CN103374724A - Colored film and manufacturing method thereof - Google Patents
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- CN103374724A CN103374724A CN2012101575948A CN201210157594A CN103374724A CN 103374724 A CN103374724 A CN 103374724A CN 2012101575948 A CN2012101575948 A CN 2012101575948A CN 201210157594 A CN201210157594 A CN 201210157594A CN 103374724 A CN103374724 A CN 103374724A
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- 238000004519 manufacturing process Methods 0.000 title abstract description 5
- 239000010410 layer Substances 0.000 claims abstract description 144
- 229910052751 metal Inorganic materials 0.000 claims abstract description 89
- 239000002184 metal Substances 0.000 claims abstract description 89
- 238000000034 method Methods 0.000 claims abstract description 35
- 239000011241 protective layer Substances 0.000 claims abstract description 23
- 239000000758 substrate Substances 0.000 claims description 41
- 239000000463 material Substances 0.000 claims description 40
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 24
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 18
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 claims description 12
- 229910052804 chromium Inorganic materials 0.000 claims description 12
- 239000011651 chromium Substances 0.000 claims description 12
- 229910052759 nickel Inorganic materials 0.000 claims description 12
- 239000010935 stainless steel Substances 0.000 claims description 12
- 229910001220 stainless steel Inorganic materials 0.000 claims description 12
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims description 11
- 230000008021 deposition Effects 0.000 claims description 10
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 9
- 229910052709 silver Inorganic materials 0.000 claims description 9
- 239000004332 silver Substances 0.000 claims description 9
- 239000011521 glass Substances 0.000 claims description 8
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical group [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 7
- 229910052782 aluminium Inorganic materials 0.000 claims description 7
- 239000004411 aluminium Substances 0.000 claims description 7
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 7
- 229910052738 indium Inorganic materials 0.000 claims description 7
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 claims description 7
- 229910052718 tin Inorganic materials 0.000 claims description 7
- 229910017083 AlN Inorganic materials 0.000 claims description 6
- PIGFYZPCRLYGLF-UHFFFAOYSA-N Aluminum nitride Chemical compound [Al]#N PIGFYZPCRLYGLF-UHFFFAOYSA-N 0.000 claims description 6
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical group [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 6
- 229910000846 In alloy Inorganic materials 0.000 claims description 6
- 229910000990 Ni alloy Inorganic materials 0.000 claims description 6
- 229910001128 Sn alloy Inorganic materials 0.000 claims description 6
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 6
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 6
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 claims description 6
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 claims description 6
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 6
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims description 6
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 claims description 6
- 229910001297 Zn alloy Inorganic materials 0.000 claims description 6
- SJKRCWUQJZIWQB-UHFFFAOYSA-N azane;chromium Chemical compound N.[Cr] SJKRCWUQJZIWQB-UHFFFAOYSA-N 0.000 claims description 6
- 229910052802 copper Inorganic materials 0.000 claims description 6
- 239000010949 copper Substances 0.000 claims description 6
- 229960004643 cupric oxide Drugs 0.000 claims description 6
- 229910000480 nickel oxide Inorganic materials 0.000 claims description 6
- GNRSAWUEBMWBQH-UHFFFAOYSA-N oxonickel Chemical compound [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 claims description 6
- 239000000843 powder Substances 0.000 claims description 6
- 238000002310 reflectometry Methods 0.000 claims description 6
- 229910052719 titanium Inorganic materials 0.000 claims description 6
- 239000010936 titanium Substances 0.000 claims description 6
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims description 6
- 229910052725 zinc Inorganic materials 0.000 claims description 6
- 239000011701 zinc Substances 0.000 claims description 6
- 229910052726 zirconium Inorganic materials 0.000 claims description 6
- ZVWKZXLXHLZXLS-UHFFFAOYSA-N zirconium nitride Chemical compound [Zr]#N ZVWKZXLXHLZXLS-UHFFFAOYSA-N 0.000 claims description 6
- 238000004062 sedimentation Methods 0.000 claims description 5
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Abstract
The invention discloses a colored film structure and a manufacturing method of the colored film. The structure enables the color development layer on the rough metal layer to have more accurate color, and the color development layer is covered with a protective layer to prevent the color development layer of the colored film from deteriorating and improve the hardness of the colored film. The method for manufacturing the colored film can reduce environmental pollution and energy consumption and has the characteristic of low-temperature film forming.
