CN102866816B - Capacitive touch sensor, manufacturing method thereof, touch screen and display device - Google Patents
Capacitive touch sensor, manufacturing method thereof, touch screen and display device Download PDFInfo
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- CN102866816B CN102866816B CN201210321950.5A CN201210321950A CN102866816B CN 102866816 B CN102866816 B CN 102866816B CN 201210321950 A CN201210321950 A CN 201210321950A CN 102866816 B CN102866816 B CN 102866816B
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Abstract
The invention discloses a manufacturing method of a capacitive touch sensor. The manufacturing method comprises the following steps of: manufacturing a drive electrode pattern layer by using a transparent conductive layer pattern mask and a photoresist; manufacturing an insulating layer by using an insulating layer mask and a photoresist; manufacturing a sensing electrode pattern layer by using the transparent conductive layer pattern mask and a photoresist which has the stickability opposite to that of the drive electrode pattern layer, wherein the drive electrode pattern layer and the sensing electrode pattern layer are located at different sides of a plane where the insulating layer is located; and manufacturing an insulating protection layer by using the insulating layer mask and a photoresist. The invention further discloses a capacitive touch sensor, a touch screen and a display device. As the insulating layer and the insulating protection layer are manufactured by using the same mask, the consumption number of masks is reduced, and then, the manufacturing cost of the touch screen is reduced. Furthermore, the sensing electrode pattern layer and the drive electrode pattern layer which are provided with transparent conductive layer patterns are respectively formed at different sides of the insulating layer, so that electric field lines from a drive electrode to a sensing electrode are enabled to be more divergent, and the sensitive touch degree is increased.
Description
Technical field
The present invention relates to technical field of touch control, particularly relate to a kind of capacitive touch sensors and manufacturing process thereof, and comprise touch-screen and the display device of this capacitive touch sensors.
Background technology
Condenser type Touch Panel(touch-screen) with its good performance and Consumer's Experience, develop into the touch-screen of main flow gradually.Condenser type Touch Sensor(touch sensor) be the Primary Component of capacitive touch screen.The structure of existing capacitive touch sensors generally includes: transparent insulating substrate; the ground floor be produced on transparent insulating substrate is metal level; the second layer is insulation course, and third layer is ITO(nano indium tin metal oxide) patterned layer, the 4th layer is insulating protective layer.Figure 1 shows that a kind of triangle ITO patterned layer schematic diagram, the pattern that multiple white triangles shape is formed is the induction electrode pattern (or drive electrode pattern) of ITO patterned layer, and the pattern that the triangle that multiple oblique line is filled is formed is the drive electrode pattern (or induction electrode pattern) of ITO patterned layer.Wherein, ITO pattern realizes conducting by contacting with metal level.In order to ensure the conducting of ITO pattern, need to ensure not covered by insulation course in the conducting junction of ITO pattern and metal level.In the process making capacitive touch sensors, need 4 Mask(masks).Wherein, metal level uses a Mask, and insulation course uses Mask, an ITO patterned layer to use a Mask, and insulating protective layer uses a Mask.Because the design cost of Mask is higher, therefore, there is the higher problem of cost of manufacture in the manufacture craft of existing capacitive touch screen.
Summary of the invention
The object of this invention is to provide a kind of capacitive touch sensors and preparation method thereof, and comprise touch-screen and the display device of this capacitive touch sensors, to solve the higher problem of existing capacitive touch sensors cost of manufacture.
The object of the invention is to be achieved through the following technical solutions:
A method for making for capacitive touch sensors, comprising:
Pattern for transparent conductive layer mask and photoresist is used to form drive electrode patterned layer through patterning processes;
Insulation course mask and photoresist is used to form insulation course through patterning processes;
Described pattern for transparent conductive layer mask and the photoresist contrary with described drive electrode patterned layer colloidality is used to form induction electrode patterned layer through patterning processes; Described drive electrode patterned layer and described induction electrode patterned layer are positioned at the heteropleural of described insulation course place plane;
Described insulation course mask and the photoresist identical with described insulation course colloidality is used to make insulating protective layer;
The method also comprises:
On transparent insulating substrate, use metal mask layer and photoresist to make metal level, described metal level comprises the bridging line of viewing area; Described drive electrode patterned layer is formed on described metal level;
Or,
In described drive electrode patterned layer, metal mask layer and photoresist is used to make metal level; Described insulation course is made on described metal level;
Or,
On described insulation course, metal mask layer and photoresist is used to make metal level; Described induction electrode patterned layer is formed on described metal level.
