CN103235667A - Optical filter assembly and touch display assembly - Google Patents

Optical filter assembly and touch display assembly Download PDF

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Publication number
CN103235667A
CN103235667A CN 201310169278 CN201310169278A CN103235667A CN 103235667 A CN103235667 A CN 103235667A CN 201310169278 CN201310169278 CN 201310169278 CN 201310169278 A CN201310169278 A CN 201310169278A CN 103235667 A CN103235667 A CN 103235667A
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CN
China
Prior art keywords
conductive
conductive pattern
optical filter
filter box
shading matrix
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Withdrawn
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CN 201310169278
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Chinese (zh)
Inventor
唐根初
董绳财
刘伟
唐彬
何世磊
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Nanchang Ofilm Display Tech Co ltd
Nanchang OFilm Optical Display Technology Co Ltd
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Nanchang Ofilm Display Tech Co ltd
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Priority to CN 201310169278 priority Critical patent/CN103235667A/en
Priority to CN201310329243.5A priority patent/CN103399666B/en
Priority to CN201320464185.2U priority patent/CN203386175U/en
Publication of CN103235667A publication Critical patent/CN103235667A/en
Withdrawn legal-status Critical Current

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Abstract

The invention relates to an optical filter assembly and a touch display assembly. The optical filter assembly comprises a glass substrate, a shading array layer, a color light resistance layer and a conducting layer. The conducting layer comprises a first conducting pattern, at least two conducting pattern units and a conducting bridge; the first conducting pattern and the conducting pattern units are formed into an induction structure in a mutually interval mode; the conducting bridge and the first conducting pattern are mutually insulated with each other; and the conducting bridge and the second conducting pattern units which are arranged at two ends of the conducting bridge are formed into a second conducting pattern. The optical filter module has the advantages of being capable of simultaneously achieving touch operation and functions of the optical filter and beneficial to the reduction of thickness of the electronic products and greatly saving material and assembling costs.