Description
Technical field
The present invention relates to the finishing material manufacturing technology, particularly form one deck textured metal layer to reduce the Coloured film of luminous reflectance factor relevant for a kind of with Film forming method.
Background technology
At present, in various musical instruments, household electrical appliances and Internet appliance product, it is not only noticeable to have bright and new beautiful outward appearance, and technique that more can improving product itself is worth.Therefore, each manufacturer all must make an effort in color and luster and the texture of product surface, could allow oneself product can obtain more human consumers' favor.The mode of existing outward appearance processing has plating, baking vanish or vacuum splashing and plating, wherein electroplating to be plated on the shell of metal material mostly, crossing in the layer of plating processing also can produce a large amount of electroplating wastewaters, so that contaminate environment, and plating produces microparticle on the surface easily and affects impression.Baking vanish processing has bright, the advantage with being difficult for falling lacquer bright in luster, and is dirty but fingerprint often is stained with easily in its surface, and increase the problem that cleaning goes up.Vacuum splashing and plating processing has low cost, the large advantage with meeting environmental protection act of output, often can't present specific color but shortcoming is vacuum splashing and plating processing, for example white.
Summary of the invention
Because above-mentioned technical problem, the object of the invention is providing a kind of look film and preparation method thereof exactly, is worth with the technique that increases product appearance.
For reaching above-mentioned purpose, Coloured film of the present invention, its structure comprises: substrate; The textured metal layer, this textured metal layer is positioned on the substrate, and the surface of this textured metal layer has a uneven surface, in order to reduce luminous reflectance factor; And color layer, this color layer is positioned on the surface of textured metal layer, so that Coloured film manifests color; Also comprise protective layer, this protective layer is positioned on the color layer, can not produce oxidative phenomena or chemical transformation phenomenon with the protection color layer under atmosphere or other environment.
Wherein, the thickness range 10nm to 1000nm of this protective layer, the material of this protective layer is Si oxide (SiO
x) or aluminum oxide (AlO
x), and x is a positive rational number.
Wherein, the material of this substrate is glass, metal, stainless steel or macromolecular material.Deposition one buffer layer between this substrate alternative and the textured metal layer, in order to this substrate and this textured metal layer of combining closely, the material of this buffer layer is nickel, chromium, various nickelalloy or various Chrome metal powder.
Wherein, the material of this textured metal layer is tin, zinc, indium, various tin alloy, various indium alloy or various zinc alloy, and the thickness range of this textured metal layer is 5nm to 1000nm, the mean roughness (R on this textured metal layer surface
a) scope is between 0.06 μ m to the 0.25 μ m.
Wherein, the material of this color layer is copper, aluminium, silver, nickel, chromium, zirconium, titanium, cupric oxide, aluminum oxide, nickel oxide, chromic oxide, zirconium white, titanium oxide, aluminium nitride, chromium nitride, zirconium nitride, titanium nitride or stainless steel, and the thickness range of color layer is 30nm to 5500nm.
Another purpose of the present invention is to propose the again making method of energy-conservation Coloured film of a kind of environmental protection.
The making method of a kind of Coloured film structure of the present invention comprises the following step: substrate is provided; Form the textured metal layer at this substrate, the surface of this textured metal layer has roughness, to reduce the color layer reflectivity; And at the surface of this textured metal layer formation color layer, so that this Coloured film structure display reveals color.Form protective layer at color layer, under atmosphere or other environment, do not produce oxidative phenomena or chemical transformation phenomenon with the protection color layer.
Wherein, this textured metal layer is with sputter, evaporation, electroless plating (Chemical Vapor Deposition, CVD), electric pulp vapour deposition (Plasma enhanced Chemical Vapor Deposition, PECVD) or the sedimentation such as coating be formed on this substrate, and the material of this textured metal layer is tin, zinc, indium, various tin alloy, various zinc alloy or various indium alloy.The thickness range of this textured metal layer is 5nm to 1000nm.The average surface roughness scope of this textured metal layer is between 0.06 μ m to the 0.25 μ m.
