CN103317825B - UV makeup method of holographic dedicated plate - Google Patents
UV makeup method of holographic dedicated plate Download PDFInfo
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- CN103317825B CN103317825B CN201310177004.2A CN201310177004A CN103317825B CN 103317825 B CN103317825 B CN 103317825B CN 201310177004 A CN201310177004 A CN 201310177004A CN 103317825 B CN103317825 B CN 103317825B
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- 238000000034 method Methods 0.000 title claims abstract description 38
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims abstract description 84
- 229910052759 nickel Inorganic materials 0.000 claims abstract description 42
- 239000011247 coating layer Substances 0.000 claims abstract description 4
- 239000011248 coating agent Substances 0.000 claims description 52
- 238000000576 coating method Methods 0.000 claims description 52
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 claims description 33
- 239000010410 layer Substances 0.000 claims description 29
- 238000002360 preparation method Methods 0.000 claims description 19
- 239000011159 matrix material Substances 0.000 claims description 18
- 238000001125 extrusion Methods 0.000 claims description 11
- 239000004745 nonwoven fabric Substances 0.000 claims description 11
- 238000012856 packing Methods 0.000 claims description 11
- 238000004049 embossing Methods 0.000 claims description 8
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 claims description 6
- 229940043232 butyl acetate Drugs 0.000 claims description 6
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 claims description 6
- 230000000694 effects Effects 0.000 claims description 5
- 239000002184 metal Substances 0.000 claims description 4
- 229910052751 metal Inorganic materials 0.000 claims description 4
- 239000008199 coating composition Substances 0.000 claims description 3
- LRPWSMQGXLANTG-UHFFFAOYSA-M iodogallium Chemical compound I[Ga] LRPWSMQGXLANTG-UHFFFAOYSA-M 0.000 claims description 2
- 238000010030 laminating Methods 0.000 claims description 2
- 229920003229 poly(methyl methacrylate) Polymers 0.000 claims description 2
- 239000004926 polymethyl methacrylate Substances 0.000 claims description 2
- 238000011017 operating method Methods 0.000 claims 1
- 239000000758 substrate Substances 0.000 abstract description 6
- 238000004519 manufacturing process Methods 0.000 abstract description 5
- 239000003973 paint Substances 0.000 abstract 5
- 238000004140 cleaning Methods 0.000 abstract 1
- 230000001678 irradiating effect Effects 0.000 abstract 1
- 238000001465 metallisation Methods 0.000 abstract 1
- 238000005096 rolling process Methods 0.000 abstract 1
- 238000003825 pressing Methods 0.000 description 7
- 238000010586 diagram Methods 0.000 description 6
- 238000005516 engineering process Methods 0.000 description 6
- 238000005323 electroforming Methods 0.000 description 5
- 238000000016 photochemical curing Methods 0.000 description 5
- 239000011347 resin Substances 0.000 description 5
- 229920005989 resin Polymers 0.000 description 5
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 4
- 238000007639 printing Methods 0.000 description 4
- 229910052709 silver Inorganic materials 0.000 description 4
- 239000004332 silver Substances 0.000 description 4
- 238000004587 chromatography analysis Methods 0.000 description 3
- 238000005242 forging Methods 0.000 description 3
- 238000001093 holography Methods 0.000 description 3
- 238000005286 illumination Methods 0.000 description 3
- 239000007921 spray Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 2
- 239000002985 plastic film Substances 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 238000001723 curing Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 239000002345 surface coating layer Substances 0.000 description 1
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- Holo Graphy (AREA)
Abstract
The invention provides a makeup method of a holographic dedicated mother plate. The makeup method comprises the following steps: 1. designing and making a location film and an exposure film according to mother plate patterns; 2. adding a UV paint A between a transparent substrate and a holographic nickel plate or a holographic film, rolling to uniform, jointing the exposure film, irradiating light, stripping and cleaning; 3. adding a UV paint B between a small-width transparent substrate and a holographic unit nickel plate or a holographic film, repeating the processes after addition of the UV paint A in the step 2; 4.on an operating table successively placing the location film, a transparent large plate (with the surface of the pattern up) and a transparent small plate (with the surface of the pattern down), wherein the transparent large plate and the transparent small plate being in counterpoint jointing; 5. adding the UV paint A below the transparent small plates and then repeating the processes after the addition of the UV paint A in the step 2; 6.obtaining a broad-width holographic transparent large plate; 7. obtaining the broad-width holographic dedicated mother plate through metallization processing on a coating layer surface. The makeup method of the holographic dedicated mother plate has the advantages of high precision and no generation of bubbles and clearances, and the broad-width seamless holographic large plate which is suitable for production is prepared through repeating makeup of holographic dedicated pattern small plates.
