CN103345129A - Method for measuring transmittance of full illumination system and components in photoetching machine - Google Patents
Method for measuring transmittance of full illumination system and components in photoetching machine Download PDFInfo
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- CN103345129A CN103345129A CN2013102796618A CN201310279661A CN103345129A CN 103345129 A CN103345129 A CN 103345129A CN 2013102796618 A CN2013102796618 A CN 2013102796618A CN 201310279661 A CN201310279661 A CN 201310279661A CN 103345129 A CN103345129 A CN 103345129A
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Abstract
The invention discloses a method for measuring the transmittance of a full illumination system and components in a photoetching machine. A measurement device comprises a light source, an energy attenuation device, a light path resolution element, a to-be-measured optical element, a light beam receiving and detecting unit, and a data processing and control system. The method is implemented through following steps: splitting the light beam of an excimer laser light source into a test light path and a reference light path by use of a spectroscope; the voltage data output by photoelectric detectors of multiple groups of test light paths and reference light paths output are recorded by an oscilloscope; two adjacent measurement results are subjected to data processing respectively; finally the transmittance of the to-be-measured optical element is obtained by the method of summing and averaging the data of the whole group. The method for measuring the transmittance of the full illumination system and components in a photoetching machine, provided by the invention, has high measurement precision and measurement versatility.
Description
Technical field
The present invention relates to element testing field in the litho machine, relate in particular to illuminator transmitance survey method in the litho machine.
Background technology
The illuminator of litho machine is one of important component part of exposure system of photo-etching machine, its functional module is many, complex structure, wherein, the transmitance of photo-etching machine illumination system and each parts thereof is to the energy adjustment important influence in the exposure process, and the energy size of plane of exposure is directly connected to the quality of photoetching process, the size of its transmitance is directly connected to the exposure energy on the chip, therefore, the transmitance of accurately measuring photo-etching machine illumination system and each parts thereof has great significance for the exposure energy control of litho machine.
In the checking photoetching in the test process of optical element performance, usually adopt excimer laser as light source, but each UV laser pulses that excimer laser sends all exist with expect energy differ ± 15% even more energy drift, and, the energy meter at substrate place changes requirement control ± 0.1% or lower, at present, less for ultraviolet photolithographic system transmitance flow measurement measuring method report, in existing transmissivity of optical system measurement scheme, traditional device for testing optical transmittance adopts single pass method, this also is the method that most of transmissivity of optical system tests are adopted, test process is divided into empty the survey and actual measurement, but be subject to the influence of environment and light source fluctuation in this course, make measuring result error bigger; The Dong of Changchun Polytechnics in 2006 rises along waiting people to propose optical system detection method based on cross-correlation technique, adopt the structure of double light path, used parallel light tube, spectroscope, chopper disk, lock-in amplifier, integrating sphere, devices such as silicon photocell, as shown in Figure 1, its principle is: chopper disk is modulated the tested light signal that parallel light tube sends, and export one tunnel reference signal, lock-in amplifier is done computing cross-correlation with the reference signal of the response modulating frequency that light signal and the signal generator of reference beam and test beams are exported, and removes noise and undesired signal, extracts the test beams of corresponding modulating frequency and the useful signal of reference beam and carries out calculation process again.Test is divided into empty the survey and actual measurement, and the expression formula that obtains transmitance at last is:
The splitting ratio of demarcating when wherein R is empty survey the, V1 be reference path emergent light flux corresponding voltage value during for actual measurement, and V2 is optical system for testing emergent light flux corresponding voltage value during for actual measurement.
But this method need be carried out modulation and demodulation to light signal, make system architecture comparatively complicated, and under the situation of quasi-molecule laser source as system source, the laser beam that sends is originally as high-frequency pulsed light beam, the undesired signal generator, family devices such as lock-in amplifier carry out modulation and demodulation to laser beam, so in this case, adopt the method removal The noise of coherent detection to become infeasible.
