CN102866816A - Capacitive touch sensor, manufacturing method thereof, touch screen and display device - Google Patents
Capacitive touch sensor, manufacturing method thereof, touch screen and display device Download PDFInfo
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- CN102866816A CN102866816A CN2012103219505A CN201210321950A CN102866816A CN 102866816 A CN102866816 A CN 102866816A CN 2012103219505 A CN2012103219505 A CN 2012103219505A CN 201210321950 A CN201210321950 A CN 201210321950A CN 102866816 A CN102866816 A CN 102866816A
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Abstract
The invention discloses a manufacturing method of a capacitive touch sensor. The manufacturing method comprises the following steps of: manufacturing a drive electrode pattern layer by using a transparent conductive layer pattern mask and a photoresist; manufacturing an insulating layer by using an insulating layer mask and a photoresist; manufacturing a sensing electrode pattern layer by using the transparent conductive layer pattern mask and a photoresist which has the stickability opposite to that of the drive electrode pattern layer, wherein the drive electrode pattern layer and the sensing electrode pattern layer are located at different sides of a plane where the insulating layer is located; and manufacturing an insulating protection layer by using the insulating layer mask and a photoresist. The invention further discloses a capacitive touch sensor, a touch screen and a display device. As the insulating layer and the insulating protection layer are manufactured by using the same mask, the consumption number of masks is reduced, and then, the manufacturing cost of the touch screen is reduced. Furthermore, the sensing electrode pattern layer and the drive electrode pattern layer which are provided with transparent conductive layer patterns are respectively formed at different sides of the insulating layer, so that electric field lines from a drive electrode to a sensing electrode are enabled to be more divergent, and the sensitive touch degree is increased.
Description
Technical Field
The invention relates to the technical field of touch control, in particular to a capacitive touch sensor and a manufacturing process thereof, and a touch screen and a display device comprising the capacitive touch sensor.
Background
Capacitive Touch Panel (Touch screen) has been gradually developed into the mainstream Touch screen due to its good performance and user experience. Capacitive Touch sensors are key components of capacitive Touch screens. The structure of the existing capacitive touch sensor generally includes: the transparent insulating substrate, the first layer made on the transparent insulating substrate is a metal layer, the second layer is an insulating layer, the third layer is an ITO (nanometer indium tin metal oxide) pattern layer, and the fourth layer is an insulating protective layer. Fig. 1 is a schematic diagram of a triangular ITO pattern layer, in which a pattern formed by a plurality of white triangles is a sensing electrode pattern (or driving electrode pattern) of the ITO pattern layer, and a pattern formed by a plurality of triangles filled with oblique lines is a driving electrode pattern (or sensing electrode pattern) of the ITO pattern layer. Wherein the ITO pattern is in contact with the metal layer to realize conduction. In order to ensure the conduction of the ITO pattern, it is necessary to ensure that the conductive connection between the ITO pattern and the metal layer is not covered by the insulating layer. In the process of manufacturing the capacitive touch sensor, 4 masks are required. Wherein, the metal layer uses a Mask, the insulating layer uses a Mask, the ITO pattern layer uses a Mask, and the insulating protective layer uses a Mask. The Mask is high in design cost, so that the existing manufacturing process of the capacitive touch screen has the problem of high manufacturing cost.
Disclosure of Invention
The invention aims to provide a capacitive touch sensor, a manufacturing method thereof, a touch screen comprising the capacitive touch sensor and a display device, and aims to solve the problem that the existing capacitive touch sensor is high in manufacturing cost.
The purpose of the invention is realized by the following technical scheme:
a method of making a capacitive touch sensor, comprising:
forming a driving electrode pattern layer by using a transparent conductive layer pattern mask and photoresist through a composition process;
forming an insulating layer through a patterning process using an insulating layer mask and a photoresist;
forming a sensing electrode pattern layer by using the transparent conductive layer pattern mask and photoresist with opposite adhesive property to the driving electrode pattern layer through a composition process; the driving electrode pattern layer and the induction electrode pattern layer are positioned on the opposite sides of the plane of the insulating layer;
manufacturing an insulating protective layer by using the insulating layer mask and photoresist with the same adhesive property as the insulating layer;
the method further comprises the following steps:
manufacturing a metal layer on a transparent insulating substrate by using a metal layer mask and photoresist, wherein the metal layer comprises a bridging line of a display area; the driving electrode pattern layer is formed on the metal layer;
or,
manufacturing a metal layer on the driving electrode pattern layer by using a metal layer mask and photoresist; the insulating layer is manufactured on the metal layer;
or,
manufacturing a metal layer on the insulating layer by using a metal layer mask and photoresist; the induction electrode pattern layer is formed on the metal layer.
