CN103042611B - Holder, holder unit and chalker - Google Patents
Holder, holder unit and chalker Download PDFInfo
- Publication number
- CN103042611B CN103042611B CN201210380323.9A CN201210380323A CN103042611B CN 103042611 B CN103042611 B CN 103042611B CN 201210380323 A CN201210380323 A CN 201210380323A CN 103042611 B CN103042611 B CN 103042611B
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- CN
- China
- Prior art keywords
- holder
- stitch marker
- width part
- pin
- support portion
- Prior art date
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B33/00—Severing cooled glass
- C03B33/02—Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor
- C03B33/023—Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor the sheet or ribbon being in a horizontal position
- C03B33/027—Scoring tool holders; Driving mechanisms therefor
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B33/00—Severing cooled glass
- C03B33/02—Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor
- C03B33/023—Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor the sheet or ribbon being in a horizontal position
- C03B33/033—Apparatus for opening score lines in glass sheets
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D1/00—Working stone or stone-like materials, e.g. brick, concrete or glass, not provided for elsewhere; Machines, devices, tools therefor
- B28D1/22—Working stone or stone-like materials, e.g. brick, concrete or glass, not provided for elsewhere; Machines, devices, tools therefor by cutting, e.g. incising
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B33/00—Severing cooled glass
- C03B33/02—Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor
- C03B33/023—Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor the sheet or ribbon being in a horizontal position
- C03B33/037—Controlling or regulating
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B33/00—Severing cooled glass
- C03B33/10—Glass-cutting tools, e.g. scoring tools
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P40/00—Technologies relating to the processing of minerals
- Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
- Y02P40/57—Improving the yield, e-g- reduction of reject rates
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
- Processing Of Stones Or Stones Resemblance Materials (AREA)
- Lighting Device Outwards From Vehicle And Optical Signal (AREA)
Abstract
The invention provides a kind of stitch marker holder and chalker, this stitch marker holder, can prevent because foreign matter enters the malrotation of the stitch marker caused between the inwall of retention groove and stitch marker.In the holder (40a) of retention groove (42) with maintenance stitch marker (50), be pre-formed with groove (46) at the inwall of retention groove (42).Thus, the foreign matter entered is discharged via groove (46), therefore can prevent the malrotation of stitch marker (50).
Description
Technical field
The present invention relates to a kind of in order to keeping the holder of stitch marker, there is the holder unit of stitch marker and there is the chalker of this holder unit, and this stitch marker is the device in order to form line on the brittle substrates such as glass substrate, ceramic substrate, silicon substrate.
Background technology
In the past, in the manufacturing step of two-d display panel, the solar cells etc. such as display panels or organic electroluminescent (EL, Electroluminescence) panel, be designed with the segmentation step of the brittle substrates such as female glass substrate.In this segmentation step, usually use chalker.And, in segmentation step, one stitch marker had in the face of this chalker applies the load conformed to all conditions such as the material of brittle substrate or thickness, one side makes stitch marker rotate on the surface of brittle substrate and forms line, by applying specific power to brittle substrate along line dividing brittle material substrate, thus manufacture single panel or various substrate.
As this chalker, there will be a known the such as device shown in following patent document 1.The bridge that chalker described in patent document 1 is setting up in the mode of the platform across mounting brittle substrate is physically provided with moveable scribe head, and this scribe head is provided with the holder keeping stitch marker.
And the holder of this stitch marker is configured to have two support portions in front end, and rotatably keep stitch marker in retention groove between these two support portions.
Prior art document
Patent document
Patent document 1: International Publication WO2007/063979 publication
Summary of the invention
[inventing problem to be solved]
There are the following problems: the foreign matters such as the small chips of glass produced in segmentation step can enter kept by this retention groove between stitch marker and the inwall of retention groove, and rotate under the state causing stitch marker to accompany foreign matter between stitch marker and inwall, produce the malrotation of stitch marker thus.
Namely, there is following tendency: owing to remaining in the holder unit on holder at stitch marker, the contact area of the side wall surface of the stitch marker in retention groove and the support portion of holder becomes large, the chips of glass produced during the line of therefore such as glass substrate can be involved between the inwall of the side wall surface of stitch marker and the support portion of holder, the chips of glass be involved in because of this and cause the malrotation of stitch marker.
In addition, if the amount being involved in the chips of glass between the side wall surface of stitch marker and the inwall of holder is more, then the rotatory of stitch marker worsens more, and during line, blade tip is at the slippery surface of glass substrate, therefore has the misgivings of the blade tip lost of life.In addition, also there is following situation: because the support portion of holder and the contact area of pin make frictional resistance larger comparatively greatly, pin in line is caused to rotate or non rotating, thus heterogeneity is become to the cut-out load of glass, thus become the main cause of the decline of glass end face strength or the inequality of glass rupture strength.
Therefore, present inventor carries out various research repeatedly in order to eliminate this problem, result is expected by the stitch marker holder of retention groove with the stitch marker rotatably keeping disk like, retention groove inwall with the position of the side subtend of stitch marker on form depressed part and this problem can be eliminated, thus complete the present invention.
Namely, problem of the present invention is to eliminate described problem, its object is to provide a kind of holder, there is the holder unit of stitch marker and there is the chalker of this holder unit, in stitch marker holder, can prevent because foreign matter enters the malrotation of the stitch marker caused between the inwall of retention groove and stitch marker.
[technological means of dealing with problems]
In order to reach described object, the feature of aspect of the present invention is: it a kind ofly rotatably keeps disk like by rotatably inserting the pin in through hole and be formed with the holder of the stitch marker of described through hole at center; Described holder comprises: retention groove, keeps described stitch marker; A pair support portion, is formed by described retention groove, and has the inwall of mutual subtend; And a pair pin-and-hole, be formed in described a pair support portion, insert for described pin; And inwall in described support portion be formed with depressed part with the part of the side subtend of described stitch marker.
According to holder of the present invention, the inwall of holder in support portion be formed with depressed part with the part of the side subtend of described stitch marker, therefore when maintaining stitch marker, space can be guaranteed between the side of stitch marker and support portion, thus the generation because invading the malrotation caused to the foreign matter between inwall and the side of stitch marker can be reduced.
In addition, the feature of the aspect of holder of the present invention is: described depressed part is to be formed in the groove of the inwall of described support portion with the discontiguous mode of described pin-and-hole.
According to holder of the present invention, the inwall of holder in support portion is to be formed with groove with the discontiguous mode of pin-and-hole, even if therefore the foreign matter such as chips of glass invades between inwall and stitch marker, also can reduce the malrotation of stitch marker in the trench because of foreign body retention.
In addition, the feature of the aspect of holder of the present invention is: described retention groove comprises the narrow width part and the wide width part wider than described narrow width part that the part for described stitch marker inserts, and described depressed part is described wide width part, described pair of pin hole is formed on the position corresponding with the described wide width part of described retention groove.
According to holder of the present invention, in the wide width part of retention groove, the side wall surface of stitch marker does not contact with the support portion of holder.Therefore, the contact area inserted between the side wall surface of the stitch marker in the narrow width part of retention groove and the support portion of holder is little compared with the situation of holder in the past, therefore the frictional resistance between stitch marker and the support portion of holder diminishes, thus makes stitch marker be easy to rotate.In addition, according to holder of the present invention, when ruling, the rotatory of stitch marker and pin is good, therefore the blade tip when ruling stitch marker not easily occurring is by the phenomenon of the slippery surface of line substrate, thus the blade tip life-span is elongated, and can suppress after ruling by the line decline of end face strength of substrate or the inequality of rupture strength.
In addition, according to holder of the present invention, the pair of pin hole being respectively formed at a pair support portion is formed on the position corresponding with the wide width part of retention groove, therefore in the wide width part of retention groove, space can be produced around pin, even if therefore produce the narrow width part that chips of glass and this chips of glass enter retention groove when ruling, be also easy to discharge.