The illuminator of litho machine is mainly by beam-expanding collimation system, light beam systems stabilisation, variable attenuator, diffraction optical element DOE, zoom light group, axicon lens group, double fly eye lens array, compound eye condenser group, compositions such as coupling objective lens.Wherein, the caliber size according to incident beam angle of divergence difference and outgoing beam can be divided into testing element two classes: the first kind: beam-expanding collimation system, light beam systems stabilisation, axicon lens light group, diffraction element DOE; Bore and the angle of divergence of this class optical element outgoing beam are all very little, behind the available condenser convergent beam, are directly received by detector.Second class: zoom light group, compound eye condenser group, the coupling objective lens, double fly eye lens array, the illumination total system, the outgoing beam bore of this class optical element is bigger, and the numerical aperture NA of outgoing beam is also bigger, can not directly carry out beam dump with condenser.The proving installation of optical module is primarily aimed at first kind optical element and tests in the litho machine of the present invention, remove the influence of spectroscope splitting ratio, inhomogeneity difference and detector self internal noise as two light beam receiving element output beams of receiving beam have also produced influence to measurement result, under the situation that the bigger situation of energy of light source fluctuation ratio and measuring accuracy are had relatively high expectations, this influence be can not ignore.The present invention adopts the metering system of double light path to eliminate laser beam because the undulatory property that energy jitter brings, the method that adopts repeatedly sampling to be averaging simultaneously reduces measuring error, and in the control system of test, added synchronizing circuit and make the photodetector of accepting exposure signal be able to synchronous working, improved measuring accuracy.Measurement mechanism structure of the present invention is compact, and succinct, test macro is easy operating also.
Summary of the invention
Technology of the present invention is dealt with problems: overcome the deficiencies in the prior art, the measuring method of illumination total system and each assembly transmitance can be applicable to the deep ultraviolet wave band in a kind of litho machine, realizes high precision, and multi-functional detection can reduce the detection cost thus greatly.
Technical solution of the present invention: the measurement mechanism of illumination total system and each assembly transmitance in a kind of litho machine, comprise: adjustable quasi-molecule laser source 1, energy attenuation device 2, spectroscope 3, optical element 4, the first condenser groups 51 to be measured and the second light microscopic group 52, first optical filter 61 and second optical filter 62, the first light beam detection unit 71 and the second photodetection unit 72, synchronization control circuit 8, oscillograph 9 and computing machine 10; Wherein, the first condenser group 51 and the first condenser group 52, first optical filter 61 and second optical filter 62 constitute the light beam receiving element, first photodetector 71 and second photodetector 72 constitute the light beam detection unit, synchronization control circuit 8, oscillograph 9 and computing machine 10 composition data PIAPACSs; Adjustable quasi-molecule laser source 1 sends Gaussian beam to energy attenuation device 2, light beam incides on the spectroscope 3 through behind the attenuating device 2, be divided into two light beams through spectroscope 3, enter respectively in optical system for testing and the reference path, the light signal of optical system for testing enters first photodetector 71 behind the first condenser group 51 and first optical filter 61, produce the electric signal that the optical system for testing exposure is directly proportional; The light signal of reference path enters second photodetector 72 behind the second condenser group 52 and second optical filter 62, produce the electric signal that is directly proportional with the reference path exposure; This two-way light beam detection unit receives respectively and is stored in the oscillograph 9, and oscillograph 9 shows and the each transmitance data of measuring of record, will handle in its importing computing machine 10 of measurement data at last.Wherein, after quasi-molecule laser source 1 is started working, send trigger pulse to synchronization control circuit 8, synchronization control circuit 8 sends instruction to the first light beam detection unit 71 and the second light beam detection unit 72 after receiving trigger pip, makes above two light beam detection unit begin synchronous working; The relative mechanical motion of computing machine 10 controls optical element to be measured 4 inside.
Wherein tell in the measurement mechanism, LASER Light Source is quasi-molecule laser source, and sending and measuring light wavelength is 193nm.
Wherein tell in the measurement mechanism, energy attenuation device is the adjustable optical variable attenuator of transmitance scope, and its transmitance scope is 8%-90%.
Wherein tell in the measurement mechanism, the first light beam detection unit 71 and the second photodetection unit 72 are for ultraviolet single-point photodetector or ultraviolet light photo diode or have the visible-light detector composition that ultraviolet light is converted into the visible light device.
The measuring method of illumination total system and each assembly transmitance in a kind of litho machine, step is as follows:
Step 1: quasi-molecule laser source 1 produces illuminating bundle, through energy attenuation device 2, by regulating the rotational angle of attenuator and compensating plate in the variable attenuator, makes the energy attenuation of outgoing beam.