A method of making a capacitive touch sensor, comprising:
forming an induction electrode pattern layer by using a transparent conductive layer pattern mask and photoresist through a composition process;
manufacturing an insulating layer by using an insulating layer mask and photoresist;
forming a driving electrode pattern layer by using the transparent conductive layer pattern mask and photoresist with opposite adhesive property to the sensing electrode pattern layer through a composition process; the induction electrode pattern layer and the driving electrode pattern layer are positioned on the opposite sides of the plane where the insulating layer is positioned;
manufacturing an insulating protective layer by using the insulating layer mask and photoresist with the same adhesive property as the insulating layer;
the method further comprises the following steps:
manufacturing a metal layer on a transparent insulating substrate by using a metal layer mask and photoresist, wherein the metal layer comprises a bridging line of a display area; the induction electrode pattern layer is formed on the metal layer;
or,
manufacturing a metal layer on the induction electrode pattern layer by using a metal layer mask and photoresist; the insulating layer is manufactured on the metal layer;
or,
manufacturing a metal layer on the insulating layer by using a metal layer mask and photoresist; the driving electrode pattern layer is formed over the metal layer.
A capacitive touch sensor, comprising:
the display device comprises a transparent insulating substrate, a metal layer made of a metal layer mask and photoresist, a driving electrode pattern layer formed by a composition process by using the transparent conducting layer pattern mask and the photoresist, an insulating layer made of the insulating layer mask and the photoresist, an induction electrode pattern layer made of the transparent conducting layer pattern mask and the photoresist with opposite adhesive property to the driving electrode pattern layer, and an insulating protective layer made of the insulating layer mask and the photoresist with the same adhesive property as the insulating layer;
the transparent insulating substrate is manufactured at the bottommost layer;
the driving electrode pattern layer and the induction electrode pattern layer are formed on the opposite sides of the plane of the insulating layer;
the metal layer is manufactured on the transparent insulating substrate, or is manufactured on the driving electrode pattern layer, or is manufactured on the insulating layer;
the insulating protection layer is manufactured on the uppermost layer.
The capacitive touch sensor has the following structure:
a transparent insulating substrate formed on the bottom layer;
the first layer on the transparent insulating substrate is the metal layer, the second layer is the driving electrode pattern layer, the third layer is the insulating layer, the fourth layer is the sensing electrode pattern layer, and the fifth layer is the insulating protective layer.
The capacitive touch sensor has the following structure:
a transparent insulating substrate formed on the bottom layer;
the first layer on the transparent insulating substrate is the driving electrode pattern layer, the second layer is the metal layer, the third layer is the insulating layer, the fourth layer is the induction electrode pattern layer, and the fifth layer is the insulating protective layer.
The capacitive touch sensor has the following structure:
a transparent insulating substrate formed on the bottom layer;
the first layer on the transparent insulating substrate is the driving electrode pattern layer, the second layer is the insulating layer, the third layer is the metal layer, the fourth layer is the induction electrode pattern layer, and the fifth layer is the insulating protective layer.
The capacitive touch sensor has the following structure:
a transparent insulating substrate formed on the bottom layer;
the first layer on the transparent insulating substrate is the metal layer, the second layer is the induction electrode pattern layer, the third layer is the insulating layer, the fourth layer is the driving electrode pattern layer, and the fifth layer is the insulating protective layer.
The capacitive touch sensor has the following structure:
a transparent insulating substrate formed on the bottom layer;
the first layer on the transparent insulating substrate is the induction electrode pattern layer, the second layer is the metal layer, the third layer is the insulating layer, the fourth layer is the driving electrode pattern layer, and the fifth layer is the insulating protective layer.
The capacitive touch sensor has the following structure:
a transparent insulating substrate formed on the bottom layer;
the first layer on the transparent insulating substrate is the induction electrode pattern layer, the second layer is the insulating layer, the third layer is the metal layer, the fourth layer is the driving electrode pattern layer, and the fifth layer is the insulating protective layer.
