CN103290364B - Continuous vacuum evaporation coating device - Google Patents
Continuous vacuum evaporation coating device Download PDFInfo
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- CN103290364B CN103290364B CN201310196857.0A CN201310196857A CN103290364B CN 103290364 B CN103290364 B CN 103290364B CN 201310196857 A CN201310196857 A CN 201310196857A CN 103290364 B CN103290364 B CN 103290364B
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- 238000000576 coating method Methods 0.000 title claims abstract description 207
- 239000011248 coating agent Substances 0.000 title claims abstract description 200
- 238000007738 vacuum evaporation Methods 0.000 title claims abstract description 30
- 230000007704 transition Effects 0.000 claims abstract description 220
- 239000000463 material Substances 0.000 claims abstract description 101
- 238000001704 evaporation Methods 0.000 claims description 27
- 238000012544 monitoring process Methods 0.000 claims description 9
- 230000006978 adaptation Effects 0.000 claims description 8
- 230000005540 biological transmission Effects 0.000 claims description 6
- 238000010849 ion bombardment Methods 0.000 claims description 4
- 239000006200 vaporizer Substances 0.000 claims description 4
- 150000001875 compounds Chemical class 0.000 claims description 3
- 238000000926 separation method Methods 0.000 claims description 3
- 230000008020 evaporation Effects 0.000 description 24
- 239000007789 gas Substances 0.000 description 11
- 238000010438 heat treatment Methods 0.000 description 11
- 238000005086 pumping Methods 0.000 description 7
- 238000010894 electron beam technology Methods 0.000 description 6
- 239000000523 sample Substances 0.000 description 6
- 238000005566 electron beam evaporation Methods 0.000 description 5
- 238000000034 method Methods 0.000 description 5
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- 238000006243 chemical reaction Methods 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
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- 238000005240 physical vapour deposition Methods 0.000 description 2
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- 239000010453 quartz Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
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Abstract
The invention discloses a kind of continuous vacuum evaporation coating device, comprising: coating chamber, work rest and coating materials frame; Coating chamber one end is communicated with First Transition room, and the other end is communicated with the second transition chamber; The first track and the second track is respectively equipped with in First Transition room, coating chamber, the second transition chamber; Two ends, First Transition room and the second transition chamber two ends are respectively equipped with push-pull valve; First Transition room, coating chamber, the second transition chamber are configured with independently air-bleed system respectively.In plant running provided by the present invention, except the handling of work rest and coating materials adopt manually, other operations are completed automatically by device, substantially increase plated film efficiency, ensure that the consistence of product rete.Can keep high vacuum state in coating chamber, foreign gas is few, effectively can prevent coating materials steam from being polluted by foreign gas, thus can obtain the more excellent rete of quality simultaneously.
Description
Technical field
The present invention relates to coating technique field, especially relate to a kind of continuous vacuum evaporation coating device.
Background technology
Vacuum vapor plating (abbreviation evaporation) technology is PVD(physical vapor deposition) develop the earliest in technology, the coating technique that Application Areas is very wide.Its principle of work: the evaporation source (be used for heating film material make it the device of steam raising) film material being placed in vacuum coating film equipment, make it evaporation by evaporation source heating film material in high vacuum conditions and form steam, steam arrives because base material temperature is lower after plated substrate surface, and steam just condenses in substrate surface and forms film.
Current widespread use be box evaporation coating machine, this box evaporation coating owner will adopt resistance heating evaporation source and two kinds, electron beam heating evaporation source (being made up of electron beam gun and crucible) evaporation source.This coating equipment mainly comprises: vacuum chamber, air-bleed system, evaporation source, membrane thickness measuring system, ion source, well heater etc.
Existing box evaporation coating machine to the basic procedure that base material plated film is processed is: a, loading (by base material loaded to be deposited on work rest); B, added (work rest installing base material is installed in vacuum chamber); C, bleed (close vacuum chamber gate, bleed until vacuum pressure value is to set(ting)value to vacuum chamber, as being better than 10 by vacuum pump
-2pa); D, heating (to base material heating until base material temperature is to set(ting)value, requiring also can not heat according to plated film in addition); E, Ion Cleaning (rotational workpieces frame, is cleaned base material by ion source, requires also can not clean in addition according to plated film); F, plated film (open evaporation source and realize plated film, until thickness reaches set(ting)value); G, shutdown (stopping heating, the work rest that stops the rotation, vacuum chamber amplification gas); H, undercarriage (open door for vacuum chamber, the base material work rest after plated film is taken out); Then return a step and perform next Production Flow Chart.
Above-mentioned this box evaporation coating machine carries out in coating process to base material that there are the following problems:
1, because it is by the cycle of modes work of start-shutdown-start; in this working cycle coating process condition involved by different cycles as vacuum pressure, Heating temperature, the speed of evacuation, the venting of room body, that room body pollution is difficult to each processing condition is completely the same; and only have a rare variation of processing condition; all will cause the change of film quality, the film quality consistence that therefore this coating equipment is produced is difficult to be guaranteed.
