CN102937767A - Array substrate, display device and manufacturing method of array substrate - Google Patents

Array substrate, display device and manufacturing method of array substrate Download PDF

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Publication number
CN102937767A
CN102937767A CN2012104213224A CN201210421322A CN102937767A CN 102937767 A CN102937767 A CN 102937767A CN 2012104213224 A CN2012104213224 A CN 2012104213224A CN 201210421322 A CN201210421322 A CN 201210421322A CN 102937767 A CN102937767 A CN 102937767A
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metal wire
array base
public electrode
base palte
pixel cell
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CN2012104213224A
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CN102937767B (en
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木素真
李成
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BOE Technology Group Co Ltd
Beijing BOE Optoelectronics Technology Co Ltd
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Beijing BOE Optoelectronics Technology Co Ltd
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Abstract

The invention discloses an array substrate, a display device and a manufacturing method of the array substrate, relating to the technical field of liquid crystal display. According to the invention, the resistance of a common electrode is reduced, and the uniformity of the voltage of the common electrode is enhanced. The array substrate comprises a plurality of pixel units, wherein each pixel unit comprises a pixel electrode, a common electrode and a metal wire, and the metal wire is positioned on a layer different from a common electrode layer; an insulating layer is arranged between the metal wire layer and the common electrode layer, and the insulating layer is provided with a plurality of through holes in a metal wire area; and the metal wire is connected with the common electrode through the through holes. The display device comprises the array substrate.

