CN103245423A - Common-optical path polarization point diffraction phase-shift interference wavefront sensor - Google Patents
Common-optical path polarization point diffraction phase-shift interference wavefront sensor Download PDFInfo
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Abstract
The invention relates to a common-optical path polarization point diffraction phase-shift interference wavefront sensor, which comprises a polaroid, a first double refraction lens, a second double refraction lens, a phase-shift interference system, a CCD (Charge Coupled Device) sensor and a computer, as well as a polarization PDI (Point-diffraction Interferometer) mask plate provided with a needle hole and additionally arranged at a confocal plane of the first and second double refraction lenses, wherein a linearly polarized light beam to be detected is divided into two beams by the first double refraction lens, E light is converged at the needle hole of the polarization PDI mask plate to be subjected to small hole diffraction so as to serve as reference light, and O light passes through the polarization PDI mask plate nearly without decrement to serve as testing light; the reference light and the testing light pass through the phase shift interference system to form a four-frame time or space phase shift interference figure; streak contrast gradient is adjusted through rotating the polaroid; and then a phase shift algorithm is adopted to re-establish a phase position of a wavefront to be detected. According to the invention, the wavefront sensor adopts a common-optical path, dispenses with special reference light, is strong in system stability and adjustable in streak contrast gradient, and is suitable for high-precision detection for dynamic and static stage of various wavefront phase positions.
Description
Technical field
The present invention relates to the Primary Component in the fields such as a kind of adaptive optics, Wavefront detecting, optical element detection, refer in particular to a kind of light path polarized point diffraction movable phase interfere Wavefront sensor altogether.
Background technology
Wavefront sensor is the important Primary Component in the adaptive system, is used for surveying the Wave-front phase of incident beam.Wavefront sensor can be divided into three major types according to the relation between measuring-signal and the corrugated: the first kind is to restore Wave-front phase by measuring wavefront slope, for example Hartmann wave front sensor, lateral shearing interference Wavefront sensor (Appl.Opt.2001,41 (19): 3781-3789; Light laser and the particle beams, 2000,12 (3): 269-272); Second class is to restore Wave-front phase, for example curvature Wavefront sensor (J.Opt.Soc.Am.A, 1994,11 (5): 1667-1673) by measuring wavefront curvature; The 3rd class is directly to restore Wave-front phase, typical case's representative be the point-diffraction interference Wavefront sensor (Jpn.J.Appl.Phys.1975,14:351-356).
In all Wavefront sensors, Hartmann wave front sensor is used the most general.Its ultimate principle is: adopt microlens array that incident beam is cut apart, find the solution wavefront slope by the center-of-mass coordinate of each image patch and the difference of reference wavefront center-of-mass coordinate on the measurement lens arra focal plane.Also can use the pyramid of a plurality of faceted pebbles that incident beam is carried out beam splitting, and then measure Wave-front phase (" Optical wavefront sensing system ", US Patent No. 4399356).The Wavefront sensor of these two kinds of branch wavefront, sub-aperture number determine the spatial sampling rate, in order to improve measuring accuracy, thereby need to increase sub-aperture number.Yet the increase of sub-aperture number purpose will propose higher requirement to the resolution of photoelectric detector.
The interference wave front sensor produces interference with incident distortion light wave to be measured and reference light wave, utilizes phase shift technology or spatial phase modulation, rebuilds Wave-front phase by phase-shift interference.Wherein reference light wave derives from light wave to be measured and does not need other introducing, and therefore this interference wavefront sensing technology also claims self-reference interference wave front sensor.Compare with Hartmann wave front sensor, the corresponding sub-aperture of each pixel in the interferogram that the interference wave front sensor collects, so both can reduce the requirement to the ccd sensor high spatial resolution, can also effectively improve the spatial resolution (Proc.SPIE of wavefront measurements, 2004,5553:112-126).
