CN109468611B - Vacuum coater - Google Patents
Vacuum coater Download PDFInfo
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- CN109468611B CN109468611B CN201811595488.1A CN201811595488A CN109468611B CN 109468611 B CN109468611 B CN 109468611B CN 201811595488 A CN201811595488 A CN 201811595488A CN 109468611 B CN109468611 B CN 109468611B
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/568—Transferring the substrates through a series of coating stations
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- Chemical Kinetics & Catalysis (AREA)
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- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The present invention relates to a kind of vacuum coaters, it include: the first vacuum chamber row, the second vacuum chamber row, the first transfer device, the second transfer device, the first driving mechanism, the second driving mechanism and substrate frame, first vacuum chamber row, the second transfer device and the second vacuum chamber alignment time arrangement are to form circulation, the opposite sides of substrate frame is used to load substrate, first driving mechanism is for driving substrate frame to arrange along first direction across the first vacuum chamber, so that the substrate for being loaded into the first side of substrate frame completes vacuum outgas plated film；Second transfer device is used to substrate frame being transferred to the second vacuum chamber row by the first vacuum chamber row, so that substrate frame drives via the second driving mechanism passes through the second vacuum chamber row in a second direction, so that so that the substrate for being loaded into second side of substrate frame completes vacuum outgas plated film；First transfer device be used for by opposite sides reload substrate substrate frame by the second vacuum chamber row be transferred to the first vacuum chamber row.
Description
Technical field
The present invention relates to technical field of vacuum plating more particularly to a kind of vacuum coaters.
Background technique
Traditional vacuum coater operation is once typically only capable to carry out the single substrate for being loaded into its substrate frame side
Vacuum outgas plated film, when carrying out the processing of vacuum outgas plated film to large batch of substrate using above-mentioned vacuum coater, it will
The machining period of substrate is caused to waste serious, energy consumption is big, and production efficiency is low.
Summary of the invention
Based on this, it is necessary to provide a kind of vacuum coater of vacuum outgas plating membrane efficiency that can be improved substrate.
A kind of vacuum coater, comprising: the first vacuum chamber row, the second vacuum chamber row, the first transfer device, second
Transfer device, the first driving mechanism, the second driving mechanism and substrate frame, first transfer device, first vacuum chamber
Row, second transfer device and the second vacuum chamber alignment time arrangement are to form circulation, the first vacuum chamber row
And the second vacuum chamber row is respectively positioned between first transfer device and second transfer device, by described first turn
Telephone-moving structure to the direction of second transfer device is first direction, by second transfer device to first transfer device
Direction be second direction；The opposite sides of the substrate frame is used to load substrate, and first driving mechanism is for driving
The substrate frame is arranged along the first direction across first vacuum chamber, so as to be loaded into the first side of the substrate frame
The substrate completes vacuum outgas plated film；Second transfer device is for being arranged the substrate frame by first vacuum chamber
It is transferred to the second vacuum chamber row, so that the substrate frame drives via second driving mechanism along the second direction
It is arranged across second vacuum chamber, so that so that the substrate for being loaded into second side of the substrate frame completes vacuum outgas
Plated film；First transfer device has the substrate frame of the substrate true by described second for opposite sides to be reloaded
Plenum chamber row is transferred to the first vacuum chamber row；
The first vacuum chamber row includes the first buffer vacuum chamber sequentially arranged along the first direction, the first vacuum
Coating chamber and the second buffer vacuum chamber, the second vacuum chamber row include the third buffering sequentially arranged along the second direction
Vacuum chamber, the second vacuum film coating chamber and the 4th buffer vacuum chamber；
First buffer vacuum chamber includes sequentially arranging along the first direction and import that vacuum degree is gradually increased is true
Empty room, import vacuum lock chamber and import vacuum transition chamber, the 4th buffer vacuum chamber include along the second direction sequentially
Outlet vacuum transition chamber, exit vacuum lock room and the exit vacuum chamber that arrangement and vacuum degree are gradually reduced；
The import vacuum chamber side by side and is aligned setting with the exit vacuum chamber, the import vacuum lock chamber with it is described
Exit vacuum lock room is side by side and alignment setting, the import vacuum transition chamber side by side and are aligned with the outlet vacuum transition chamber
Setting, first vacuum film coating chamber side by side and are aligned setting, second buffer vacuum chamber with second vacuum film coating chamber
Side by side and setting is aligned with the third buffer vacuum chamber.
