CN103245423B - Light path polarized point diffraction movable phase interfere Wavefront sensor altogether - Google Patents
Light path polarized point diffraction movable phase interfere Wavefront sensor altogether Download PDFInfo
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Abstract
The present invention relates to a kind of light path polarized point diffraction movable phase interfere Wavefront sensor altogether.Comprise polaroid, the first and second birefringent lens, movable phase interfere system, ccd sensor, computing machine; Also be included in the first and second confocal plane places of birefringent lens and add a polarization PDI mask plate containing pin hole.Linearly polarized light beam to be measured is divided into two bundles by the first birefringent lens, and E light converges at pin hole generation pinhole difiration on polarization PDI mask plate as with reference to light; O light almost undamped by polarization PDI mask plate as test light; Reference light and test light form four frame times or spatial Phase-shifting Method interferogram by movable phase interfere system, regulate fringe contrast by rotatory polarization sheet, and then use Phase-shifting algorithm to rebuild Wave-front phase to be measured.The present invention adopts common light channel structure, without the need to special reference light and system stability is strong, fringe contrast is adjustable, be applicable to the dynamic and static high precision test of all kinds of Wave-front phase.
Description
Technical field
The present invention relates to the Primary Component in the fields such as a kind of adaptive optics, Wavefront detecting, optical element detection, refer in particular to a kind of light path polarized point diffraction movable phase interfere Wavefront sensor altogether.
Background technology
Wavefront sensor is the important Primary Component in adaptive system, is used for detecting the Wave-front phase of incident beam.Wavefront sensor can be divided into three major types according to the relation between measuring-signal and corrugated: the first kind restores Wave-front phase by measuring wavefront slope, such as Hartmann wave front sensor, lateral shearing interference Wavefront sensor (Appl.Opt.2001,41 (19): 3781-3789; Light laser and the particle beams, 2000,12 (3): 269-272); Equations of The Second Kind restores Wave-front phase, such as curvature wavefront sensor (J.Opt.Soc.Am.A, 1994,11 (5): 1667-1673) by measuring wavefront curvature; 3rd class directly restores Wave-front phase, and Typical Representative is point diffraction-interference wave front sensing device (Jpn.J.Appl.Phys.1975,14:351-356).
In all Wavefront sensors, Hartmann wave front sensor application is the most general.Its ultimate principle is: adopt microlens array to split incident beam, solves wavefront slope by measuring the center-of-mass coordinate of each image patch and the difference of reference wavefront center-of-mass coordinate on lens arra focal plane.Also the pyramid of multiple faceted pebble can be used to carry out beam splitting to incident beam, and then measure Wave-front phase (" Opticalwavefrontsensingsystem ", US Patent No. 4399356).The Wavefront sensor of these two kinds of points of wavefront, sub-aperture number determines space sampling frequency, in order to improve measuring accuracy, thus needs to increase sub-aperture number.But the increase of sub-aperture number proposes higher requirement by the resolution of photoelectric detector.
Distortion light wave to be measured for incidence and reference light wave produce by interference wave front sensor interferes, and utilizes phase shift technology or spatial phase modulation, rebuilds Wave-front phase by phase-shift interference.Wherein reference light wave derives from light wave to be measured and does not need other introducing, and therefore this interference wavefront sensing technique also claims self-reference interference wave front sensor.Compared with Hartmann wave front sensor, the corresponding sub-aperture of each pixel in the interferogram that interference wave front sensor collects, so both can reduce the requirement to ccd sensor high spatial resolution, effectively can also improve the spatial resolution (Proc.SPIE of wavefront measurements, 2004,5553:112-126).
