CN103290373A - Horizontal type multi-target vacuum sputtering or ion plating machine - Google Patents

Horizontal type multi-target vacuum sputtering or ion plating machine Download PDF

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Publication number
CN103290373A
CN103290373A CN2013101770023A CN201310177002A CN103290373A CN 103290373 A CN103290373 A CN 103290373A CN 2013101770023 A CN2013101770023 A CN 2013101770023A CN 201310177002 A CN201310177002 A CN 201310177002A CN 103290373 A CN103290373 A CN 103290373A
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China
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coating equipment
sputtering
rotating cage
targets
heater
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CN2013101770023A
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CN103290373B (en
Inventor
周小平
翁惠军
杨庆忠
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Ningbo Yunsheng Equipment Technology Co., Ltd.
Ningbo Yunsheng Magnet Components Technology Co., Ltd.
Ningbo Yunsheng Co Ltd
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NINGBO YUNSHENG ELECTROMECHANICAL EQUIPMENT Co Ltd
Ningbo Yunsheng Magnet Components Technology Co Ltd
Ningbo Yunsheng Co Ltd
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Priority to CN201310177002.3A priority Critical patent/CN103290373B/en
Publication of CN103290373A publication Critical patent/CN103290373A/en
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Abstract

A horizontal type multi-target vacuum sputtering or ion plating machine comprises a plating machine furnace body, a transmission output component in the plating machine, arc-shaped targets, sputtering targets, a vacuum pump-out slot and a workpiece rack, wherein the interior of the plating machine furnace body is divided into two areas, a plurality of arc-shaped targets are distributed in the area I and arranged below the plating machine furnace body and close to the inner wall of the plating machine furnace body, a plurality of sputtering targets are distributed in the area II and arranged above in the inner cavity of the plating machine furnace body at a hollow position of the corresponding workpiece rack above the center of the plating machine furnace body, a rotating part for placing workpieces and a power input mechanism are arranged on the workpiece rack, when the workpiece rack enters the plating machine furnace body, the rotating part can pass through between the arc-shaped targets and the sputtering targets, the power input mechanism of the workpiece rack and the transmission output component in the plating machine are coupled so as to drive the rotating part to rotate, and the vacuum pump-out slot is arranged at the center or close to the center of the plating machine furnace body. According to the horizontal type multi-target vacuum sputtering or ion plating machine, the mutual pollution of the arc-shaped targets and the sputtering targets can be effectively prevented, and the plating efficiency and the plating quality can be improved.

