CN102994965A - Magnetron sputtering reeling coater for large-area flexible substrate - Google Patents
Magnetron sputtering reeling coater for large-area flexible substrate Download PDFInfo
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- CN102994965A CN102994965A CN2011102688474A CN201110268847A CN102994965A CN 102994965 A CN102994965 A CN 102994965A CN 2011102688474 A CN2011102688474 A CN 2011102688474A CN 201110268847 A CN201110268847 A CN 201110268847A CN 102994965 A CN102994965 A CN 102994965A
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Abstract
The invention relates to the technical field of high-vacuum continuous reeling coaters, and concretely discloses a magnetron sputtering reeling coater for a large-area flexible substrate. The coater comprises a circular vacuum chamber, a flexible substrate reeling system and magnetron sputtering sources, wherein the circular vacuum chamber is divided into an unreeling zone, a pretreatment zone, a rolling zone and a coating zone by separation plates; a cold air blast in the flexible substrate reeling system stretches into an inner ring wall in a semicircular coating zone, and the inner ring wall is matched with the outer wall of the cold air blast; a rolling mechanism guarantees a case that a substrate is unreeled, goes through the cold air blast and then enters substrate rolling; and the magnetron sputtering sources stretch into the coating zone in the circular vacuum chamber from a direction opposite to the flexible substrate reeling system in order to coat the substrate which goes through the cold air blast. The coater enables the coating of multilayer films to be once completed, and the wrinkling of plastic substrates to be difficult; and simultaneously the circular vacuum chamber is fixed, and the flexible substrate reeling system and the magnetron sputtering sources respectively stretch into or are dragged out from the vacuum chamber from two sides, so the operation and the maintenance of the coater are convenient.
Description
Technical field
The invention belongs to high vacuum continuous coiling and coating machine technology field, be specifically related to large area flexible base material magnetic-control sputtering coiling film coating machine.
Background technology
The high vacuum continuous coating machine, the thermal evaporation coating equipment occupies dominant position all the time.It is mainly used such as the food product pack aluminium plating film, capacitor films, Industrial Metal flash plating protective membrane.In recent years flexible parent metal thermal evaporation coating process has had new application, comprises new function films such as being coated with blooming, catalytic film, high-resistant diaphragm, and the thermal evaporation continuous film plating machine has the high characteristics of production efficiency, but institute's membrane uniformity is poor, and structure is relatively simple.Along with the development of modern industrial technology, increasing for the plated film demand of flexible parent metal.Functional Requirement to institute's coatings is more and more higher, and film structure becomes increasingly complex.Magnetic-control sputtering coiling film coating machine has obtained huge development, and uses magnetron sputtering technique during plated film, because its thermal load is relatively large, the problem that causes that easily film is wrinkling to be arranged on plastics film.
Summary of the invention
The object of the present invention is to provide a kind of large area flexible base material magnetic-control sputtering coiling film coating machine, can plate multilayer film at plastic basis material, and be difficult for making plastic basis material wrinkling.
Technical scheme of the present invention is as follows: a kind of large area flexible base material magnetic-control sputtering coiling film coating machine, comprise circular vacuum chamber, flexible parent metal reel system and controlled sputtering source, wherein, circular vacuum chamber is fixed, flexible parent metal reel system and controlled sputtering source can stretch into or haul out circular vacuum chamber from the both sides of circular vacuum chamber respectively, circular vacuum chamber is separated into by division board and unreels the district, pre-treatment district and rolling district, and these three districts all are connected with diffusion pump by vacuum valve separately, in the rolling district, also be provided with the plated film district of semicircular ring cavity-like, it is positioned at middle part, circular vacuum chamber below, and be separated into several independent cavitys, and each cavity is singly connected with molecular pump; The flexible parent metal reel system comprises cold drum, base material unreels, base material rolling and mistake roller mechanism, wherein, cold drum stretches in the internal ring wall in the semicircular ring plated film district that is complementary with cold bulging outer wall, be provided with base material and unreel and the base material rolling unreeling district and rolling district left-right symmetry, unreel at base material, be provided with roller mechanism near cold drum and the base material rolling, can realize that base material unreels through entering the base material rolling behind the cold drum from base material, controlled sputtering source comprises the sputtering source that several are corresponding with plated film district cavity, and extend in several corresponding independent cavitys of plated film district the circular vacuum chamber from the direction relative with the flexible parent metal reel system, the base material through cold drum is carried out plated film.