Description

Optical filter box and touch display module
Technical field
The present invention relates to the demonstration field, particularly relate to the touch display screen of a kind of optical filter box and this optical filter box of use.
Background technology
Touching display device and given information interaction brand-new looks, is extremely attractive brand-new information interaction equipment.The development that touches the display device technology has caused the common concern of domestic and international information medium circle, has become the Chaoyang new high-tech industry that the photoelectricity industry is a dark horse.
At present, touching display device mainly is made up of display screen and the touch-screen that is positioned on the display screen, yet, touch-screen as with display screen assembly independently, when being used for some touch display devices realization man-machine interactive operation, need to order according to the size that shows screen, assemble again afterwards, the assembling of existing touch-screen and display screen mainly contains dual mode, be that frame pastes and full the applying, the frame subsides are to be fitted in the edge of touch-screen and display screen, and full the applying is that the touch display device design difficulty and the thickness that obtain like this are all bigger with whole applying of upper surface of lower surface and the display screen of touch-screen.
Summary of the invention
Based on this, the touch display screen that is necessary to provide the higher optical filter box of a kind of product yield and uses this optical filter box.
A kind of optical filter box comprises:
Glass baseplate;
The shading matrix layer is arranged on the described glass baseplate, and described shading matrix layer comprises cross one another ruling, described ruling intersection shaping grid;
The colorama resistance layer comprises a plurality of chromatic photoresist unit that are arranged on the described glass baseplate and are arranged in described grid;
Conductive layer, be arranged on described shading matrix layer away from a side of described glass baseplate, described conductive layer comprises first conductive pattern and at least two second conductive pattern unit, described first conductive pattern and the second conductive pattern unit are latticed conductive grid, comprise cross one another conductive thread, described at least two second conductive pattern unit are positioned at the relative both sides of described first conductive pattern, described first conductive pattern forms induction structure with space, at least two second conductive pattern unit, and the projection of described conductive thread on described shading matrix layer all drops on the ruling of described shading matrix layer; And
Conducting bridge, stride and be located on described first conductive pattern, described conducting bridge is electrically connected adjacent with described first conductive pattern and is positioned at described second conductive unit of the relative both sides of described first conductive pattern, mutually insulated between described conducting bridge and described first conductive pattern, described conducting bridge and the described second conductive pattern unit that is positioned at described conducting bridge two ends be common to constitute second conductive pattern, and described first leads pattern and second conductive pattern is arranged in a crossed manner.
Therein among embodiment, optical filter box further comprises insulation course, described insulation course covers described conductive layer, described conducting bridge is embedded in the described insulation course, described conducting bridge comprises connecting portion and is separately positioned on two of described connecting portion two ends and runs through portion, described connecting portion is in the side of described insulation course away from described shading matrix layer, and the described portion of running through extends to the described second conductive pattern unit to be electrically connected on two described second adjacent conductive units respectively from described insulation course away from a side of described shading matrix layer.
Among embodiment, the described portion of running through overlaps two conductive threads on the described second conductive pattern unit at least therein.
Therein among embodiment, described connecting portion is conductive grid, the width of described conductive grid is 5 microns~500 microns, described conductive grid comprises cross one another conductive thread, the width of described conductive thread is 0.2 micron~5 microns, conductive thread intersects to form mesh node mutually, and the distance between the two adjacent mesh nodes is 10 microns~500 microns.
Among embodiment, the projection of described connecting portion on described shading matrix layer all drops on the ruling of described shading matrix layer therein.
Therein among embodiment, further comprise insulation course, described insulation course comprises a plurality of collets that cover on described first conductive pattern, and described conducting bridge is crossed on the described collets and is electrically connected adjacent with described first conductive pattern and is positioned at two second conductive units of the relative both sides of described first conductive pattern.
Among embodiment, the thickness of described colorama resistance layer is more than or equal to the thickness of described shading matrix layer therein.
Among embodiment, the thickness of described insulation course is 1 micron~5 microns therein, and the material of described insulation course is ultraviolet-curing resin, visible-light curing resin or heat reactive resin.
Among embodiment, the width of described conductive thread is 0.2 micron~5 microns therein, and conductive thread intersects to form mesh node mutually, and the distance between the two adjacent mesh nodes is 10 microns~500 microns.