2, because above-mentioned this coating equipment generally adopts the air-bleed system of oil diffusion pump+lobe pump+oil seal type sliding vane rotary pump, oil vapour is known from experience vacuum chamber certain pollution, and then meeting pollution film layer quality; In addition in actual procedure owing to wanting to obtain high vacuum tightness environment, pumpdown time can be very long, and comprehensive evaporation requires and the consideration of production efficiency, and general control vacuum tightness is 10
-2about Pa, namely now also remains more H in vacuum chamber
2o, CO
2, O
2, N
2, the gases such as organic vapor, in coating process, these gas can be adsorbed or be combined together with evaporation particle, pollutes in the film, and then affects film layer quality.
Summary of the invention
Main purpose of the present invention is to provide a kind of continuous vacuum evaporation coating device, improves plated film efficiency, ensures the consistence of product rete, prevents rete from being polluted by foreign gas, obtains the rete that quality is more excellent.
The present invention proposes a kind of continuous vacuum evaporation coating device, comprising: coating chamber, work rest and coating materials frame;
Described coating chamber one end is communicated with First Transition room, and the other end is communicated with the second transition chamber;
Be respectively equipped with the first track of the described work rest of transmission in described First Transition room, coating chamber, the second transition chamber and transmit the second track of described coating materials frame;
Described two ends, First Transition room and the second transition chamber two ends are respectively equipped with can the push-pull valve for separation gas of switch;
Described First Transition room, coating chamber, the second transition chamber are configured with independently air-bleed system respectively.
Preferably, the first track of described First Transition room and the first track of coating chamber are isolated by the space accommodating push-pull valve, and the two prolongation is overlapped; First track of coating chamber and the first track of the second transition chamber are isolated by the space accommodating push-pull valve, and the two prolongation is overlapped;
Second track of described First Transition room and the second track of coating chamber are isolated by the space accommodating push-pull valve, and the two prolongation is overlapped; Second track of coating chamber and the second track of the second transition chamber are isolated by the space accommodating push-pull valve, and the two prolongation is overlapped.
Preferably, described First Transition room comprises: upper First Transition room, the lower First Transition room be communicated with upper First Transition room; Upper First Transition indoor are provided with described first track; Described lower First Transition indoor are provided with described second track;
Described second transition chamber comprises: upper second transition chamber, lower second transition chamber be communicated with upper second transition chamber; Described first track is provided with in upper second transition chamber; Described second track is provided with in described lower second transition chamber.
Preferably, described push-pull valve comprises: upper push-pull valve and lower plugboard valve;
Described upper two ends, First Transition room and upper second transition chamber two ends are provided with push-pull valve;
Described lower two ends, First Transition room and lower second transition chamber two ends are provided with lower plugboard valve.
Preferably, described first track comprises: the first pulley, and the side of this first pulley is provided with the first gear;
Described work rest comprises: work rest body, and the top of this work rest body is provided with the first slide block with described first pulley adaptation, and this first slide block side is provided with the first tooth bar with described first gears meshing.
Preferably, described second track comprises: the second pulley, and the side of this second pulley is provided with the second gear; Described coating materials frame comprises: coating materials frame body, and the bottom of this coating materials frame body is provided with the second slide block with described second pulley adaptation, and the side of described second slide block is provided with the second tooth bar with described second gears meshing.
Preferably, continuous vacuum evaporation coating device also comprises the first underframe, pan carriage, and for transporting the second underframe of pan carriage; Described First Transition room, coating chamber and the second transition chamber are placed on described first underframe; Described second underframe two ends connect respectively at the two ends of described first underframe, and the outer surface of cupular part of the two is in same level;
Described pan carriage is respectively arranged with the first track and the second track; When described pan carriage is placed in one end that one end that the second underframe is provided with First Transition room with the first underframe is connected, the first track of described pan carriage and the first track of First Transition room are isolated by the space accommodating push-pull valve, and the two prolongation is overlapped.
Preferably, continuous vacuum evaporation coating device also comprises:
For evaporating the vaporizer of coating materials;
For the well heater to upper First Transition room, coating chamber;
For the ion bombardment device cleaned base material.
Preferably, continuous vacuum evaporation coating device also comprises:
For monitoring the film thickness monitoring instrument of base material coating film thickness;
For monitoring the compound vacuum gauge of vacuum tightness of First Transition room, coating chamber, the second transition chamber.
A kind of continuous vacuum evaporation coating device provided by the present invention, described coating chamber one end is communicated with First Transition room, and the other end is communicated with the second transition chamber; First and second track of transmission work rest, coating materials frame is respectively equipped with in First Transition room, coating chamber, the second transition chamber; Two ends, First Transition room and the second transition chamber two ends are equipped with push-pull valve; First Transition room, coating chamber, the second transition chamber are configured with the mode of independently air-bleed system respectively, in described plant running, except the handling of work rest and coating materials adopt manually, other operations are completed automatically by device, substantially increase plated film efficiency, ensure that the consistence of product rete.Can keep high vacuum state in coating chamber, foreign gas is few, effectively can prevent coating materials steam from being polluted by foreign gas, thus can obtain the more excellent rete of quality simultaneously.
