CN102856169B - 薄膜晶体管的制备方法及顶栅极式薄膜晶体管 - Google Patents
薄膜晶体管的制备方法及顶栅极式薄膜晶体管 Download PDFInfo
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- CN102856169B CN102856169B CN201210136709.5A CN201210136709A CN102856169B CN 102856169 B CN102856169 B CN 102856169B CN 201210136709 A CN201210136709 A CN 201210136709A CN 102856169 B CN102856169 B CN 102856169B
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- Prior art keywords
- film transistor
- carbon nanotube
- walled carbon
- thin
- nanotube layer
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- Expired - Fee Related
Links
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- 239000002109 single walled nanotube Substances 0.000 claims abstract description 46
- 239000000758 substrate Substances 0.000 claims abstract description 37
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims abstract description 35
- 229910052760 oxygen Inorganic materials 0.000 claims abstract description 35
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- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 47
- 239000002041 carbon nanotube Substances 0.000 claims description 32
- 229910021393 carbon nanotube Inorganic materials 0.000 claims description 32
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- 239000007789 gas Substances 0.000 claims description 17
- 229910000449 hafnium oxide Inorganic materials 0.000 claims description 12
- WIHZLLGSGQNAGK-UHFFFAOYSA-N hafnium(4+);oxygen(2-) Chemical compound [O-2].[O-2].[Hf+4] WIHZLLGSGQNAGK-UHFFFAOYSA-N 0.000 claims description 12
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- 229910017052 cobalt Inorganic materials 0.000 claims description 2
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- CJNBYAVZURUTKZ-UHFFFAOYSA-N hafnium(IV) oxide Inorganic materials O=[Hf]=O CJNBYAVZURUTKZ-UHFFFAOYSA-N 0.000 description 4
- 238000001259 photo etching Methods 0.000 description 4
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- BRGOCSWOKBOIOJ-UHFFFAOYSA-N N.[O-2].[Hf+4] Chemical compound N.[O-2].[Hf+4] BRGOCSWOKBOIOJ-UHFFFAOYSA-N 0.000 description 3
- PGDDJXSLIWMIRI-UHFFFAOYSA-N acetic acid;molybdenum Chemical compound [Mo].CC(O)=O PGDDJXSLIWMIRI-UHFFFAOYSA-N 0.000 description 3
- 229910021529 ammonia Inorganic materials 0.000 description 3
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- 229940011182 cobalt acetate Drugs 0.000 description 3
- QAHREYKOYSIQPH-UHFFFAOYSA-L cobalt(II) acetate Chemical compound [Co+2].CC([O-])=O.CC([O-])=O QAHREYKOYSIQPH-UHFFFAOYSA-L 0.000 description 3
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- 102000004129 N-Type Calcium Channels Human genes 0.000 description 1
- 108010075750 P-Type Calcium Channels Proteins 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
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- 229910001873 dinitrogen Inorganic materials 0.000 description 1
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- 239000007792 gaseous phase Substances 0.000 description 1
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- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 229910052735 hafnium Inorganic materials 0.000 description 1
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