In addition, in order to reach described object, aspect of the present invention is a kind of holder unit, it is characterized in that comprising: holder described in described aspect; Stitch marker, be disk like, circumferentially portion has the sword comprising inclined-plane and crestal line, and is formed with through hole at center; And pin, rotatably insert described through hole; And described stitch marker remains in the retention groove of described holder, described pin inserts described through hole and described pin-and-hole and remains on described support portion.
According to holder unit of the present invention, the inwall of holder in support portion be formed with depressed part with the part of the side subtend of described stitch marker, therefore can guarantee space between the side of stitch marker and support portion, thus reduce the generation because invading the malrotation caused to the foreign matter between inwall and the side of stitch marker.
In addition, in order to reach described object, aspect of the present invention is a kind of chalker, and it comprises: holder unit described in described aspect; And scribe head, described holder unit is installed.
According to chalker of the present invention, holder is formed with depressed part at the inwall of support portion, therefore can guarantee space between the side of stitch marker and support portion, thus the generation because invading the malrotation caused to the foreign matter between inwall and the side of stitch marker can be reduced.
In addition, in order to reach described object, the feature of aspect of the present invention is: its be a kind of as described in the chalker of aspect, and scribe head has the holder joint that can load and unload described holder unit.
According to chalker of the present invention, chalker has the holder joint that can load and unload holder unit, therefore when changing stitch marker, can change one by one holder unit, therefore easily can carry out replacing operation.
Accompanying drawing explanation
Fig. 1 is the skeleton diagram of the chalker of embodiment 1.
Fig. 2 is the front view of the holder joint of the holder unit being provided with embodiment 1.
Fig. 3 is the stereogram of the holder unit of embodiment 1.
Fig. 4 is the sectional view of the holder unit of embodiment 1.
Fig. 5 is the sectional view of the holder unit of embodiment 2.
Fig. 6 is the sectional view of the holder unit of embodiment 3.
Fig. 7 is the sectional view of the holder unit of embodiment 4.
Fig. 8 is the stereogram of the holder unit of embodiment 5.
Fig. 9 is the sectional view of the holder unit of embodiment 5.
Figure 10 is stereogram and the sectional view of the holder unit of embodiment 6.
Figure 11 is stereogram and the sectional view of the holder unit of embodiment 7.
Figure 12 is stereogram and the sectional view of the holder unit of embodiment 8.
Figure 13 is the stereogram of the holder unit of embodiment 2.
Figure 14 is the front view of the holder unit of embodiment 3.
Figure 15 is the stereogram of the holder unit of embodiment 4.
Figure 16 is front view and the enlarged drawing of the holder unit of embodiment 4.
Figure 17 is the stereogram of the holder unit of embodiment 5.
Figure 18 is front view and the enlarged drawing of the holder unit of embodiment 5.
Figure 19 is the stereogram of the holder unit of embodiment 6.
Figure 20 is front view and the enlarged drawing of the holder unit of embodiment 6.
[explanation of symbol]
10 chalkers
21 scribe heads
23 holder joints
40,40a ~ 40i, 140,211,211A, 211B holder
42,144,214 retention grooves
45a, 45b inwall
46,47a, 47b, 47c, 48a, 48b, 48c, 49a, 49b groove
50,150,212 stitch markers
52a, 52b, 151a, 151b side
210,210A, 210B holder unit
Detailed description of the invention
Below, use and graphic embodiments of the present invention to be described.Wherein, embodiment shown below represents an example of chalker, holder unit and holder in order to be specialized by technological thought of the present invention, and being not intended to by the present invention specific to this chalker, holder unit and holder, the present invention also can be applicable to the situation of other embodiments comprised in the scope of claim.In addition, the parts remained on by pin by stitch marker on holder are described as holder unit.
[embodiment 1]
The skeleton diagram of the chalker 10 of embodiments of the present invention 1 is represented in Fig. 1.In chalker 10, travelling carriage 11 is kept to freedom of movement in the y-axis direction by along pair of guide rails 12a, 12b.Travelling carriage 11 and ball screw 13 screw togather.This ball screw 13 is rotated by the driving of motor 14, and travelling carriage 11 is moved in the y-axis direction along guide rail 12a, 12b.
The upper surface of travelling carriage 11 is provided with motor 15.Motor 15 platform 16 is rotated in xy plane and is positioned at the parts of special angle.Brittle substrate 17 is positioned on this platform 16, by maintenances such as not shown vacuum adsorption mechanisms.On the top of chalker 10, be provided with 2 CCD (ChargeCoupled Device, the charge-coupled image sensor) camera 18 of the alignment mark of shooting brittle substrate 17.And, in chalker 10, to have set up bridge body 19 by pillar 20a, 20b along the x-axis direction across travelling carriage 11 and the mode of the platform 16 on its top.
Be provided with guiding element 22 at bridge body 19, scribe head 21 can move along guiding element 22 in x-axis direction.And, on the scribe head 21 of this chalker 10, the holder unit of the holder 40 comprising the embodiment 1 rotatably keeping stitch marker 50 (with reference to Fig. 2) is installed via holder joint 23.
Secondly, Fig. 2 and Fig. 3 is used to be described the holder joint 23 and this holder 40 that are provided with the holder unit with holder 40.Fig. 2 is the front view of the holder joint 23 being provided with the holder unit with holder 40.Fig. 3 is the stereogram amplified by the holder unit with holder 40a.
Holder joint 23 is formed roughly cylindric, is made up of rotating shaft portion 24 and connector portions 25.
And, under the state being provided with holder joint 23 at scribe head 21, become the state being provided with two bearings 26a, the 26b freely keeping holder joint 23 in order to turn in this rotating shaft portion 24 via columnar distance piece 27.In addition, represent the front view of holder joint 23 in fig. 2, and indicate and be arranged on bearing 26a, the 26b in rotating shaft portion 24 and the sectional view of distance piece 27.
Be formed with circular opening 28 in the lower end side of columniform connector portions 25, and be embedded with magnet 29 on the top of this opening.And, load and unload at this opening 28 and holder 40 is freely installed.
This holder 40 comprises metal or the resin of substantial cylindrical, and its lower end side is provided with support portion 41a, 41b.In addition, in fig. 2 the figure of the lower end side of holder 40 amplification gained is represented enlarged drawing when observing from the transverse direction shown in arrow A.
The retention groove 42 keeping stitch marker 50 is formed between this support portion 41a and support portion 41b.In addition, at support portion 41a, 41b, be formed with poroid pin-and-hole 43a respectively in order to fixing stitch marker 50.Pin 44 this pin-and-hole through 43a, and stitch marker 50 is rotatably installed.Now, respective inwall 45a, 45b of support portion 41a and support portion 41b respectively with round sides 52a, the 52b subtend of stitch marker 50.
This stitch marker 50 formed by such as sintered diamond, have the shape that wheel footpath is 2.5mm, thickness d is the disk like of about 0.65mm, and circumferentially portion is formed with the sword 51 of the vertical-sectional shape V-shaped comprising inclined-plane and crestal line.And, be formed with through hole 53 at two round sides 52a of stitch marker 50, the center of 52b.By pin 44 this through hole 53 through of through previously described pin-and-hole 43a, and rotatably keep stitch marker 50 in retention groove 42.In addition, relative to the thickness of stitch marker 50, the interval (distance of inwall 45a and inwall 45b) of retention groove 42 is slightly large, and such as, when the thickness d of stitch marker 50 is 0.65mm, the interval of retention groove 42 is about 0.67mm.
The installation portion 46 of location is provided with in the upper end side of holder 40.This installation portion 46 is a part for excision holder 40 and is formed, and has rake 46a and support portion 46b.In addition, holder 40 upper end side be made up of magnetic metal at least partially.
There is this stitch marker 50 insert from the opening 28 of the installation portion 46 side direction holder joint 23 of holder 40 with the holder unit of holder 40.Now, the magnetic metal of the upper end side of holder 40 is attracted by magnet 29, thus the rake 46a of installation portion 46 is contacted with by the parallel pin 30 of the inside of opening 28 and positions, and makes holder unit be fixed on holder joint 23.On the contrary, by holder unit from holder joint 23 removal time, by just can easily removal by the drawing downwards of holder unit.
