CN102923936A - Etching device - Google Patents

Etching device Download PDF

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Publication number
CN102923936A
CN102923936A CN2011102298897A CN201110229889A CN102923936A CN 102923936 A CN102923936 A CN 102923936A CN 2011102298897 A CN2011102298897 A CN 2011102298897A CN 201110229889 A CN201110229889 A CN 201110229889A CN 102923936 A CN102923936 A CN 102923936A
Authority
CN
China
Prior art keywords
etching
etching system
liquid storage
storage spare
tumbler
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CN2011102298897A
Other languages
Chinese (zh)
Other versions
CN102923936B (en
Inventor
刘咸柱
陈钜盛
肖兴荣
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fulian Yuzhan Technology Shenzhen Co Ltd
Original Assignee
Shenzhen Yuzhan Precision Technology Co ltd
Hon Hai Precision Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shenzhen Yuzhan Precision Technology Co ltd, Hon Hai Precision Industry Co Ltd filed Critical Shenzhen Yuzhan Precision Technology Co ltd
Priority to CN201110229889.7A priority Critical patent/CN102923936B/en
Priority to TW100129472A priority patent/TWI412502B/en
Priority to US13/299,438 priority patent/US20130037214A1/en
Publication of CN102923936A publication Critical patent/CN102923936A/en
Application granted granted Critical
Publication of CN102923936B publication Critical patent/CN102923936B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B13/00—Machines or plants for applying liquids or other fluent materials to surfaces of objects or other work by spraying, not covered by groups B05B1/00 - B05B11/00
    • B05B13/02—Means for supporting work; Arrangement or mounting of spray heads; Adaptation or arrangement of means for feeding work
    • B05B13/04—Means for supporting work; Arrangement or mounting of spray heads; Adaptation or arrangement of means for feeding work the spray heads being moved during spraying operation
    • B05B13/0442—Installation or apparatus for applying liquid or other fluent material to separate articles rotated during spraying operation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B3/00—Spraying or sprinkling apparatus with moving outlet elements or moving deflecting elements
    • B05B3/02—Spraying or sprinkling apparatus with moving outlet elements or moving deflecting elements with rotating elements
    • B05B3/10—Spraying or sprinkling apparatus with moving outlet elements or moving deflecting elements with rotating elements discharging over substantially the whole periphery of the rotating member, i.e. the spraying being effected by centrifugal forces
    • B05B3/1007—Spraying or sprinkling apparatus with moving outlet elements or moving deflecting elements with rotating elements discharging over substantially the whole periphery of the rotating member, i.e. the spraying being effected by centrifugal forces characterised by the rotating member

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  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Surface Treatment Of Glass (AREA)
  • Weting (AREA)

Abstract

An etching device comprises a basal body and a liquid storing member, wherein the liquid storing member is arranged on the basal body and is provided with accommodation holes for accommodating an etching liquid; the side surface of the liquid storing member is provided with injection holes communicated with the accommodation holes, and the etching liquid is injected from the injection holes; and the etching device also comprises rotation members arranged on the basal body, and the rotation members are arranged opposite to the side surface of the liquid storing member. The etching liquid can be injected to curved glass from all angles because the rotation members drive the curved glass to rotate when the curved glass is etched by the etching device, so the curved glass is uniformly etched by the etching liquid, thereby the non-uniform etching caused by the non-uniform flow velocity of the etching liquid because of the irregular surface of the curved glass is avoided.

