CN1955331A - Device for gas phase sedimentation on substrate - Google Patents
Device for gas phase sedimentation on substrate Download PDFInfo
- Publication number
- CN1955331A CN1955331A CN 200610110077 CN200610110077A CN1955331A CN 1955331 A CN1955331 A CN 1955331A CN 200610110077 CN200610110077 CN 200610110077 CN 200610110077 A CN200610110077 A CN 200610110077A CN 1955331 A CN1955331 A CN 1955331A
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- Prior art keywords
- equipment
- tightness system
- lid
- substrate
- center
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- 239000000758 substrate Substances 0.000 title claims abstract description 23
- 238000004062 sedimentation Methods 0.000 title 1
- 230000008021 deposition Effects 0.000 claims description 8
- 238000007789 sealing Methods 0.000 claims description 8
- 238000001704 evaporation Methods 0.000 abstract description 4
- 230000008020 evaporation Effects 0.000 abstract description 3
- 238000007740 vapor deposition Methods 0.000 abstract 1
- 235000013305 food Nutrition 0.000 description 18
- 238000010438 heat treatment Methods 0.000 description 8
- 239000002184 metal Substances 0.000 description 5
- 239000003566 sealing material Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 230000000630 rising effect Effects 0.000 description 3
- 239000006200 vaporizer Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 238000003475 lamination Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 239000012858 resilient material Substances 0.000 description 2
- 230000003213 activating effect Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 235000015927 pasta Nutrition 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 229920002994 synthetic fiber Polymers 0.000 description 1
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Abstract
The invention relates to an arrangement for the vapor deposition on substrates. It includes a pan as well as a cover with linearly disposed bores. Above this cover is seated a seal-off device, which also includes openings. Through the seal-off device the bores of the cover can be opened or closed, all bores being addressed simultaneously. Through the seal-off device different evaporation rates can be set within an extremely short time.
Description
Technical field
The present invention relates to a kind of as described in the preamble, equipment of being used for vapour deposition in substrate according to claim 1.
Background technology
Usually under vacuum condition, make synthetic film have metal level, for example so that make synthetic film or not make its conduction through gas.If be not All Ranges but just some trace line make conduction, then make those zones that can not receive metal level have some oil film bands.Because these oil films, metal can't be attached on the lamination.Apply these oil film bands by means of oil vaporizer.
Be used for producing metal-free band, be known that in the mode of coated film trace line under vacuum condition be provided with the container of charge of oil in this equipment, this equipment has at least one escape pipe (DE 3922187 A1) in particular for the equipment of producing electric capacity.The ozzle of giving vent to anger of this escape pipe ends at the pasta below in the application chamber, the substrate that the next-door neighbour will be coated with.
And, known a kind of method and apparatus (EP 0756020 A1) that is used for producing metal-free band at the vapor deposited metal of lagging material band.Here, coat in the zone of the metal-free band that will produce and cover band, by means of oil vaporizer, this covers band and scribbles oil in a side.The details of oil vaporizer structure does not provide.
Equipment at the known shielding film that is used for producing oil of another kind is provided with the columniform roller that covers, and covers oil and is imported into (JP2001-279425) in this equipment.Cover roller around opening is arranged, cover oil by the output of this opening.Above this covers roller, be positioned with thin stack, and these through holes and this opening are overlapping with some through holes.
Disclose another kind of equipment in JP 2004-214185, wherein substrate is directed through some linear ozzles that are provided with.Here said equipment comprises the box-like device of charge of oil, and the heating system that is positioned this equipment below.
Aforesaid device does not have the ability of the effusive oil gas quantity of metering.
Summary of the invention
Therefore, the invention solves provides a kind of problem that is used for the equipment of vapour deposition oil in substrate, and this equipment can be set effusive oil gas quantity.
This problem is resolved by the described feature of claim 1.
Therefore, the present invention relates to a kind of equipment that is used for vapour deposition in substrate.This equipment comprises dish and with the lid in some linear holes that are provided with.Be provided with tightness system above this lid, the sealing device also has some openings.By the sealing device, these holes of lid can be sealed or be open, and all holes all are handled simultaneously.By the sealing device, can in the extremely short time, set different vaporator rates.
Equipment described in the present invention has the advantage that makes vapor pressure have more obvious homogeneity, and thereby makes oil film band precision obtain more obvious homogeneity on the whole working width of oil film.
Equipment comprises some holes that setting is embarked on journey, and these holes can be opened wide or sealing by means of tightness system.The sealing device also comprises some openings, and by activating the sealing device, these holes can be opened wide or seal.