A method for making for capacitive touch sensors, comprising:
Pattern for transparent conductive layer mask and photoresist is used to form induction electrode patterned layer through patterning processes;
Insulation course mask and photoresist is used to make insulation course;
Described pattern for transparent conductive layer mask and the photoresist contrary with described induction electrode patterned layer colloidality is used to form drive electrode patterned layer through patterning processes; Described induction electrode patterned layer and described drive electrode patterned layer are positioned at the heteropleural of described insulation course place plane;
Described insulation course mask and the photoresist identical with described insulation course colloidality is used to make insulating protective layer;
The method also comprises:
On transparent insulating substrate, use metal mask layer and photoresist to make metal level, described metal level comprises the bridging line of viewing area; Described induction electrode patterned layer is formed on described metal level;
Or,
In described induction electrode patterned layer, metal mask layer and photoresist is used to make metal level; Described insulation course is made on described metal level;
Or,
On described insulation course, metal mask layer and photoresist is used to make metal level; Described drive electrode patterned layer is formed on described metal level.
A kind of capacitive touch sensors, comprising:
Transparent insulating substrate, use the metal level that metal mask layer and photoresist make, described metal level comprises the bridging line of viewing area, use the drive electrode patterned layer that pattern for transparent conductive layer mask and photoresist are formed through patterning processes, use the insulation course that insulation course mask and photoresist make, the induction electrode patterned layer using described pattern for transparent conductive layer mask and the photoresist contrary with described drive electrode patterned layer colloidality to make, uses the insulating protective layer that described insulation course mask and the photoresist identical with described insulation course colloidality make;
Described transparent insulating substrate is made in the bottom;
Described drive electrode patterned layer and described induction electrode patterned layer are formed at the heteropleural of described insulation course place plane;
Described metal level is made on described transparent insulating substrate, or is made on described drive electrode patterned layer, or is made on described insulation course;
Described insulating protective layer is made in the superiors.
The structure of described capacitive touch sensors is specially:
Be made in the transparent insulating substrate of the bottom;
Ground floor on described transparent insulating substrate is described metal level, and the second layer is described drive electrode patterned layer, and third layer is described insulation course, and the 4th layer is described induction electrode patterned layer, and layer 5 is described insulating protective layer.
The structure of described capacitive touch sensors is specially:
Be made in the transparent insulating substrate of the bottom;
Ground floor on described transparent insulating substrate is described drive electrode patterned layer, and the second layer is described metal level, and third layer is described insulation course, and the 4th layer is described induction electrode patterned layer, and layer 5 is described insulating protective layer.
The structure of described capacitive touch sensors is specially:
Be made in the transparent insulating substrate of the bottom;
Ground floor on described transparent insulating substrate is described drive electrode patterned layer, and the second layer is described insulation course, and third layer is described metal level, and the 4th layer is described induction electrode patterned layer, and layer 5 is described insulating protective layer.
The structure of described capacitive touch sensors is specially:
Be made in the transparent insulating substrate of the bottom;
Ground floor on described transparent insulating substrate is described metal level, and the second layer is described induction electrode patterned layer, and third layer is described insulation course, and the 4th layer is described drive electrode patterned layer, and layer 5 is described insulating protective layer.
The structure of described capacitive touch sensors is specially:
Be made in the transparent insulating substrate of the bottom;
Ground floor on described transparent insulating substrate is described induction electrode patterned layer, and the second layer is described metal level, and third layer is described insulation course, and the 4th layer is described drive electrode patterned layer, and layer 5 is described insulating protective layer.
The structure of described capacitive touch sensors is specially:
Be made in the transparent insulating substrate of the bottom;
Ground floor on described transparent insulating substrate is described induction electrode patterned layer, and the second layer is described insulation course, and third layer is described metal level, and the 4th layer is described drive electrode patterned layer, and layer 5 is described insulating protective layer.
A kind of touch-screen, comprises above-mentioned arbitrary described capacitive touch sensors.
A kind of display device, comprises above-mentioned arbitrary described capacitive touch sensors.
Capacitive touch sensors provided by the invention and preparation method thereof, the touch-screen comprising this capacitance touch inductor and display device; owing to using same mask fabrication insulation course and insulating protective layer; thus decrease the usage quantity of mask, and then reduce the cost of manufacture of capacitive touch screen.
