CN103309539A - Capacitive touch screen provided with in OGS structure and fabrication method of capacitive touch screen - Google Patents
Capacitive touch screen provided with in OGS structure and fabrication method of capacitive touch screen Download PDFInfo
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- CN103309539A CN103309539A CN201310247213XA CN201310247213A CN103309539A CN 103309539 A CN103309539 A CN 103309539A CN 201310247213X A CN201310247213X A CN 201310247213XA CN 201310247213 A CN201310247213 A CN 201310247213A CN 103309539 A CN103309539 A CN 103309539A
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Abstract
The invention discloses a capacitive touch screen provided with in an OGS (On Glass Solution) structure, which comprises a substrate, an electrode layer arranged on the surface of the substrate, a protection layer arranged on the electrode layer, and a plurality of electric bridges covering the protection layer at intervals, wherein the electrode layer comprises a first electrode extending in a first direction; the first electrode comprises a plurality of first conduction blocks arranged at intervals; and each electric bridge extends into through holes formed at a minimum distance part between the two adjacent first conduction blocks in the first direction, and allows the two adjacent first conduction blocks to be electrically connected. According to the capacitive touch screen in provided with the OGS structure, no photosensitive adhesive is required to be used for making an insulation block bridge when inductive capacitance is formed, so that an insulation block made of the photosensitive adhesive is avoided, and the transmittance is higher in compared comparison with the traditional capacitive touch screen in provided with the OGS structure. The invention further discloses a fabrication method of the capacitive touch screen in provided with the OGS structure.
Description
Technical field
The present invention relates to the display device field, particularly capacitive touch screen of a kind of OGS structure and preparation method thereof.
Background technology
Capacitive touch screen is widely used in various information as a kind of emerging information input mode and shows product, as touch-screen mobile phone, GPS navigation system etc.
OGS(One Glass Solution) technology; exactly touch-control glass (Touch Sensor) and cover glass (Cover Glass) are integrated; that is plate the ITO conductive layer in general cover glass inboard; make this monolithic glass not only possess intensity, the security of cover glass, also have touch controllable function simultaneously concurrently.
The capacitive touch screen of traditional OGS structure is done the mode that collets are built bridge in the point of crossing of X/Y with photoresists, forms inductance capacitance.Yet the capacitive touch screen of this OGS structure has been owing to increased the collets of photoresists materials, thereby reduced the transmitance of capacitive touch screen.
Summary of the invention
Based on this, be necessary capacitive touch screen that provides the higher OGS structure of a kind of transmitance and preparation method thereof.
A kind of capacitive touch screen of OGS structure comprises substrate, is arranged on the electrode layer on the described substrate surface, a plurality of electric bridges that are arranged on the protective seam on the described electrode layer and cover the interval setting on the described protective seam;
Described electrode layer comprises along first electrode of first direction extension and second electrode that extends along second direction, described first electrode and described second electrode are insulated from each other, first direction and second direction are not parallel, described first electrode comprises first conducting block that a plurality of intervals arrange, described second electrode comprises a plurality of second conducting blocks, and a plurality of described second conducting blocks insulate along the second direction electrical connection and along first direction;
Two adjacent on first direction first conducting blocks are provided with through hole respectively at the bee-line place of first direction, described electric bridge extend to two adjacent on the first direction first conducting blocks in the through hole that the bee-line place of first direction arranges and described electric bridge will described two adjacent first conducting blocks electrical connections.
In one embodiment, the material of described electric bridge is ITO, Ag, Cu or MOALMO.
In one embodiment, the material of described protective seam is photoresists.
In one embodiment, described photoresists are organic insulator.
In one embodiment, the material of described first electrode and described second electrode is ITO.
