CN103488067B - 发光装置的光量补偿检查方法 - Google Patents
发光装置的光量补偿检查方法 Download PDFInfo
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- CN103488067B CN103488067B CN201210312466.6A CN201210312466A CN103488067B CN 103488067 B CN103488067 B CN 103488067B CN 201210312466 A CN201210312466 A CN 201210312466A CN 103488067 B CN103488067 B CN 103488067B
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- 238000000034 method Methods 0.000 title claims abstract description 23
- 238000007689 inspection Methods 0.000 title claims abstract description 19
- 230000002950 deficient Effects 0.000 claims 2
- 238000006243 chemical reaction Methods 0.000 description 13
- 238000010586 diagram Methods 0.000 description 10
- 238000004020 luminiscence type Methods 0.000 description 7
- 238000005516 engineering process Methods 0.000 description 3
- 238000007639 printing Methods 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 230000008878 coupling Effects 0.000 description 2
- 238000010168 coupling process Methods 0.000 description 2
- 238000005859 coupling reaction Methods 0.000 description 2
- 238000001514 detection method Methods 0.000 description 2
- 239000000428 dust Substances 0.000 description 2
- 206010021033 Hypomenorrhoea Diseases 0.000 description 1
- 230000002159 abnormal effect Effects 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 230000000977 initiatory effect Effects 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 238000005375 photometry Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G15/00—Apparatus for electrographic processes using a charge pattern
- G03G15/04—Apparatus for electrographic processes using a charge pattern for exposing, i.e. imagewise exposure by optically projecting the original image on a photoconductive recording material
- G03G15/043—Apparatus for electrographic processes using a charge pattern for exposing, i.e. imagewise exposure by optically projecting the original image on a photoconductive recording material with means for controlling illumination or exposure
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Printers Or Recording Devices Using Electromagnetic And Radiation Means (AREA)
Abstract
Description
Claims (4)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW101120760A TWI477404B (zh) | 2012-06-08 | 2012-06-08 | 發光裝置之光量補償檢查方法 |
TW101120760 | 2012-06-08 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN103488067A CN103488067A (zh) | 2014-01-01 |
CN103488067B true CN103488067B (zh) | 2016-02-24 |
Family
ID=49714731
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201210312466.6A Active CN103488067B (zh) | 2012-06-08 | 2012-08-29 | 发光装置的光量补偿检查方法 |
Country Status (3)
Country | Link |
---|---|
US (1) | US8786199B2 (zh) |
CN (1) | CN103488067B (zh) |
TW (1) | TWI477404B (zh) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP3370407B1 (en) * | 2012-04-24 | 2021-06-16 | Hewlett-Packard Development Company, L.P. | Printing system and method of operation |
JP2015011237A (ja) * | 2013-06-28 | 2015-01-19 | キヤノン株式会社 | 光走査装置及び画像形成装置 |
JP6802676B2 (ja) * | 2016-09-14 | 2020-12-16 | キヤノン株式会社 | 画像形成装置 |
CN106157897B (zh) * | 2016-09-26 | 2018-11-20 | 京东方科技集团股份有限公司 | 一种亮度控制方法、装置、amoled面板和电子设备 |
JP2019046835A (ja) * | 2017-08-30 | 2019-03-22 | 株式会社沖データ | 半導体発光素子、半導体複合装置、光プリントヘッド、及び画像形成装置 |
US10769505B2 (en) * | 2018-03-20 | 2020-09-08 | Ricoh Company, Ltd. | Optical sensor device performing color correction using light adjustment |
JP2019202442A (ja) * | 2018-05-22 | 2019-11-28 | コニカミノルタ株式会社 | 光書込み装置、画像形成装置、および光量制御方法 |
JP7386190B2 (ja) | 2021-01-21 | 2023-11-24 | 株式会社アドバンテスト | 試験装置、試験方法およびプログラム |
JP7355773B2 (ja) * | 2021-02-26 | 2023-10-03 | 株式会社アドバンテスト | 試験装置、試験方法およびプログラム |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001232852A (ja) * | 2000-02-25 | 2001-08-28 | Konica Corp | 画像形成装置および光量調整方法ならびに光量補正方法 |
CN1912770A (zh) * | 2005-08-08 | 2007-02-14 | 精工爱普生株式会社 | 发光装置的光量校正方法、图像形成装置和显示装置 |
CN101673752A (zh) * | 2008-09-10 | 2010-03-17 | 富士施乐株式会社 | 发光装置、曝光装置、图像形成装置以及发光控制方法 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6828538B2 (en) * | 2001-12-26 | 2004-12-07 | Xerox Corporation | Illumination detection method for LED printbars |
US20040218960A1 (en) * | 2003-04-29 | 2004-11-04 | Pictologic, Inc. | Method and apparatus for printer head error compensation |
CN100566485C (zh) * | 2005-05-27 | 2009-12-02 | 皇家飞利浦电子股份有限公司 | 用于控制发光半导体装置的方法和包括该装置的照明系统 |
JP5195183B2 (ja) * | 2008-09-04 | 2013-05-08 | コニカミノルタビジネステクノロジーズ株式会社 | 光書込装置の評価装置及び光書込装置の評価方法 |
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2012
- 2012-06-08 TW TW101120760A patent/TWI477404B/zh active
- 2012-08-10 US US13/572,032 patent/US8786199B2/en active Active
- 2012-08-29 CN CN201210312466.6A patent/CN103488067B/zh active Active
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001232852A (ja) * | 2000-02-25 | 2001-08-28 | Konica Corp | 画像形成装置および光量調整方法ならびに光量補正方法 |
CN1912770A (zh) * | 2005-08-08 | 2007-02-14 | 精工爱普生株式会社 | 发光装置的光量校正方法、图像形成装置和显示装置 |
CN101673752A (zh) * | 2008-09-10 | 2010-03-17 | 富士施乐株式会社 | 发光装置、曝光装置、图像形成装置以及发光控制方法 |
Also Published As
Publication number | Publication date |
---|---|
CN103488067A (zh) | 2014-01-01 |
US8786199B2 (en) | 2014-07-22 |
TW201350351A (zh) | 2013-12-16 |
TWI477404B (zh) | 2015-03-21 |
US20130328487A1 (en) | 2013-12-12 |
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C06 | Publication | ||
PB01 | Publication | ||
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C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
TR01 | Transfer of patent right | ||
TR01 | Transfer of patent right |
Effective date of registration: 20190322 Address after: Taiwan, China Hsinchu science and Technology Park, a new road, No. 20 Patentee after: Hongguang Precision Industry Co., Ltd. Address before: 6th Floor, 132 Lane 235, Baoqiao Road, Xindian District, Xinbei City, Taiwan, China Patentee before: Day prosperous electronics incorporated company |
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TR01 | Transfer of patent right | ||
TR01 | Transfer of patent right |
Effective date of registration: 20190827 Address after: No. 9 Yangtai Road, Suzhou Industrial Park, Jiangsu Province Patentee after: Avision Precision Industry (Suzhou) Co., Ltd. Address before: Taiwan, China Hsinchu science and Technology Park, a new road, No. 20 Patentee before: Hongguang Precision Industry Co., Ltd. |
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EE01 | Entry into force of recordation of patent licensing contract | ||
EE01 | Entry into force of recordation of patent licensing contract |
Application publication date: 20140101 Assignee: Hongguang Precision Industry Co., Ltd. Assignor: Hongguang Precision Industry (Suzhou) Co., Ltd. Contract record no.: X2019990000194 Denomination of invention: Method for compensating and checking light amount of light-emitting device Granted publication date: 20160224 License type: Exclusive License Record date: 20191120 |