Description

Etching system
Technical field
The present invention relates to a kind of etching system, relate in particular to a kind of for glass is carried out etched etching system.
Background technology
Often relate in the glass processing process glass surface is carried out etch processes, general etching system comprises a plurality of nozzles that are arranged side by side, and the nozzle below vertically arranges multiple pieces of glass side by side regularly.During etching, etching solution is along glass sides substantially evenly to glass bottom diffluence.Yet above-mentioned etching system is only applicable to etching sheet glass, during such as need etching bend glass, because the irregular variation of bend glass side curvature, make the flow velocity of etching solution inhomogeneous, etching solution is inconsistent in the residence time on bend glass surface, thereby causes the bend glass etching inhomogeneous.
Summary of the invention
In view of above content, but be necessary to provide a kind of etching system of uniform etching bend glass.
A kind of etching system, it comprises matrix and liquid storage spare, and liquid storage spare is installed on the matrix, and liquid storage spare offers be used to the accommodation hole of accommodating etching solution.The side of liquid storage spare also offers the jet hole that is communicated with accommodation hole, and etching solution is spouting from jet hole.Etching system comprises that also rotation is installed on the tumbler on the matrix, and the side of tumbler and liquid storage spare is oppositely arranged.
When adopting above-mentioned etching system etching bend glass, because tumbler drives bend glass and rotates, etching solution can be injected on the bend glass from all angles, make bend glass be subject to equably the etching of etching solution, thereby avoided because the bend glass surface imperfection, the flow velocity that makes etching solution is inhomogeneous and cause etching inhomogeneous.
Description of drawings
Fig. 1 is the solid assembling synoptic diagram of the etching system that is equiped with bend glass of embodiment of the present invention.
Fig. 2 is the three-dimensional exploded view of the etching system that is equiped with bend glass shown in Figure 1.
Fig. 3 is the sectional view along III-III line among Fig. 1.
The main element nomenclature
Etching system 100
Matrix 10
The first open holes 11
The second open holes 13
Liquid storage spare 30
The resettlement section 31
The first end face 311
Accommodation hole 3110
The second end face 312
The side 313
Jet hole 3130
End cap portions 33
Communicating aperture 330
Air compressor 40
Tumbler 50
Main body 51
Rotation axis 53
Bend glass 200
Following embodiment further specifies the present invention in connection with above-mentioned accompanying drawing.
Embodiment
See also Fig. 1, etching system 100 is used for etching is carried out on bend glass 200 surfaces, and etching system 100 comprises matrix 10, liquid storage spare 30, air compressor 40 and tumbler 50.Liquid storage spare 30 is used for holding etching solution, and it is connected with air compressor 40, so that etching solution is interior spouting from liquid storage spare 30.Tumbler 50 is installed on the matrix 10 rotationally, and contiguous liquid storage spare 30.Bend glass 200 is fixed on the tumbler 50, can be sprayed on the surface of bend glass 200 from liquid storage spare 30 interior spouting etching solutions, with etching bend glass 200.
Please consult simultaneously Fig. 2 and Fig. 3, matrix 10 is used for installing liquid storage spare 30 and tumbler 50, and in embodiment of the present invention, matrix 10 is discoid.Offer the first open holes 11 and the second open holes 13 on the matrix 10.The first open holes 11 is opened in the central position of matrix 10.The quantity of the second open holes 13 is a plurality of, and a plurality of the second open holess 13 are evenly offered around the first open holes 11, and are positioned at take the first open holes 11 on the circumferential line in the center of circle.
Liquid storage spare 30 comprises resettlement section 31 and end cap portions 33.Resettlement section 31 roughly is right cylinder, and correspondence is installed on the first open holes 11 places.Resettlement section 31 comprises the first end face 311 away from matrix 10, the second end face 312 of close matrix 10 and the side 313 that connects the first end face 311 and the second end face 312.The mid-way of the first end face 311 offers accommodation hole 3110, and extends to vertically the position of contiguous the second end face 312, makes accommodation hole 3110 form blind hole to accommodate etching solution.The second end face 312 is fixedly connected with matrix 10.Radially offer a plurality of jet holes 3130 that are communicated with accommodation hole 3110 around accommodation hole 3110 on the side 313, a plurality of jet holes 3130 are covered with side 313.In embodiment of the present invention, a plurality of jet holes 3130 are rule arranges, and makes a plurality of jet holes 3130 form vertically laminate structure, and the plane at a plurality of jet hole 3130 every one deck places is parallel with the first end face 311 or the second end face 312.Be appreciated that a plurality of jet holes 3130 also can be random and arrange in a jumble.End cap portions 33 is connected with the first end face 311 of resettlement section 31, with capping resettlement section 31.End cap portions 33 is cylindrical, and the intermediate position offers communicating aperture 330, and communicating aperture 330 is connected with the accommodation hole 3110 of resettlement section 31.
Air compressor 40 is connected with the communicating aperture 330 of liquid storage spare 30, makes the etching solution blowing perforation 3130 that is contained in resettlement section 31 spouting to produce high-pressure air.
Be appreciated that air compressor 40 also can omit, when this kind situation, liquid storage spare 30 be arranged on the matrix 10 rotationally, utilize an actuator to drive liquid storage spare 30 and rotate, make etching solution blowing perforation 3130 under the effect of centrifugal force spouting.
Tumbler 50 correspondences are installed on the second open holes 13 places of matrix 10, and its quantity is corresponding with the quantity of the second open holes 13.Tumbler 50 comprises main body 51 and rotation axis 53.Main body 51 is roughly cylindrical, and a plurality of bend glasses 200 can be installed in its side, and is oppositely arranged with the jet hole 3130 of liquid storage spare 30.In embodiment of the present invention, bend glass 200 adopts adhesive means to be fixed in the side of main body 51.Rotation axis 53 passes the second open holes 13 main body 51 is fixed on the matrix 10 rotationally.Be appreciated that tumbler 50 also can comprise a plurality of suckers that are arranged on the main body 51, with adsorption curve glass 200.Perhaps, tumbler 50 also can comprise a plurality of snap-in structures that are arranged on the main body 51, with fixing engaging bend glass 200.
Etching system 100 also comprises the actuator that rotates for driving tumbler 50.The quantity of actuator is corresponding with the quantity of tumbler 50, and each actuator links to each other with a tumbler 50.The quantity that is appreciated that actuator also can when this kind situation, can arrange gear mechanism less than the quantity of tumbler 50 between tumbler 50, to realize interlock.
During etching bend glass 200, bend glass 200 is installed on the side of the main body 51 of tumbler 50, tumbler 50 is rotated, etching solution blowing perforation 3130 is injected into the surface of bend glass 200.During etching, because tumbler 50 drives bend glass 200 and rotates, etching solution can differently be injected on the bend glass 200 from all angles height, make bend glass 200 be subject to equably the etching of etching solution, thereby avoided because the bend glass surface imperfection, the flow velocity that makes etching solution is inhomogeneous and cause etching inhomogeneous.
The etching system 100 that is appreciated that embodiment of the present invention also can be used for flat glass is carried out etching, perhaps is used to be etched that suitable etching solution also can be used for other material and carries out etching.
Be appreciated that those skilled in the art also can do other variation in spirit of the present invention, as long as it does not depart from technique effect of the present invention and all can.The variation that these are done according to spirit of the present invention all should be included within the present invention's scope required for protection.