Description

The method for making of array base palte, display device and array base palte
Technical field
The present invention relates to technical field of liquid crystal display, relate in particular to the method for making of a kind of array base palte, display device and array base palte.
Background technology
In the present liquid crystal display, for the multiple situation of being provided with of public electrode in the panel, wherein a kind of is that public electrode is arranged in the color membrane substrates, also having a kind of is that public electrode and pixel electrode all are arranged at situation on the array base palte, senior super dimension field switch (Advanced-Super DimensionalSwitching, be called for short ADS) technology for example.The ADS technology is that the electric field that the electric field that produces by gap electrode edge in the same plane and gap electrode layer and plate electrode interlayer produce forms multi-dimensional electric field, makes in the liquid crystal cell between gap electrode, all aligned liquid-crystal molecules can both produce rotation directly over the electrode.
Yet for situation about public electrode and pixel electrode all being arranged on the array base palte, public electrode has larger resistance, and because the area of public electrode is larger, so that the homogeneity of public electrode voltages is relatively poor.
Summary of the invention
Embodiments of the invention provide the method for making of a kind of array base palte, display device and array base palte, have reduced the resistance of public electrode, and have improved the homogeneity of public electrode voltages.
For solving the problems of the technologies described above, embodiments of the invention adopt following technical scheme:
A kind of array base palte comprises a plurality of pixel cells, and each described pixel cell comprises pixel electrode and public electrode, also comprises:
Be positioned at the metal wire of different layers with described public electrode;
Be provided with insulation course between described metal wire place layer and the described public electrode place layer;
Described insulation course has a plurality of via holes at the region division of described metal wire, and described metal wire is connected with described public electrode by described via hole.
Further, described metal wire is between adjacent pixel cell.
Further, described via hole is arranged at the overlapping zone of grid line and described metal wire.
Further, described metal wire is arranged between the two adjacent row pixel cells.
Further, every two row pixel cells the described metal wire of one row is set.
Further, every row pixel cell is divided into a plurality of pixel cell groups, and each pixel cell group is comprised of two adjacent pixel cells;
Every row pixel cell top is provided with the first grid line, every row pixel cell below is provided with the second grid line, described the first grid line and the second grid line are used for driving respectively two pixel cells of described each pixel cell group, and two pixel cells in each pixel cell group are connected in the same data line;
Be provided with the virtual data line between the adjacent pixel cell group, described metal wire is described virtual data line.
Further, described via hole is arranged at the zone of the first grid line and the second grid line and described virtual data line overlap adjacent between the adjacent two row pixel cells.
A kind of display device comprises above-mentioned array base palte.
A kind of manufacture method of array base palte comprises:
Form the pattern that comprises grid line at substrate;
Form the first insulation course at the substrate that forms above-mentioned pattern;
Form the pattern that comprises data line, metal wire and pixel electrode at the substrate that forms above-mentioned pattern;
Form the second insulation course at the substrate that forms above-mentioned pattern, and by composition technique, form a plurality of via holes at described the second insulation course;
Form the pattern that comprises public electrode at the substrate that forms above-mentioned pattern, described public electrode is connected with described metal wire by described via hole.
The method for making of the array base palte in the embodiment of the invention, display device and array base palte, owing to interconnect by a plurality of positions of a plurality of via holes with metal wire and public electrode, it is in parallel to be equivalent to metal wire and public electrode, therefore reduce the resistance of public electrode, and improved the homogeneity of public electrode voltages.
Description of drawings
In order to be illustrated more clearly in the embodiment of the invention or technical scheme of the prior art, the below will do to introduce simply to the accompanying drawing of required use in embodiment or the description of the Prior Art, apparently, accompanying drawing in the following describes only is some embodiments of the present invention, for those of ordinary skills, under the prerequisite of not paying creative work, can also obtain according to these accompanying drawings other accompanying drawing.
Fig. 1 is the structural representation of a kind of array base palte in the embodiment of the invention;
Fig. 2 is the structural representation of another kind of array base palte in the embodiment of the invention;
Fig. 3 be among Fig. 2 AA ' to sectional view;
Fig. 4 be among Fig. 2 BB ' to sectional view;
Fig. 5 is the manufacture method process flow diagram of a kind of array base palte in the embodiment of the invention.
Description of reference numerals:
The 1-pixel electrode; The 2-public electrode; The 3-metal wire; The 4-via hole; The 5-data line; The 6-grid line.7-the second insulation course; 8-pixel cell group; The 9-glass substrate; 10-the first insulation course.
Embodiment
Below in conjunction with the accompanying drawing in the embodiment of the invention, the technical scheme in the embodiment of the invention is clearly and completely described, obviously, described embodiment only is the present invention's part embodiment, rather than whole embodiment.Based on the embodiment among the present invention, those of ordinary skills belong to the scope of protection of the invention not making the every other embodiment that obtains under the creative work prerequisite.
As shown in Figure 1, the embodiment of the invention provides a kind of array base palte, comprise longitudinally data line 5 and horizontal grid line 6, data line 5 and a plurality of pixel cells of grid line 6 intersection definition, each pixel cell comprises pixel electrode 1 and public electrode 2, the point-like fill area is public electrode 2 among Fig. 1, public electrode 2 is also arranged to be communicated with the public electrode in each pixel cell in the position of data line 5 and grid line 6, pixel electrode 1 in each pixel cell and public electrode 2 are respectively tabular and slit-shaped, this array base palte also comprises: be positioned at the metal wire 3 of different layers with public electrode 2, particularly, metal wire 3 can be line longitudinally as shown in Figure 1, also can be horizontal line; Be provided with insulation course between metal wire 3 place layers and the public electrode 2 place layers; Insulation course has a plurality of via holes 4 at the region division of metal wire 3, and metal wire 3 is connected with public electrode 2 by via hole 4, and a plurality of via holes 4 are positioned at the viewing area.