It in one of the embodiments, further include the first cabinet, the second cabinet, third cabinet, the 4th cabinet, the 5th case
Body, first partition, second partition, third partition, the 4th partition and the 5th partition, first cabinet, second cabinet, institute
Third cabinet, the 4th cabinet and the 5th cabinet is stated sequentially to arrange along the first direction；The first partition is by described
One cabinet is divided into the import vacuum chamber and the exit vacuum chamber；Second cabinet is divided into institute by the second partition
State import vacuum lock chamber and the exit vacuum lock room；The third cabinet is divided into the import by the third partition
Vacuum transition chamber and the outlet vacuum transition chamber；4th cabinet is divided into first Vacuum Deposition by the 4th partition
Film room and second vacuum film coating chamber；5th partition by the 5th cabinet be divided into second buffer vacuum chamber with
The third buffer vacuum chamber.
The first filming target, the first filming target are equipped in first vacuum coating room in one of the embodiments,
For by the first filming target and being loaded into the substrate of the first side of the substrate frame to along the first direction and splashing
Penetrate depositional coating.
In one of the embodiments, when substrate frame passes through the first filming target along the first direction, the base
First side of horse is towards the first filming target, and second side of the substrate frame deviates from the first filming target.
The second coated target, second coated target are equipped in second vacuum coating room in one of the embodiments,
For being splashed to the substrate of the second side passed through second coated target along the second direction and be loaded into the substrate frame
Penetrate depositional coating.
In one of the embodiments, when the substrate frame passes through second coated target along the second direction, institute
The first side back of substrate frame is stated from second coated target, and second side of the substrate frame is towards second coated target.
First transfer device includes the first load transfer station and is used for and the substrate frame phase in one of the embodiments,
First transmission component of cooperation, first transmission component are connect with first load transfer station, and first load transfer station can lead to
Crossing first transmission component drives the substrate frame to move along third direction and fourth direction, and first transmission component can
The substrate frame is driven to move along the first direction, the third direction is by second vacuum chamber to described first true
The direction of plenum chamber row, the fourth direction is the direction arranged by second vacuum chamber to first vacuum chamber.
Second transfer device is used under vacuum conditions by the substrate frame by described in one of the embodiments,
First vacuum chamber row is transferred to the second vacuum chamber row.
In one of the embodiments, second transfer device include vacuum transfer chamber, the second load transfer station and for
The second transmission component that the substrate frame matches, second load transfer station are set in the vacuum transfer chamber, and described second passes
Dynamic component is connect with second load transfer station, and second load transfer station can drive the substrate by second transmission component
Frame is moved along third direction and fourth direction, and second transmission component is able to drive the substrate frame and moves along the second direction
Dynamic, the third direction is the direction arranged by second vacuum chamber to first vacuum chamber, and the fourth direction is
The direction arranged by second vacuum chamber to first vacuum chamber.
It in one of the embodiments, further include the first vacuum pump group and the second vacuum pump group, first vacuum pump group
For extracting the air in the first vacuum chamber row, second vacuum pump group is for extracting the second vacuum chamber row
Interior air.
Above-mentioned vacuum coater, when operation, the first driving mechanism drives substrate frame to pass through the first vacuum along first direction
Chamber row, so that the substrate for being loaded into the first side of substrate frame completes vacuum outgas plated film, then, the second transfer device is by substrate
Frame is transferred to the second vacuum chamber row by the first vacuum chamber row, so that substrate frame drives via the second driving mechanism along second party
It is arranged to the second vacuum chamber is passed through, so that so that the substrate for being loaded into second side of substrate frame completes vacuum outgas plated film, then
After the substrate for having unloaded substrate frame opposite sides completion plated film, opposite sides is reloaded and has substrate by the first transfer device
Substrate frame by the second vacuum chamber row be transferred to the first vacuum chamber row, to realize that counterweight is newly loaded into substrate frame opposite sides
Substrate next vacuum coating circulation, therefore, above-mentioned vacuum coater pass through the first driving mechanism, the second transfer
The mutual cooperation of structure, the second driving mechanism and the first transfer device can be realized to the substrate for being loaded into substrate frame opposite sides
Vacuum outgas plated film and be continuously conveyed, substantially increase substrate vacuum outgas plating membrane efficiency, reduce production cost, automation
High with serialization degree, energy consumption is few.
Detailed description of the invention
In order to more clearly explain the embodiment of the invention or the technical proposal in the existing technology, to embodiment or will show below
There is attached drawing needed in technical description to be briefly described, it should be apparent that, the accompanying drawings in the following description is only this
Some embodiments of invention for those of ordinary skill in the art without creative efforts, can be with
It obtains other drawings based on these drawings.
Fig. 1 is the structural schematic diagram of vacuum coater in an embodiment；
Fig. 2 is the diagrammatic cross-section of vacuum coater in an embodiment；
Fig. 3 is the enlarged diagram in Fig. 2 at A；
Fig. 4 is the enlarged diagram in Fig. 2 at B；
Fig. 5 is the enlarged diagram in Fig. 2 at C；
Fig. 6 is another structural schematic diagram of vacuum coater in an embodiment.