The sealing device is handled all holes simultaneously, thereby can realize as one man open all holes.
Become thus and can in the extremely short time, set the vaporator rate of thermal inertia evaporation equipment.
An advantage of the present invention comprises: tightness system can be set, make effusive quantity of steam keep constant always.Because quantity of steam constant, thereby the coating of substrate also can become evenly, thereby this equipment is particularly suitable for synthesizing on the film at metal and forms band, pattern and surperficial metal-free zone.
Another advantage of the present invention is that between the standby period and between the tailend of gas-phase deposition, evaporating space can seal by means of tightness system.Therefore, the leakage of oil becomes unlikely, and this also makes oil that the pollution of environment has been dropped to minimum.Thereby, can reduce the loss of oil significantly.Therefore, tightness system has the ability of setting open position or off-position.
Utilize the ability of regulating effusive oil gas quantity, can make the oil mass optimum, can be thereby become in the quality of improving metal-free zone aspect edge definition and the residual oil mass.For example, can accurately set, thereby by means of the definite oil mass of being discharged of metering facility.If the output of oily vapour is not corresponding with calibration value, then there is signal to be delivered to the device that is used to activate tightness system, thereby again oil gas quantity is set in calibration value.
The design of this equipment also is embodied in, make rising steam only along upward to, promptly leave this equipment towards a side, this is because can not see through steam fully on other all sides.Thereby, cross-stream no longer takes place, there is not flow resistance in vapor pressure thus near equating yet in the space below ozzle in the All Ranges of equipment.Because crucible and the more shallow structure that is the tightness system of slide block form, equipment can be taked the size more much smaller than the evaporator unit of previously known.
Description of drawings
Theme of the present invention shows in the accompanying drawings, and will describe in further detail hereinafter.In the accompanying drawings:
Fig. 1 is the skeleton view that is used in the equipment of deposition oil in the substrate and is directed to the substrate of this equipment of process;
Fig. 2 is the skeleton view of equipment when not having substrate and ozzle bar according to Fig. 1;
Fig. 3 be along A-A by one section view according to the longitudinal cross-section of the equipment of Fig. 1, wherein slide block is shown in an open position;
Fig. 4 is that along the cross sectional view of B-B by equipment shown in Figure 1, wherein slide block is shown in an open position after rotating 90 degree along clockwise direction.
Embodiment
Fig. 1 shown be used under vacuum, the skeleton view of the equipment 1 of vapour deposition on the material substrate of for example organic materials.Above this equipment 1, along B-B guiding lamination substrate 38.If this substrate is synthetic film, then as described in the JP 2001-279425, substrate can be moved above equipment 1.In order to produce the band of sharp edges, the distance between substrate 38 and the equipment 1 is very little usually.
This equipment 1 comprises food tray 2, and the oil that will evaporate to some extent wherein is set.Thermofin 3 is arranged on food tray 2, on thermofin 3, be provided with hot-plate 4.Be positioned with ozzle bar 5 on this hot-plate 4, this ozzle bar 5 has gap 6 in its top.Some independent ozzles can also be set to replace gap 6.A-A along the line is provided with the slide block 7 with some holes, and having only hole 10 wherein in Fig. 1 is visible.Gap 6 is delimited by two zones 24,25.
And this equipment 1 comprises some connect elements 28-32, and they are joined to one another food tray 2, thermofin 3, hot-plate 4 and the ozzle bar 5 that rests above them.
In order to prevent steam in the condensation of the central zone of equipment 1, hot-plate 4 comprises the bar type well heater 8 that at least one is independent.
Fig. 2 has shown the skeleton view when equipment shown in Figure 11 does not have substrate 38 and ozzle bar 5.And, can see slide block 7, this slide block 7 is set in the hot-plate 4.As shown here, slide block 7 can be the form of elongated board.Hot-plate 4 contacts with thermal baffle 3 above leaning against food tray 2, and thermal baffle 3, hot-plate 4 and food tray 2 are joined to one another by connect elements 28-37.And bar type well heater 9,8 and 27 is obvious visible.