According to the difference of reference light wave acquisition mode, the interference wave front sensor generally is divided into three kinds, that is, and and lateral shearing interference Wavefront sensor, radial shear interference Wavefront sensor and point-diffraction interference Wavefront sensor.Wherein, the different multiframe lateral shear interferograms of shearing displacement on two mutually perpendicular directions of lateral shearing interference Technology Need, and the validity of wave front restoration algorithm required high (Appl.Opt.1974,13 (3): 623-629).The radial shear interference technology is by enlarging and dwindle at bore incident light wave, and further produce radial shear interference, although the problem that does not exist lateral shearing interference to run on the principle, but this technology needs complicated wavefront reconstruction algorithm (for example Ze Nike fitting process or process of iteration) to reconstruct Wave-front phase to be measured (Opt.Lett.2011,36 (18): 3693-3695) by the shearing phase difference equally.This is for the Wave-front phase of some high spatial frequencies, and reconstruction precision horizontal and the radial shear interference technology all has big limitation (Appl.Opt.1964,3 (7): 853-857).The point-diffraction interference Wavefront sensor utilizes the pin hole diffraction to form the reference light wave that is similar to ideal plane ripple or spherical wave, the test light wave that has comprised distorted wavefront information to be measured with another bundle produces interference, just can directly rebuild Wave-front phase to be measured by analyzing interference fringe, and need not the wavefront reconstruction step in the shear interference technology.Simultaneously, the realization Wavefront detecting of point-diffraction interference Wavefront sensor in occasions such as light intensity flicker, this irregular entrance pupil shape of central obscuration has sizable advantage (Opt.Express, 2007,15 (21): 13745-13756).
In most cases, the point-diffraction interference Wavefront sensor adopts Mach-Zehnder type or Tymann-Green type interference structure (Opt.Commun.2010,283 (14): 2782-2786; CHINESE OPTICS LETTERS, 2011,9 (12): 120002-120004), so just, can easily use the PZT phase shifter between two light beams, to introduce phase shift, or by inclined mirror introducing spatial carrier, thereby utilize phase shift algorithm or fourier transform method (Appl.Opt.1974,13 (11): 2693-2703; J.Opt.Soc.Am.1982,72 (1): 156-160) find the solution.The disadvantage of this optical texture is roads altogether of two bundle coherent light beams, thereby exists air turbulence and surrounding environment to the influence of measurement result inevitably.Secondly, if use fourier transform method to find the solution Wave-front phase, then owing to the influence of boundary effect, the wavefront measurement precision is lower; Simultaneously, owing to need to introduce than high carrier frequency, the dynamic range of wavefront measurement is also lower.
In order to make the point-diffraction interference technology will have bigger stability, unique solution is to adopt light path optical texture altogether, yet the major defect of light channel structure is the phase measurement difficulty altogether.Owing to reference light wave and test light wave almost keep identical geometric-optical axis, comprise few interference fringe in the interferogram of generation usually, therefore can not adopt fourier transform method to extract distorted wavefront information.Though phase shift technology is the optimal selection scheme of interfering wavefront reconstruction, is difficult between the two-beam ripple and introduces phase shift.Nonetheless, some optical textures that phase shift technology is introduced point diffraction interferometer system also are suggested.For example, document (Opt.Lett.1984,9 (2): 59-61) by in grating, increasing pin hole, thereby in point-diffraction interferometer, realize phase shift.Document (Appl.Opt.1996,35 (10): 1633-1642; Opt.Lett.1994,19 (12): 916-918) by a microsphere being placed liquid crystal layer replace pin hole to produce reference light wave, and utilize the liquid crystal of electrical addressing that the test light wave is carried out phase shift.By as seen above-mentioned, light path point-diffraction interference Technology Need is made complicated PDI (Point-diffraction interferometer) mask plate altogether at present, the realization difficulty is big, and certain structures also needs to introduce accurate light-dividing device (Opt.Lett.1996,21 (19): 1526-1528).
Summary of the invention
Technology of the present invention is dealt with problems and is: be not total to the road in order to solve the existing existing test light wave of point-diffraction interference wavefront sensing technology and reference light wave, PDI mask plate difficulty of processing height, the phase shift difficulty, weak points such as fringe contrast is non-adjustable, the invention provides a kind of light path polarized point diffraction movable phase interfere Wavefront sensor altogether, utilize birefringent lens and polarization PDI mask plate to produce light path orhtogonal linear polarizaiton reference light and test light altogether, utilize the movable phase interfere technology to rebuild Wave-front phase to be measured, thereby reach anti-ambient vibration and the atmospheric interference ability is strong, interference fringe contrast height, self-reference is interfered, the purpose that measuring accuracy is high.