Specific embodiment
To facilitate the understanding of the present invention, a more comprehensive description of the invention is given in the following sections with reference to the relevant attached drawings.In attached drawing
Give better embodiment of the invention.But the invention can be realized in many different forms, however it is not limited to herein
Described embodiment.On the contrary, the purpose of providing these embodiments is that making to understand more the disclosure
Add thorough and comprehensive.
It should be noted that it can directly on the other element when element is referred to as " being fixed on " another element
Or there may also be elements placed in the middle.When an element is considered as " connection " another element, it, which can be, is directly connected to
To another element or it may be simultaneously present centering elements.Term as used herein "inner", "outside", "left", "right" and
Similar statement for illustrative purposes only, is not meant to be the only embodiment.
As shown in Figures 1 and 2, the vacuum coater 10 in an embodiment includes that the first vacuum chamber row 100, second is true
Plenum chamber arrange the 200, first transfer device 300, the second transfer device 400, the first driving mechanism 500, the second driving mechanism 600 and
Substrate frame 700.First transfer device 300, the first vacuum chamber arrange the 100, second transfer device 400 and the second vacuum chamber row
200 sequentially arrange to form circulation.First vacuum chamber row 100 and the second vacuum chamber row 200 are respectively positioned on the first transfer device
300 and second between transfer device 400.It is first direction by the direction of 300 to the second transfer device 400 of the first transfer device,
It is second direction by the direction of 400 to the first transfer device 300 of the second transfer device.The opposite sides of substrate frame 700 is used to
Load substrate 20.First driving mechanism 500 arranges 100 for driving substrate frame 700 to pass through the first vacuum chamber along first direction, with
The substrate 20 for the first side for being loaded into substrate frame 700 is set to complete vacuum outgas plated film；Second transfer device 400 is used for substrate frame
700 are transferred to the second vacuum chamber row 200 by the first vacuum chamber row 100, so that substrate frame 700 is via the second driving mechanism
600 drive in a second direction across the second vacuum chamber row 200, to so as to be loaded into the substrate of second side of substrate frame 700
20 complete vacuum outgas plated film；First transfer device 300 for opposite sides is reloaded have the substrate frame 700 of substrate 20 by
Second vacuum chamber row 200 is transferred to the first vacuum chamber row 100.
Above-mentioned vacuum coater 10, when operation, the first driving mechanism 500 driving substrate frame 700 is passed through along first direction
First vacuum chamber row 100, so that the substrate 20 for being loaded into the first side of substrate frame 700 completes vacuum outgas plated film, then, the
Substrate frame 700 is transferred to the second vacuum chamber row 200 by the first vacuum chamber row 100 by two transfer devices 400, so that substrate frame
700 drive via the second driving mechanism 600 in a second direction across the second vacuum chamber row 200, to so as to be loaded into substrate
The substrate 20 of second side of frame 700 completes vacuum outgas plated film, then when unload 700 opposite sides of substrate frame completion plated film
After substrate 20, the first transfer device 300, which reloads opposite sides, has the substrate frame 700 of substrate 20 by the second vacuum chamber
Row 200 is transferred to the first vacuum chamber row 100, to realize that counterweight is newly loaded under the substrate 20 of 700 opposite sides of substrate frame
One vacuum coating circulation, therefore, above-mentioned vacuum coater 10 by the first driving mechanism 500, the second transfer device 400,
The mutual cooperation of second driving mechanism 600 and the first transfer device 300 can be realized to being loaded into 700 opposite sides of substrate frame
Substrate 20 vacuum outgas plated film and be continuously conveyed, substantially increase substrate 20 vacuum outgas plating membrane efficiency, reduce production
Cost, automation and serialization degree are high, and energy consumption is few.
As shown in Figure 1, in the present embodiment, first direction and second direction are linear direction, specifically, first direction
For X-direction, second direction is Y-direction.In one embodiment, the first vacuum chamber row 100 includes sequentially arranging along first direction
The first buffer vacuum chamber 110, the first vacuum film coating chamber 120 and the second buffer vacuum chamber 130, the second vacuum chamber row 200 packet
Include the third buffer vacuum chamber 210 sequentially arranged in a second direction, the second vacuum film coating chamber 220 and the 4th buffer vacuum chamber 230.