Claims (10)

1. etching system, it comprises matrix and liquid storage spare, described liquid storage spare is installed on the described matrix, described liquid storage spare offers be used to the accommodation hole of accommodating etching solution, it is characterized in that: the side of described liquid storage spare also offers the jet hole that is communicated with described accommodation hole, described etching solution is spouting from described jet hole, and described etching system comprises that also rotation is installed on the tumbler on the described matrix, and the side of described tumbler and described liquid storage spare is oppositely arranged.
2. etching system as claimed in claim 1, it is characterized in that: described liquid storage spare comprises the resettlement section, described resettlement section comprises the first end face away from described matrix, described the first end face is connected with described side, described accommodation hole is opened in described the first end face, the quantity of described jet hole is a plurality of, and a plurality of described jet holes are offered around described accommodation hole.
3. etching system as claimed in claim 2, it is characterized in that: described resettlement section is right cylinder, and described accommodation hole extends vertically, and described jet hole radially extends.
4. etching system as claimed in claim 2, it is characterized in that: a plurality of described jet holes are rule and arrange.
5. etching system as claimed in claim 4 is characterized in that: a plurality of described jet holes form laminate structures, and the plane at the every one deck of a plurality of described jet holes place is parallel with described the first end face.
6. etching system as claimed in claim 2, it is characterized in that: described liquid storage spare also comprises the end cap portions that is connected with the first end face of described resettlement section, described end cap portions offers communicating aperture, described communicating aperture is connected with described accommodation hole, described etching system also comprises air compressor, and described air compressor is connected with described communicating aperture.
7. etching system as claimed in claim 2, it is characterized in that: the quantity of described tumbler is a plurality of, and a plurality of described tumbler arranges around described liquid storage spare.
8. etching system as claimed in claim 1, it is characterized in that: described liquid storage spare is rotatably installed on the described matrix.
9. etching system as claimed in claim 1 is characterized in that: described tumbler comprises main body and is arranged on the side of described main body and a plurality of suckers or the snap-in structure relative with described jet hole.
10. etching system as claimed in claim 9, it is characterized in that: described tumbler also comprises rotation axis, offers open holes on the described matrix, described rotation axis passes described open holes described main body is fixed on the described matrix rotationally.
CN201110229889.7A 2011-08-11 2011-08-11 Etching device Active CN102923936B (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
CN201110229889.7A CN102923936B (en) 2011-08-11 2011-08-11 Etching device
TW100129472A TWI412502B (en) 2011-08-11 2011-08-17 Etching device
US13/299,438 US20130037214A1 (en) 2011-08-11 2011-11-18 Curved glass sheet etching device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201110229889.7A CN102923936B (en) 2011-08-11 2011-08-11 Etching device

Publications (2)

Publication Number Publication Date
CN102923936A true CN102923936A (en) 2013-02-13
CN102923936B CN102923936B (en) 2014-12-10

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Family Applications (1)

Application Number Title Priority Date Filing Date
CN201110229889.7A Active CN102923936B (en) 2011-08-11 2011-08-11 Etching device

Country Status (3)