Herein, because therefore stitch marker 50 must be changed termly for running stores.In the present embodiment, holder unit is arranged on scribe head 21 via holder joint 23, therefore easily can carry out the handling of holder unit.Therefore, not by stitch marker 50 from removal holder 40, as long as using stitch marker 50 with holder 40 as integrally processing, and change holder unit itself, therefore easily can carry out the replacing operation of stitch marker 50.
Secondly, there is the foreign matters such as the small chips of glass produced in segmentation step as described above and enter side 52a, the 52b of the stitch marker 50 kept by the retention groove 42 of holder 40 and the misgivings between inwall 45a, 45b of retention groove 42.Therefore, in present embodiment, be formed with depressed part at inwall 45a, 45b of retention groove 42.This depressed part comprises the part of following groove or wide width part etc. specifically.Therefore, even if foreign matter enters between side 52a, 52b of inwall 45a, 45b and stitch marker 50, also can diminish due to the contact area of side 52a, 52b and inwall 45a, 45b, and reduce the generation of the malrotation of stitch marker 50.The concrete example of depressed part of graphic inwall 45a, 45b to being formed in this retention groove 42 is used to be described.
[embodiment 1]
The sectional view of the holder 40a of embodiment 1 is represented in Fig. 4.In addition, Fig. 4 (a) is the sectional view of the IVa-IVa line along Fig. 3, and Fig. 4 (b) is the sectional view of the IVb-IVb line along Fig. 3.In addition, stitch marker 50 is represented by dotted lines.
The groove 46 of the arc-shaped of the example as depressed part is formed respectively at inwall 45a, 45b of holder 40a.This groove 46 is arranged on on the position of side 52a, 52b subtend of stitch marker 50.Therefore, even if the foreign matters such as chips of glass enter inwall 45a, 45b and between side 52a, 52b, also can because foreign body retention be in groove 46, and impact that the rotation of stitch marker 50 is caused can be reduced.In addition, because groove 46 is extended to the position with side 52a, 52b of stitch marker 50 not subtend, therefore the foreign matter be trapped in groove 46 can be discharged to the position with side 52a, 52b not subtend along with the rotation of stitch marker 50, thus further can reduce the malrotation of stitch marker 50.
And, due to the extended end to retention groove 42 of this groove 46, therefore the outside of foreign matter to holder 40a can be discharged.In addition, the width one side expanding groove gradually towards vertical direction G one side due to this groove 46 extends, and therefore foreign matter is easy to downward, thus is easier to foreign matter to discharge.In the present embodiment, the degree of depth of groove 46 is fixed, but also can optionally make the degree of depth of groove different.Such as, make the degree of depth of groove the darkest in the position of side 52a, 52b subtend with stitch marker 50, and make the degree of depth of groove along with the position from the not subtend of side 52a, the 52b with stitch marker 50 close and shoal to the end of retention groove 42, holder 40a can be easier to the foreign matter be detained in the trench to discharge thus.
[embodiment 2]
The formation of the holder 40b of embodiment 2 is represented in Fig. 5.In addition, Fig. 5 (a) is the sectional view of the IVa-IVa line along Fig. 3, and Fig. 5 (b) is the sectional view of the IVb-IVb line along Fig. 3.In addition, stitch marker 50 is represented by dotted lines.
3 grooves 47a, 47b, 47c are formed respectively at inwall 45a, 45b of holder 40b.This groove 47a, 47b, 47c in the same manner as the groove 46 of embodiment 1, the extended position to not subtend from the position of side 52a, 52b subtend with stitch marker 50.In addition, towards the extended end to retention groove 42 of vertical direction G.Thus, even if the foreign matters such as chips of glass enter inwall 45a, 45b and between side 52a, 52b, also can be discharged by foreign matter via groove 47a, 47b, 47c, thus can reduce the malrotation of stitch marker 50.
In addition, these 3 grooves 47a, 47b, 47c are formed as the curve little compared with the curvature of stitch marker 50, and in addition, respective curvature is different.As so, a plurality of different grooves of size are set, even if stitch marker 50 to be altered to the stitch marker of different size, because groove is positioned on the position be applicable to for the stitch marker 50 of each size, therefore holder 40b also can reduce the malrotation of stitch marker 50.In addition, holder 40b is formed with a plurality of grooves, and therefore foreign body retention probability in the trench becomes higher, thus can reduce the malrotation of stitch marker 50.
[embodiment 3]
The formation of the holder 40c of embodiment 3 is represented in Fig. 6.In addition, Fig. 6 is the sectional view of the IVa-IVa line along Fig. 3, is represented by dotted lines for stitch marker 50.
3 grooves 48a, 48b, 48c are formed respectively at the inwall 45a of holder 40c.This groove 48a, 48b, 48c are formed in on the position of the side 52a subtend of stitch marker 50 in the same manner as the groove 46 of embodiment 1, and towards the extended end to retention groove 42 of vertical direction G.Thus, even if the foreign matters such as chips of glass enter inwall 45a, 45b and between side 52a, 52b, foreign matter also can be discharged via groove 48a, 48b, 48c by holder 40c, thus can reduce the malrotation of stitch marker 50.
In addition, groove 48a, 48b, 48c are formed with a plurality of in the same manner as the groove 46 of embodiment 2, even if therefore stitch marker 50 to be altered to the stitch marker of different size, because groove is positioned at stitch marker 50 relative to each size and on stark suitable position, therefore holder 40c also can reduce the malrotation of stitch marker 50, in addition, because groove is formed with complex trace, therefore foreign body retention probability in the trench becomes higher, and can reduce the malrotation of stitch marker 50.In addition, this groove 48a, 48b, 48c forms the curve large compared with the curvature of stitch marker 50.Thus the foreign matter be detained in the trench is easier to fall along vertical direction G.
[embodiment 4]
The formation of the holder 40d of embodiment 4 is represented in Fig. 7.In addition, Fig. 7 is the sectional view of the IVa-IVa line along Fig. 3, is represented by dotted lines for stitch marker 50.
2 grooves 49a, 49b are formed respectively at the inwall 45a of holder 40d.Groove 49a is formed in on the position of the side 52a subtend of stitch marker 50 in the same manner as the groove 46 of embodiment 1, and towards the extended end to retention groove 42 of vertical direction G.Thus, even if the foreign matters such as chips of glass enter between inwall 45a and side 52a, also via groove 49a, foreign matter can be discharged, thus the malrotation of stitch marker 50 can be reduced.
In addition, groove 49a is groove that is orthogonal relative to pin 44 and that asymmetricly formed relative to the axle extended at vertical direction G, at the front side of the direct of travel B of holder 40a, be formed with the curve large compared with the curvature of stitch marker 50, at the rear side of the direct of travel B of holder 40d, be formed with the curve little compared with the curvature of stitch marker 50.Thus holder 40d is easy to make delay foreign matter in the trench fall at the front side of groove 49a, makes delay foreign matter in the trench fall to the outside of stitch marker 50 at the rear side of groove 49a.
In addition, groove 49b is formed in and the groove on the position of the side 52a of stitch marker 50 not subtend.Thus, even if be formed with groove on the position of the not subtend of the side with stitch marker 50, also via groove 49b, the outside of the foreign matter entered in retention groove 42 to retention groove 42 can be discharged, therefore holder 40d can cut down the foreign matter that will enter between inwall 45a and side 52a, thus can reduce the malrotation of stitch marker 50.
Secondly, to being that differently composed holder 40e ~ 40g is described with holder 40a ~ 40d.In addition, holder 40e ~ 40g, in the same manner as holder 40a ~ d, can be used as the holder unit and installation on holder joint 23 that maintain stitch marker 50.