Step 2: spectroscope 3 is divided into two incident beam and is optical system for testing and reference path, and the first via light of its reflection is reference path, by shining on the first photodetection unit 71 behind the first condenser group 51 and first optical filter 61; The second road light of spectroscope transmission, be optical system for testing, light beam is by optical element 4 to be measured, shine on the second photodetection unit 72 behind the second condenser group 52 and the second light microscopic group 52 and second optical filter 62, optical system for alignment begins to measure, with the photodetector output voltage data of n measurement back optical system for testing of oscillograph 9 records and reference path, n〉200, establish it and be respectively:
Reference path: V
1, V
2, V
3... .V
n
Optical system for testing: V
1', V
2', V
3' ... .V
n';
Wherein, the gap is 0.2 second between these n group data;
Step 3: according to the two-way voltage signal after n the measurement in the step 2 that records in the oscillograph 9, use computing machine 10 to carry out data and handle, solve the transmitance of optical module 4 to be measured.
If the photodetector output voltage data of optical system for testing and reference path are respectively V when measuring for the k time
kAnd V
k', then have:
V
k＝αω
kT
51T
61x+ΔV
k (1-8)
V
k′＝(1-α)ω
kT
52T
62T
Akx+ΔV
k′ (1-9)
Wherein, ω
kThrough after the energy attenuation device 2, spectroscope 3 is laser beam energy before when being the k time measurement, and α and (1-α) are respectively spectroscope to the splitting ratio of optical system for testing and reference path, T
51, T
52Be respectively the transmitance of the first condenser group 51 and the second condenser group 52, T
61, T
62Be respectively the transmitance of first optical filter 61 and second optical filter 62, T
AkBe the transmitance of optical element 4 to be measured, x is that photodetector is operated in the efficient that in the linear zone light intensity is converted to voltage.Wherein, α, T
51, T
52, T
61, T
62Be known quantity.Δ V
kWith Δ V
k' be respectively in measuring for the k time two photodetectors because the voltage error value of the influence output of internal noise.
The photodetector output voltage data of optical system for testing and reference path are respectively V when measuring for k+1 time
K+1And V
K+1', then have:
V
k+1＝αω
k+1T
51T
61x+ΔV
k+1 (1-10)
V
k+1′＝(1-α)ω
k+1T
51T
61T
Akx+ΔV
k+1′ (1-11)
Wherein, ω
K+1Through after the energy attenuation device 2, spectroscope 3 is laser beam energy before, Δ V at this moment
K+1With Δ V
K+1' be respectively in measuring for the k+1 time two photodetectors because the voltage error value of the influence output of internal noise.
Visual Δ V in measuring process
k≈ Δ V
K+1, Δ V
k' ≈ Δ V
K+1', in conjunction with above formula, draw the transmitance T of first kind the measured optical unit
AFor:
Wherein, T
ABe the transmitance through the optical element to be measured (4) that draws after twice measurement, V
kAnd V
k', V
K+1And V
K+1' be respectively the photodetector output voltage data of establishing the k time and the k+1 time optical system for testing and reference path when measuring.
With in the step 3 the data of surveying substitution formula (1-5) in twos, the results added that obtains averaged obtains the transmitance of optical element 4 to be measured:
Wherein,
Transmitance for optical element 4 to be measured after measuring through n time.
In the wherein said step 2, the photodetection unit of optical system for testing and reference path requires synchronous working.
The present invention makes it compared with prior art owing to adopted above-mentioned technical scheme, has following advantage and good effect:
(1) high precision, owing to adopted the method for testing of double light path in the present invention's test, eliminated the energy hunting of laser, therefore guaranteed the work synchronism of ultraviolet detector, reduced measuring error, simultaneously also applicable to the high-acruracy survey under the bright field situation.
(2) multi-functional, detection system not only can be measured the illuminator in the etching system and each several part assembly according to the present invention, can also measure other optical elements in the ultraviolet photolithographic system.
Description of drawings
The optical system detection system based on cross-correlation technique of Fig. 1 for proposing in the prior art;
Fig. 2 is energy attenuation device synoptic diagram of the present invention;
Fig. 3 is the optical element transmission measurement apparatus structure synoptic diagram to be measured according to the embodiment of the invention.