Accompanying drawing explanation
Fig. 1 is the perspective view of continuous vacuum evaporation coating device one embodiment of the present invention;
Fig. 2 is the main view principle schematic diagram of continuous vacuum evaporation coating device of the present invention;
Fig. 3 be continuous vacuum evaporation coating device of the present invention overlook principle schematic;
Fig. 4 is the first track of coating chamber of the present invention and the fit structure schematic diagram of work rest;
Fig. 5 is the structural representation of work rest of the present invention;
Fig. 6 is the first track of coating chamber of the present invention and another fit structure schematic diagram of work rest;
Fig. 7 is the structural representation of coating materials frame of the present invention;
Fig. 8 is the fit structure schematic diagram of coating materials frame of the present invention and the second track.
The realization of the object of the invention, functional characteristics and advantage will in conjunction with the embodiments, are described further with reference to accompanying drawing.
Embodiment
Should be appreciated that specific embodiment described herein only in order to explain the present invention, be not intended to limit the present invention.
See Fig. 1, propose a kind of continuous vacuum evaporation coating device 100 1 embodiment of the present invention, comprising: coating chamber 110, work rest 120 and coating materials frame 130, described coating chamber 110 one end is communicated with First Transition room 140, and the other end is communicated with the second transition chamber 150.Be respectively equipped with the first track 160 of the described work rest 120 of transmission in described First Transition room 140, coating chamber 110, second transition chamber 150 and transmit the second track 170 of described coating materials frame 130.Described two ends, First Transition room 140 and the second transition chamber 150 two ends are provided with can the push-pull valve for separation gas (Fig. 1 is not shown) of switch.Described First Transition room 140, coating chamber 110, second transition chamber 150 are configured with independently air-bleed system respectively.
In the course of the work, described work rest 120 and coating materials frame 130 transporting direction are First Transition room 140 → coating chamber 110 → the second transition chambers 150 to the device 100 that the present embodiment provides.Described coating chamber 110 is for the coating materials on evaporating film bin 130, realizes the working space of the base material in work rest 120 being carried out to plated film.
Described push-pull valve is used for cutting off or being communicated with First Transition room 140, coating chamber 110 and the second transition chamber 150, has made the conversion of First Transition room 140 and the second transition chamber 150 atmospheric environment and vacuum environment.Ensure that described in described device 100 working process, coating chamber 110 is in the vacuum environment of the vacuum ranges of setting all the time.
Described First Transition room 140 is changed to vacuum environment by atmospheric environment for making work rest 120 and coating materials frame 130.Second transition chamber 150 is changed to atmospheric environment by vacuum environment for making work rest 120 and coating materials frame 130.
In the present embodiment, described First Transition room 140 is identical with the air-bleed system of the configuration of the second transition chamber 150, all have employed dry pump+lobe pump unit (for slightly taking out), turbomolecular pump+direct connection sliding vane rotary pump unit (taking out for essence), pump group intermittent type is bled, and completes First Transition room 140 and the conversion between the second transition chamber 150 atmospheric environment and vacuum environment.And the air-bleed system that described coating chamber 110 configures have employed turbomolecular pump+direct connection sliding vane rotary pump unit (taking out for essence), pump group continues to bleed, and makes coating chamber 110 keep high vacuum environment always, the better quality of rete during to ensure plated film.Due to described First Transition room 140, second transition chamber 150, and the off-gas pump that coating chamber 110 adopts is without oily oil-sealed rotary pump, can not to First Transition room 140, second transition chamber 150, and coating chamber 110 causes oil pollution, base material plated film under clean vacuum environment, can obtain the rete that quality is higher.
Further, see Fig. 2, Fig. 3, in above-mentioned continuous vacuum evaporation coating device 100 embodiment, described push-pull valve comprises: the push-pull valve VS40 of one end that the push-pull valve VS10 of one end that First Transition room 140 is not connected with coating chamber 110, the push-pull valve VS20 between First Transition room 140 with coating chamber 110, the push-pull valve VS30 between coating chamber 110 with the second transition chamber 150, the second transition chamber 150 are not connected with coating chamber 110.First track 160 of wherein said First Transition room 140 is isolated by the space accommodating push-pull valve VS20 with the first track 160 of coating chamber 110, and the two prolongation is overlapped.First track 160 of coating chamber 110 and the first track 160 of the second transition chamber 150 are isolated by the space accommodating push-pull valve VS30, and the two prolongation is overlapped.Second track 170 of described First Transition room 140 is isolated by the space accommodating push-pull valve VS20 with the second track 170 of coating chamber 110, and the two prolongation is overlapped.Second track 170 of coating chamber 110 and the second track 170 of the second transition chamber 150 are isolated by the space accommodating push-pull valve VS30, and the two prolongation is overlapped.Namely ensure that the first track 160, second transition chamber 150 first track 160 of the first track 160 of described First Transition room 140, coating chamber 110 is on same straight line; Work rest 120 can run on the first track 160 of coating chamber 110 by the first track 160 of First Transition room 140 reposefully, reruns on the first track 160 of the second transition chamber 150.In like manner ensure that the second track 170 of the second track 170, second transition chamber 150 of the second track 170 of described First Transition room 140, coating chamber 110 is on same straight line, coating materials frame 130 can run on the second track 170 of coating chamber 110 by the second track 170 of First Transition room 140 reposefully, reruns on the second track 170 of the second transition chamber 150.
