CN103336625B - Optical filter box and touch display screen - Google Patents
Optical filter box and touch display screen Download PDFInfo
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- CN103336625B CN103336625B CN201310282645.4A CN201310282645A CN103336625B CN 103336625 B CN103336625 B CN 103336625B CN 201310282645 A CN201310282645 A CN 201310282645A CN 103336625 B CN103336625 B CN 103336625B
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Abstract
The present invention relates to optical filter box, including: glass baseplate；Including the first surface being oppositely arranged and second surface；First conductive layer, including the first conductive pattern being located on first surface；It is arranged on first surface and the first conductive layer；Second conductive layer, is imprinting the glue-line the second conductive pattern away from the side of first surface including being embedded；First conductive pattern and the second conductive pattern spaced formation induction structure on the thickness direction of impressing glue-line；Shading matrix layer, is arranged on a second surface, and color light resistance layer, arranges on a second surface, and the projection on shading matrix layer of the conductive thread of the first conductive pattern and described second conductive pattern each falls within the ruling of shading matrix layer.Make optical filter box can realize touch control operation and there is again filtering functions, advantageously reduce the thickness of electronic product, also a saving material and assembly cost.Also provide for a kind of touch display screen.
Description
Technical field
The present invention relates to touch screen, particularly relate to a kind of optical filter box and use touching of this optical filter box
Touch display screen.
Background technology
Touch screen is a kind of inductive arrangement receiving Touching controlling lamp input signal.Touch screen imparts information and hands over
Brand-new looks, are extremely attractive brand-new information interactive devices.The development of touch screen technology causes
The common concern of information medium circle both at home and abroad, it has also become the Chaoyang new high-tech industry that photovoltaic industry is a dark horse.
At present, the electronic product with touch display function all includes display screen and the touch being positioned on display screen
Screen.But, touch screen is as the assembly with display screen independence, at the electronics realizing man-machine interaction for some
During product, it is required to the size according to display screen and orders, assemble the most again, show to be formed to touch
Display screen, touch display screen can have simultaneously can touch control operation and display function.Existing touch screen and display screen
Assembling mainly have a two ways, i.e. frame patch and entirely fitting.Frame patch is by the edge patch of touch screen with display screen
Closing, full laminating is by whole of the upper surface laminating of the lower surface of touch screen Yu display screen.
Display screen mainly includes polaroid, optical filter box, Liquid Crystal Module and the film crystal being sequentially overlapped
Pipe (TFT, Thin Film Transistor), therefore display screen itself has had bigger thickness, and continues past
On display screen during laminating touch screen, its thickness be will be further increased, furthermore, many one attaching process, just meaning
Taste and is added the probability that product is bad, is greatly increased the production cost of product.
Summary of the invention
Based on this, it is necessary to provide a kind of optical filter box advantageously reducing electronic installation thickness and use to be somebody's turn to do
The touch display screen of optical filter box.
A kind of optical filter box, including:
Glass baseplate；Including the first surface being oppositely arranged and second surface；
First conductive layer, including the first conductive pattern on the first surface being located at described glass baseplate, described
First conductive pattern includes that continuous print conductive grid, described conductive grid are intersected to form by conductive thread；
Impressing glue-line, is arranged on described first surface and described first conductive pattern, described first conductive pattern
Case is embedded at described impressing glue-line near the side of described first surface；
Second conductive layer, including being embedded at described impressing glue-line away from second the leading of side of described first surface
Electrical pattern；Described second conductive pattern includes that continuous print conductive grid, described conductive grid are handed over by conductive thread
Fork-shaped becomes；Described first conductive pattern and described second conductive pattern are on the thickness direction of described impressing glue-line
Spaced formation induction structure；
Shading matrix layer, is arranged on described second surface, and described shading matrix layer includes cross one another lattice
Line, described ruling intersects to form multiple grid cell；And
Color light resistance layer, is arranged on described second surface, including multiple chromatic photoresist unit, each described
Chromatic photoresist unit is positioned in a described grid cell；
The conductive thread of described first conductive pattern and described second conductive pattern is on described shading matrix layer
Projection each falls within the ruling of described shading matrix layer.
