CN108359943A - Variable gear ratio tunnel type sputter coating machine - Google Patents

Variable gear ratio tunnel type sputter coating machine Download PDF

Info

Publication number
CN108359943A
CN108359943A CN201810048979.8A CN201810048979A CN108359943A CN 108359943 A CN108359943 A CN 108359943A CN 201810048979 A CN201810048979 A CN 201810048979A CN 108359943 A CN108359943 A CN 108359943A
Authority
CN
China
Prior art keywords
plated film
hanger
outer barrel
membrane cavity
inner cylinder
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201810048979.8A
Other languages
Chinese (zh)
Inventor
李可峰
许仁
符东浩
虞文韬
王伟
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
MILLION TECHNOLOGY Co Ltd
WEIDALI INDUSTRY (SHENZHEN) Co Ltd
Maxford Technology Ltd
Original Assignee
MILLION TECHNOLOGY Co Ltd
WEIDALI INDUSTRY (SHENZHEN) Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by MILLION TECHNOLOGY Co Ltd, WEIDALI INDUSTRY (SHENZHEN) Co Ltd filed Critical MILLION TECHNOLOGY Co Ltd
Priority to CN201810048979.8A priority Critical patent/CN108359943A/en
Publication of CN108359943A publication Critical patent/CN108359943A/en
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34Sputtering
    • C23C14/3464Sputtering using more than one target
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50Substrate holders
    • C23C14/505Substrate holders for rotation of the substrates

Abstract

The invention discloses a kind of variable gear ratio tunnel type sputter coating machines.The variable gear ratio tunnel type sputter coating machine includes plated film cylinder, radio-frequency ion source, plated film hanger and hanger driving part, plated film cylinder includes inner cylinder and outer barrel, there is interval and the interval to form plating membrane cavity between inner cylinder and outer barrel, the both ends of inner cylinder and the both ends of outer barrel correspond to closing connection so that plating membrane cavity is in closed, on the inner wall of the direction plating membrane cavity of outer barrel or the inner wall of inner cylinder towards plating membrane cavity is equipped with multiple coated target slots, radio-frequency ion source is connected on the inner wall of the direction plating membrane cavity of outer barrel or on the inner wall of inner cylinder direction plating membrane cavity, plated film hanger is annular in shape, plated film hanger is located at plated film intracavitary and plated film hanger is sheathed on inner cylinder, multiple hanging rods are connected on plated film hanger, multiple hanging rods are parallel and arrangement annular in shape, hanger driving part is connected to plated film hanger for driving plated film hanger rotation.The variable gear ratio tunnel type sputter coating machine can effectively promote production capacity and efficiency.