Description
technical field
The present invention relates to a kind of keyline layout method of laser hologram special edition, particularly a kind of keyline layout method applying the laser hologram special edition of photocuring technology.
Background technology
One of most important operation of moulding holographic technology makes holographic mold pressing mother matrix, in embossed holographic product high volume production process, requires that holographic mold pressing mother matrix has larger size, i.e. wide-width holographic embossing master plate.The preparation method of prior art wide cut contour forging template is imprinted directly on plastic sheet by makeup machine by the hologram in undersized contour forging template, electroforming is carried out after being metallized by plastic sheet again, obtain wide-width holographic embossing master plate, after casting, obtain wide cut contour forging template.Because undersized special image version can leave version seam when splicing, the existence of these edition seam can cause the discontinuous of picture and text, has a strong impact on the quality of product.
The special holographic mother be jointly made up of special edition pattern and background patterns, there are following three kinds of preparation methods at present: a kind of is the method adopting traditional-handwork layout, namely in background patterns version, the position hollow out that special pattern plate is set will be needed in advance, first background patterns version is attached in roller, again special pattern plate is attached to hollow part, by heating pressurization, the information of background version and special edition is all transferred on film, carry out spray through the method for industry public office more silver metallized, electroforming forms the special holographic mother of wide cut.Another kind is the method utilizing plate joggling apparatus, namely special pattern plate is first attached on die head, information in background patterns version is first replicated on PC resin plate by the method for mold pressing, by the method for concora crush heat transfer the information on special pattern plate being transferred to one by one respectively has on the PC resin plate of background version information again, then carry out spray by the known method of industry silver metallized, electroforming forms the special holographic mother of wide cut.Also has a kind of method adopting UV layout, some regions are divided into by substrate surface, first on the first area of base material, print UV dope layer, and UV dope layer and the holographic nickel version or holographic film with background patterns or special edition pattern are fitted, illumination is penetrated and is peeled off, chromatography UV dope layer on the second region again, and the dope layer of non-photocuring and the holographic nickel version or holographic film with special edition pattern are fitted, illumination is penetrated and is peeled off, finally to copying have powerful connections pattern and special edition pattern or only have the substrate surface of special edition pattern to metallize, obtain the wide-width holographic embossing master plate being formed wide-width holographic embossing master plate by special edition pattern and background patterns or be made up of special edition pattern.
Traditional-handwork layout not only inefficiency, and position precision is not high, and easily there is gap in the place that special edition pattern and background patterns are connected, cause gap location both not have special edition pattern also there is no background patterns, affect follow-up printing effect and anti-counterfeiting performance thereof; And machine layout, if special edition pattern area is comparatively large, because thermal source and pressure are difficult to control evenly, be difficult to consistent with the local quality at edge in the middle of special edition pattern, cause the special edition pattern shifted to there is certain defect; Above-mentioned UV layout mode, UV dope layer and holographic nickel version or holographic film process of fitting is not easy to operate, easily produces bubble and space and makes holographic information transfer effect imperfect, and the positioning printing of UV dope layer relates to forme makes, chromatography precision, the problems such as complex operation.
Summary of the invention
For solving above Problems existing, the object of this invention is to provide a kind of keyline layout method applying the holographic special edition of photocuring technology, the holographic special edition obtained by the method, holographic lines is clear, seamless, and simple to operation, with low cost.
