CN103345129B - Method for measuring transmittance of full illumination system and components in photoetching machine - Google Patents
Method for measuring transmittance of full illumination system and components in photoetching machine Download PDFInfo
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- CN103345129B CN103345129B CN201310279661.8A CN201310279661A CN103345129B CN 103345129 B CN103345129 B CN 103345129B CN 201310279661 A CN201310279661 A CN 201310279661A CN 103345129 B CN103345129 B CN 103345129B
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Abstract
The invention discloses a method for measuring the transmittance of a full illumination system and components in a photoetching machine. A measurement device comprises a light source, an energy attenuation device, a light path resolution element, a to-be-measured optical element, a light beam receiving and detecting unit, and a data processing and control system. The method is implemented through following steps: splitting the light beam of an excimer laser light source into a test light path and a reference light path by use of a spectroscope; the voltage data output by photoelectric detectors of multiple groups of test light paths and reference light paths output are recorded by an oscilloscope; two adjacent measurement results are subjected to data processing respectively; finally the transmittance of the to-be-measured optical element is obtained by the method of summing and averaging the data of the whole group. The method for measuring the transmittance of the full illumination system and components in a photoetching machine, provided by the invention, has high measurement precision and measurement versatility.
Description
Technical field
The present invention relates to element testing field in litho machine, particularly relate to illuminator transmitance survey method in litho machine.
Background technology
The illuminator of litho machine is one of important component part of exposure system of photo-etching machine, its functional module is many, complex structure, wherein, the transmitance of lithography machine illumination system and all parts thereof has important impact to the energy adjustment in exposure process, and the energy size of plane of exposure is directly connected to the quality of photoetching process, the size of its transmitance is directly connected to the exposure energy on chip, therefore, Accurate Measurement lithography machine illumination system and all parts thereof transmitance for litho machine exposure energy control have great significance.
In the test process verifying optical element performance in photoetching, usual employing excimer laser is as light source, but each UV laser pulses that excimer laser sends all also exists and expects that energy differs ± 15% even more energy jitter, and, the energy meter change requirement at substrate place controls ± 0.1% or lower, at present, less for ultraviolet lithographic system transmitance flow measurement measuring method report, in existing transmissivity of optical system measurement scheme, traditional device for testing optical transmittance adopts single pass method, this is also that most of transmissivity of optical system tests the method adopted, test process is divided into empty survey and actual measurement, but be subject to the impact of environment and light source fluctuation in this course, make measuring result error larger, Changchun University of Science and Technology Dong in 2006 rises along waiting people to propose optical system detection method based on cross-correlation technique, adopt the structure of double light path, employ parallel light tube, spectroscope, chopper disk, lock-in amplifier, integrating sphere, the devices such as silicon photocell, as shown in Figure 1, its principle is: the tested light signal that parallel light tube sends by chopper disk is modulated, and export a road reference signal, lock-in amplifier does computing cross-correlation with reference to the reference signal of the response modulating frequency that light signal and the signal generator of light beam and test beams exports, remove Noise and Interference signal, the useful signal of the test beams and reference beam that extract corresponding modulating frequency carries out calculation process again.Test is divided into empty survey and actual measurement, and the expression formula finally obtaining transmitance is:
The splitting ratio demarcated when wherein R is empty survey, the magnitude of voltage that when V1 is actual measurement, reference path exit luminous flux is corresponding, the magnitude of voltage that when V2 is actual measurement, optical system for testing exit luminous flux is corresponding.
But this method needs to carry out modulation and demodulation to light signal, make system architecture comparatively complicated, and when quasi-molecule laser source is as system source, the laser beam sent is originally as high-frequency pulsed light beam, undesired signal generator, the family devices such as lock-in amplifier carry out modulation and demodulation to laser beam, so in this case, the impact adopting the method for coherent detection to remove noise becomes infeasible.