Wherein, this color layer is formed on the surface of textured metal layer with sedimentations such as sputter, evaporation, CVD, PECVD or coatings, and the material of this color layer is copper, aluminium, silver, nickel, chromium, zirconium, titanium, cupric oxide, aluminum oxide, nickel oxide, chromic oxide, zirconium white, titanium oxide, aluminium nitride, chromium nitride, zirconium nitride, titanium nitride or stainless steel.
Wherein, the material of this substrate is glass, metal, stainless steel or macromolecular material.Wherein, this substrate more can selectivity and the textured metal layer between deposition one buffer layer, in order to substrate and the textured metal layer of combining closely.In addition, the material of this buffer layer is nickel, chromium, various nickelalloy or various Chrome metal powder.
In sum, Coloured film of the present invention and preparation method thereof, it can have one or more following advantage:
(1) making method of this Coloured film can by the sedimentation manufacturing, with environmental contamination reduction and energy consumption, and have the characteristics of film formation at low temp.
(2) this Coloured film is provided with the textured metal layer to reduce luminous reflectance factor, forms particular color.
(3) this Coloured film has protective layer protection color layer, and the Coloured film color layer is rotten also can to promote Coloured film hardness to avoid.
Description of drawings
Fig. 1 is the structural representation of Coloured film of the present invention.
Fig. 2 is the structural representation of the textured metal layer of Coloured film of the present invention.
Fig. 3 is the making method schema of Coloured film of the present invention.
Fig. 4 is Coloured film average reflectance synoptic diagram of the present invention.
Wherein:
10: substrate; 12: the textured metal layer; 121: the surface; 14: color layer; 16: protective layer; 18: buffer layer; S1: substrate is provided; S2: carry out first and form step; S3: carry out second and form step; S4: carry out the 3rd and form step.
Embodiment
Below in conjunction with accompanying drawing the present invention is elaborated.
See also Fig. 1, shown in Figure 2, the Coloured film structure comprises substrate 10, and this substrate 10 is the materials such as glass, metal, stainless steel or macromolecular material.This substrate 10 is provided with textured metal layer 12, and the uneven surface that these textured metal layer 12 surfaces 121 have certain roughness is in order to reduce reflectivity.Textured metal layer 12 is provided with color layer 14, so that the Coloured film structure manifests color.Color layer 14 is provided with protective layer 16, with protection color layer 14.Wherein alternative has buffer layer 18 between substrate 10 and this textured metal layer 12, these buffer layer 18 usefulness so that substrate 10 and textured metal layer 12 have and better be combined effect.In addition, the thickness range of textured metal layer 12 is 5 to 1000nm, is preferably 100 to 500nm; The thickness range of color layer 14 is 30 to 5500nm, is preferably 350 to 1500nm; The thickness range of protective layer 16 is 10 to 1000nm, is preferably 30 to 110nm.
See also shown in Figure 2ly, the surface 121 of textured metal layer 12 has certain roughness, and this surface 121 can make light carry out interreflection, reduces reflectivity to absorb light, avoids occuring the situation of for example total reflection.Wherein, the material of this textured metal layer 12 is the metallic substance such as tin, zinc, indium or various tin alloy, various zinc alloy or various indium alloys, thus with low melting point metal with Film forming method and sputtering method, be formed on this substrate 10, to produce textured metal layer 12.In addition, alternative has buffer layer 18 between substrate 10 and the textured metal layer 12, and the material of this buffer layer 18 is nickel, chromium, various nickelalloy and various Chrome metal powder.Surface 121 average surface roughness (Ra) scope of this textured metal layer 12 is between 0.06 μ m to the 0.25 μ m, is preferably between 0.08 μ m to the 0.13 μ m.
Effect below by comparison example explanation textured metal layer.Such as Fig. 1 and shown in Figure 4,10 materials take glass as substrate, form textured metal layer 12 at these substrate 10 sputter one deck indiums (In), be color layer 14 at textured metal layer 12 sputter one deck silver (Ag) again, formed Coloured film is between wavelength 400nm to 800nm, and the average reflectance of visible light is 84.22%.