For realizing above object, technical scheme of the present invention is: the UV keyline layout method of holographic special edition, comprises the steps:
1. according to the pattern that will make mother matrix, design and make the film of corresponding size, film comprises the location film and exposure film;
2. the unit special edition needed for layout and background patterns version quantity, produce unit special nickel version and the background patterns nickel version of requirement with electrocasting;
3. according to the pattern dimension that will make mother matrix, a transparent base is cut into transparent large plate (1-0); According to the size of the holographic special nickel version of unit, prepare the transparent platelet (2-0) of respective numbers;
4. copy background patterns version information: by background patterns version or holographic film with pattern upward mode tile fixing on the operational platform, one photocureable coating A is dripped in background patterns version or holographic film head end, again transparent large plate (1-0) is fitted on background patterns version or holographic film to process face-down manner, with rubber roll by photocureable coating A equably extrusion packing between transparent large plate (1-0) and background patterns version or holographic film
A laminating exposure film on transparent large plate (1-0), utilizes printer or UV-LED light source, photocureable coating is solidified, background patterns version or holographic film are separated with dope layer, make background patterns information reproduction on the dope layer of transparent large plate (1-0) again,
Dip in ethyl acetate with non-woven fabrics or Butylacetate falls uncured photocureable coating A, obtain the transparent large plate (1-1) with background holographic information;
5. range site holographic special nickel version copied cells holographic transparent film: by holographic for unit special nickel version with pattern upward mode tile fixing on the operational platform, one photocureable coating B is dripped at unit holographic special nickel version head end, again transparent platelet (2-0) is fitted in the holographic special nickel version of unit to process face-down manner, with small sized cot with by photocureable coating B equably extrusion packing between the holographic special nickel version of transparent platelet (2-0) and unit
To fit on transparent platelet (2-0) more corresponding exposure film, utilize printer or UV-LED light source, photocureable coating B is solidified, unit special nickel version is separated with dope layer, make special edition information reproduction on the dope layer of transparent platelet (2-0),
Dip in ethyl acetate with non-woven fabrics or Butylacetate falls uncured photocureable coating B, obtain the transparent platelet (2-1) with special edition hologram pattern information;
6. the transparent large plate (1-1) that special edition pattern location on unit holographic transparent film is copied to transparent large plate (1-1) upper: on the operational platform, place alignment film sheet successively, pattern is supine, there is background holographic information,
Again the transparent platelet (2-1) with special edition hologram pattern information is fitted with the ventricumbent mode of pattern and transparent large plate (1-1) contraposition,
Below transparent platelet (2-1), drip appropriate photocureable coating A, with small sized cot by photocureable coating A equably extrusion packing between transparent platelet (2-1) and transparent large plate (1-1),
To fit on transparent platelet (2-1) more corresponding exposure film, utilize printer or UV-LED light source, photocureable coating A is solidified, transparent platelet (2-1) is separated with dope layer, make special edition information reproduction on the dope layer of transparent large plate (1-1)
Dip in ethyl acetate with non-woven fabrics or butyl acetate washes uncured A type UV coating lightly, obtain the large plate of wide cut holographic transparent (1-2) be made up of background patterns and special edition pattern;
7. metalized is carried out to transparent large plate (1-2) surface of copying have powerful connections pattern and special edition pattern, forms metal level, obtain the wide-width holographic embossing master plate (3-1) be made up of background patterns and special edition pattern,
When the unit special edition quantity of required splicing is more than one, repeat step 5., 6., or 5. located by step by the special edition pattern of multiple unit special nickel plate simultaneously and copy on a transparent platelet (2-1), more 6., 7. carry out operating the wide-width holographic embossing master plate (3-1) obtaining being made up of background patterns and special edition pattern according to step.
In above-mentioned preparation method, described photocureable coating A and B viscosity 25 DEG C time is 80 ~ 1000 mPaS, preferably 100 ~ 200 mPaS.
In above-mentioned preparation method, photocureable coating B adopts the UV coating with release effect.
