CN104750322A - Touch screen and preparation method thereof - Google Patents
Touch screen and preparation method thereof Download PDFInfo
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- CN104750322A CN104750322A CN201310737034.4A CN201310737034A CN104750322A CN 104750322 A CN104750322 A CN 104750322A CN 201310737034 A CN201310737034 A CN 201310737034A CN 104750322 A CN104750322 A CN 104750322A
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Abstract
The invention provides a preparation method of a touch screen. The preparation method of the touch screen includes: using a photoresist layer used to pattern a first conductive layer as an insulating layer so as to isolate a first connection pattern from a second connection pattern and insulate the first connection pattern and the second connection pattern. Only two masking steps and two etching processes are needed to complete the preparation process of the touch screen, and therefore the number of production processes is effectively decreased, and production efficiency and a production yield are improved. Simultaneously, a covering is not arranged on a first sensing pattern or a second sensing pattern of the touch screen, and only the photoresist layer is arranged between the first connection pattern and the second connection pattern, and therefore light transmittance of the touch screen is effectively improved.
Description
Technical field
Display technique field of the present invention, is specifically related to a kind of capacitance type touch control screen and preparation method thereof.
Background technology
Touch screen (English full name is Touch Panel), also known as touch-screen, contact panel, that one is formed on image display device display surface, the conductor such as human body or capacitance pen is utilized to carry out the device of instruction input, the input equipment such as the external input device such as mouse, keyboard and mechanical type input key can be replaced, effectively can simplify the electronic product such as computer, mobile phone structure, there is boundless application prospect.
Touch screen is divided into resistance-type to cover (resistive overlay) touch screen, photosensitive type touch screen, capacitance type touch control screen etc.Wherein, (English full name is Capacity Touch Panel to capacitance type touch control screen, referred to as CTP) be utilize the electric current of human body to respond to control screen, according to the capacitance variations of detecting touch area, and then calculating touch position, have highly sensitive, easily realize the advantages such as multipoint-touch-technology, become the main flow touch screen applied in the electronic product such as smart mobile phone, panel computer gradually.
Chinese patent literature CN102163095A discloses a kind of capacitance type touch control screen and preparation method thereof, comprises formation the first sensing figure and second on a transparent substrate and senses figure.First sensing figure connects pattern each other by first and connects setting along first direction, second sensing figure connects pattern each other by second and to connect along second direction and arrange, and what the first row and second of being formed by connecting of sensing figure sensed that figure is formed by connecting go to be formed insulate and structure intersected with each other.
In order to prevent the first connection pattern to be connected pattern short circuit with second, need to form insulation course between the first connection pattern and the second sensing figure, preparation method is: order forms conductive layer and insulation course on a transparent substrate; Form photoresist oxidant layer on the insulating layer and patterning formation mask; Carry out patterning to conductive layer and insulation course respectively by mask, form the first sensing figure, the second sensing figure and series connection first sensing figure first connects pattern, removes mask after patterning; Substrate is formed the conductive layer that covering second senses figure and insulation course, and patterning forms the second connection pattern that series connection second senses figure.
In above-mentioned preparation method, the first sensing figure, the second sensing figure and the first connection pattern are provided with insulation course, have had a strong impact on the transmittance of described touch screen; And, first sensing figure, the second sensing figure, first connect pattern, the second connection forming process of pattern and the Patternized technique of insulation course and need altogether to perform twice mask and three road etching technics, manufacturing process is complicated, thus reduce production efficiency and the yields of touch screen, improve production cost.
Summary of the invention
For this reason, to be solved by this invention is the problem of low, the complicated process of preparation of touch screen transmittance in prior art, provides that a kind of transmittance is high, the simple touch screen of preparation technology and preparation method thereof.