Wherein in an embodiment, the live width of described conductive thread is less than the width of described ruling.
Wherein in an embodiment, in described first conductive pattern and described second conductive pattern one of them
The live width of conductive thread be 0.2 micron～5 microns.
Wherein in an embodiment, described conductive thread intersects formation grid node, two adjacent nets
Distance between lattice node is 50 microns～500 microns.
Wherein in an embodiment, described conductive grid includes that multiple grid cell, each grid cell exist
Projection in described color light resistance layer at least accommodates a chromatic photoresist unit.
Wherein in an embodiment, described first conductive layer is by breaking the conductive grid that whole complete
Line processes and obtains multiple the first spaced conductive pattern, and described second conductive layer is by complete by whole
Conductive grid carries out break line treatment and obtains multiple the second spaced conductive pattern.
Two adjacent described first conductive patterns wherein in an embodiment, in described first conductive layer
Interval width be 0.5 micron～50 microns, described second conduction that in described second conductive layer two are adjacent
The interval width of pattern is 0.5 micron～50 microns.
Wherein in an embodiment, the thickness of described color light resistance layer is more than or equal to described shading matrix layer
Thickness.
Wherein in an embodiment, described impressing glue-line offers shape and mates with described second conductive pattern
Groove, described second conductive pattern is contained in described groove, the degree of depth of described groove be less than described impressing
The thickness of glue-line, the thickness of described second conductive pattern is less than or equal to the degree of depth of described groove.
A kind of touch display screen, including the film crystal pipe electrode stacked gradually, Liquid Crystal Module, filter set
Part and polaroid, described optical filter box is as above optical filter box described in any one.
Above-mentioned optical filter box and use the touch display screen of this optical filter box, optical filter box can be the most real
Existing touch control operation and filtering functions, as the combination of two assemblies indispensable in display screen, be used for showing
Time in screen, display screen can be directly made to have touch controllable function, it is not necessary to assemble a touch screen the most on a display screen, no
Only advantageously reduce the thickness of electronic product, be the most also greatly saved material and assembly cost.
Accompanying drawing explanation
Fig. 1 is the structural representation touching display screen of an embodiment；
Fig. 2 is the generalized section of optical filter box shown in Fig. 1；
Fig. 3 is the schematic perspective view of the optical filter box of an embodiment；
Fig. 4 is the generalized section of the optical filter box of another embodiment；
Fig. 5 is a conductive layer top view shown in Fig. 3；
Fig. 6 is the structural representation of the conductive thread of an embodiment；
Fig. 7 is the structural representation of the conductive thread of another embodiment；
Fig. 8 is the structural representation of the conductive thread of another embodiment；
Fig. 9 is the structural representation of the conductive thread of another embodiment；
Figure 10 is the generalized section of the optical filter box of another embodiment.
Detailed description of the invention
Understandable for enabling the above-mentioned purpose of the present invention, feature and advantage to become apparent from, the most right
The detailed description of the invention of the present invention is described in detail.Elaborate in the following description a lot of detail with
It is easy to fully understand the present invention.But the present invention can come real to be a lot different from alternate manner described here
Executing, those skilled in the art can do similar improvement in the case of intension of the present invention, therefore this
Bright do not limited by following public being embodied as.
It should be noted that when element is referred to as " being fixed on " another element, and it can be directly at another
On individual element or element placed in the middle can also be there is.When an element is considered as " connection " another yuan
Part, it can be directly to another element or may be simultaneously present centering elements.
Unless otherwise defined, all of technology used herein and scientific terminology and the technology belonging to the present invention
The implication that the technical staff in field is generally understood that is identical.The art used the most in the description of the invention
Language is intended merely to describe the purpose of specific embodiment, it is not intended that in limiting the present invention.Used herein
Term " and/or " include the arbitrary and all of combination of one or more relevant Listed Items.
