CN103409756A - 金属抛光剂及其制备方法 - Google Patents
金属抛光剂及其制备方法 Download PDFInfo
- Publication number
- CN103409756A CN103409756A CN2013103100609A CN201310310060A CN103409756A CN 103409756 A CN103409756 A CN 103409756A CN 2013103100609 A CN2013103100609 A CN 2013103100609A CN 201310310060 A CN201310310060 A CN 201310310060A CN 103409756 A CN103409756 A CN 103409756A
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- CN
- China
- Prior art keywords
- parts
- polishing agent
- preparation
- metal polishing
- repone
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 229910052751 metal Inorganic materials 0.000 title claims abstract description 24
- 239000002184 metal Substances 0.000 title claims abstract description 24
- 238000002360 preparation method Methods 0.000 title claims abstract description 11
- 238000005498 polishing Methods 0.000 title abstract description 8
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 claims abstract description 22
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 claims abstract description 19
- WCUXLLCKKVVCTQ-UHFFFAOYSA-M Potassium chloride Chemical compound [Cl-].[K+] WCUXLLCKKVVCTQ-UHFFFAOYSA-M 0.000 claims abstract description 12
- 235000019270 ammonium chloride Nutrition 0.000 claims abstract description 11
- 239000002994 raw material Substances 0.000 claims abstract description 8
- RCIVOBGSMSSVTR-UHFFFAOYSA-L stannous sulfate Chemical compound [SnH2+2].[O-]S([O-])(=O)=O RCIVOBGSMSSVTR-UHFFFAOYSA-L 0.000 claims abstract description 8
- 229910000375 tin(II) sulfate Inorganic materials 0.000 claims abstract description 8
- FXZAUBIBKADOBA-UHFFFAOYSA-N 1,4-bis(2-methylpropoxy)-1,4-dioxobutane-2-sulfonic acid;sodium Chemical compound [Na].CC(C)COC(=O)CC(S(O)(=O)=O)C(=O)OCC(C)C FXZAUBIBKADOBA-UHFFFAOYSA-N 0.000 claims description 10
- KWCHGHCWERZDGX-UHFFFAOYSA-N 4-amino-3-hydroxybutan-2-one Chemical compound CC(=O)C(O)CN KWCHGHCWERZDGX-UHFFFAOYSA-N 0.000 claims description 10
- 150000001412 amines Chemical class 0.000 claims description 10
- 125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 claims description 10
- 230000003647 oxidation Effects 0.000 claims description 10
- 238000007254 oxidation reaction Methods 0.000 claims description 10
- 239000002826 coolant Substances 0.000 claims description 5
- 239000012467 final product Substances 0.000 claims description 5
- 238000003756 stirring Methods 0.000 claims description 5
- 230000009286 beneficial effect Effects 0.000 abstract description 2
- 230000007613 environmental effect Effects 0.000 abstract description 2
- 231100000252 nontoxic Toxicity 0.000 abstract description 2
- 230000003000 nontoxic effect Effects 0.000 abstract description 2
- 239000003795 chemical substances by application Substances 0.000 abstract 4
- 125000000218 acetic acid group Chemical group C(C)(=O)* 0.000 abstract 1
- 230000008021 deposition Effects 0.000 abstract 1
- 239000001103 potassium chloride Substances 0.000 abstract 1
- 235000011164 potassium chloride Nutrition 0.000 abstract 1
- NTWXWSVUSTYPJH-UHFFFAOYSA-M sodium;1,4-bis(2-methylpropoxy)-1,4-dioxobutane-2-sulfonate Chemical compound [Na+].CC(C)COC(=O)CC(S([O-])(=O)=O)C(=O)OCC(C)C NTWXWSVUSTYPJH-UHFFFAOYSA-M 0.000 abstract 1
- RJSZFSOFYVMDIC-UHFFFAOYSA-N tert-butyl n,n-dimethylcarbamate Chemical compound CN(C)C(=O)OC(C)(C)C RJSZFSOFYVMDIC-UHFFFAOYSA-N 0.000 abstract 1
- 150000001875 compounds Chemical class 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 3
- 238000001556 precipitation Methods 0.000 description 2
- 230000007812 deficiency Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000007517 polishing process Methods 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 231100000167 toxic agent Toxicity 0.000 description 1
- 239000003440 toxic substance Substances 0.000 description 1
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- Detergent Compositions (AREA)
Abstract
Description
Claims (2)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201310310060.9A CN103409756B (zh) | 2013-07-23 | 2013-07-23 | 金属抛光剂及其制备方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201310310060.9A CN103409756B (zh) | 2013-07-23 | 2013-07-23 | 金属抛光剂及其制备方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN103409756A true CN103409756A (zh) | 2013-11-27 |
CN103409756B CN103409756B (zh) | 2015-12-09 |