A kind of preparation method of capacitive touch screen of OGS structure comprises the steps:
Substrate is provided, and forms the preceding conductive layer of conduction at described substrate;
Conductive layer before described is carried out etching, form conductive layer, described electrode layer comprises along first electrode of first direction extension and second electrode that extends along second direction, described first electrode and described second electrode are insulated from each other, first direction and second direction are not parallel, described first electrode comprises first conducting block that a plurality of intervals arrange, and described second electrode comprises a plurality of second conducting blocks, and a plurality of described second conducting blocks insulate along the second direction electrical connection and along first direction;
Form protective seam at described conductive layer;
Two adjacent on first direction first conducting blocks form through hole respectively at the bee-line place of first direction;
Two adjacent on first direction first conducting blocks form electric bridge in the through hole that the bee-line place of first direction arranges, and described electric bridge covers on the described protective seam and described electric bridge is electrically connected described two adjacent first conducting blocks.
In one embodiment, the material of described electric bridge is ITO, Ag, Cu or MOALMO.
In one embodiment, the material of described protective seam is photoresists.
In one embodiment, described photoresists are organic insulator.
In one embodiment, the material of described first electrode and described second electrode is ITO.
The capacitive touch screen of this OGS structure is finished the electrical connection of two adjacent on first direction first conducting blocks by extending at the electric bridge of two adjacent on the first direction first conducting blocks in the through hole that the bee-line place of first direction arranges, thereby forms inductance capacitance.The capacitive touch screen of this OGS structure need not made collets with photoresists and build bridge when forming inductance capacitance, thereby has avoided increasing the collets of photoresists material, and with respect to the capacitive touch screen of traditional OGS structure, transmitance is higher.
Description of drawings
Fig. 1 is the diagrammatic cross-section of the capacitive touch screen of an embodiment;
The synoptic diagram of the electrode layer of the capacitive touch screen that Fig. 2 shows for Fig. 1;
Fig. 3 is the part-structure synoptic diagram in the front of capacitive touch screen as shown in Figure 1.
Embodiment:
For the ease of understanding the present invention, with reference to relevant drawings the present invention is described more fully below.Provided preferred embodiment of the present invention in the accompanying drawing.But the present invention can realize with many different forms, be not limited to embodiment described herein.On the contrary, provide the purpose of these embodiment be make the understanding of disclosure of the present invention comprehensively thorough more.
Need to prove that when element is called as " being fixed in " another element, can directly can there be element placed in the middle in it on another element or also.When an element is considered to " connection " another element, it can be to be directly connected to another element or may to have element placed in the middle simultaneously.Term as used herein " vertical ", " level ", " left side ", " right side " and similar statement are just for illustrative purposes.
Unless otherwise defined, the employed all technology of this paper are identical with the implication that belongs to those skilled in the art's common sense of the present invention with scientific terminology.Employed term is not intended to be restriction the present invention just in order to describe the purpose of specific embodiment in instructions of the present invention herein.Term as used herein " and/or " comprise one or more relevant Listed Items arbitrarily with all combinations.
As shown in Figure 1, the capacitive touch screen of the OGS structure of an embodiment comprises substrate 10, is arranged on substrate 10 lip-deep electrode layers 20, is arranged on the protective seam 30 on the electrode layer 20 and covers a plurality of electric bridges 40 that the interval on the protective seam 30 arranges.
The material of substrate 10 is ultra-thin glass.
In conjunction with Fig. 2, electrode layer 20 comprises along first electrode 22 of first direction extension and second electrode 24 that extends along second direction.
The material of first electrode 22 and second electrode 24 is ITO.
In conjunction with Fig. 2 and Fig. 3, on first direction adjacent two first conducting blocks 220 be provided with respectively at the bee-line place of first direction 222, one electric bridges 40 of through hole extend to two adjacent on the first direction first conducting blocks 220 in the through hole 222 that the bee-line place of first direction arranges and electric bridge 40 with adjacent two first conducting blocks, 220 electrical connections.
The material of electric bridge 40 is ITO, Ag, Cu or MOALMO.
The material of protective seam 30 is photoresists.Photoresists can be organic insulator.
The thickness of protective seam 30 is 1 μ m～3 μ m.