Accompanying drawing explanation
Fig. 1 is existing a kind of ITO patterned layer schematic diagram;
The method flow diagram that Fig. 2 provides for one embodiment of the invention;
The method flow diagram that Fig. 3 provides for another embodiment of the present invention;
The method flow diagram that Fig. 4 provides for another embodiment of the present invention;
First capacitive touch sensors structural representation that Fig. 5 provides for the embodiment of the present invention;
Second capacitive touch sensors structural representation that Fig. 6 provides for the embodiment of the present invention;
The 3rd the capacitive touch sensors structural representation that Fig. 7 provides for the embodiment of the present invention;
The 4th the capacitive touch sensors structural representation that Fig. 8 provides for the embodiment of the present invention;
The 5th the capacitive touch sensors structural representation that Fig. 9 provides for the embodiment of the present invention;
The 6th the capacitive touch sensors structural representation that Figure 10 provides for the embodiment of the present invention;
The 7th the capacitive touch sensors structural representation that Figure 11 provides for the embodiment of the present invention;
The capacitive touch sensors local schematic top plan view that Figure 12 provides for the embodiment of the present invention.
Embodiment
In order to reduce the cost of manufacture of capacitive touch sensors, embodiments provide a kind of method for making of capacitive touch sensors, the method as shown in Figure 2, specifically comprises following operation:
S201, use pattern for transparent conductive layer mask and photoresist form drive electrode patterned layer through patterning processes.
S202, use insulation course mask and photoresist make insulation course.
S203, above-mentioned pattern for transparent conductive layer mask and the photoresist contrary with above-mentioned drive electrode patterned layer colloidality is used to form induction electrode patterned layer through patterning processes,
Wherein, drive electrode pattern and induction electrode pattern form complete pattern for transparent conductive layer.
Above-mentioned drive electrode patterned layer and above-mentioned induction electrode patterned layer are positioned at the heteropleural of above-mentioned insulation course place plane.So-called heteropleural refers to, when capacitive touch sensors horizontal positioned, drive electrode patterned layer is positioned on insulation course, and induction electrode patterned layer is positioned under insulation course; Or drive electrode patterned layer is positioned under insulation course, and induction electrode patterned layer is positioned on insulation course.
If drive electrode patterned layer uses positive photoresist to be formed, then induction electrode patterned layer uses negative photoresist to be formed, if drive electrode patterned layer uses negative photoresist to be formed, then induction electrode patterned layer uses negative photoresist to be formed.
S204, above-mentioned insulation course mask and the photoresist identical with above-mentioned insulation course colloidality is used to make insulating protective layer.
The method also comprises following arbitrary step:
S205a, on transparent insulating substrate, use metal mask layer and photoresist to make metal level, this metal level comprises the bridging line of viewing area; Above-mentioned drive electrode patterned layer is formed on this metal level.
S205b, in above-mentioned drive electrode patterned layer, use metal mask layer and photoresist to make metal level, this metal level comprises the bridging line of viewing area; Above-mentioned insulation course is made on this metal level.
S205c, on above-mentioned insulation course, use metal mask layer and photoresist to make metal level, this metal level comprises the bridging line of viewing area; Above-mentioned induction electrode patterned layer is formed on this metal level.
In order to reduce the cost of manufacture of capacitive touch sensors, the embodiment of the present invention additionally provides a kind of method for making of capacitive touch sensors, and the method as shown in Figure 3, specifically comprises following operation:
S301, use pattern for transparent conductive layer mask and photoresist form induction electrode patterned layer through patterning processes.
S302, use insulation course mask and photoresist make insulation course.
S303, above-mentioned pattern for transparent conductive layer mask and the photoresist contrary with above-mentioned induction electrode patterned layer colloidality is used to form drive electrode patterned layer through patterning processes.
Wherein, drive electrode pattern and induction electrode pattern form complete pattern for transparent conductive layer.
Above-mentioned induction electrode patterned layer and above-mentioned drive electrode patterned layer are positioned at the heteropleural of above-mentioned insulation course place plane.
If induction electrode patterned layer uses positive photoresist to be formed, then drive electrode patterned layer uses negative photoresist to be formed, if induction electrode patterned layer uses negative photoresist to be formed, then drive electrode patterned layer uses negative photoresist to be formed.
S304, above-mentioned insulation course mask and the photoresist identical with above-mentioned insulation course colloidality is used to make insulating protective layer.
The method also comprises following arbitrary step:
S305a, on transparent insulating substrate, use metal mask layer and photoresist to make metal level, this metal level comprises the bridging line of viewing area; Above-mentioned induction electrode patterned layer is formed on this metal level.
S305b, in above-mentioned induction electrode patterned layer, use metal mask layer and photoresist to make metal level, this metal level comprises the bridging line of viewing area; Above-mentioned insulation course is made on this metal level.
S305c, on above-mentioned insulation course, use metal mask layer and photoresist to make metal level, this metal level comprises the bridging line of viewing area; Above-mentioned pattern drive electrode patterned layer is formed on this metal level.