Example as a comparison, 10 materials take glass as substrate are color layer 14 sputter textured metal layer 12 not at these substrate 10 sputter one decks silver (Ag), and formed Coloured film is between wavelength 400nm to 800nm, and the average reflectance of visible light is 94.84%.Hence one can see that, and the average reflectance that forms the Coloured film visible light of textured metal layer 12 can be less than the Coloured film that does not form textured metal layer 12.So the present invention forms one deck textured metal layer 12 in the Coloured film structure, can absorb light and reduce reflectivity, and avoid occuring the situation of total reflection.
Such as Fig. 1 and shown in Figure 2, color layer 14 is formed on the textured metal layer 12, and these color layer 14 usefulness are so that Coloured film manifests color.The composition of this color layer 14 is copper, aluminium, silver, nickel, chromium, zirconium, titanium, cupric oxide, aluminum oxide, nickel oxide, chromic oxide, zirconium white, titanium oxide, aluminium nitride, chromium nitride, zirconium nitride, titanium nitride or stainless steel.These coloured film composition materials are with Film forming method, and methods such as sputter, evaporation, electroless plating (CVD), electric pulp vapour deposition (PECVD) or coating is formed on the textured metal layer 12.Protective layer 16 is formed on the color layer 14, and protective layer 16 is to protect color layer 14 can not produce oxidation or chemical transformation phenomenon under atmosphere or other environment.The composition of protective layer 16 is Si oxide (SiO
x) or aluminum oxide (AlO
x), and x is positive rational number.These protective layer 16 formation methods are Film forming methods, such as methods such as sputter, evaporation, electroless plating (CVD), electric pulp vapour deposition (PECVD) or coating, form one deck Si oxide or aluminum oxide on the color layer 14.
The below introduces the example of several Coloured films.
Embodiment 1
Such as Fig. 1 and shown in Figure 2, textured metal layer 12 material are indium in the present embodiment Coloured film structure, and thickness is 350nm, the average surface roughness (R on these textured metal layer 12 surfaces 121
a) be 0.103 μ m.Color layer 14 materials on this textured metal layer 12 are aluminium, and thickness is that the color of 800nm so this color layer 14 is silvery white.Protective layer 16 materials on this color layer 14 are Si oxide (SiO
x), thickness is 85nm.In sum, the present embodiment Coloured film demonstrates silvery white color and luster.
Embodiment 2
Such as Fig. 1 and shown in Figure 2, textured metal layer 12 material are tin in the present embodiment Coloured film structure, and thickness is 350nm, and the average surface roughness (Ra) on the surface 121 of this textured metal layer 12 is 0.085 μ m.Color layer 14 materials on this textured metal layer 12 are silver, and thickness is 1200nm, so the color of this color layer 14 is white.Protective layer 16 materials on this color layer 14 are Si oxide, and thickness is 90nm.In sum, the present embodiment Coloured film demonstrates the pearl white color and luster.
The below introduces the making method of this Coloured film.
See also shown in Figure 3, step S1: a substrate 10 through cleaning is provided.These substrate 10 materials are the materials such as glass, metal, stainless steel or macromolecular material.
Step S2: carry out first and form step, namely adopt Film forming method at substrate 10, such as methods such as sputter, evaporation, electroless plating (CVD), electric pulp vapour deposition (PECVD) or coatings, form one deck textured metal layer 12.These textured metal layer 12 materials are low melting point metal, for example tin, zinc, indium, various tin alloy, various zinc alloy or various indium alloy.
Step S3: carry out second and form step, namely form color layer 14 at textured metal layer 12.The formation method of this color layer 14 is to adopt Film forming method, and methods such as sputter, evaporation, electroless plating (CVD), electric pulp vapour deposition (PECVD) or coating forms one deck coloured film at textured metal layer 12.The material of this color layer 14 is copper, aluminium, silver, nickel, chromium, zirconium, titanium, cupric oxide, aluminum oxide, nickel oxide, chromic oxide, zirconium white, titanium oxide, aluminium nitride, chromium nitride, zirconium nitride, titanium nitride or stainless steel.
Step S4: carry out the 3rd and form step, namely form a protective layer 16 at color layer 14.The formation method of this protective layer 16 adopts Film forming method, such as methods such as sputter, evaporation, electroless plating (CVD), electric pulp vapour deposition (PECVD) or coating, forms one deck Si oxide or aluminum oxide at color layer 14.