The illuminator of litho machine primarily of beam-expanding collimation system, beamstability system, variable attenuator, diffraction optical element DOE, zoom light group, axicon lens group, double fly eye lens array, compound eye condenser group, composition such as coupling objective lens etc.Wherein, according to incident beam divergence is different and the caliber size of outgoing beam, testing element can be divided into two classes: the first kind: beam-expanding collimation system, beamstability system, axicon lens light group, diffraction element DOE; Bore and the angle of divergence of this kind of optical element outgoing beam are all very little, after available condenser convergent beam, are directly received by detector.Equations of The Second Kind: zoom light group, compound eye condenser group, coupling objective lens, double fly eye lens array, illumination total system, the outgoing beam bore of this kind of optical element is comparatively large, and the numerical aperture NA of outgoing beam is also comparatively large, directly can not carry out light beam collection with condenser.In litho machine of the present invention, the proving installation of optical module is tested mainly for first kind optical element, the impact of removing spectroscope splitting ratio, also impact is created on measurement result as the difference of the homogeneity of two beam reception unit output beams of receiving beam and detector therein noise, in the larger situation of energy of light source fluctuation ratio and measuring accuracy requires higher, this impact be can not ignore.The undulatory property that the present invention adopts the metering system of double light path elimination laser beam to bring due to energy jitter, the method simultaneously adopting multiple repairing weld to be averaging reduces measuring error, and add synchronizing circuit and make the photodetector accepting exposure signal be able to synchronous working in the control system of test, improve measuring accuracy.Measurement mechanism structure comparison of the present invention is compact, and succinctly, test macro is also easy to operation.
Summary of the invention
Technology of the present invention is dealt with problems: overcome the deficiencies in the prior art, and the measuring method of throw light in a kind of litho machine total system and each assembly transmitance, can be applicable to deep ultraviolet wave band, realize high precision, multi-functional detection, greatly can reduce testing cost thus.
Technical solution of the present invention: the measurement mechanism of throw light in a kind of litho machine total system and each assembly transmitance, comprise: adjustable quasi-molecule laser source 1, energy attenuation device 2, spectroscope 3, optical element 4, first condenser group 51 to be measured and the second light microscopic group 52, first optical filter 61 and the second optical filter 62, first light beam detection unit 71 and the second photoelectric detection unit 72, synchronization control circuit 8, oscillograph 9 and computing machine 10; Wherein, first condenser group 51 and the first condenser group 52, first optical filter 61 and the second optical filter 62 form beam reception unit, first photodetector 71 and the second photodetector 72 form light beam detection unit, synchronization control circuit 8, oscillograph 9 and computing machine 10 composition data PIAPACS; Adjustable quasi-molecule laser source 1 sends Gaussian beam to energy attenuation device 2, light beam incides on spectroscope 3 after attenuating device 2, two light beams is divided into through spectroscope 3, enter in optical system for testing and reference path respectively, the light signal of optical system for testing enters the first photodetector 71 after the first condenser group 51 and the first optical filter 61, produces the electric signal that optical system for testing exposure is directly proportional; The light signal of reference path enters the second photodetector 72 after second condenser lens group 52 and the second optical filter 62, produces the electric signal be directly proportional to reference path exposure; This two-way light beam detection unit receives respectively and is stored in oscillograph 9, and oscillograph 9 shows and records each transmitance data measured, and finally processes in its importing computing machine 10 of measurement data.Wherein, after quasi-molecule laser source 1 is started working, send trigger pulse to synchronization control circuit 8, synchronization control circuit 8 sends instruction to the first light beam detection unit 71 and the second light beam detection unit 72 after receiving trigger pip, make above two light beam detection unit start synchronous working; Computing machine 10 controls the relative mechanical motion of optical element 4 inside to be measured.
Wherein in told measurement mechanism, LASER Light Source is quasi-molecule laser source, and sending the wavelength measuring light is 193nm.
Wherein in told measurement mechanism, energy attenuation device is the adjustable optical variable attenuator of transmitance scope, and its transmitance scope is 8%-90%.
Wherein in told measurement mechanism, the first light beam detection unit 71 and the second photoelectric detection unit 72 are ultraviolet single-point photodetector or ultraviolet photodiode or form with visible-light detector ultraviolet light being converted into visible ray device.
A measuring method for total system and each assembly transmitance of throwing light in litho machine, step is as follows:
Step 1: quasi-molecule laser source 1 produces illuminating bundle, through energy attenuation device 2, by regulating the rotational angle of attenuator and compensating plate in variable attenuator, makes the energy attenuation of outgoing beam.
