CN104762596A - Vacuum film plating apparatus - Google Patents
Vacuum film plating apparatus Download PDFInfo
- Publication number
- CN104762596A CN104762596A CN201410009010.1A CN201410009010A CN104762596A CN 104762596 A CN104762596 A CN 104762596A CN 201410009010 A CN201410009010 A CN 201410009010A CN 104762596 A CN104762596 A CN 104762596A
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- Prior art keywords
- evaporation source
- cavity
- vacuum
- film plating
- present
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Abstract
The present invention provides a vacuum film plating apparatus, which comprises a cavity, wherein a probe, a template for placing a substrate, a first evaporation source and a second evaporation source are arranged in the cavity, the side of the cavity is provided with a gas pipe, the gas pipe is connected with an external vacuum pump, and the first evaporation source is provided with a conical protection shield. The vacuum film plating apparatus of the present invention has beneficial effects of simple structure, easy use, uniform film plating, and avoidance of cross-contamination during the vacuum evaporation process.
Description
Technical field
The present invention relates to field of vacuum coating, especially relate to a kind of vacuum coater.
Background technology
In vacuum coating technology, often material at high temperature is heated, be then cooled to substrate to form film, in coating process, because material can form gas, gas has unstable, and because the cavity of the cavity of vacuum plating is comparatively large, what film can be made like this to be formed is uneven; In addition, owing to there is multiple evaporation source in vacuum cavity, when using one of them evaporation source, can pollute other evaporation source, affecting the quality of plated film.
Summary of the invention
The object of this invention is to provide a kind of vacuum coater, structure is simple, easy to use, and plated film is even, can avoid steaming the crossed contamination in transient.
Technical scheme of the present invention is: a kind of vacuum coater, comprises cavity, is provided with probe, the template of placing substrate, the first evaporation source and the second evaporation source in described cavity; Described cavity side is provided with tracheae; Described tracheae is connected with outside vacuum pump; The first described evaporation source is provided with conical shield cap.
Further, described conical shield cap can substitute with the baffle plate be arranged between the first evaporation source and the second evaporation source.
Further, described baffle plate is mobilizable.
The advantage that the present invention has and positively effect are: owing to adopting technique scheme, structure is simple, easy to use, and plated film is even, can avoid steaming the crossed contamination in transient.
Accompanying drawing explanation
Fig. 1 is structural representation of the present invention.
Fig. 2 is the structural representation of the embodiment of the present invention two.
In figure:
1, cavity 2, probe 3, tracheae 4, vacuum pump 5, template 6, first evaporation source 7, second evaporation source 8, shield cap 9, baffle plate
Embodiment
Below in conjunction with accompanying drawing, the present invention is elaborated.
Embodiment one
As shown in Figure 1, a kind of vacuum coater of the present invention, comprises cavity 1, is provided with probe 2, template 5, first evaporation source 6 placing substrate and the second evaporation source 7 in described cavity 1; Described cavity 1 side is provided with tracheae 3; Described tracheae 3 is connected with outside vacuum pump 4; The first described evaporation source 6 is provided with conical shield cap 8.Therefore, conical shield cap 8 had both avoided the pollution of evaporation source, crossed owing to making the steaming of gaseous state the restriction that material receives space, and plated film can be made again even.
Embodiment two
Embodiment two is with the difference of embodiment one: as shown in Figure 1-2, and described conical shield cap 8 can substitute with the baffle plate 9 be arranged between the first evaporation source 6 and the second evaporation source 7; Described baffle plate 9 is mobilizable.The effect of baffle plate 9 is the pollutions avoiding evaporation source, makes it the quality not affecting plated film.
Above one embodiment of the present of invention have been described in detail, but described content being only preferred embodiment of the present invention, can not being considered to for limiting practical range of the present invention.All equalizations done according to the present patent application scope change and improve, and all should still belong within patent covering scope of the present invention.
Claims (3)
1. a vacuum coater, comprises cavity (1), it is characterized in that: be provided with probe (2), the template (5) of placing substrate, the first evaporation source (6) and the second evaporation source (7) in described cavity (1); Described cavity (1) side is provided with tracheae (3); Described tracheae (3) is connected with outside vacuum pump (4); Described the first evaporation source (6) is provided with conical shield cap (8).
2. a kind of vacuum coater according to claim 1, is characterized in that: described conical shield cap (8) can substitute with the baffle plate (9) be arranged between the first evaporation source (6) and the second evaporation source (7).
3. a kind of vacuum coater according to claim 2, is characterized in that: described baffle plate (9) is for mobilizable.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410009010.1A CN104762596A (en) | 2014-01-06 | 2014-01-06 | Vacuum film plating apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410009010.1A CN104762596A (en) | 2014-01-06 | 2014-01-06 | Vacuum film plating apparatus |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN104762596A true CN104762596A (en) | 2015-07-08 |
Family
ID=53644679
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201410009010.1A Pending CN104762596A (en) | 2014-01-06 | 2014-01-06 | Vacuum film plating apparatus |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN104762596A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109536893A (en) * | 2017-09-22 | 2019-03-29 | 杭州纤纳光电科技有限公司 | A kind of Preparation equipment of solar battery thin film and preparation method thereof |
| CN113737137A (en) * | 2021-11-05 | 2021-12-03 | 苏州盛曼特新材料有限公司 | Metal film evaporation processing equipment |
-
2014
- 2014-01-06 CN CN201410009010.1A patent/CN104762596A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109536893A (en) * | 2017-09-22 | 2019-03-29 | 杭州纤纳光电科技有限公司 | A kind of Preparation equipment of solar battery thin film and preparation method thereof |
| CN113737137A (en) * | 2021-11-05 | 2021-12-03 | 苏州盛曼特新材料有限公司 | Metal film evaporation processing equipment |
| CN113737137B (en) * | 2021-11-05 | 2022-01-18 | 苏州盛曼特新材料有限公司 | Metal film evaporation processing equipment |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20150708 |
|
| WD01 | Invention patent application deemed withdrawn after publication |