The present invention proposes a kind of optical filter box and uses the touch display screen of this optical filter box.This optical filter
Assembly can realize touch operation and optical filter function, so that touching display screen have touch display function.
The lower polaroid 10 of the present embodiment, thin film transistor (TFT) (Thin Film Transistor, TFT) electrode 20, liquid
Crystal module 30, public electrode 40, protecting film 50 and the structure of upper polaroid 60 and function can be with existing products
Condition is same, does not repeats them here.
Be appreciated that for using backlight be polarized light source, such as OLED polarized light source, then without under
Polaroid 10, it is only necessary to polaroid 60.Protecting film 50 can also omit.
Optical filter box 200 has tangible operation and filtering functions simultaneously, makes display screen have touch display
Function.Display screen can be straight-down negative or the LCDs of side entering type light source.
Following emphasis describes optical filter box 200.
Referring to Fig. 2, optical filter box 200 includes transparent base 22, impressing glue-line the 24, first conductive layer
25, the second conductive layer 26, shading matrix layer (Black Matrix, BM) 27, color light resistance layer 28.First
Conductive layer 25 and the second conductive layer 26 spaced formation induction structure on the thickness direction of impressing glue-line 24.
Transparent base 22 includes first surface 222 and second surface 224.Transparent base 22 is transparent insulation material
Matter, such as glass, its material can be sillico aluminate glass or calcium soda-lime glass.
Impressing glue-line 24 arranges on first surface 222 and first conductive layer 25 of transparent base 22, imprints glue
Layer 24 is transparence, and thickness is 2 microns～10 microns, does not affect the light transmittance of entirety.Impressing glue-line 24
Material can be solvent-free ultra-violet curing acryl resin, On Visible Light Cured Resin or heat reactive resin.
First conductive layer 25 is arranged on first surface 222, and is embedded at impressing glue-line 24 near transparent base
The side of the first surface 222 of 22.First conductive layer 25 includes the first conductive pattern 252.First conductive pattern
Case 252 by plating/matel coated layer at first surface 222, then can be etched and obtain.The material of metal level can
To be at least one in the metals such as gold, silver, copper, aluminum, zinc, stannum and molybdenum.
Referring to Fig. 2 and 3, the first conductive pattern 252 includes continuous print conductive grid, and conductive grid is by conducting electricity
Silk thread a intersects to form.The basic grid that conductive thread a is formed can be regular polygon, such as square, rhombus
Or regular hexagon.Conductive thread a can be with straight line, curve or broken line.The conductive filament of the first conductive pattern 252
Line a projection on shading matrix layer 27 entirely falls on the ruling of shading matrix layer 27.In the present embodiment,
The live width of conductive thread a is equal with the ruling lattice width of shading matrix layer 27, the live width of such conductive thread a
That can relatively do is wider, to reduce the manufacture difficulty of conductive thread a.Ensure to expose shading square simultaneously
Battle array layer 27 to chromatic photoresist region and affect light-out effect and the product appearance effect of chromatic photoresist.
In one embodiment, referring to Fig. 4, the conductive thread a of the first conductive pattern 252 is at shading matrix layer
The projection of 27 entirely falls on the ruling of shading matrix layer 27, and the live width of conductive thread a is less than the width of ruling
Degree, to reduce the risk that conductive thread a is exposed to outside ruling.
In another embodiment, the live width of conductive thread a can be 0.2 micron～5 microns, conductive thread a
Intersect formation grid node, and the distance between adjacent two grid nodes is 50 microns～500 microns, with reality
Existing visually-clear effect, i.e. naked eyes are invisible.It is further ensured that high light transmittance.