Described excessively roller mechanism comprises that base material unreels the excessively roller A that the release base material direction is provided with, and unreel the tonometry roller that the up and down both sides of division board are provided with between district and the pre-treatment district and cross roller D, and in the middle of this division board, also be provided with roller C, simultaneously, above cold drum, be disposed with feed tension roller, nip rolls B, nip rolls A and discharging tensioning roller, and feed tension roller and discharging tensioning roller left-right symmetry, nip rolls B and nip rolls A left-right symmetry also were provided with successively roller E, crossed roller B and crossed roller F on the direction of base material rolling rolling base material.
The described base material that unreels out from base material enters the tonometry roller through guaranteeing base material to the roller A that crosses of tonometry roller cornerite angle, passed through roller C turnover pre-treatment district from tonometry roller base material out, base material passed through successively roller D, feed tension roller and nip rolls B and entered cold drum, from the cold base material that comes of bloating successively through nip rolls A, discharging tensioning roller, enter the base material rolling after crossing roller F, cross roller E and crossing roller B, wherein, feed tension roller and discharging tensioning roller all have certain relative speed difference with cold drum, can make base material be fitted in preferably cold drum surface; Nip rolls B and nip rolls A can guarantee that base material flattens before entering cold drum.
Described excessively roller D can guarantee that the base material that passed through between roller C and the mistake roller D is level, and is provided with the pre-treatment ion source below this horizontal plane, can clean substrate surface, improves the bonding force of rete and base material.
Be provided with the on-line monitoring system that product type is CTR between described excessively roller F and the mistake roller B, can carry out to the base material that plated film is finished the real-time measurement of optical property, measure optical projection and the emission parameter of film.
The described district that unreels also is provided with deep cooling water vapour capture coil pipe.
Described plated film district semicircular ring cavity is divided into six independently cavitys, and controlled sputtering source comprises six sputtering sources corresponding with plated film district cavity.
Described cold drum is connected with the cold and hot water circulation.
Unusual effect of the present invention is: a kind of large area flexible base material magnetic-control sputtering coiling film coating machine cost of the present invention is low, production efficiency is high, can once finish the plated film of assembly of thin films on plastic basis material, and be difficult for making plastic basis material wrinkling; Simultaneously, circular vacuum chamber is fixed, and flexible parent metal reel system and controlled sputtering source can stretch into or haul out circular vacuum chamber from the both sides of circular vacuum chamber respectively, make operation of equipment easy to maintenance.
Description of drawings
Fig. 1 is a kind of large area flexible base material magnetic-control sputtering coiling film coating machine of the present invention gentle isolated system structural representation of bleeding;
Fig. 2 is a kind of large area flexible base material magnetic-control sputtering coiling film coating machine schematic cross-section shown in the present;
Among the figure: 1, unreel the district; 2, pre-treatment district; 3, rolling district; 4, plated film district; 5, molecular pump; 6, diffusion pump; 7, vacuum valve; 8, division board; 9, deep cooling water vapour captures coil pipe; 10, cold drum; 11, sputtering source; 12, feed tension roller; 13, front ion processing source; 14, cross roller A; 15, base material unreels; 16, nip rolls A; 17, base material rolling; 18, cross roller B; 19, on-line monitoring system; 20, tonometry roller; 21, discharging tensioning roller; 22, cross roller C; 23, cross roller D; 24, mistake roller E, 25, mistake roller F; 26, nip rolls B.
Embodiment
Below in conjunction with drawings and the specific embodiments the present invention is described in further detail.