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- 229910052719 titanium Inorganic materials 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/20—Carbon compounds, e.g. carbon nanotubes or fullerenes
- H10K85/221—Carbon nanotubes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
- H10K10/40—Organic transistors
- H10K10/46—Field-effect transistors, e.g. organic thin-film transistors [OTFT]
- H10K10/462—Insulated gate field-effect transistors [IGFETs]
- H10K10/464—Lateral top-gate IGFETs comprising only a single gate
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
- H10K10/40—Organic transistors
- H10K10/46—Field-effect transistors, e.g. organic thin-film transistors [OTFT]
- H10K10/462—Insulated gate field-effect transistors [IGFETs]
- H10K10/468—Insulated gate field-effect transistors [IGFETs] characterised by the gate dielectrics
- H10K10/472—Insulated gate field-effect transistors [IGFETs] characterised by the gate dielectrics the gate dielectric comprising only inorganic materials
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Nanotechnology (AREA)
- Materials Engineering (AREA)
- Physics & Mathematics (AREA)
- Mathematical Physics (AREA)
- Theoretical Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Thin Film Transistor (AREA)
- Carbon And Carbon Compounds (AREA)
- Electroluminescent Light Sources (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW100115551 | 2011-05-04 | ||
| TW100115551A TWI479547B (zh) | 2011-05-04 | 2011-05-04 | 薄膜電晶體之製備方法及頂閘極式薄膜電晶體 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN102856169A CN102856169A (zh) | 2013-01-02 |
| CN102856169B true CN102856169B (zh) | 2015-04-15 |
Family
ID=47089642
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201210136709.5A Expired - Fee Related CN102856169B (zh) | 2011-05-04 | 2012-05-04 | 薄膜晶体管的制备方法及顶栅极式薄膜晶体管 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US20120280213A1 (enExample) |
| JP (1) | JP5553856B2 (enExample) |
| CN (1) | CN102856169B (enExample) |
| TW (1) | TWI479547B (enExample) |
Families Citing this family (23)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9455421B2 (en) | 2013-11-21 | 2016-09-27 | Atom Nanoelectronics, Inc. | Devices, structures, materials and methods for vertical light emitting transistors and light emitting displays |
| CN105810747B (zh) | 2014-12-31 | 2018-11-30 | 清华大学 | N型薄膜晶体管 |
| CN105810748B (zh) * | 2014-12-31 | 2018-12-21 | 清华大学 | N型薄膜晶体管 |
| CN105810587B (zh) | 2014-12-31 | 2019-07-12 | 清华大学 | N型薄膜晶体管的制备方法 |
| CN105810586B (zh) | 2014-12-31 | 2018-10-02 | 清华大学 | N型薄膜晶体管的制备方法 |
| CN105810746B (zh) | 2014-12-31 | 2019-02-05 | 清华大学 | N型薄膜晶体管 |
| CN105810749B (zh) * | 2014-12-31 | 2018-12-21 | 清华大学 | N型薄膜晶体管 |
| CN105810785B (zh) | 2014-12-31 | 2018-05-22 | 清华大学 | 发光二极管 |
| CN105810792B (zh) * | 2014-12-31 | 2018-05-22 | 清华大学 | 发光二极管 |
| CN105810788B (zh) | 2014-12-31 | 2018-05-22 | 清华大学 | 发光二极管 |
| KR102356986B1 (ko) * | 2015-07-16 | 2022-02-03 | 삼성디스플레이 주식회사 | 표시 패널, 이를 포함하는 표시 장치 및 이의 구동 방법 |
| US10957868B2 (en) | 2015-12-01 | 2021-03-23 | Atom H2O, Llc | Electron injection based vertical light emitting transistors and methods of making |