[embodiment 5]
The formation comprising the holder 40e of embodiment 5 and the holder unit of stitch marker 50 is represented in Fig. 8, Fig. 9.In addition, Fig. 8 (a) is the stereogram of the holder 40e from upper side observation, and Fig. 8 (b) is the stereogram of the holder 40e of side observation from below.In addition, Fig. 9 (a) is the sectional view of the IXa-IXa line along Fig. 8, and Fig. 9 (b) is the sectional view of the IXb-IXb line along Fig. 8.
The holder unit of embodiment 5 also rotatably keeps stitch marker 50 in the lower end of holder 40e.In addition, holder 40e is described above, stitch marker 50 is connected to formed the device of line as brittle substrate by line component, therefore below, being connected to of holder 40e is called D score by the side (cut-out side) of line component, its opposition side is called " on ".
Retention groove 42 is formed in the below of holder 40e.And retention groove 42 comprises the wide width part 42b of the narrow width part 42a making a part for the top of stitch marker 50 insert and the example as depressed part being formed wider than this narrow width part 42a.Therefore, a pair support portion 65,66 comprises narrow width part 65b, the 66b respectively with wide width part 65a, 66a of the narrow width part 42a subtend of retention groove 42 and the wide width part 42b subtend with retention groove 42.In addition, the support portion 65,66 of holder 40e wide width part 65a, 66a and be formed as jump shape between narrow width part 65b, 66b.
In addition, the relative inwall of support portion 65,66 of holder 40e and the relative face of the relative face of wide width part 65a, 66a and narrow width part 65b, 66b are formed all abreast.And, at narrow width part 65b, 66b of the support portion 65,66 of holder 40e, be formed with the pin-and-hole 43a of through each respectively coaxially.Pin-and-hole 43a vertically intersects with retention groove 42 and can keep the through hole of the circle of the pin 44 of stitch marker 50.
And, in the holder unit of embodiment 5, in the through hole 53 that pin 44 is arranged on stitch marker 50 in the discontiguous mode of wide width part 65a, 66a of the support portion 65,66 with holder 40e and pin-and-hole 43a.Therefore, gap 67 is formed between the downside of wide width part 65a, 66a in the support portion 65,66 of holder 40e and pin 44.In addition, pin 44 is the columniform components formed by metal, sintered diamonds such as such as superhard alloys, and one end has pointed shape.
The interval of the narrow width part 42a of retention groove 42 sets slightly larger than the width of stitch marker 50.The width of stitch marker 50 is such as about 0.65mm, and the interval of the narrow width part 42a of retention groove 42 is such as about 0.67mm.In addition, as long as the interval of the wide width part 42b of retention groove 42 is wider than the interval of narrow width part 42a, can be arbitrarily.But, in order to reduce the friction during rotation of the pin 44 in pin-and-hole 43a, must only be supported pin 44 at both ends, and it is shorter to make pin 44 be positioned at the length of the part of pin-and-hole 43a.Thus the interval of wide width part 42b is preferably more than 2 times of the interval of the narrow width part 42a of retention groove 42.
On the other hand, if by too much for the setting of the interval of wide width part 42b, then the width of narrow width part 65b, 66b of the support portion 65,66 of holder 40e can become narrower, therefore there is the load owing to applying during line and cause the anxiety that narrow width part 65b, 66b are bending, and produce the situation that pin 44 is supported on side, both ends, thus there is the also bending anxiety of pin 44 self, therefore preferably make the width of narrow width part 65b, 66b of the support portion 65,66 of holder 40e be about 1/3 of wide width part 65a, 66a of the support portion 65,66 of holder 40e.In addition, the interval being formed in the gap 67 between the downside of wide width part 65a, 66a of the support portion 65,66 of holder 40e and pin 44 can be arbitrarily, but in order to make holder unit small-sized and the smaller the better.
If use the holder unit of this state to rule to the brittle bases such as glass substrate 17, then stitch marker 50 position stability in the narrow width part 42a of retention groove 42, therefore stitch marker 50 exists hardly relative to swinging of direct of travel, thus can improve the linearity of line when ruling.In addition, even if produce chips of glass when ruling, and between the narrow width part 42a of this chips of glass intrusion retention groove 42 and stitch marker 50, also and the existence in the space between pin 44 and brittle base 17 can be formed in and easily discharge because of the gap 67 that is formed between the downside of wide width part 65a, 66a of the support portion 65,66 of holder 40e and pin 44, therefore suppress the rotatory of stitch marker 50 impaired.
Therefore, according to the holder unit of embodiment 5, when ruling, the rotatory of stitch marker 50 and pin 44 is good, therefore the blade tip when ruling stitch marker 50 not easily occurring by the phenomenon of the slippery surface of line substrate, thus can play extend the blade tip life-span and after suppressing line by the line decline of end face strength of substrate or the excellent effect of the inequality of rupture strength.
In addition, in the holder unit of embodiment 5, the narrow width part 42a illustrating retention groove 42 is formed in the example of a part for the top of stitch marker 50, but certainly also can be formed in the mode making a part for graphic middle left and right sides insert.And in either case, the chips of glass produced during line is all difficult to invade in the narrow width part 42a of retention groove 42, thus makes the rotatory of stitch marker 50 and pin 44 good.
In addition, in the holder 40e of embodiment 5, the relative inwall of support portion 65,66 of holder 40b and the relative face of the relative face of wide width part 65a, 66a and narrow width part 65b, 66b are formed all abreast, as long as but the relative face of wide width part 65a, 66a is formed abreast, the relative face of narrow width part 65b, 66b also can be not parallel.Its reason is, as long as at least the relative face of wide width part 65a, 66a of support portion 65,66 that contacts of stitch marker 50 is parallel, just can make stitch marker 50 position stability in the narrow width part 42a of retention groove 42.
[embodiment 6]
The formation comprising the holder 40f of embodiment 6 and the holder unit of stitch marker 50 is represented in Figure 10.In addition, Figure 10 (a) is the stereogram of the holder 40f of side observation from below, and Figure 10 (b) is the stereogram of the holder 40f observed from opposition side, and Figure 10 (c) is the sectional view of the X-X line along (a).
The holder 40f of the embodiment 6 and holder 40e of holder unit and embodiment 5 and the difference of holder unit on forming are the narrow width part 42a of retention groove 42 and the formation of wide width part 42b and wide width part 65a, 66a of support portion 65,66 of being formed and the formation of narrow width part 65b, 66b thereupon.Namely, in the holder 40f of embodiment 6, the narrow width part 42a of retention groove 42 is that the mode that the part on the right side of stitch marker 50 in a part for the top of stitch marker 50 and Figure 10 (c) is inserted is formed, and wide width part 65a, 66a of support portion 65,66 are formed in the top of stitch marker 50 and the right side of the middle stitch marker 50 of Figure 10 (c) thereupon.
And the wide width part 42b of retention groove 42 is formed in the left side of stitch marker 50 in Figure 10 (c), and narrow width part 65b, 66b of support portion 65,66 are formed in the left side of stitch marker 50 in Figure 10 (c) thereupon.In addition, the support portion 65,66 of holder 40f wide width part 65a, 66a and be formed as jump shape between narrow width part 65b, 66b.
In this case, the relative inwall of support portion 65,66 of holder 40f and the relative face of the relative face of wide width part 65a, 66a and narrow width part 65b, 66b are also formed all abreast.And at narrow width part 65b, 66b of the support portion 65,66 of holder 40f, be formed with the pin-and-hole 43a of through each coaxially, pin 44 installs in the discontiguous mode of wide width part 65a, 66a of the support portion 65,66 with holder 40f.Therefore, gap 67 is formed between the downside of wide width part 65a, 66a in the support portion 65,66 of holder 40f and pin 44.
According to holder 40f and the holder unit of the embodiment 6 of this kind of formation, if in contrast to holder 40e and the holder unit of embodiment 5, then the contact area between wide width part 65a, 66a of stitch marker 50 and support portion 65,66 becomes large a little, therefore frictional resistance becomes large a little, if but removed this point, equal action effect could be played in fact, in addition because the swing of the blade tip of stitch marker 50 becomes less, wriggling when being formed of ruling therefore also can be suppressed.