Need to prove that except the pixel electrode in each pixel cell 1 shown in Fig. 1 is tabular, public electrode 2 is situations of slit-shaped, can also be slit-shaped for pixel electrode 1, and public electrode 2 is tabular situations.
Array base palte in the embodiment of the invention, owing to interconnect by a plurality of positions of a plurality of via holes with metal wire and public electrode, it is in parallel to be equivalent to metal wire and public electrode, has not only reduced the resistance of public electrode, and has improved the homogeneity of public electrode voltages.
Further, metal wire 3 can be between adjacent pixel cell.Metal wire 3 can be blocked by the black matrix at data line and grid line place, can not affect transmitance.
Further, as shown in Figure 2, via hole 4 can be arranged at the position in the overlapping zone of grid line 6 and metal wire 3, is convenient to block via hole 4 by the black matrix at grid line 6 places.
Further, metal wire 3 is arranged between the two adjacent row pixel cells.Metal wire 3 concrete number and distribution modes can require according to the homogeneity of cost and public electrode voltages to arrange.
Further, every two row pixel cells one row metal wire 3 is set.
As shown in Figure 2, particularly, above-mentioned array base palte can be double grid (Dual Gate) array base palte, namely drives pixel with delegation by two grid lines 6, the quantity of data line 5 can be reduced by half like this, thereby has reduced the number of data I C joint.In the double grid array base palte, every row pixel cell is divided into a plurality of pixel cell groups 8, and each pixel cell group 8 is comprised of two adjacent pixel cells; Every row pixel cell top is provided with the first grid line, every row pixel cell below is provided with the second grid line, the first grid line and the second grid line are used for driving respectively two pixel cells of each pixel cell group 8, and two pixel cells in each pixel cell group 8 are connected in same data line 5; Be provided with virtual data line (Dummy Data Line) between the adjacent pixel cell group 8, the virtual data line does not have actual effect in the process that drives.Above-mentioned metal wire 3 can be the virtual data line.Can effectively utilize so originally in the driving process, do not have practical function the virtual data line as metal wire 3 with the resistance that reduces public electrode and the homogeneity that improves public electrode voltages.
Accordingly, in the double grid array base palte, be provided with two row grid lines 6 between the two adjacent row pixel cells; Via hole 4 is arranged at the zone of the first grid line and the second grid line and virtual data line overlap adjacent between the adjacent two row pixel cells.This is because the virtual data line is thinner, do not need too large-sized black matrix to block, need larger size and make via hole, if other positions at the virtual data line make via hole 4, then need the black matrix of large-size to block, thereby reduced transmitance, and therefore the size of two row grid lines 6 can not reduce transmitance enough greatly to cover via hole 4.
Need to prove, can delegation's via hole 4 all be set at every delegation pixel cell, delegation's via hole 4 perhaps just is set in every line.Above-mentioned via hole 4 does not need extra mask (Mask) manufacturing process, because the viewing area of array base palte periphery just needs to make via hole usually, the figure that only need to increase above-mentioned via hole 4 in original mask plate can be realized.Array base palte in the embodiment of the invention is applicable to various public electrode and pixel electrode all are arranged in the display device on the array base palte, for example adopt the screen of ADS technology or adopt plane conversion (In-Plane Switching, abbreviation IPS) screen of technology, for different application, the improvement technology of ADS technology has high permeability I-ADS technology, high aperture H-ADS and high resolving power S-ADS technology etc., and the array base palte that the embodiment of the invention provides is for adopting the array base palte of HADS technology display device.
Array base palte in the embodiment of the invention, owing to interconnect by a plurality of positions of a plurality of via holes with metal wire and public electrode, it is in parallel to be equivalent to metal wire and public electrode, has not only reduced the resistance of public electrode, and has improved the homogeneity of public electrode voltages.
The embodiment of the invention also provides a kind of display device, comprises above-mentioned array base palte.
Display device in the embodiment of the invention, because array base palte interconnects by a plurality of positions of a plurality of via holes with metal wire and public electrode, it is in parallel to be equivalent to metal wire and public electrode, has not only reduced the resistance of public electrode, and has improved the homogeneity of public electrode voltages.
Shown in Figure 5, the embodiment of the invention also provides a kind of manufacture method of array base palte, can be for the manufacture of the array base palte in the various embodiments described above, and this manufacture method comprises:
Step 101, with reference to figure 2, Fig. 3 and shown in Figure 4, form the pattern that comprises grid line 6 at glass substrate 9;
Step 102, form the first insulation course 10 at the substrate that forms above-mentioned pattern;
Step 103, form the pattern that comprises data line, metal wire 3 and pixel electrode 1 at the substrate that forms above-mentioned pattern;
Step 104, form the second insulation course 7 at the substrate that forms above-mentioned pattern, and by composition technique, form a plurality of via holes 4 at the second insulation course 7;
Step 105, form the pattern that comprises public electrode 2 at the substrate that forms above-mentioned pattern, public electrode 2 is connected with metal wire 3 by via hole 4.
Concrete array base-plate structure is same as the previously described embodiments, does not repeat them here.
The method for making of array base palte in the embodiment of the invention, because array base palte interconnects by a plurality of positions of a plurality of via holes with metal wire and public electrode, it is in parallel to be equivalent to metal wire and public electrode, has not only reduced the resistance of public electrode, and has improved the homogeneity of public electrode voltages.
In addition, for the array base palte of the pixel electrode that for example adopts the ADS technology above public electrode, also can adopt and the similar manufacture method of the embodiment of the invention, difference only is to make first the pattern that comprises public electrode, form insulation course at the substrate that forms above-mentioned pattern, and by composition technique, form a plurality of via holes at this insulation course, form the pattern that comprises metal wire at the substrate that forms above-mentioned pattern, metal wire is connected with public electrode by described via hole.
The above; be the specific embodiment of the present invention only, but protection scope of the present invention is not limited to this, anyly is familiar with those skilled in the art in the technical scope that the present invention discloses; can expect easily changing or replacing, all should be encompassed within protection scope of the present invention.Therefore, protection scope of the present invention should be as the criterion with the protection domain of described claim.