A touch screen comprising a capacitive touch sensor as described in any of the above.
A display device comprising any of the capacitive touch sensors described above.
According to the capacitive touch sensor and the manufacturing method thereof, and the touch screen and the display device comprising the capacitive touch sensor, the insulating layer and the insulating protective layer are manufactured by using the same mask, so that the number of masks is reduced, and the manufacturing cost of the capacitive touch screen is further reduced.
Drawings
FIG. 1 is a schematic diagram of a conventional ITO pattern layer;
FIG. 2 is a flow chart of a method provided by one embodiment of the present invention;
FIG. 3 is a flow chart of a method provided by another embodiment of the present invention;
FIG. 4 is a flow chart of a method provided by yet another embodiment of the present invention;
fig. 5 is a schematic structural diagram of a first capacitive touch sensor according to an embodiment of the present invention;
fig. 6 is a schematic structural diagram of a second capacitive touch sensor according to an embodiment of the present invention;
fig. 7 is a schematic structural diagram of a third capacitive touch sensor according to an embodiment of the present invention;
fig. 8 is a schematic structural diagram of a fourth capacitive touch sensor according to an embodiment of the present invention;
fig. 9 is a schematic structural diagram of a fifth capacitive touch sensor according to an embodiment of the present invention;
fig. 10 is a schematic structural diagram of a sixth capacitive touch sensor according to an embodiment of the present invention;
fig. 11 is a schematic structural diagram of a seventh capacitive touch sensor according to an embodiment of the present invention;
fig. 12 is a partial top view of a capacitive touch sensor according to an embodiment of the invention.
Detailed Description
In order to reduce the manufacturing cost of the capacitive touch sensor, an embodiment of the present invention provides a manufacturing method of a capacitive touch sensor, where the method is shown in fig. 2, and specifically includes the following operations:
and S201, forming a driving electrode pattern layer by using a transparent conductive layer pattern mask and photoresist through a composition process.
S202, manufacturing an insulating layer by using an insulating layer mask and photoresist.
S203, forming a sensing electrode pattern layer by using the transparent conductive layer pattern mask and photoresist with opposite adhesive property to the driving electrode pattern layer through a patterning process,
wherein, the driving electrode pattern and the sensing electrode pattern form a complete transparent conductive layer pattern.
The driving electrode pattern layer and the sensing electrode pattern layer are positioned on the opposite side of the plane of the insulating layer. The opposite side means that when the capacitive touch sensor is horizontally placed, the driving electrode pattern layer is positioned above the insulating layer, and the sensing electrode pattern layer is positioned below the insulating layer; alternatively, the driving electrode pattern layer is located below the insulating layer, and the sensing electrode pattern layer is located above the insulating layer.
The sensing electrode pattern layer is formed using a negative paste if the driving electrode pattern layer is formed using a positive paste, and the sensing electrode pattern layer is formed using a negative paste if the driving electrode pattern layer is formed using a negative paste.
And S204, manufacturing an insulating protective layer by using the insulating layer mask and photoresist with the same adhesive property as the insulating layer.
The method further comprises any one of the following steps:
s205a, manufacturing a metal layer on the transparent insulating substrate by using a metal layer mask and photoresist, wherein the metal layer comprises a bridge connector of the display area; the driving electrode pattern layer is formed on the metal layer.
S205b, forming a metal layer on the driving electrode pattern layer by using a metal layer mask and a photoresist, wherein the metal layer includes a bridge line of the display region; the insulating layer is formed on the metal layer.
S205c, forming a metal layer on the insulating layer by using a metal layer mask and a photoresist, wherein the metal layer includes a bridge line in the display region; the induction electrode pattern layer is formed on the metal layer.
In order to reduce the manufacturing cost of the capacitive touch sensor, an embodiment of the present invention further provides a manufacturing method of the capacitive touch sensor, where the method is shown in fig. 3, and specifically includes the following operations:
and S301, forming a sensing electrode pattern layer by using a transparent conductive layer pattern mask and photoresist through a patterning process.
S302, manufacturing an insulating layer by using an insulating layer mask and photoresist.
And S303, forming a driving electrode pattern layer by using the transparent conductive layer pattern mask and photoresist with opposite adhesive property to the sensing electrode pattern layer through a composition process.