Wherein, in step S2, can on substrate 10, form first one deck buffer layer 18, form textured metal layer 12 at this buffer layer 18 again, to strengthen the binding ability of textured metal layer 12 and substrate 10.The formation method of buffer layer 18 adopts Film forming method, methods such as sputter, evaporation, electroless plating (CVD), electric pulp vapour deposition (PECVD) or coating forms one deck nickel, chromium, various nickelalloy and various Chrome metal powder at substrate 10.
The above only is illustrative, but not is restricted person.Anyly do not break away from spirit of the present invention and category, and to its effective modification or change of carrying out, all should be contained in the application's claim.
Claims (21)
1. a Coloured film is characterized in that, comprises:
Substrate;
The textured metal layer, described textured metal layer is positioned on the described substrate, and described textured metal layer surface has a uneven surface, in order to reduce reflectivity; And,
Color layer, described color layer are positioned at described textured metal layer surface, so that described Coloured film manifests color.
2. described Coloured film according to claim 1 is characterized in that also comprise protective layer, described protective layer is positioned on the described color layer, to protect described color layer.
3. described Coloured film according to claim 2 is characterized in that the thickness range of described protective layer is 10nm to 1000nm.
4. described Coloured film according to claim 3 is characterized in that the material of described protective layer is Si oxide or aluminum oxide.
5. described Coloured film according to claim 1 is characterized in that the material of described substrate is glass, metal, stainless steel or macromolecular material.
6. described Coloured film according to claim 1 is characterized in that the material of described textured metal layer is tin, zinc, indium, tin alloy, zinc alloy or indium alloy.
7. described Coloured film according to claim 6 is characterized in that the thickness range of described textured metal layer is 5nm to 1000nm.
8. described Coloured film according to claim 7 is characterized in that the mean roughness on described textured metal layer surface is between 0.06 μ m to the 0.25 μ m.
9. described Coloured film according to claim 1, it is characterized in that the material of described color layer is copper, aluminium, silver, nickel, chromium, zirconium, titanium, cupric oxide, aluminum oxide, nickel oxide, chromic oxide, zirconium white, titanium oxide, aluminium nitride, chromium nitride, zirconium nitride, titanium nitride or stainless steel.
10. described Coloured film according to claim 9 is characterized in that the thickness range of described color layer is 30nm to 5500nm.
11. each described Coloured film is characterized in that according to claim 1 ~ 10, has buffer layer between described substrate and the described textured metal layer, in order to described substrate and the described textured metal layer of combining closely.
12. described Coloured film is characterized in that according to claim 11, the material of described buffer layer is nickel, chromium, nickelalloy or Chrome metal powder.
13. the making method of a Coloured film is characterized in that, comprises the following step:
One substrate is provided;
Form a textured metal layer at described substrate, the surface of described textured metal layer has roughness, to reduce reflectivity; And,
Form a color layer on the surface of described textured metal layer, so that described Coloured film shows color.
14. the making method of described Coloured film is characterized in that according to claim 13, the material of described substrate is glass, metal, stainless steel or macromolecular material.
15. the making method of described Coloured film is characterized in that according to claim 13, described textured metal layer is to adopt sedimentation to be formed on the described substrate; And the material of described textured metal layer is tin, zinc, indium, tin alloy, zinc alloy or indium alloy.
16. the making method of described Coloured film is characterized in that according to claim 15, the roughness on described textured metal layer surface is 0.06 μ m to 0.25 μ m.
17. the making method of described Coloured film is characterized in that according to claim 16, the thickness range of described textured metal layer is 5nm to 1000nm.
18. the making method of described Coloured film is characterized in that according to claim 13, forms a protective layer at described color layer, to protect described color layer.
19. the making method of described Coloured film is characterized in that according to claim 18, described color layer is to adopt sedimentation to be formed at the surface of described textured metal layer; And the material of described color layer is copper, aluminium, silver, nickel, chromium, zirconium, titanium, cupric oxide, aluminum oxide, nickel oxide, chromic oxide, zirconium white, titanium oxide, aluminium nitride, chromium nitride, zirconium nitride, titanium nitride or stainless steel.
20. the making method of each described Coloured film is characterized in that according to claim 13 ~ 19, deposition one buffer layer between described substrate and the described textured metal layer is in order to described substrate and the described textured metal layer of combining closely.