Technical solution of the present invention is: be total to light path polarized point diffraction movable phase interfere Wavefront sensor, comprise polaroid, first birefringent lens and second birefringent lens, movable phase interfere system, ccd sensor, computing machine; Also be included in place, the confocal plane of first and second birefringent lens and add a polarization PDI mask plate that contains pin hole, its direction of vibration is perpendicular to the direction of vibration through first birefringent lens institute convergent beam.The birefringence triplet that described first and second birefringent lens are symmetries, by one in the middle of being positioned at the kalzit biconcave lens and the biconvex lens of two glass form, the optical axis of kalzit is positioned at the lens plane, and the coincidence of two lens focuss and quick shaft direction are parallel; Described first birefringent lens, polarization PDI mask plate, second birefringent lens and ccd sensor are formed the 4f system; Described movable phase interfere system can make two bundle orhtogonal linear polarizaiton light generation time movable phase interfere or space movable phase interferes, and three kinds of forms are specifically arranged, and is respectively polarization time movable phase interfere system, is made up of quarter-wave plate and polaroid; Polarization space movable phase interfere system is realized by common beam splitter and polarizing beam splitter mirror light splitting, polarizer phase shift; Grating beam splitting space movable phase interfere system is realized by two-dimensional grating light splitting and polaroid phase shift.
Describe according to light path, the testing laser light beam forms linearly polarized light through behind the polaroid, is divided into the mutually orthogonal linearly polarized light in two bundle polarization directions by first birefringent lens then, and wherein O light (ordinary light) does not change the direction of propagation, be parallel beam still, and E light (non-ordinary light) is converged.Produce the aperture diffraction behind the pin hole on the E light process polarization PDI mask plate of convergence and form the approximate ideal spherical wave, behind second birefringent lens, form the approximate ideal plane wave again, thereby conduct is with reference to light; And O light is almost undamped all by polarization PDI mask plate and second birefringent lens, is parallel beam still, and has comprised whole wavefront information to be measured and as test light; The test light of orhtogonal linear polarizaiton enters the movable phase interfere system with reference light along identical light path, produces four step movable phase interferes; Angle by the rotatory polarization sheet obtains the interferogram of high-contrast, is received and the input computing machine by ccd sensor, adopts the phase shift algorithm to rebuild Wave-front phase to be measured then and distributes.
In the technique scheme, the pinhole aperture size on the described polarization PDI mask plate has two values to select: when this invention was applied to the wavefront detection, the pinhole aperture size was 0.5 times of Airy disk diameter; When this invention was applied to closed loop adaptive optical system, pinhole aperture was not more than 1.5 times of Airy disk diameters, thereby can improve the efficiency of light energy utilization better.
The present invention compared with prior art has following advantage:
1) with Wavefront detecting in commonly used to Hartmann wave front sensor compare, the present invention adopts interferometric method to rebuild Wave-front phase, each pixel can be regarded a sub-aperture as in the interferogram, has promoted Wavefront detecting precision and spatial resolution.
2) the present invention adopts strict common light channel structure design, compares with Mach-Zehnder type interference wave front sensor, has very strong Chinese People's Anti-Japanese Military and Political College's gas and disturbs and the ambient vibration ability, and the scope of application is wider.
3) adopt birefringent lens to realize polarization beam splitting, so just can obtain the highest fringe contrast by the rotatory polarization sheet, overcome the shortcoming of the non-adjustable or inconvenient adjustment of fringe contrast in the conventional point diffraction interference technology well.
4) adopt the made polarization PDI mask plate of polaroid with holes to realize the pin hole diffraction, and additional birefringent lens is realized light path design altogether, be total to light path point diffraction movable phase interfere technology with tradition and compare, have PDI mask plate handling ease, the low advantage of the used optical element cost of system.
5) adopt phase shift technology directly to rebuild Wave-front phase to be measured, compare with fourier transform method, have the measuring accuracy height, the ccd sensor spatial resolution is required low, the big advantage of measurement dynamic range; Compare with radial shear movable phase interfere technology, do not need wavefront reconstruction mathematical operation process, have the simple advantage of wavefront reconstruction algorithm.