For solving the problems of the technologies described above, the technical solution used in the present invention is as follows:
A kind of touch screen of the present invention, comprises substrate, is arranged on some independently the first sensing patterns on substrate and some independently the second sensing patterns;
Described first sensing patterns connects pattern by first and is connected in series along first direction, forms the first conductive unit;
Described second sensing patterns connects pattern by second and is connected in series along second direction, forms the second conductive unit;
Described first conductive unit and described second conductive unit form crossover network, and insulated from each other by insulation course; Described insulation course is photoresist oxidant layer, and described first sensing patterns and described second sensing patterns are arranged with layer.
Described first connects pattern is connected pattern along stacking in turn perpendicular to described substrate direction with described second, described insulation course is arranged between the two.
Described photoresist oxidant layer is transparent or semitransparent rete.
Described photoresist is shadow tone photoresist.
Described first sensing patterns is identical with described second sensing patterns.
The preparation method of a kind of touch screen of the present invention, comprises the steps:
S1, on substrate, form the first conductive layer and photoresist oxidant layer in turn;
S2, by photoetching process, patterning is carried out to photoresist oxidant layer, form mask;
S3, adopt etching technics to carry out patterning to the first conductive layer by mask obtained in step S2, form some first sensing patterns, the first sensing patterns of connecting along first direction first connect pattern and some independently the second sensing patterns;
S4, remove portion mask, retain the photoresist oxidant layer covered on the first connection pattern, and carry out hot setting process, makes photoresist oxidant layer coated first connect the side of pattern;
S5, on substrate, form the second conductive layer covering the second conductive pattern and photoresist oxidant layer along second direction, and patterning forms and connects pattern along second of second direction series connection adjacent second conductive pattern.
Described photoresist is shadow tone photoresist, and in the described mask that step S2 is formed, form the height that the first height connecting the region of pattern is greater than other regions, difference in height is 1.0 μm ~ 2 μm.
By cineration technics remove portion mask in step S4.
Step S3 connects pattern over etching to described first, makes described first to connect pattern being projected in the drop shadow spread over the substrate of described mask corresponding region over the substrate.
Technique scheme of the present invention has the following advantages compared to existing technology:
1, the preparation method of touch screen of the present invention, the photoresist oxidant layer of patterning first conductive layer is adopted to be that insulator separation first connects pattern and is connected pattern with second and makes it to insulate, the preparation process of described touch screen is made only to need twice mask and twice etching technics just can realize, effectively reduce production process, improve production efficiency and yields.
2, the preparation method of touch screen of the present invention, connect pattern to described first and carry out over etching, and the photoresist oxidant layer covered on the first connection pattern is carried out hot setting process, make photoresist oxidant layer coated first connect the side of pattern, effectively prevent the generation that the first connection pattern and second connects short circuit phenomenon between pattern.
3, touch screen of the present invention, the first sensing patterns and the second sensing patterns do not arrange coverture, be only provided with one deck photoresist oxidant layer, effectively improve the transmittance of described touch screen between the first connection pattern and the second connection pattern.
Accompanying drawing explanation
In order to make content of the present invention be more likely to be clearly understood, below according to a particular embodiment of the invention and by reference to the accompanying drawings, the present invention is further detailed explanation, wherein
Fig. 1 is the vertical view of touch screen in prior art;
Fig. 2 is that in Fig. 1, the first sensing figure and second senses graph position relation and annexation schematic diagram;
Fig. 3-1 ~ Fig. 3-7 is touch screen of the present invention structural representations in preparation process.
In figure, Reference numeral is expressed as: 10-substrate, 12-first conductive layer, 12a-first senses figure, 12b-second senses figure, 12a1-first connects pattern, 12b1-second connects pattern, 13-insulation course, 14-second conductive layer.
Embodiment
In order to make the object, technical solutions and advantages of the present invention clearly, below in conjunction with accompanying drawing, embodiments of the present invention are described in further detail.