The capacitive touch screen of this OGS structure is finished the electrical connection of two adjacent on first direction first conducting blocks 220 by extending at the electric bridge 40 of two adjacent on the first direction first conducting blocks 220 in the through hole 222 that the bee-line place of first direction arranges, thereby forms inductance capacitance.The capacitive touch screen of this OGS structure need not made collets with photoresists and build bridge when forming inductance capacitance, thereby has avoided increasing the collets of photoresists material, and with respect to the capacitive touch screen of traditional OGS structure, transmitance is higher.
The preparation method of the capacitive touch screen of the above-mentioned OGS structure of one embodiment comprises the steps:
S10, provide substrate 10, and form the preceding conductive layer of conduction at substrate 10.
The material of substrate 10 is ultra-thin glass.
Can pass through method conductive layer before substrate 10 forms layer of even of evaporation, electrochemical deposition.
S20, preceding conductive layer is carried out etching, form conductive layer 20.
Concrete lithographic method can be decided as the case may be, and generally speaking, dry etching or wet etching all can.
In conjunction with Fig. 2, electrode layer 20 comprises along first electrode 22 of first direction extension and second electrode 24 that extends along second direction.
The material of first electrode 22 and second electrode 24 is ITO.
S20, form protective seams 30 at conductive layer 20.
The material of protective seam 30 is photoresists.Photoresists can be organic insulator.
The thickness of protective seam 30 is 1 μ m～3 μ m.
Can directly apply photoresists at conductive layer 20, layer 30 is protected after the exposure.
S30, two adjacent on first direction first conducting blocks 220 form through hole 222 respectively at the bee-line place of first direction.
In conjunction with Fig. 3, two adjacent on first direction first conducting blocks 220 are formed with through hole 222 respectively at the bee-line place of first direction.
S40, two adjacent on first direction first conducting blocks 220 form electric bridge 40 at through hole 222 places that the bee-line place of first direction arranges, and electric bridge 40 covers on the protective seam 30 and electric bridge 30 is electrically connected two adjacent first conducting blocks 220.
In conjunction with Fig. 3, electric bridge 40 extend to two adjacent on the first direction first conducting blocks 220 in the through hole 222 that the bee-line place of first direction arranges and electric bridge 40 with adjacent two first conducting blocks, 220 electrical connections.
The material of electric bridge 40 is ITO, Ag, Cu or MOALMO.
In the present embodiment, after substrate is finished black ink and ITO figure, with whole OC(insulation photoresists) cover above, and to whole OC(insulation photoresists) borehole (can be the hole of different shape), and by exposure, the gold-tinted technology of developing is OC(insulation photoresists with holes) cover.Next be exactly to be made in OC(insulation photoresists with electric bridge (ITO, Ag, Cu, MOALMO) conductive material), realize capacitive sensing by piercing into tapping.General ITO and MOALMO electric bridge also are to get on vacuum magnetic-control sputtering.
The above embodiment has only expressed one or more embodiments of the present invention, and it describes comparatively concrete and detailed, but can not therefore be interpreted as the restriction to claim of the present invention.Should be pointed out that for the person of ordinary skill of the art without departing from the inventive concept of the premise, can also make some distortion and improvement, these all belong to protection scope of the present invention.Therefore, the protection domain of patent of the present invention should be as the criterion with claims.
Claims (10)
1. the capacitive touch screen of an OGS structure is characterized in that, comprises substrate, is arranged on the electrode layer on the described substrate surface, a plurality of electric bridges that are arranged on the protective seam on the described electrode layer and cover the interval setting on the described protective seam;
Described electrode layer comprises along first electrode of first direction extension and second electrode that extends along second direction, described first electrode and described second electrode are insulated from each other, first direction and second direction are not parallel, described first electrode comprises first conducting block that a plurality of intervals arrange, described second electrode comprises a plurality of second conducting blocks, and a plurality of described second conducting blocks insulate along the second direction electrical connection and along first direction;
Two adjacent on first direction first conducting blocks are provided with through hole respectively at the bee-line place of first direction, described electric bridge extend to two adjacent on the first direction first conducting blocks in the through hole that the bee-line place of first direction arranges and described electric bridge will described two adjacent first conducting blocks electrical connections.