Referring to Fig. 2, the second conductive layer 26 is arranged on the impressing glue-line 24 first table away from transparent base 22
The side in face 222.Second conductive layer 26 includes the second conductive pattern 262.Can be by impressing glue-line 24
The groove 242 that shape is mated is offered with described second conductive pattern 262 on side away from transparent base 22,
The second conductive pattern 262 is prepared after filling conductive material solidification in groove 242 again.The degree of depth of groove 242 is little
In the thickness of impressing glue-line 24, the thickness of the second conductive pattern 262 is less than or equal to the degree of depth of groove 242.This
In embodiment, the thickness of the second conductive pattern 262 is equal to the degree of depth of groove 242.The conductive material filled can
Think metal, CNT, Graphene, organic conductive macromolecule and ITO, be preferably metal, such as nanometer
Silver slurry.When using impressing mode, the degree of depth of groove 242 is less than the thickness of impressing glue-line 24, in groove 242
The thickness of the conductive material housed, less than or equal to the degree of depth of groove 242, can avoid conductive layer in successive process
In be scraped off.
Referring to Fig. 3, the second conductive pattern 262 includes continuous print conductive grid, and conductive grid is by conductive thread
A intersects to form.The basic grid that conductive thread a is formed can be regular polygon, such as square, rhombus or just
Hexagon.Conductive thread a can be with straight line, curve or broken line.The conductive thread a of the second conductive pattern 262
Projection on shading matrix layer 27 entirely falls on the ruling of shading matrix layer 27.In the present embodiment, lead
The live width of electrical filament line a is equal with the ruling lattice width of shading matrix layer 27, and the live width of such conductive thread a can
Wider with relatively do, to reduce the manufacture difficulty of conductive thread.And shading matrix layer 27 to coloured silk will not be exposed
Coloured light hinders region and affects light-out effect and the product appearance effect of chromatic photoresist.
In one embodiment, referring to Fig. 4, the conductive thread a of the second conductive pattern 262 is at shading matrix layer
The projection of 27 entirely falls on the ruling of shading matrix layer 27, and the live width of conductive thread a is less than the width of ruling
Degree, to reduce the risk that conductive thread a is exposed to outside ruling.
In another embodiment, the live width of conductive thread a can be 0.2 micron～5 microns, conductive thread a
Intersect formation grid node, and the distance between adjacent two grid nodes is 50 microns～500 microns, with reality
Existing visually-clear effect, i.e. naked eyes are invisible.It is further ensured that high light transmittance.
Referring to Fig. 5, in the first conductive layer 25 and the second conductive layer 26, either conductive layer is obtained by break line treatment
The spaced schematic diagram of the multiple conductive patterns arrived.Wherein, multiple first conductive patterns 252 and multiple
The most spaced insulation of second conductive pattern 262 forms induction structure.To leading of whole face the first conductive layer 25
Electrical filament line a carries out break line treatment (at square frame b on figure) and obtains the first conductive pattern of spaced insulation
252, the conductive thread two internodal distance that breaks is 0.5 micron～50 microns.Multiple first conductive patterns are led
Electricity 252 is separate, insulation.Equally, the conductive thread a of whole face the second conductive layer 26 is carried out at broken string
Reason carries out break line treatment and obtains the second conductive pattern 262 of spaced insulation, the two broken string joints of conductive thread a
Distance between point is 0.5 micron～50 microns.Multiple second conductive patterns conduct electricity 262 separate, insulation.