Among embodiment, the width of described conductive thread is smaller or equal to the width of described ruling therein.
Among embodiment, described conductive grid comprises a plurality of grid cells therein, and each grid cell is accommodated a chromatic photoresist unit at least.
Among embodiment, described conductive thread is conductive coating or conductive coating therein.
A kind of touch display screen comprises the TFT electrode, Liquid Crystal Module, public electrode, optical filter box and the last polaroid that stack gradually, and described optical filter box is aforesaid optical filter box.
Above-mentioned optical filter module can realize touch control operation and optical filter function simultaneously, as an indispensable assembly in the display screen, when being used for display screen, can directly make display screen have touch controllable function, need not again at display screen assembling one touch-screen, not only be conducive to reduce the thickness of electronic product, also saved material and assembly cost simultaneously greatly.
Description of drawings
Fig. 1 is the structural representation of the touch display screen of an embodiment;
Fig. 2 is the diagrammatic cross-section of optical filter box shown in Figure 1;
Fig. 3 is the front view of conductive layer shown in Figure 2;
Fig. 4 a is the structural representation of the conductive thread of an embodiment;
Fig. 4 b is the structural representation of the conductive thread of another embodiment;
Fig. 5 is the diagrammatic cross-section of the optical filter box of another embodiment;
Fig. 6 is the diagrammatic cross-section of the optical filter box of another embodiment;
Fig. 7 is the diagrammatic cross-section of the optical filter box of another embodiment;
Fig. 8 is the structural representation of the conductive thread of an embodiment;
Fig. 9 is the structural representation of the conductive thread of another embodiment;
Figure 10 is the structural representation of the conductive thread of another embodiment.
Embodiment
For above-mentioned purpose of the present invention, feature and advantage can be become apparent more, below in conjunction with accompanying drawing the specific embodiment of the present invention is described in detail.A lot of details have been set forth in the following description so that fully understand the present invention.But the present invention can implement much to be different from alternate manner described here, and those skilled in the art can do similar improvement under the situation of intension of the present invention, so the present invention is not subjected to the restriction of following public concrete enforcement.
Need to prove that when element is called as " being fixed in " another element, can directly can there be element placed in the middle in it on another element or also.When an element is considered to " connection " another element, it can be to be directly connected to another element or may to have element placed in the middle simultaneously.
Unless otherwise defined, the employed all technology of this paper are identical with the implication that belongs to those skilled in the art's common sense of the present invention with scientific terminology.Employed term is not intended to be restriction the present invention just in order to describe the purpose of specific embodiment in instructions of the present invention herein.Term as used herein " and/or " comprise one or more relevant Listed Items arbitrarily with all combinations.
The present invention proposes a kind of optical filter box and uses the touch display screen of this optical filter box.This optical filter box can be realized touch operation and optical filter function, thereby makes touch display screen have the touch Presentation Function.
See also Fig. 1, the touch display screen 100 of an embodiment comprises following polaroid 10, TFT electrode 20, Liquid Crystal Module 30, public electrode 40, diaphragm 50, the optical filter box 200 that stacks gradually and goes up polaroid 60.
Structure and the function of the following polaroid 10 of present embodiment, TFT electrode 20, Liquid Crystal Module 30, public electrode 40, diaphragm 50 and last polaroid 60 can be identical with existing product, do not repeat them here.
Be appreciated that for using backlight as polarized light source, as the OLED polarized light source, then need not down polaroid 10, only need one to go up polaroid 60 and get final product.Diaphragm 50 also can omit.
But touch display screen 100 has tangible operation and polarized light function simultaneously, makes display screen have the touch Presentation Function.Display screen can be the LCDs of straight-down negative or side down light source.
Following emphasis is described optical filter box 200.
See also Fig. 2, optical filter box 200 comprise glass baseplate 22, shading matrix layer (Black Matrix, BM) 24, colorama resistance layer 26, conductive layer 28 and insulation course 29.
Glass baseplate 22 can be sillico aluminate glass or calcium soda-lime glass.
Shading matrix layer 24 is arranged on the surface of glass baseplate 22.The material of shading matrix layer 24 is photoresist or the crome metal that has black dyes, and it can adopt exposure, develop and make.Shading matrix layer 24 comprises cross one another ruling, these rulings intersection shaping grids.From the angle of overlooking, shading matrix layer 24 comprises a plurality of grids, and light screening material is removed in the grid, is used for accommodating colorama resistance layer 26.