Description

Variable gear ratio tunnel type sputter coating machine
Technical field
The present invention relates to a kind of variable gear ratio tunnel type sputter coating machines.
Background technology
In plated film field, the line length of degree coating machine used at present is compared with long, occupied space is big, and cost is higher and there are small The problem of chamber extension amount is less, production capacity is low, evacuated time is long, heating time is long and production capacity promotes limited extent, or even exist not With between type target the problem of cross contamination.
Invention content
Based on this, it is necessary to provide a kind of variable gear ratio tunnel type sputter coating that can effectively promote production capacity and efficiency Machine.
A kind of variable gear ratio tunnel type sputter coating machine, including the driving of plated film cylinder, radio-frequency ion source, plated film hanger, hanger Component and rotation driving part, the plated film cylinder include inner cylinder and outer barrel, are had between the inner cylinder and the outer barrel Interval and the interval formed plating membrane cavity, it is described plating membrane cavity it is closed at both ends, the outer barrel towards it is described plating membrane cavity inner wall on or The outer wall of inner cylinder described in person towards the plating membrane cavity is equipped with multiple coated target slots, and the radio-frequency ion source is connected to the outer barrel Towards it is described plating membrane cavity inner wall on or the inner cylinder towards it is described plating membrane cavity outer wall on, the plated film hanger is annular in shape, The plated film hanger is located at the plated film intracavitary and the plated film hanger is sheathed on the inner cylinder, is connected on the plated film hanger Multiple hanging rods for being placed for base material to be plated, multiple hanging rods are parallel and arrangement annular in shape, the hanger driving part connect The plated film hanger is connected to for driving the plated film hanger rotation, quantity and the hanging rod of the rotation driving part Quantity is consistent, and each rotation driving part is both connected on the plated film hanger, divides on each rotation driving part Lian Jie not be there are one the hanging rod, the rotation driving part is for driving the hanging rod to be rotated relative to the plated film hanger.
Further include target slot baffle, the quantity of the target slot baffle and the coated target slot in one of the embodiments, Quantity is consistent, and multiple target slot baffles are corresponded with multiple coated target slots, and the target slot baffle is connected to described outer Cylinder direction it is described plating membrane cavity inner wall on or the inner cylinder towards it is described plating membrane cavity outer wall on, the baffle plate with plated film is used for Open or close the coated target slot.
The inner wall of the outer barrel towards the plating membrane cavity is equipped with multiple coated target slots, institute in one of the embodiments, State radio-frequency ion source be connected to the inner cylinder towards it is described plating membrane cavity outer wall on;Alternatively, the inner cylinder is towards the plating membrane cavity Outer wall be equipped with multiple coated target slots, the radio-frequency ion source be connected to the outer barrel towards it is described plating membrane cavity inner wall on.
The quantity of the radio-frequency ion source is multiple in one of the embodiments,.
The inner cylinder is cylindrical in one of the embodiments, and the outer barrel is cylindrical, and the plated film hanger is in circle Ring-type, the inner cylinder, the outer barrel and the plated film hanger are coaxial.
Further include the first filming block piece in one of the embodiments, the first filming block piece is cylindrical in shape, described Between the plated film hanger and the inner cylinder, the first filming block piece is sheathed in described the first filming block piece Cylinder, the first filming block piece are connected to the hanger driving part, the first filming block piece and the plated film hanger It is opposing stationary, there are multiple the first filming through-holes, multiple the first filming through-holes on the side wall of the first filming block piece It is corresponded with multiple hanging rods.
Further include the second plated film block piece in one of the embodiments, the second plated film block piece is cylindrical in shape, described For second plated film block piece between the plated film hanger and the outer barrel, the second plated film block piece is sheathed on the plating Film hanger, the second plated film block piece are connected to the hanger driving part, the second plated film block piece and the plated film Hanger can move synchronously, on the side wall of the second plated film block piece have multiple second plated through holes, multiple described second Plated through holes are corresponded with multiple hanging rods.
