CN103249750B - 透明层形成聚合物 - Google Patents

透明层形成聚合物 Download PDF

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Publication number
CN103249750B
CN103249750B CN201180055847.4A CN201180055847A CN103249750B CN 103249750 B CN103249750 B CN 103249750B CN 201180055847 A CN201180055847 A CN 201180055847A CN 103249750 B CN103249750 B CN 103249750B
Authority
CN
China
Prior art keywords
layer
methyl
formula
polymkeric substance
side base
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN201180055847.4A
Other languages
English (en)
Chinese (zh)
Other versions
CN103249750A (zh
Inventor
大西治
L·F·罗兹
田头宣雄
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Bakelite Co Ltd
Original Assignee
Sumitomo Bakelite Co Ltd
Promerus LLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Bakelite Co Ltd, Promerus LLC filed Critical Sumitomo Bakelite Co Ltd
Publication of CN103249750A publication Critical patent/CN103249750A/zh
Application granted granted Critical
Publication of CN103249750B publication Critical patent/CN103249750B/zh
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F232/00—Copolymers of cyclic compounds containing no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic ring system
    • C08F232/08—Copolymers of cyclic compounds containing no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic ring system having condensed rings
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G61/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
    • C08G61/02—Macromolecular compounds containing only carbon atoms in the main chain of the macromolecule, e.g. polyxylylenes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Epoxy Resins (AREA)
  • Polyoxymethylene Polymers And Polymers With Carbon-To-Carbon Bonds (AREA)
  • Laminated Bodies (AREA)
CN201180055847.4A 2010-12-14 2011-12-13 透明层形成聚合物 Expired - Fee Related CN103249750B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US42276310P 2010-12-14 2010-12-14
US61/422,763 2010-12-14
PCT/US2011/064569 WO2012082705A1 (en) 2010-12-14 2011-12-13 Transparent layer forming polymer

Publications (2)

Publication Number Publication Date
CN103249750A CN103249750A (zh) 2013-08-14
CN103249750B true CN103249750B (zh) 2015-12-02

Family

ID=45478486

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201180055847.4A Expired - Fee Related CN103249750B (zh) 2010-12-14 2011-12-13 透明层形成聚合物

Country Status (7)

Country Link
US (1) US8829087B2 (https=)
EP (1) EP2651996B1 (https=)
JP (1) JP5947809B2 (https=)
KR (1) KR101810502B1 (https=)
CN (1) CN103249750B (https=)
TW (1) TWI491626B (https=)
WO (1) WO2012082705A1 (https=)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107430900B (zh) * 2015-03-26 2019-11-01 京瓷株式会社 介电膜及使用其的膜电容器、连结型电容器、以及逆变器、电动车辆
CN111057028B (zh) * 2018-10-17 2021-12-10 北京师范大学 含氟阳离子聚合单体及其合成和应用
GB2579405B (en) 2018-11-30 2022-09-14 Si Group Switzerland Chaa Gmbh Antioxidant compositions
JP7764724B2 (ja) * 2021-10-19 2025-11-06 住友ベークライト株式会社 ポリマーおよびワニス

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101044185A (zh) * 2004-07-07 2007-09-26 普罗梅鲁斯有限责任公司 基于多环聚合物的感光性组合物
US7524594B2 (en) * 2004-07-07 2009-04-28 Promerus Llc Photosensitive dielectric resin compositions, films formed therefrom and semiconductor and display devices encompassing such films

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6800875B1 (en) 1995-11-17 2004-10-05 Semiconductor Energy Laboratory Co., Ltd. Active matrix electro-luminescent display device with an organic leveling layer
AU2001280856A1 (en) 2000-07-28 2002-02-13 Goodrich Corporation Polymeric compositions for forming optical waveguides; optical waveguides formed therefrom; and methods for making same
US7022790B2 (en) * 2002-07-03 2006-04-04 Sumitomo Bakelite Company, Ltd. Photosensitive compositions based on polycyclic polymers
KR101230512B1 (ko) 2003-11-21 2013-02-18 스미토모 베이클리트 컴퍼니 리미티드 광-유도 열 현상형 막 및 광도파로 형성 방법
WO2008143003A1 (ja) * 2007-05-24 2008-11-27 Sumitomo Bakelite Co., Ltd. 透明複合シート
JP5187492B2 (ja) * 2007-11-22 2013-04-24 Ｊｓｒ株式会社 硬化性樹脂組成物、保護膜および保護膜の形成方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101044185A (zh) * 2004-07-07 2007-09-26 普罗梅鲁斯有限责任公司 基于多环聚合物的感光性组合物
US7524594B2 (en) * 2004-07-07 2009-04-28 Promerus Llc Photosensitive dielectric resin compositions, films formed therefrom and semiconductor and display devices encompassing such films

Also Published As

Publication number Publication date
JP5947809B2 (ja) 2016-07-06
CN103249750A (zh) 2013-08-14
EP2651996B1 (en) 2018-06-06
US8829087B2 (en) 2014-09-09
KR20130125376A (ko) 2013-11-18
EP2651996A1 (en) 2013-10-23
TWI491626B (zh) 2015-07-11
WO2012082705A1 (en) 2012-06-21
TW201231485A (en) 2012-08-01
KR101810502B1 (ko) 2017-12-20
JP2014510798A (ja) 2014-05-01
US20120149815A1 (en) 2012-06-14

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Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant
C41 Transfer of patent application or patent right or utility model
TR01 Transfer of patent right

Effective date of registration: 20160218

Address after: Tokyo, Japan

Patentee after: Sumitomo Bakelite Co., Ltd.

Address before: American Ohio

Patentee before: Promerus LLC

Patentee before: Sumitomo Bakelite Co., Ltd.

CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20151202

Termination date: 20201213

CF01 Termination of patent right due to non-payment of annual fee