Colorama resistance layer 26 is arranged in the grid of shading matrix layer 24, and the material of colorama resistance layer 26 can be for having the photoresist of coloured dye, for example red (red, R), green (green, it is G), blue that (colorama resistance layer 26 can adopt exposure, the formation of developing for blue, color such as B).Colorama resistance layer 26 is distributed among the grid of shading matrix layer 24 formation, and namely colorama resistance layer 26 and shading matrix layer 24 are distributed on the surface of glass baseplate 22.In the present embodiment, the chromatic photoresist of colorama resistance layer 26 is the R/G/B chromatic photoresist.From Plane Angle, colorama resistance layer 26 comprises a plurality of chromatic photoresists unit.Each chromatic photoresist unit is arranged in the grid.The thickness of colorama resistance layer 26 can increase the light emission rate of light like this greater than the thickness of shading matrix layer 24.If the thickness of colorama resistance layer 26 is less than the thickness of shading matrix layer 24, looking then that colorama resistance layer 26 is similar to is embedded in shading matrix layer 24, shading matrix layer 24 covers light, therefore 26 light that come out can only be seen from the front from the colorama resistance layer, the side is then blocked by shading matrix layer 24 easily, is unfavorable for bright dipping.
Seeing also Fig. 2, conductive layer 28 is arranged on the side of shading matrix layer 24 away from glass baseplate.Conductive layer 28 comprises first conductive pattern 282, second conductive pattern 284 and conducting bridge 286, and first conductive pattern 282 and second conductive pattern, 284 spaces formation induction structure.
See also Fig. 3, in the present embodiment, first conductive pattern 282 and second conductive pattern 286 are the conductive pattern of individual layer multipoint configuration.First conductive pattern 282 comprises that a plurality of continuous settings and first conductive unit, 2822, the second conductive patterns 284 that are electrically connected mutually comprise second conductive unit 2842 of a plurality of insulation that separated at interval by first conductive unit 2822.Adjacent two second conductive pattern unit 2842 are positioned at the relative both sides of first conductive unit 2822.Adjacent two second conductive units 2842 are electrically connected second conductive pattern 284 that obtains being communicated with by conducting bridge 286.Conducting bridge 286 and first conductive pattern 282 are by insulation course 29 mutually insulateds.
Further, first conductive pattern 282 and second conductive pattern 284 include latticed continuous conduction grid.Conductive grid comprises a plurality of grid cells, and each grid cell is accommodated a chromatic photoresist unit at least.Conductive grid is intersected to form by conductive thread a.Conductive thread a all drops in the projection on the shading matrix layer 24 on the ruling of shading matrix layer 24, and the intersection point of conductive thread a grid overlaps with the ruling intersection point of shading matrix layer 24.See also Fig. 4 a and Fig. 4 b, conductive thread a can be straight line or curve.
Conductive thread a is by metal cladding on shading matrix layer 24 (being conductive coating) or is coated with one deck conductive ink, as the nanometer silver paste conductive coating, forms through resist coating-exposure-operations such as development-etching again.Conductive material among the conductive thread a can be at least a in the metals such as gold, silver, copper, aluminium, zinc, tin, molybdenum.
Preferably, the mesh lines of conductive thread a is apart from being the shading matrix layer 24 same axially integral multiple of adjacent two distance between center lines, so that preparation.Here can be divided into three kinds of situations: 1. only on first axial (for example transverse axis), the mesh lines of conductive thread a is apart from being the shading matrix layer 24 same axially integral multiple of adjacent two distance between center lines, namely at the mesh lines of the conductive thread a of X direction apart from the integral multiple that is about a grid live width, as shown in Figure 8; 2. only on second axial (for example longitudinal axis), the mesh lines of conductive thread a is apart from being the shading matrix layer 24 same axially integral multiple of adjacent two distance between center lines, namely at the mesh lines of the conductive thread a of y direction apart from the integral multiple that is about a grid live width, as shown in Figure 9; 3. first axially and second axially on, the conductive thread mesh lines is apart from all being the shading matrix layer 24 same axially integral multiple of adjacent two distance between center lines, namely at the mesh lines of the conductive thread a of transverse axis and y direction apart from the integral multiple that all is about a grid live width, as shown in figure 10.
See also Fig. 2 and Fig. 5, first conductive pattern 282, second conductive pattern 284 be all over against shading matrix layer 24, and the width of first conductive pattern 282, second conductive pattern 284 is less than the width of the ruling of shading matrix layer 24.Be that conductive thread a is over against the ruling of shading matrix layer 24, and the width of conductive thread a is smaller or equal to the width of ruling, do not influence the light effect that in colorama resistance layer 26 zones so that first conductive pattern 282, second conductive pattern 284 cover the surface of shading matrix layer 24, and guarantee first conductive pattern 282 and second conductive pattern, 284 monolithic conductives of space insulation.In other embodiments, see also Fig. 6 and Fig. 7, the width of first conductive pattern 282, second conductive pattern 284 can equal the ruling of shading matrix layer 24.The width wider width shown in Figure 2 relatively of such first conductive pattern 282, second conductive pattern 284, even conductive grid is wideer and opaque, can be sheltered from by shading matrix layer 24, so the user can not see conductive grid in use yet, therefore can not influence the user and experience.