First buffer vacuum chamber 110 is used to carry out the substrate 20 for being carried on 700 opposite sides of substrate frame the vacuum outgas before plated film, with
Remove moisture and other impurities remaining in substrate 20；First vacuum film coating chamber 120 is used for being carried on the first of substrate frame 700
The substrate 20 of side carries out vacuum coating, and the second buffer vacuum chamber 130 and third buffer vacuum chamber 210 are used for being carried on substrate frame
The substrate 20 of 700 second side carries out the vacuum outgas before plated film；Second vacuum film coating chamber 220 is used for being carried on substrate frame
The substrate 20 of 700 second side carries out vacuum coating, and the 4th buffer vacuum chamber 230 is used for being carried on substrate frame 700 opposite two
The substrate 20 of side carries out the vacuum transmission after plated film.
Further, in the present embodiment, the first buffer vacuum chamber 110 includes sequentially arranging along first direction and vacuum degree
Import vacuum chamber 112, import vacuum lock chamber 114 and the import vacuum transition chamber 116 being gradually increased, the 4th buffer vacuum chamber
230 include the outlet vacuum transition chamber 232 that sequentially arrangement and vacuum degree are gradually reduced in a second direction, exit vacuum lock room
234 and exit vacuum chamber 236.
Specifically in the present embodiment, import vacuum chamber 112, import vacuum lock chamber 114 and import vacuum transition chamber 116 are logical
It crosses valve 150 to be sequentially communicated, import vacuum transition chamber 116, the first vacuum film coating chamber 120 and the second buffer vacuum chamber 130 are successively
Connection, third buffer vacuum chamber 210, the second vacuum film coating chamber 220 and outlet vacuum transition chamber 232 are sequentially communicated, and export vacuum
Transition chamber 232, exit vacuum lock room 234 and exit vacuum chamber 236 are sequentially communicated by valve 150.
Further, import vacuum chamber 112 side by side and is aligned setting, import vacuum lock chamber 114 with exit vacuum chamber 236
Side by side and be aligned setting with exit vacuum lock room 234, import vacuum transition chamber 116 and outlet vacuum transition chamber 232 side by side and
Alignment setting, the first vacuum film coating chamber 120 side by side and are aligned setting, the second buffer vacuum chamber 130 with the second vacuum film coating chamber 220
Side by side and setting is aligned with third buffer vacuum chamber 210.
In one embodiment, by taking visual angle shown in FIG. 1 as an example, when the second vacuum chamber row 200 is located at the first vacuum chamber
When the surface of row 100, exit vacuum chamber 236 is located at the surface of import vacuum chamber 112, and exit vacuum lock room 234 is located at
The surface of import vacuum lock chamber 114, outlet vacuum transition chamber 232 are located at the surface of import vacuum transition chamber 116, and second
Vacuum film coating chamber 220 is located at the surface of the first vacuum film coating chamber 120, and third buffer vacuum chamber 210 is located at the second buffer vacuum
The surface of room 130.
Similarly, in another embodiment, when the second vacuum chamber row 200 be located at the first vacuum chamber row 100 just under
Fang Shi, exit vacuum chamber 236 are located at the underface of import vacuum chamber 112, and exit vacuum lock room 234 is located at import vacuum lock
The underface of room 114, outlet vacuum transition chamber 232 are located at the underface of import vacuum transition chamber 116, the second vacuum film coating chamber
220 be located at the first vacuum film coating chamber 120 underface, third buffer vacuum chamber 210 be located at the second buffer vacuum chamber 130 just under
Side.When the second vacuum chamber row 200 is located at, the first vacuum chamber arranges 100 front or the second vacuum chamber row 200 is located at
When the dead astern of the first vacuum chamber row 100, exit vacuum chamber 236 and import vacuum chamber 112, exit vacuum lock room 234 with
Import vacuum lock chamber 114, outlet vacuum transition chamber 232 and import vacuum transition chamber 116, the second vacuum film coating chamber 220 and the
The positional relationship of one vacuum film coating chamber 120 and third buffer vacuum chamber 210 and the second buffer vacuum chamber 130 and the second vacuum
The case where when chamber row 200 is positioned at the underface of the first vacuum chamber row 100, is similar.This is no longer going to repeat them.
As shown in Figure 1, in one embodiment, being equipped with the first filming target 122, the first filming in the first vacuum film coating chamber 120
Target 122 be used for along first direction by the first filming target 122 and be loaded into substrate frame 700 the first side substrate 20 sputter
Depositional coating, to realize that the plated film to the substrate 20 for the first side for being loaded into substrate frame 700 is processed.
Further, when substrate frame 700 passes through the first filming target 122 along first direction, the first side court of substrate frame 700
To the first filming target 122, and second side of substrate frame 700 deviates from the first filming target 122.So set, working as the first filming target 122
To along first direction by the first filming target 122 and be loaded into substrate frame 700 the first side 20 sputtering sedimentation film of substrate
When layer, since substrate frame 700 can carry out barrier to the depositional coating that the first filming target 122 sputters, so as to avoid first
The depositional coating that coated target 122 sputters is emitted on the substrate 20 of the second side for being loaded into substrate frame 700, this is avoided to be loaded into base
The depositional coating that the substrate 20 of second side of horse 700 is sputtered by the first filming target 122 accidentally plates.