Family
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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CN201310310060.9A Active CN103409756B (zh) | 2013-07-23 | 2013-07-23 | 金属抛光剂及其制备方法 |
Country Status (1)
Country | Link |
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CN (1) | CN103409756B (zh) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104046990A (zh) * | 2014-06-23 | 2014-09-17 | 梧州恒声电子科技有限公司 | 一种铜抛光的方法 |
CN104264152A (zh) * | 2014-10-09 | 2015-01-07 | 无锡康柏斯机械科技有限公司 | 一种金属专用抛光剂及其制备方法 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101177591A (zh) * | 2007-12-07 | 2008-05-14 | 天长市华润清洗科技有限公司 | 金属抛光剂及其制备方法 |
CN101532127A (zh) * | 2008-10-24 | 2009-09-16 | 尤耀明 | 硅片载体使用的挂具 |
CN101649459A (zh) * | 2008-08-12 | 2010-02-17 | 北京科技桥科贸有限公司 | 不锈钢化学抛光液 |
CN101684392A (zh) * | 2008-09-26 | 2010-03-31 | 安集微电子(上海)有限公司 | 一种化学机械抛光液 |
US20100096584A1 (en) * | 2008-10-22 | 2010-04-22 | Fujimi Corporation | Polishing Composition and Polishing Method Using the Same |
-
2013
- 2013-07-23 CN CN201310310060.9A patent/CN103409756B/zh active Active
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101177591A (zh) * | 2007-12-07 | 2008-05-14 | 天长市华润清洗科技有限公司 | 金属抛光剂及其制备方法 |
CN101649459A (zh) * | 2008-08-12 | 2010-02-17 | 北京科技桥科贸有限公司 | 不锈钢化学抛光液 |
CN101684392A (zh) * | 2008-09-26 | 2010-03-31 | 安集微电子(上海)有限公司 | 一种化学机械抛光液 |
US20100096584A1 (en) * | 2008-10-22 | 2010-04-22 | Fujimi Corporation | Polishing Composition and Polishing Method Using the Same |
CN101532127A (zh) * | 2008-10-24 | 2009-09-16 | 尤耀明 | 硅片载体使用的挂具 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104046990A (zh) * | 2014-06-23 | 2014-09-17 | 梧州恒声电子科技有限公司 | 一种铜抛光的方法 |
CN104264152A (zh) * | 2014-10-09 | 2015-01-07 | 无锡康柏斯机械科技有限公司 | 一种金属专用抛光剂及其制备方法 |
Also Published As
Publication number | Publication date |
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CN103409756B (zh) | 2015-12-09 |
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Effective date of registration: 20151104 Address after: 226300, Jiangsu, Nantong province Tongzhou District Stone Town Industrial Park Applicant after: Ge Juan Address before: 215212 Puxi Industrial Zone, No. 17 traffic West Road, Fen town, Suzhou City, Jiangsu, Wujiang Applicant before: WUJIANG LONGSHUO METAL PRODUCTS Co.,Ltd. |
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C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
CP02 | Change in the address of a patent holder | ||
CP02 | Change in the address of a patent holder |
Address after: 274300 1km south of Wangzhuang ferry, Huanggang Town, Shan county, Heze City, Shandong Province Patentee after: Ge Juan Address before: 226300, Jiangsu, Nantong province Tongzhou District Stone Town Industrial Park Patentee before: Ge Juan |
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Effective date of registration: 20210114 Address after: Room 104, building 10, Siwei Road, Dongli District, Tianjin Patentee after: Tianjin Yizheng Technology Co.,Ltd. Address before: 274300 1km south of Wangzhuang ferry, Huanggang Town, Shan county, Heze City, Shandong Province Patentee before: Ge Juan |
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CP02 | Change in the address of a patent holder | ||
CP02 | Change in the address of a patent holder |
Address after: No. 928, Huaying Building, Central Avenue, Dongli District Free Trade Zone (Airport Economic Zone), Tianjin 300000 (Tianjin Guoxing Commercial Secretary Co., Ltd. Trustee No. 020) Patentee after: Tianjin Yizheng Technology Co.,Ltd. Address before: Room 104, building 10, Siwei Road, Dongli District, Tianjin Patentee before: Tianjin Yizheng Technology Co.,Ltd. |
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CP02 | Change in the address of a patent holder | ||
CP02 | Change in the address of a patent holder |
Address after: No. 928, Huaying Building, Central Avenue, Binhai New Area Pilot Free Trade Zone (Airport Economic Zone), Tianjin 300000 (Tianjin Guoxing Commercial Secretary Co., Ltd. Trustee No. 020) Patentee after: Tianjin Yizheng Technology Co.,Ltd. Address before: No. 928, Huaying Building, Central Avenue, Dongli District Free Trade Zone (Airport Economic Zone), Tianjin 300000 (Tianjin Guoxing Commercial Secretary Co., Ltd. Trustee No. 020) Patentee before: Tianjin Yizheng Technology Co.,Ltd. |