It should be noted that: in the embodiment of the present invention, described patterning processes is generally the processing steps such as exposure, etching, stripping, (it is a kind of that the generation type of certain material on substrate is not limited to deposition to be generally the material of deposition formation required for pattern, can also be other modes), carry out patterning processes afterwards.The material of described drive electrode patterned layer and induction electrode patterned layer is transparent conductive material, such as ITO, but is not limited thereto, and can also be that AZO(mixes Al zinc oxide aluminum), FTO(mixes F tin oxide) etc.The material of described insulation course and insulating protective layer can be organic insulator material also can be inorganic insulating layer material, such as silicon nitride, allyl resin and epoxy resin.
Described metal level also comprises the circuit line of welding disking area, in insulating layer pattern forming step, by exposed for the pattern for transparent conductive layer (drive electrode pattern or induction electrode pattern) of welding disking area, facilitates IC(driving chip) Bonding(binding).
In existing capacitive touch sensors manufacture craft, usually adopt a Mask on one deck, form complete pattern for transparent conductive layer.And the method for making of the capacitive touch sensors that the various embodiments described above of the present invention provide, divide drive electrode patterned layer and the induction electrode patterned layer of two-layer formation pattern for transparent conductive layer, and drive electrode patterned layer and induction electrode patterned layer are formed in the heteropleural of insulation course place plane, thus reduce the mutual capacitance between drive electrode and induction electrode.Use same Mask, drive electrode patterned layer and induction electrode patterned layer is formed respectively with positive photoresist and negative photoresist, because the degree of accuracy of negative photoresist is lower, the pattern for transparent conductive layer (induction electrode pattern or drive electrode pattern) using negative photoresist to form a direction can reduce to some extent, thus make the pattern for transparent conductive layer of both direction can not vertical alignment in edge, drive electrode is dispersed more to the electric field line of induction electrode, such finger touch just can siphon away more electric field line, thus increases sensitive touch-control degree.In addition; use same Mask; drive electrode patterned layer and the induction electrode patterned layer of pattern for transparent conductive layer is formed respectively with positive photoresist and negative photoresist; the pattern for transparent conductive layer obtained is different from existing pattern for transparent conductive layer; thus same Mask can be used to make insulation course and insulating protective layer; reduce the usage quantity of Mask, and then reduce production cost.
In the method that the various embodiments described above of the present invention provide, when making insulation course, metal level and drive electrode patterned layer be ensured or do not covered completely by insulation course with the junction of induction electrode patterned layer.Thus ensure pattern for transparent conductive layer conducting.
In the method that the various embodiments described above of the present invention provide, as the preferred implementation of one, above-mentioned metal level, insulation course, insulating protective layer all adopt positive photoresist to make.
Method provided by the invention is applicable to any manufacture craft being realized the tactile sensor of induction by transparency conducting layer.Such as, the Add On(external hanging type of induction is realized by transparency conducting layer) touch sensor, On Cell(be external) touch sensor, In Cell(be built-in) touch sensor etc., and realized the GTG(Glass To Glass of induction by transparency conducting layer, double glazing) touch sensor, One Glass Solusion(single-glass) touch sensor etc.
Below the method for making using the manufacturing process of Add On GTG touch sensor as concrete Application Example to the capacitive touch sensors that the embodiment of the present invention provides is described in detail.
The method for making of a capacitive touch sensors as shown in Figure 4, its implementation specifically comprises following operation:
S401, on transparent insulating substrate (e.g., glass, plastics), make ground floor (metal level), this metal level comprises the bridging line of viewing area;
Specifically adopt Mask1(metal level Mask), positive photoresist makes metal bridge, metal routing etc.;
S402, the making second layer (drive electrode patterned layer);
Specifically adopt Mask2(pattern for transparent conductive layer Mask), positive photoresist forms drive electrode pattern through patterning processes;
S403, making third layer (insulation course);
Specifically adopt Mask3(insulation course Mask), positive photoresist makes insulation course, and the figure of this insulation course is pressing figure;
When making insulation course, ensure that the junction of metal level and pattern for transparent conductive layer is not covered completely by insulation course, to ensure the conducting of pattern for transparent conductive layer;
S404, making the 4th layer (induction electrode patterned layer);
Specifically adopt Mask2, negative photoresist forms induction electrode pattern through patterning processes;
S405, making layer 5 (insulating protective layer);
Specifically adopt Mask3, positive photoresist makes insulating protective layer;
S406, carry out sensor cutting;
S407, carry out FPC(flexible circuit web joint) pressing;
S408, Cover Lens(cover plate) laminating, complete the making of tactile sensor.