Embodiment
The present invention will be further described below in conjunction with drawings and Examples.
Fig. 2 is the energy attenuation device structural representation, energy attenuation device among the present invention is made up of optical variable attenuator, when powering up to it, the attenuator 21 of variable attenuator and compensating plate 22 are with rotating, make incident beam and attenuator be different angles, outgoing beam can pass through different energy attenuatioies.
Fig. 3 is that each optical module transmitance measurement mechanism structural representation of illuminator of the present invention is by adjustable quasi-molecule laser source 1, energy attenuation device 2, spectroscope 3, optical element 4 to be measured, the first condenser group 51 and the second condenser group, 52, the first optical filters 61 and second optical filter, 62, the first light beam detection unit 71 and the second light beam detection unit 72, synchronization control circuit 8, oscillograph 9 and computing machine 10 are formed.Adjustable quasi-molecule laser source 1, energy attenuation device 2, spectroscope 3, the center of optical element 4 to be measured is on same optical axis, spectroscope 3 and optical axis are into about 45 ° of angles, the first condenser group 51 and the second condenser group 52, the center of the first light beam detection unit 71 and the second light beam detection unit 72 is aimed at the center of first optical filter 61 and second optical filter 62 respectively, synchronization control circuit 8 is connected with the second light beam detection unit 72 with the first light beam detection unit 71 with adjustable quasi-molecule laser source 1, the first light beam detection unit 71 is connected with oscillograph 9 with the second light beam detection unit 72, and oscillograph 9 is connected with computing machine 10.Wherein, the first condenser group 51 and the second condenser group 52, first optical filter 61 and second optical filter 62 constitute the light beam receiving element, first photodetector, 71 devices and second photodetector 72 constitute the light beam detection unit, synchronization control circuit 8, oscillograph 9 and computing machine 10 composition data PIAPACSs.Adjustable quasi-molecule laser source 1 sends Gaussian beam to energy attenuation device 2, light beam incides on the spectroscope 3 through behind the attenuating device 2, be divided into two light beams through spectroscope 3, enter respectively in optical system for testing and the reference path, the light signal of optical system for testing enters in first photodetector 71 behind the first condenser group 51 and first optical filter 61, produces the electric signal that the optical system for testing exposure is directly proportional; The light signal of reference path enters in first photodetector 72 behind the second condenser group 52 and second optical filter 62, produce the electric signal that is directly proportional with the reference path exposure, the voltage signal of two-way light beam detection unit output is stored in the oscillograph 9, oscillograph 9 shows and the each two-way voltage signal data of measuring of record, will handle in its importing computing machine 10 of measurement data at last; Wherein, after adjustable quasi-molecule laser source 1 is started working, send trigger pulse to synchronization control circuit 8, synchronization control circuit 9 sends instruction to first photodetector 71 and second photodetector 72 after receiving trigger pip, makes above two photodetectors begin synchronous working; The relative mechanical motion of computing machine 10 controls optical element to be measured 4 inside.
Measuring method concrete steps of the present invention are as follows, comprising:
Step 1: because adjustable quasi-molecule laser source 1 output pulse peak power is bigger, the deep ultraviolet laser of outgoing must be decayed through energy attenuation device 2, just can make the light beam that shines on the detector be no more than its energy threshold, energy attenuation device of the present invention is optical variable attenuator, and the anglec of rotation of adjustable variable attenuator makes and decays by its beam energy in test process.
Step 2: spectroscope 3 is divided into two incident beam and is optical system for testing and reference path, wherein spectroscope 3 is divided into two incident beam and is optical system for testing and reference path, the first via light of its reflection, be reference path, by shining on the photodetector 71 behind the first condenser group 51 and first optical filter 61; The second road light of spectroscope transmission is optical system for testing, and light beam passes through to shine on the photodetector 72 behind optical element 4, the second condenser groups 52 to be measured and second optical filter 62.The light beam receiving element is made up of the first condenser group 51 and the second condenser group 52, first optical filter 61 and second optical filter 62, the optical system for testing that the condenser group will be divided into two by spectroscope and the light beam of reference path are converged to the hot spot less than light beam detection unit receiving area, and it shines on the light beam detection unit after by first optical filter 61 and second optical filter 62.Two-way light beam detection unit connects storage oscilloscope 9 respectively, and storage oscilloscope 9 shows and the each transmitance data of measuring of record, will handle in its importing data handling system of measurement data at last.