According to the difference of reference light wave acquisition pattern, interference wave front sensor is generally divided into three kinds, that is, lateral shearing interference Wavefront sensor, radial shear interference Wavefront sensor and point diffraction-interference wave front sensing device.Wherein, the multiframe lateral shear interferograms that lateral shearing interference technology needs the shearing displacement in two mutually perpendicular directions different, and high (Appl.Opt.1974,13 (3): 623-629) are required to the validity of wavefront control algorithm.Radial shear interference technology by carrying out expansion to incident light wave and reduce on bore, and produce radial shear interference further, although principle does not exist the problem that lateral shearing interference runs into, but this technology needs complicated wavefront reconstruction algorithm (such as Ze Nike fitting process or process of iteration) to reconstruct Wave-front phase to be measured (Opt.Lett.2011,36 (18): 3693-3695) by shearing phase difference equally.This is for the Wave-front phase of some high spatial frequencies, laterally all has larger limitation (Appl.Opt.1964,3 (7): 853-857) with the reconstruction precision of radial shear interference technology.Point diffraction-interference wave front sensing device utilizes pin hole diffraction to form the reference light wave being similar to ideal plane ripple or spherical wave, restraint with another test light wave containing distorted wavefront information to be measured to produce and interfere, just Wave-front phase to be measured can be directly rebuild by analyzing interference fringe, and without the need to the wavefront reconstruction step in shear interference technology.Meanwhile, the realize Wavefront detecting of point diffraction-interference wave front sensing device in the occasions such as light intensity flicker, this irregular entrance pupil shape of central obscuration has sizable advantage (Opt.Express, 2007,15 (21): 13745-13756).
In most cases, point diffraction-interference wave front sensing device adopts Mach-Zehnder type or Tymann-Green type interference structure (Opt.Commun.2010,283 (14): 2782-2786; CHINESEOPTICSLETTERS, 2011,9 (12): 120002-120004), so just, can easily use PZT phase shifter to introduce phase shift between two light beams, or introduce spatial carrier by inclined mirror, thus utilize Phase-shifting algorithm or fourier transform method (Appl.Opt.1974,13 (11): 2693-2703; J.Opt.Soc.Am.1982,72 (1): 156-160) solve.The disadvantage of this optical texture is two bundle coherent light beam Bu Gong roads, thus inevitably there is air turbulence and surrounding environment to the impact of measurement result.Secondly, if use fourier transform method to solve Wave-front phase, then due to the impact of boundary effect, wavefront measurement precision is lower; Meanwhile, because comparatively high carrier frequency introduced by needs, the dynamic range of wavefront measurement is also lower.
In order to make point-diffraction interference technology have larger stability, unique solution adopts path optics structure altogether, but the major defect of light channel structure is phase measurement difficulty altogether.Because reference light wave almost keeps identical geometric-optical axis with test light wave, in the interferogram of generation, usually comprise few interference fringe, fourier transform method therefore can not be adopted to extract distorted wavefront information.Although phase shift technology is the optimal selection scheme of interfering wavefront reconstruction, be difficult to introduce phase shift between two-beam ripple.Nonetheless, some optical textures phase shift technology being introduced point diffraction interferometer system are also suggested.Such as, document (Opt.Lett.1984,9 (2): 59-61) by increasing pin hole in grating, thus realizes phase shift in point-diffraction interferometer.Document (Appl.Opt.1996,35 (10): 1633-1642; Opt.Lett.1994,19 (12): 916-918) replace pin hole to produce reference light wave by a microsphere being placed in liquid crystal layer, and utilize the liquid crystal of electrical addressing to carry out phase shift to test light wave.From above-mentioned, light path point-diffraction interference technology needs to make complicated PDI (Point-diffractioninterferometer) mask plate altogether at present, realize difficulty large, certain structures also needs to introduce accurate light-dividing device (Opt.Lett.1996,21 (19): 1526-1528).
Summary of the invention
Technology of the present invention is dealt with problems and is: in order to solve test light wave existing for existing point diffraction-interference wave front sensing technology and reference light wave Bu Gong road, PDI mask plate difficulty of processing is high, phase shift difficulty, the weak points such as fringe contrast is non-adjustable, the invention provides a kind of light path polarized point diffraction movable phase interfere Wavefront sensor altogether, birefringent lens and polarization PDI mask plate is utilized to produce light path orhtogonal linear polarizaiton reference light and test light altogether, Phase-Shifting Interferometry is utilized to rebuild Wave-front phase to be measured, thus reach environment resistant vibration and atmospheric interference ability strong, intetference-fit strengthening is high, self-reference is interfered, the object that measuring accuracy is high.