Description

A kind of horizontal many targets vacuum sputtering or ion film coating machine
Technical field
The present invention relates to technical field of vacuum plating, particularly substitute horizontal many targets vacuum sputtering or the ion film coating machine of electroplating technology for part.
Background technology
Plating is used for a long time in industry, but owing in electroplating process, there is the three waste discharge environmental pollution serious, need great amount of investment to administer again difficult radical cure, carried out research widely in the last few years both at home and abroad, part adopts ion plating to replace electroplating technology, and particularly vertical many targets vacuum sputtering or ion film coating machine have obtained development faster, mainly based on rack plating, its shortcoming is the plated film that relatively is fit to specific workpiece, and is more relatively poor than the adaptability of plating piece with plating, is difficult to realize the effect of workpiece barrel plating.
Horizontal many targets vacuum sputtering or ion film coating machine are at present in accelerated development, be mainly used in the little shape workpiece of barrel plating, as polygon mat spare of screw, nut, Polygons thin slice, annulus, disk, various polygon mat spare and fragile workpiece such as magneticsubstance different shape etc.
The barrel plating technology of horizontal many targets vacuum sputtering or ion film coating machine, be in the pilot run stage at present mostly, also have a lot of technical barriers to capture with respect to commercial application, improve the production efficiency of horizontal many targets vacuum sputtering or ion film coating machine, the arc target that arranges in coating equipment and sputtering target are many as much as possible, the coating ion that coating equipment was ejected in the unit time is many as far as possible, prevent the mutual pollution that arc plating and sputter are plated, be conducive to the layout of work rest and the setting of vacuum take-off mouth, make the structure of work rest can avoid the restriction of various arc targets and sputtering target effectively, it is big that the workpiece amount of once feeding is wanted, it is quick that the workpiece loading and unloading are wanted, so the commercial application of horizontal many targets vacuum sputtering or ion film coating machine remains to be furtherd investigate and exploitation.
Summary of the invention
Technical problem to be solved by this invention provides a kind of horizontal many targets vacuum sputtering or the ion film coating machine that substitutes electroplating technology for part, this coating equipment makes the whole turnover of work rest convenient, and the workpiece loading and unloading are quick, the coating wide adaptability, the production efficiency height is fit to the commercial application requirement.
The present invention solves the problems of the technologies described above the technical scheme that adopts: a kind of horizontal many targets vacuum sputtering or ion film coating machine, comprise the coating equipment body of heater, transmission output block in the coating equipment, the arc target, sputtering target, vacuum take-off mouth and work rest, be divided into two zones in the coating equipment body of heater, a plurality of arc targets are arranged in zone one, a plurality of arc targets are arranged on the coating equipment body of heater near the coating equipment inboard wall of furnace body, a plurality of sputtering targets are arranged in zone two, a plurality of sputtering targets are arranged in the coating equipment body of heater inner chamber of the corresponding work rest hollow position of coating equipment body of heater, work rest arranges tumbler and the power input mechanism of place work piece, tumbler can pass through between arc target and sputtering target when work rest entered in the coating equipment body of heater, the power input mechanism of work rest and the transmission output block in the coating equipment are coupled and drive the tumbler rotation, and coating equipment body of heater center or close center are provided with the vacuum take-off mouth.
Above-mentioned a plurality of arc target is arranged on the below of coating equipment body of heater near the coating equipment inboard wall of furnace body, and a plurality of sputtering targets are arranged in the coating equipment body of heater inner chamber of the corresponding work rest hollow position above the coating equipment body of heater center.
Above-mentioned vacuum take-off open area accounts for 20% ~ 60% of area that the coating equipment inboard wall of furnace body surrounds, is preferably 30% ~ 45%.
Above-mentioned sputtering target is cylindrical structure, and can be around the rotation of right cylinder axle center.
Above-mentioned sputtering target is divided into two groups of relative arrangement, and one group of sputtering target is near the coating equipment inboard wall of furnace body, and another group sputtering target is arranged in the coating equipment body of heater inner chamber of the corresponding work rest hollow position above the coating equipment body of heater center, sputter better effects if like this.
Above-mentioned arc target region and sputtering target zone are provided with the shielding barrier partitions.
Above-mentioned tumbler comprises rotating cage planet carrier and rotating cage, the rotating cage planet carrier is installed a plurality of rotating cage drive elements, each rotating cage drive element is equipped with rotating cage, power input mechanism drives the rotating cage planet carrier and rotates, the rotating cage planet carrier drives the power transmission part motion, power transmission part drives a plurality of rotating cage drive elements when being installed in sprocket engagement on the work rest outer support and rotates, and the rotating cage drive element drives rotating cage and rotates, and makes the revolution of rotating cage planet carrier and rotating cage rotation.
The transmission of above-mentioned rotating cage planet carrier and rotating cage drive element is sprocket wheel, and power transmission part is chain, like this transferring power compact construction.
During use, workpiece is placed on the rotating cage of work rest, and work rest is finished workpiece blanking and material loading work by travelling car or other moving members turnover coating equipment body of heater.When work rest moved into the coating equipment body of heater, the transmission output block in the coating equipment body of heater and the power input mechanism coupling of work rest drove the rotating cage planet carrier and revolve round the sun and the rotating cage rotation, can carry out arc plating and sputter plating to workpiece.