Further include pre- feed space in one of the embodiments, the side wall of the outer barrel has feed inlet, the pre- charging Room is located at the outside of the outer barrel and is connected to the outer barrel, and the pre- feed space is communicated in the plated film by the feed inlet Chamber.
Further include transmission shaft, driving gear and transmission gear in one of the embodiments, the transmission shaft is connected to The middle part of plated film hanger bottom surface, the driving gear is arranged in the drive shaft for being connected to the hanger driving part, described Transmission gear, which is arranged, to be connected on the transmission shaft, and the driving gear and the transmission gear are ratcheting.
Further include the first rotating gear and the second rotating gear, the first rotation tooth in one of the embodiments, The quantity of wheel is consistent with the quantity of the hanging rod, and multiple first rotating gears are corresponded with multiple hanging rods, First rotating gear, which is arranged, to be connected on the corresponding hanging rod, and quantity and the rotation of second rotating gear are driven The quantity of dynamic component is consistent, and multiple second rotating gears are corresponded with multiple rotation driving parts, each described Second rotating gear, each second rotating gear and corresponding described first are connected separately on rotation driving part Rotating gear is ratcheting.
Above-mentioned variable gear ratio tunnel type sputter coating machine, duty ratio is small, and extension amount is big, and equipment cost is low, close by being arranged The plating membrane cavity of envelope, can rapid vacuumizing, be rapidly heated, heat the time used it is opposite reduce, extension production capacity is significantly promoted, and is plated Cavity space substantially reduces than existing cylindrical machine while extension amount is substantially improved in membrane cavity, compared to existing cylindrical machine.It is above-mentioned Variable gear ratio tunnel type sputter coating machine, coating fully, fast reaction, promote film layer purity.Above-mentioned variable gear ratio tunnel There are road formula sputter coating machine multiple coated target slots, the setting of multiple coated target slots so that target position increase can be filled, can realize more The quick plated film of target, multiple types.Above-mentioned variable gear ratio tunnel type sputter coating machine, film forming compactness is high, rate of film build is high, single The stove time is short, continuous production capacity is high.Above-mentioned variable gear ratio tunnel type sputter coating machine drives extension by the way that rotation driving part is arranged Bar is rotated relative to plated film hanger, and the rotating speed of plated film hanger and the rotating speed of hanging rod are adjustable, the rotation of plated film hanger and hanging rod Rotation formed revolution and rotation, revolution, rotational velocity reach variable gear ratio than adjustable so that above-mentioned variable gear ratio tunnel type Sputter coating machine can be matched with the filming equipment of multiple types coating.
Above-mentioned variable gear ratio tunnel type sputter coating machine is equipped with target slot baffle arrangement at coated target slot, and target slot baffle can Effectively reduce the cavity design mutually polluted between target not of the same race in multiple coated target slots.Above-mentioned variable gear ratio tunnel type sputtering Coating machine can effectively reduce the cross contamination between variety classes target, reduce the appearance that interlayer intersects excessive layer.
Above-mentioned variable gear ratio tunnel type sputter coating machine, to hanger driving part namely revolution power under high speed conditions The requirement in source reduces, and has saved cost;The major-minor power source cooperation being made up of hanger driving part, rotation driving part, hangs Bar can reach higher rotating speed, can effectively promote rate of film build, reduce plated film time, promote production capacity, and production capacity is promoted while being increased The effective degree for adding coating to react promotes reaction purity.
Description of the drawings
Fig. 1 is that the variable gear ratio tunnel type sputter coating machine described in an embodiment removes the sagittal plane section view after pre- feed space Schematic diagram;
Fig. 2 is that the variable gear ratio tunnel type sputter coating machine described in an embodiment removes the sagittal plane section view after pre- feed space Schematic diagram;
Fig. 3 is that the variable gear ratio tunnel type sputter coating machine described in an embodiment includes the first filming block piece, the second plating Sagittal plane schematic cross-sectional view when film block piece.