Conducting bridge 286 can be to be coated with conductive material again and to obtain by impression, also begins to realize by the mode of silk-screen or inkjet printing conductive ink, below describes respectively.
Please consult Fig. 2 again, in one embodiment, conducting bridge 286 comprises the connecting portion that is embedded on insulation course 29 2862 and is arranged on connecting portion 2862 two ends and penetrates two of insulation course 29 and runs through 2864, two in portion and run through portion 2864 and be electrically connected on two adjacent second conductive units 2842 respectively.
Connecting portion 2862 is positioned at insulation course 29 away from a side of shading matrix layer 24.Connecting portion 2862 is conductive grid.The basic grid of conductive grid can be the regular grid figure, as rectangle, rhombus or regular hexagon; Also can be irregular grid.Conductive grid comprises cross one another conductive thread.For satisfying visually-clear, namely naked eyes are invisible, and the width of conductive thread is 0.2 micron~5 microns, and conductive thread intersects to form mesh node mutually, and the distance between the two adjacent mesh nodes is 10 microns~500 microns.
Run through portion 2864 and penetrate insulation course 29 and extend to the second conductive pattern unit 2842 to be electrically connected on two adjacent second conductive units 2842 of second conductive pattern 284 respectively from the side of insulation course 29 away from shading matrix layer 24, make the mesh lines of conducting bridge 286 and the second corresponding conductive pattern 284 be connected.At least two conductive thread a in corresponding second conductive pattern 284 of conducting bridge 286 cross-over connections are to guarantee electrically the validity of overlap joint (if broken string wherein, but another still conducting).
The thickness of insulation course 29 is 1 micron~5 microns.The material of insulation course 29 can be ultraviolet-curing resin, visible-light curing resin or heat reactive resin.
Conducting bridge 286 in embodiment illustrated in fig. 2 can be by the grid conducting bridge of disposable impression arch, also can obtain the consent of the mode elder generation formation conducting block of consent with exposure imaging, impression forms the lattice portion groove again, removes consent at last and once insert conductive material formation to have connecting portion 2862 and be arranged on the conducting bridge 286 that portion 2864 is run through at two of connecting portion 2862 two ends.
See also Fig. 5 to Fig. 7, in these three embodiment, conducting bridge 286 is to form by silk-screen or inkjet printing electrically conducting transparent ink.Insulation course 29 comprises a plurality of collets 292 that cover on first conductive pattern 282.Conducting bridge 286 is crossed on the collets 292, and the two ends of conducting bridge 286 link to each other with two second conductive patterns 284 at interval and realize being electrically connected, and second conductive pattern 284 directly is not electrically connected with first conductive pattern 282, and described conducting bridge 286 and conducting block 292 all can select skill with transparent or transparent conductive material according to the precision of silk-screen or ink-jet.
When adopting disposable method for stamping to obtain conducting bridge 286, the manufacturing process of optical filter box 200 is as follows:
(1) on glass baseplate, at first carries out plasma (Plasma) and handle, remove the dirty of glass surface, and make surface ionization, the cohesive force of increase and chromatic photoresist and shading matrix.
(2) be coated with/plate the shading matrix material at the whole face in glass baseplate surface, wherein the shading matrix material is black UV glue or crome metal, if the shading matrix material is black UV glue, then adopts exposure-developing technique, the shading matrix material in chromatic photoresist zone is removed, obtained the shading matrix layer; If the shading matrix material is crome metal, then coating one deck photoresist is removed the shading matrix material in chromatic photoresist zone again through overexposure-development-etching technique earlier, obtains the shading matrix layer;
(3) whole metal cladding or be coated with the layer of metal conductive ink and solidify again;
(4) coating photoresist utilizes exposure-development-etching technique to obtain the tinsel layer of required conductive pattern at the shading matrix layer;
(5) plate/coat the R/G/B chromatic photoresist in the corresponding region gradation then, obtain the colorama resistance layer.
(6) be coated with layer of transparent UV glue again as insulation course on the surface of above-mentioned tinsel layer, impress and be cured with the impression block corresponding with required bridging structure, here needing to carry out contraposition handles, make the protuberance at mould place of corresponding bridging two ends conducting block press to penetrate bright UV glue and be connected with second conductive pattern of corresponding intervals, obtain the groove nested with the structure of putting up a bridge;
(7) filled conductive material and being cured in the above-mentioned groove structure, conductive material is metal simple-substance or alloy, carbon nano-tube, Graphene, organic conductive macromolecule or ITO.
When adopting exposure imaging to obtain the consent of the mode elder generation formation conducting block of consent, impression forms the lattice portion groove again, removes consent at last and once inserts conductive material formation when obtaining conducting bridge 286, and the manufacturing process of optical filter box 200 is as follows:
(1) on glass baseplate, at first carries out Plasma and handle, remove the dirty of glass surface, and make surface ionization, the cohesive force of increase and chromatic photoresist and BM;