In above-mentioned processing procedure, negative photoresist can also be used to form drive electrode patterned layer, use positive photoresist to form induction electrode patterned layer.In addition, induction electrode patterned layer can also be formed at the second layer, form drive electrode patterned layer at the 4th layer.
In above-mentioned processing procedure, on transparent insulating substrate, first make metal level.The advantage first making metal level is, can not be oxidized at the Bonding regional metal of FPC.
Existing capacitive touch sensors method for making needs 4 Mask, above-mentioned processing procedure makes the capacitive touch sensors obtained, only need 3 Mask to complete making, decrease the cost of development of Mask, and then reduce the cost of manufacture of capacitive touch sensors.In addition, owing to the drive electrode patterned layer of pattern for transparent conductive layer and induction electrode patterned layer to be respectively formed at the heteropleural of insulation course place plane, drive electrode is dispersed more to the electric field line of induction electrode, such finger touch just can siphon away more electric field line, thus increases sensitive touch-control degree.
The present invention also provides a kind of capacitive touch sensors, and its structure is as shown in Fig. 5 ~ 10, and specific implementation structure is as follows:
Comprise transparent insulating substrate 1, use the metal level 2 that metal mask layer and photoresist make, this metal level 2 comprises the bridging line of viewing area, use the drive electrode patterned layer 3 that pattern for transparent conductive layer mask and photoresist are formed through patterning processes, use the insulation course 4 that insulation course mask and photoresist make, use the induction electrode patterned layer 5 that above-mentioned pattern for transparent conductive layer mask and the photoresist contrary with above-mentioned drive electrode patterned layer 3 colloidality make, use the insulating protective layer 6 that above-mentioned insulation course mask and the photoresist identical with above-mentioned insulation course 4 colloidality make.
Wherein, above-mentioned transparent insulating substrate 1 is made in the bottom; Above-mentioned drive electrode patterned layer 3 and above-mentioned induction electrode patterned layer 5 are made in the heteropleural of above-mentioned insulation course 4 place plane; Above-mentioned metal level 2 is made on above-mentioned transparent insulating substrate 1, or is made on above-mentioned drive electrode patterned layer 3, or is made on above-mentioned insulation course 4; Above-mentioned insulating protective layer 6 is made in the superiors.
Above-mentioned metal level 2 is with drive electrode patterned layer 3 or do not covered completely by insulation course 4 with the junction of induction electrode patterned layer 5.Thus ensure pattern for transparent conductive layer conducting.
The capacitive touch sensors that the embodiment of the present invention provides, the drive electrode patterned layer 3 of transparency conducting layer and induction electrode patterned layer 5 are respectively formed at the heteropleural of insulation course.Because the degree of accuracy of negative photoresist is lower, the pattern for transparent conductive layer (drive electrode pattern 3 or induction electrode pattern 5) in the direction using negative photoresist to be formed can reduce to some extent, thus make the pattern for transparent conductive layer of both direction can not vertical alignment in edge, drive electrode is dispersed more to the electric field line of induction electrode, such finger touch just can siphon away more electric field line, thus increases sensitive touch-control degree.In addition; the pattern for transparent conductive layer of capacitive touch sensors provided by the invention is different from existing pattern for transparent conductive layer; thus same Mask can be used to make insulation course 4 and insulating protective layer 6; reduce the usage quantity of Mask, and then reduce the production cost of capacitive touch sensors.
The capacitive touch sensors that the embodiment of the present invention provides, above-mentioned metal level 2, insulation course 4, insulating protective layer 6 preferably adopt positive photoresist to make.
As shown in Figure 5, for first preferred capacitive touch sensors provided by the invention realizes structure.Wherein:
Transparent insulating substrate 1 is made in the bottom; Ground floor on this transparent insulating substrate 1 is above-mentioned metal level 2; described metal level 2 comprises the bridging line of viewing area; the second layer is above-mentioned drive electrode patterned layer 3; third layer is above-mentioned insulation course 4; 4th layer is above-mentioned induction electrode patterned layer 5, and layer 5 is above-mentioned insulating protective layer 6.
As shown in Figure 6, for second preferred capacitive touch sensors provided by the invention realizes structure.
Wherein:
Transparent insulating substrate 1 is made in the bottom; Ground floor on this transparent insulating substrate 1 is above-mentioned drive electrode patterned layer 3; the second layer is above-mentioned metal level 2; this metal level 2 comprises the bridging line of viewing area; third layer is above-mentioned insulation course 4; 4th layer is above-mentioned induction electrode patterned layer 5, and layer 5 is above-mentioned insulating protective layer 6.