As shown in Figure 1 and Figure 2, a kind of large area flexible base material magnetic-control sputtering coiling film coating machine, comprise circular vacuum chamber, flexible parent metal reel system and controlled sputtering source, wherein, circular vacuum chamber is fixed, and flexible parent metal reel system and controlled sputtering source can stretch into or haul out circular vacuum chamber from the both sides of circular vacuum chamber respectively; Circular vacuum chamber unreels district 1, pre-treatment district 2 and rolling district 3 by division board 8 by counterclockwise being divided into successively, and unreeling district 1, pre-treatment district 2 is connected with the rolling district all and is connected with diffusion pump 6 by vacuum valve 7 separately, and deep cooling water vapour is installed captures coil pipe 9 unreeling district 1, in rolling district 3, also be provided with the plated film district 4 of semicircular ring cavity-like, it is positioned at middle part, circular vacuum chamber below, and be separated into six independent cavitys, and each cavity is singly connected with molecular pump 5; The flexible parent metal reel system comprises cold drum 10, base material unreels 15 and base material rolling 17, wherein, the cold drum 10 that connects the cold and hot water circulation stretches in the internal ring wall in the semicircular ring plated film district 4 that is complementary with cold drum 10 outer walls, base material unreels 15 and is symmetrical set with base material rolling 17, and extend into respectively unreel the district 1 and rolling district 3 in, base material unreels 15 directions that discharge base material and was provided with roller A14 in unreeling district 1, be respectively equipped with tonometry roller 20 in the up and down both sides that unreel the division board 8 between district 1 and the pre-treatment district 2 and cross roller D23, and pass this division board 8 and also be provided with roller C22, wherein, base material from base material unreel 15 emit after, passed through roller A14 by overtension measuring roller 20, cross roller A14 and can guarantee that base material is to the cornerite angle of tonometry roller 20, so that the observed value of tonometry roller 20 is accurate, cross centre and division board 8 formation strip crevices that roller C22 is positioned at division board 8, behind the base material process tonometry roller 20, enter pre-treatment district 2 by crossing roller C22, base material passed through roller D23, and excessively forming horizontal plane between roller C22 and the mistake roller D23, and below this horizontal plane, be provided with pre-treatment ion source 13, pre-treatment ion source 13 can clean substrate surface, improves the bonding force of rete and base material; Above cold drum 10, be disposed with feed tension roller 12, nip rolls B26, nip rolls A16 and discharging tensioning roller 21, and feed tension roller 12 and discharging tensioning roller 21 left-right symmetry, nip rolls B26 and nip rolls A16 left-right symmetry, the base material that passed through roller D23 carries out plated film through the surface that enters cold drum 10 behind feed tension roller 12 and the nip rolls B26 successively, feed tension roller 12 has certain velocity contrast with respect to cold drum 10, can make base material cold drum 10 surfaces of fitting well, nip rolls B26 between feed tension roller 12 and cold drum 10 can make base material entering cold drum 10 front flattenings, avoids base material to produce gauffer at cold drum 10; Around base material rolling 17 rolling base material directions, be provided with successively roller E24, cross roller B18 and cross roller F25, base material from cold drum 10 out after, pass through successively nip rolls A16, discharging tensioning roller 21, cross roller F25, enter base material rolling 17 after crossing roller E24 and crossing roller B18, wherein, it is poor that the relatively cold drum 10 of discharging tensioning roller 21 has certain speed, make base material cold drum 10 surfaces of can fitting well, and excessively be provided with the on-line monitoring system 18 that product type is CTR between roller F25 and the mistake roller B18, on-line monitoring system 18 can carry out to the base material that plated film is finished the real-time measurement of optical property, measures optical projection and the emission parameter of film.Controlled sputtering source comprises six sputtering sources 11, and extend in six independent cavitys in plated film district 4 the circular vacuum chamber from the direction relative with the flexible parent metal reel system, and the base material through cold drum 10 is carried out plated film.
The specific works process of a kind of large area flexible base material magnetic-control sputtering coiling film coating machine of the present invention is: circular vacuum chamber is fixed, flexible parent metal reel system and controlled sputtering source extend into the circular vacuum chamber from the both sides of circular vacuum chamber respectively, unreel district 1, pre-treatment district 2 and rolling district 3 start working by the diffusion pump 6 that vacuum valve 7 connects separately, the division in each district can make each district keep the vacuum tightness difference of an order of magnitude, simultaneously, can make plated film prepare the pumpdown time shortening, enhance productivity, plated film district 4 vacuumizes by molecular pump 5, improved the plated film district homogeneity of bleeding, reduced the pumpdown time and improved coating quality, the deep cooling water vapour trap tube 9 that arranges in unreeling district 1 can extract the on-stream water vapour of emitting of base material fast; Be arranged in and unreel district's 1 base material and unreel 15 base material and passed through roller A14 and tonometry roller 20, excessively roller C22 by division board 8 centres, enter pre-treatment district 2, after passing through roller D23, feed tension roller 12 and nip rolls B26 successively, the base material that passed through roller C22 entered into cold drum 10, crossing roller C22 and crossing the pre-treatment ion source 13 that arranges between the roller D23 and can the substrate surface before entering cold drum 10 be cleaned, improve the bonding force of rete and base material; Six sputtering sources 11 that are arranged in plated film district 4 can be to finishing the coating film treatment of six kinds of film systems by the base material on cold drum 10 surfaces, after passing through successively nip rolls A16, discharging tensioning roller 21, cross roller F25, cross roller E24 and cross roller B18, cold drum 10 base material out enters into base material rolling 17, wherein, feed tension roller 12 and discharging tensioning roller 21 all have certain relative speed difference with cold drum 10, can make base material be fitted in preferably cold drum 10 surfaces; Nip rolls B26 and nip rolls A16 can guarantee that base material is entering cold drum 10 front flattenings; The base material that passed through roller F25 can be finished by on-line monitoring system 18 the real-time measurement of coating material optical property, at the cold drum 10 that is connected with the cold and hot water circulation, cold drum 10 passes into cryogenic liquid in coating process, guarantees that film fully cools off, and prevents sputter procedure thermal load infringement base material; After plated film finishes, cold drum 10 is passed into the hot water circulation that the hydrothermal solution temperature is higher than the water vapour dew-point temperature, when flexible parent metal reel system and controlled sputtering source are hauled out from circular vacuum chamber, prevent cold bulging frosting.