Claims (9)

1. an array base palte comprises a plurality of pixel cells, and each described pixel cell comprises pixel electrode and public electrode, it is characterized in that, also comprises:
Be positioned at the metal wire of different layers with described public electrode;
Be provided with insulation course between described metal wire place layer and the described public electrode place layer;
Described insulation course has a plurality of via holes at the region division of described metal wire, and described metal wire is connected with described public electrode by described via hole.
2. array base palte according to claim 1 is characterized in that,
Described metal wire is between adjacent pixel cell.
3. array base palte according to claim 1 is characterized in that,
Described via hole is arranged at the overlapping zone of grid line and described metal wire.
4. array base palte according to claim 2 is characterized in that,
Described metal wire is arranged between the two adjacent row pixel cells.
5. array base palte according to claim 2 is characterized in that,
Every two row pixel cells the described metal wire of one row is set.
6. according to claim 1 to 5 arbitrary described array base paltes, it is characterized in that,
Every row pixel cell is divided into a plurality of pixel cell groups, and each pixel cell group is comprised of two adjacent pixel cells;
Every row pixel cell top is provided with the first grid line, every row pixel cell below is provided with the second grid line, described the first grid line and the second grid line are used for driving respectively two pixel cells of described each pixel cell group, and two pixel cells in each pixel cell group are connected in the same data line;
Be provided with the virtual data line between the adjacent pixel cell group, described metal wire is described virtual data line.
7. array base palte according to claim 6 is characterized in that,
Described via hole is arranged at the zone of the first grid line and the second grid line and described virtual data line overlap adjacent between the adjacent two row pixel cells.
8. a display device is characterized in that, comprises arbitrary described array base palte such as claim 1-7.
9. the manufacture method of an array base palte is characterized in that, comprising:
Form the pattern that comprises grid line at substrate;
Form the first insulation course at the substrate that forms above-mentioned pattern;
Form the pattern that comprises data line, metal wire and pixel electrode at the substrate that forms above-mentioned pattern;
Form the second insulation course at the substrate that forms above-mentioned pattern, and by composition technique, form a plurality of via holes at described the second insulation course;
Form the pattern that comprises public electrode at the substrate that forms above-mentioned pattern, described public electrode is connected with described metal wire by described via hole.
CN201210421322.4A 2012-10-29 2012-10-29 The method for making of array base palte, display device and array base palte Active CN102937767B (en)

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Cited By (16)

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CN103474436A (en) * 2013-09-18 2013-12-25 京东方科技集团股份有限公司 Array substrate, manufacturing method thereof and display device
CN103839888A (en) * 2014-02-27 2014-06-04 京东方科技集团股份有限公司 Array substrate, manufacturing method thereof and displaying device
CN104199220A (en) * 2014-07-10 2014-12-10 合肥鑫晟光电科技有限公司 Display panel and display device
CN104345506A (en) * 2013-07-30 2015-02-11 三星显示有限公司 Display apparatus
CN104598089A (en) * 2013-05-31 2015-05-06 京东方科技集团股份有限公司 Array substrate, touch screen, drive method and display device
CN104730781A (en) * 2015-03-27 2015-06-24 京东方科技集团股份有限公司 ADS array substrate, manufacturing method thereof, and display device comprising same
CN105204251A (en) * 2015-08-28 2015-12-30 重庆京东方光电科技有限公司 Display base plate and manufacturing method thereof as well as display device
CN105607369A (en) * 2016-01-05 2016-05-25 京东方科技集团股份有限公司 Array substrate, liquid crystal display panel and display device
CN106773372A (en) * 2016-12-30 2017-05-31 深圳市华星光电技术有限公司 Common electrode structure, liquid crystal display panel and preparation method
CN106855670A (en) * 2017-02-28 2017-06-16 厦门天马微电子有限公司 Array base palte, display panel and display device
WO2018126509A1 (en) * 2017-01-03 2018-07-12 深圳市华星光电技术有限公司 Ffs mode array substrate and manufacturing method therefor
CN108983484A (en) * 2018-08-06 2018-12-11 深圳市华星光电技术有限公司 A kind of colored filter and preparation method, display device
WO2019056992A1 (en) * 2017-09-22 2019-03-28 京东方科技集团股份有限公司 Pixel structure, array substrate and display device
CN111948848A (en) * 2020-08-06 2020-11-17 Tcl华星光电技术有限公司 Display panel and display device
CN113934032A (en) * 2020-06-29 2022-01-14 京东方科技集团股份有限公司 Display panel, manufacturing method thereof and display device
CN114911102A (en) * 2022-04-08 2022-08-16 上海天马微电子有限公司 Display panel, manufacturing method thereof and display device