As shown in Figure 7, for the 3rd preferred capacitive touch sensors provided by the invention realizes structure.Wherein:
Transparent insulating substrate 1 is made in the bottom; Ground floor on this transparent insulating substrate 1 is above-mentioned drive electrode patterned layer 3; the second layer is above-mentioned insulation course 4; third layer is above-mentioned metal level 2; this metal level 2 comprises the bridging line of viewing area; 4th layer is above-mentioned induction electrode patterned layer 5, and layer 5 is above-mentioned insulating protective layer 6.
As shown in Figure 8, for the 4th preferred capacitive touch sensors provided by the invention realizes structure.Wherein:
Be made in the transparent insulating substrate 1 of the bottom;
Ground floor on described transparent insulating substrate 1 is described metal level 2; described metal level 2 comprises the bridging line of viewing area, and the second layer is described induction electrode patterned layer 5, and third layer is described insulation course 4; 4th layer is described drive electrode patterned layer 3, and layer 5 is described insulating protective layer 6.
As shown in Figure 9, for the 5th preferred capacitive touch sensors provided by the invention realizes structure.Wherein:
Transparent insulating substrate 1 is made in the bottom; Ground floor on this transparent insulating substrate 1 is above-mentioned induction electrode patterned layer 5; the second layer is above-mentioned metal level 2; this metal level 2 comprises the bridging line of viewing area; third layer is above-mentioned insulation course 4; 4th layer is above-mentioned drive electrode patterned layer 3, and layer 5 is above-mentioned insulating protective layer 6.
As shown in Figure 10, for the 6th preferred capacitive touch sensors provided by the invention realizes structure.Wherein:
Transparent insulating substrate 1 is made in the bottom; Ground floor on this transparent insulating substrate 1 is above-mentioned induction electrode patterned layer 5; the second layer is above-mentioned insulation course 4; third layer is above-mentioned metal level 2; this metal level 2 comprises the bridging line of viewing area; 4th layer is above-mentioned drive electrode patterned layer 3, and layer 5 is above-mentioned insulating protective layer 6.
Capacitive touch sensors provided by the invention can be any touch sensor being realized induction by transparency conducting layer.For example and without limitation, can be the Add On touch sensor, On Cell touch sensor, In Cell touch sensor etc. that are realized induction by transparency conducting layer, also can be the GTG touch sensor, One Glass Solusion touch sensor etc. that are realized induction by transparency conducting layer.
Be described in detail for the structure of Add On GTG touch sensor arrangement to capacitive touch sensors provided by the invention shown in a Figure 11 below.
In Figure 11, on transparent insulating substrate 1, ground floor is metal level 2, comprises the bridging line of viewing area, can be specifically metal bridge and metal routing;
The second layer is drive electrode patterned layer 3.
Third layer is insulation course 4, wherein, and the junction of drive electrode patterned layer 3 and metal level 2, and the junction (not shown) of induction electrode patterned layer 5 and metal level 2 is not covered completely by insulation course 4, to ensure the conducting of pattern for transparent conductive layer.
4th layer is induction electrode patterned layer 5.
Drive electrode pattern 3 and induction electrode pattern 5 adopt same Mask, adopt positive photoresist and negative photoresist to be formed through patterning processes respectively, and drive electrode patterned layer 3 and induction electrode patterned layer 5 are made in the heteropleural of insulation course 4, thus increase touch-control sensitivity.
Layer 5 is insulating protective layer 6, and this layer is made by the Mask making insulation course 4, and then decreases the usage quantity of Mask.
The flexible circuit web joint 7 that after also having comprised sensor cutting, pressing is got on.
Figure 12 shows that the local schematic top plan view of the capacitive touch sensors that the embodiment of the present invention provides.For the capacitive touch sensors of structure shown in Fig. 5,6,10, Figure 12 bend is depicted as induction electrode patterned layer, and in induction electrode patterned layer, connected between each induction electrode by metal routing, mesh lines is depicted as drive electrode patterned layer.For the capacitive touch sensors of structure shown in Fig. 7,8,9, Figure 12 bend is depicted as drive electrode patterned layer, and in drive electrode patterned layer, connected between each drive electrode by metal routing, mesh lines is depicted as induction electrode patterned layer.
It should be noted that, the metal level mentioned in above-mentioned comprises the bridging line of viewing area, i.e. metal bridge and metal routing, in order to avoid repeat specification, does not mention in above-mentioned metal level.
The present invention is real also provides a kind of capacitive touch screen, comprises as above any one capacitive touch sensors.
