CN103374757B - A kind of modified version tail gas of diffusion furnace discharge equipment - Google Patents
A kind of modified version tail gas of diffusion furnace discharge equipment Download PDFInfo
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- CN103374757B CN103374757B CN201310310760.8A CN201310310760A CN103374757B CN 103374757 B CN103374757 B CN 103374757B CN 201310310760 A CN201310310760 A CN 201310310760A CN 103374757 B CN103374757 B CN 103374757B
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Abstract
The invention discloses a kind of modified version tail gas of diffusion furnace discharge equipment, comprise the first gas buffer bottle, exhaust equipment and pressure monitoring devices and nitrogen compensation equipment, unidirectionally between pressure monitoring devices with nitrogen compensation equipment to be connected, one end of first gas buffer bottle is via the second gas buffer bottle be linked in sequence successively,, be connected with exhaust equipment after N gas buffer bottle; Pressure monitoring devices is located on the pipe connecting on the arbitrary gas buffer bottle after the gas buffer bottle at nitrogen compensation equipment place or between gas buffer bottle.The present invention is on the basis of existing equipment, add the quantity of gas buffer bottle, have adjusted the position of pressure monitoring device, make gas compensation no longer delayed, the fluctuation that directly can reduce exhaust equipment, on the impact of air-flow in silica tube, is conducive to maintaining airflow stability in silica tube, reaches the object of the constant voltage ensureing air-flow in diffusion quartz tube, increase the stability of technique, ensure that the homogeneity of square resistance and the quality of PN junction.
Description
Technical field
The present invention relates to technical field of semiconductor device preparation.
Background technology
The main flow that sun power crystal silicon battery is produced comprises: the deposition of making herbs into wool, diffusion, wet etching, antireflective coating, silk screen printing and sintering.Wherein, diffusion is master operation prepared by PN junction, and PN junction is the core texture of solar cell, and the efficiency of conversion of the quality of PN junction on sun crystal silicon battery has important impact.The homogeneity of square resistance weighs a sign of PN junction quality, and the whether constant of air-flow has very large relation in the homogeneity of square resistance and Quartz stove tube, the fluctuation therefore how reducing equipment peripheral gas is very necessary on the impact of air-flow in Quartz stove tube.
The structure of current diffusion furnace exhaust emission device as shown in Figure 1, it mainly comprises gas buffer bottle and exhaust equipment, one end of gas buffer bottle is connected with the silica tube of diffusion furnace, its the other end is connected with exhaust equipment, silica tube is provided with pressure monitoring devices, gas buffer bottle is provided with nitrogen compensation equipment, unidirectionally between pressure monitoring devices with nitrogen compensation equipment is connected.The working process of exhaust emission device is: the waste gas produced in silica tube is drawn out of by exhaust equipment, and first waste gas discharged by exhaust equipment through gas buffer bottle again.If the gas in production process in exhaust equipment produces fluctuation, the gas in silica tube will be caused to change, and then the gaseous tension of silica tube is changed; After pressure monitoring device monitors this change information, will notify that nitrogen compensation equipment makes it carry out " nitrogen compensation " gas buffer bottle, to adjust the air pressure in exhaust equipment, and then make the stable gas pressure in silica tube be a certain steady state value.
By above-mentioned known, existing apparatus be after exhaust equipment generation gas pulsation conducts to silica tube again pressure test monitor just can start nitrogen compensate, obviously, the compensation of nitrogen is delayed, that in silica tube, gas has produced the subsequent compensation adjustment that fluctuation just can occur, to maintain air pressure in Quartz stove tube for steady state value.Therefore, the mode of connection of existing apparatus to be unfavorable for ensureing in production process air-flow stability from start to finish in silica tube.