The present invention can implement in many different forms, and should not be understood to be limited to embodiment set forth herein.On the contrary, provide these embodiments, make the disclosure to be thorough and complete, and design of the present invention fully will be conveyed to those skilled in the art, the present invention will only be limited by claim.In the accompanying drawings, for clarity, the size in layer and region and relative size can be exaggerated.Should be understood that, when element such as layer, region or substrate be referred to as " being formed in " or " being arranged on " another element " on " time, this element can be set directly on another element described, or also can there is intermediary element.On the contrary, when element is referred to as on " being formed directly into " or " being set directly at " another element, there is not intermediary element; When element is called as " transparent or semitransparent ", represent that this element has high optical transmittance.
The present embodiment provides a kind of touch screen, as shown in Figure 1, comprises substrate 10, arranges some independently the first sensing patterns 12a over the substrate 10 and some independently the second sensing patterns 12b.
Described substrate 10 is the glass substrate of transparent or semitransparent substrate, the present embodiment preferably clear.
Described first sensing patterns 12a connects pattern 12a1 by first and is connected in series along first direction, forms the first conductive unit; Described second sensing patterns 12b connects pattern 12b1 by second and is connected in series along second direction, forms the second conductive unit.
First sensing patterns 12a described in the present embodiment is identical with described second sensing patterns 12b shape, is rhombus; Along first direction and second direction, all described first sensing patterns 12a are all adjacent with bight with described second sensing patterns 12b.
As other embodiments of the present invention, described first sensing patterns 12a also can be different from described second sensing patterns 12b, also can realize object of the present invention, belong to protection scope of the present invention.
In the present embodiment, described first sensing patterns 12a and described second sensing patterns 12b is formed within the same layer, as shown in Figure 2, described first connects pattern is connected pattern along stacking in turn perpendicular to described substrate direction with described second, described insulation course is arranged between the two.Described first conductive unit and described second conductive unit is made to form crossover network, and it is insulated from each other by being arranged on the described first insulation course connected between pattern 12a1 and second connection pattern 12b1, described insulation course is photoresist oxidant layer 13, and described first sensing patterns 12a1 and described second sensing patterns 12b1 is arranged with layer.
In the present embodiment, described photoresist oxidant layer 13 is transparent or semitransparent rete; And described photoresist oxidant layer 13 is preferably shadow tone photoresist oxidant layer.
Touch screen described in the present embodiment, first sensing patterns 12a and the second sensing patterns 12b does not arrange coverture, only be provided with one deck photoresist oxidant layer 13 between first connection pattern 12a1 and second connection pattern 12b1, effectively improve the transmittance of described touch screen.
The preparation method of described touch screen, comprises the steps:
S1, as shown in figure 3-1, form the first conductive layer 12 over the substrate 10 by sputtering technology, on the first conductive layer 12, form photoresist oxidant layer 13 by spin coating proceeding.
Described in the present embodiment, the first conductive layer 12 is preferably indium tin oxide (ITO) layer; as other embodiments of the present invention; described first conductive layer 12 is selected from but is not limited to the low-resistance materials such as molybdenum (Mo), silver (Ag), titanium (Ti), copper (Cu), aluminium (Al) or molybdenum/aluminium/molybdenum (Mo/Al/Mo); concrete preparation method selects according to material; all can realize object of the present invention, belong to protection scope of the present invention.
S2, as shown in figure 3-2, by photoetching process, patterning is carried out to photoresist oxidant layer 13, form mask.
The preferred shadow tone photoresist of photoresist described in the present embodiment (the AZ GXR600 series purchased from An Zhi Electron Material Co., Ltd), in the process of patterning, mask overlay area corresponding described first sensing patterns 12a, described second sensing patterns 12b and described first connect pattern 12a1, corresponding first height connecting the masked areas of pattern 12a1 is greater than the height in other regions, difference in height is 1.0 μm ~ 2.0 μm, the preferred 1.5um of the present embodiment.
S3, as shown in Fig. 3-3, adopt wet-etching technology to carry out patterning to the first conductive layer 12 by mask obtained in step S2, form some first sensing patterns 12a, the first sensing patterns 12a that connects along first direction first connect pattern 12a1 and some independently the second sensing patterns 12b.