In addition, in the holder unit of embodiment 6, indicate that the narrow width part 42a of retention groove 42 is the examples not only making a part for the top of stitch marker 50 but also the mode of the part insertion on the right side of the middle stitch marker 50 of Figure 10 (c) is formed, but certainly also can be formed in the mode making the part in the left side of stitch marker 50 in Figure 10 (c) insert.And, in either case, when using the holder unit with the holder 40f of embodiment 6 to form line, as long as mobile holder 40f, the chips of glass produced during line is all difficult to invade in the narrow width part 42a of retention groove 42, therefore can play extend the blade tip life-span and after suppressing line by the line decline of end face strength of substrate or the excellent effect of the inequality of rupture strength.
[embodiment 7]
The formation comprising the holder 40g of embodiment 7 and the holder unit of stitch marker 50 is represented in Figure 11.In addition, Figure 11 (a) is the stereogram of the holder 40g of side observation from below, and Figure 11 (b) is the sectional view of the XI-XI line along (a).
The holder 40g of the embodiment 7 and holder 40e of holder unit and embodiment 5 and the difference of holder unit on forming be the narrow width part 42a of retention groove 42 and wide width part 42b configuration, turn upside down with wide width part 65a, 66a of support portion 65,66 of being formed and the configuration of narrow width part 65b, 66b thereupon.Namely, in the holder 40g and holder unit of embodiment 7, the narrow width part 42a of retention groove 42 is formed in the below of stitch marker 50, wide width part 42b is formed in the top of stitch marker 50, wide width part 65a, 66a of support portion 65,66 are formed in the below of stitch marker 50 thereupon, and narrow width part 65b, 66b are formed in the top of stitch marker 50.In addition, the support portion 65,66 of holder 40g wide width part 65a, 66a and be formed as jump shape between narrow width part 65b, 66b.
In this case, the relative inwall of support portion 65,66 of holder 40g and the relative face of the relative face of wide width part 65a, 66a and narrow width part 65b, 66b are also formed all abreast.And at narrow width part 65b, 66b of the support portion 65,66 of holder 40g, be formed with the pin-and-hole 43a of through each coaxially, pin 44 installs in the discontiguous mode of wide width part 65a, 66a of the support portion 65,66 with holder 40g.Therefore, gap 67 is formed between the upside of wide width part 65a, 66a in the support portion 65,66 of holder 40g and the upside of pin 44.
According to holder 40g and the holder unit of the embodiment 7 of this kind of formation, if in contrast to holder 40e and the holder unit of embodiment 5, then the effect that the contact area between stitch marker 50 and support portion 65,66 is diminished also can be played.
Thus, even if produce chips of glass when ruling, and between the narrow width part 42a of this chips of glass intrusion retention groove 42 and stitch marker 50, also easily can discharge because of the existence in the space between the gap 67 that is formed between the upside of wide width part 65a, 66a of the support portion 65,66 of holder 40g and pin 44 and the wide width part 42b being formed in pin 44 and retention groove 42, therefore suppress the rotatory of stitch marker 50 impaired.
[embodiment 8]
The formation comprising the holder 40h of embodiment 8 and the holder unit of stitch marker 50 is represented in Figure 12.In addition, Figure 12 (a) is the stereogram of the holder 40h of side observation from below, Figure 12 (b) is the sectional view of the XIIb-XIIb line along (a), and Figure 12 (c) is the sectional view of the XIIc-XIIc line along (a).In addition, in Figure 12 (b), (c), and not shown pin 44.
The holder 40h of the embodiment 8 and holder 40e of holder unit and embodiment 5 and the difference of holder unit on forming be the narrow width part 42a of retention groove 42 and wide width part 42b formation, with wide width part 65a, 66a of support portion 65,66 of being formed and the formation of narrow width part 65b, 66b thereupon.Specifically, in the holder 40h of embodiment 8, till the lower end of the narrow width part 42a of retention groove 42 is formed to the position overlapped with pin 44.That is, the lower end of wide width part 65a, 66a of support portion 65,66 is formed on the position that contacts with pin 44.In addition, in embodiment 8, as shown in Figure 12 (b), in the comparatively middle of pin 44 slightly by upside, the wide width part 65a of support portion 65 contacts with pin 44.That is, holder 40h is provided with pin-and-hole 43a and forms on wide width part 65a, 66a of support portion 65,66 and the jump position between narrow width part 65b, 66b.
According to the embodiment 8 that this kind is formed, holder 40h and holder unit have wide width part 42b in retention groove 42, therefore can play the effect that the contact area between stitch marker 50 and support portion 65,66 is diminished.In addition, holder 40h and holder unit are provided with pin-and-hole 43a on wide width part 65a, 66a of support portion 65,66 and the jump position between narrow width part 65b, 66b, therefore the swing of the blade tip of stitch marker 50 also tails off, thus the effect of wriggling when suppressing line to be formed also uprises.
[embodiment 2]
Secondly, the holder 40a ~ 40h of Figure 13 pair and embodiment 1 is used to be that the holder 40i of differently composed embodiment 2 is described.In addition, Figure 13 is stereogram holder 40i being amplified gained.In addition, use the identical symbol pair formation identical with holder 40a ~ 40h to be described, and omit its detailed description.The holder 40i of embodiment 2 is as the holder unit maintaining stitch marker 50, and in the same manner as the holder 40 of embodiment 1, the opening 28 to holder joint 23 inserts and is arranged on the scribe head 21 of chalker 10.
This holder 40i comprises metal or the resin of substantial cylindrical, and its lower end side is provided with support portion 41a, 41b.And, between this support portion 41a and support portion 41b, be formed with the retention groove 42 keeping stitch marker 50.In addition, in the lower end of support portion 41a, 41b, be formed with in order to fixing stitch marker 50 the pin-and-hole 43b carrying out otch formation respectively.And pin 44 this pin-and-hole through 43b, stitch marker 50 is rotatably arranged on holder 40i.In the upper end side of this holder 40i, be formed with the installation portion 46 comprising rake 46a and support portion 46b in the same manner as holder 40.
And at the inwall of the retention groove 42 of this holder 40i, being also formed with the situation shown in embodiment 1 to the embodiment 8 of embodiment 1 is the depressed part (illustrate and omit) of identical formation.The holder 40i of this embodiment 2 is comparable to be easier to and precision forms pin-and-hole 43b well, but pin-and-hole 43b becomes the state forming otch, and therefore the foreign matter such as chips of glass more easily invades in retention groove 42 compared with the situation of the holder 40 of embodiment 1.But, in the holder 40i of embodiment 2, by being formed with depressed part at the inwall of retention groove 42, the effect identical with embodiment 1 to the embodiment 8 of embodiment 1, effect can be played.
[embodiment 3]
Secondly, use Figure 14, to being differently composed embodiment 3 with the holder 40i shown in the holder 40a ~ 40h shown in embodiment 1 or embodiment 2, holder 140 is described.In addition, Figure 14 is the front view of the holder 140 of embodiment 3.In addition, on holder 140, the parts of stitch marker 150 are kept to be described as holder unit using by pin.
The holder unit with the holder 140 of embodiment 3 is the devices not being directly installed on the scribe head 21 of chalker 10 via holder joint.Holder 140 is formed as roughly cylindric, is made up of rotating shaft portion 141 and wheel maintaining part 142.And, under the state being provided with holder 140 on scribe head 21, be formed as the state being provided with two bearings 126a, the 126b freely keeping holder 140 in order to turn in this rotating shaft portion 141 via columnar distance piece 127.In addition, represent the front view of holder 140 in fig. 14, and indicate and be arranged on bearing 126a, the 126b in rotating shaft portion 141 and the sectional view of distance piece 127.
Wheel maintaining part 142 is formed as rectangular-shaped, and lower end side is formed as triangle, in order to stitch marker 150 is inserted in the front end to this triangle, and between 143a and the 143b of support portion, is formed with the retention groove 144 keeping stitch marker 150.In addition, in fig. 14 the figure of the lower end side of holder 140 amplification gained is represented enlarged drawing when observing from the transverse direction shown in arrow C.