Description of drawings
Fig. 1 is total to light path polarized point diffraction movable phase interfere Wavefront sensor structural representation for transmission-type;
Fig. 2 is reflective light path polarized point diffraction movable phase interfere Wavefront sensor structural representation altogether;
Fig. 3 polarization time movable phase interfere system;
Fig. 4 polarization space movable phase interfere system;
Fig. 5 grating beam splitting space movable phase interfere system;
Among the figure, 1,12. polaroids, 2,13. common beam splitters, 3. first birefringent lens, 7. second birefringent lens, 4. polarization PDI mask plate, 5. pin hole, 6,16,17,22,23,24. catoptrons, 8. movable phase interfere system, 9.CCD sensor, 10. computing machine, 11,14,15,18. quarter-wave plates, 19. polarizing beam splitter mirror, 20,21,25,27,29. positive fourier lenses, 26. two-dimensional gratings, 28. diaphragm, 30. polaroid arrays.
Embodiment
The present invention is light path polarized point diffraction movable phase interfere Wavefront sensor altogether, as shown in Figure 1, comprises polaroid 1, first birefringent lens 3 and second birefringent lens 7, movable phase interfere system 8, ccd sensor 9, computing machine 10; Also be included in place, the confocal plane of first and second birefringent lens and add a polarization PDI mask plate 4 that contains pin hole 5, its direction of vibration is perpendicular to the direction of vibration through first birefringent lens, 3 post-concentration light beams.Described first birefringent lens 3 and second birefringent lens 7 are birefringence triplets of a symmetry, by one in the middle of being positioned at the kalzit biconcave lens and the biconvex lens of two glass form, the optical axis of kalzit is positioned at the lens plane, and the coincidence of two lens focuss and quick shaft direction are parallel; Described birefringent lens 3 and 7 can be divided into a branch of linear polarization parallel beam two bundle orhtogonal linear polarizaiton light, a branch of limit remote that converges on the optical axis wherein, and another bundle does not change the direction of propagation and still is parallel beam; Described first birefringent lens 3, polarization PDI mask plate 4, second birefringent lens 7 and ccd sensor 9 are formed the 4f system.
Describe according to light path, the testing laser light beam forms linearly polarized light through polaroid 1, is divided into the linearly polarized light of two bundle polarization direction quadratures by first birefringent lens 3, and wherein O light (ordinary light) does not change the direction of propagation, be parallel beam still, and E light (non-ordinary light) will be converged.The E light of convergence produces the aperture diffraction through pin hole 5 on the polarization PDI mask plate 4 and forms the approximate ideal spherical waves, form the approximate ideal plane wave again behind second birefringent lens 7, thereby conduct is with reference to light; And O light is almost undamped all by polarization PDI mask plate 4 and second birefringent lens 7, is parallel beam still, and has comprised whole wavefront information to be measured and as test light; The test light of orhtogonal linear polarizaiton enters movable phase interfere system 8 with reference light along identical light path, produces four step movable phase interferes.
Figure 2 shows that reflective structure, be with the difference of transmission-type structure shown in Figure 1: place a catoptron 6 after being close to polarization PDI mask plate 4, to all reflect through the two-beam of polarization PDI mask plate 4, owing to all keep original polarization direction separately, so again through 4 transmissions of polarization PDI mask plate, pass 2 reflections of first birefringent lens 3, beam splitter then and enter movable phase interfere system 8.This structural design has been saved second birefringent lens 7 among Fig. 1.
By the amplitude ratio between the two-beam after angular adjustment first birefringent lens 3 beam splitting of rotatory polarization sheet 1, obtaining the phase-shift interference of high-contrast, received and input computing machine 10 is handled by ccd sensor 9.