Step 2: incident beam is divided into two as optical system for testing and reference path by spectroscope 3, the first via light of its reflection, is reference path, by shining in the first photoelectric detection unit 71 after the first condenser group 51 and the first optical filter 61; Second road light of spectroscope transmission, be optical system for testing, light beam is by optical element 4 to be measured, shine in the second photoelectric detection unit 72 after second condenser lens group 52 and the second light microscopic group 52 and the second optical filter 62, optical system for alignment starts to measure, the photodetector output voltage data measuring rear optical system for testing and reference path for n time are recorded, n>200, if it is respectively with oscillograph 9:
Reference path: V
1, V
2, V
3... .V
n;
Optical system for testing: V
1', V
2', V
3' ... .V
n';
Wherein, between these n group data, gap is 0.2 second;
Step 3: according to the two-way voltage signal after n measurement in the step 2 recorded in oscillograph 9, uses computing machine 10 to carry out data processing, solves the transmitance of optical module 4 to be measured.
If the photodetector output voltage data of optical system for testing and reference path are respectively V when kth time is measured
kand V
k', then have:
V
k＝αω
kT
51T
61x+ΔV
k(1-8)
V
k′＝(1-α)ω
kT
52T
62T
Akx+ΔV
k′ (1-9)
Wherein, ω
kfor when kth time is measured after energy attenuation device 2, laser beam energy before spectroscope 3, α and (1-α) are respectively the splitting ratio of spectroscope to optical system for testing and reference path, T
51, T
52be respectively the transmitance of the first condenser group 51 and second condenser lens group 52, T
61, T
62be respectively the transmitance of the first optical filter 61 and the second optical filter 62, T
akfor the transmitance of optical element 4 to be measured, x is that photodetector is operated in the efficiency in linear zone, light intensity being converted to voltage.Wherein, α, T
51, T
52, T
61, T
62be known quantity.Δ V
kwith Δ V
k' be respectively kth time measure in the voltage error value that exports due to the impact of internal noise of two photodetectors.
When kth is measured for+1 time, the photodetector output voltage data of optical system for testing and reference path are respectively V
k+1and V
k+1', then have:
V
k+1＝αω
k+1T
51T
61x+ΔV
k+1(1-10)
V
k+1′＝(1-α)ω
k+1T
51T
61T
Akx+ΔV
k+1′ (1-11)
Wherein, ω
k+1for now after energy attenuation device 2, laser beam energy before spectroscope 3, Δ V
k+1with Δ V
k+1' be respectively kth+1 time measure in the voltage error value that exports due to the impact of internal noise of two photodetectors.
Visual Δ V in measuring process
k≈ Δ V
k+1, Δ V
k' ≈ Δ V
k+1', in conjunction with above formula, draw the transmitance T of first kind the measured optical unit
afor:
Wherein, T
afor the transmitance of optical element to be measured (4) drawn after twice measurement, V
kand V
k', V
k+1and V
k+1' be respectively the photodetector output voltage data of optical system for testing and reference path when establishing kth time and kth to measure for+1 time.
By in step 3 survey data and substitute into formula (1-5) between two, the results added obtained being averaged obtains the transmitance of optical element 4 to be measured:
Wherein,
for the transmitance of optical element 4 to be measured after n time is measured.
In wherein said step 2, the photoelectric detection unit of optical system for testing and reference path requires synchronous working.
The present invention, owing to have employed above-mentioned technical scheme, makes it compared with prior art, has following advantage and good effect:
(1) high precision, owing to have employed the method for testing of double light path in the present invention's test, eliminate the energy hunting of laser, therefore ensure that the work synchronism of ultraviolet detector, reduce measuring error, be also applicable to the high-acruracy survey in bright field situation simultaneously.
(2) multi-functional, not only can measure the illuminator in etching system and each several part assembly according to detection system of the present invention, can also measure other optical elements in ultraviolet lithographic system.
Accompanying drawing explanation
Fig. 1 is the optical system detection system based on cross-correlation technique proposed in prior art;
Fig. 2 is energy attenuation device schematic diagram of the present invention;
Fig. 3 is the transmittance of optical element proving installation structural representation to be measured according to the embodiment of the present invention.
Embodiment
Below in conjunction with drawings and Examples, the present invention will be further described.
Fig. 2 is energy attenuation device structural representation, energy attenuation device in the present invention is made up of optical variable attenuator, when powering up to it, the attenuator 21 of variable attenuator and compensating plate 22 are with rotating, make incident beam and attenuator be different angles, outgoing beam can be passed through different energy attenuatioies.