Technical solution of the present invention is: light path polarized point diffraction movable phase interfere Wavefront sensor altogether, comprises polaroid, the first birefringent lens and the second birefringent lens, movable phase interfere system, ccd sensor, computing machine; Also be included in the first and second confocal plane places of birefringent lens and add a polarization PDI mask plate containing pin hole, its direction of vibration is perpendicular to the direction of vibration through the first birefringent lens institute convergent beam.The first and second described birefringent lens are symmetrical birefringence triplets, the biconvex lens being positioned at middle kalzit biconcave lens and two glass by one forms, the optical axis of kalzit is positioned at lens plane, and two lens focuss overlap and quick shaft direction is parallel; Described first birefringent lens, polarization PDI mask plate, the second birefringent lens and ccd sensor composition 4f system; Described movable phase interfere system can make two bundle orhtogonal linear polarizaiton light generation time movable phase interferes or spatial Phase-shifting Method interfere, and specifically has three kinds of forms, is respectively polarization time movable phase interfere system, is made up of quarter-wave plate and polaroid; Polarized spatial movable phase interfere system, is realized by common beam splitter and polarizing beam splitter mirror light splitting, polarizer phase shift; Grating beam splitting spatial Phase-shifting Method interference system, is realized by two-dimensional grating light splitting and polaroid phase shift.
Describe according to light path, testing laser light beam forms linearly polarized light after polaroid, then the mutually orthogonal linearly polarized light in two bundle polarization directions is divided into by the first birefringent lens, wherein O light (ordinary light) does not change the direction of propagation, be still parallel beam, and E light (non-ordinary light) is converged.The E light assembled produces pinhole difiration and forms approximate ideal spherical wave after the pin hole on polarization PDI mask plate, then forms approximate ideal plane wave after the second birefringent lens, thus as reference light; And O light is almost undamped all by polarization PDI mask plate and the second birefringent lens, be still parallel beam, and contain whole wavefront information to be measured and as test light; The test light of orhtogonal linear polarizaiton enters movable phase interfere system with reference light along identical light path, produces four step movable phase interferes; Obtained the interferogram of most high-contrast by the angle of rotatory polarization sheet, received by ccd sensor and input computing machine, then adopt Phase-shifting algorithm to rebuild Wave-front phase to be measured distribution.
In technique scheme, the pinhole aperture size on described polarization PDI mask plate has two values to select: when this invention is applied to Wave-front measurement, and pinhole aperture size is 0.5 times of Airy disk diameter; When this invention is applied to closed loop adaptive optical system, pinhole aperture is not more than 1.5 times of Airy disk diameters, thus can improve the efficiency of light energy utilization better.
The present invention compared with prior art has the following advantages:
1) compared with the Hartmann wave front sensor commonly used in Wavefront detecting, the present invention adopts interferometric method to rebuild Wave-front phase, and in interferogram, each pixel can regard a sub-aperture as, improves wavefront sensing accuracy and spatial resolution.
2) the present invention adopts strict common light channel structure design, and compared with Mach-Zehnder type interference wave front sensor, have very strong anti-atmospheric interference and ambient vibration ability, the scope of application is wider.
3) adopt birefringent lens to realize polarization beam splitting, so just can the highest fringe contrast be obtained by rotatory polarization sheet, overcome the shortcoming of the non-adjustable or inconvenient adjustment of fringe contrast in conventional point diffraction interference technology well.
4) the polarization PDI mask plate made by polaroid with holes is adopted to realize pin hole diffraction, and additional birefringent lens realizes Common-path method, compared with tradition altogether light path point diffraction Phase-Shifting Interferometry, there is PDI mask plate handling ease, advantage that system optical element used cost is low.