At support portion 143a, 143b, be formed with poroid pin-and-hole 145 respectively in order to fixing stitch marker 150, in pin 146 this pin-and-hole 145 through, stitch marker 150 be rotatably arranged on holder 140.Now, respective inwall 147a, 147b of support portion 143a and support portion 143b and round sides 151a, the 151b subtend respectively of stitch marker 150.And in the outside of support portion 143a, 143b, by screw 149, spiral shell is intrinsic in order to pin casting die 148a, the 148b from outer side covers pin-and-hole 145 respectively.
In addition, in this case, stitch marker 150 is also running stores, must change termly, therefore in the holder unit with holder 140, when changing stitch marker 150, first, by holder unit from removal scribe head 21, secondly, by pin casting die 148a, 148b from removal holder 140, afterwards pin 146 taken out and carry out the replacing of stitch marker 150.
And being formed with the situation shown in the embodiment 1 ~ embodiment 8 of embodiment 1 at inwall 147a, 147b of holder 140 is the depressed part (illustrate and omit) of identical formation.Therefore, even if the foreign matters such as chips of glass enter between side 151a, 151b of inwall 147a, 147b and stitch marker 150, also reduce the generation of the malrotation of stitch marker 150 by this depressed part.In addition, the pin-and-hole 145 of present embodiment is formed as poroid, but also can a part for the lower end of support portion 143a and support portion 143b be excised in the same manner as embodiment 2 and be formed.
[embodiment 4]
Figure 15 and Figure 16 is used to be described the holder 211 of embodiments of the present invention 4 and holder unit 210.In addition, Figure 15 is the stereogram of the holder unit of embodiment 4, and Figure 16 (a) is the front view of the holder unit of Figure 15, and Figure 16 (b) is the enlarged drawing of the XVIB part of Figure 16 (a).
The holder unit 210 of embodiment 4 has holder 211 and stitch marker 212, rotatably maintains stitch marker 212 in the lower end of holder 211.Holder 211 is rectangular-shaped components that below is formed as triangle, and has the through hole 213 in order to fixing holder 211 on top.In addition, this holder 211 makes stitch marker 212 be connected to the device being formed line by line component, being below connected to of holder 211 is called D score by the side (cut-out side) of line component, its opposition side is called " on ".
Stitch marker 212 is components that the thickness d formed by such as sintered diamond is about the disk like of 0.65mm, and has through hole at center.In addition, stitch marker 212 has the sword of the V-shaped forming crestal line along peripheral part.The inclined plane of the both sides of crestal line is intersected mutually with the angle of 90 ~ 165 ° usually, utilizes these inclined planes to be formed with crestal line.
In the below of this holder 211, be formed with retention groove 214 in the mode of the opened downward making the triangle of holder 211, be formed with support portion 215,216 in the part of this triangle clipping retention groove 214.And retention groove 214 comprises the narrow width part 214a making a part for the top of stitch marker 212 insert and the wide width part 214b being formed wider than this narrow width part 214a.Therefore, a pair support portion 215,216 comprises narrow width part 215b, the 216b respectively with wide width part 215a, 216a of the narrow width part 214a subtend of retention groove 214 and the wide width part 214b subtend with retention groove 214.In addition, the support portion 215,216 of holder 211 wide width part 215a, 216a and be formed as jump shape between narrow width part 215b, 216b.
In addition, the relative inwall of support portion 215,216 of holder 211 and the relative face of the relative face of wide width part 215a, 216a and narrow width part 215b, 216b are formed all abreast.And, at narrow width part 215b, 216b of the support portion 215,216 of holder 211, be formed with the pin-and-hole 217,218 of through each coaxially.Pin-and-hole 217,218 vertically intersects with retention groove 214 and can keep the through hole of the circle of the pin 219 of stitch marker 212.
And, in the holder unit 210 of present embodiment 4, in the through hole that pin 219 is arranged on stitch marker 212 in the discontiguous mode of wide width part 215a, 216a of the support portion 215,216 with holder 211 and pin-and-hole 217,218.Therefore, gap 220 is formed between the downside of wide width part 215a, 216a in the support portion 215,216 of holder 211 and pin 219.In addition, pin 219 is the columniform components formed by metal, sintered diamonds such as such as superhard alloys, and one end has pointed shape.
The interval w1 of the narrow width part 214a of retention groove 214 sets slightly larger than the width of stitch marker 212.The width d of stitch marker 212 is such as about 0.65mm, and the interval w1 of the narrow width part 214a of retention groove 214 is such as about 0.67mm.In addition, as long as the interval w2 of the wide width part 214b of retention groove 214 is wider than the interval of the interval w1 of narrow width part 214, can be arbitrarily, but in order to reduce the pin 219 in the pin-and-hole 217,218 of narrow width part 215b, 216b of being formed in support portion 215,216 rotation time friction, must only be supported pin 219 at both ends, and it is shorter to make pin 219 be positioned at the length of the part of pin-and-hole 217,218, thus be preferably more than 2 times of the interval w1 of the narrow width part 214a of retention groove 214.
But, if w2 is set too much, then the width of narrow width part 215b, 216b of the support portion 215,216 of holder 211 can become narrower, therefore there is the load owing to applying during line and cause the anxiety that narrow width part 215b, 216b are bending, and produce the situation that pin 219 is supported on side, both ends, thus there is the also bending anxiety of pin 219 self, therefore preferably make the width of narrow width part 215b, 216b of the support portion 215,216 of holder 211 be about 1/3 of wide width part 215a, 216a of the support portion 215,216 of holder 211.In addition, the interval being formed in the gap 220 between the downside of wide width part 215a, 216a of the support portion 215,216 of holder 211 and pin 219 can be arbitrarily, but the smaller the better in order to make holder unit 210 miniaturized.
In addition, in the holder unit 210 of present embodiment 4, the both ends being formed in the pin-and-hole 217,218 of wide width part 215a, 216a of the support portion 215,216 of holder 211 are blocked by gland 222,223 respectively.These glands 222,223, such as shown in Figure 15, have the washer-shaped that one end is outstanding, and each gland is fixed on the lateral surface of holder 211 above holder 211 by adjustment screw 224,225.
The assembling of this holder unit 210 is carried out as follows.First, gland 222 is installed from side, support portion 215 by adjustment screw 224 and blocks the outer side of pin-and-hole 217.Secondly, a part for stitch marker 212 is inserted and remains in the narrow width part 214a of retention groove 214, pin 219 is inserted pin-and-hole 218, the through hole of stitch marker 212 and pin-and-hole 217 from the part of pointed shape.Pin 219 is inserted into till the part of the pointed shape of pin 219 contacts with the gland 222 near the opening being positioned at pin-and-hole 217, then utilizes adjustment screw 225 spiral shell solid pressure lid 223 from side, support portion 216 and close the outer side of pin-and-hole 218.Thus, pin 219 can not come off from pin-and-hole 217,218, and stitch marker 212 is rotatably kept by pin 219.
If use the brittle bases such as holder unit 210 pairs of glass substrates of this state to rule, then stitch marker 212 position stability in the narrow width part 214a of retention groove 214, therefore stitch marker 212 exists hardly relative to swinging of direct of travel, thus can improve the linearity of line when ruling.In addition, even if produce when ruling that chips of glass and this chips of glass invade retention groove 214 between narrow width part 214a and stitch marker 212, also and the existence in the space between pin 219 and brittle base can be formed in and easily discharge because of the gap 220 that is formed between the downside of wide width part 215a, 216a of the support portion 215,216 of holder 211 and pin 219, therefore suppress the rotatory of stitch marker 212 impaired.
Therefore, the holder unit 210 of 4 according to the present embodiment, when ruling, the rotatory of stitch marker 212 and pin 219 is good, therefore the blade tip when ruling stitch marker 212 not easily occurring by the phenomenon of the slippery surface of line substrate, thus can play extend the blade tip life-span and after suppressing line by the line decline of end face strength of substrate or the excellent effect of the inequality of rupture strength.