The etching agent adopted in described wet-etching technology is selected from but is not limited to comprise the acidic etchant of oxalic acid, the preferred oxalic acid of the present embodiment.In the present embodiment, preferably connect pattern 12a over etching to described first, make the side of described first connection pattern 12a more inner than the side of described mask corresponding region, obtain described first and connect pattern 12a being projected in the drop shadow spread of described mask corresponding region on described substrate 10 on described substrate 10.
S4, as shown in Figure 3-4, adopt cineration technics remove portion mask, height due to the masked areas of the described first connection pattern 12a1 of correspondence is greater than the height in other regions, therefore be arranged on the described first masked areas connected on pattern 12a1 and be able to part reservation, the height of reserve part is suitable with the difference in height in ashing this region front and other regions.
As in Figure 3-5, the present embodiment also comprises the step of the photoresist oxidant layer 13 covered on described first connection pattern 12a1 being carried out to hot setting process, because the side of the first connection pattern 12a described in step S3 is more inner than the side of described mask corresponding region, described photoresist oxidant layer 13 is after hot setting process, make described photoresist oxidant layer 13 complete coated described first connect the side of pattern, effectively prevent the generation that the first connection pattern and second connects short circuit phenomenon between pattern.
S5, as seen in figures 3-6, the second conductive layer 14 covering the second conductive pattern and photoresist oxidant layer 13 along second direction is formed over the substrate 10 by sputtering technology, as shown in fig. 3 to 7, with etching technics, patterning formation is carried out to described second conductive layer 14 by photoetching and be connected pattern 12b1 along second of second direction series connection adjacent second conductive pattern.
Described second conductive layer 14 is selected from but is not limited to the low-resistance material layers such as molybdenum (Mo), silver (Ag), titanium (Ti), copper (Cu), aluminium (Al) or molybdenum/aluminium/molybdenum (Mo/Al/Mo), concrete preparation method selects according to material, all can realize object of the present invention, belong to protection scope of the present invention; The preferred molybdenum layer of the present embodiment.
The preparation method of touch screen of the present invention, the photoresist oxidant layer 13 of patterning first conductive layer 12 is adopted to be connected pattern 12b1 with second to make it to insulate for insulator separation first connects pattern 12a1, the preparation process of described touch screen is made only to need twice mask and twice etching technics just can realize, effectively reduce production process, improve production efficiency and yields.
Obviously, above-described embodiment is only for clearly example being described, and the restriction not to embodiment.For those of ordinary skill in the field, can also make other changes in different forms on the basis of the above description.Here exhaustive without the need to also giving all embodiments.And thus the apparent change of extending out or variation be still among protection scope of the present invention.
Claims (9)
1. a touch screen, comprises substrate, is arranged on some independently the first sensing patterns on substrate and some independently the second sensing patterns;
Described first sensing patterns connects pattern by first and is connected in series along first direction, forms the first conductive unit;
Described second sensing patterns connects pattern by second and is connected in series along second direction, forms the second conductive unit;
Described first conductive unit and described second conductive unit form crossover network, and insulated from each other by insulation course; It is characterized in that,
Described insulation course is photoresist oxidant layer, and described first sensing patterns and described second sensing patterns are arranged with layer.
2. a kind of touch screen according to claim 1, is characterized in that, described first connects pattern is connected pattern along stacking in turn perpendicular to described substrate direction with described second, described insulation course is arranged between the two.
3. a kind of touch screen according to claim 1, is characterized in that, described photoresist oxidant layer is transparent or semitransparent rete.
4. a kind of touch screen according to claim 1, is characterized in that, described photoresist is shadow tone photoresist.
5. a kind of touch screen according to claim 1, is characterized in that, described first sensing patterns is identical with described second sensing patterns.