Claims (8)
1. large area flexible base material magnetic-control sputtering coiling film coating machine, it is characterized in that: comprise circular vacuum chamber, flexible parent metal reel system and controlled sputtering source, wherein, circular vacuum chamber is fixed, flexible parent metal reel system and controlled sputtering source can stretch into or haul out circular vacuum chamber from the both sides of circular vacuum chamber respectively, circular vacuum chamber is separated into by division board (8) and unreels district (1), pre-treatment district (2) and rolling district (3), and these three districts all are connected with diffusion pump (6) by vacuum valve (7) separately, in rolling district (3), also be provided with the plated film district (4) of semicircular ring cavity-like, it is positioned at middle part, circular vacuum chamber below, and be separated into several independent cavitys, and each cavity is singly connected with molecular pump (5); The flexible parent metal reel system comprises cold drum (10), base material unreels (15), base material rolling (17) and mistake roller mechanism, wherein, cold drum (10) stretches in the internal ring wall in the semicircular ring plated film district (4) that is complementary with cold drum (10) outer wall, be provided with base material and unreel (15) and base material rolling (17) unreeling district (1) and rolling district (3) left-right symmetry, unreel at base material (15), be provided with roller mechanism near cold drum (10) and the base material rolling (17), can realize that base material enters base material rolling (17) after base material unreels (15) the cold drums of process (10), controlled sputtering source comprises the sputtering source (11) that several are corresponding with plated film district cavity, and extend in several corresponding independent cavitys of plated film district (4) the circular vacuum chamber from the direction relative with the flexible parent metal reel system, the base material through cold drum (10) is carried out plated film.
2. a kind of large area flexible base material magnetic-control sputtering coiling film coating machine according to claim 1, it is characterized in that: described excessively roller mechanism comprises that base material unreels (15) and discharges the excessively roller A (14) that base material direction is provided with, and the tonometry roller (20) that is provided with of the up and down both sides that unreel division board (8) between district (1) and pre-treatment district (2) and cross roller D (23), and in the middle of this division board (8), also be provided with roller C (22), simultaneously, be disposed with feed tension roller (12) in cold drum (10) top, nip rolls B (26), nip rolls A (16) and discharging tensioning roller (21), and feed tension roller (12) and discharging tensioning roller (21) left-right symmetry, nip rolls B (26) and nip rolls A (16) left-right symmetry also were provided with roller E (24) successively on the direction of base material rolling (17) rolling base material, cross roller B (18) and cross roller F (25).
3. a kind of large area flexible base material magnetic-control sputtering coiling film coating machine according to claim 2, it is characterized in that: describedly unreel (15) base material out from base material and through guaranteeing base material the roller A (14) that crosses of tonometry roller (20) cornerite angle is entered tonometry roller (20), passed through roller C (22) turnover pre-treatment district (2) from tonometry roller (20) base material out, base material passed through roller D (23) successively, feed tension roller (12) and nip rolls B (26) enter cold drum (10), pass through successively nip rolls A (16) from cold drum (10) base material out, discharging tensioning roller (21), cross roller F (25), enter base material rolling (17) after crossing roller E (24) and crossing roller B (18), wherein, feed tension roller (12) and discharging tensioning roller (21) all have certain relative speed difference with cold drum (10), can make base material be fitted in preferably cold drum (10) surface; Nip rolls B (26) and nip rolls A (16) can guarantee that base material is entering the front flattening of cold drum (10).
4. a kind of large area flexible base material magnetic-control sputtering coiling film coating machine according to claim 2, it is characterized in that: described excessively roller D (23) can guarantee that the base material that passed through between roller C (22) and the mistake roller D (23) is level, and below this horizontal plane, be provided with pre-treatment ion source (13), can clean substrate surface, improve the bonding force of rete and base material.