With the photodetector output voltage data of n measurement back optical system for testing of oscillograph 9 records and reference path, n〉200, establish it and be respectively:
Reference path: V
1, V
2, V
3... .V
n
Optical system for testing: V
1', V
2', V
3' ... .V
n';
Wherein, the gap is 0.2 second between these n group data;
Because the transmitance value of test gained optical element to be measured is subjected to factor affecting such as photodetection unit internal noise, the noise thereby the data handling procedure shown in 3 of taking steps is made a return journey in the power-off signal.
Step 3: according to the two-way voltage signal after n the measurement in the step 2 that records in the oscillograph (9), use computing machine (10) to carry out data and handle, solve the transmitance of optical module to be measured (4).
If the photodetector output voltage data of optical system for testing and reference path are respectively V when measuring for the k time
kAnd V
k', then have:
V
k＝αω
kT
51T
61x+ΔV
k (1-14)
V
k′＝(1-α)ω
kT
52T
62T
Akx+ΔV
k′ (1-15)
Wherein, ω
kThrough after the energy attenuation device 2, spectroscope 3 is laser beam energy before when being the k time measurement, and α and (1-α) are respectively spectroscope to the splitting ratio of optical system for testing and reference path, T
51, T
52Be respectively the transmitance of the first condenser group 51 and the second condenser group 52, T
61, T
62Be respectively the transmitance of first optical filter 61 and second optical filter 62, T
AkBe the transmitance of optical element 4 to be measured, x is that photodetector is operated in the efficient that in the linear zone light intensity is converted to voltage.Wherein, α, T
51, T
52, T
61, T
62Be known quantity.Δ V
kWith Δ V
k' be respectively in measuring for the k time two photodetectors because the voltage error value of the influence output of internal noise.
The photodetector output voltage data of optical system for testing and reference path are respectively V when measuring for k+1 time
K+1And V
K+1', then have:
V
k+1＝αω
k+1T
51T
61x+ΔV
k+1 (1-16)
V
k+1′＝(1-α)ω
k+1T
51T
61T
Akx+ΔV
k+1′ (1-17)
Wherein, ω
K+1Through after the energy attenuation device 2, spectroscope 3 is laser beam energy before, Δ V at this moment
K+1With Δ V
K+1' be respectively in measuring for the k+1 time two photodetectors because the voltage error value of the influence output of internal noise.
Because in measuring process, the energy of LASER Light Source output is certain but have ± 10% energy jitter, learn through measuring, this ± 10% energy jitter to photodetector because the voltage error value influence of the influence of internal noise output is less, and measurement clearance is extremely short, then can be considered Δ V in measuring process
k≈ Δ V
K+1, Δ V
k' ≈ Δ V
K+1', in conjunction with above formula, draw the transmitance T of optical element to be measured
AFor:
Wherein, T
ABe the transmitance through the optical element to be measured 4 that draws after twice measurement, V
kAnd V
k', V
K+1And V
K+1' be respectively the photodetector output voltage data of establishing the k time and the k+1 time optical system for testing and reference path when measuring.With in the step 3 the data of surveying substitution formula (1-18) in twos, the results added that obtains averaged obtains the transmitance of optical element 4 to be measured:
Wherein,
Transmitance for optical element 4 to be measured after measuring through n time.
The non-elaborated part of the present invention belongs to techniques well known.
The above; only for part embodiment of the present invention, but protection scope of the present invention is not limited thereto, and any those skilled in the art are in the technical scope that the present invention discloses; the variation that can expect easily or replacement all should be encompassed within protection scope of the present invention.