6. a preparation method for touch screen, is characterized in that, comprises the steps:
S1, on substrate, form the first conductive layer and photoresist oxidant layer in turn;
S2, by photoetching process, patterning is carried out to photoresist oxidant layer, form mask;
S3, adopt etching technics to carry out patterning to the first conductive layer by mask obtained in step S2, form some first sensing patterns, the first sensing patterns of connecting along first direction first connect pattern and some independently the second sensing patterns;
S4, remove portion mask, retain the photoresist oxidant layer covered on the first connection pattern, and carry out hot setting process, makes photoresist oxidant layer coated first connect the side of pattern;
S5, on substrate, form the second conductive layer covering the second conductive pattern and photoresist oxidant layer along second direction, and patterning forms and connects pattern along second of second direction series connection adjacent second conductive pattern.
7. the preparation method of touch screen according to claim 6, it is characterized in that, described photoresist is shadow tone photoresist, in the described mask that step S2 is formed, form the height that the first height connecting the region of pattern is greater than other regions, difference in height is 1.0 μm ~ 2 μm.
8. the preparation method of touch screen according to claim 6, is characterized in that, by cineration technics remove portion mask in step S4.
9. the preparation method of touch screen according to claim 6, it is characterized in that, step S3 connects pattern over etching to described first, makes described first to connect pattern being projected in the drop shadow spread over the substrate of described mask corresponding region over the substrate.
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Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN102163097A (en) * | 2010-02-22 | 2011-08-24 | 三星移动显示器株式会社 | Fabricating method for touch screen panel |
| CN102163095A (en) * | 2010-02-22 | 2011-08-24 | 三星移动显示器株式会社 | Touch screen panel and fabricating method thereof |
| CN102339184A (en) * | 2010-07-14 | 2012-02-01 | 乐金显示有限公司 | Electrostatic capacity type touch screen panel and method of manufacturing the same |
| CN202230457U (en) * | 2010-11-09 | 2012-05-23 | 宸鸿光电科技股份有限公司 | Touch control panel structure |
| CN102866816A (en) * | 2012-09-03 | 2013-01-09 | 北京京东方光电科技有限公司 | Capacitive touch sensor, manufacturing method thereof, touch screen and display device |
| US20130050137A1 (en) * | 2011-08-23 | 2013-02-28 | Lg Display Co., Ltd. | Electrostatic capacity type touch screen panel |
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Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102163097A (en) * | 2010-02-22 | 2011-08-24 | 三星移动显示器株式会社 | Fabricating method for touch screen panel |
| CN102163095A (en) * | 2010-02-22 | 2011-08-24 | 三星移动显示器株式会社 | Touch screen panel and fabricating method thereof |
| CN102339184A (en) * | 2010-07-14 | 2012-02-01 | 乐金显示有限公司 | Electrostatic capacity type touch screen panel and method of manufacturing the same |
| CN202230457U (en) * | 2010-11-09 | 2012-05-23 | 宸鸿光电科技股份有限公司 | Touch control panel structure |
| US20130050137A1 (en) * | 2011-08-23 | 2013-02-28 | Lg Display Co., Ltd. | Electrostatic capacity type touch screen panel |
| CN102866816A (en) * | 2012-09-03 | 2013-01-09 | 北京京东方光电科技有限公司 | Capacitive touch sensor, manufacturing method thereof, touch screen and display device |
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Application publication date: 20150701 Assignee: Yungu (Gu'an) Technology Co., Ltd.|Bazhou Yungu Electronic Technology Co., Ltd.|Kunshan Institute of technology new flat panel display technology center Co., Ltd Assignor: Kunshan Guo Xian Photoelectric Co., Ltd. Contract record no.: X2019990000157 Denomination of invention: Touch screen and preparation method thereof Granted publication date: 20180904 License type: Common License Record date: 20191031 |
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Effective date of registration: 20191205 Address after: 510130 No.2 Xiangshan Avenue, Yongning Street, Zengcheng District, Guangzhou City, Guangdong Province (within the core area of Zengcheng economic and Technological Development Zone) Patentee after: Guangzhou Guoxian Technology Co., Ltd Address before: 215300, No. 1, Longteng Road, Kunshan Development Zone, Jiangsu, Suzhou, 4 Patentee before: Kunshan Guo Xian Photoelectric Co., Ltd. |
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