Beneficial effect of the present invention: the whole turnover of coating equipment work rest is convenient, workpiece material loading and blanking operate in the coating equipment body of heater and carry out outward, the workpiece loading and unloading are quick, after being conducive to work rest one-piece machine member material loading, be convenient to workpiece and outside the coating equipment body of heater, carry out the preceding technology pre-treatment of other technology stove plating, effectively improve working efficiency and workpiece quality of coating in the coating equipment.
Work rest drives rotating cage can pass through arc plating zone and sputter plating zone, guarantee that the coating ion that coating equipment ejected in the unit time bombards workpiece to be plated as much as possible, workpiece to be plated is evenly distributed between arc target and the sputtering target, once charging realizes the recombining process that arc plating and sputter are plated, the arc plating improves the coating stackeding speed, the sputter plating improves quality of coating, improves coating equipment production efficiency and quality of coating effectively.
Because the effect workpiece to be plated of gravity generally all is deposited in the below of rotating cage, so a plurality of arc targets are arranged in zone one, be arranged on the below of coating equipment body of heater, arc plating efficient is higher.A plurality of sputtering targets are arranged in zone two, be arranged on the top of coating equipment body of heater, a plurality of sputtering targets are divided into two groups of relative arrangement, one group of sputtering target is near the coating equipment inboard wall of furnace body, another group sputtering target is arranged in the coating equipment body of heater inner chamber of the corresponding work rest hollow position above the coating equipment body of heater center, rotating cage in the work rest can pass through between two groups of sputtering targets, and another group sputtering target is higher to the workpiece sputter plating efficient that is deposited in the rotating cage below.
The shielding baffle plate plates zone and sputter plating region separation to arc, can effectively prevent the mutual pollution that arc plating and sputter are plated, and improves the equipment serviceability.
Near coating equipment body of heater center, the vacuum take-off mouth is set, effectively improves vacuum take-off efficient, improve coating equipment system production efficiency.
Description of drawings
Fig. 1 is in the horizontal many targets vacuum sputtering of the embodiment of the invention or the ion film coating machine, the schematic layout pattern of a plurality of arc targets, sputtering target and rotating cage.
The horizontal many targets vacuum sputtering of Fig. 2 embodiment of the invention or ion film coating machine and work rest are installed relation.
The structure of Fig. 3 embodiment of the invention work rest.
The mode of Fig. 4 embodiment of the invention work rest turnover coating equipment.
Wherein the mark among the figure is as follows: 1 coating equipment body of heater; 2 coating equipment inboard wall of furnace body; 3 arc targets; 4 sputtering targets; 5 rotating cages; 6 workpieces to be plated; 7 arc targets and sputtering target shielding baffle plate; Transmission output block in the 8 coating equipment bodies of heater; 9 inboard wall of furnace body guide rails; 10 work rest bogie wheels; 11 power transmission chains; 12 chain tensioning devices; 13 sprocket wheels; Suction mouth in the 14 coating equipment bodies of heater; 15 travelling cars; 16 vehicle guides; 17 work rest outer supports; 18 rotating cage planet carriers; 19 rotating cage drive elements; 20 power input mechanisms; 21 are fixed on the sprocket wheel on the work rest outer support; 22 work rests.
Embodiment
The present invention is further described below in conjunction with drawings and Examples.
As shown in Figure 1 and Figure 2, coating equipment inboard wall of furnace body 2 is divided into two zones, and a regional H arranges a plurality of arc targets 3, is arranged on the below of coating equipment body of heater 1, and regional two Z arrange a plurality of sputtering targets 4, is arranged on the top of coating equipment body of heater 1.
Sputtering target 4 is cylindrical structures, and can be around the rotation of right cylinder axle center.
Sputtering target 4 is divided into two groups of relative arrangement, one group of sputtering target 4a is near coating equipment inboard wall of furnace body 2, another group sputtering target 4b is located in the coating equipment body of heater inner chamber of corresponding work rest 22 hollow positions in top, coating equipment body of heater center, and the rotating cage 5 in the work rest 22 can pass through between one group of sputtering target 4a and another group sputtering target 4b.
Shielding baffle plate 7 is separated arc target region H and sputtering target zone Z, shielding baffle plate 7 fens arc target regions H and sputtering target zone Z.
Be provided with vacuum take-off mouth 14 at coating equipment body of heater 1 near the center, vacuum take-off mouth 14 areas account for 20% ~ 60% of area that coating equipment inboard wall of furnace body 2 surrounds, and preferably 30% ~ 45%.
As shown in Figure 3, work rest 22 comprises rotating cage 5, work rest bogie wheel 10, the rotating cage planet carrier 18 of band rotating cage drive element 1, the power input mechanism 20 of work rest.
As shown in Figure 4,22 of work rests on travelling car 15, on travelling car 15 can towards A to or B move to orientation.
When work rest 22 integral body turnover coating equipment bodies of heater 1, two side vehicle guides 16 of travelling car 15 align with inboard wall of furnace body guide rail 9 respectively, work rest B is to movement, work rest shifts out coating equipment body of heater 1, and workpiece to be plated 6 is done blanking operation among Fig. 1 outside coating equipment body of heater 1, finish blanking after, load onto rotating cage 5 and workpiece to be plated 6, work rest A enters in the coating equipment body of heater 1 to movement, finishes workpiece blanking and material loading work.
When work rest 22 moves into coating equipment body of heater 1, transmission output block 8 in the coating equipment body of heater and power input mechanism 20 couplings of work rest, driving rotating cage planet carrier 18 revolves round the sun, see Fig. 2, rotating cage planet carrier 18 is equipped with a plurality of rotating cage drive elements 19, see Fig. 3, each rotating cage drive element 19 is equipped with sprocket wheel 13, when meshing, meshes with the sprocket wheel 21 that is fixed on the work rest outer support 17 by the sprocket wheel 13 of power transmission chain 11 and a plurality of rotating cage drive elements, chain tensioning device 12 tensioning power transmission chains 11, realize 18 revolution and rotating cage 5 spinning motions of rotating cage planet carrier, see Fig. 2.