Fig. 3 is that illuminator of the present invention each optical module Transmissivity measurement apparatus structure schematic diagram is by adjustable quasi-molecule laser source 1, energy attenuation device 2, spectroscope 3, optical element 4 to be measured, first condenser group 51 and second condenser lens group 52, first optical filter 61 and the second optical filter 62, first light beam detection unit 71 and the second light beam detection unit 72, synchronization control circuit 8, oscillograph 9 and computing machine 10 form.Adjustable quasi-molecule laser source 1, energy attenuation device 2, spectroscope 3, the center of optical element 4 to be measured is on same optical axis, spectroscope 3 and optical axis are into about 45 ° of angles, first condenser group 51 and second condenser lens group 52, the center of the first light beam detection unit 71 and the second light beam detection unit 72 is aimed at the center of the first optical filter 61 and the second optical filter 62 respectively, synchronization control circuit 8 and adjustable quasi-molecule laser source 1 and the first light beam detection unit 71 and the second light beam detection unit 72 are connected, first light beam detection unit 71 is connected with oscillograph 9 with the second light beam detection unit 72, oscillograph 9 is connected with computing machine 10.Wherein, first condenser group 51 and second condenser lens group 52, first optical filter 61 and the second optical filter 62 form beam reception unit, first photodetector 71 device and the second photodetector 72 form light beam detection unit, synchronization control circuit 8, oscillograph 9 and computing machine 10 composition data PIAPACS.Adjustable quasi-molecule laser source 1 sends Gaussian beam to energy attenuation device 2, light beam incides on spectroscope 3 after attenuating device 2, two light beams is divided into through spectroscope 3, enter in optical system for testing and reference path respectively, the light signal of optical system for testing enters in the first photodetector 71 after the first condenser group 51 and the first optical filter 61, produces the electric signal that optical system for testing exposure is directly proportional; The light signal of reference path enters in the first photodetector 72 after second condenser lens group 52 and the second optical filter 62, produce the electric signal be directly proportional to reference path exposure, the voltage signal that two-way light beam detection unit exports is stored in oscillograph 9, oscillograph 9 shows and records each two-way voltage signal data measured, and finally processes in its importing computing machine 10 of measurement data; Wherein, after adjustable quasi-molecule laser source 1 is started working, send trigger pulse to synchronization control circuit 8, synchronization control circuit 9 sends instruction to the first photodetector 71 and the second photodetector 72 after receiving trigger pip, make above two photodetectors start synchronous working; Computing machine 10 controls the relative mechanical motion of optical element 4 inside to be measured.
Measuring method concrete steps of the present invention are as follows, comprising:
Step one: to export pulse peak power larger due to adjustable quasi-molecule laser source 1, the deep ultraviolet laser of outgoing has to pass through energy attenuation device 2 and decays, the light beam shone on detector just can be made to be no more than its energy threshold, energy attenuation device of the present invention is optical variable attenuator, and in test process, the anglec of rotation of adjustable variable attenuator makes the beam energy decay by it.
Step 2: incident beam is divided into two as optical system for testing and reference path by spectroscope 3, wherein incident beam is divided into two as optical system for testing and reference path by spectroscope 3, the first via light of its reflection, be reference path, by shining on photodetector 71 after the first condenser group 51 and the first optical filter 61; Second road light of spectroscope transmission, is optical system for testing, and light beam, by optical element 4 to be measured, shines on photodetector 72 after second condenser lens group 52 and the second optical filter 62.Beam reception unit is made up of the first condenser group 51 and second condenser lens group 52, first optical filter 61 and the second optical filter 62, the light beam of the optical system for testing be divided into two by spectroscope and reference path is converged to the hot spot being less than light beam detection unit receiving area by condenser group, and it is by shining on light beam detection unit after the first optical filter 61 and the second optical filter 62.Two-way light beam detection unit connects storage oscilloscope 9 respectively, and storage oscilloscope 9 shows and records each transmitance data measured, and finally processes in its importing data handling system of measurement data.