Further, see Fig. 1 and Fig. 2, above-mentioned continuous vacuum evaporation coating device 100 embodiment, described First Transition room 140 comprises: upper First Transition room 141, the lower First Transition room 142 be communicated with upper First Transition room 141; Described first track 160 is provided with in upper First Transition room 141; Described second track 170 is provided with in described lower First Transition room 142.Described second transition chamber 150 comprises: upper second transition chamber 151, lower second transition chamber 152 be communicated with upper second transition chamber 151; Described first track 160 is provided with in upper second transition chamber 151; Described second track 170 is provided with in described lower second transition chamber 152.
Further, above-mentioned continuous vacuum evaporation coating device 100 embodiment, described push-pull valve comprises push-pull valve and lower plugboard valve, and wherein said upper two ends, First Transition room 141 and upper second transition chamber 151 two ends are provided with push-pull valve; Described lower two ends, First Transition room 142 and lower second transition chamber 152 two ends are provided with lower plugboard valve.See Fig. 2 and Fig. 3, the push-pull valve VS40 of one end that described push-pull valve comprises push-pull valve VS10, the push-pull valve VS20 between First Transition room 140 with coating chamber 110 of one end that First Transition room 140 is not connected with coating chamber 110, the push-pull valve VS30 between coating chamber 110 with the second transition chamber 150, the second transition chamber 150 are not connected with coating chamber 110.Described VS10 comprises push-pull valve VS11 and lower plugboard valve VS12.Described VS20 comprises push-pull valve VS21 and lower plugboard valve VS22.Described VS30 comprises push-pull valve VS31 and lower plugboard valve VS32.Described VS40 comprises push-pull valve VS41 and lower plugboard valve VS42.Between described upper First Transition room 141 and coating chamber 110, between upper second transition chamber 151 and coating chamber 110, and one end that upper First Transition room 141 one end, upper second transition chamber 151 that are not communicated with described coating chamber 110 are not communicated with described coating chamber 110 is respectively arranged with upper push-pull valve VS11, VS21, VS31, VS41.Between described lower First Transition room 142 and coating chamber 110, lower between the second transition chamber 152 and coating chamber 110, and one end, one end of descending the second transition chamber 142 not to be communicated with described coating chamber 110 that lower First Transition room 142 is not communicated with described coating chamber 110 are provided with lower plugboard valve VS12, VS22, VS32, VS42.
Further, see Fig. 4, Fig. 5, Fig. 6, in above-mentioned continuous vacuum evaporation coating device 100 embodiment, described first track 160 comprises: the first pulley 161, and the side of this first pulley 161 is provided with the first gear 162.Described work rest 120 comprises: work rest 120 body 121, and the top of this work rest 120 body 121 is provided with the first slide block 122 with described first pulley 161 adaptation, and this first slide block 122 side is provided with the first tooth bar 123 engaged with described first gear 162.When work rest 120 is mounted to after on the first track 160, described first pulley 161 and the first slide block 122 slide adaptation, described first gear 162 engages with the first tooth bar 123, described first gear 162 rotates under the driving of motor, first tooth bar 123 drives described work rest 120 to move along the length direction of the first tooth bar 123 along with the first gear 162 rotates, thus reaches the object of transporting described work rest 120.
In addition, see Fig. 4 and Fig. 6, in the present embodiment, first slide block 122 top center place of described work rest 120 is provided with the first revolving gear 124, described first revolving gear 124 is fixed with described work rest 120 body, namely described work rest 120 is with the first revolving gear 124 synchronous axial system, is provided with the second revolving gear 163 engaged with described first revolving gear 124 in the first track 160 of described coating chamber 110.When described work rest 120 be transported to start to carry out plated film to the basis on work rest 120 after coating chamber 110 desired location time, described second revolving gear 163 rotates under the startup of motor, first revolving gear 124 rotates along with described second revolving gear 163 and rotates, thus make work rest 120 rotate along with the second revolving gear 163 and rotate, make the plated film even film layer on base material.