The shape of the grid cell of the conductive grid of the conductive thread a of the first conductive layer 25 and the second conductive layer 26
Shape can with shading matrix layer 27 grid be shaped as similar fitgures, i.e. with the colourama of color light resistance layer 28
Hinder the similar fitgures that are shaped as of unit 282, the grid that conductive thread a is formed throwing on shading matrix layer 27
The intersection point of shadow overlaps with the ruling intersection point of shading matrix layer 27.First conductive layer 25 and the second conductive layer 26
The projection in color light resistance layer 27 of the basic grid unit of conductive thread a accommodates at least one chromatic photoresist list
Unit 282, is wherein divided into four kinds of situations:
1, conductive thread a grid cell and chromatic photoresist unit 282 one_to_one corresponding, the i.e. net of conductive thread a
Ruling is away from being shading matrix layer 24 and adjacent two distance between center lines, as shown in Figure 6.2, only first
Axially on (such as transverse axis), the grid lines of conductive thread a is away from being shading matrix layer 24 same axially adjacent two
The integral multiple of bar distance between center lines, i.e. at the basic grid unit of conductive thread a of X direction in shading
Projection in matrix layer 24 comprises multiple complete chromatic photoresist unit 282, as shown in Figure 7.3, only
On two axial (the such as longitudinal axis), the grid lines of conductive thread a is away from being that shading matrix layer 24 is same axially adjacent
Article two, the integral multiple of distance between center lines, i.e. the basic grid unit at the conductive thread a of y direction are hiding
Projection on light matrix layer 24 comprises multiple complete chromatic photoresist unit 282, as shown in Figure 8.4,
One axially and second axially on, the grid lines of conductive thread a is away from being all that shading matrix layer 24 is same axially adjacent
Article two, the integral multiple of distance between center lines, i.e. the basic grid list of the conductive thread a in horizontally and vertically direction
Unit's projection on shading matrix layer 24 all comprises multiple complete chromatic photoresist unit 282, such as Fig. 9 institute
Show.
Referring to Figure 10, shading matrix layer 27 is arranged on the second surface 224 of transparent base 22.Shading
Matrix layer 27 includes cross one another ruling, and these rulings intersect to form multiple grid cell.Grid cell is used
In housing chromatic photoresist material.The material of shading matrix layer 27 is the photoresist with black dyes or crome metal,
It can use exposure, developing manufacture process to obtain.
Color light resistance layer 28 is arranged on the second surface 224 of transparent base 22.Color light resistance layer 28 includes
Multiple chromatic photoresist unit 282, each chromatic photoresist unit 282 is positioned in a grid cell of correspondence.Color
The material of coloured light resistance layer 28 can be the photoresist with coloured dye, the reddest (red, R), green (green,
G), the color such as blue (blue, B), color light resistance layer 28 can use exposure, developing manufacture process acquisition.Colored
Photoresist layer 28 is distributed among the grid cell that shading matrix layer 27 is formed, i.e. color light resistance layer 28 and shading
Matrix layer 27 is distributed on the second surface 224 of transparent base 22.In the present embodiment, chromatic photoresist
The chromatic photoresist of layer 28 is R/G/B chromatic photoresist.
As shown in Figure 10, the thickness of color light resistance layer 28 is more than the thickness of shading matrix layer 27, the most permissible
Increase the light emission rate of light.When the thickness of color light resistance layer 28 is less than the thickness of shading matrix layer 27, then take a fancy to
Going color light resistance layer 28 to be similar to be embedded in shading matrix layer 27, light is covered by shading matrix layer 27, because of
These 26 light out from color light resistance layer can only be seen from front, and side is the most easily blocked matrix layer 27
Block, be unfavorable for light.And when the thickness of color light resistance layer 28 is more than the thickness of shading matrix layer 27, color
The top of coloured light resistance layer 28 is similar to embed in impressing glue-line 24, and impressing glue-line 24 is by between chromatic photoresist
Gap is filled and led up, and impressing glue-line 24 simultaneously works as protecting chromatic photoresist and the effect of grid molding.At other
In embodiment, the thickness of color light resistance layer 28 is equal to the thickness of shading matrix layer 27.
The above-mentioned optical filter box 200 with touch-control effect, its manufacturing process is as follows:
(1) first carry out Plasma process at the first surface of glass baseplate and second surface, remove glass the
One, second surface is dirty, and makes surface ionizing, increases follow-up and other material cohesive force.
(2) at whole metal cladding of glass baseplate first surface or painting layer of metal conductive ink (the present embodiment
It is adopted as argent),
(3) then it is coated with a layer photoetching glue, through exposure-development technology, only retains and cover the first conductive pattern
The photoresist of part, removes the photoresist in remaining place；
(4) utilize metal etch liquid that above-mentioned metal level is etched, obtain the first conductive pattern of desirable pattern
The conductive thread of case.