The photodetector output voltage data measuring rear optical system for testing and reference path for n time are recorded, n>200, if it is respectively with oscillograph 9:
Reference path: V
1, V
2, V
3... .V
n;
Optical system for testing: V
1', V
2', V
3' ... .V
n';
Wherein, between these n group data, gap is 0.2 second;
Because the transmitance value of test gained optical element to be measured affects by factors such as photoelectric detection unit internal noises, thus the noise that the data handling procedure shown in 3 of taking steps is made a return journey in power-off signal.
Step 3: according to the two-way voltage signal after n measurement in the step 2 recorded in oscillograph (9), uses computing machine (10) to carry out data processing, solves the transmitance of optical module to be measured (4).
If the photodetector output voltage data of optical system for testing and reference path are respectively V when kth time is measured
kand V
k', then have:
V
k＝αω
kT
51T
61x+ΔV
k(1-14)
V
k′＝(1-α)ω
kT
52T
62T
Akx+ΔV
k′ (1-15)
Wherein, ω
kfor when kth time is measured after energy attenuation device 2, laser beam energy before spectroscope 3, α and (1-α) are respectively the splitting ratio of spectroscope to optical system for testing and reference path, T
51, T
52be respectively the transmitance of the first condenser group 51 and second condenser lens group 52, T
61, T
62be respectively the transmitance of the first optical filter 61 and the second optical filter 62, T
akfor the transmitance of optical element 4 to be measured, x is that photodetector is operated in the efficiency in linear zone, light intensity being converted to voltage.Wherein, α, T
51, T
52, T
61, T
62be known quantity.Δ V
kwith Δ V
k' be respectively kth time measure in the voltage error value that exports due to the impact of internal noise of two photodetectors.
When kth is measured for+1 time, the photodetector output voltage data of optical system for testing and reference path are respectively V
k+1and V
k+1', then have:
V
k+1＝αω
k+1T
51T
61x+ΔV
k+1(1-16)
V
k+1′＝(1-α)ω
k+1T
51T
61T
Akx+ΔV
k+1′ (1-17)
Wherein, ω
k+1for now after energy attenuation device 2, laser beam energy before spectroscope 3, Δ V
k+1with Δ V
k+1' be respectively kth+1 time measure in the voltage error value that exports due to the impact of internal noise of two photodetectors.
Due in measuring process, the energy that LASER Light Source exports certain but exist ± 10% energy jitter, learn through measurement, this ± voltage error value impact that the energy jitter of 10% exports due to the impact of internal noise photodetector is less, and measurement clearance is extremely short, then in measuring process, can be considered Δ V
k≈ Δ V
k+1, Δ V
k' ≈ Δ V
k+1', in conjunction with above formula, draw the transmitance T of optical element to be measured
afor:
Wherein, T
afor the transmitance of optical element to be measured 4 drawn after twice measurement, V
kand V
k', V
k+1and V
k+1' be respectively the photodetector output voltage data of optical system for testing and reference path when establishing kth time and kth to measure for+1 time.By in step 3 survey data and substitute into formula (1-18) between two, the results added obtained being averaged obtains the transmitance of optical element 4 to be measured:
Wherein,
for the transmitance of optical element 4 to be measured after n time is measured.
Non-elaborated part of the present invention belongs to techniques well known.
The above; be only part embodiment of the present invention, but protection scope of the present invention is not limited thereto, any those skilled in the art are in the technical scope that the present invention discloses; the change that can expect easily or replacement, all should be encompassed within protection scope of the present invention.