Reference sign
10, variable gear ratio tunnel type sputter coating machine;100, plated film cylinder;110, inner cylinder;120, outer barrel;130, membrane cavity is plated; 140, coated target slot;200, radio-frequency ion source;300, plated film hanger;310, hanging rod;400, target slot baffle;510, the first filming hides Block piece;511, the first filming through-hole;520, the second plated film block piece;521, the second plated through holes;600, pre- feed space;700, certainly Shaft.
Specific implementation mode
To facilitate the understanding of the present invention, below with reference to relevant drawings to invention is more fully described.In attached drawing Give presently preferred embodiments of the present invention.But the present invention can realize in many different forms, however it is not limited to this paper institutes The embodiment of description.Keep the understanding to the disclosure more thorough on the contrary, purpose of providing these embodiments is Comprehensively.
It should be noted that when element is referred to as " being fixed on " another element, it can be directly on another element Or there may also be elements placed in the middle.When an element is considered as " connection " another element, it can be directly connected to To another element or it may be simultaneously present centering elements.
Unless otherwise defined, all of technologies and scientific terms used here by the article and belong to the technical field of the present invention The normally understood meaning of technical staff is identical.Used term is intended merely to description tool in the description of the invention herein The purpose of the embodiment of body, it is not intended that in the limitation present invention.Term as used herein "and/or" includes one or more phases Any and all combinations of the Listed Items of pass.
Shown in Figure 1, the present embodiment relates to a kind of variable gear ratio tunnel type sputter coating machine 10.The variable gear ratio tunnel Road formula sputter coating machine 10 includes plated film cylinder 100, radio-frequency ion source 200, plated film hanger 300, hanger driving part and rotation Driving part.
Plated film cylinder 100 includes inner cylinder 110 and outer barrel 120.Between there is interval between inner cylinder 110 and outer barrel 120 and be somebody's turn to do Membrane cavity 130 is plated every being formed.The closing corresponding with the distribution of the both ends of outer barrel 120 of the both ends of inner cylinder 110 connects so that plating membrane cavity 130 is in envelope Close shape.Inner cylinder 110 and outer barrel 120 can be circular concentric, concentric polygon etc., be formed between inner cylinder 110 and outer barrel 120 narrow The plating membrane cavity 130 (loop tunnel cavity) of annular.
Outer barrel 120 direction plating membrane cavity 130 inner wall on or inner cylinder 110 towards plating membrane cavity 130 outer wall be equipped with it is more A coated target slot 140.
Radio-frequency ion source 200 is connected on the inner wall of the direction plating membrane cavity 130 of outer barrel 120 or inner cylinder 110 is towards plated film On the inner wall of chamber 130.Specifically, shown in Figure 1, when the inner wall that the direction of outer barrel 120 plates membrane cavity 130 is equipped with multiple plated films When target slot 140, radio-frequency ion source 200 is connected on the outer wall of direction plating membrane cavity 130 of inner cylinder 110.It is shown in Figure 2, when interior The inner wall of cylinder 110 towards plating membrane cavities 130 is equipped with multiple coated target slots 140, for placing target source in coated target slot 140, namely Need the material source being plated on base material to be plated.Radio-frequency ion source 200 is connected on the inner wall of direction plating membrane cavity 130 of outer barrel 120. Multiple coated target slots 140 are evenly distributed, it can be achieved that the equivalent plated film of each position in concentric circumferences;Target group quantity is 1 group or more Group.
Radio-frequency ion source 200 can be RF radio-frequency ion sources.Radio-frequency ion source 200 has independent RF cavitys, and RF cavitys can Make the abundant atomization of the indoor reactant gas molecules of RF chambers, is conducive to the abundant fast reaction of coating.
Plated film hanger 300 is annular in shape.Plated film hanger 300 is located in plating membrane cavity 130 and plated film hanger 300 is sheathed on inner cylinder 110.Multiple hanging rods 310 for being placed for base material to be plated are connected on plated film hanger 300.Multiple hanging rods 310 are parallel and are in ring Shape arranges.Hanger driving part is connected to plated film hanger 300 and is rotated for driving plated film hanger 300.