In above-mentioned preparation method, step 4., the thickness of photocureable coating layer 5. and 6. preferably 0.4 ~ 2 μm; During special pattern if any small size, the thickness of photocureable coating layer can be 1 ~ 8 μm.
The step (4) of above-mentioned preparation method, in (5) and (6), should guarantee can not have bubble and space between the two when holographic nickel plate or holographic film and dope layer are fitted.
In above-mentioned preparation method, printer adopts 2KW Iodine gallium light printer, and copying time is 3 ~ 20 seconds, is preferably 5 ~ 10 seconds; UV-LED light source adopts 365nm 1000mW/cm2 line source, and irradiation time is 1 ~ 5 second.
In above-mentioned preparation method, the pressure preferably 4 ~ 8Kg/cm2 of step rubber roll 4..
In above-mentioned preparation method, transparent base can be PC or PMMA or PET, and thickness is 0.1 ~ 0.2mm.
In above-mentioned preparation method, the 7. described metalized of step is: at the large plate of wide cut holographic transparent (1-2) be made up of background patterns and special edition pattern upper spray one deck silver, substrate surface is conducted electricity, then on silver layer electroforming last layer nickel, then nickel version and transparent base are peeled off.
In above-mentioned preparation method, the mode that rubber roll flattens with circle pressure circle or circle extrudes full width coating composition.
The UV keyline layout method of the holographic special edition of the present invention, by merging photocuring technology and film printing down technique, according to the designing requirement of mother matrix, first make and there is the transparent large plate of background patterns and there is the transparent platelet of special edition pattern, then according to the different qualities of photocureable coating B and photocureable coating A, utilize the location film and exposure film, being copied to complete for special edition pattern on transparent platelet location easily has on the transparent large plate of background patterns, again the transparent substrate surface copying have powerful connections pattern and special edition pattern is metallized, the holographic special edition of the wide cut obtaining being made up of background patterns and special edition pattern.
Preparation method of the present invention, systematically make use of photocuring technology, uv equipment, reference utilizes film printing down technique, can ensure that the precision of layout is high, special edition pattern can accurately positioning splicing be in background patterns, and obviously, special edition pattern and background patterns stitching portion exist the problems such as interval to the layout seam that common keyline layout method can be avoided to be easy to occur.Due to employing is the mode extruding full width coating composition with rubber roll with circle pressure circle or circle pressing mode, avoids generation bubble and gap, eliminates trouble and the expense of plate making, also there is not chromatography precision problem.By locating the cooperation of the film and exposure film, the high accuracy of layout can be ensured.Also by repeatedly splicing, the little version of special for holography pattern is spliced into the large version of wide cut seamless holographic being suitable for production.
Present invention uses the photocureable coating B with release effect, can cheap, quick, easy mode produce " the transparent mother matrix " with hologram pattern, realize the UV layout mode of " film transferring film ", avoid repeatedly expense and the time of electroforming repeatedly on the one hand, on the other hand due to the transparency of adopted base material, both be beneficial to positioning action, and can select according to actual needs again to carry out illumination curing, handled easily from the front of film or reverse side.
accompanying drawing explanation
Fig. 1 is the pattern schematic diagram with background patterns holographic mold pressing mother matrix.
Fig. 2 is the pattern schematic diagram of the holographic mold pressing mother matrix splicing have powerful connections pattern and special edition pattern.
Fig. 3 is the schematic diagram that in Fig. 2 background patterns manufacturing process, pattern copies.
Fig. 4 is the schematic diagram that unit holographic transparent film figure copies.
Fig. 5 is the schematic diagram that in Fig. 2 special edition pattern production process, pattern copies.
Fig. 6 is the pattern schematic diagram of the holographic mold pressing mother matrix be made up of special edition pattern.