Wherein, the driving electrode pattern and the sensing electrode pattern form a complete transparent conductive layer pattern.
The sensing electrode pattern layer and the driving electrode pattern layer are positioned on the opposite sides of the plane of the insulating layer.
If the sensing electrode pattern layer is formed using a positive paste, the driving electrode pattern layer is formed using a negative paste, and if the sensing electrode pattern layer is formed using a negative paste, the driving electrode pattern layer is formed using a negative paste.
And S304, manufacturing an insulating protective layer by using the insulating layer mask and photoresist with the same adhesive property as the insulating layer.
The method further comprises any one of the following steps:
s305a, manufacturing a metal layer on the transparent insulating substrate by using a metal layer mask and photoresist, wherein the metal layer comprises bridge connection lines of the display area; the induction electrode pattern layer is formed on the metal layer.
S305b, forming a metal layer on the sensing electrode pattern layer by using a metal layer mask and a photoresist, wherein the metal layer includes a bridge line of the display region; the insulating layer is formed on the metal layer.
S305c, forming a metal layer on the insulating layer by using a metal layer mask and a photoresist, wherein the metal layer includes a bridge line of the display region; the pattern driving electrode pattern layer is formed on the metal layer.
It should be noted that: in the embodiment of the present invention, the patterning process generally includes process steps such as exposure, etching, and stripping, and generally is a process of depositing a material required for forming a pattern (of course, the forming manner of the material on the substrate is not limited to one deposition, and may be other manners), and then performing the patterning process. The material of the driving electrode pattern layer and the sensing electrode pattern layer is a transparent conductive material, such as ITO, but is not limited thereto, and may also be AZO (Al-doped zinc aluminum oxide), FTO (F-doped tin oxide), and the like. The material of the insulating layer and the insulating protection layer can be organic insulating layer material or inorganic insulating layer material, such as silicon nitride, acryl resin and epoxy resin.
The metal layer further comprises a circuit line in the pad area, and in the insulating layer pattern forming step, the transparent conducting layer pattern (driving electrode pattern or induction electrode pattern) in the pad area is exposed, so that the Bonding of an IC (driving chip) is facilitated.
In the conventional capacitive touch sensor manufacturing process, a Mask is usually used to form a complete transparent conductive layer pattern on a layer. In the method for manufacturing the capacitive touch sensor according to the embodiments of the present invention, the driving electrode pattern layer and the sensing electrode pattern layer of the transparent conductive layer pattern are formed in two layers, and the driving electrode pattern layer and the sensing electrode pattern layer are formed on different sides of the plane where the insulating layer is located, so that the mutual capacitance between the driving electrode and the sensing electrode is reduced. The driving electrode pattern layer and the sensing electrode pattern layer are respectively formed by positive glue and negative glue by using the same Mask, and the accuracy of the negative glue is lower, so that the size of a transparent conducting layer pattern (a sensing electrode pattern or a driving electrode pattern) formed in one direction by using the negative glue is reduced, the transparent conducting layer patterns in the two directions cannot be vertically aligned at the edge, electric field lines from the driving electrode to the sensing electrode are more divergent, and more electric field lines can be sucked away by finger touch, so that the sensitive touch control degree is increased. In addition, the driving electrode pattern layer and the sensing electrode pattern layer of the transparent conducting layer pattern are formed by using the same Mask and positive glue and negative glue respectively, and the obtained transparent conducting layer pattern is different from the existing transparent conducting layer pattern, so that the insulating layer and the insulating protective layer can be manufactured by using the same Mask, the using number of the masks is reduced, and the production cost is further reduced.
In the method provided by the above embodiments of the present invention, when the insulating layer is formed, it is ensured that the connection portion between the metal layer and the driving electrode pattern layer or the sensing electrode pattern layer is not completely covered by the insulating layer. Thereby ensuring the pattern conduction of the transparent conductive layer.
In the method provided by each of the above embodiments of the present invention, as a preferred implementation manner, the metal layer, the insulating layer, and the insulating protection layer are all made of positive photoresist.