Further, see Fig. 7 and Fig. 8, in above-mentioned continuous vacuum evaporation coating device 100 embodiment, described second track 170 comprises: the second pulley 171, and the side of this second pulley 171 is provided with the second gear 172; Described coating materials frame 130 comprises: coating materials frame 130 body 131, the bottom of this coating materials frame 130 body 131 is provided with the second slide block 132 with described second pulley 171 adaptation, and the side of described second slide block 132 is provided with the second tooth bar 133 engaged with described second gear 172.When coating materials frame 130 is mounted to after on the second track 170, described second pulley 171 and the second slide block 132 slide adaptation, described second gear 172 engages with the second tooth bar 133, described second gear 172 rotates under the driving of motor, because the second tooth bar 133 engages with described second gear 172, therefore described coating materials frame 130 moves along the length direction of the second tooth bar 133, thus reaches the object of transporting described coating materials frame 130.
In the present embodiment, what described first gear 162 and the second gear 172 adopted is that reducing motor drives, can by the travelling speed regulating motor speed can change work rest 120 and coating materials frame 130.The connection of the first adjacent gear 162, the connection of the second adjacent gear 172 adopt Timing Belt to connect respectively, therefore can ensure the consistence of all first pinion rotation, and the consistence of all second pinion rotation.Make work rest 120 and coating materials frame 130 transmission smooth and easy, steady.
In addition, in the present embodiment, the clutch of described first gear 162 and the first tooth bar 123 and the second gear 172 and the second tooth bar 133 all adopts electromagnetic clutch to control, thus makes the first gear 162 engage smooth and easy with the first tooth bar 123, second gear 172 with the second tooth bar 133.This accuracy of mesh is high, and the operation making work rest 120 and coating materials frame 130 is very steady, can not produce the situation that base material or coating materials drop.
Further, see Fig. 1, in above-mentioned continuous vacuum evaporation coating device 100 embodiment, said apparatus 100 also comprises the first underframe 101, pan carriage 102, for transporting the second underframe 103 of pan carriage 102.First Transition room 140, coating chamber 110 and the second transition chamber 150 are placed on described first underframe 101.Described second underframe 103 two ends are connected with the two ends of described first underframe 101 respectively, and the outer surface of cupular part of the two is in same level.Described pan carriage 102 is respectively arranged with the first track 160 and the second track 170.When described pan carriage 102 is placed in one end that one end that the second underframe 103 is provided with First Transition room 140 with the first underframe 101 is connected, first track 160 of described pan carriage 102 is isolated by the space accommodating push-pull valve VS10 with the first track 160 of First Transition room 140, and the two prolongation is overlapped.
The device 100 that this enforcement provides needs two described pan carriage 102, mounted work rest 120 and coating materials frame 130 are in one end that First Transition room 140 is not connected coating chamber 110 by one of them, then work rest 120 transports on the first track 160 of First Transition room 140 by the first track 160 by pan carriage 102, is meanwhile transported on the second track 170 of First Transition room 140 by coating materials frame 130 by the second track 170.After the base material plated film on described work rest 120 completes, described work rest 120 enters on the first track 160 in the pan carriage 102 of another sky by the first track 160 transport of the second transition chamber 150; Meanwhile described coating materials frame 130 is entered on the second track 170 in the pan carriage 102 of another sky by the second track 170 transport of the second transition chamber 150.
Further, in above-mentioned continuous vacuum evaporation coating device 100 embodiment, described device 100 also comprises the vaporizer (scheming not shown) for making coating materials evaporate, described vaporizer is resistance-type evaporation source or electron beam evaporation source, according to resistance-type evaporation source, then after described coating materials frame 130 enters coating chamber 110, adopt the electrode communication apparatus of air cylinder driven to the evaporation boat connection circuit of resistance-type evaporation source.Described electron beam evaporation source comprises two kinds of structures: electron beam gun and crucible integral type, electron beam gun and crucible split type.When the coating materials that plated film amount is little then adopts the electron beam evaporation source of electron beam gun and crucible integral type; The coating materials that plated film amount is large then adopts electron beam gun and the split type electron beam evaporation source of crucible.
In the present embodiment, described device 100 is First Transition room 140, coating chamber 110, second transition chamber 150 is configured with compound vacuum gauge (scheming not shown) respectively, is respectively used to the vacuum tightness monitoring First Transition room 140, coating chamber 110, second transition chamber 150 in real time.
In the present embodiment, described device 100 is also for upper First Transition room 141, coating chamber 110 are configured with well heater (scheming not shown) respectively.The well heater of the present embodiment can adopt stainless steel tubular heater, and this well heater can realize big area homogeneous heating, and working stability, long service life.Wherein, described well heater adopts PID temperature control module to control, and control accuracy can reach ± and 2.5 DEG C.
