CN103050422B - 晶圆劈裂检知方法 - Google Patents
晶圆劈裂检知方法 Download PDFInfo
- Publication number
- CN103050422B CN103050422B CN201210196421.7A CN201210196421A CN103050422B CN 103050422 B CN103050422 B CN 103050422B CN 201210196421 A CN201210196421 A CN 201210196421A CN 103050422 B CN103050422 B CN 103050422B
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- CN
- China
- Prior art keywords
- wafer
- splitting
- image
- split
- computer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000001514 detection method Methods 0.000 title claims abstract description 36
- 230000009471 action Effects 0.000 claims abstract description 34
- 238000003776 cleavage reaction Methods 0.000 claims abstract description 22
- 230000007017 scission Effects 0.000 claims abstract description 22
- 238000000034 method Methods 0.000 claims abstract description 13
- 241001270131 Agaricus moelleri Species 0.000 claims description 17
- 238000004458 analytical method Methods 0.000 claims description 14
- 238000011496 digital image analysis Methods 0.000 claims description 6
- 238000003384 imaging method Methods 0.000 claims description 6
- 230000008569 process Effects 0.000 description 5
- 238000010586 diagram Methods 0.000 description 4
- 239000013078 crystal Substances 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 238000010191 image analysis Methods 0.000 description 3
- 238000007689 inspection Methods 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 230000008859 change Effects 0.000 description 2
- 238000005336 cracking Methods 0.000 description 2
- 238000005286 illumination Methods 0.000 description 2
- 230000007246 mechanism Effects 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000005538 encapsulation Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
Landscapes
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Dicing (AREA)
- Processing Of Stones Or Stones Resemblance Materials (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW100136855A TW201316425A (zh) | 2011-10-12 | 2011-10-12 | 晶圓劈裂檢知方法 |
| TW100136855 | 2011-10-12 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN103050422A CN103050422A (zh) | 2013-04-17 |
| CN103050422B true CN103050422B (zh) | 2015-03-04 |
Family
ID=48063021
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201210196421.7A Expired - Fee Related CN103050422B (zh) | 2011-10-12 | 2012-06-14 | 晶圆劈裂检知方法 |
Country Status (2)
| Country | Link |
|---|---|
| CN (1) | CN103050422B (enExample) |
| TW (1) | TW201316425A (enExample) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104332421B (zh) * | 2014-09-01 | 2017-05-03 | 上海华力微电子有限公司 | 一种检测扫描机台的性能方法 |
| CN105047576A (zh) * | 2015-07-09 | 2015-11-11 | 深圳市华腾半导体设备有限公司 | 图像检测芯片未断方法 |
| CN109425315B (zh) * | 2017-08-31 | 2021-01-15 | 长鑫存储技术有限公司 | 半导体结构的测试载具及测试方法 |
| CN112446887B (zh) * | 2019-09-05 | 2022-04-08 | 长鑫存储技术有限公司 | 晶圆切割晶片数计算方法及计算设备 |
| TWI727860B (zh) * | 2020-07-22 | 2021-05-11 | 環球晶圓股份有限公司 | 晶圓橫向撞擊測試裝置及晶圓強度測試方法 |
| CN120300072B (zh) * | 2025-06-11 | 2025-09-05 | 深圳平湖实验室 | 一种晶圆的加工方法、晶圆加工设备及晶粒 |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003168655A (ja) * | 2001-12-03 | 2003-06-13 | Tokyo Seimitsu Co Ltd | ダイシング装置 |
| CN1575908A (zh) * | 2003-07-09 | 2005-02-09 | 株式会社迪斯科 | 激光束处理方法和激光束处理装置 |
| CN101685271A (zh) * | 2008-09-23 | 2010-03-31 | 和舰科技(苏州)有限公司 | 一种晶圆片晶边清洗宽度的检测方法 |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| IL120656A (en) * | 1997-04-13 | 2001-04-30 | Inspectech Ltd | Apparatus for analyzing cuts |
| TW490351B (en) * | 2000-10-03 | 2002-06-11 | Chuan-Huei Tsai | Laser cutting system of controlled fracture and the method of optimizing the laser path |
| GB0115259D0 (en) * | 2001-06-21 | 2001-08-15 | Esm Ltd | Method of monitoring and controlling a photoresist edge bead |
| CN100407215C (zh) * | 2002-09-30 | 2008-07-30 | 东京毅力科创株式会社 | 用于监视和控制半导体生产过程的方法和装置 |
| US20050148203A1 (en) * | 2003-12-29 | 2005-07-07 | Shirley Paul D. | Method, apparatus, system and computer-readable medium for in situ photoresist thickness characterization |
| US7098077B2 (en) * | 2004-01-20 | 2006-08-29 | Taiwan Semiconductor Manufacturing Company, Ltd. | Semiconductor chip singulation method |
| JP4455469B2 (ja) * | 2004-09-14 | 2010-04-21 | エーエスエムエル マスクツールズ ビー.ブイ. | フルチップ製造信頼性チェックおよび補正を行うための方法 |
| US7262115B2 (en) * | 2005-08-26 | 2007-08-28 | Dynatex International | Method and apparatus for breaking semiconductor wafers |
| TWM322058U (en) * | 2007-04-27 | 2007-11-11 | Uni Via Technology Inc | All lighting device for LED wafer cutting process |
| TW200931553A (en) * | 2008-01-11 | 2009-07-16 | Horng Terng Automation Co Ltd | Image-capturing device of the optical detection equipment for cleaving wafer |
| TW200931510A (en) * | 2008-01-11 | 2009-07-16 | Horng Terng Automation Co Ltd | Wafer cleaver with high-precision cutting |
| TW200931552A (en) * | 2008-01-11 | 2009-07-16 | Horng Terng Automation Co Ltd | Optical detection method of cleaving wafer |
| TWM377691U (en) * | 2009-10-09 | 2010-04-01 | Horng Terng Automation Co Ltd | Wafer cleavage detection device |
-
2011
- 2011-10-12 TW TW100136855A patent/TW201316425A/zh not_active IP Right Cessation
-
2012
- 2012-06-14 CN CN201210196421.7A patent/CN103050422B/zh not_active Expired - Fee Related
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003168655A (ja) * | 2001-12-03 | 2003-06-13 | Tokyo Seimitsu Co Ltd | ダイシング装置 |
| CN1575908A (zh) * | 2003-07-09 | 2005-02-09 | 株式会社迪斯科 | 激光束处理方法和激光束处理装置 |
| CN101685271A (zh) * | 2008-09-23 | 2010-03-31 | 和舰科技(苏州)有限公司 | 一种晶圆片晶边清洗宽度的检测方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| TWI447829B (enExample) | 2014-08-01 |
| TW201316425A (zh) | 2013-04-16 |
| CN103050422A (zh) | 2013-04-17 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20150304 Termination date: 20190614 |