Specifically there are three kinds of forms in movable phase interfere system 8, first kind of form is polarization time movable phase interfere system, as shown in Figure 3, formed by quarter-wave plate 11 and polaroid 12, wherein the quick shaft direction of quarter-wave plate 11 and reference or test light wave polarization direction angle at 45.The test light wave of orhtogonal linear polarizaiton and reference light wave become left-handed and right-circularly polarized light through behind the quarter-wave plate 11, then through generation time movable phase interferes behind the polaroid 12 of a rotation.Second kind of form is polarization space movable phase interfere system, as shown in Figure 4, mainly utilizes quarter- wave plate 14,15 and 18, and common beam splitter 13 and polarizing beam splitter mirror 19 realizations four step space phase shifts, produces the phase-shift interference of four frame pi/2 phase shifts synchronously; Further use catoptron and positive fourier lense, four frame phase-shift interferences are incided simultaneously the different spatial of ccd sensor 9.The third form is two-dimensional grating light splitting space movable phase interfere system, as shown in Figure 5, utilizes the two-dimensional grating 26 of quadrature to produce symmetrical light splitting, obtains (± 1, ± 1) level four bundle diffraction lights through diaphragm 28 backs; They differ 45 ° polaroid array 30 respectively successively by a polarization direction, obtain the phase-shift interference of four frame pi/2 phase shifts.Second and the third form be space phase shift structure, can produce four frame phase-shift interferences synchronously, therefore can be applied to real-time wavefront measurement.
Suppose that the incident beam bore is D, lambda1-wavelength is λ, and the focal length of first birefringent lens 3 is f, and then orthoscope optical system Airy disk diameter is d
A=2.44 λ f/D.If when Wavefront sensor of the present invention was applied to the wavefront detection, the pore size of pin hole 5 was 0.5d on the polarization PDI mask plate 4
AIf when being applied to closed loop adaptive optical system, then the aperture of pin hole 5 is not more than 1.5d
A
Suppose that light beam complex amplitude to be measured is expressed as
Movable phase interfere system 8 introduces four different phase-shift phase δ
n, δ
nEqual 0 respectively, pi/2, π and 3 pi/2s.Then four frame times or the space phase-shift interference unification that receive of ccd sensor 9 of the present invention is expressed as:
I
n(x，y)＝a(x，y)+b(x，y)cos[Φ(x，y)-δ
n] (1)
Wherein, I
n(x, y) expression phase-shift interference intensity, a (x, y) and b (x y) represents interferogram background and modulate intensity respectively.Therefore, the winding PHASE DISTRIBUTION of Wave-front phase to be measured is:
The result of calculation of formula (2)
Be positioned at [π, π] scope, further utilize the to be measured Wave-front phase of phase unwrapping after algorithm can obtain separating winding to distribute
According to the optical interferometry principle, wavefront measurement precision and interference fringe contrast are closely related, and described interference fringe contrast K and described reference light light intensity I
rWith test light light intensity I
tRatio τ=I
r/ I
tBetween relation table be shown:
At a certain Wave-front phase to be measured
To produce the logical light rate of aperture behind the aperture diffraction be η for pin hole 5 on the polarization PDI mask plate 4, and the anglec of rotation of establishing polaroid 1 is θ, and θ ∈ (0, pi/2) then has
τ＝ηcot
2θ (4)
So described interference fringe contrast K expression formula (3) further is written as:
In order to obtain maximum fringe contrast, i.e. K=1, can know according to following formula:
All the other optical elements, for example polaroid, quarter-wave plate, common beam splitter, polarizing beam splitter mirror, catoptron and positive fourier lense are optical element commonly used, need not particular design.
Claims (6)
1. be total to light path polarized point diffraction movable phase interfere Wavefront sensor, comprise polaroid, first birefringent lens, second birefringent lens, movable phase interfere system, ccd sensor, computing machine; It is characterized in that also being included in place, the confocal plane of first and second birefringent lens and add a polarization PDI mask plate that contains pin hole; Described first birefringent lens, polarization PDI mask plate, second birefringent lens and ccd sensor are formed the 4f system; Describe according to light path, the testing laser light beam is divided into two bundles through behind the polaroid by first birefringent lens, and wherein little diffraction by aperture takes place E light pin hole on polarization PDI mask plate, forms the approximate ideal plane wave again as reference light behind second birefringent lens; O light is almost undamped by polarization PDI mask plate and second birefringent lens, still is that parallel beam is as test light; Reference light and test light enter the movable phase interfere system and produce four step movable phase interferes.