Detailed description of the invention
embodiment 1
It is the special mother matrix of holography that special edition pattern is spliced in the present invention in background patterns shown in Fig. 2, its preparation method is: as shown in Fig. 3,4,5, first according to the pattern that will make mother matrix, design and make the film (comprise exposure film 4-1 and locate film 4-2) of corresponding size; According to the pattern dimension that will make mother matrix, by the transparent PET resin plate of a thickness at 0.1 ~ 0.2mm, cut into transparent large plate 1-0;
According to the size of the holographic special nickel version of unit, prepare the transparent platelet 2-0 of respective numbers;
By background patterns nickel version with pattern upward mode tile fixing on the operational platform, drip one appropriate photocureable coating A at background patterns nickel version head end, more transparent large plate 1-0 fitted in background patterns version, with rubber roll with 4 ~ 6kg/cm to process face-down manner
2pressure by photocureable coating A equably extrusion packing between transparent large plate 1-0 and background patterns version; Fit an exposure film 4-1 again on transparent large plate 1-0, utilizes the printer 3 of 2KW power, expose 8 seconds, photocureable coating A is solidified, background patterns version is separated with dope layer, make background patterns information reproduction on the dope layer of transparent large plate 1-0; Dip in ethyl acetate with non-woven fabrics and wash uncured UV coating lightly, obtain the transparent large plate 1-1 with background holographic information;
By holographic for unit special nickel version with pattern upward mode tile fixing on the operational platform, one appropriate photocureable coating B is dripped at unit holographic special nickel version head end, again transparent platelet 2-0 is fitted in the holographic special nickel version of unit, with small sized cot with 4 ~ 6kg/cm to process face-down manner
2pressure by photocureable coating B equably extrusion packing between the holographic special nickel version of transparent platelet 2-0 and unit; Fit corresponding exposure film 4-1 again on transparent platelet 2-0, utilizes UV LED line source to irradiate 2 seconds, photocureable coating B is solidified, unit special nickel version is separated with dope layer, makes special edition information reproduction on the dope layer of transparent platelet 2-0; Dip in ethyl acetate with non-woven fabrics and wash uncured UV coating lightly, obtain the transparent platelet 2-1 with special edition hologram pattern information;
On the operational platform, place alignment film sheet 4-2 successively, there is the transparent large plate 1-1(pattern plane of background holographic information upward); Again the transparent platelet 2-1 with special edition hologram pattern information is fitted with the ventricumbent mode of pattern and transparent large plate 1-1 contraposition; Below transparent platelet 2-1, drip appropriate photocureable coating A, with small sized cot with the pressure of 4 ~ 6kg/cm2 by photocureable coating A equably extrusion packing between transparent platelet 2-1 and transparent large plate 1-1; Fit corresponding exposure film 4-1 again on transparent platelet 2-1, utilizes UV LED line source to irradiate 2 seconds, photocureable coating A is solidified, is separated by transparent platelet 2-1 with dope layer, makes special edition information reproduction on the dope layer of transparent large plate 1-1; Dip in ethyl acetate with non-woven fabrics and wash uncured UV coating lightly, obtain the large plate of wide cut holographic transparent be made up of background patterns and special edition pattern; Metalized is carried out to transparent large plate surface, forms metal level, the holographic special mother matrix of the wide cut obtaining being made up of background patterns and special edition pattern.