(2) being coated with/plating BM(BM at the whole face in glass baseplate surface is black UV glue or crome metal), if BM is black UV glue, then adopt exposure-developing technique, the BM in chromatic photoresist zone is removed; If BM is crome metal, then earlier coating one deck photoresist is removed the BM in chromatic photoresist zone again through overexposure-development-etching technique;
(3) whole metal cladding or be coated with the layer of metal conductive ink and solidify again;
(4) coating photoresist utilizes exposure-development-etching technique to obtain the tinsel layer of required conductive pattern at the BM layer;
(5) plate/coat the R/G/B chromatic photoresist in the corresponding region gradation;
(6) be coated with photoresist layer again on the surface of above-mentioned tinsel layer, and utilize mask plate that photoresist layer is exposed, develops, obtain photoresist respectively in two conducting block corresponding positions of follow-up conducting bridge and cover layer;
(7) to described have photoresist cover the layer the conductive thread laminar surface be coated with layer of transparent UV glue again as insulation course, impress and be cured with the impression block corresponding with required bridging structure, here need to carry out contraposition and handle, make grid two ends and the photoresist of conducting bridge cover and layer be connected;
(8) described photoresist is covered layer and removed, to form the conducting block groove that is communicated with the second corresponding conductive pattern and conduction bridging surface mesh ruling;
(9) filled conductive material and solidifying in described bridging grid wire grooves and the described conducting block groove, obtain being communicated with the conduction bridging of corresponding adjacent two conductive units of second conductive pattern, conductive material is metal simple-substance or alloy, carbon nano-tube, Graphene, organic conductive macromolecule or ITO.
When adopting electrically conducting transparent printing ink as conducting bridge 286, optical filter box 200 manufacturing process are as follows:
(1) on glass baseplate, at first carries out Plasma and handle, remove the dirty of glass surface, and make surface ionization, increase cohesive force follow-up and chromatic photoresist and BM;
(2) being coated with/plating BM(BM at the whole face in glass baseplate surface is black UV glue or crome metal), if BM is black UV glue, then adopt exposure-developing technique, the BM in chromatic photoresist zone is removed; If BM is crome metal, then earlier coating one deck photoresist is removed the BM in chromatic photoresist zone again through overexposure-development-etching technique;
(3) whole metal cladding or be coated with the layer of metal conductive ink and solidify (present embodiment can adopt argent) again;
(4) coating photoresist utilizes exposure-development-etching technique to obtain the tinsel layer of required conductive pattern at the BM layer;
(5) plate/coat the R/G/B chromatic photoresist in the corresponding region gradation;
(6) adopt inkjet printing or screen printing technique to cover the layer of transparent insulation course in needs bridging zone;
(7) adopt inkjet printing or screen printing technique to cover the layer of transparent conductive ink as bridging at above-mentioned transparent insulating layer, make bridge two ends second conductive pattern at interval realize being electrically connected, and be not communicated with first conductive pattern, its material of electrically conducting transparent ink is electrically conducting transparent macromolecular material or nano level metal particle, and it is transparent to solidify after-vision.
Above-mentioned optical filter box and touch display screen also have following advantage:
(1) optical filter box can be realized touch control operation and optical filter function simultaneously, as an indispensable assembly in the display screen, when being used for display screen, can directly make display screen have touch controllable function, need not again at display screen assembling one touch-screen, not only be conducive to reduce the thickness of electronic product, also saved material and assembly cost simultaneously greatly.
(3) carefully arrange to visually-clear or over against the shading matrix ruling owing to the conductive grid silk thread, so the user can not see conductive grid in use.
(4) material selected for use of conductive pattern only expands all suitable conductive materials to transparent material by tradition, when conductive pattern is selected metal material for use, can reduce resistance greatly to reduce the energy consumption of touch-screen.
(5) above-mentioned conductive pattern adopts the metal grill structure, adopts imprint process to make, compared to the technology of traditional ITO film as conductive layer, mesh shape can one step forming, and technology is simple, does not need expensive device such as sputter, evaporation, the yield height is fit to large tracts of land, production in enormous quantities.And if with metal replacement ITO, material cost reduces greatly, owing to do not need to use etching technics, can not cause the waste of conductive, and environmentally friendly.
The above embodiment has only expressed several embodiment of the present invention, and it describes comparatively concrete and detailed, but can not therefore be interpreted as the restriction to claim of the present invention.Should be pointed out that for the person of ordinary skill of the art without departing from the inventive concept of the premise, can also make some distortion and improvement, these all belong to protection scope of the present invention.Therefore, the protection domain of patent of the present invention should be as the criterion with claims.