Further, in one embodiment, the second coated target 222, the second coated target are equipped in the second vacuum film coating chamber 220
222 for pass through second coated target 222 in a second direction and be loaded into substrate frame 700 second side the sputtering of substrate 20 it is heavy
Integrated membrane layer, to realize that the plated film to the substrate 20 of the second side for being loaded into substrate frame 700 is processed.
Further, when substrate frame 700 passes through the second coated target 222 in a second direction, the first side back of substrate frame 700
From the second coated target 222, and second side of substrate frame 700 is towards the second coated target 222.So set, working as the first filming target 122
To passing through second coated target 222 in a second direction and be loaded into the substrate 20 of second side of substrate frame 700 to carry out sputtering heavy
When integrated membrane layer, since substrate frame 700 can carry out barrier to the depositional coating that the second coated target 222 sputters, so as to avoid
The depositional coating of second coated target 222 sputtering is emitted on the substrate 20 for being loaded into the first side of substrate frame 700, avoids the loading
In the depositional coating secondary film coating that the substrate 20 that the first side plated film of substrate frame 700 is completed is sputtered by the second coated target 222.
As shown in Figures 1 and 2, in one embodiment, above-mentioned vacuum coater 10 further includes the first cabinet 800, second
Cabinet 810, third cabinet 820, the 4th cabinet 830, the 5th cabinet 850, first partition 860, second partition 870, third partition
880, the 4th partition 890 and the 5th partition 892.First cabinet 800, the second cabinet 810, third cabinet 820, the 4th cabinet 830
And the 5th cabinet 850 sequentially arrange along first direction；First partition 860 by the first cabinet 800 be divided into import vacuum chamber 112 with
Exit vacuum chamber 236；Second cabinet 810 is divided into import vacuum lock chamber 114 and exit vacuum lock room by second partition 870
234；Third cabinet 820 is divided into import vacuum transition chamber 116 and outlet vacuum transition chamber 232 by third partition 880；4th every
4th cabinet 830 is divided into the first vacuum film coating chamber 120 and the second vacuum film coating chamber 220 by plate 890；5th partition 892 is by
Five cabinets 850 are divided into the second buffer vacuum chamber 130 and third buffer vacuum chamber 210.
As shown in figure 3, further, in one embodiment, the first transfer device 300 includes the first load transfer station 320 and uses
In the first transmission component 340 matched with substrate frame 700, the first transmission component 340 is connect with the first load transfer station 320, and first
Load transfer station 320 can drive substrate frame 700 to move along third direction and fourth direction by the first transmission component 340, and first passes
Dynamic component 340 is able to drive substrate frame 700 and moves along first direction, and third direction is that the first vacuum chamber row 100 to the second is true
The direction of plenum chamber row 200, fourth direction are by the direction of the second vacuum chamber to the first vacuum chamber row 100, and then with reality
Continuous transfer of the existing substrate frame 700 from the second vacuum chamber row 200 to the first vacuum chamber row 100, in the present embodiment, third
Direction and fourth direction are linear direction, and third direction is Z-direction, fourth direction be the direction W, third direction and first direction and
Second direction is vertical, and fourth direction is vertical with first direction and second direction.
As shown in figure 3, further, the first transmission component 340 includes multiple first for matching with substrate frame 700
Belt wheel 342, multiple first synchronous belts 344 and the first actuator.Multiple rotations of first pulley 342 are set on the first load transfer station 320
And be sequentially intervally arranged along first direction, each first synchronous belt 344 is set in two first pulleys 342 of arbitrary neighborhood,
First actuator is connect with one of first pulley 342, and the first actuator can drive a first pulley connected to it
342 rotations to drive remaining first pulley 342 to rotate synchronously by each first synchronous belt 344, and then drive substrate frame
700 move along first direction.
In one embodiment, further, the second transfer device 400 is under vacuum conditions by substrate frame 700 by the
One vacuum chamber row 100 is transferred to the second vacuum chamber row 200.By the setting of above structure, so as to reduce substrate frame
700 exposure duration in an atmosphere, to greatly reduce the number of the moisture and other impurities in the atmosphere of the absorption of substrate frame 700
Amount avoids substrate frame 700 from passing through second in a second direction true so that the vacuum outgas burden of substrate frame 700 itself greatly reduces
Because the excess of moisture and other impurities in the atmosphere of 700 own absorption of substrate frame discharges due to shadow during plenum chamber row 200
Ring the coating quality for being carried on the substrate 20 of 700 two sides of substrate frame.