5) adopt phase shift technology directly to rebuild Wave-front phase to be measured, compared with fourier transform method, there is the advantage that measuring accuracy is high, low to ccd sensor spatial resolution requirements, measurement dynamic range is large; Compared with radial shear Phase-Shifting Interferometry, do not need wavefront reconstruction Mathematical Calculations, there is the simple advantage of wavefront reconstruction algorithm.
Accompanying drawing explanation
Fig. 1 is transmission-type light path polarized point diffraction movable phase interfere Wavefront sensor structural representation altogether;
Fig. 2 is reflective light path polarized point diffraction movable phase interfere Wavefront sensor structural representation altogether;
Fig. 3 polarization time movable phase interfere system;
Fig. 4 polarized spatial movable phase interfere system;
Fig. 5 grating beam splitting spatial Phase-shifting Method interference system;
In figure, 1,12. polaroids, 2,13. common beam splitters, 3. the first birefringent lens, 7. the second birefringent lens, 4. polarization PDI mask plate, 5. pin hole, 6,16,17,22,23,24. catoptrons, 8. movable phase interfere system, 9.CCD sensor, 10. computing machine, 11,14,15,18. quarter-wave plates, 19. polarizing beam splitter mirrors, 20,21,25,27,29. positive fourier lenses, 26. two-dimensional gratings, 28. diaphragms, 30. polaroid arrays.
Embodiment
The present invention is light path polarized point diffraction movable phase interfere Wavefront sensor altogether, as shown in Figure 1, comprises polaroid 1, first birefringent lens 3 and the second birefringent lens 7, movable phase interfere system 8, ccd sensor 9, computing machine 10; Also be included in the first and second confocal plane places of birefringent lens and add a polarization PDI mask plate 4 containing pin hole 5, its direction of vibration is perpendicular to the direction of vibration through the first birefringent lens 3 post-concentration light beam.The first described birefringent lens 3 and the second birefringent lens 7 are symmetrical birefringence triplets, the biconvex lens being positioned at middle kalzit biconcave lens and two glass by one forms, the optical axis of kalzit is positioned at lens plane, and two lens focuss overlap and quick shaft direction is parallel; A branch of linear polarization parallel beam can be divided into two bundle orhtogonal linear polarizaiton light by described birefringent lens 3 and 7, wherein a branch of limit remote converged on optical axis, and it is still parallel beam that another bundle does not change the direction of propagation; Described first birefringent lens 3, polarization PDI mask plate 4, second birefringent lens 7 and ccd sensor 9 form 4f system.
Describe according to light path, testing laser light beam forms linearly polarized light through polaroid 1, the orthogonal linearly polarized light in two bundle polarization directions is divided into by the first birefringent lens 3, wherein O light (ordinary light) does not change the direction of propagation, be still parallel beam, and E light (non-ordinary light) will be converged.The E light pin hole 5 on polarization PDI mask plate 4 assembled produces pinhole difiration and forms approximate ideal spherical wave, then forms approximate ideal plane wave after the second birefringent lens 7, thus as reference light; And O light is almost undamped all by polarization PDI mask plate 4 and the second birefringent lens 7, be still parallel beam, and contain whole wavefront information to be measured and as test light; The test light of orhtogonal linear polarizaiton enters movable phase interfere system 8 with reference light along identical light path, produces four step movable phase interferes.
Figure 2 shows that reflective structure, be with the difference of the transmission-type structure shown in Fig. 1: after being close to polarization PDI mask plate 4, place a catoptron 6, two-beam through polarization PDI mask plate 4 is all reflected, owing to all keeping original polarization direction separately, so again through the transmission of polarization PDI mask plate 4, then enter movable phase interfere system 8 through the first birefringent lens 3, beam splitter 2 reflection.This structural design eliminates the second birefringent lens 7 in Fig. 1.
By the amplitude ratio after angular adjustment first birefringent lens 3 beam splitting of rotatory polarization sheet 1 between two-beam, to obtain the phase-shift interference of most high-contrast, received by ccd sensor 9 and input computing machine 10 and process.