In one embodiment, which further includes target slot baffle 400.Target slot baffle 400 quantity is consistent with the quantity of coated target slot 140.Multiple target slot baffles 400 are corresponded with multiple coated target slots 140.Target Slot baffle 400 be connected to outer barrel 120 direction plating membrane cavity 130 inner wall on or inner cylinder 110 towards plating membrane cavity 130 outer wall On, target slot baffle 400 is used to open or closes coated target slot 140.Target slot baffle 400 is to promote public autobiography hanging rack structure Plate film uniformity, stop outer barrel 120 on target distance farther out when film deposition, increase base material to be plated far from anti-after target Between seasonable, the reaction adequacy of coating is promoted.
Above-mentioned variable gear ratio tunnel type sputter coating machine 10 is equipped with 400 structure of target slot baffle at coated target slot 140, Target slot baffle 400 can effectively reduce the cavity design mutually polluted between target not of the same race in multiple coated target slots 140.Above-mentioned can Gear ratio tunnel type sputter coating machine 10 can effectively reduce the cross contamination between variety classes target, reduce interlayer and intersect excessive layer Appearance.
Further, in one embodiment, multiple coated target slots 140 are uniformly distributed.
Further, in one embodiment, the quantity of radio-frequency ion source 200 is multiple.
Preferably, in one embodiment, inner cylinder 110 is cylindrical, and outer barrel 120 is cylindrical, the diameter of plated film hanger 300 To face in annular shape, inner cylinder 110, outer barrel 120 and plated film hanger 300 are coaxial.
In one embodiment, which further includes the first filming block piece 510.The One plated film block piece 510 is cylindrical in shape.The first filming block piece 510 is between plated film hanger 300 and inner cylinder 110, the first plating Film block piece 510 is sheathed on inner cylinder 110.The first filming block piece 510 is connected to hanger driving part, the first filming block piece 510 is opposing stationary with plated film hanger 300.There are multiple the first filming through-holes 511 on the side wall of the first filming block piece 510.It is more A the first filming through-hole 511 is corresponded with multiple hanging rods 310.
In one embodiment, which further includes the second plated film block piece 520.The Two plated film block pieces 520 are cylindrical in shape.Second plated film block piece 520 is between plated film hanger 300 and outer barrel 120, the second plating Film block piece 520 is sheathed on plated film hanger 300.Second plated film block piece 520 is connected to hanger driving part, and the second plated film blocks Part 520 and plated film hanger 300 are opposing stationary.There are multiple second plated through holes 521 on the side wall of second plated film block piece 520. Multiple second plated through holes 521 are corresponded with multiple hanging rods 310.
Shown in Figure 3, in one embodiment, which further includes pre- feed space 600.The side wall of outer barrel 120 has feed inlet.Pre- feed space 600 is located at the outside of outer barrel 120 and is connected to outer barrel 120.Preadmission Material room 600 is communicated in plating membrane cavity 130 by feed inlet.Pre- feed space 600 is to realize automation input and output material, and reduce and plated per stove External pre- charging small chamber can be used in heating, evacuated time when film input and output material, the disengaging realized rapid evacuation, quickly heated Material, save energy consumption, when consume, promoted production capacity.
In one embodiment, the variable gear ratio tunnel type sputter coating machine 10 further include transmission shaft, driving gear and Transmission gear.Transmission shaft is connected to the middle part of 300 bottom surface of plated film hanger, and driving gear is arranged the drive for being connected to hanger driving part On moving axis.Transmission gear, which is arranged, to be connected on transmission shaft, and driving gear is ratcheting with transmission gear.
Preferably, in one embodiment, the quantity of rotation driving part is consistent with the quantity of hanging rod 310.Each rotation Driving part is both connected on plated film hanger 300, is separately connected on each rotation driving part there are one hanging rod 310.Rotation is driven Dynamic component is for driving hanging rod 310 to be rotated relative to plated film hanger 300.Alternatively, the variable gear ratio tunnel type sputter coating machine 10 Further include rotating gear and the axis of rotation 700, in a ring, the quantity of rotation driving part is one to rotating gear, is made at this time Following corresponding setting:There are the gear teeth, the periphery wall of the axis of rotation 700 to have the gear teeth, each hanging rod 310 on the internal perisporium of rotating gear Be connected to plated film hanger 300 by the axis of rotation 700, rotating gear be sheathed on multiple hanging rods 310 and the gear teeth of rotating gear with it is each The ratcheting cooperation of the gear teeth of a hanging rod 310, rotation driving part are connected to rotating gear for driving rotating gear rotation, so A rotation power source can be arranged in setting.