Country Link
US (1) US20130037214A1 (en)
CN (1) CN102923936B (en)
TW (1) TWI412502B (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107916747A (en) * 2017-11-13 2018-04-17 德睿盛兴（大连）装配式建筑科技有限公司 Exquisiteness builds the assembled wallboard and production method of smooth outside
CN108000368A (en) * 2017-12-01 2018-05-08 福建和达玻璃技术有限公司 The anti-dazzle surface processing equipment of curl glass cover-plate and processing method

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107962501B (en) * 2017-12-01 2019-09-20 福建和达玻璃技术有限公司 The anti-dazzle surface processing equipment of special-shaped glass cover board with angle
CN113499912A (en) * 2021-06-04 2021-10-15 重庆工程职业技术学院 Wheel hub paint spraying apparatus is used in new energy automobile production convenient to it is fixed

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WO2001028950A1 (en) * 1999-10-19 2001-04-26 Phifer Smith Corporation A method and apparatus for treating a substrate with an ozone-solvent solution
CN101033116A (en) * 2006-02-17 2007-09-12 智圆技术株式会社 Apparatus of thinning a glass substrate
CN101080806A (en) * 2004-12-17 2007-11-28 英特尔公司 Improved uniformity in batch spray processing using independent cassette rotation
CN101197255A (en) * 2006-12-08 2008-06-11 Lg.菲利浦Lcd株式会社 Apparatus for etching substrate and fabrication line for fabricating liquid crystal display using the same
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Publication number Priority date Publication date Assignee Title
WO2001028950A1 (en) * 1999-10-19 2001-04-26 Phifer Smith Corporation A method and apparatus for treating a substrate with an ozone-solvent solution
CN101080806A (en) * 2004-12-17 2007-11-28 英特尔公司 Improved uniformity in batch spray processing using independent cassette rotation
CN101033116A (en) * 2006-02-17 2007-09-12 智圆技术株式会社 Apparatus of thinning a glass substrate
CN101197255A (en) * 2006-12-08 2008-06-11 Lg.菲利浦Lcd株式会社 Apparatus for etching substrate and fabrication line for fabricating liquid crystal display using the same
CN101229954A (en) * 2007-01-25 2008-07-30 蔡孟廷 Glass panel cutting method, glass panel cutting device and flat display
CN201347410Y (en) * 2009-02-09 2009-11-18 新鋐源科技股份有限公司 Upright type etching mechanism

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107916747A (en) * 2017-11-13 2018-04-17 德睿盛兴（大连）装配式建筑科技有限公司 Exquisiteness builds the assembled wallboard and production method of smooth outside
CN108000368A (en) * 2017-12-01 2018-05-08 福建和达玻璃技术有限公司 The anti-dazzle surface processing equipment of curl glass cover-plate and processing method
CN108000368B (en) * 2017-12-01 2020-03-31 福建和达玻璃技术有限公司 Anti-dazzle surface treatment equipment and treatment method for curved-edge glass cover plate

Also Published As

Publication number Publication date
TWI412502B (en) 2013-10-21
CN102923936B (en) 2014-12-10
TW201307232A (en) 2013-02-16
US20130037214A1 (en) 2013-02-14

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C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
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GR01 Patent grant
TR01 Transfer of patent right

Effective date of registration: 20170316

Address after: Shenzhen City, Guangdong Guanlan Foxconn science and Technology Park B District Building 5 building C09 floor, C07 building, floor 2, C08 building, floor 4, floor C04, building, 1

Patentee after: SHENZHENSHI YUZHAN PRECISION TECHNOLOGY Co.,Ltd.

Address before: 518109 Guangdong city of Shenzhen province Baoan District Guanlan Street third community Guanlan Foxconn Technology Park B District, building 4, building 6, building 7, building 13, (I)

Patentee before: FuTaiHua Industry (Shenzhen) Co.,Ltd.

Patentee before: HON HAI PRECISION INDUSTRY Co.,Ltd.

TR01 Transfer of patent right
CP03 Change of name, title or address

Address after: 518109 Foxconn H5 plant 101, No. 2, Donghuan 2nd Road, Fukang community, Longhua street, Longhua District, Shenzhen, Guangdong Province; plant 5, building C09, 4th floor, building C07, 2nd floor, building C08, 3rd floor, 4th floor, building C04, zone B, Foxconn Hongguan science and Technology Park, Fucheng Dasan community, Guanlan street, Guangdong Province

Patentee after: Fulian Yuzhan Technology (Shenzhen) Co.,Ltd.

Address before: 518109 Shenzhen Guanlan Foxconn Science and Technology Park, Guangdong Province, District B workshop 5 C09 4 storeys, C07 2 storeys, C08 3 storeys 4 storeys, C04 1

Patentee before: SHENZHENSHI YUZHAN PRECISION TECHNOLOGY Co.,Ltd.

CP03 Change of name, title or address