5. a kind of large area flexible base material magnetic-control sputtering coiling film coating machine according to claim 2, it is characterized in that: be provided with the on-line monitoring system that product type is CTR (18) between described excessively roller F (25) and the mistake roller B (18), can carry out to the base material that plated film is finished the real-time measurement of optical property, measure optical projection and the emission parameter of film.
6. a kind of large area flexible base material magnetic-control sputtering coiling film coating machine according to claim 1 is characterized in that: the described district (1) that unreels also is provided with deep cooling water vapour and captures coil pipe (9).
7. a kind of large area flexible base material magnetic-control sputtering coiling film coating machine according to claim 1, it is characterized in that: described plated film district (4) semicircular ring cavity is divided into six independently cavitys, and controlled sputtering source comprises six sputtering sources (11) corresponding with plated film district cavity.
8. described any one large area flexible base material magnetic-control sputtering coiling film coating machine according to claim 1～7 is characterized in that: described cold drum (10) is connected with the cold and hot water circulation.
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| CN201110268847.4A CN102994965B (en) | 2011-09-13 | 2011-09-13 | Magnetron sputtering reeling coater for large-area flexible substrate |
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| CN201110268847.4A CN102994965B (en) | 2011-09-13 | 2011-09-13 | Magnetron sputtering reeling coater for large-area flexible substrate |
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| CN102994965B CN102994965B (en) | 2014-10-01 |
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| CN104651792A (en) * | 2015-03-09 | 2015-05-27 | 常州工学院 | Single-sided continuous winding magnetron sputtering coating automatic production line for flexible substrate |
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| CN103436844A (en) * | 2013-08-19 | 2013-12-11 | 肇庆市腾胜真空技术工程有限公司 | Coating device and method for depositing flexible substrate ITO film at low temperature |
| CN104674181A (en) * | 2015-02-09 | 2015-06-03 | 常州工学院 | Magnetron sputtering winding coating machine capable of exchanging target quickly and coating film continuously in reciprocating mode |
| CN104611678A (en) * | 2015-02-12 | 2015-05-13 | 安徽方兴光电新材料科技有限公司 | Online film flatness control device in flexible winding coating |
| CN104651792A (en) * | 2015-03-09 | 2015-05-27 | 常州工学院 | Single-sided continuous winding magnetron sputtering coating automatic production line for flexible substrate |
| CN104775102A (en) * | 2015-05-04 | 2015-07-15 | 上海产业技术研究院 | Vacuum coating system combining reel-to-reel magnetron sputtering cathode and columnar multi-arc source |
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| CN105239052A (en) * | 2015-11-17 | 2016-01-13 | 广东腾胜真空技术工程有限公司 | Double-release and double-collection winding film coating device and method |
| CN106011773A (en) * | 2016-06-20 | 2016-10-12 | 广东振华科技股份有限公司 | EMI shielding film magnetic control winding coating machine |
| CN105970181B (en) * | 2016-06-27 | 2019-07-12 | 广东腾胜真空技术工程有限公司 | Enhanced magnetron sputtering coil film coating device and method |
| CN105970181A (en) * | 2016-06-27 | 2016-09-28 | 广东腾胜真空技术工程有限公司 | Reinforced magnetron-sputtering winding coating device and method |
| CN106222627A (en) * | 2016-09-22 | 2016-12-14 | 铜陵市铜创电子科技有限公司 | A kind of metallized film vacuum coating equipment |
| CN106381468A (en) * | 2016-09-22 | 2017-02-08 | 铜陵市铜创电子科技有限公司 | Preheating vacuum coating mechanism used for metallized film processing |
| CN106381468B (en) * | 2016-09-22 | 2019-02-01 | 铜陵市铜创电子科技有限公司 | A kind of metallized film processing preheating vacuum film coating mechanism |
| CN106222627B (en) * | 2016-09-22 | 2019-02-01 | 铜陵市铜创电子科技有限公司 | A kind of metallized film vacuum coating equipment |
| CN108165949A (en) * | 2018-03-06 | 2018-06-15 | 广东中钛节能科技有限公司 | Magnetic-control sputtering coiling film coating machine |
| CN108165949B (en) * | 2018-03-06 | 2024-04-19 | 广东中钛节能科技有限公司 | Magnetron sputtering winding film plating machine |
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| CN115064383A (en) * | 2022-07-06 | 2022-09-16 | 六和电子（江西）有限公司 | High-temperature and high-humidity resistant metallized film and preparation method thereof |
| CN115433917A (en) * | 2022-10-18 | 2022-12-06 | 北京北方华创真空技术有限公司 | Main drum assembly and vacuum coating equipment applying same |
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