Movable phase interfere system 8 specifically has three kinds of forms, the first form is polarization time movable phase interfere system, as shown in Figure 3, be made up of quarter-wave plate 11 and polaroid 12, wherein quarter-wave plate 11 quick shaft direction with reference to or angle at 45 °, test light wave polarization direction.The test light wave of orhtogonal linear polarizaiton and reference light wave become left-handed and right-circularly polarized light after quarter-wave plate 11, then generation time movable phase interfere after a polaroid 12 rotated.The second form is polarized spatial movable phase interfere system, as shown in Figure 4, mainly utilizes quarter-wave plate 14,15 and 18, and common beam splitter 13 and polarizing beam splitter mirror 19 realize four step spatial Phase-shifting Methods, the synchronous phase-shift interference producing four frame pi/2 phase shifts; Four frame phase-shift interferences are incided the different spatial of ccd sensor 9 by further use catoptron and positive fourier lense simultaneously.The third form is two-dimensional grating light splitting spatial Phase-shifting Method interference system, as shown in Figure 5, utilizes orthogonal two-dimensional grating 26 to produce symmetrical light splitting, obtains (± 1, ± 1) level four and restraint diffraction light after diaphragm 28; They differ the polaroid array 30 of 45 ° successively respectively by a polarization direction, obtain the phase-shift interference of four frame pi/2 phase shifts.Second and the third form be spatial Phase-shifting Method structure, synchronously can produce four frame phase-shift interferences, therefore can be applied to real-time wavefront measurement.
Suppose that incident beam bore is D, lambda1-wavelength is λ, and the focal length of the first birefringent lens 3 is f, then orthoscope optical system Airy disk diameter is d
a=2.44 λ f/D.If when Wavefront sensor of the present invention is applied to Wave-front measurement, on polarization PDI mask plate 4, the pore size of pin hole 5 is 0.5d
a; If when being applied to closed loop adaptive optical system, then the aperture of pin hole 5 is not more than 1.5d
a.
Suppose that light beam Complex Amplitude to be measured is
movable phase interfere system 8 introduces four different phase-shift phase δ
n, δ
nequal 0 respectively, pi/2, π and 3 pi/2s.Then four frame times that receive of ccd sensor 9 of the present invention or spatial Phase-shifting Method interferogram are collectively expressed as:
I
n(x，y)＝a(x，y)+b(x，y)cos[Φ(x，y)-δ
n](1)
Wherein, I
n(x, y) represents phase-shift interference intensity, and a (x, y) and b (x, y) represents interferogram background and modulate intensity respectively.Therefore, the winding PHASE DISTRIBUTION of Wave-front phase to be measured is:
The result of calculation of formula (2)
be positioned at [-π, π] scope, utilize the to be measured Wave-front phase distribution of phase unwrapping after algorithm can obtain unwrapping further
According to optical interferometry principle, wavefront measurement precision and intetference-fit strengthening closely related, and described intetference-fit strengthening K and described reference light light intensity I
rwith test light light intensity I
tratio τ=I
r/ I
tbetween relation be expressed as:
For a certain Wave-front phase to be measured
it is η that aperture after pin hole 5 produces pinhole difiration on polarization PDI mask plate 4 leads to light rate, and sets the anglec of rotation of polaroid 1 as θ, θ ∈ (0, pi/2), then have
τ＝ηcot
2θ(4)
So described intetference-fit strengthening K expression formula (3) is written as further:
In order to obtain maximum fringe contrast, i.e. K=1, can know according to above formula:
All the other optical elements, such as polaroid, quarter-wave plate, common beam splitter, polarizing beam splitter mirror, catoptron and positive fourier lense are conventional optical element, without the need to particular design.