In the present embodiment, described device 100 also comprises the film thickness monitoring instrument (scheming not shown) for monitoring base material coating film thickness, and described monitor can adopt quartz crystal to pop one's head in.Wherein according to the difference of base material plated film thicknesses of layers, quartz crystal probe can select single probe, dual probe or Multi probe (more than two probes, as six probes).
In the present embodiment, described device 100 also comprises the ion bombardment device (scheming not shown) for cleaning base material, and described ion bombardment device can be ion source.
The device 100 pairs of base material coating process provided below by way of above-described embodiment are that example is further detailed the present invention.See Fig. 2 and Fig. 3, described device 100 pairs of base material coating process are specific as follows:
One, start shooting
Close coating chamber 110 gate, and push-pull valve lower plugboard valve VS21, VS22, VS31, VS32 are closed in pass.
Open direct connection sliding vane rotary pump, open molecular pump foreline valve (FV1-FV7); Molecular pump forvacuum opens molecular pump after reaching molecular pump trigger pressure.
Start First Transition room 140, second transition chamber 150, coating chamber 110 internal heater, make it to reach design temperature (according to coating process setting) respectively.
Dry pumping set starts.
Two, frame is entered
Open push-pull valve VS11, lower plugboard valve VS12, close and close push-pull valve VS21, lower plugboard valve VS22, make First Transition room 141, lower First Transition room 142 be in atmospheric environment state.
Unit one frame 120 and coating materials frame 130 are entered in upper First Transition room 141, lower First Transition room 142 from linear running left end pan carriage 102 respectively and stops, closing and close push-pull valve VS11, lower plugboard valve VS12.
After pan carriage has carried unit one frame 120 and coating materials frame 130, between spill circulation 103, receive second work rest 120 and coating materials frame 130, and wait on upper First Transition room 141, the outer holding fix in lower First Transition room 142.
Three, vacuum transition
Control heater is to base material heating on the unit one frame 120 in upper First Transition room 141.
Valve RV1 slightly taken out by the dry pumping set opening First Transition room 140 correspondence, and upper First Transition room 141 given by dry pumping set, bleed in lower First Transition room 142, makes its vacuum pressure reach set(ting)value and (is generally 10
-1the handkerchief order of magnitude).
Close dry pumping set and slightly take out valve RV1, open molecular pump essence and take out valve HV1, HV2; Molecular pump is bled to upper First Transition room 141, lower First Transition room 142, makes its vacuum pressure reach set(ting)value and (is generally 10
-3the Pa order of magnitude).
Open push-pull valve VS21 and lower plugboard valve VS22, unit one frame 120 and coating materials frame 130 respectively from upper First Transition room 141, lower First Transition room 142 linear running enter in coating chamber 110 stop, close close push-pull valve VS21, lower plugboard valve VS22.
First Transition room 141 is closed in pass, the molecular pump essence of lower First Transition room 142 correspondence takes out valve HV1, HV2, opens the purging valve of First Transition room 141, lower First Transition room 142, exits to atmospheric condition to upper First Transition room 141, lower First Transition room 142.
Open push-pull valve VS11, lower plugboard valve VS12, second work rest 120 and coating materials frame 130 enter in upper First Transition room 141, lower First Transition room 142 from linear running pan carriage 102 respectively and stop, and close and close push-pull valve VS11, lower plugboard valve VS12.After this unit one frame 120 and coating materials frame 130 action is repeated.
Four, plated film
Arrive the first revolving gear 124 in the unit one frame 120 of coating chamber 110 to engage with the second revolving gear 163 on the first track 160 of coating chamber 110, open electric motor starting second revolving gear 163 to rotate, work rest 120 starts to do rotation movement in coating chamber 110.
First the coating materials frame 130 arriving coating chamber 110 is located with evaporation source position in coating chamber 110, and wherein electrode communication apparatus is to evaporation boat connection circuit.
Coating chamber 110 internal ion-source carries out Ion Cleaning, simultaneously to base material heating to base material on work rest 120.
After base material cleaning terminates, according to coating process needs, by resistance-type evaporation source or the evaporation of electron beam evaporation source coating materials, realize base material plated film.
Five, vacuum transition
Close and slightly take out valve RV2, open molecular pump essence and take out valve HV3, HV4, make the second transition chamber 151, down the second transition chamber 152 be in the state of vacuumizing; Molecular pump is bled to upper second transition chamber 151, lower second transition chamber 152, makes its vacuum pressure reach set(ting)value and (is generally 10
-3the Pa order of magnitude).
After plated film terminates, unit one frame 120 stops spinning motion.
Open push-pull valve VS31, lower plugboard valve VS32, unit one frame 120 and coating materials frame 130 enter in the second transition chamber 151, lower second transition chamber 152 from coating chamber linear running and stop, and close and close push-pull valve VS31, lower plugboard valve VS32.
Open push-pull valve VS21, lower plugboard valve VS22, second work rest 120 and coating materials frame 130 from upper First Transition room 141, lower First Transition room 142 linear running enters in coating chamber and stops, closing and close push-pull valve VS21, lower plugboard valve VS22.After this unit one frame 120 and coating materials frame 130 action is repeated.