Claims (9)

1. horizontal many targets vacuum sputtering or ion film coating machine, it is characterized in that: comprise the coating equipment body of heater, transmission output block in the coating equipment, the arc target, sputtering target, vacuum take-off mouth and work rest, be divided into two zones in the coating equipment body of heater, a plurality of arc targets are arranged in zone one, a plurality of arc targets are arranged on the coating equipment body of heater near the coating equipment inboard wall of furnace body, a plurality of sputtering targets are arranged in zone two, a plurality of sputtering targets are arranged in the coating equipment body of heater inner chamber of the corresponding work rest hollow position of coating equipment body of heater, work rest arranges tumbler and the power input mechanism of place work piece, tumbler can pass through between arc target and sputtering target when work rest entered in the coating equipment body of heater, the power input mechanism of work rest and the transmission output block in the coating equipment are coupled and drive the tumbler rotation, and coating equipment body of heater center or close center are provided with the vacuum take-off mouth.
2. according to the described horizontal many targets vacuum sputtering of claim l or ion film coating machine, it is characterized in that: described a plurality of arc targets are arranged on the below of coating equipment body of heater near the coating equipment inboard wall of furnace body, and a plurality of sputtering targets are arranged in the coating equipment body of heater inner chamber of the corresponding work rest hollow position above the coating equipment body of heater center.
3. according to the described horizontal many targets vacuum sputtering of claim l or ion film coating machine, it is characterized in that: described vacuum take-off open area accounts for 20% ~ 60% of area that the coating equipment inboard wall of furnace body surrounds.
4. horizontal many targets vacuum sputtering according to claim 3 or ion film coating machine is characterized in that: described vacuum take-off open area accounts for 30% ~ 45% of area that the coating equipment inboard wall of furnace body surrounds.
5. according to the described horizontal many targets vacuum sputtering of claim l or ion film coating machine, it is characterized in that: described sputtering target is cylindrical structure, and can be around the rotation of right cylinder axle center.
6. according to the described horizontal many targets vacuum sputtering of claim l or ion film coating machine, it is characterized in that: described sputtering target is divided into two groups of relative arrangement, one group of sputtering target is near the coating equipment inboard wall of furnace body, and another group sputtering target is arranged in the coating equipment body of heater inner chamber of the corresponding work rest hollow position above the coating equipment body of heater center.
7. according to the described horizontal many targets vacuum sputtering of claim l or ion film coating machine, it is characterized in that: arc target region and sputtering target zone are provided with the shielding barrier partitions.
8. horizontal many targets vacuum sputtering according to claim 1 or ion film coating machine, it is characterized in that: described tumbler comprises rotating cage planet carrier and rotating cage, the rotating cage planet carrier is installed a plurality of rotating cage drive elements, each rotating cage drive element is equipped with rotating cage, power input mechanism drives the rotating cage planet carrier and rotates, the rotating cage planet carrier drives the power transmission part motion, power transmission part drives a plurality of rotating cage drive elements when being installed in sprocket engagement on the work rest outer support and rotates, the rotating cage drive element drives rotating cage and rotates, and makes the revolution of rotating cage planet carrier and rotating cage rotation.
9. horizontal many targets vacuum sputtering according to claim 1 or ion film coating machine, it is characterized in that: the transmission of described rotating cage planet carrier and rotating cage drive element is sprocket wheel, and power transmission part is chain.
CN201310177002.3A 2013-05-14 2013-05-14 A kind of horizontal type multi-target vacuum sputtering or ion plating machine Active CN103290373B (en)

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Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103820766A (en) * 2014-03-22 2014-05-28 沈阳中北真空设备有限公司 Magnetron coating apparatus for neodymium-iron-boron rare-earth permanent magnet devices, and manufacturing method thereof
CN104174544A (en) * 2014-08-26 2014-12-03 法柯特科技(江苏)有限公司 Vacuum spraying target production equipment
CN105970161A (en) * 2016-06-24 2016-09-28 李晓马 Stainless steel vacuum multi-arc ion plating horizontal furnace
CN106086792A (en) * 2016-06-24 2016-11-09 李晓马 A kind of stainless-steel vacuum plated film horizontal chamber furnace (oven)
CN108300974A (en) * 2018-04-28 2018-07-20 深圳市正和忠信股份有限公司 PVD Tumble-plating devices and method
CN108359943A (en) * 2018-01-18 2018-08-03 维达力实业(深圳)有限公司 Variable gear ratio tunnel type sputter coating machine
CN110621804A (en) * 2017-05-12 2019-12-27 应用材料公司 Redeposition-free sputtering system
CN113699493A (en) * 2021-08-30 2021-11-26 北京航空航天大学合肥创新研究院(北京航空航天大学合肥研究生院) Cluster beam deposition equipment for realizing wide-width nanoparticle beam

