CN102955188B - 彩色滤光片、液晶显示元件及彩色滤光片的制造方法 - Google Patents

彩色滤光片、液晶显示元件及彩色滤光片的制造方法 Download PDF

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CN102955188B
CN102955188B CN201210295610.XA CN201210295610A CN102955188B CN 102955188 B CN102955188 B CN 102955188B CN 201210295610 A CN201210295610 A CN 201210295610A CN 102955188 B CN102955188 B CN 102955188B
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CN102955188A (zh
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铃木康伸
本田晃久
奥田务
一户大吾
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JSR Corp
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JSR Corp
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/201—Filters in the form of arrays
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Nonlinear Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Liquid Crystal (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
CN201210295610.XA 2011-08-17 2012-08-14 彩色滤光片、液晶显示元件及彩色滤光片的制造方法 Active CN102955188B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2011178656A JP5708363B2 (ja) 2011-08-17 2011-08-17 カラーフィルタ、液晶表示素子およびカラーフィルタの製造方法
JP2011-178656 2011-08-17

Publications (2)

Publication Number Publication Date
CN102955188A CN102955188A (zh) 2013-03-06
CN102955188B true CN102955188B (zh) 2015-12-09

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CN201210295610.XA Active CN102955188B (zh) 2011-08-17 2012-08-14 彩色滤光片、液晶显示元件及彩色滤光片的制造方法

Country Status (4)

Country Link
JP (1) JP5708363B2 (ja)
KR (1) KR101842085B1 (ja)
CN (1) CN102955188B (ja)
TW (1) TWI541601B (ja)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5826135B2 (ja) * 2012-08-23 2015-12-02 富士フイルム株式会社 着色感放射線性組成物、これを用いたカラーフィルタ
TWI489212B (zh) 2013-03-29 2015-06-21 Chi Mei Corp Photosensitive resin composition and its application
CN103744236B (zh) * 2013-12-27 2016-02-24 深圳市华星光电技术有限公司 像素结构
TWI693470B (zh) * 2015-06-30 2020-05-11 日商富士軟片股份有限公司 感光性樹脂組成物、硬化膜的製造方法、硬化膜及液晶顯示裝置
KR20180082540A (ko) * 2015-11-11 2018-07-18 롤릭 테크놀로지스 아게 광-정렬가능 물질의 조성물
JP6969086B2 (ja) * 2015-12-28 2021-11-24 Jsr株式会社 カラーフィルタ、カラーフィルタの製造方法、表示素子および保護膜形成用樹脂組成物
KR20180037105A (ko) * 2016-10-03 2018-04-11 가부시키가이샤 한도오따이 에네루기 켄큐쇼 표시 장치, 표시 모듈, 및 표시 장치의 제작 방법
KR102572711B1 (ko) * 2016-11-15 2023-08-30 동우 화인켐 주식회사 착색 감광성 수지 조성물, 컬러 필터 및 이를 구비한 화상 표시 장치
KR102661122B1 (ko) * 2016-11-21 2024-04-26 삼성디스플레이 주식회사 표시 장치 및 이의 제조 방법
EP3805820B1 (en) * 2018-05-31 2024-04-17 Toppan Printing Co., Ltd. Coloring composition and method for producing color filter for use in solid-state imaging element
JP2021179451A (ja) * 2018-07-23 2021-11-18 Jsr株式会社 カラーフィルタ、液晶表示素子およびカラーフィルタの製造方法
CN109358390B (zh) * 2018-10-30 2024-03-22 东莞市谷麦光学科技有限公司 一种出光均匀的导光组件
CN110989066B (zh) * 2019-12-20 2022-01-11 京东方科技集团股份有限公司 偏光片、其制作方法及显示装置

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1414048A (zh) * 2001-10-25 2003-04-30 捷时雅株式会社 形成保护膜用固化性组合物、该膜的形成方法和该膜
JP4178812B2 (ja) * 2002-02-25 2008-11-12 凸版印刷株式会社 カラーフィルタの製造方法及びそれを用いて作製したカラーフィルタ
CN101498894A (zh) * 2008-01-28 2009-08-05 富士胶片株式会社 感光性树脂组合物、光间隔物、保护膜、着色图案、显示装置及其基板
CN101779159A (zh) * 2007-08-21 2010-07-14 Jsr株式会社 液晶取向剂、液晶取向膜的制造方法以及液晶显示元件

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* Cited by examiner, † Cited by third party
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JP2003066604A (ja) * 2001-08-28 2003-03-05 Jsr Corp スペーサー用感放射線性樹脂組成物、スペーサーおよび液晶表示素子
JP2003131021A (ja) * 2001-10-30 2003-05-08 Dainippon Ink & Chem Inc カラーフィルターの製造方法
KR100955570B1 (ko) * 2006-09-18 2010-04-30 주식회사 엘지화학 저온 경화형 보호막 형성용 조성물, 이로부터 제조되는보호막, 및 이를 포함하는 기재
JP2008208342A (ja) * 2007-01-31 2008-09-11 Toray Ind Inc 樹脂組成物、硬化膜、および硬化膜を有するカラーフィルタ
CN101815966B (zh) * 2007-08-21 2012-04-04 Jsr株式会社 液晶取向剂、液晶取向膜的形成方法以及液晶显示元件

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1414048A (zh) * 2001-10-25 2003-04-30 捷时雅株式会社 形成保护膜用固化性组合物、该膜的形成方法和该膜
JP4178812B2 (ja) * 2002-02-25 2008-11-12 凸版印刷株式会社 カラーフィルタの製造方法及びそれを用いて作製したカラーフィルタ
CN101779159A (zh) * 2007-08-21 2010-07-14 Jsr株式会社 液晶取向剂、液晶取向膜的制造方法以及液晶显示元件
CN101498894A (zh) * 2008-01-28 2009-08-05 富士胶片株式会社 感光性树脂组合物、光间隔物、保护膜、着色图案、显示装置及其基板

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Publication number Publication date
KR20130020594A (ko) 2013-02-27
JP2013041165A (ja) 2013-02-28
TW201310170A (zh) 2013-03-01
CN102955188A (zh) 2013-03-06
KR101842085B1 (ko) 2018-03-26
JP5708363B2 (ja) 2015-04-30
TWI541601B (zh) 2016-07-11

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