(5) at above-mentioned glass basic surface whole topcoating cloth impressing glue (the present embodiment covering the first conductive pattern
PMMA UV is used to solidify resin), and with the impression block being nested with the second conductive pattern at impressing glue table
Face imprints and solidifies, and obtains the grid groove of required second conductive pattern；
(6) filling conductive material in the grid groove of the second conductive pattern and solidify, conductive material can be
Metal, CNT, Graphene, organic conductive macromolecule and ITO, form the conduction that conductive thread is constituted
Grid；It is preferably metal (such as nanometer silver paste)；
(7) covering layer protective layer at impressing glue-line and the whole face of the second conductive pattern surface (can be to be coated with/plate
Clear protective film layer, final products retain；Can also be one layer of intermediate process protecting film, finally remove),
To avoid affecting the effect of the second conductive pattern when making the pattern of shading matrix layer and color light resistance layer.
(8) at the whole topcoating of the second surface/plating light screening material of substrate of glass；
(9) use exposure imaging technology, the light screening material in chromatic photoresist region is removed, obtains shading square
Battle array layer.
(10) plate/coat R/G/B chromatic photoresist by several times in corresponding region, obtain color light resistance layer.
Wherein, when in above-mentioned 7th step for intermediate process protecting film, also need to after the 10th step by
It removes)
In above-mentioned optical filter box and touch display screen, above-mentioned optical filter box and this optical filter box of use
Touch in display screen, including glass substrate, impressing glue-line on the glass substrate is set, is distributed in impressing glue
First conductive layer of both sides of layer and the second conductive layer and be arranged on shading matrix layer and the colourama of impressing glue-line
The spaced insulation of resistance layer, the first conductive layer and the second conductive layer forms induction structure.Optical filter box can be same
Shi Shixian touch control operation and filtering functions, as the combination of two assemblies indispensable in display screen, be used for
Time in display screen, display screen can be directly made to have touch controllable function, it is not necessary to assemble a touch screen the most on a display screen,
Not only contribute to reduce the thickness of electronic product, be the most also greatly saved material and assembly cost.
Further, the conductive thread of the first conductive pattern and described second conductive pattern is at shading matrix layer
On projection all entirely fall on the ruling of shading matrix layer, the width of conductive thread without departing from the width of ruling,
From without blocking passing through of light source, thus there is higher light transmittance, it is ensured that visually-clear effect is preferable.
And conductive layer is arranged on the both sides of impressing glue-line, it is to avoid the scratch of conductive layer.
Additionally, above-mentioned optical filter box and touch display screen have the further advantage that
(1) first conductive thread is obtained by metal etch；Second conductive thread uses impressing mode to prepare,
The material that conductive pattern is selected only can be expanded to all suitable conductive materials with transparent material by tradition.When
When metal material selected by the conductive material of conductive thread, resistance can be substantially reduced and reduce the energy consumption of touch screen.
(2) the above-mentioned optical filter box with touch controllable function is bilayer conductive structure, it is not necessary to carry out design of putting up a bridge,
It is substantially reduced task difficulty.
(3) above-mentioned conductive pattern uses metal mesh structure, uses imprint process to manufacture, compared to biography
The ito film of system can a step be formed as the technique of conductive layer, mesh shape, and technique is simple, it is not necessary to spatter
The expensive device such as plating, evaporation, yield is high, is suitable for large area, production in enormous quantities.And if with metal generation
For ITO, material cost is substantially reduced, and owing to need not use etching technics, does not results in conductive
Waste, and environmentally friendly.
Embodiment described above only have expressed the several embodiments of the present invention, and it describes more concrete and detailed,
But therefore can not be interpreted as the restriction to the scope of the claims of the present invention.It should be pointed out that, for this area
Those of ordinary skill for, without departing from the inventive concept of the premise, it is also possible to make some deformation and
Improving, these broadly fall into protection scope of the present invention.Therefore, the protection domain of patent of the present invention should be with appended
Claim is as the criterion.