Summary of the invention
The technical problem to be solved in the present invention is to provide a kind of modified version tail gas of diffusion furnace discharge equipment, this device can to reduce or avoid in exhaust equipment gas pulsation on the impact of airflow stability in quartz tubes in diffusion furnace, and then ensure diffusion technique steady running, avoid because the homogeneity of the influence of fluctuations diffusion square resistance of exhaust equipment.
For solving the problems of the technologies described above, the technical solution used in the present invention is: a kind of modified version tail gas of diffusion furnace discharge equipment, comprise the first gas buffer bottle, exhaust equipment and pressure monitoring devices and nitrogen compensation equipment, unidirectionally between described pressure monitoring devices with nitrogen compensation equipment to be connected, one end of described first gas buffer bottle is connected with diffusion furnace silica tube, the other end of the first gas buffer bottle is via the second gas buffer bottle be linked in sequence successively, be connected with exhaust equipment after N gas buffer bottle, wherein N > 2, between each gas buffer bottle, gas buffer bottle is all connected by pipe connecting with between exhaust equipment, described nitrogen compensation equipment is located on arbitrary gas buffer bottle, and described pressure monitoring devices is located on the pipe connecting on the arbitrary gas buffer bottle after the gas buffer bottle at nitrogen compensation equipment place or between gas buffer bottle.
Described first gas buffer bottle is connected with exhaust equipment via after the second gas buffer bottle, and described nitrogen compensation equipment is located on the first gas buffer bottle, and described pressure monitoring devices is located on the pipe connecting between the first gas buffer bottle and the second gas buffer bottle.
Described first gas buffer bottle is connected with exhaust equipment via after the second gas buffer bottle, and described nitrogen compensation equipment is located on the first gas buffer bottle, and described pressure monitoring devices is located on the second gas buffer bottle.
Described first gas buffer bottle is connected with exhaust equipment via after the second gas buffer bottle be linked in sequence and the 3rd gas buffer bottle.
Described nitrogen compensation system is located on the first gas buffer bottle, and described pressure monitoring devices is located on the pipe connecting between the first gas buffer bottle and the second gas buffer bottle or is located on the second gas buffer bottle.
Described nitrogen compensation system is located on the second gas buffer bottle, and described pressure monitoring devices is located on the pipe connecting between the second gas buffer bottle and the 3rd gas buffer bottle or is located on the 3rd gas buffer bottle.
The technical progress adopting technique scheme to obtain is: the present invention is on the basis of existing equipment, add the quantity of gas buffer bottle, have adjusted the position of pressure monitoring device, the distance of pressure monitoring devices distance silica tube is made to be greater than the distance of nitrogen compensation equipment distance silica tube, first the gas pulsation of such exhaust equipment has influence on gas buffer bottle, after pressure monitoring devices monitors, start nitrogen compensation equipment at once, the fluctuation of gas can be eased in gas buffer bottle, avoids the air-flow directly involved in silica tube; After connection like this, gas compensation is no longer delayed, directly can reduce the fluctuation of exhaust equipment to the impact of air-flow in silica tube, more be conducive to maintaining airflow stability in silica tube, reach the object of the constant voltage ensureing air-flow in diffusion quartz tube, increase the stable and repeated of technique, ensure that the homogeneity of square resistance and the quality of PN junction.
Accompanying drawing explanation
Fig. 1 is the structural representation of existing exhaust emission device;
Fig. 2 is structural representation of the present invention;
Fig. 3 is the structural representation of the embodiment of the present invention 1;
Fig. 4 is the structural representation of the embodiment of the present invention 2;
Fig. 5 is the structural representation of the embodiment of the present invention 3;
Fig. 6 is the structural representation of the embodiment of the present invention 4.