The present invention also provides a kind of display device, comprises as above any one capacitive touch sensors.
Obviously, those skilled in the art can carry out various change and modification to the present invention and not depart from the spirit and scope of the present invention.Like this, if these amendments of the present invention and modification belong within the scope of the claims in the present invention and equivalent technologies thereof, then the present invention is also intended to comprise these change and modification.
Claims (11)
1. a method for making for capacitive touch sensors, is characterized in that, comprising:
Pattern for transparent conductive layer mask and photoresist is used to form drive electrode patterned layer through patterning processes;
Insulation course mask and photoresist is used to form insulation course through patterning processes;
Described pattern for transparent conductive layer mask and the photoresist contrary with described drive electrode patterned layer colloidality is used to form induction electrode patterned layer through patterning processes; Described drive electrode patterned layer and described induction electrode patterned layer lay respectively at the heteropleural of described insulation course place plane;
Described insulation course mask and the photoresist identical with described insulation course colloidality is used to make insulating protective layer;
The method also comprises:
On transparent insulating substrate, use metal mask layer and photoresist to make metal level, described metal level comprises the bridging line of viewing area; Described drive electrode patterned layer is formed on described metal level;
Or,
In described drive electrode patterned layer, metal mask layer and photoresist is used to make metal level; Described insulation course is made on described metal level;
Or,
On described insulation course, metal mask layer and photoresist is used to make metal level; Described induction electrode patterned layer is formed on described metal level.
2. a method for making for capacitive touch sensors, is characterized in that, comprising:
Pattern for transparent conductive layer mask and photoresist is used to form induction electrode patterned layer through patterning processes;
Insulation course mask and photoresist is used to make insulation course;
Described pattern for transparent conductive layer mask and the photoresist contrary with described induction electrode patterned layer colloidality is used to form drive electrode patterned layer through patterning processes; Described induction electrode patterned layer and described drive electrode patterned layer lay respectively at the heteropleural of described insulation course place plane;
Described insulation course mask and the photoresist identical with described insulation course colloidality is used to make insulating protective layer;
The method also comprises:
On transparent insulating substrate, use metal mask layer and photoresist to make metal level, described metal level comprises the bridging line of viewing area; Described induction electrode patterned layer is formed on described metal level;
Or,
In described induction electrode patterned layer, metal mask layer and photoresist is used to make metal level; Described insulation course is made on described metal level;
Or,
On described insulation course, metal mask layer and photoresist is used to make metal level; Described drive electrode patterned layer is formed on described metal level.
3. a capacitive touch sensors, is characterized in that, comprising:
Transparent insulating substrate, use the metal level that metal mask layer and photoresist make, described metal level comprises the bridging line of viewing area, use the drive electrode patterned layer that pattern for transparent conductive layer mask and photoresist are formed through patterning processes, use the insulation course that insulation course mask and photoresist make, the induction electrode patterned layer using described pattern for transparent conductive layer mask and the photoresist contrary with described drive electrode patterned layer colloidality to make, uses the insulating protective layer that described insulation course mask and the photoresist identical with described insulation course colloidality make;
Described transparent insulating substrate is made in the bottom;
Described drive electrode patterned layer and described induction electrode patterned layer are formed at the heteropleural of described insulation course place plane respectively;
Described metal level is made on described transparent insulating substrate, or is made on described drive electrode patterned layer, or is made on described insulation course;
Described insulating protective layer is made in the superiors.
4. capacitive touch sensors according to claim 3, is characterized in that, the structure of described capacitive touch sensors is specially:
Be made in the transparent insulating substrate of the bottom;
Ground floor on described transparent insulating substrate is described metal level, and the second layer is described drive electrode patterned layer, and third layer is described insulation course, and the 4th layer is described induction electrode patterned layer, and layer 5 is described insulating protective layer.
5. capacitive touch sensors according to claim 3, is characterized in that, the structure of described capacitive touch sensors is specially:
Be made in the transparent insulating substrate of the bottom;
Ground floor on described transparent insulating substrate is described drive electrode patterned layer, and the second layer is described metal level, and third layer is described insulation course, and the 4th layer is described induction electrode patterned layer, and layer 5 is described insulating protective layer.
6. capacitive touch sensors according to claim 3, is characterized in that, the structure of described capacitive touch sensors is specially:
Be made in the transparent insulating substrate of the bottom;
Ground floor on described transparent insulating substrate is described drive electrode patterned layer, and the second layer is described insulation course, and third layer is described metal level, and the 4th layer is described induction electrode patterned layer, and layer 5 is described insulating protective layer.