The method provided by the invention is suitable for the manufacturing process of any touch sensor which realizes induction through the transparent conducting layer. For example, Add On (external) touch sensors, On Cell (external) touch sensors, In Cell (internal) touch sensors, and the like, which are implemented by a transparent conductive layer, and GTG (Glass To Glass, double Glass) touch sensors, One Glass solution (single Glass) touch sensors, and the like, which are implemented by a transparent conductive layer.
The following describes in detail a method for manufacturing a capacitive touch sensor according to an embodiment of the present invention, with a process for manufacturing an Add On GTG touch sensor as a specific application embodiment.
Fig. 4 shows a method for manufacturing a capacitive touch sensor, which is implemented by the following operations:
s401, manufacturing a first layer (metal layer) on a transparent insulating substrate (such as glass and plastic), wherein the metal layer comprises bridge connection lines of a display area;
specifically, Mask1 (metal layer Mask) is adopted, and positive glue is used for manufacturing metal bridges, metal routing wires and the like;
s402, manufacturing a second layer (a driving electrode pattern layer);
specifically, Mask2 (transparent conducting layer pattern Mask) is adopted, and positive photoresist is subjected to a composition process to form a driving electrode pattern;
s403, manufacturing a third layer (an insulating layer);
specifically, a Mask3 (insulating layer Mask) is adopted, positive glue is used for manufacturing an insulating layer, and the pattern of the insulating layer is a pressing pattern;
when the insulating layer is manufactured, the connection part of the metal layer and the transparent conducting layer pattern is not completely covered by the insulating layer so as to ensure the conduction of the transparent conducting layer pattern;
s404, manufacturing a fourth layer (an induction electrode pattern layer);
specifically, a Mask2 is adopted, and a negative glue is subjected to a composition process to form an induction electrode pattern;
s405, manufacturing a fifth layer (an insulating protective layer);
specifically, Mask3 is adopted, and positive glue is used for manufacturing an insulating protective layer;
s406, cutting the sensor;
s407, pressing an FPC (flexible circuit connecting plate);
and S408, attaching the Cover Lens (Cover plate) to complete the manufacture of the touch sensor.
In the above process, the driving electrode pattern layer may be formed using a negative paste, and the sensing electrode pattern layer may be formed using a positive paste. Alternatively, the sensing electrode pattern layer may be formed on the second layer, and the driving electrode pattern layer may be formed on the fourth layer.
In the above process, a metal layer is first formed on the transparent insulating substrate. The advantage of fabricating the metal layer first is that the metal is not oxidized in the Bonding area of the FPC.
The existing capacitive touch sensor manufacturing method needs 4 masks, and the capacitive touch sensor manufactured in the processing process can be manufactured only by 3 masks, so that the development cost of the masks is reduced, and the manufacturing cost of the capacitive touch sensor is further reduced. In addition, because the driving electrode pattern layer and the induction electrode pattern layer of the transparent conducting layer pattern are respectively formed on the different sides of the plane where the insulating layer is located, electric field lines from the driving electrode to the induction electrode are more divergent, so that more electric field lines can be absorbed by finger touch, and the sensitive touch degree is increased.
The invention also provides a capacitive touch sensor which has the structure shown in figures 5-10, and the specific implementation structure is as follows:
the display device comprises a transparent insulating substrate 1, a metal layer 2 made of a metal layer mask and photoresist, wherein the metal layer 2 comprises a bridging line of a display area, a driving electrode pattern layer 3 formed by a composition process through the transparent conducting layer pattern mask and the photoresist, an insulating layer 4 made of the insulating layer mask and the photoresist, an induction electrode pattern layer 5 made of the transparent conducting layer pattern mask and the photoresist with opposite glue property to the driving electrode pattern layer 3, and an insulating protection layer 6 made of the insulating layer mask and the photoresist with the same glue property as the insulating layer 4.
Wherein, the transparent insulating substrate 1 is manufactured at the bottommost layer; the driving electrode pattern layer 3 and the sensing electrode pattern layer 5 are formed on the opposite side of the plane of the insulating layer 4; the metal layer 2 is formed on the transparent insulating substrate 1, the driving electrode pattern layer 3, or the insulating layer 4; the insulating passivation layer 6 is formed on the top layer.
The above-mentioned connection between the metal layer 2 and the driving electrode pattern layer 3 or the sensing electrode pattern layer 5 is not completely covered by the insulating layer 4. Thereby ensuring the pattern conduction of the transparent conductive layer.