As shown in Fig. 1 and Fig. 4, further, the second transfer device 400 includes vacuum transfer chamber 420, the second load transfer station
440 and the second transmission component 460 for being matched with substrate frame 700, vacuum transfer chamber 420 and the second buffer vacuum chamber 130
And third buffer vacuum chamber 210 is connected to, the second load transfer station 440 is set in vacuum transfer chamber 420, the second transmission component 460 and the
The connection of two load transfer stations 440, the second load transfer station 440 substrate frame 700 can be driven along third direction by the second transmission component 460 and
Fourth direction is mobile, and the second transmission component 460 is able to drive substrate frame 700 and moves in a second direction, and then to realize substrate frame
The 700 continuous transfers from the first vacuum chamber row 100 to the second vacuum chamber row 200 under vacuum conditions.
As shown in figure 4, further, the second transmission component 460 includes multiple second for matching with substrate frame 700
Belt wheel 462, worm screw 464, multiple worm gears 466 and third actuator, multiple rotations of second belt wheel 462 are set to the second load transfer station 440
It above and is in a second direction sequentially intervally arranged, and the second belt wheel 462 is equipped with and nibbles wheel 468, the rotation of worm screw 464 is set to the second transfer
On platform 440, multiple 466 fixed intervals of worm gear are sheathed on worm screw 464 and engage with multiple 468 one-to-one correspondence of wheel of nibbling, and third is driven
Moving part is connect with worm screw 464, and third actuator can drive worm screw 464 to rotate around the axial direction of itself, to pass through multiple worm gears 466
It drives multiple second belt wheels 462 to rotate synchronously with multiple engaged transmissions for nibbling wheel 468, and then drives substrate frame 700 along second party
To movement.
As shown in figure 5, in one embodiment, the first driving mechanism 500 includes multiple for matching with substrate frame 700
Multiple third belt wheels 520, multiple second synchronous belts 540 and fourth drive member, multiple rotations of third belt wheel 520 are set to the first vacuum
It is sequentially intervally arranged in chamber row 100 and along first direction, each second synchronous belt 540 is set in two thirds of arbitrary neighborhood
On belt wheel 520, fourth drive member is connect with one of third belt wheel 520, and fourth drive member can drive connected to it one
A third belt wheel 520 rotates, to drive remaining third belt wheel 520 to rotate synchronously by each second synchronous belt 540, and then band
Dynamic substrate frame 700 passes through the first vacuum chamber row 100 along first direction.
As shown in figure 5, further, in one embodiment, the second driving mechanism 600 includes multiple is used for and substrate frame
700 multiple 4th belt wheels 620, multiple third synchronous belts 640 and the 5th actuators matched, multiple 4th belt wheel 620 rotations
It is in a second direction intervally arranged in the second vacuum chamber row 200 and sequentially, each third synchronous belt 640 is set in any phase
On two adjacent the 4th belt wheels 620, the 5th actuator is connect with one of them the 4th belt wheel 620, and the 5th actuator can drive
4th belt wheel 620 rotation connected to it, to drive remaining the 4th belt wheel 620 same by each third synchronous belt 640
Step rotation, and then substrate frame 700 is driven to pass through the second vacuum chamber row 200 in a second direction.
As shown in Figure 1 and Figure 6, in one embodiment, above-mentioned vacuum coater 10 further includes 900 He of the first vacuum pump group
Second vacuum pump group 910, the first vacuum pump group 900 are used to extract the air in the first vacuum chamber row 100, the second vacuum pump group
910 for extracting the air in the second vacuum chamber row 200.
Further, in the present embodiment, the first vacuum pump group 900 includes the first black vacuum pump group 920, the second black vacuum
Pump group 930 and the first diffusing vacuum pump group 940, the first diffusing vacuum pump group 940 are connect with the second black vacuum pump group 930, and first
Black vacuum pump group 920 is used to extract the air in import vacuum chamber 112, and the first diffusing vacuum pump group 940 is used for thick true second
Under the cooperation of empty pump group 930 extract import vacuum lock chamber 114, import vacuum transition chamber 116, the first vacuum film coating chamber 120 and
Air in second buffer vacuum chamber 130.
Further, the second vacuum pump group 910 includes third black vacuum pump group 950, the 4th black vacuum pump group 960 and second
Diffusing vacuum pump group 970, the second diffusing vacuum pump group 970 are connect with the 4th black vacuum pump group 960, third black vacuum pump group 950
For extracting the air in exit vacuum chamber 236, the second diffusing vacuum pump group 970 is used for matching in the 4th black vacuum pump group 960
It closes lower extract and exports vacuum lock chamber 234, outlet vacuum transition chamber 232, the second vacuum film coating chamber 220 and third buffer vacuum chamber
Air in 210.