7. capacitive touch sensors according to claim 3, is characterized in that, the structure of described capacitive touch sensors is specially:
Be made in the transparent insulating substrate of the bottom;
Ground floor on described transparent insulating substrate is described metal level, and the second layer is described induction electrode patterned layer, and third layer is described insulation course, and the 4th layer is described drive electrode patterned layer, and layer 5 is described insulating protective layer.
8. capacitive touch sensors according to claim 3, is characterized in that, the structure of described capacitive touch sensors is specially:
Be made in the transparent insulating substrate of the bottom;
Ground floor on described transparent insulating substrate is described induction electrode patterned layer, and the second layer is described metal level, and third layer is described insulation course, and the 4th layer is described drive electrode patterned layer, and layer 5 is described insulating protective layer.
9. capacitive touch sensors according to claim 3, is characterized in that, the structure of described capacitive touch sensors is specially:
Be made in the transparent insulating substrate of the bottom;
Ground floor on described transparent insulating substrate is described induction electrode patterned layer, and the second layer is described insulation course, and third layer is described metal level, and the 4th layer is described drive electrode patterned layer, and layer 5 is described insulating protective layer.
10. a touch-screen, is characterized in that, comprises the capacitive touch sensors as described in claim 3 ~ 9 any one.
11. 1 kinds of display device, is characterized in that, comprise the capacitive touch sensors as described in claim 3 ~ 9 any one.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210321950.5A CN102866816B (en) | 2012-09-03 | 2012-09-03 | Capacitive touch sensor, manufacturing method thereof, touch screen and display device |
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| CN103150067B (en) * | 2013-02-06 | 2015-04-08 | 南昌欧菲光科技有限公司 | Touch screen, touch display screen and electronic device provided with touch screen |
| CN103092426A (en) * | 2013-02-06 | 2013-05-08 | 南昌欧菲光科技有限公司 | Touch display screen and electronic device comprising the same |
| CN103309539A (en) * | 2013-06-20 | 2013-09-18 | 深圳南玻伟光导电膜有限公司 | Capacitive touch screen provided with in OGS structure and fabrication method of capacitive touch screen |
| CN104571672B (en) * | 2013-11-27 | 2018-05-08 | 北京京东方光电科技有限公司 | A kind of touch-screen and preparation method thereof |
| CN104750322B (en) * | 2013-12-27 | 2018-09-04 | 昆山国显光电有限公司 | A kind of touch screen and preparation method thereof |
| CN104156109B (en) | 2014-08-05 | 2018-09-07 | 京东方科技集团股份有限公司 | A kind of conductive film, touch panel and preparation method thereof, display device |
| CN104750347A (en) * | 2015-04-17 | 2015-07-01 | 合肥京东方光电科技有限公司 | Capacitive touch screen, production technology for same and touch display panel |
| CN106919284A (en) * | 2017-02-27 | 2017-07-04 | 京东方科技集团股份有限公司 | Touch base plate and preparation method thereof, electronic installation |
| US20180245950A1 (en) * | 2017-02-28 | 2018-08-30 | Maxim Integrated Products, Inc. | Planarized capacitive sensor array |
| CN113867043B (en) * | 2020-06-30 | 2023-01-10 | 京东方科技集团股份有限公司 | Light-emitting substrate, preparation method thereof and display device |
| CN112198995A (en) * | 2020-11-11 | 2021-01-08 | 深圳市华星光电半导体显示技术有限公司 | External hanging type touch sensing device and manufacturing method thereof |
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| TW201001247A (en) * | 2008-06-20 | 2010-01-01 | Sheng Chang Technology Co Ltd | Multi-sensing touch panel |
| CN101819482A (en) * | 2009-01-16 | 2010-09-01 | 三星移动显示器株式会社 | Touch screen panel and method of fabricating the same |
| TW201102894A (en) * | 2009-07-07 | 2011-01-16 | Arima Display Corp | Projective-capacitive touch panel and fabrication method thereof |
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| TW201040818A (en) * | 2009-05-08 | 2010-11-16 | Sintek Photronic Corp | Capacitive touch panel structure with high optical uniformity |
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| TW201001247A (en) * | 2008-06-20 | 2010-01-01 | Sheng Chang Technology Co Ltd | Multi-sensing touch panel |
| CN101819482A (en) * | 2009-01-16 | 2010-09-01 | 三星移动显示器株式会社 | Touch screen panel and method of fabricating the same |
| TW201102894A (en) * | 2009-07-07 | 2011-01-16 | Arima Display Corp | Projective-capacitive touch panel and fabrication method thereof |
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