Six, frame is gone out
Treat that unit one frame 120 and coating materials frame 130 enter the second transition chamber 151, lower second transition chamber 152 respectively, close and close push-pull valve VS31, lower plugboard valve VS32, then closure molecule pump essence takes out valve HV3, HV4.
Open the purging valve of the second transition chamber 151, lower second transition chamber 152, upper second transition chamber 151, lower second transition chamber 152 are exitted to atmospheric condition.
Open push-pull valve VS41, lower plugboard valve VS42, unit one frame 120 and coating materials frame 130 from upper second transition chamber 151, lower second transition chamber 152 linear running in pan carriage, close and close push-pull valve VS41, lower plugboard valve VS42 respectively.
Open the second transition chamber 151, the down dry pumping set of the second transition chamber 1520 correspondence and slightly take out valve RV2, upper second transition chamber 151 given by dry pumping set, lower second transition chamber 152 is bled, make vacuum pressure reach set(ting)value and (be generally 10
-1the Pa order of magnitude).
Close dry pumping set and slightly take out valve RV2, open molecular pump essence and take out valve HV3, HV4; Molecular pump is bled to upper second transition chamber 151, lower second transition chamber 152, makes vacuum pressure reach set(ting)value and (is generally 10
-3the Pa order of magnitude).
Upper second transition chamber 151, lower second transition chamber 152 are in high vacuum state, wait for that second work rest 120 and coating materials frame 130 plated film complete.
Seven, frame is walked in circulation
Unit one frame 120 and coating materials frame 130, by the transmission mechanism of pan carriage underframe 103, move to left end pan carriage 102 from right-hand member pan carriage 102.
In left end pan carriage 102, workman takes off the work rest 120 that base material has plated, changes the work rest 120 that installs base material to be plated.
In left end pan carriage 102, workman adds to the evaporation boat on coating materials frame 130 or crucible or changes coating materials.
In left end pan carriage 102 ready work rest 120 and coating materials frame 130 in upper First Transition room 141, the outer wait in lower First Transition room 142 enter.
For ensureing that described device 100 can operate continuously, according to the difference of work tempo, the number of work rest and coating materials frame can be respectively two or more; Quantity=single the work rest of minimum work rest or the configuration of coating materials frame or coating materials frame circular flow time ÷ work tempo once (namely adjacent two work rests or coating materials frame pass through the timed interval of production line same position).
Each operation steps in said apparatus 100 is by PLC time variable control, and adopt industrial computer control inerface, user can arrange respective processing parameter and plated film formula.
As from the foregoing: continuous vacuum evaporation coating device 100 provided by the present invention is in operation, except the handling of work rest and coating materials adopt manually, other operations are completed automatically by device, substantially increase plated film efficiency, ensure that the consistence of product rete.Can keep high vacuum state in coating chamber, foreign gas is few, effectively can prevent coating materials steam from being polluted by foreign gas, thus can obtain the more excellent rete of quality simultaneously.
Should be understood that; these are only the preferred embodiments of the present invention; can not therefore limit the scope of the claims of the present invention; every utilize specification sheets of the present invention and accompanying drawing content to do equivalent structure or equivalent flow process conversion; or be directly or indirectly used in other relevant technical fields, be all in like manner included in scope of patent protection of the present invention.
Claims (8)
1. a continuous vacuum evaporation coating device, comprising: coating chamber, work rest and coating materials frame, is characterized in that,
Described coating chamber one end is communicated with First Transition room, and the other end is communicated with the second transition chamber;
Be respectively equipped with the first track of the described work rest of transmission in described First Transition room, coating chamber, the second transition chamber and transmit the second track of described coating materials frame;
Described two ends, First Transition room and the second transition chamber two ends are respectively equipped with can the push-pull valve for separation gas of switch;
Described First Transition room, coating chamber, the second transition chamber are configured with independently air-bleed system respectively;
Described first track comprises: the first pulley, and the side of this first pulley is provided with the first gear;
Described work rest comprises: work rest body, and the top of this work rest body is provided with the first slide block with described first pulley adaptation, and this first slide block side is provided with the first tooth bar with described first gears meshing;
Described first slider top center position is provided with the first revolving gear, and described first revolving gear and described work rest body are fixed, and described first track in described coating chamber is provided with the second revolving gear engaged with described first revolving gear.
2. continuous vacuum evaporation coating device according to claim 1, is characterized in that,
First track of described First Transition room and the first track of coating chamber are isolated by the space accommodating push-pull valve, and the two prolongation is overlapped; First track of coating chamber and the first track of the second transition chamber are isolated by the space accommodating push-pull valve, and the two prolongation is overlapped;
Second track of described First Transition room and the second track of coating chamber are isolated by the space accommodating push-pull valve, and the two prolongation is overlapped; Second track of coating chamber and the second track of the second transition chamber are isolated by the space accommodating push-pull valve, and the two prolongation is overlapped.