The variable gear ratio tunnel type sputter coating machine 10, further includes the first rotating gear and the second rotating gear, described The quantity of first rotating gear is consistent with the quantity of the hanging rod 310, multiple first rotating gears with it is multiple described Hanging rod 310 corresponds, and first rotating gear, which is arranged, to be connected on the corresponding hanging rod 310, the second rotation tooth The quantity of wheel is consistent with the quantity of rotation driving part, multiple second rotating gears and multiple rotation driving portions Part corresponds, and second rotating gear, each second rotation are connected separately on each rotation driving part Gear and corresponding first rotating gear are ratcheting.
Above-mentioned variable gear ratio tunnel type sputter coating machine 10 drives hanging rod 310 opposite by the way that rotation driving part is arranged It is rotated in plated film hanger 300, the rotating speed of plated film hanger 300 and the rotating speed of hanging rod 310 are adjustable, the rotation of plated film hanger 300 Rotation with hanging rod 310 forms revolution and rotation, and public rotational velocity is than adjustable so that above-mentioned variable gear ratio tunnel type sputtering plating Film machine 10 can be matched with the filming equipment of multiple types coating.Above-mentioned variable gear ratio tunnel type sputter coating machine 10, high rotating speed Under the conditions of to hanger driving part namely revolve round the sun power source requirement reduce, saved cost;Pass through hanger driving part, rotation The major-minor power source cooperation of driving part composition, revolution, rotational velocity reach variable gear ratio than adjustable, and hanging rod 310 can reach more High rotating speed can effectively promote rate of film build, reduce plated film time, promote production capacity, and production capacity is promoted while increasing coating reaction Effective degree, promoted reaction purity.
The revolution speed (speed of hanger driving part driving) of hanging rod 310 is 1-50 revs/min, rotational velocity (rotation The speed of driving part driving) it is 18-900 revs/min;Revolution speed, determining for rotational velocity collocation need according to every group of target Target number, single group target effective coating wire perimeter determine.For high-precision membrane system, one group of target is passed through in the revolution of hanging rod 310, needs certainly Turn 3-50 weeks, makes this from the product plated film time having the same on swivel.
Above-mentioned variable gear ratio tunnel type sputter coating machine 10, duty ratio is small, and extension amount is big, and equipment cost is low, passes through setting Plate membrane cavity 130, can rapid vacuumizing, be rapidly heated so that heat time used opposite reduction, extend production capacity and significantly promoted, And cavity space substantially reduces than existing cylindrical machine while extension amount is substantially improved, compared to existing cylindrical machine.Above-mentioned Variable gear ratio tunnel type sputter coating machine 10, coating fully, fast reaction, promote film layer purity.Above-mentioned variable gear ratio tunnel There are road formula sputter coating machine 10 multiple coated target slots 140, the setting of multiple coated target slots 140 so that target position increase, energy can be filled Enough realize the quick plated film of more targets, multiple types.Above-mentioned variable gear ratio tunnel type sputter coating machine 10, film forming compactness is high, at Film rate high, single stove time is short, continuous production capacity is high.
Each technical characteristic of embodiment described above can be combined arbitrarily, to keep description succinct, not to above-mentioned reality It applies all possible combination of each technical characteristic in example to be all described, as long as however, the combination of these technical characteristics is not deposited In contradiction, it is all considered to be the range of this specification record.
Several embodiments of the invention above described embodiment only expresses, the description thereof is more specific and detailed, but simultaneously Cannot the limitation to the scope of the claims of the present invention therefore be interpreted as.It should be pointed out that for those of ordinary skill in the art For, without departing from the inventive concept of the premise, various modifications and improvements can be made, these belong to the guarantor of the present invention Protect range.Therefore, the protection domain of patent of the present invention should be determined by the appended claims.