In the capacitive touch sensor provided by the embodiment of the invention, the driving electrode pattern layer 3 and the sensing electrode pattern layer 5 of the transparent conductive layer are respectively formed on the opposite sides of the insulating layer. Because the accuracy of the negative glue is low, the transparent conducting layer pattern (the driving electrode pattern 3 or the sensing electrode pattern 5) in one direction formed by the negative glue is reduced, so that the transparent conducting layer patterns in the two directions cannot be vertically aligned at the edge, electric field lines from the driving electrode to the sensing electrode are more divergent, and thus, more electric field lines can be sucked away by finger touch, and the sensitive touch control degree is increased. In addition, the transparent conducting layer pattern of the capacitive touch sensor is different from the existing transparent conducting layer pattern, so that the insulating layer 4 and the insulating protection layer 6 can be manufactured by using the same Mask, the using number of masks is reduced, and the production cost of the capacitive touch sensor is further reduced.
In the capacitive touch sensor provided by the embodiment of the invention, the metal layer 2, the insulating layer 4 and the insulating protective layer 6 are preferably made of positive photoresist.
As shown in fig. 5, a first preferred capacitive touch sensor implementation is provided for the present invention. Wherein:
the transparent insulating substrate 1 is manufactured at the bottommost layer; the first layer on the transparent insulating substrate 1 is the metal layer 2, the metal layer 2 includes a bridge line of a display region, the second layer is the driving electrode pattern layer 3, the third layer is the insulating layer 4, the fourth layer is the sensing electrode pattern layer 5, and the fifth layer is the insulating protective layer 6.
A second preferred capacitive touch sensor implementation is provided for the present invention, as shown in fig. 6.
Wherein:
the transparent insulating substrate 1 is manufactured at the bottommost layer; the first layer on the transparent insulating substrate 1 is the driving electrode pattern layer 3, the second layer is the metal layer 2, the metal layer 2 includes a bridge line of a display region, the third layer is the insulating layer 4, the fourth layer is the sensing electrode pattern layer 5, and the fifth layer is the insulating protection layer 6.
A third preferred capacitive touch sensor implementation is provided for the present invention, as shown in fig. 7. Wherein:
the transparent insulating substrate 1 is manufactured at the bottommost layer; the first layer on the transparent insulating substrate 1 is the driving electrode pattern layer 3, the second layer is the insulating layer 4, the third layer is the metal layer 2, the metal layer 2 includes a bridge line of a display region, the fourth layer is the sensing electrode pattern layer 5, and the fifth layer is the insulating protection layer 6.
A fourth preferred capacitive touch sensor implementation is provided for the present invention, as shown in fig. 8. Wherein:
a transparent insulating substrate 1 formed on the bottom layer;
the first layer on the transparent insulating substrate 1 is the metal layer 2, the metal layer 2 comprises a bridge connection line of a display area, the second layer is the induction electrode pattern layer 5, the third layer is the insulating layer 4, the fourth layer is the driving electrode pattern layer 3, and the fifth layer is the insulating protective layer 6.
As shown in fig. 9, a fifth preferred capacitive touch sensor implementation is provided for the present invention. Wherein:
the transparent insulating substrate 1 is manufactured at the bottommost layer; the first layer on the transparent insulating substrate 1 is the above-mentioned sensing electrode pattern layer 5, the second layer is the above-mentioned metal layer 2, the metal layer 2 includes the bridge connection of the display area, the third layer is the above-mentioned insulating layer 4, the fourth layer is the above-mentioned driving electrode pattern layer 3, the fifth layer is the above-mentioned insulating protective layer 6.
A sixth preferred capacitive touch sensor implementation is provided for the present invention, as shown in fig. 10. Wherein:
the transparent insulating substrate 1 is manufactured at the bottommost layer; the first layer on the transparent insulating substrate 1 is the above-mentioned sensing electrode pattern layer 5, the second layer is the above-mentioned insulating layer 4, the third layer is the above-mentioned metal layer 2, the metal layer 2 includes the bridge connection of the display area, the fourth layer is the above-mentioned driving electrode pattern layer 3, the fifth layer is the above-mentioned insulating protective layer 6.