| US10541374B2 (en) | 2016-01-04 | 2020-01-21 | Carbon Nanotube Technologies, Llc | Electronically pure single chirality semiconducting single-walled carbon nanotube for large scale electronic devices |
| US10724136B2 (en) * | 2016-01-20 | 2020-07-28 | Honda Motor Co., Ltd. | Conducting high transparency thin films based on single-walled carbon nanotubes |
| US10665798B2 (en) * | 2016-07-14 | 2020-05-26 | International Business Machines Corporation | Carbon nanotube transistor and logic with end-bonded metal contacts |
| US10665799B2 (en) * | 2016-07-14 | 2020-05-26 | International Business Machines Corporation | N-type end-bonded metal contacts for carbon nanotube transistors |
| CN108336142B (zh) * | 2017-01-20 | 2020-09-25 | 清华大学 | 薄膜晶体管 |
| US10847757B2 (en) | 2017-05-04 | 2020-11-24 | Carbon Nanotube Technologies, Llc | Carbon enabled vertical organic light emitting transistors |
| CN110892532A (zh) * | 2017-05-04 | 2020-03-17 | 碳纳米管技术有限责任公司 | 单极性n型或p型碳纳米管晶体管及其制造方法 |
| US10978640B2 (en) | 2017-05-08 | 2021-04-13 | Atom H2O, Llc | Manufacturing of carbon nanotube thin film transistor backplanes and display integration thereof |
| US10665796B2 (en) | 2017-05-08 | 2020-05-26 | Carbon Nanotube Technologies, Llc | Manufacturing of carbon nanotube thin film transistor backplanes and display integration thereof |
| KR20210134616A (ko) | 2019-01-04 | 2021-11-10 | 아톰 에이치투오, 엘엘씨 | 탄소 나노튜브 기반 무선 주파수 장치 |
| CN110137355B (zh) * | 2019-05-15 | 2021-05-25 | 华东师范大学 | 一种改进亚阈值摆幅和开关比的有机薄膜晶体管及制备方法 |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101124050A (zh) * | 2005-01-27 | 2008-02-13 | 国际商业机器公司 | 在氧化物表面上碳纳米管的选择性设置 |
| CN101351405A (zh) * | 2006-01-03 | 2009-01-21 | 国际商业机器公司 | 通过官能化选择性地布置碳纳米管 |
| CN101390218A (zh) * | 2005-02-25 | 2009-03-18 | 摩托罗拉公司 | 均一的单壁碳纳米管网状结构 |
| CN101388412A (zh) * | 2008-10-09 | 2009-03-18 | 北京大学 | 自对准栅结构纳米场效应晶体管及其制备方法 |
| CN101582445A (zh) * | 2008-05-14 | 2009-11-18 | 清华大学 | 薄膜晶体管 |
Family Cites Families (26)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20020172767A1 (en) * | 2001-04-05 | 2002-11-21 | Leonid Grigorian | Chemical vapor deposition growth of single-wall carbon nanotubes |
| KR101016763B1 (ko) * | 2002-02-13 | 2011-02-25 | 도레이 카부시키가이샤 | 단층 카본 나노튜브의 제조방법 |
| TWI220269B (en) * | 2002-07-31 | 2004-08-11 | Ind Tech Res Inst | Method for fabricating n-type carbon nanotube device |
| US20040144972A1 (en) * | 2002-10-04 | 2004-07-29 | Hongjie Dai | Carbon nanotube circuits with high-kappa dielectrics |
| US7282191B1 (en) * | 2002-12-06 | 2007-10-16 | The Board Of Trustees Of The Leland Stanford Junior University | Carbon nanotube growth |
| US6918284B2 (en) * | 2003-03-24 | 2005-07-19 | The United States Of America As Represented By The Secretary Of The Navy | Interconnected networks of single-walled carbon nanotubes |
| TWI222742B (en) * | 2003-05-05 | 2004-10-21 | Ind Tech Res Inst | Fabrication and structure of carbon nanotube-gate transistor |
| US7628974B2 (en) * | 2003-10-22 | 2009-12-08 | International Business Machines Corporation | Control of carbon nanotube diameter using CVD or PECVD growth |
| US7276285B2 (en) * | 2003-12-31 | 2007-10-02 | Honeywell International Inc. | Nanotube fabrication basis |
| JP2005285822A (ja) * | 2004-03-26 | 2005-10-13 | Fujitsu Ltd | 半導体装置および半導体センサ |