Claims (10)

1. a kind of variable gear ratio tunnel type sputter coating machine, which is characterized in that including plated film cylinder, radio-frequency ion source, plated film hanger, Hanger driving part and rotation driving part, the plated film cylinder include inner cylinder and outer barrel, the inner cylinder and the outer barrel Between there is interval and the interval to form plating membrane cavity, the plating membrane cavity it is closed at both ends, the outer barrel is towards the plating membrane cavity On inner wall or the outer wall of the inner cylinder towards the plating membrane cavity is equipped with multiple coated target slots, and the radio-frequency ion source is connected to The outer barrel towards it is described plating membrane cavity inner wall on or the inner cylinder towards it is described plating membrane cavity outer wall on, the plated film hanger Annularly, the plated film hanger is located at the plated film intracavitary and the plated film hanger is sheathed on the inner cylinder, the plated film hanger On be connected with it is multiple for for base material to be plated place hanging rods, the hanger driving part be connected to the plated film hanger for The plated film hanger is driven to rotate, the quantity of the rotation driving part is consistent with the quantity of the hanging rod, each rotation Driving part is both connected on the plated film hanger, is separately connected on each rotation driving part there are one the hanging rod, The rotation driving part is for driving the hanging rod to be rotated relative to the plated film hanger.
2. variable gear ratio tunnel type sputter coating machine according to claim 1, which is characterized in that further include target slot baffle, The quantity of the target slot baffle is consistent with the quantity of coated target slot, multiple target slot baffles and multiple coated target slots It corresponds, on the inner wall of direction that the target slot baffle is connected to the outer barrel plating membrane cavity or the inner cylinder is towards institute On the outer wall for stating plating membrane cavity, the target slot baffle is used to open or closes the coated target slot.
3. variable gear ratio tunnel type sputter coating machine according to claim 1, which is characterized in that the outer barrel is described in The inner wall for plating membrane cavity is equipped with multiple coated target slots, and the radio-frequency ion source is connected to the inner cylinder towards the outer of the plating membrane cavity On wall;Alternatively, the outer wall of the inner cylinder towards the plating membrane cavity is equipped with multiple coated target slots, the radio-frequency ion source is connected to The outer barrel towards it is described plating membrane cavity inner wall on.
4. the variable gear ratio tunnel type sputter coating machine according to claim 1-3 any one, which is characterized in that described to penetrate The quantity of frequency ion source is multiple.
5. the variable gear ratio tunnel type sputter coating machine according to claim 1-3 any one, which is characterized in that in described Cylinder is cylindrical, and the outer barrel is cylindrical, and the plated film hanger is in annular shape, the inner cylinder, the outer barrel and the plating Film hanger is coaxial.
6. the variable gear ratio tunnel type sputter coating machine according to claim 1-3 any one, which is characterized in that further include The first filming block piece, the first filming block piece is cylindrical in shape, the first filming block piece be located at the plated film hanger with And between the inner cylinder, the first filming block piece is sheathed on the inner cylinder, and the first filming block piece is connected to described Hanger driving part, the first filming block piece can be moved synchronously with the plated film hanger, the first filming block piece Side wall on there are multiple the first filming through-holes, multiple the first filming through-holes to be corresponded with multiple hanging rods.
7. the variable gear ratio tunnel type sputter coating machine according to claim 1-3 any one, which is characterized in that further include Second plated film block piece, the second plated film block piece is cylindrical in shape, the second plated film block piece be located at the plated film hanger with And between the outer barrel, the second plated film block piece is sheathed on the plated film hanger, and the second plated film block piece is connected to The hanger driving part, the second plated film block piece and the plated film hanger are opposing stationary, the second plated film block piece Side wall on there are multiple second plated through holes, multiple second plated through holes to be corresponded with multiple hanging rods.
8. the variable gear ratio tunnel type sputter coating machine according to claim 1-3 any one, which is characterized in that further include There is the side wall of pre- feed space, the outer barrel feed inlet, the pre- feed space to be located at the outside of the outer barrel and be connected to described Outer barrel, the pre- feed space are communicated in the plating membrane cavity by the feed inlet.
9. the variable gear ratio tunnel type sputter coating machine according to claim 1-3 any one, which is characterized in that further include Transmission shaft, driving gear and transmission gear, the transmission shaft are connected to the middle part of plated film hanger bottom surface, the driving tooth Wheel is arranged in the drive shaft for being connected to the hanger driving part, and the transmission gear, which is arranged, to be connected on the transmission shaft, institute It states driving gear and the transmission gear is ratcheting.
10. the variable gear ratio tunnel type sputter coating machine according to claim 1-3 any one, which is characterized in that also wrap The first rotating gear and the second rotating gear are included, the quantity of first rotating gear is consistent with the quantity of the hanging rod, more A first rotating gear is corresponded with multiple hanging rods, and first rotating gear, which is arranged, to be connected to accordingly On the hanging rod, the quantity of second rotating gear is consistent with the quantity of rotation driving part, and multiple described second certainly Rotating disk is corresponded with multiple rotation driving parts, and described second is connected separately on each rotation driving part Rotating gear, each second rotating gear and corresponding first rotating gear are ratcheting.
CN201810048979.8A 2018-01-18 2018-01-18 Variable gear ratio tunnel type sputter coating machine Pending CN108359943A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201810048979.8A CN108359943A (en) 2018-01-18 2018-01-18 Variable gear ratio tunnel type sputter coating machine