Claims (6)
1. be total to light path polarized point diffraction movable phase interfere Wavefront sensor, comprise polaroid, the first birefringent lens, the second birefringent lens, movable phase interfere system, ccd sensor, computing machine; Characterized by further comprising and add a polarization PDI mask plate containing pin hole at the first and second confocal plane places of birefringent lens; Described first birefringent lens, polarization PDI mask plate, the second birefringent lens and ccd sensor form 4f system; Describe according to light path, testing laser light beam is divided into two bundles by the first birefringent lens after polaroid, wherein E light pin hole generation pinhole difiration on polarization PDI mask plate, then after the second birefringent lens, forms approximate ideal plane wave as reference light; O light is almost undamped by polarization PDI mask plate and the second birefringent lens, is still that parallel beam is as test light; Reference light and test light enter movable phase interfere system and produce four step movable phase interferes.
2. Wavefront sensor according to claim 1, it is characterized in that, first, second birefringent lens described is symmetrical birefringence triplet, and the biconvex lens being positioned at middle kalzit biconcave lens and two glass by forms, and the optical axis of kalzit is positioned at lens plane; Linear polarization directional light can be divided into two bundle orhtogonal linear polarizaiton light by first, second birefringent lens described, and wherein E light converges at the limit remote on optical axis, and O light is still parallel beam; And the focus of described first and second birefringent lens overlaps and quick shaft direction is parallel.
3. Wavefront sensor according to claim 1, it is characterized in that, the polaroid of pin hole is contained at described polarization PDI mask plate Shi Yige center, and described pin hole is positioned at the public focus of described first and second birefringent lens.
4. Wavefront sensor according to claim 1, it is characterized in that, the direction of vibration of described polarization PDI mask plate is perpendicular to the direction of vibration through described first birefringent lens post-concentration E light.
5. Wavefront sensor according to claim 1, it is characterized in that, the pore size of pin hole on described polarization PDI mask plate: when being applied to Wave-front measurement, pinhole aperture size is 0.5 times of Airy disk diameter; When being applied to closed loop adaptive optical system, pinhole aperture is not more than 1.5 times of Airy disk diameters.
6. Wavefront sensor according to claim 1, is characterized in that, obtains the highest intetference-fit strengthening by the angle rotating described polaroid.
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| CN105466668B (en) * | 2015-12-24 | 2018-01-12 | 中国科学院上海光学精密机械研究所 | The detection method of point-diffraction interference wave aberration measuring instrument and optical system wavefront aberration |
| CN106248217B (en) * | 2016-08-22 | 2019-10-01 | 中国科学院力学研究所 | A kind of Radiation From Shock Wave quantitative measurment original position scaling system and method |
| CN107063477B (en) * | 2017-03-16 | 2019-04-19 | 中国科学院上海光学精密机械研究所 | Grating lateral shearing interference large-numerical aperture wave-front reconstruction method |
| CN107830937B (en) * | 2017-12-07 | 2019-07-09 | 中科院南京天文仪器有限公司 | Double grating polarized point diffraction interferometer device and wavefront test method |
| US20200004036A1 (en) * | 2018-06-28 | 2020-01-02 | Viavi Solutions Inc. | Diffractive optical device providing structured light |
| CN114323580A (en) * | 2021-12-21 | 2022-04-12 | 西安工业大学 | Multidirectional synchronous phase shift transverse shearing interference device and measurement method |
| CN114719741B (en) * | 2022-03-19 | 2024-01-30 | 西北工业大学 | Common-path polarization point diffraction synchronous phase-shifting interference system and method |
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| CN102865810A (en) * | 2012-09-18 | 2013-01-09 | 哈尔滨工程大学 | Orthogonal double-grating based detecting device for synchronous phase shift common-light path interference and detecting method therefor |
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| US7057737B2 (en) * | 2003-08-29 | 2006-06-06 | 4D Technology Corporation | Common optical-path testing of high-numerical-aperture wavefronts |
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| CN102095504A (en) * | 2010-12-07 | 2011-06-15 | 四川大学 | Ring common-path point diffraction interferometer based on spatial phase modulation |
| CN102865810A (en) * | 2012-09-18 | 2013-01-09 | 哈尔滨工程大学 | Orthogonal double-grating based detecting device for synchronous phase shift common-light path interference and detecting method therefor |
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