| WO2006004599A2 (en) * | 2004-06-04 | 2006-01-12 | The Trustees Of Columbia University In The City Of New York | Methods for preparing single-walled carbon nanotubes |
| US7582534B2 (en) * | 2004-11-18 | 2009-09-01 | International Business Machines Corporation | Chemical doping of nano-components |
| JP4891550B2 (ja) * | 2005-02-10 | 2012-03-07 | 独立行政法人科学技術振興機構 | ｎ型トランジスタ、ｎ型トランジスタセンサ及びｎ型トランジスタ用チャネルの製造方法 |
| WO2006132659A2 (en) * | 2005-06-06 | 2006-12-14 | President And Fellows Of Harvard College | Nanowire heterostructures |
| US20070001231A1 (en) * | 2005-06-29 | 2007-01-04 | Amberwave Systems Corporation | Material systems for dielectrics and metal electrodes |
| US20100075137A1 (en) * | 2006-05-17 | 2010-03-25 | Lockheed Martin Corporation | Carbon nanotube synthesis using refractory metal nanoparticles and manufacture of refractory metal nanoparticles |
| US7956345B2 (en) * | 2007-01-24 | 2011-06-07 | Stmicroelectronics Asia Pacific Pte. Ltd. | CNT devices, low-temperature fabrication of CNT and CNT photo-resists |
| JP2009252798A (ja) * | 2008-04-01 | 2009-10-29 | Mitsumi Electric Co Ltd | カーボンナノチューブ電界効果トランジスタおよびその製造方法 |
| CN101582381B (zh) * | 2008-05-14 | 2011-01-26 | 鸿富锦精密工业（深圳）有限公司 | 薄膜晶体管及其阵列的制备方法 |
| CN101593699B (zh) * | 2008-05-30 | 2010-11-10 | 清华大学 | 薄膜晶体管的制备方法 |
| CN101582447B (zh) * | 2008-05-14 | 2010-09-29 | 清华大学 | 薄膜晶体管 |
| JP2010052961A (ja) * | 2008-08-26 | 2010-03-11 | Hiroki Ago | カーボンナノチューブの製造方法及びカーボンナノチューブ |
| US8847313B2 (en) * | 2008-11-24 | 2014-09-30 | University Of Southern California | Transparent electronics based on transfer printed carbon nanotubes on rigid and flexible substrates |
| JP5371453B2 (ja) * | 2009-01-09 | 2013-12-18 | ミツミ電機株式会社 | 電界効果トランジスタおよびその製造方法 |
| EP2348531B1 (en) * | 2010-01-26 | 2021-05-26 | Samsung Electronics Co., Ltd. | Thin film transistor and method of manufacturing the same |
| US8569121B2 (en) * | 2011-11-01 | 2013-10-29 | International Business Machines Corporation | Graphene and nanotube/nanowire transistor with a self-aligned gate structure on transparent substrates and method of making same |
-
2011
- 2011-05-04 TW TW100115551A patent/TWI479547B/zh not_active IP Right Cessation
-
2012
- 2012-05-04 US US13/463,856 patent/US20120280213A1/en not_active Abandoned
- 2012-05-04 CN CN201210136709.5A patent/CN102856169B/zh not_active Expired - Fee Related
- 2012-05-07 JP JP2012105931A patent/JP5553856B2/ja not_active Expired - Fee Related
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101124050A (zh) * | 2005-01-27 | 2008-02-13 | 国际商业机器公司 | 在氧化物表面上碳纳米管的选择性设置 |
| CN101390218A (zh) * | 2005-02-25 | 2009-03-18 | 摩托罗拉公司 | 均一的单壁碳纳米管网状结构 |
| CN101351405A (zh) * | 2006-01-03 | 2009-01-21 | 国际商业机器公司 | 通过官能化选择性地布置碳纳米管 |
| CN101582445A (zh) * | 2008-05-14 | 2009-11-18 | 清华大学 | 薄膜晶体管 |
| CN101388412A (zh) * | 2008-10-09 | 2009-03-18 | 北京大学 | 自对准栅结构纳米场效应晶体管及其制备方法 |
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| US20120280213A1 (en) | 2012-11-08 |
| CN102856169A (zh) | 2013-01-02 |
| JP2012235129A (ja) | 2012-11-29 |
| TW201246309A (en) | 2012-11-16 |
| TWI479547B (zh) | 2015-04-01 |
| JP5553856B2 (ja) | 2014-07-16 |
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