2. according to the described Wavefront sensor of claim 1, it is characterized in that, described first, second birefringent lens is the birefringence triplet of symmetry, and the kalzit biconcave lens in the middle of being positioned at by and the biconvex lens of two glass are formed, and the optical axis of kalzit is positioned at the lens plane; Described first, second birefringent lens can be divided into the linear polarization directional light two bundle orhtogonal linear polarizaiton light, and wherein E light converges at the limit remote on the optical axis, and O light still is parallel beam; And the focus of described first and second birefringent lens overlaps and quick shaft direction is parallel.
3. according to the described Wavefront sensor of claim 1, it is characterized in that described polarization PDI mask plate is the polaroid that pin hole is contained at a center, described pin hole is positioned at the public focus of described first and second birefringent lens.
4. according to the described Wavefront sensor of claim 1, it is characterized in that the direction of vibration of described polarization PDI mask plate is perpendicular to the direction of vibration through the described first birefringent lens post-concentration E light.
5. according to the described Wavefront sensor of claim 1, it is characterized in that the pore size of pin hole has two values to select on the described polarization PDI mask plate: when this invention was applied to the wavefront detection, the pinhole aperture size was 0.5 times of Airy disk diameter; When this invention was applied to closed loop adaptive optical system, pinhole aperture was not more than 1.5 times of Airy disk diameters.
6. according to the described Wavefront sensor of claim 1, it is characterized in that, obtain the highest interference fringe contrast by the angle of rotating described polaroid.
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Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN105466668A (en) * | 2015-12-24 | 2016-04-06 | 中国科学院上海光学精密机械研究所 | Wave aberration measurement instrument of point diffraction interference and detection method of wave aberration of optical system |
| CN106248217A (en) * | 2016-08-22 | 2016-12-21 | 中国科学院力学研究所 | A kind of Radiation From Shock Wave quantitative measurement scaling system and method in situ |
| CN107063477A (en) * | 2017-03-16 | 2017-08-18 | 中国科学院上海光学精密机械研究所 | Grating lateral shearing interference large-numerical aperture wave-front reconstruction method |
| CN107830937A (en) * | 2017-12-07 | 2018-03-23 | 中科院南京天文仪器有限公司 | Double grating polarized point diffraction interferometer device and wavefront method of testing |
| CN110658573A (en) * | 2018-06-28 | 2020-01-07 | 唯亚威解决方案股份有限公司 | Diffractive optical device providing structured light |
| CN114323580A (en) * | 2021-12-21 | 2022-04-12 | 西安工业大学 | Multidirectional synchronous phase shift transverse shearing interference device and measurement method |
| CN114719741A (en) * | 2022-03-19 | 2022-07-08 | 西北工业大学 | Common-path polarization point diffraction synchronous phase-shifting interference system and method |
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| CN106248217A (en) * | 2016-08-22 | 2016-12-21 | 中国科学院力学研究所 | A kind of Radiation From Shock Wave quantitative measurement scaling system and method in situ |
| CN106248217B (en) * | 2016-08-22 | 2019-10-01 | 中国科学院力学研究所 | A kind of Radiation From Shock Wave quantitative measurment original position scaling system and method |
| CN107063477A (en) * | 2017-03-16 | 2017-08-18 | 中国科学院上海光学精密机械研究所 | Grating lateral shearing interference large-numerical aperture wave-front reconstruction method |
| CN107063477B (en) * | 2017-03-16 | 2019-04-19 | 中国科学院上海光学精密机械研究所 | Grating lateral shearing interference large-numerical aperture wave-front reconstruction method |
| CN107830937A (en) * | 2017-12-07 | 2018-03-23 | 中科院南京天文仪器有限公司 | Double grating polarized point diffraction interferometer device and wavefront method of testing |
| CN107830937B (en) * | 2017-12-07 | 2019-07-09 | 中科院南京天文仪器有限公司 | Double grating polarized point diffraction interferometer device and wavefront test method |
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| CN114323580A (en) * | 2021-12-21 | 2022-04-12 | 西安工业大学 | Multidirectional synchronous phase shift transverse shearing interference device and measurement method |
| CN114719741A (en) * | 2022-03-19 | 2022-07-08 | 西北工业大学 | Common-path polarization point diffraction synchronous phase-shifting interference system and method |
| CN114719741B (en) * | 2022-03-19 | 2024-01-30 | 西北工业大学 | Common-path polarization point diffraction synchronous phase-shifting interference system and method |
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