The capacitive touch sensor provided by the invention can be any touch sensor which realizes sensing through a transparent conducting layer. By way of example and not limitation, Add On touch sensors, On Cell touch sensors, In Cell touch sensors, and the like, which implement sensing through a transparent conductive layer, or GTG touch sensors, One Glass solution touch sensors, and the like, which implement sensing through a transparent conductive layer, may be used.
The structure of the capacitive touch sensor provided by the present invention will be described in detail below by taking an Add On GTG touch sensor structure shown in fig. 11 as an example.
In fig. 11, on the transparent insulating substrate 1, the first layer is a metal layer 2, which includes bridge lines of the display area, specifically, a metal bridge and a metal trace;
the second layer is a drive electrode pattern layer 3.
The third layer is an insulating layer 4, wherein the connection between the driving electrode pattern layer 3 and the metal layer 2 and the connection between the sensing electrode pattern layer 5 and the metal layer 2 (not shown in the figure) are not completely covered by the insulating layer 4, so as to ensure the conduction of the transparent conductive layer pattern.
The fourth layer is a sensing electrode pattern layer 5.
The driving electrode pattern 3 and the sensing electrode pattern 5 are formed by the same Mask through a composition process by respectively adopting positive glue and negative glue, and the driving electrode pattern layer 3 and the sensing electrode pattern layer 5 are manufactured on the opposite sides of the insulating layer 4, so that the touch sensitivity is increased.
The fifth layer is an insulating protective layer 6 which is made of Mask for making the insulating layer 4, thereby reducing the use number of Mask.
The sensor cutting device further comprises a flexible circuit connecting plate 7 which is pressed on after the sensor cutting is finished.
Fig. 12 is a schematic partial top view of a capacitive touch sensor according to an embodiment of the invention. For the capacitive touch sensor with the structure shown in fig. 5, 6, and 10, oblique lines in fig. 12 indicate the sensing electrode pattern layer, on the sensing electrode pattern layer, the sensing electrodes are connected by metal traces, and grid lines indicate the driving electrode pattern layer. For the capacitive touch sensor with the structure shown in fig. 7, 8, and 9, oblique lines in fig. 12 indicate a driving electrode pattern layer, on the driving electrode pattern layer, the driving electrodes are connected by metal traces, and grid lines indicate a sensing electrode pattern layer.
It should be noted that the metal layer mentioned above includes bridge lines of the display area, i.e. metal bridges and metal traces, and the metal layer is not mentioned in order to avoid repeated descriptions.
The invention further provides a capacitive touch screen which comprises any one of the capacitive touch sensors.
The invention also provides a display device comprising any one of the capacitive touch sensors.
It will be apparent to those skilled in the art that various changes and modifications may be made in the present invention without departing from the spirit and scope of the invention. Thus, if such modifications and variations of the present invention fall within the scope of the claims of the present invention and their equivalents, the present invention is also intended to include such modifications and variations.
Claims (11)
1. A method of making a capacitive touch sensor, comprising:
forming a driving electrode pattern layer by using a transparent conductive layer pattern mask and photoresist through a composition process;
forming an insulating layer through a patterning process using an insulating layer mask and a photoresist;
forming a sensing electrode pattern layer by using the transparent conductive layer pattern mask and photoresist with opposite adhesive property to the driving electrode pattern layer through a composition process; the driving electrode pattern layer and the induction electrode pattern layer are positioned on the opposite sides of the plane of the insulating layer;
manufacturing an insulating protective layer by using the insulating layer mask and photoresist with the same adhesive property as the insulating layer;
the method further comprises the following steps:
manufacturing a metal layer on a transparent insulating substrate by using a metal layer mask and photoresist, wherein the metal layer comprises a bridging line of a display area; the driving electrode pattern layer is formed on the metal layer;
or,
manufacturing a metal layer on the driving electrode pattern layer by using a metal layer mask and photoresist; the insulating layer is manufactured on the metal layer;
or,
manufacturing a metal layer on the insulating layer by using a metal layer mask and photoresist; the induction electrode pattern layer is formed on the metal layer.