embodiment 2
Be the special mother matrix of holography be made up of small size special edition pattern shown in Fig. 6, its preparation method is substantially the same manner as Example 1;
First according to the pattern that will make mother matrix, design and make the film (comprise exposure film 4-1 and locate film 4-2) of corresponding size; According to the pattern dimension that will make mother matrix, by the transparent PET resin plate of a thickness at 0.1 ~ 0.2mm, cut into transparent large plate 1-0; According to the size of the holographic special nickel version of unit, prepare the transparent platelet 2-0 of respective numbers;
By holographic for unit special nickel version with pattern upward mode tile fixing on the operational platform, one appropriate photocureable coating B is dripped at unit holographic special nickel version head end, again transparent platelet 2-0 is fitted in the holographic special nickel version of unit, with small sized cot with 4 ~ 6kg/cm to process face-down manner
2pressure by photocureable coating B equably extrusion packing between the holographic special nickel version of transparent platelet 2-0 and unit; Fit corresponding exposure film 4-1 again on transparent platelet 2-0, UV LED line source is utilized to irradiate 2 seconds, photocureable coating B is solidified, unit special nickel version is separated with dope layer, dip in ethyl acetate with non-woven fabrics and wash uncured UV coating lightly, obtain the transparent platelet 2-1 with special edition hologram pattern information;
On the operational platform, place alignment film sheet 4-2 successively, transparent large plate 1-0(treated side upward); Again the transparent platelet 2-1 with special edition hologram pattern information is fitted with the ventricumbent mode of pattern and transparent large plate 1-0 contraposition; Appropriate photocureable coating A is dripped, with small sized cot with 4 ~ 6kg/cm below transparent platelet 2-1
2pressure by photocureable coating A equably extrusion packing between transparent platelet 2-1 and transparent large plate 1-0; Fit corresponding exposure film 4-1 again on transparent platelet 2-1, utilizes UV LED line source to irradiate 2 seconds, photocureable coating A is solidified, is separated by transparent platelet 2-1 with dope layer, dip in ethyl acetate wash uncured UV coating lightly with non-woven fabrics;
Can constantly repeat above step, then carry out the operation of next special edition pattern splicing, directly cause and obtain by the complete wide cut holographic transparent resin plate be stitched together of special edition pattern; Metalized is carried out to transparent large plate surface coating layer, forms metal level, the holographic special edition of the wide cut obtaining being made up of special edition pattern.
Be more than specific embodiments of the invention; technical scheme of the present invention is described further; but these embodiments are also not used to limit the scope of the invention; every equivalence not departing from the present invention's design is implemented or is equal to substitute; as adopted different masterplates, different transparent bases, different UV coating; or the splicing of different special edition pattern, include within protection scope of the present invention.
Claims (7)
1. a UV keyline layout method for holographic special edition, is characterized in that operating procedure is as follows:
1. according to the pattern that will make mother matrix, design and make the film of corresponding size, film comprises the location film and exposure film;
2. the unit special edition needed for layout and background patterns version quantity, produce unit special nickel version and the background patterns nickel version of requirement with electrocasting;
3. according to the pattern dimension that will make mother matrix, a transparent base is cut into transparent large plate (1-0); According to the size of the holographic special nickel version of unit, prepare the transparent platelet (2-0) of respective numbers;
4. copy background patterns version information: by background patterns version or holographic film with pattern upward mode tile fixing on the operational platform, one photocureable coating A is dripped in background patterns version or holographic film head end, again transparent large plate (1-0) is fitted on background patterns version or holographic film to process face-down manner, with rubber roll by photocureable coating A equably extrusion packing between transparent large plate (1-0) and background patterns version or holographic film
A laminating exposure film on transparent large plate (1-0) again, utilize printer or UV-LED line source, photocureable coating is solidified, background patterns version or holographic film are separated with dope layer, make background patterns information reproduction on the dope layer of transparent large plate (1-0)
Dip in ethyl acetate with non-woven fabrics or Butylacetate falls uncured photocureable coating A, obtain the transparent large plate (1-1) with background holographic information;
5. range site holographic special nickel version copied cells holographic transparent film: by holographic for unit special nickel version with pattern upward mode tile fixing on the operational platform, the photocureable coating B together with release effect is dripped at unit holographic special nickel version head end, again transparent platelet (2-0) is fitted in the holographic special nickel version of unit to process face-down manner, with small sized cot with by photocureable coating B equably extrusion packing between the holographic special nickel version of transparent platelet (2-0) and unit