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201810048979.8A CN108359943A (en) 2018-01-18 2018-01-18 Variable gear ratio tunnel type sputter coating machine

Publications (1)

Publication Number Publication Date
CN108359943A true CN108359943A (en) 2018-08-03

Family

ID=63006660

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201810048979.8A Pending CN108359943A (en) 2018-01-18 2018-01-18 Variable gear ratio tunnel type sputter coating machine

Country Status (1)

Country Link
CN (1) CN108359943A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112251728A (en) * 2020-10-22 2021-01-22 凯盛信息显示材料(黄山)有限公司 Continuous vacuum magnetron sputtering coating device and coating production line
CN115537755A (en) * 2022-09-12 2022-12-30 浙江海量纳米科技股份有限公司 Improved PVD coating rotating stand structure

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101724854A (en) * 2008-10-16 2010-06-09 河南省长葛市新能源研究所 Technical equipment for preparing hydrogen energy from water vapor in an electrolyzing way
CN201660695U (en) * 2010-04-12 2010-12-01 常州龙腾太阳能热电设备有限公司 Up-right cylinder-type multitarget magnetron sputtering coating machine
CN103290373A (en) * 2013-05-14 2013-09-11 宁波韵升股份有限公司 Horizontal type multi-target vacuum sputtering or ion plating machine
CN103668092A (en) * 2012-09-24 2014-03-26 中国科学院大连化学物理研究所 Plasma assisted magnetron sputtering depositing method
CN105803386A (en) * 2016-05-31 2016-07-27 苏州普京真空技术有限公司 Vacuum coating device
CN106048552A (en) * 2016-07-19 2016-10-26 深圳市东丽华科技有限公司 Vacuum coating machine

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101724854A (en) * 2008-10-16 2010-06-09 河南省长葛市新能源研究所 Technical equipment for preparing hydrogen energy from water vapor in an electrolyzing way
CN201660695U (en) * 2010-04-12 2010-12-01 常州龙腾太阳能热电设备有限公司 Up-right cylinder-type multitarget magnetron sputtering coating machine
CN103668092A (en) * 2012-09-24 2014-03-26 中国科学院大连化学物理研究所 Plasma assisted magnetron sputtering depositing method
CN103290373A (en) * 2013-05-14 2013-09-11 宁波韵升股份有限公司 Horizontal type multi-target vacuum sputtering or ion plating machine
CN105803386A (en) * 2016-05-31 2016-07-27 苏州普京真空技术有限公司 Vacuum coating device
CN106048552A (en) * 2016-07-19 2016-10-26 深圳市东丽华科技有限公司 Vacuum coating machine

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112251728A (en) * 2020-10-22 2021-01-22 凯盛信息显示材料(黄山)有限公司 Continuous vacuum magnetron sputtering coating device and coating production line
CN115537755A (en) * 2022-09-12 2022-12-30 浙江海量纳米科技股份有限公司 Improved PVD coating rotating stand structure

Similar Documents

Publication Publication Date Title
CN108359943A (en) Variable gear ratio tunnel type sputter coating machine
JPS59179785A (en) Magnetron cathode sputtering device
CN203355993U (en) Dip-spin-coating device
CN104046958A (en) Device and method for surface modification of micro-nano particles
CN102534527A (en) Magnetron sputtering source and magnetron sputtering equipment
CN108425093A (en) Tunnel type sputter coating machine
CN208201102U (en) Tunnel type sputter coating machine
CN110760808B (en) Curved surface screen magnetron sputtering assembly
CN113774351B (en) Magnetron sputtering coating chamber, coating machine and coating method
TW201217561A (en) Deposition device
JPH09157844A (en) Formation of physical vapor deposition film on vane for rotary compressor and device therefor
CN2796861Y (en) Coating clamping apparatus for sleeve type parts
CN208087737U (en) A kind of highly effective ring is to sputtering magnetic control film coating machine
CN204982037U (en) Rotation type coating machine
CN211734462U (en) Curved surface screen magnetron sputtering subassembly
US20120097103A1 (en) Physical vapor deposition device for coating workpiece
CN112626479A (en) Double-rotation equipment for improving coating uniformity of multi-arc ion plating equipment
CN102703872B (en) Magnetron sputtering target of magnetron sputtering film plating machine
CN109423629A (en) The disposable full-surface deposition work piece actuating device of disk part by performing and gaseous phase deposition stove
CN208632638U (en) A kind of planetary three-stage cylindrical gear insert clamp device
KR101113303B1 (en) A cylindrical sputtering cathode
CN110592550A (en) Magnetron sputtering and electron beam evaporation double-cavity coating device and using method thereof
US8535495B2 (en) Coating device
CN109750261A (en) A kind of vacuum coater based on multiple revolving cylinders
CN102200387B (en) Microwave stirring device and microwave freeze-drying equipment provided with same

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
RJ01 Rejection of invention patent application after publication
RJ01 Rejection of invention patent application after publication

Application publication date: 20180803