3. continuous vacuum evaporation coating device according to claim 2, is characterized in that, described First Transition room comprises: upper First Transition room, the lower First Transition room be communicated with upper First Transition room; Upper First Transition indoor are provided with described first track; Described lower First Transition indoor are provided with described second track;
Described second transition chamber comprises: upper second transition chamber, lower second transition chamber be communicated with upper second transition chamber; Described first track is provided with in upper second transition chamber; Described second track is provided with in described lower second transition chamber.
4. continuous vacuum evaporation coating device according to claim 3, is characterized in that, described push-pull valve comprises: upper push-pull valve and lower plugboard valve;
Described upper two ends, First Transition room and upper second transition chamber two ends are provided with push-pull valve;
Described lower two ends, First Transition room and lower second transition chamber two ends are provided with lower plugboard valve.
5. the continuous vacuum evaporation coating device according to any one of Claims 1-4, is characterized in that, described second track comprises: the second pulley, and the side of this second pulley is provided with the second gear; Described coating materials frame comprises: coating materials frame body, and the bottom of this coating materials frame body is provided with the second slide block with described second pulley adaptation, and the side of described second slide block is provided with the second tooth bar with described second gears meshing.
6. the continuous vacuum evaporation coating device according to any one of Claims 1-4, is characterized in that, also comprises the first underframe, pan carriage, and for transporting the second underframe of pan carriage; Described First Transition room, coating chamber and the second transition chamber are placed on described first underframe; Described second underframe two ends are connected with the two ends of described first underframe respectively, and the outer surface of cupular part of the two is in same level;
Described pan carriage is respectively arranged with the first track and the second track; When described pan carriage is placed in one end that one end that the second underframe is provided with First Transition room with the first underframe is connected, the first track of described pan carriage and the first track of First Transition room are isolated by the space accommodating push-pull valve, and the two prolongation is overlapped.
7. continuous vacuum evaporation coating device according to claim 6, is characterized in that, also comprise:
For evaporating the vaporizer of coating materials;
For the well heater of upper First Transition room, coating chamber;
For the ion bombardment device cleaned base material.
8. continuous vacuum evaporation coating device according to claim 6, is characterized in that, also comprise:
For monitoring the film thickness monitoring instrument of base material coating film thickness;
For monitoring the compound vacuum gauge of vacuum tightness of First Transition room, coating chamber, the second transition chamber.
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| CN109468611B (en) * | 2018-12-25 | 2019-10-25 | 东莞市一粒米薄膜科技有限公司 | Vacuum coater |
| CN112080731B (en) * | 2020-07-22 | 2022-10-18 | 湘潭宏大真空技术股份有限公司 | Multi-chamber continuous optical film coating machine |
| CN113061870A (en) * | 2021-04-02 | 2021-07-02 | 泸州韶光智造科技有限公司 | Continuous vacuum coating production line and method for optical thin film component |
| CN116397206B (en) * | 2022-06-21 | 2024-01-23 | 费勉仪器科技(南京)有限公司 | Detachable connecting device, sample rack and vacuum sampling system |
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| CN101956174A (en) * | 2010-05-06 | 2011-01-26 | 东莞宏威数码机械有限公司 | Circulating evaporation device |
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| JP5694679B2 (en) * | 2009-05-04 | 2015-04-01 | 三星ディスプレイ株式會社Ｓａｍｓｕｎｇ Ｄｉｓｐｌａｙ Ｃｏ．，Ｌｔｄ． | Organic matter vapor deposition apparatus and vapor deposition method |
| JP2012140671A (en) * | 2010-12-28 | 2012-07-26 | Canon Tokki Corp | Film-forming apparatus |
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| CN101463471A (en) * | 2009-01-12 | 2009-06-24 | 浙江嘉远格隆能源股份有限公司 | Continuous thin film vacuum deposition method and apparatus |
| CN101956174A (en) * | 2010-05-06 | 2011-01-26 | 东莞宏威数码机械有限公司 | Circulating evaporation device |
| CN102051581A (en) * | 2010-12-30 | 2011-05-11 | 东莞宏威数码机械有限公司 | Substrate film-coating processing system |
| CN203333745U (en) * | 2013-05-23 | 2013-12-11 | 深圳市生波尔机电设备有限公司 | Continuous type vacuum evaporation coating device |
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Address after: Building 4, Haiyin Technology Industrial Park, No.1 Industrial Avenue, Banfu Community, Banfu Town, Zhongshan City, Guangdong Province, 528400 Patentee after: Guangdong Sheng Boer Photoelectric Technology Co.,Ltd. Address before: 528400 Room 403, four floor, government side economic and trade building, 25 of ban Fu town, 25 of ban Fu Road, Zhongshan, Guangdong. Patentee before: Guangdong Sheng Boer Photoelectric Technology Co.,Ltd. |