To fit on transparent platelet (2-0) more corresponding exposure film, utilize printer or UV-LED line source, photocureable coating B is solidified, unit special nickel version is separated with dope layer, make special edition information reproduction on the dope layer of transparent platelet (2-0),
Dip in ethyl acetate with non-woven fabrics or Butylacetate falls uncured photocureable coating B, obtain the transparent platelet (2-1) with special edition hologram pattern information;
6. the transparent large plate (1-1) that special edition pattern location on unit holographic transparent film is copied to transparent large plate (1-1) upper: on the operational platform, place alignment film sheet successively, pattern is supine, there is background holographic information,
Again the transparent platelet (2-1) with special edition hologram pattern information is fitted with the ventricumbent mode of pattern and transparent large plate (1-1) contraposition; Below transparent platelet (2-1), drip appropriate photocureable coating A, with small sized cot by photocureable coating A equably extrusion packing between transparent platelet (2-1) and transparent large plate (1-1),
To fit on transparent platelet (2-1) more corresponding exposure film, utilize printer or UV-LED line source, photocureable coating A is solidified, transparent platelet (2-1) is separated with dope layer, make special edition information reproduction on the dope layer of transparent large plate (1-1)
Dip in ethyl acetate with non-woven fabrics or butyl acetate washes uncured photocureable coating A lightly, obtain the large plate of wide cut holographic transparent (1-2) be made up of background patterns and special edition pattern;
7. metalized is carried out to transparent large plate (1-2) surface of copying have powerful connections pattern and special edition pattern, forms metal level, obtain the wide-width holographic embossing master plate (3-1) be made up of background patterns and special edition pattern,
When the unit special edition quantity of required splicing is more than one, repeat step 5., 6., or 5. located by step by the special edition pattern of multiple unit special nickel plate simultaneously and copy on a transparent platelet (2-1), more 6., 7. carry out operating the wide-width holographic embossing master plate (3-1) obtaining being made up of background patterns and special edition pattern according to step.
2. according to the UV keyline layout method of the holographic special edition described in claim 1, it is characterized in that: described photocureable coating A and B viscosity 25 DEG C time is 80 ~ 1000 mPaS.
3. according to the UV keyline layout method of the holographic special edition described in claim 1, it is characterized in that: in above-mentioned preparation method, step 4., the thickness of photocureable coating layer 5. and 6. preferably 0.4 ~ 2 μm.
4. according to the UV keyline layout method of the holographic special edition described in claim 1, it is characterized in that: in above-mentioned preparation method, printer adopts 2KW Iodine gallium light printer, and copying time is 3 ~ 20 seconds; UV-LED line source adopts 365nm 1000mW/cm2 line source, and irradiation time is 1 ~ 5 second.
5. according to the UV keyline layout method of the holographic special edition described in claim 1, it is characterized in that: in above-mentioned preparation method, the pressure preferably 4 ~ 8Kg/cm2 of step rubber roll 4..
6. according to the UV keyline layout method of the holographic special edition described in claim 1, it is characterized in that: in above-mentioned preparation method, transparent base is PC or PMMA or PET, and thickness is 0.1 ~ 0.2mm.
7. according to the UV keyline layout method of the holographic special edition described in claim 1, it is characterized in that: in above-mentioned preparation method, the mode that rubber roll flattens with circle pressure circle or circle extrudes full width coating composition.
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| CN201310177004.2A CN103317825B (en) | 2013-05-14 | 2013-05-14 | UV makeup method of holographic dedicated plate |
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| CN201310177004.2A CN103317825B (en) | 2013-05-14 | 2013-05-14 | UV makeup method of holographic dedicated plate |
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| CN103317825B true CN103317825B (en) | 2015-03-04 |
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| CN103691694B (en) * | 2014-01-26 | 2016-01-27 | 湖北兴龙包装材料有限责任公司 | UV layout cleaning plant and method of operating |
| CN104149481B (en) * | 2014-07-22 | 2016-06-22 | 天津沃特激光防伪标识有限公司 | A kind of laser holographic anti-counterfeiting film nickel plate keyline layout method |
| CN105774192B (en) * | 2016-04-29 | 2019-06-25 | 珠海市瑞明科技有限公司 | A kind of manufacturing system and method for seamless forging printing plate roller |
| CN106739428B (en) * | 2016-12-07 | 2018-12-14 | 武汉华工图像技术开发有限公司 | A kind of production method of holography metal molding mother matrix |
| CN107627714B (en) * | 2017-09-14 | 2019-06-21 | 广德美好包装科技有限公司 | A kind of food pack plate making technique |
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