Claims (3)
1. an optical filter box, it is characterised in that including:
Glass baseplate, including the first surface being oppositely arranged and second surface；
First conductive layer, including the first conductive pattern on the first surface being located at described glass baseplate, described
First conductive layer carries out break line treatment by the conductive grid complete by whole and obtains multiple spaced first
Conductive pattern, described first conductive pattern includes continuous print conductive grid, and described conductive grid is by conductive thread
Intersect to form；
Impressing glue-line, is arranged on described first surface and described first conductive pattern, described first conductive pattern
Case is embedded at described impressing glue-line near the side of described first surface；
Second conductive layer, including being embedded at described impressing glue-line away from second the leading of side of described first surface
Electrical pattern, described second conductive layer carries out break line treatment by the conductive grid complete by whole and obtains multiple phase
Second conductive pattern at interval mutually, two adjacent described second conductive patterns in described second conductive layer
Interval width is 0.5 micron～50 microns, and described second conductive pattern includes continuous print conductive grid, described in lead
Power grid is intersected to form by conductive thread, two adjacent described first conductive patterns in described first conductive layer
The interval width of case is 0.5 micron～50 microns, and described first conductive pattern and described second conductive pattern are in institute
State spaced formation induction structure on the thickness direction of impressing glue-line；
Shading matrix layer, is arranged on described second surface, and described shading matrix layer includes cross one another lattice
Line, described ruling intersects to form multiple grid cell；And
Color light resistance layer, is arranged on described second surface, including multiple chromatic photoresist unit, each described
Chromatic photoresist unit is positioned in a described grid cell, described first conductive layer and described second conductive layer
Conductive grid all includes multiple grid cell, and the projection in described color light resistance layer of each grid cell is at least
Accommodating a chromatic photoresist unit, the thickness of described color light resistance layer is more than or equal to the thickness of described shading matrix layer；
The conductive thread of described first conductive pattern and described second conductive pattern is on described shading matrix layer
Projection each fall within the ruling of described shading matrix layer, the live width of the conductive thread of described first conductive pattern with
The ruling width of described shading matrix layer is equal, and described impressing glue-line offers shape and described second conductive pattern
The groove of case coupling, described second conductive pattern is contained in described groove, and the degree of depth of described groove is less than institute
Stating the thickness of impressing glue-line, the thickness of described second conductive pattern is less than or equal to the degree of depth of described groove.
Optical filter box the most according to claim 1, it is characterised in that described first conductive pattern and
In described second conductive pattern, the live width of the conductive thread of one of them is 0.2 micron～5 microns.
3. touch a display screen, including the film crystal pipe electrode stacked gradually, Liquid Crystal Module, optical filter
Assembly and polaroid, it is characterised in that described optical filter box is for as described in claim 1～2 any one
Optical filter box.
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| CN102903423A (en) * | 2012-10-25 | 2013-01-30 | 南昌欧菲光科技有限公司 | Conduction structure in transparent conduction film, transparent conduction film and manufacture method thereof |
| CN203338320U (en) * | 2013-07-05 | 2013-12-11 | 南昌欧菲光显示技术有限公司 | Optical filter assembly and touch displaying screen |
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Effective date of registration: 20170630 Address after: 330000 Jiangxi city of Nanchang Province Economic and Technological Development Zone HUANGJIAHU Road Patentee after: Nanchang OFilm Tech. Co.,Ltd. Address before: North to the East, 330013 in Jiangxi province Nanchang city Nanchang economic and technological development zones clove road Longtan ditch Co-patentee before: Shenzhen OFilm Tech Co.,Ltd. Patentee before: Nanchang Ofilm Display Tech Co.,Ltd. Co-patentee before: Suzhou OFilm Tech. Co.,Ltd. |
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Effective date of registration: 20210224 Address after: 231323 Building 1, precision electronics industrial park, Hangbu Town, Shucheng County, Lu'an City, Anhui Province Patentee after: Anhui jingzhuo optical display technology Co.,Ltd. Address before: 330000 Huangjiahu Road, Nanchang Economic and Technological Development Zone, Jiangxi Province Patentee before: Nanchang OFilm Tech. Co.,Ltd. |