Further, above-mentioned vacuum coater 10 further includes third vacuum pump group 980, and third vacuum pump group 980 is used for
Extract the air in vacuum transfer chamber 420.In the present embodiment, third vacuum pump group 980 includes third diffusing vacuum pump group 982
With the 4th diffusing vacuum pump group 984, third diffusing vacuum pump group 982 is connect with the second black vacuum pump group 930, third diffusing vacuum
Pump group 982 under the cooperation of the second black vacuum pump group 930 for extracting the air in vacuum transfer chamber 420, the 4th diffusing vacuum
Pump group 984 is connect with the 4th black vacuum pump group 960, and the 4th diffusing vacuum pump group 984 is used for matching in the 4th black vacuum pump group 960
Close the lower air extracted in vacuum transfer chamber 420.
As shown in fig. 6, in one embodiment, above-mentioned vacuum coater 10 further includes power control cabinet 990 and power cabinet 992,
Power control cabinet 990 is used to control the parameter regulation of vacuum coater 10, and power cabinet 992 is used to provide electricity to vacuum coater 10
Power.
Each technical characteristic of above embodiments can be combined arbitrarily, for simplicity of description, not to above-described embodiment
In each technical characteristic it is all possible combination be all described, as long as however, the combination of these technical characteristics be not present lance
Shield all should be considered as described in this specification.
Only several embodiments of the present invention are expressed for above embodiments, and the description thereof is more specific and detailed, but can not
Therefore it is construed as limiting the scope of the patent.It should be pointed out that for those of ordinary skill in the art,
Under the premise of not departing from present inventive concept, various modifications and improvements can be made, and these are all within the scope of protection of the present invention.
Therefore, the scope of protection of the patent of the invention shall be subject to the appended claims.
Claims (10)
1. a kind of vacuum coater characterized by comprising the first vacuum chamber row, the second vacuum chamber row, the first transfer
Mechanism, the second transfer device, the first driving mechanism, the second driving mechanism and substrate frame, first transfer device, described first
To form circulation, described first is true for vacuum chamber row, second transfer device and the second vacuum chamber alignment time arrangement
Plenum chamber row and second vacuum chamber row are respectively positioned between first transfer device and second transfer device, by institute
Stating the first transfer device to the direction of second transfer device is first direction, by second transfer device to described first
The direction of transfer device is second direction；The opposite sides of the substrate frame is used to load substrate, first driving mechanism
For driving the substrate frame to arrange along the first direction across first vacuum chamber, so as to be loaded into the substrate frame
The substrate of first side completes vacuum outgas plated film；Second transfer device is used for the substrate frame is true by described first
Plenum chamber row is transferred to the second vacuum chamber row, so that the substrate frame drives via second driving mechanism along described
Second direction is arranged across second vacuum chamber, so that so that the substrate for being loaded into second side of the substrate frame is completed
Vacuum outgas plated film；First transfer device has the substrate frame of the substrate by institute for opposite sides to be reloaded
It states the second vacuum chamber row and is transferred to the first vacuum chamber row；
The first vacuum chamber row includes the first buffer vacuum chamber sequentially arranged along the first direction, the first vacuum coating
Room and the second buffer vacuum chamber, the second vacuum chamber row includes the third buffer vacuum sequentially arranged along the second direction
Room, the second vacuum film coating chamber and the 4th buffer vacuum chamber；
First buffer vacuum chamber include sequentially arrange along the first direction and import vacuum chamber that vacuum degree is gradually increased,
Import vacuum lock chamber and import vacuum transition chamber, the 4th buffer vacuum chamber include sequentially arrange along the second direction and
Outlet vacuum transition chamber, exit vacuum lock room and the exit vacuum chamber that vacuum degree is gradually reduced；
The import vacuum chamber side by side and is aligned setting, the import vacuum lock chamber and the outlet with the exit vacuum chamber
Vacuum lock chamber is side by side and alignment setting, the import vacuum transition chamber side by side and are aligned and set with the outlet vacuum transition chamber
Set, first vacuum film coating chamber side by side and is aligned setting with second vacuum film coating chamber, second buffer vacuum chamber with
The third buffer vacuum chamber is side by side and alignment is arranged.
