CN102896826A - 镀膜件及其制造方法 - Google Patents
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- 229910052725 zinc Inorganic materials 0.000 claims abstract description 22
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Abstract
本发明提供一种镀膜件，包括基体、依次形成于基体上的呈白色的第一膜层及第二膜层；该第一膜层主要由Zn和O两种元素组成；该第二膜层主要由Al和Si中的任一种、O及N三种元素组成。该镀膜件呈现出纯正的骨瓷质感的外观。本发明还提供了所述镀膜件的制造方法。
Description
技术领域
本发明涉及一种镀膜件及其制造方法，尤其涉及一种具有骨瓷质感的镀膜件及其制造方法。
背景技术
现有技术，通常采用喷涂、阳极处理及PVD镀膜等技术于电子产品（如手机、PDA等）的壳体表面形成装饰性膜层，以使壳体呈现出彩色的外观。然而，上述壳体虽然呈现出彩色的外观，却不能呈现出如骨瓷般的洁白、细腻、通透、清洁等视觉或外观效果。
传统的骨瓷产品的制作方法是以动物骨灰（主要成分为Ca3(PO4)2）、优质高岭土及石英为基本原料，经过高温素烧和低温釉烧两次烧制而成，其制作工艺复杂、成品率低、价格十分高昂，因而难以实现大批量地工业生产。此外，传统的骨瓷产品还具有轻脆易碎的特点。
发明内容
鉴于此，本发明提供一种具有骨瓷质感的镀膜件。
另外，本发明还提供一种上述镀膜件的制造方法。
一种镀膜件，包括基体、依次形成于基体上的呈白色的第一膜层及第二膜层；该第一膜层主要由Zn和O两种元素组成；该第二膜层主要由Al和Si中的任一种、O及N三种元素组成。
一种镀膜件的制造方法，其包括如下步骤：
提供基体；
采用真空镀膜法，以锌靶为靶材，在该基体的表面形成一锌层；
关闭所述锌靶，使用氧气对该锌层进行热处理制得第一膜层，该第一膜层主要由Zn和O两种元素组成；
采用真空镀膜法，以铝、铝合金、硅或硅合金为靶材，以氧气及氮气为反应气体，在该第一膜层上形成第二膜层，该第二膜层主要由Al和Si中的任一种、O及N三种元素组成；
对所述第二膜层的表面进行精抛处理。
所述第一膜层呈白色，覆盖于该第一膜层上溅射无色透明的第二膜层，该二膜层结合使该镀膜件呈现出纯正的骨瓷质感的外观。相较于传统的骨瓷产品，该镀膜件的制作方法简单、良率较高、生产成本较低且几乎没有环境污染，可实现大批量地工业生产，因而可运用于3C电子产品壳体、建筑装饰件、汽车装饰件及家居生活用品等诸多产品中。
附图说明
图1是本发明一较佳实施例镀膜件的剖视图；
图2是本发明一较佳实施例真空镀膜机的示意图。
主要元件符号说明
| 镀膜件 | 10 |
| 基体 | 11 |
| 第一膜层 | 13 |
| 第二膜层 | 15 |
| 镀膜机 | 100 |
| 镀膜室 | 20 |
| 真空泵 | 30 |
| 轨迹 | 21 |
| 第一靶材 | 22 |
| 第二靶材 | 23 |
| 气源通道 | 24 |
如下具体实施方式将结合上述附图进一步说明本发明。
具体实施方式
请参阅图1，本发明一较佳实施例的镀膜件10包括基体11、依次形成于基体11上的第一膜层13及第二膜层15。该镀膜件10可以是电子装置外壳，也可以是钟表外壳、金属卫浴件及建筑用件。
基体11的材质为金属或非金属，其中金属可为不锈钢、铝、铝合金、镁或镁合金，非金属可为塑料或玻璃。
所述第一膜层13主要由锌（Zn）和氧（O）两种元素组成，其中Zn的质量百分含量为70~78%，O的质量百分含量为22~30%。所述第一膜层13可通过真空镀膜并结合氧气热处理的方式制得。所述第一膜层13的厚度为5~10μm。所述第一膜层13的色度区域于CIE LAB表色系统的L*坐标为89至93，呈白色，为镀膜件10提供陶瓷般的外观颜色。
所述第二膜层15主要由金属或非金属元素M、O及N三种元素组成，其中M可为铝（Al）或硅（Si）。当M为Al时，该第二膜层15中Al的质量百分含量为60~70%，O的质量百分含量为25~28%，N的质量百分含量为2~15%。当M为Si时，该第二膜层15中Si的质量百分含量为65~75%，O的质量百分含量为17~22%，N的质量百分含量为3~18%。该第二膜层15由平均粒径为10~15nm的纳米颗粒组成，质地均匀致密。第二膜层15的粗糙度Ra为10~30nm。
所述第二膜层15呈无色透明的类玻璃状外观。该第二膜层15可通过磁控溅射、真空蒸镀等真空镀膜的方式形成。所述第二膜层15的厚度可为2~4μm。