21. the making method of described Coloured film is characterized in that according to claim 20, the material of described buffer layer is nickel, chromium, nickelalloy or Chrome metal powder.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW101112973 | 2012-04-12 | ||
| TW101112973A TWI448385B (en) | 2012-04-12 | 2012-04-12 | Colored membrance structure for the propose of improve the appearance of the product and manufacturing method of colored membrance for improving the appearance of the product |
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| Publication Number | Publication Date |
|---|---|
| CN103374724A true CN103374724A (en) | 2013-10-30 |
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| TW (1) | TWI448385B (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106498391A (en) * | 2016-09-29 | 2017-03-15 | 歌尔股份有限公司 | The multi-layer film structure of heat-tinting |
| CN107604323A (en) * | 2017-08-01 | 2018-01-19 | 赣州市德普特科技有限公司 | A kind of fuselage composite membrane and preparation method and application |
| CN107815657A (en) * | 2017-11-07 | 2018-03-20 | 福建工程学院 | A kind of alumina ceramic coating of Color tunable and preparation method thereof |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
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| TWI615528B (en) * | 2015-06-04 | 2018-02-21 | 福懋興業股份有限公司 | Multi-colored transparent fabric and method for manufacturing the same |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1257004A1 (en) * | 2001-05-11 | 2002-11-13 | Lucent Technologies Inc. | Metal article with multilayer coating |
| CN101332690A (en) * | 2008-04-16 | 2008-12-31 | 株式会社Hitec | Decorating material and decoration |
| JP2011056683A (en) * | 2009-09-07 | 2011-03-24 | Nissha Printing Co Ltd | Decorative sheet, method for manufacturing the same, and decorative article |
| EP2434031A1 (en) * | 2010-09-28 | 2012-03-28 | Haute Ecole Arc | White decorative covering, decorative item and method |
| CN202705477U (en) * | 2012-04-13 | 2013-01-30 | 钜永真空科技股份有限公司 | Colored film |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100269824B1 (en) * | 1992-06-29 | 2000-11-01 | Sumitomo Electric Industries | Process for producing composite material , and for producing composite material molding |
| KR20070111488A (en) * | 2005-02-17 | 2007-11-21 | 아사히 가라스 가부시키가이샤 | Conductive laminated body, electromagnetic wave shielding film for plasma display and protection plate for plasma display |
-
2012
- 2012-04-12 TW TW101112973A patent/TWI448385B/en not_active IP Right Cessation
- 2012-05-21 CN CN2012101575948A patent/CN103374724A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1257004A1 (en) * | 2001-05-11 | 2002-11-13 | Lucent Technologies Inc. | Metal article with multilayer coating |
| CN101332690A (en) * | 2008-04-16 | 2008-12-31 | 株式会社Hitec | Decorating material and decoration |
| JP2011056683A (en) * | 2009-09-07 | 2011-03-24 | Nissha Printing Co Ltd | Decorative sheet, method for manufacturing the same, and decorative article |
| EP2434031A1 (en) * | 2010-09-28 | 2012-03-28 | Haute Ecole Arc | White decorative covering, decorative item and method |
| CN202705477U (en) * | 2012-04-13 | 2013-01-30 | 钜永真空科技股份有限公司 | Colored film |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106498391A (en) * | 2016-09-29 | 2017-03-15 | 歌尔股份有限公司 | The multi-layer film structure of heat-tinting |
| CN106498391B (en) * | 2016-09-29 | 2019-04-30 | 歌尔股份有限公司 | The multi-layer film structure of heat-tinting |
| CN107604323A (en) * | 2017-08-01 | 2018-01-19 | 赣州市德普特科技有限公司 | A kind of fuselage composite membrane and preparation method and application |
| CN107604323B (en) * | 2017-08-01 | 2019-04-23 | 赣州市德普特科技有限公司 | A kind of fuselage composite membrane and the preparation method and application thereof |
| CN107815657A (en) * | 2017-11-07 | 2018-03-20 | 福建工程学院 | A kind of alumina ceramic coating of Color tunable and preparation method thereof |
Also Published As
| Publication number | Publication date |
|---|---|
| TWI448385B (en) | 2014-08-11 |
| TW201341188A (en) | 2013-10-16 |
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