In addition, in the holder unit 210 of embodiment 4, the narrow width part 214a illustrating retention groove 214 is formed in the example of a part for the top of stitch marker 212, but certainly also can be formed in the mode making a part for graphic middle left and right sides insert.And in either case, the chips of glass produced during line is all difficult to invade in the narrow width part 214a of retention groove 214, thus makes the rotatory of stitch marker 212 and pin 219 good.
In addition, in the holder of present embodiment 4, the relative inwall of support portion 215,216 of holder 211 and the relative face of the relative face of wide width part 215a, 216a and narrow width part 215b, 216b are formed all abreast, as long as but the relative face of wide width part 215a, 216a is formed abreast, the relative face of narrow width part 215b, 216b also can be not parallel.Its reason is, as long as at least the relative face of wide width part 215a, 216a of support portion 215,216 that contacts of stitch marker 212 is parallel, just can make stitch marker 212 position stability in the narrow width part 214a of retention groove 214.
In addition, in the holder of present embodiment 4, the pin-and-hole 217,218 of through each is formed coaxially at narrow width part 215b, 216b of the support portion 215,216 of holder 211, gland 222,223 can be used from the both sides retaining pin 219 of pin-and-hole 217,218, the diameter of a pin-and-hole also can be made in the narrower and retaining pin of support portion outer circumferential side.In addition any one, as long as pin-and-hole 217,218 is formed coaxially, then only in through narrow width part 215b, 216b.In this case, as long as do not make the lateral surface of the narrower support portion of the diameter of pin-and-hole or the support portion that arranges through to some extent pin-and-hole be provided with gland.
[embodiment 5]
Secondly, Figure 17 and Figure 18 is used to be described the holder of embodiment 5 and holder unit.In addition, Figure 17 is the stereogram of the holder unit of embodiment 5, and Figure 18 is the sectional view of the XVIII-XVIII line along Figure 17.In addition, in Figure 17 and Figure 18, the component part identical to the holder unit 210 with embodiment 4 marks identical reference marks, and omits its detailed description.
The holder 211A of embodiment 5 and the holder 211 of holder unit 210A and embodiment 4 and the difference of holder unit 210 on forming be the narrow width part 214a of retention groove 214 and wide width part 214b formation, with wide width part 215a, 216a of support portion 215,216 of being formed and the formation of narrow width part 215b, 216b thereupon.Namely, in the holder 211A and holder unit 210A of embodiment 5, the narrow width part 214a of retention groove 214 is that the mode that the part on a part for the top of stitch marker 212 and graphic right side is inserted is formed, and wide width part 215a, 216a of support portion 215,216 are formed in the top of stitch marker 212 and graphic right side thereupon.
And the wide width part 214b of retention groove 214 is formed in the graphic left side of stitch marker 212, and narrow width part 215b, 216b of support portion 215,216 are formed in the graphic left side of stitch marker 212 thereupon.In addition, the support portion 215,216 of holder 211A wide width part 215a, 216a and be formed as jump shape between narrow width part 215b, 216b.
In this case, the relative inwall of support portion 215,216 of holder 211A and the relative face of the relative face of wide width part 215a, 216a and narrow width part 215b, 216b are also formed all abreast.And, at narrow width part 215b, 216b of the support portion 215,216 of holder 211A, be formed with the pin-and-hole (diagram is omitted) of through each coaxially, pin 219 installs in the discontiguous mode of wide width part 215a, 216a of the support portion 215,216 with holder 211A.Therefore, gap 220 is formed between the downside of wide width part 215a, 216a in the support portion 215,216 of holder 211A and pin 219.
According to holder 211A and the holder unit 210A of the embodiment 5 of this kind of formation, if in contrast to holder 211 and the holder unit 210 of embodiment 4, then the contact area between wide width part 215a, 216a of stitch marker 212 and support portion 215,216 becomes large a little, therefore frictional resistance becomes large a little, if but removed this point, equal action effect could be played in fact, in addition because the swing of the blade tip of stitch marker 212 becomes less, wriggling when being formed of ruling therefore also can be suppressed.
In addition, in the holder unit 210A of embodiment 5, indicate that the narrow width part 214a of retention groove 214 is the examples not only making a part for the top of stitch marker 212 but also mode that the part on graphic right side is inserted be formed, but certainly also can be formed in the mode making the part in graphic left side insert.And, in either case, when using the holder unit 210A of embodiment 5 to form line, as long as make holder unit 210A move to the narrow width part side being formed in arbitrary place, left and right in graphic, the chips of glass produced during line is all difficult to invade in the narrow width part 214a of retention groove 214, therefore can play extend the blade tip life-span and after suppressing line by the line decline of end face strength of substrate or the excellent effect of the inequality of rupture strength.
[embodiment 6]
Secondly, Figure 19 and Figure 20 is used to be described the holder of embodiment 6 and holder unit.In addition, Figure 19 is the stereogram of the holder unit of embodiment 6, and Figure 20 (a) is the front view of the holder unit of Figure 19, and Figure 20 (b) is the enlarged drawing of the XIXB part of Figure 20 (a).In addition, in Figure 19 and Figure 20, the component part identical to the holder unit 210 with embodiment 4 marks identical reference marks, and omits its detailed description.
The holder 211B of embodiment 6 and the holder 211 of holder unit 210B and embodiment 4 and the difference of holder unit 210 on forming be the narrow width part 214a of retention groove 214 and wide width part 214b configuration, turn upside down with wide width part 215a, 216a of support portion 215,216 of being formed and the configuration of narrow width part 215b, 216b thereupon.Namely, in the holder 211B and holder unit 210B of embodiment 6, the narrow width part 214a of retention groove 214 is formed in the below of stitch marker 212, wide width part 214b is formed in the top of stitch marker 212, wide width part 215a, 216a of support portion 215,216 are formed in the below of stitch marker 212 thereupon, and narrow width part 215b, 216b are formed in the top of stitch marker 212.In addition, the support portion 215,216 of holder 211B wide width part 215a, 216a and be formed as jump shape between narrow width part 215b, 216b.
In this case, the relative face of support portion 215,216 of holder 211B and the relative face of the relative face of wide width part 215a, 216a and narrow width part 215b, 216b are also formed all abreast.And, at narrow width part 215b, 216b of the support portion 215,216 of holder 211B, be formed with the pin-and-hole 217,218 of through each coaxially, pin 219 installs in the discontiguous mode of wide width part 215a, 216a of the support portion 215,216 with holder 211B.Therefore, gap 220 is formed between the upside of wide width part 215a, 216a in the support portion 215,216 of holder 211B and the upside of pin 219.
According to holder 211B and the holder unit 210B of the embodiment 6 of this kind of formation, if in contrast to holder 211 and the holder unit 210 of embodiment 4, then also can play and the contact area between stitch marker 212 and support portion 215,216 is tailed off and makes the installation of stitch marker 212 become easy effect.
That is, when installing stitch marker 212, a part for stitch marker 212 is inserted in the narrow width part 214a of retention groove 214, thus make pin 219 sequentially through through hole 218, the through hole of stitch marker 212, the through hole 217 of support portion 215 of support portion 216.But in the holder 211 and holder unit 210 of embodiment 4, therefore the inside that narrow width part 214a is positioned at holder 211 be difficult to fixing stitch marker 212, if reduce the external diameter of stitch marker 212, it is installed and becomes difficulty.On the other hand, according to holder 211B and the holder unit 210B of embodiment 6, the narrow width part 214a of retention groove 214 is formed in cut-out side, therefore the narrow width part 214a of the lower end being positioned at holder 211B can be utilized when installing stitch marker 212 to keep stitch marker 212 and insert pin 219, being therefore easy to installation and the replacing of carrying out stitch marker 212.
In addition, even if produce when ruling that chips of glass and this chips of glass invade retention groove 214 between narrow width part 214a and stitch marker 212, also easily can discharge because of the existence in the space between the gap 220 that is formed between the upside of wide width part 215a, 216a of the support portion 215,216 of holder 211B and pin 219 and the wide width part 214b being formed in pin 219 and retention groove 214, therefore suppress the rotatory of stitch marker 212 impaired.