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CN1530459A (en) * 2003-03-10 2004-09-22 北京凯贝克咨询有限公司 Nanometer vacuum coating film furnaces
CN1575350A (en) * 2001-08-24 2005-02-02 纳米纳克斯公司 Method and apparatus of producing uniform isotropic stresses in a sputtered film
CN101407906A (en) * 2008-10-20 2009-04-15 舟山市汉邦机械科技有限公司 Vacuum film plating apparatus
CN201793727U (en) * 2010-08-03 2011-04-13 深圳市振恒昌实业有限公司 Planet gear mouse cage type work rest
US20120097103A1 (en) * 2010-10-26 2012-04-26 Hon Hai Precision Industry Co., Ltd. Physical vapor deposition device for coating workpiece

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1575350A (en) * 2001-08-24 2005-02-02 纳米纳克斯公司 Method and apparatus of producing uniform isotropic stresses in a sputtered film
CN1530459A (en) * 2003-03-10 2004-09-22 北京凯贝克咨询有限公司 Nanometer vacuum coating film furnaces
CN101407906A (en) * 2008-10-20 2009-04-15 舟山市汉邦机械科技有限公司 Vacuum film plating apparatus
CN201793727U (en) * 2010-08-03 2011-04-13 深圳市振恒昌实业有限公司 Planet gear mouse cage type work rest
US20120097103A1 (en) * 2010-10-26 2012-04-26 Hon Hai Precision Industry Co., Ltd. Physical vapor deposition device for coating workpiece

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103820766A (en) * 2014-03-22 2014-05-28 沈阳中北真空设备有限公司 Magnetron coating apparatus for neodymium-iron-boron rare-earth permanent magnet devices, and manufacturing method thereof
CN103820766B (en) * 2014-03-22 2016-04-06 沈阳中北真空设备有限公司 A kind of magnetic control film coating equipment of neodymium iron boron rare earth permanent magnet device and manufacture method
CN104174544A (en) * 2014-08-26 2014-12-03 法柯特科技(江苏)有限公司 Vacuum spraying target production equipment
CN104174544B (en) * 2014-08-26 2016-06-08 法柯特科技(江苏)有限公司 Target airless spraying produces equipment
CN105970161A (en) * 2016-06-24 2016-09-28 李晓马 Stainless steel vacuum multi-arc ion plating horizontal furnace
CN106086792A (en) * 2016-06-24 2016-11-09 李晓马 A kind of stainless-steel vacuum plated film horizontal chamber furnace (oven)
CN110621804A (en) * 2017-05-12 2019-12-27 应用材料公司 Redeposition-free sputtering system
CN108359943A (en) * 2018-01-18 2018-08-03 维达力实业(深圳)有限公司 Variable gear ratio tunnel type sputter coating machine
CN108300974A (en) * 2018-04-28 2018-07-20 深圳市正和忠信股份有限公司 PVD Tumble-plating devices and method
CN113699493A (en) * 2021-08-30 2021-11-26 北京航空航天大学合肥创新研究院(北京航空航天大学合肥研究生院) Cluster beam deposition equipment for realizing wide-width nanoparticle beam
CN113699493B (en) * 2021-08-30 2023-10-10 北京航空航天大学合肥创新研究院(北京航空航天大学合肥研究生院) Cluster beam deposition equipment for realizing wide nanoparticle beam

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Effective date of registration: 20181204

Address after: 315040 Mingzhu Road 428, Ningbo High-tech Zone, Zhejiang Province

Co-patentee after: Ningbo Yunsheng Co., Ltd.

Patentee after: Ningbo Yunsheng Equipment Technology Co., Ltd.

Co-patentee after: Ningbo Yunsheng Magnet Components Technology Co., Ltd.

Address before: 315040 No. 1 Yangfan Road, Ningbo High-tech Zone, Zhejiang Province

Co-patentee before: Ningbo Yunsheng Electromechanical Equipment Co., Ltd.

Patentee before: Ningbo Yunsheng Co., Ltd.

Co-patentee before: Ningbo Yunsheng Magnet Components Technology Co., Ltd.