Hot-plate 4 has groove at it along the center of A-A, and slide block 7 is assembled in this groove.This slide block 7 has some opening 10-14 that setting is embarked on journey, and they are equidistantly spaced apart substantially each other.Slide block 7 can move along A-A (seeing arrow).The as many opening 10-14 in hole with hot-plate 4 (invisible among Fig. 2) must be arranged at least, and the width between centers in two holes in the width between centers of two opening 10-14 and the hot-plate 4 is corresponding.The aperture of hot-plate is roughly corresponding with the diameter of the opening 10-14 of slide block 7.Thereby the length of slide block 7 adds that with the length of hot-plate 4 width between centers of two opening 10-14 is corresponding.Therefore, become possible and be: on the one hand, the center of opening 10-14 can accurately be positioned at the top, center in these holes, on the other hand, and between the center in these holes.If these openings accurately are positioned at these tops, hole, steam can leave from the inside of food tray 2, yet, if these openings between these holes, have then stoped steam to leave.It being understood that between these two extreme positions to have some possible positions, in these positions, the steam of decrease is left.It being understood that opening 10-14 more than the open amount shown in Fig. 2 and that size is littler can be set.
Be equipped with sealing material 15,16 on two sides of the hot-plate 4 that extends along A-A, this has prevented that steam from leaving from food tray 2. Sealing material 15,16 preferably comprises the resilient material of rubber-type.
Fig. 3 has shown equipment shown in Figure 1 a section along the longitudinal cross-section of A-A.Can see heating rod 9 in the internal space 18 of food tray 2, this heating rod 9 is surrounded by oil fully.On food tray 2, be positioned with thermal baffle 3, on thermal baffle 3, be provided with hot-plate 4.This hot-plate 4 comprises some hole 19-22, and steam can leave from these holes and the opening 10-14 by slide block 7 enters space 26.
As seen in fig. 3, be with the part of the slide block 7 of opening 10 to be positioned at food tray 2 outsides.In the following manner slide block 7 is arranged on the hot-plate 4, that is, makes the part of opening 12-14 of slide block aim at the hole 19-21 of hot-plate 4.Thereby the steam of rising can enter in the space 26 of ozzle bar 5 by these holes 19-21 and opening 12-14, and from that by gap 6 and through outside the equipment 1.In this way, steam arrives the substrate 38 of moving above equipment 1.
If slide block 7 further slides in the equipment 1, then can determine: opening 10-12 only is positioned partially at hole 19-22 top now.In this case, slide block 7 effects are similar to throttling valve, and this is because less steam can be through outside the food tray 2.If slide block 7 further slides into again in the equipment 1, then coating process is interrupted fully, and this is because there is not opening still to be positioned at hole 19-22 top, and steam no longer may leave from food tray 2.
Fig. 4 has shown the equipment shown in Figure 3 cross sectional view along B-B after rotating 90 degree along clockwise direction.Substrate 38 is moved above equipment 1, and through equipment 1.Heating rod 9 extends in the inside 18 of food tray 2, and this heating rod 9 is surrounded by oil 17 fully.
Stop the slide block 7 that band opening 12 is arranged on hot-plate 4, slide block 7 just in time is positioned at 19 tops, hole.Therefore, rising steam can arrive space 26.In order to obtain uniform oil film band, particularly having under the situation of the ozzle bar of ozzle seldom, the vapour pressure equilibrium of forces must be possible, and does not have tangible flow resistance.Therefore, the space 26 of ozzle below must be big as much as possible.Ozzle bar 5 has the gap 6 that is limited by two zones 24,25.By this gap 6, steam can leave equipment 1, and arrives the substrate 38 that moves through this equipment 1, and steam is condensate in the substrate 38 at last.
The slip of slide block 7 is finished, and makes opening 12 no longer or only be positioned partially at 19 tops, hole.
If slide block 7 only is positioned partially at 19 tops, hole, then obtained restriction effect, opposite, if opening 12 no longer is positioned at 19 tops, hole, then steam can not leave.Thereby slide block 7 is as seal valve.
In case coating process is finished, and equipment 1 cooled down, then can unload web member 29,34, and can take this device easily apart and clean it.
Claims (14)
1. equipment that is used for vapour deposition in substrate, this equipment comprise dish (2) and in this dish (2) top, have a lid (4) in some linear holes (19-22) that are provided with, it is characterized in that, be provided with tightness system (7) in the top of this lid (4), sealing device (7) also comprises some linear openings (10-14) that are provided with.
2. equipment as claimed in claim 1, wherein, described tightness system (7) has at least the as many opening in hole (19-22) (10-14) that has with described lid (4).
3. equipment as claimed in claim 1, wherein, described tightness system (7) can move along a coordinate.
4. equipment as claimed in claim 1, wherein, the length of described tightness system (7) is roughly corresponding with the length of described lid (4).