2. vacuum coater according to claim 1, which is characterized in that further include the first cabinet, the second cabinet, third
Cabinet, the 4th cabinet, the 5th cabinet, first partition, second partition, third partition, the 4th partition and the 5th partition, described first
Cabinet, second cabinet, the third cabinet, the 4th cabinet and the 5th cabinet are sequentially arranged along the first direction；
First cabinet is divided into the import vacuum chamber and the exit vacuum chamber by the first partition；The second partition will
Second cabinet is divided into the import vacuum lock chamber and the exit vacuum lock room；The third partition is by described
Three cabinets are divided into the import vacuum transition chamber and the outlet vacuum transition chamber；4th partition is by the 4th cabinet
It is divided into first vacuum film coating chamber and second vacuum film coating chamber；5th cabinet is divided by the 5th partition
Second buffer vacuum chamber and the third buffer vacuum chamber.
3. vacuum coater according to claim 1, which is characterized in that be equipped with first in first vacuum coating room
Coated target, the first filming target is for by the first filming target and being loaded into the substrate frame to along the first direction
The first side the substrate sputtering sedimentation film layer.
4. vacuum coater according to claim 3, which is characterized in that when substrate frame passes through institute along the first direction
When stating the first filming target, the first side of the substrate frame is towards the first filming target, and second side of the substrate frame deviates from
The first filming target.
5. vacuum coater according to claim 1, which is characterized in that be equipped with second in second vacuum coating room
Coated target, second coated target is for by second coated target and being loaded into the substrate frame to along the second direction
Second side the substrate sputtering sedimentation film layer.
6. vacuum coater according to claim 5, which is characterized in that when the substrate frame is passed through along the second direction
When crossing second coated target, the first side back of the substrate frame is from second coated target, and second side of the substrate frame
Towards second coated target.
7. vacuum coater according to claim 1, which is characterized in that first transfer device includes the first transfer
Platform and the first transmission component for matching with the substrate frame, first transmission component and first load transfer station connect
It connects, first load transfer station can drive the substrate frame to move along third direction and fourth direction by first transmission component
Dynamic, first transmission component is able to drive the substrate frame and moves along the first direction, and the third direction is by described
The direction that second vacuum chamber is arranged to first vacuum chamber, the fourth direction are by second vacuum chamber to described
The direction of first vacuum chamber row.
8. vacuum coater according to claim 1, which is characterized in that second transfer device is used in vacuum item
The substrate frame second vacuum chamber is transferred to by first vacuum chamber row under part to arrange.
9. vacuum coater according to claim 8, which is characterized in that second transfer device includes vacuum transfer
Room, the second load transfer station and the second transmission component for matching with the substrate frame, second load transfer station are set to described true
Idle running moves indoor, and second transmission component is connect with second load transfer station, and second load transfer station can pass through described the
Two transmission components drive the substrate frame to move along third direction and fourth direction, and second transmission component is able to drive described
Substrate frame is moved along the second direction, and the third direction is to be arranged by second vacuum chamber to first vacuum chamber
Direction, the fourth direction is the direction arranged by second vacuum chamber to first vacuum chamber.
10. vacuum coater according to claim 1, which is characterized in that further include that the first vacuum pump group and second are true
Empty pump group, first vacuum pump group are used to extract the air in the first vacuum chamber row, and second vacuum pump group is used
Air in extraction the second vacuum chamber row.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811595488.1A CN109468611B (en) | 2018-12-25 | 2018-12-25 | Vacuum coater |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811595488.1A CN109468611B (en) | 2018-12-25 | 2018-12-25 | Vacuum coater |
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| CN109468611B true CN109468611B (en) | 2019-10-25 |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| BE1027828B1 (en) * | 2019-12-05 | 2021-07-06 | Soleras Advanced Coatings Bv | COMPACT SUBATHOSPHERIC PROCESSING CHAMBER |
| CN112853305A (en) * | 2020-12-31 | 2021-05-28 | 深圳市嘉德真空光电有限公司 | Multifunctional vacuum nano film coating ring type production line |
| CN114427082B (en) * | 2021-12-28 | 2023-07-25 | 凯盛信息显示材料(洛阳)有限公司 | Continuous type coating equipment substrate frame |
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| CN201206164Y (en) * | 2008-05-08 | 2009-03-11 | 北儒精密股份有限公司 | Foldable vacuum apparatus |
| CN101463471B (en) * | 2009-01-12 | 2011-05-04 | 浙江嘉远格隆能源股份有限公司 | Continuous thin film vacuum deposition method and apparatus |
| CN201648512U (en) * | 2010-03-24 | 2010-11-24 | 深圳森丰真空镀膜有限公司 | Continuous vacuum coating device |
| CN103290364B (en) * | 2013-05-23 | 2015-11-18 | 深圳市生波尔机电设备有限公司 | Continuous vacuum evaporation coating device |
| CN205893384U (en) * | 2016-07-29 | 2017-01-18 | 爱发科豪威光电薄膜科技(深圳)有限公司 | Continuous type vacuum coating equipment |
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