Claims (2)
1. the measuring method of illumination total system and each assembly transmitance in the litho machine, it is characterized in that: described comprising: adjustable quasi-molecule laser source (1), energy attenuation device (2), spectroscope (3), optical element to be measured (4), the first condenser group (51) and the second condenser group (52), first optical filter (61) and second optical filter (62), the first light beam detection unit (71) and the second photodetection unit (72), synchronization control circuit (8), oscillograph (9) and computing machine (10), performing step is as follows:
Step 1: quasi-molecule laser source (1) produces illuminating bundle, through energy attenuation device (2), by regulating the rotational angle of attenuator and compensating plate in the variable attenuator, makes the energy attenuation of outgoing beam;
Step 2: spectroscope (3) is divided into two incident beam and is optical system for testing and reference path, and the first via light of its reflection is reference path, by shining on the photodetection unit (71) behind the first condenser group (51) and first optical filter (61); The second road light of spectroscope transmission is optical system for testing, and light beam shines on the photodetection unit (72) behind the second condenser group (52) and second optical filter (62) by optical element to be measured (4), and optical system for alignment begins to measure;
With the photodetector output voltage data of n measurement back optical system for testing of oscillograph (9) record and reference path, n〉200, establish it and be respectively:
Reference path: V
1, V
2, V
3... .V
n
Optical system for testing: V
1', V
2', V
3' ... .V
n';
Wherein, the gap is 0.2 second between these n group data;
Step 3: according to the two-way voltage signal after n the measurement in the step 2 that records in the oscillograph (9), use computing machine (10) to carry out data and handle, solve the transmitance of optical element to be measured (4);
If the photodetector output voltage data of optical system for testing and reference path are respectively V when measuring for the k time
kAnd V
k', then have:
V
k＝αω
kT
51T
61x+ΔV
k (1-1)
Wherein, ω
kThrough after the energy attenuation device (2), spectroscope (3) is laser beam energy before when being the k time measurement, and α and (1-α) are respectively spectroscope to the splitting ratio of optical system for testing and reference path, T
51, T
52Be respectively the transmitance of the first condenser group (51) and the second condenser group (52), T
61, T
62Be respectively the transmitance of first optical filter (61) and second optical filter (62), T
AkBe the transmitance of optical element to be measured (4), x is that photodetector is operated in the efficient that in the linear zone light intensity is converted to voltage; Wherein, α, T
51, T
52, T
61, T
62Be known quantity, Δ V
kWith Δ V
k' be respectively in measuring for the k time two photodetectors because the voltage error value of the influence output of internal noise;
The photodetector output voltage data of optical system for testing and reference path are respectively V when measuring for k+1 time
K+1And V
K+1', then have:
V
k+1＝αω
k+1T
51T
61x+ΔV
k+1 (1-3)
V
k+1′＝(1-α)ω
k+1T
51T
61T
Akx+ΔV
k+1′ (1-4)
Wherein, ω
K+1After process energy attenuation device this moment (2), spectroscope (3) is laser beam energy before, Δ V
K+1With Δ V
K+1' be respectively in measuring for the k+1 time two photodetectors because the voltage error value of the influence output of internal noise;
Visual Δ V in measuring process
k≈ Δ V
K+1, Δ V
k' ≈ Δ V
K+1', in conjunction with above formula, draw the transmitance T of optical element to be measured (4)
AFor:
Wherein, T
ABe the transmitance through the optical element to be measured (4) that draws after twice measurement, V
kAnd V
k', V
K+1And V
K+1' be respectively the photodetector output voltage data of establishing the k time and the k+1 time optical system for testing and reference path when measuring;
With in the step 3 the data of surveying substitution formula (1-5) in twos, the results added that obtains averaged obtains the transmitance of optical element to be measured (4):
Wherein,
Transmitance for optical element to be measured (4) after measuring through n time.
2. the measuring method of total system and each the assembly transmitance of throwing light in a kind of litho machine as claimed in claim 1 is characterized in that: in the described step 2, the photodetection unit of optical system for testing and reference path requires synchronous working.
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| CN106646310A (en) * | 2016-11-21 | 2017-05-10 | 国家电网公司 | Optical sensor reliability testing system and testing method |
| CN110031190A (en) * | 2019-04-25 | 2019-07-19 | 中国科学院光电技术研究所 | A kind of Transmissivity measurement accuracy scaling method |
| CN112147851A (en) * | 2019-06-28 | 2020-12-29 | 上海微电子装备（集团）股份有限公司 | Photoetching equipment and method for detecting pupil surface transmittance of photoetching equipment |
| CN112147852A (en) * | 2019-06-28 | 2020-12-29 | 上海微电子装备（集团）股份有限公司 | Method for detecting pupil surface transmittance distribution of photoetching equipment |
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