Claims (2)
1. the measuring method of total system and each assembly transmitance of throwing light in a litho machine, it is characterized in that: described in comprise: adjustable quasi-molecule laser source (1), energy attenuation device (2), spectroscope (3), optical element to be measured (4), first condenser group (51) and second condenser lens group (52), first optical filter (61) and the second optical filter (62), first light beam detection unit (71) and the second photoelectric detection unit (72), synchronization control circuit (8), oscillograph (9) and computing machine (10), performing step is as follows:
Step 1: quasi-molecule laser source (1) produces illuminating bundle, through energy attenuation device (2), by regulating the rotational angle of attenuator and compensating plate in variable attenuator, makes the energy attenuation of outgoing beam;
Step 2: incident beam is divided into two as optical system for testing and reference path by spectroscope (3), the first via light of its reflection, be reference path, by shining in photoelectric detection unit (71) after the first condenser group (51) and the first optical filter (61); Second road light of spectroscope transmission, be optical system for testing, light beam, by optical element to be measured (4), shines in photoelectric detection unit (72) after second condenser lens group (52) and the second optical filter (62), and optical system for alignment starts to measure;
The photodetector output voltage data of optical system for testing and reference path after measuring for n time with oscillograph (9) record, n>200, if it is respectively:
Reference path: V
1, V
2, V
3... .V
n;
Optical system for testing: V
1', V
2', V
3' ... .V
n';
Wherein, between these n group data, gap is 0.2 second;
Step 3: according to the two-way voltage signal after n measurement in the step 2 recorded in oscillograph (9), uses computing machine (10) to carry out data processing, solves the transmitance of optical element to be measured (4);
If the photodetector output voltage data of reference path and optical system for testing are respectively V when kth time is measured
kand V
k', then have:
V
k＝αω
kT
51T
61x+ΔV
k(1-1)
V
k′＝(1-α)ω
kT
52T
62T
Akx+ΔV
k′ (1-2)
Wherein, ω
kfor when kth time is measured after energy attenuation device (2), laser beam energy before spectroscope (3), α and (1-α) are respectively the splitting ratio of spectroscope to reference path and optical system for testing, T
51, T
52be respectively the transmitance of the first condenser group (51) and second condenser lens group (52), T
61, T
62be respectively the transmitance of the first optical filter (61) and the second optical filter (62), T
akfor the transmitance of optical element to be measured (4), x is that photodetector is operated in the efficiency in linear zone, light intensity being converted to voltage; Wherein, α, T
51, T
52, T
61, T
62be known quantity, Δ V
kwith Δ V
k' be respectively kth time measure in the voltage error value that exports due to the impact of internal noise of two photodetectors;
When kth is measured for+1 time, the photodetector output voltage data of reference path and optical system for testing are respectively V
k+1and V
k+1', then have:
V
k+1＝αω
k+1T
51T
61x+ΔV
k+1(1-3)
V
k+1′＝(1-α)ω
k+1T
52T
62T
Akx+ΔV
k+1′ (1-4)
Wherein, ω
k+1for now after energy attenuation device (2), laser beam energy before spectroscope (3), Δ V
k+1with Δ V
k+1' be respectively kth+1 time measure in the voltage error value that exports due to the impact of internal noise of two photodetectors;
Visual Δ V in measuring process
k≈ Δ V
k+1, Δ V
k' ≈ Δ V
k+1', in conjunction with above formula, draw the transmitance T of optical element to be measured (4)
afor:
Wherein, T
afor the transmitance of optical element to be measured (4) drawn after twice measurement, V
kand V
k', V
k+1and V
k+1' be respectively the photodetector output voltage data of reference path and optical system for testing when establishing kth time and kth to measure for+1 time;
By in step 3 survey data and substitute into formula (1-5) between two, the results added obtained being averaged obtains the transmitance of optical element to be measured (4):
Wherein,
for the transmitance of optical element to be measured (4) after n time is measured.
2. the measuring method of total system and each assembly transmitance of throwing light in a kind of litho machine as claimed in claim 1, is characterized in that: in described step 2, and the photoelectric detection unit of optical system for testing and reference path requires synchronous working.
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| CN110031190A (en) * | 2019-04-25 | 2019-07-19 | 中国科学院光电技术研究所 | A kind of Transmissivity measurement accuracy scaling method |
| CN112147852B (en) * | 2019-06-28 | 2021-11-12 | 上海微电子装备（集团）股份有限公司 | Method for detecting pupil surface transmittance distribution of photoetching equipment |
| CN112147851B (en) * | 2019-06-28 | 2022-03-11 | 上海微电子装备（集团）股份有限公司 | Photoetching equipment and method for detecting pupil surface transmittance of photoetching equipment |
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| CN102735428A (en) * | 2012-06-08 | 2012-10-17 | 中国科学院上海光学精密机械研究所 | Measurement device and measurement method for optical performance of diffractive optical element |
| CN103018011A (en) * | 2012-11-29 | 2013-04-03 | 中国科学院光电技术研究所 | System and method for measuring transmittance of variable optical attenuator |
| CN103105284A (en) * | 2013-01-14 | 2013-05-15 | 中国科学院光电技术研究所 | Lithography machine illuminating system optical module transmittance measuring device and method |
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