CN103364374B - 用于检查石墨烯板的设备和方法 - Google Patents
用于检查石墨烯板的设备和方法 Download PDFInfo
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- CN103364374B CN103364374B CN201310120414.3A CN201310120414A CN103364374B CN 103364374 B CN103364374 B CN 103364374B CN 201310120414 A CN201310120414 A CN 201310120414A CN 103364374 B CN103364374 B CN 103364374B
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Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/59—Transmissivity
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
- G01B11/04—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness specially adapted for measuring length or width of objects while moving
- G01B11/046—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness specially adapted for measuring length or width of objects while moving for measuring width
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/14—Measuring arrangements characterised by the use of optical techniques for measuring distance or clearance between spaced objects or spaced apertures
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/9501—Semiconductor wafers
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/956—Inspecting patterns on the surface of objects
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/956—Inspecting patterns on the surface of objects
- G01N2021/95676—Masks, reticles, shadow masks
Abstract
Description
Claims (18)
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2012-0036800 | 2012-04-09 | ||
KR20120036800 | 2012-04-09 | ||
KR10-2012-0086942 | 2012-08-08 | ||
KR1020120086942A KR20130114552A (ko) | 2012-04-09 | 2012-08-08 | 그래핀 기판 검사 장치 및 그 방법 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN103364374A CN103364374A (zh) | 2013-10-23 |
CN103364374B true CN103364374B (zh) | 2017-08-08 |
Family
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201310120414.3A Active CN103364374B (zh) | 2012-04-09 | 2013-04-09 | 用于检查石墨烯板的设备和方法 |
Country Status (2)
Country | Link |
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US (1) | US9128050B2 (zh) |
CN (1) | CN103364374B (zh) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101475266B1 (ko) * | 2013-03-26 | 2014-12-23 | 한국과학기술원 | 고품질 그래핀층 형성을 위한 기판 및 방법 |
KR20150098406A (ko) | 2014-02-20 | 2015-08-28 | 한양대학교 산학협력단 | 그래핀의 전도성 검사 장치 및 검사 방법 |
JP6203668B2 (ja) * | 2014-03-17 | 2017-09-27 | 日本ピラー工業株式会社 | 平面アンテナ検査方法及び平面アンテナ |
CN111060018B (zh) * | 2014-04-28 | 2022-02-01 | 深圳迈瑞生物医疗电子股份有限公司 | 样本形态监测装置及方法 |
CN104634262B (zh) | 2015-03-02 | 2017-11-07 | 合肥鑫晟光电科技有限公司 | 基板检测装置和基板检测方法 |
CN105203559B (zh) * | 2015-10-22 | 2018-11-20 | 夏烬楚 | 一种多层石墨烯污点拍照检测装置 |
JP7226053B2 (ja) * | 2019-04-16 | 2023-02-21 | トヨタ紡織株式会社 | 検査装置 |
CN111380840B (zh) * | 2020-03-13 | 2023-07-14 | 西安理工大学 | 石墨烯材料激光装置及检测石墨烯光学特性的方法 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0777494A (ja) * | 1993-09-07 | 1995-03-20 | Nittetsu Mining Co Ltd | フィルタエレメントの検査方法及び検査装置 |
CN1296287A (zh) * | 1999-11-05 | 2001-05-23 | 日本电气株式会社 | 半导体器件检查装置 |
TW200938957A (en) * | 2008-03-05 | 2009-09-16 | Nanya Technology Corp | Feedback system and feedback method for controlling power ratio of light source |
CN101749598A (zh) * | 2008-12-04 | 2010-06-23 | 精工电子有限公司 | 照明装置及使用该照明装置的显示装置 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH11101614A (ja) | 1997-09-25 | 1999-04-13 | Citizen Watch Co Ltd | 光学スケールを用いた寸法測定装置 |
US6943898B2 (en) * | 2002-05-07 | 2005-09-13 | Applied Materials Israel, Ltd. | Apparatus and method for dual spot inspection of repetitive patterns |
US7003003B2 (en) * | 2003-07-21 | 2006-02-21 | Coherent, Inc. | Method and apparatus for providing multiple independently controllable beams from a single laser output beam |
JP2007065561A (ja) | 2005-09-02 | 2007-03-15 | Toppan Printing Co Ltd | 電気泳動表示装置用前面板の検査方法および検査装置 |
JP4279322B2 (ja) * | 2007-02-20 | 2009-06-17 | 三菱重工業株式会社 | 波長選択方法、膜厚計測方法、膜厚計測装置、及び薄膜シリコン系デバイスの製造システム |
JP2010175433A (ja) | 2009-01-30 | 2010-08-12 | Toppan Printing Co Ltd | インライン透明導電膜検査方法 |
US8370096B2 (en) * | 2010-11-30 | 2013-02-05 | Intermolecular, Inc. | Method and system of improved uniformity testing |
-
2012
- 2012-11-30 US US13/690,051 patent/US9128050B2/en active Active
-
2013
- 2013-04-09 CN CN201310120414.3A patent/CN103364374B/zh active Active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0777494A (ja) * | 1993-09-07 | 1995-03-20 | Nittetsu Mining Co Ltd | フィルタエレメントの検査方法及び検査装置 |
CN1296287A (zh) * | 1999-11-05 | 2001-05-23 | 日本电气株式会社 | 半导体器件检查装置 |
TW200938957A (en) * | 2008-03-05 | 2009-09-16 | Nanya Technology Corp | Feedback system and feedback method for controlling power ratio of light source |
CN101749598A (zh) * | 2008-12-04 | 2010-06-23 | 精工电子有限公司 | 照明装置及使用该照明装置的显示装置 |
Also Published As
Publication number | Publication date |
---|---|
US9128050B2 (en) | 2015-09-08 |
US20130265567A1 (en) | 2013-10-10 |
CN103364374A (zh) | 2013-10-23 |
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Address after: Gyeongnam Changwon City, South Korea Applicant after: SAMSUNG TECHWIN CO., LTD. Address before: Gyeongnam Changwon City, South Korea Applicant before: Samsung Techwin Co., Ltd. |
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Free format text: CORRECT: ADDRESS; FROM: Free format text: CORRECT: APPLICANT; FROM: SAMSUNG TAI KEWEI CO., LTD. TO: HANWHA TECHWIN CO., LTD. |
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Address after: Gyeongnam Changwon City, South Korea Patentee after: South Korea and China Aerospace Corporation Address before: Gyeongnam Changwon City, South Korea Patentee before: HANWHA TECHWIN CO., LTD. |
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Effective date of registration: 20210218 Address after: Gloucestershire Patentee after: Vosarun Ltd. Address before: Gyeongnam Changwon City, South Korea Patentee before: HANWHA AEROSPACE Co.,Ltd. |