Claims (10)

1. an optical filter box is characterized in that, comprising:
Glass baseplate;
The shading matrix layer is arranged on the described glass baseplate, and described shading matrix layer comprises cross one another ruling, described ruling intersection shaping grid;
The colorama resistance layer comprises a plurality of chromatic photoresist unit that are arranged on the described glass baseplate and are arranged in described grid;
Conductive layer, be arranged on described shading matrix layer away from a side of described glass baseplate, described conductive layer comprises first conductive pattern and at least two second conductive pattern unit, described first conductive pattern and the second conductive pattern unit are latticed conductive grid, comprise cross one another conductive thread, described at least two second conductive pattern unit are positioned at the relative both sides of described first conductive pattern, described first conductive pattern forms induction structure with space, at least two second conductive pattern unit, and the projection of described conductive thread on described shading matrix layer all drops on the ruling of described shading matrix layer; And
Conducting bridge, stride and be located on described first conductive pattern, described conducting bridge is electrically connected adjacent with described first conductive pattern and is positioned at described second conductive unit of the relative both sides of described first conductive pattern, mutually insulated between described conducting bridge and described first conductive pattern, described conducting bridge and the described second conductive pattern unit that is positioned at described conducting bridge two ends be common to constitute second conductive pattern, and described first leads pattern and second conductive pattern is arranged in a crossed manner.
2. optical filter box according to claim 1, it is characterized in that, further comprise insulation course, described insulation course covers described conductive layer, described conducting bridge is embedded in the described insulation course, described conducting bridge comprises connecting portion and is separately positioned on two of described connecting portion two ends and runs through portion, described connecting portion is in the side of described insulation course away from described shading matrix layer, and the described portion of running through extends to the described second conductive pattern unit to be electrically connected on two described second adjacent conductive units respectively from described insulation course away from a side of described shading matrix layer.
3. optical filter box according to claim 2 is characterized in that, the described portion of running through overlaps two conductive threads on the described second conductive pattern unit at least.
4. optical filter box according to claim 2 is characterized in that, the projection of described connecting portion on described shading matrix layer all drops on the ruling of described shading matrix layer.
5. optical filter box according to claim 1, it is characterized in that, further comprise insulation course, described insulation course comprises a plurality of collets that cover on described first conductive pattern, and described conducting bridge is crossed on the described collets and is electrically connected adjacent with described first conductive pattern and is positioned at two second conductive units of the relative both sides of described first conductive pattern.
6. optical filter box according to claim 1 is characterized in that, the thickness of described colorama resistance layer is more than or equal to the thickness of described shading matrix layer.
7. optical filter box according to claim 1 is characterized in that, the width of described conductive thread is 0.2 micron~5 microns, and conductive thread intersects to form mesh node mutually, and the distance between the two adjacent mesh nodes is 10 microns~500 microns.
8. optical filter box according to claim 7 is characterized in that, the width of described conductive thread is not more than the width of described ruling.
9. optical filter box according to claim 1 is characterized in that, described conductive grid comprises a plurality of grid cells, and each grid cell is accommodated a chromatic photoresist unit at least.
10. a touch display screen is characterized in that, comprises the TFT electrode, Liquid Crystal Module, optical filter box and the last polaroid that stack gradually, and described optical filter box is as any described optical filter box of claim 1~9.
CN 201310169278 2013-05-09 2013-05-09 Optical filter assembly and touch display assembly Withdrawn CN103235667A (en)

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CN201310329243.5A CN103399666B (en) 2013-05-09 2013-07-31 Optical filter box and touch display module
CN201320464185.2U CN203386175U (en) 2013-05-09 2013-07-31 Optical filter assembly and touch display assembly

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CN103235667A (en) * 2013-05-09 2013-08-07 南昌欧菲光显示技术有限公司 Optical filter assembly and touch display assembly

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CN100462806C (en) * 2007-12-06 2009-02-18 京东方科技集团股份有限公司 Colorful filter and its making method and LCD device
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CN103425327A (en) * 2013-03-30 2013-12-04 南昌欧菲光显示技术有限公司 Touch display screen and optical filter module thereof
CN103235667A (en) * 2013-05-09 2013-08-07 南昌欧菲光显示技术有限公司 Optical filter assembly and touch display assembly

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CN107526459A (en) * 2016-06-20 2017-12-29 蓝思科技股份有限公司 The preparation method that touch screen function is realized using full silver paste pattern printing processing procedure
CN111384136A (en) * 2020-02-27 2020-07-07 武汉天马微电子有限公司 Display panel and display device
CN111384136B (en) * 2020-02-27 2022-08-16 武汉天马微电子有限公司 Display panel and display device

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