5. equipment as claimed in claim 1, wherein, the length that the length of described tightness system (7) is at least described lid (4) adds the corresponding length of width between centers with two holes (19-22).
6. equipment as claimed in claim 1, wherein, the distance between the center of approximate two adjacent holes (19-22) with described lid (4) of the distance between the center of two adjacent apertures (10-14) of described tightness system (7) is corresponding.
7. equipment as claimed in claim 1, wherein, described tightness system (7) is taked such position, and in this position, the center of described opening (10-14) accurately is positioned at the top, center in the hole (19-22) of described lid (4).
8. equipment as claimed in claim 1, wherein, described tightness system (7) is taked such position, and in this position, the center of described opening (10-14) accurately is positioned at the center between the adjacent holes (19-22) of described lid (4).
9. equipment as claimed in claim 1, wherein, described dish (2) has at least one well heater (9).
10. equipment as claimed in claim 1, wherein, described lid (4) has at least one well heater (8,27).
11. equipment as claimed in claim 1 wherein, is provided with thermal baffle (3) between described dish (2) and described lid (4).
12. equipment as claimed in claim 1 wherein, in ozzle bar (5), is provided with steam space (26) in described tightness system (7) top.
13. equipment as claimed in claim 12 wherein, in described ozzle bar (5), is provided with gap (6) in top, described steam space (26).
14. as claim 9 or the described equipment of claim 10, wherein, described well heater (9,8,27) is the bar type well heater.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP0502335.4 | 2005-10-26 | ||
| EP0502335 | 2005-10-26 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN1955331A true CN1955331A (en) | 2007-05-02 |
Family
ID=38062876
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 200610110081 Pending CN1955332A (en) | 2005-10-26 | 2006-07-31 | Evaporator device with container for containing being evaporated material |
| CN 200610110077 Pending CN1955331A (en) | 2005-10-26 | 2006-07-31 | Device for gas phase sedimentation on substrate |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 200610110081 Pending CN1955332A (en) | 2005-10-26 | 2006-07-31 | Evaporator device with container for containing being evaporated material |
Country Status (1)
| Country | Link |
|---|---|
| CN (2) | CN1955332A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104213077A (en) * | 2013-05-30 | 2014-12-17 | 海洋王照明科技股份有限公司 | Evaporation equipment used for organic electroluminescent device |
| CN106560008A (en) * | 2014-07-07 | 2017-04-05 | 铣益系统有限责任公司 | Possess the film deposition apparatus of multiple evaporation sources |
| CN106560007A (en) * | 2014-07-07 | 2017-04-05 | 铣益系统有限责任公司 | Possess the film deposition apparatus of multiple crucibles |
| CN108823535A (en) * | 2018-07-10 | 2018-11-16 | 京东方科技集团股份有限公司 | A kind of evaporated device |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2011252085A (en) | 2010-06-02 | 2011-12-15 | Honda Motor Co Ltd | Plasma film deposition method |
| TWI781929B (en) * | 2016-04-25 | 2022-11-01 | 美商創新先進材料股份有限公司 | Effusion cells, deposition systems including effusion cells, and related methods |
| US11946131B2 (en) * | 2017-05-26 | 2024-04-02 | Universal Display Corporation | Sublimation cell with time stability of output vapor pressure |
-
2006
- 2006-07-31 CN CN 200610110081 patent/CN1955332A/en active Pending
- 2006-07-31 CN CN 200610110077 patent/CN1955331A/en active Pending
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104213077A (en) * | 2013-05-30 | 2014-12-17 | 海洋王照明科技股份有限公司 | Evaporation equipment used for organic electroluminescent device |
| CN106560008A (en) * | 2014-07-07 | 2017-04-05 | 铣益系统有限责任公司 | Possess the film deposition apparatus of multiple evaporation sources |
| CN106560007A (en) * | 2014-07-07 | 2017-04-05 | 铣益系统有限责任公司 | Possess the film deposition apparatus of multiple crucibles |
| CN106560007B (en) * | 2014-07-07 | 2018-12-14 | 铣益系统有限责任公司 | The film deposition apparatus for having multiple crucibles |
| CN108823535A (en) * | 2018-07-10 | 2018-11-16 | 京东方科技集团股份有限公司 | A kind of evaporated device |
Also Published As
| Publication number | Publication date |
|---|---|
| CN1955332A (en) | 2007-05-02 |
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| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C02 | Deemed withdrawal of patent application after publication (patent law 2001) | ||
| WD01 | Invention patent application deemed withdrawn after publication |