2. the capacitive touch screen of OGS structure according to claim 1 is characterized in that, the material of described electric bridge is ITO, Ag, Cu or MOALMO.
3. the capacitive touch screen of OGS structure according to claim 1 is characterized in that, the material of described protective seam is photoresists.
4. the capacitive touch screen of OGS structure according to claim 3 is characterized in that, described photoresists are organic insulator.
5. capacitive touch screen as claimed in claim 1 is characterized in that, the material of described first electrode and described second electrode is ITO.
6. the preparation method of the capacitive touch screen of an OGS structure is characterized in that, comprises the steps:
Substrate is provided, and forms the preceding conductive layer of conduction at described substrate;
Conductive layer before described is carried out etching, form conductive layer, described electrode layer comprises along first electrode of first direction extension and second electrode that extends along second direction, described first electrode and described second electrode are insulated from each other, first direction and second direction are not parallel, described first electrode comprises first conducting block that a plurality of intervals arrange, and described second electrode comprises a plurality of second conducting blocks, and a plurality of described second conducting blocks insulate along the second direction electrical connection and along first direction;
Form protective seam at described conductive layer;
Two adjacent on first direction first conducting blocks form through hole respectively at the bee-line place of first direction;
Two adjacent on first direction first conducting blocks form electric bridge in the through hole that the bee-line place of first direction arranges, and described electric bridge covers on the described protective seam and described electric bridge is electrically connected described two adjacent first conducting blocks.
7. the preparation method of the capacitive touch screen of OGS structure according to claim 6 is characterized in that, the material of described electric bridge is ITO, Ag, Cu or MOALMO.
8. the preparation method of the capacitive touch screen of OGS structure according to claim 6 is characterized in that, the material of described protective seam is photoresists.
9. the preparation method of the capacitive touch screen of OGS structure according to claim 8 is characterized in that, described photoresists are organic insulator.
10. the preparation method of capacitive touch screen as claimed in claim 6 is characterized in that, the material of described first electrode and described second electrode is ITO.
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| CN201310247213XA CN103309539A (en) | 2013-06-20 | 2013-06-20 | Capacitive touch screen provided with in OGS structure and fabrication method of capacitive touch screen |
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| CN201310247213XA CN103309539A (en) | 2013-06-20 | 2013-06-20 | Capacitive touch screen provided with in OGS structure and fabrication method of capacitive touch screen |
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Cited By (6)
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| CN105022537A (en) * | 2014-04-30 | 2015-11-04 | 株式会社和冠 | Position detecting device |
| CN105677122A (en) * | 2016-01-12 | 2016-06-15 | 安徽方兴科技股份有限公司 | Manufacturing method of GG structure touch screen function chip |
| WO2016127608A1 (en) * | 2015-02-09 | 2016-08-18 | 京东方科技集团股份有限公司 | Ogs touchscreen and manufacturing method therefor, and ogs touch device |
| CN109725765A (en) * | 2017-10-30 | 2019-05-07 | 乐金显示有限公司 | Display equipment and its manufacturing method with integrated touch screen |
| CN110149765A (en) * | 2019-04-26 | 2019-08-20 | 信利光电股份有限公司 | A method of making protective film layer on the circuit substrate |
| CN110167280A (en) * | 2019-04-26 | 2019-08-23 | 信利光电股份有限公司 | A method of making protective film layer on the circuit substrate |
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| CN110149765A (en) * | 2019-04-26 | 2019-08-20 | 信利光电股份有限公司 | A method of making protective film layer on the circuit substrate |
| CN110167280A (en) * | 2019-04-26 | 2019-08-23 | 信利光电股份有限公司 | A method of making protective film layer on the circuit substrate |
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Effective date of registration: 20160127 Address after: 443005 No. 38, Dalian Road, Yichang, Hubei Applicant after: YICHANG NANBO DISPLAY DEVICES CO., LTD. Address before: 518000 Guangdong Province, Shenzhen high tech Zone of Nanshan District City, No. three North Road, CSG Electronics Building Applicant before: Shenzhen Nanbo Welllight Conductive Coating Co., Ltd. |
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Application publication date: 20130918 |