Holder shown in embodiment 4 ~ 6 as above and holder unit, in the same manner as embodiment 1 ~ 3, by being arranged on the scribe head that chalker possesses, can form line to brittle substrate.In addition, the holder shown in embodiment 4 ~ 6 and holder unit also can be arranged on the fragile material cut-out cutting machine in order to manual cutting brittle material substrate.In addition, the holder shown in embodiment 4 ~ 6 also can groove shown in the inwall Application Example 1 ~ 4 of support portion.
Thus, in present embodiment, by the inwall at holder with the position of the side subtend of stitch marker on form depressed part, the generation of the malrotation that the foreign matter because entering between inwall and the side of stitch marker causes can be reduced.
In addition, in said embodiment, about the groove of the example as depressed part, illustrate only groove and be formed in compared with pin-and-hole situation by the top, even if but be formed in and also can play identical effect on the lower compared with pin-and-hole, groove also can be formed in the mode contacted with pin-and-hole in addition.In addition, in the described embodiment, the shape that illustrate only groove is the situation of arc-shaped, but also can be other curves or linearity.
In addition, described chalker 10 is devices that scribe head 21 is positioned at the top of brittle substrate 17, but also can be the chalker that scribe head is also positioned at the bottom of brittle substrate 17 and the two surface formation line up and down from brittle substrate 17.Be set as to form the formation of line from two surfaces up and down of brittle substrate 17 as so, and the operating efficiency of segmentation step can be improved.
Claims (8)
1. a holder, is characterized in that: in order to rotatably to keep disk like by rotatably inserting the pin in through hole and to be formed with the stitch marker of described through hole at center, and
Described holder comprises:
Retention groove, keeps described stitch marker;
A pair support portion, is formed by described retention groove, and has the inwall of mutual subtend; And
A pair pin-and-hole, is formed in described a pair support portion, inserts for described pin; And
Inwall in described support portion with the position of the side subtend of described stitch marker on be formed with depressed part;
Described retention groove comprises the narrow width part and the wide width part wider than described narrow width part that the part for described stitch marker inserts;
Described depressed part is described wide width part, and described pair of pin hole is formed on the position corresponding with described wide width part of described retention groove.
2. holder according to claim 1, is characterized in that:
Jump shape is formed as between described narrow width part and described wide width part.
3. holder according to claim 1, is characterized in that:
The narrow width part of described retention groove relative to described pin axle and be formed in the side contrary with the cut-out side of described holder.
4. holder according to claim 1, is characterized in that:
The narrow width part of described retention groove relative to described pin axle and be formed in the side contrary with the cut-out side of described holder and the side of left and right.
5. holder according to claim 1, is characterized in that:
The narrow width part of described retention groove relative to described pin axle and be formed in the cut-out side of described holder.
6. a holder unit, is characterized in that comprising:
Holder according to any one of claim 1 to 5;
Stitch marker, be disk like, circumferentially portion has the sword comprising inclined-plane and crestal line, and is formed with through hole at center; And
Pin, rotatably inserts in described through hole; And
Described stitch marker remains in the retention groove of described holder, and described pin inserts described through hole and described pin-and-hole and remains on described support portion.
7. a chalker, comprising:
Holder unit according to claim 6; And
Scribe head, is provided with described holder unit.
8. chalker according to claim 7, is characterized in that:
Described scribe head has the holder joint that can load and unload described holder unit.
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011226100 | 2011-10-13 | ||
| JP2011-226100 | 2011-10-13 | ||
| JP2012011060A JP5826643B2 (en) | 2012-01-23 | 2012-01-23 | Scribing wheel holder and scribing device |
| JP2012-011060 | 2012-01-23 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN103042611A CN103042611A (en) | 2013-04-17 |
| CN103042611B true CN103042611B (en) | 2015-10-28 |
Family
ID=48055577
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201210380323.9A Expired - Fee Related CN103042611B (en) | 2011-10-13 | 2012-10-09 | Holder, holder unit and chalker |
Country Status (3)
| Country | Link |
|---|---|
| KR (1) | KR101381055B1 (en) |
| CN (1) | CN103042611B (en) |
| TW (1) | TWI504576B (en) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6331701B2 (en) * | 2014-05-29 | 2018-05-30 | 三星ダイヤモンド工業株式会社 | Tool holder and groove processing device |
| JP6424652B2 (en) * | 2015-02-02 | 2018-11-21 | 三星ダイヤモンド工業株式会社 | Holder, holder unit and scribing device |
| KR102124118B1 (en) * | 2018-09-05 | 2020-06-17 | 김멋진 | Scribing Holder Unit |
| CN114590993A (en) * | 2020-12-07 | 2022-06-07 | 洛阳维路智能设备有限公司 | Operation method of glass slicing device |
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|---|---|---|---|---|
| WO2002045929A1 (en) * | 2000-12-05 | 2002-06-13 | Mitsuboshi Diamond Industrial Co., Ltd. | Tip holder |
| WO2007063979A1 (en) * | 2005-12-01 | 2007-06-07 | Mitsuboshi Diamond Industrial Co., Ltd. | Scribe device, scribe method, and chip holder |
| CN101618574A (en) * | 2008-06-30 | 2010-01-06 | 三星钻石工业股份有限公司 | Knife flywheel holding tool and holding tool unit |
| CN101774182A (en) * | 2009-01-07 | 2010-07-14 | 三星钻石工业股份有限公司 | Cutter device and cutter holder |
| CN102050565A (en) * | 2009-10-29 | 2011-05-11 | 三星钻石工业股份有限公司 | Cutter wheel keeper unit |
| CN102114671A (en) * | 2009-10-29 | 2011-07-06 | 三星钻石工业股份有限公司 | Cutter wheel holder unit |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6342101Y2 (en) * | 1984-09-08 | 1988-11-04 | ||
| JPH044028U (en) * | 1990-04-24 | 1992-01-14 | ||
| JP2008094635A (en) * | 2006-10-06 | 2008-04-24 | Citizen Seimitsu Co Ltd | Cutter holder unit and scribing device equipped with the cutter holder unit |
| JP5353085B2 (en) * | 2008-06-23 | 2013-11-27 | 三星ダイヤモンド工業株式会社 | Holder joint, holder unit, scribe head, and scribe device |
-
2012
- 2012-10-04 TW TW101136752A patent/TWI504576B/en not_active IP Right Cessation
- 2012-10-09 CN CN201210380323.9A patent/CN103042611B/en not_active Expired - Fee Related
- 2012-10-12 KR KR1020120113432A patent/KR101381055B1/en not_active IP Right Cessation
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2002045929A1 (en) * | 2000-12-05 | 2002-06-13 | Mitsuboshi Diamond Industrial Co., Ltd. | Tip holder |
| WO2007063979A1 (en) * | 2005-12-01 | 2007-06-07 | Mitsuboshi Diamond Industrial Co., Ltd. | Scribe device, scribe method, and chip holder |
| CN101618574A (en) * | 2008-06-30 | 2010-01-06 | 三星钻石工业股份有限公司 | Knife flywheel holding tool and holding tool unit |
| CN101774182A (en) * | 2009-01-07 | 2010-07-14 | 三星钻石工业股份有限公司 | Cutter device and cutter holder |
| CN102050565A (en) * | 2009-10-29 | 2011-05-11 | 三星钻石工业股份有限公司 | Cutter wheel keeper unit |
| CN102114671A (en) * | 2009-10-29 | 2011-07-06 | 三星钻石工业股份有限公司 | Cutter wheel holder unit |
Also Published As
| Publication number | Publication date |
|---|---|
| TWI504576B (en) | 2015-10-21 |
| KR101381055B1 (en) | 2014-04-04 |
| KR20130040146A (en) | 2013-04-23 |
| CN103042611A (en) | 2013-04-17 |
| TW201326072A (en) | 2013-07-01 |
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