2. A method of making a capacitive touch sensor, comprising:
forming an induction electrode pattern layer by using a transparent conductive layer pattern mask and photoresist through a composition process;
manufacturing an insulating layer by using an insulating layer mask and photoresist;
forming a driving electrode pattern layer by using the transparent conductive layer pattern mask and photoresist with opposite adhesive property to the sensing electrode pattern layer through a composition process; the induction electrode pattern layer and the driving electrode pattern layer are positioned on the opposite sides of the plane where the insulating layer is positioned;
manufacturing an insulating protective layer by using the insulating layer mask and photoresist with the same adhesive property as the insulating layer;
the method further comprises the following steps:
manufacturing a metal layer on a transparent insulating substrate by using a metal layer mask and photoresist, wherein the metal layer comprises a bridging line of a display area; the induction electrode pattern layer is formed on the metal layer;
or,
manufacturing a metal layer on the induction electrode pattern layer by using a metal layer mask and photoresist; the insulating layer is manufactured on the metal layer;
or,
manufacturing a metal layer on the insulating layer by using a metal layer mask and photoresist; the driving electrode pattern layer is formed over the metal layer.
3. A capacitive touch sensor, comprising:
the display device comprises a transparent insulating substrate, a metal layer made of a metal layer mask and photoresist, a driving electrode pattern layer formed by a composition process by using the transparent conducting layer pattern mask and the photoresist, an insulating layer made of the insulating layer mask and the photoresist, an induction electrode pattern layer made of the transparent conducting layer pattern mask and the photoresist with opposite adhesive property to the driving electrode pattern layer, and an insulating protective layer made of the insulating layer mask and the photoresist with the same adhesive property as the insulating layer;
the transparent insulating substrate is manufactured at the bottommost layer;
the driving electrode pattern layer and the induction electrode pattern layer are formed on the opposite sides of the plane of the insulating layer;
the metal layer is manufactured on the transparent insulating substrate, or is manufactured on the driving electrode pattern layer, or is manufactured on the insulating layer;
the insulating protection layer is manufactured on the uppermost layer.
4. The capacitive touch sensor of claim 3, wherein the capacitive touch sensor is configured to:
a transparent insulating substrate formed on the bottom layer;
the first layer on the transparent insulating substrate is the metal layer, the second layer is the driving electrode pattern layer, the third layer is the insulating layer, the fourth layer is the sensing electrode pattern layer, and the fifth layer is the insulating protective layer.
5. The capacitive touch sensor of claim 3, wherein the capacitive touch sensor is configured to:
a transparent insulating substrate formed on the bottom layer;
the first layer on the transparent insulating substrate is the driving electrode pattern layer, the second layer is the metal layer, the third layer is the insulating layer, the fourth layer is the induction electrode pattern layer, and the fifth layer is the insulating protective layer.
6. The capacitive touch sensor of claim 3, wherein the capacitive touch sensor is configured to:
a transparent insulating substrate formed on the bottom layer;
the first layer on the transparent insulating substrate is the driving electrode pattern layer, the second layer is the insulating layer, the third layer is the metal layer, the fourth layer is the induction electrode pattern layer, and the fifth layer is the insulating protective layer.
7. The capacitive touch sensor of claim 3, wherein the capacitive touch sensor is configured to:
a transparent insulating substrate formed on the bottom layer;
the first layer on the transparent insulating substrate is the metal layer, the second layer is the induction electrode pattern layer, the third layer is the insulating layer, the fourth layer is the driving electrode pattern layer, and the fifth layer is the insulating protective layer.
8. The capacitive touch sensor of claim 3, wherein the capacitive touch sensor is configured to:
a transparent insulating substrate formed on the bottom layer;
the first layer on the transparent insulating substrate is the induction electrode pattern layer, the second layer is the metal layer, the third layer is the insulating layer, the fourth layer is the driving electrode pattern layer, and the fifth layer is the insulating protective layer.
9. The capacitive touch sensor of claim 3, wherein the capacitive touch sensor is configured to:
a transparent insulating substrate formed on the bottom layer;
the first layer on the transparent insulating substrate is the induction electrode pattern layer, the second layer is the insulating layer, the third layer is the metal layer, the fourth layer is the driving electrode pattern layer, and the fifth layer is the insulating protective layer.
10. A touch screen comprising the capacitive touch sensor of any of claims 3 to 9.
11. A display device comprising the capacitive touch sensor according to any one of claims 3 to 9.
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| CN201210321950.5A CN102866816B (en) | 2012-09-03 | 2012-09-03 | Capacitive touch sensor, manufacturing method thereof, touch screen and display device |
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