所述呈白色的第一膜层13与无色透明的所述第二膜层15的结合可使所述镀膜件10呈现骨瓷质感的外观。从该第二膜层15一侧测试镀膜件10表面的60°角光泽度为85~100；色度区域于CIE LAB表色系统的L*坐标为89至93，a*坐标为-0.5至0.5，b*坐标为-0.5至0.5，呈现为白色。
本发明镀膜件10的制造方法包括以下步骤：
提供基体11，基体11的材质为金属或非金属，其中金属可为不锈钢、铝、铝合金、镁或镁合金，非金属可为塑料或玻璃。
将基体11进行预处理。该预处理包括分别用去离子水和无水乙醇对基体11表面进行擦拭、以及用丙酮溶液对基体11进行超声波清洗等步骤。
对经上述处理后的基体11的表面进行氩气等离子体清洗，以进一步去除基体11表面的油污，以及改善基体11表面与后续镀层的结合力。结合参阅图2，提供一真空镀膜机100，该真空镀膜机100包括一镀膜室20及连接于镀膜室20的一真空泵30，真空泵30用以对镀膜室20抽真空。该镀膜室20内设有转架(未图示)、相对设置的二第一靶材22及相对设置的二第二靶材23。转架带动基体11沿圆形的轨迹21公转，且基体11在沿轨迹21公转时亦自转。每一第一靶材22及每一第二靶材23的两端均设有气源通道24，气体经该气源通道24进入所述镀膜室20中。其中，所述第一靶材22为锌靶；所述第二靶材23为铝合金靶或硅合金靶时，其中铝或硅的质量百分含量为85~90%。
该等离子体清洗的具体操作及工艺参数可为：将基体11固定于真空镀膜机100的镀膜室20中的转架上，将该镀膜室20抽真空至8.0×10-3Pa，然后向镀膜室20内通入流量约为100~400sccm(标准状态毫升/分钟)的氩气(纯度为99.999%)，并施加-200~-400V的偏压于基体11，对基体11的表面进行氩气等离子体清洗，清洗时间为3~20min。
采用磁控溅射镀膜法与热处理结合，在经氩气等离子体清洗后的基体11上形成第一膜层13。形成所述第一膜层13的步骤如下：
首先，在所述基体11上溅射一锌层（未图示）。溅射该锌层的具体操作及参数为：开启所述第一靶材22，并设定第一靶材22的功率为2~3kw；以氩气为工作气体，调节氩气的流量为100~300sccm；对基体11施加-100~-200V的偏压，并加热所述镀膜室20至温度为300~500℃（即镀膜温度为300~500℃），溅射时间为1~2h。
然后，对上述锌层进行热处理。停止通入所述氩气，并关闭所述第一靶材22，保持所述镀膜室20的温度不变，通入流量为80~150sccm氧气，对该锌层进行热处理，热处理的时间为20~60min。该热处理使所述锌层被氧化成白色的氧化锌层，从而获得第一膜层13。所述第一膜层13的色度区域于CIE LAB表色系统的L*坐标为80至90，a*坐标为-0.5至0.5，b*坐标为-0.5至0.5。所述第一膜层13的厚度为5~10μm。
由于直接以锌靶为靶材，以氧气为反应气体溅射获得的Zn-O膜层，难以保证该膜层中Zn与O的原子个数比大约为1：1，如此无法使该Zn-O膜层呈现出白色。而经上述方法获得的第一膜层13中Zn与O的原子个数比大约为1：1，如此可使Zn与O充分结合形成ZnO，进而使所述第一膜层13呈现出白色。
采用磁控溅射镀膜法，在所述第一膜层13上溅射第二膜层15。开启第二靶材23，并设定第二靶材23的功率为5~10kw；以氧气及氮气为反应气体，调节氧气的流量为50~200sccm、氮气的流量为80~300sccm，以氩气为工作气体，调节氩气的流量为100~300sccm。溅镀时，对基体11施加-100~-300V的偏压，并加热所述镀膜室20至温度为20~200℃（即镀膜温度为20~200℃），镀膜时间为50~80min。
提供一精抛机（图未示），对所述第二膜层15的表面进行精抛处理，用以提高所述第二膜层15的光泽度和透明度，从而使所述镀膜件10呈现出通透、高光泽的外观。所述精抛机包括一布轮，将含有氧化铝粉末的悬浮状水溶液涂覆在该布轮上，对所述基体11的第二膜层15的表面进行精抛，精抛的时间为10~15min。经过该精抛处理后，从该第二膜层15表面的60°角光泽度为85~100。
可以理解的，所述第二膜层15还可通过真空蒸镀及电弧离子镀等真空镀膜的方式形成。
所述第一膜层13呈白色，于该第一膜层13表面溅射无色透明的第二膜层15，所述第一膜层13与第二膜层15结合使该镀膜件10呈现出纯正的骨瓷质感的外观。相较于传统的骨瓷产品，该镀膜件10的制作方法简单、良率较高、生产成本较低且几乎没有环境污染，可实现大批量地工业生产，因而可运用于3C电子产品壳体、建筑装饰件、汽车装饰件及家居生活用品等诸多产品中。
此外，相较于传统的骨瓷产品，不锈钢、铝、铝合金、镁或镁合金等金属或塑料材质的基体11可增强所述镀膜件10的韧性，因而所述镀膜件10还具有不易碎的特点；且当基体11的材质为铝、铝合金、镁或镁合金等轻金属或塑料时，所述镀膜件10还能呈现出较传统的骨瓷产品更为轻盈的质地。