Embodiment
Known as shown in Figure 2, a kind of modified version tail gas of diffusion furnace discharge equipment, comprise the first gas buffer bottle, exhaust equipment and pressure monitoring devices and nitrogen compensation equipment, unidirectionally between described pressure monitoring devices with nitrogen compensation equipment to be connected, one end of described first gas buffer bottle is connected with diffusion furnace silica tube, the other end of the first gas buffer bottle is via the second gas buffer bottle be linked in sequence successively, be connected with exhaust equipment after N gas buffer bottle, wherein N > 2, between each gas buffer bottle, gas buffer bottle is all connected by pipe connecting with between exhaust equipment, described nitrogen compensation equipment is located on arbitrary gas buffer bottle, and described pressure monitoring devices is located on the pipe connecting on the arbitrary gas buffer bottle after the gas buffer bottle at nitrogen compensation equipment place or between gas buffer bottle.
The present invention improves on the basis of original tail gas of diffusion furnace treatment unit, improves and has 2 points: the quantity 1) adding gas buffer bottle, 2) have adjusted the position of pressure monitoring devices.
In the present invention, after nitrogen compensation equipment is adjusted in the position of pressure monitoring devices, and multiple gas buffer bottle is provided with between the first gas buffer bottle and air draft are arranged.After improvement, workflow of the present invention just becomes: when there is gas pulsation in exhaust equipment, first this fluctuation is delivered to the gas buffer bottle between the first gas buffer bottle and exhaust equipment, first the pressure monitoring devices far away apart from silica tube can monitor this fluctuation, after pressure monitoring devices monitors this fluctuation, notify nitrogen compensation equipment immediately, nitrogen compensation equipment carries out gas compensation to connected gas buffer bottle soon, the fluctuation on exhaust equipment is made to be compensated for as standard state, like this, just finished by compensation when not also being delivered to silica tube in fluctuation, therefore this fluctuation would not have an impact to the air pressure in silica tube, this ensures that there the homoeostasis of air-flow in silica tube, thus ensure the stability of the parameters of producing, ensure that the quality of PN junction.
Embodiment 1
Known as shown in Figure 3, modified version tail gas of diffusion furnace treatment unit, comprise the first gas buffer bottle, second gas buffer bottle, exhaust equipment and pressure monitoring devices and nitrogen compensation equipment, unidirectionally between described pressure monitoring devices with nitrogen compensation equipment to be connected, one end of described first gas buffer bottle is connected with diffusion furnace silica tube, the other end of described first gas buffer bottle is connected with exhaust equipment via after the second gas buffer bottle, described nitrogen compensation equipment is located on the first gas buffer bottle, described pressure monitoring devices is located on the pipe connecting between the first gas buffer bottle and the second gas buffer bottle.
Embodiment 2
Known as shown in Figure 4, as different from Example 1, described pressure monitoring devices is located on the second gas buffer bottle.
Embodiment 3
Known as shown in Figure 5, as different from Example 1, described first gas buffer bottle is connected with exhaust equipment via after the second gas buffer bottle be linked in sequence and the 3rd gas buffer bottle.Described nitrogen compensation system is located on the first gas buffer bottle, and described pressure monitoring devices is located on the pipe connecting between the first gas buffer bottle and the second gas buffer bottle or is located on the second gas buffer bottle.
Embodiment 4
Known as shown in Figure 6, as different from Example 5, described nitrogen compensation system is located on the second gas buffer bottle, and described pressure monitoring devices is located on the pipe connecting between the second gas buffer bottle and the 3rd gas buffer bottle or is located on the 3rd gas buffer bottle.
The present invention provide only several specific embodiment, those skilled in the art design according to actual needs in actual application, the position etc. of the quantity of such as gas buffer bottle, nitrogen compensation equipment and pressure monitoring devices, as long as can ensure to reach technique effect of the present invention.
Technological thought of the present invention is not limited to tail gas of diffusion furnace treatment unit, also can be used for and the device with similar exhaust equipment, in order to the air pressure fluctuation reducing exhaust equipment has an impact to preceding apparatus, thought of the present invention can be used to process.
