CN105803386A - Vacuum coating device - Google Patents
Vacuum coating device Download PDFInfo
- Publication number
- CN105803386A CN105803386A CN201610372212.1A CN201610372212A CN105803386A CN 105803386 A CN105803386 A CN 105803386A CN 201610372212 A CN201610372212 A CN 201610372212A CN 105803386 A CN105803386 A CN 105803386A
- Authority
- CN
- China
- Prior art keywords
- coating device
- vacuum
- coating apparatus
- coating
- plated film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The invention discloses a vacuum coating device. The vacuum coating device comprises a feeding device, a central processing unit, a buffering chamber, a coating device body, a vacuum pump and a discharging device. The feeding device is connected with the buffering chamber and the coating device body. The central processing unit is electrically connected with the coating device body. The vacuum pump is electrically connected with the coating device body. By means of the above manner and the vacuum coating device, pollution of coating gas is avoided, the coating quality is improved, the coating manner is convenient, and the vacuum coating device is suitable for being used by a factory on a large scale.
Description
Technical field
The present invention relates to a kind of coating system, particularly relate to vacuum coater.
Background technology
Plated film is that a kind of technology being widely used in commercial production is to change the surface characteristic of workpiece, in order to make the surface of workpiece obtain multiple different performance, generally require and workpiece is carried out multiple plated film, accordingly, it would be desirable to film-coating workpiece is changed thus obtaining different film plating layers between different coaters.
Summary of the invention
What present invention mainly solves technical problem is how to provide a kind of pollution avoiding plated film gas, and improves the quality of plated film, and the mode of plated film is more convenient, uses the large-scale vacuum coater used of factory.
For solving above-mentioned technical problem, the technical scheme that the present invention adopts is: provide a kind of vacuum coater, including: feed arrangement, central processing unit, surge chamber, coating apparatus, vacuum pump and drawing mechanism, it is connected between described feed arrangement and surge chamber, coating apparatus, it is electrically connected between described central processing unit and coating apparatus, is electrically connected between described vacuum pump and coating apparatus.
In a preferred embodiment, described vacuum coater also includes drawing mechanism, is connected between described drawing mechanism with plated film chamber.
In a preferred embodiment, described coating apparatus is positioned at surge chamber.
The invention has the beneficial effects as follows: avoid the pollution of plated film gas, and improve the quality of plated film, and the mode of plated film is more convenient, use the large-scale use of factory.
Accompanying drawing explanation
In order to be illustrated more clearly that the technical scheme in the embodiment of the present invention, below the accompanying drawing used required during embodiment is described is briefly described, apparently, accompanying drawing in the following describes is only some embodiments of the present invention, for those of ordinary skill in the art, under the premise not paying creative work, it is also possible to obtain other accompanying drawing according to these accompanying drawings, wherein:
Fig. 1 is the structural representation of vacuum coater one specific embodiment of the present invention.
Detailed description of the invention
Technical scheme in the embodiment of the present invention will be clearly and completely described below, it is clear that described embodiment is only a part of embodiment of the present invention, rather than whole embodiments.Based on the embodiment in the present invention, all other embodiments that those of ordinary skill in the art obtain under not making creative work premise, broadly fall into the scope of protection of the invention.
Refer to Fig. 1, a kind of vacuum coater is provided in one particular embodiment of the present invention, described vacuum coater includes: feed arrangement, central processing unit, surge chamber, coating apparatus, vacuum pump and drawing mechanism, it is connected between described feed arrangement and surge chamber, coating apparatus, it is electrically connected between described central processing unit and coating apparatus, is electrically connected between described vacuum pump and coating apparatus.Described vacuum coater also includes drawing mechanism, is connected between described drawing mechanism with plated film chamber.Described coating apparatus is positioned at surge chamber.
Therefore, the invention have the advantages that the pollution avoiding plated film gas, and improve the quality of plated film, and the mode of plated film is more convenient, use the large-scale use of factory.
The foregoing is only embodiments of the invention; not thereby the scope of the claims of the present invention is limited; every equivalent structure utilizing description of the present invention to make or equivalence flow process conversion; or directly or indirectly it is used in other relevant technical field, all in like manner include in the scope of patent protection of the present invention.
Claims (3)
1. a vacuum coater, it is characterized in that, including: feed arrangement, central processing unit, surge chamber, coating apparatus, vacuum pump and drawing mechanism, it is connected between described feed arrangement and surge chamber, coating apparatus, it is electrically connected between described central processing unit and coating apparatus, is electrically connected between described vacuum pump and coating apparatus.
2. vacuum coater according to claim 1, it is characterised in that described vacuum coater also includes drawing mechanism, is connected between described drawing mechanism with plated film chamber.
3. vacuum coater according to claim 1, it is characterised in that described coating apparatus is positioned at surge chamber.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610372212.1A CN105803386A (en) | 2016-05-31 | 2016-05-31 | Vacuum coating device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610372212.1A CN105803386A (en) | 2016-05-31 | 2016-05-31 | Vacuum coating device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN105803386A true CN105803386A (en) | 2016-07-27 |
Family
ID=56427691
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201610372212.1A Pending CN105803386A (en) | 2016-05-31 | 2016-05-31 | Vacuum coating device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN105803386A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108359943A (en) * | 2018-01-18 | 2018-08-03 | 维达力实业(深圳)有限公司 | Variable gear ratio tunnel type sputter coating machine |
| CN108425093A (en) * | 2018-01-18 | 2018-08-21 | 维达力实业(深圳)有限公司 | Tunnel type sputter coating machine |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103938168A (en) * | 2014-04-08 | 2014-07-23 | 江西沃格光电股份有限公司 | Magnetron sputtering coating system |
-
2016
- 2016-05-31 CN CN201610372212.1A patent/CN105803386A/en active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103938168A (en) * | 2014-04-08 | 2014-07-23 | 江西沃格光电股份有限公司 | Magnetron sputtering coating system |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108359943A (en) * | 2018-01-18 | 2018-08-03 | 维达力实业(深圳)有限公司 | Variable gear ratio tunnel type sputter coating machine |
| CN108425093A (en) * | 2018-01-18 | 2018-08-21 | 维达力实业(深圳)有限公司 | Tunnel type sputter coating machine |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| RJ01 | Rejection of invention patent application after publication | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20160727 |