Claims (13)
1.一种镀膜件，包括基体，其特征在于：该镀膜件还包括依次形成于基体上的呈白色的第一膜层及第二膜层；该第一膜层主要由Zn和O两种元素组成；该第二膜层主要由Al和Si中的任一种、O及N三种元素组成。
2.如权利要求1所述的镀膜件，其特征在于：所述第一膜层中Zn的质量百分含量为70~78%，O的质量百分含量为22~30%。
3.如权利要求1所述的镀膜件，其特征在于：所述第一膜层的色度区域于CIE LAB表色系统的L*坐标为89至93，a*坐标为-0.5至0.5，b*坐标为-0.5至0.5。
4.如权利要求1所述的镀膜件，其特征在于：当第二膜层主要由Al、O及N三种元素组成时，其中Al的质量百分含量为60~70%，O的质量百分含量为25~28%，N的质量百分含量为2~15%。
5.如权利要求1所述的镀膜件，其特征在于：当第二膜层主要由Si、O及N三种元素组成时，其中Si的质量百分含量为65~75%，O的质量百分含量为17~22%，N的质量百分含量为3~18%。
6.如权利要求1所述的镀膜件，其特征在于：所述第二膜层由平均粒径为10~15nm的纳米颗粒组成，第二膜层的粗糙度Ra为10~30nm。
7.如权利要求1所述的镀膜件，其特征在于：所述第一膜层的厚度为5~10μm，所述第二膜层的厚度为2~4μm。
8.如权利要求1所述的镀膜件，其特征在于：所述镀膜件于该第二膜层表面的60°角光泽度为85~100，色度区域于CIE LAB表色系统的L*坐标为89至93，a*坐标为-0.5至0.5，b*坐标为-0.5至0.5。
9.一种镀膜件的制造方法，其包括如下步骤：
提供基体；
采用真空镀膜法，以锌靶为靶材，在该基体的表面形成一锌层；
关闭所述锌靶，使用氧气对该锌层进行热处理制得第一膜层，该第一膜层主要由Zn和O两种元素组成；
采用真空镀膜法，以铝、铝合金、硅或硅合金为靶材，以氧气及氮气为反应气体，在该第一膜层上形成第二膜层，该第二膜层主要由Al和Si中的任一种、O及N三种元素组成；
对所述第二膜层的表面进行精抛处理。
10.如权利要求9所述的镀膜件的制造方法，其特征在于：形成所述锌层的工艺参数为：采用磁控溅射镀膜法，设置锌靶的功率为2~3kw，以氩气为工作气体，氩气的流量为100~300sccm，施加于基体的偏压为-100~-300V，镀膜温度为20~200℃，镀膜时间为1~2h。
11.如权利要求9所述的镀膜件的制造方法，其特征在于：对所述锌层进行热处理待工艺参数为:氧气的流量为80~150sccm，热处理温度为20~200℃，时间为20~60min。
12.如权利要求9所述的镀膜件的制造方法，其特征在于：形成所述第二膜层的工艺参数为：采用磁控溅射镀膜法，设置铝靶、铝合金靶、硅靶或硅合金靶的功率为5~10kw，氧气的流量为50~200sccm、氮气的流量为80~300sccm，以氩气为工作气体，氩气的流量为100~300sccm，施加于基体的偏压为-100~-300V，镀膜温度为20~200℃，镀膜时间为50~80min；所述铝合金靶材中铝的质量百分含量为85~90%，硅合金靶材中硅的质量百分含量为85~90%。
13.如权利要求9所述的镀膜件的制造方法，其特征在于：所述精抛处理的工艺参数为：提供一精抛机，所述精抛机包括一布轮，将含有氧化铝粉末的悬浮状水溶液涂覆在该布轮上，对所述第二膜层的表面进行精抛，精抛的时间为10~15min。
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| US5079089A (en) * | 1988-07-28 | 1992-01-07 | Nippon Steel Corporation | Multi ceramic layer-coated metal plate and process for manufacturing same |
| CN101119860A (zh) * | 2005-02-17 | 2008-02-06 | 桑德维克知识产权股份公司 | 涂敷的金属产品、其制备方法及该方法的用途 |
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| CN117448741A (zh) * | 2023-12-26 | 2024-01-26 | 泓欣科创生物科技(北京)有限公司 | 一种控制生物医用材料镁合金降解速率的涂层的制备方法及生物医用材料镁合金 |
| CN117448741B (zh) * | 2023-12-26 | 2024-03-22 | 泓欣科创生物科技(北京)有限公司 | 一种控制生物医用材料镁合金降解速率的涂层的制备方法及生物医用材料镁合金 |
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