Claims (6)
1. a modified version tail gas of diffusion furnace discharge equipment, comprise the first gas buffer bottle, exhaust equipment and pressure monitoring devices and nitrogen compensation equipment, unidirectionally between described pressure monitoring devices with nitrogen compensation equipment to be connected, one end of described first gas buffer bottle is connected with diffusion furnace silica tube, it is characterized in that the other end of the first gas buffer bottle via the second gas buffer bottle be linked in sequence successively until be connected with exhaust equipment after N gas buffer bottle, wherein N > 2, between each gas buffer bottle, gas buffer bottle is all connected by pipe connecting with between exhaust equipment, described nitrogen compensation equipment is located on arbitrary gas buffer bottle, and described pressure monitoring devices is located on the pipe connecting on the arbitrary gas buffer bottle after the gas buffer bottle at nitrogen compensation equipment place or between gas buffer bottle.
2. a kind of modified version tail gas of diffusion furnace discharge equipment according to claim 1, it is characterized in that described first gas buffer bottle is connected with exhaust equipment via after the second gas buffer bottle, described nitrogen compensation equipment is located on the first gas buffer bottle, and described pressure monitoring devices is located on the pipe connecting between the first gas buffer bottle and the second gas buffer bottle.
3. a kind of modified version tail gas of diffusion furnace discharge equipment according to claim 1, it is characterized in that described first gas buffer bottle is connected with exhaust equipment via after the second gas buffer bottle, described nitrogen compensation equipment is located on the first gas buffer bottle, and described pressure monitoring devices is located on the second gas buffer bottle.
4. a kind of modified version tail gas of diffusion furnace discharge equipment according to claim 1, is characterized in that described first gas buffer bottle is connected with exhaust equipment via after the second gas buffer bottle be linked in sequence and the 3rd gas buffer bottle.
5. a kind of modified version tail gas of diffusion furnace discharge equipment according to claim 4, it is characterized in that described nitrogen compensation system is located on the first gas buffer bottle, described pressure monitoring devices is located on the pipe connecting between the first gas buffer bottle and the second gas buffer bottle or is located on the second gas buffer bottle.
6. a kind of modified version tail gas of diffusion furnace discharge equipment according to claim 4, it is characterized in that described nitrogen compensation system is located on the second gas buffer bottle, described pressure monitoring devices is located on the pipe connecting between the second gas buffer bottle and the 3rd gas buffer bottle or is located on the 3rd gas buffer bottle.
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| CN201310310760.8A CN103374757B (en) | 2013-07-23 | 2013-07-23 | A kind of modified version tail gas of diffusion furnace discharge equipment |
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| CN201310310760.8A CN103374757B (en) | 2013-07-23 | 2013-07-23 | A kind of modified version tail gas of diffusion furnace discharge equipment |
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| CN103374757B true CN103374757B (en) | 2015-11-04 |
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| CN105214806A (en) * | 2015-10-29 | 2016-01-06 | 天紫环保装备制造（天津）有限公司 | The pressure relief of crosslinked formula flash distillation blasting gear |
| CN110538620B (en) * | 2018-11-14 | 2021-10-15 | 北京北方华创微电子装备有限公司 | Pressure control system and pressure control method of reaction chamber |
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| JP2699916B2 (en) * | 1995-03-29 | 1998-01-19 | 日本電気株式会社 | Atmospheric pressure vapor deposition equipment |
| JP3179437B2 (en) * | 1999-03-05 | 2001-06-25 | 広島日本電気株式会社 | Phosphorus diffusion furnace with phosphorus recovery function |
| KR20060084154A (en) * | 2005-01-19 | 2006-07-24 | 삼성전자주식회사 | Vent system for semiconductor deposition equipment |
| KR20060104236A (en) * | 2005-03-29 | 2006-10-09 | 삼성전자주식회사 | Heating equipment for semiconductor manufacturing |
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| CN201590408U (en) * | 2009-12-25 | 2010-09-22 | 深圳市捷佳伟创微电子设备有限公司 | Automatic pressure balancing structure of diffusion furnace |
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