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CN104598089A (en) * 2013-05-31 2015-05-06 京东方科技集团股份有限公司 Array substrate, touch screen, drive method and display device
CN104598089B (en) * 2013-05-31 2017-12-08 京东方科技集团股份有限公司 Array base palte, touch-screen and driving method and display device
CN104345506A (en) * 2013-07-30 2015-02-11 三星显示有限公司 Display apparatus
WO2015039389A1 (en) * 2013-09-18 2015-03-26 京东方科技集团股份有限公司 Array substrate, manufacturing method therefor and display device
US10050061B2 (en) 2013-09-18 2018-08-14 Boe Technology Group Co., Ltd. Array substrate and manufacturing method thereof, display device
CN103474436B (en) * 2013-09-18 2016-03-09 京东方科技集团股份有限公司 A kind of array base palte and preparation method thereof, display unit
CN103474436A (en) * 2013-09-18 2013-12-25 京东方科技集团股份有限公司 Array substrate, manufacturing method thereof and display device
CN103839888B (en) * 2014-02-27 2017-03-15 京东方科技集团股份有限公司 A kind of array base palte and preparation method thereof, display device
CN103839888A (en) * 2014-02-27 2014-06-04 京东方科技集团股份有限公司 Array substrate, manufacturing method thereof and displaying device
CN104199220A (en) * 2014-07-10 2014-12-10 合肥鑫晟光电科技有限公司 Display panel and display device
CN104730781A (en) * 2015-03-27 2015-06-24 京东方科技集团股份有限公司 ADS array substrate, manufacturing method thereof, and display device comprising same
CN105204251B (en) * 2015-08-28 2019-07-02 重庆京东方光电科技有限公司 A kind of display base plate and preparation method thereof and display device
CN105204251A (en) * 2015-08-28 2015-12-30 重庆京东方光电科技有限公司 Display base plate and manufacturing method thereof as well as display device
CN105607369B (en) * 2016-01-05 2019-03-26 京东方科技集团股份有限公司 A kind of array substrate, liquid crystal display panel and display device
CN105607369A (en) * 2016-01-05 2016-05-25 京东方科技集团股份有限公司 Array substrate, liquid crystal display panel and display device
US10139686B2 (en) 2016-01-05 2018-11-27 Boe Technology Group Co., Ltd. Array substrate, liquid crystal display panel and display device
CN106773372A (en) * 2016-12-30 2017-05-31 深圳市华星光电技术有限公司 Common electrode structure, liquid crystal display panel and preparation method
CN106773372B (en) * 2016-12-30 2019-12-31 深圳市华星光电技术有限公司 Common electrode structure, liquid crystal display panel and manufacturing method
WO2018126509A1 (en) * 2017-01-03 2018-07-12 深圳市华星光电技术有限公司 Ffs mode array substrate and manufacturing method therefor
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US10921655B2 (en) 2017-09-22 2021-02-16 Chongqing Boe Optoelectronics Technology Co., Ltd. Pixel structure having multiple strip electrodes
WO2019056992A1 (en) * 2017-09-22 2019-03-28 京东方科技集团股份有限公司 Pixel structure, array substrate and display device
CN108983484A (en) * 2018-08-06 2018-12-11 深圳市华星光电技术有限公司 A kind of colored filter and preparation method, display device
CN113934032A (en) * 2020-06-29 2022-01-14 京东方科技集团股份有限公司 Display panel, manufacturing method thereof and display device
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CN111948848A (en) * 2020-08-06 2020-11-17 Tcl华星光电技术有限公司 Display panel and display device
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