CN102821897B - 切削工具 - Google Patents
切削工具 Download PDFInfo
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- CN102821897B CN102821897B CN201180016829.5A CN201180016829A CN102821897B CN 102821897 B CN102821897 B CN 102821897B CN 201180016829 A CN201180016829 A CN 201180016829A CN 102821897 B CN102821897 B CN 102821897B
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
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- C23C30/005—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process on hard metal substrates
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23B—TURNING; BORING
- B23B27/00—Tools for turning or boring machines; Tools of a similar kind in general; Accessories therefor
- B23B27/14—Cutting tools of which the bits or tips or cutting inserts are of special material
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
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- C—CHEMISTRY; METALLURGY
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
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- C23C14/0664—Carbonitrides
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
- C23C28/042—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material including a refractory ceramic layer, e.g. refractory metal oxides, ZrO2, rare earth oxides
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
- C23C28/044—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material coatings specially adapted for cutting tools or wear applications
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- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
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- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
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- C23C28/42—Coatings including alternating layers following a pattern, a periodic or defined repetition characterized by the composition of the alternating layers
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T407/00—Cutters, for shaping
- Y10T407/24—Cutters, for shaping with chip breaker, guide or deflector
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- Inorganic Chemistry (AREA)
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- Cutting Tools, Boring Holders, And Turrets (AREA)
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Abstract
提供一种耐氧化性、耐磨损性高且耐缺损性优异的切削工具。切削工具(1)包括基体(2)和由TiaAlbMd(C1-xNx)(其中,M是从Si、W、Nb、Mo、Ta、Hf、Cr、Zr及Y中选出的至少一种,0.35≤a≤0.55,0.3≤b≤0.6,0≤d≤0.25,a+b+d=1,0≤x≤1)构成的被覆层(6),前刀面(3)的被覆层(6)上的熔粒(7)的Al含有率比被覆层(6)的组成的Al含有率多,且后刀面(4)上的熔粒(7)的Ti含有率比被覆层(6)的组成的Ti含有率多。
Description
技术领域
本发明涉及在基体的表面上成膜有被覆层的切削工具。
背景技术
目前,在切削工具、耐磨构件、滑动构件这样的需要耐磨损性、滑动性、耐缺损性的构件中,使用如下的方法,即:在超硬合金、金属陶瓷等的烧结合金、金刚石或cBN(立方晶氮化硼)的高硬度烧结体、氧化铝或氮化硅等的陶瓷构成的基体的表面成膜出被覆层,从而提高耐磨损性、滑动性、耐缺损性。
另外,作为成膜出上述被覆层的方法,使用电弧离子镀敷法或溅射法等的物理蒸镀法而积极地研究了以Ti或Al为主成分的氮化物层,持续地进行了用于延长工具寿命的改良。设有这些被覆层的表面覆盖工具为了应对以切削速度的高速化为首的切削环境的变化、被切削材料的多样化,除了覆盖材料元素以外也思考了各种办法。
例如,在专利文献1中记载了如下情况,即:在基体的表面覆盖TiAlN等的覆膜的表面覆盖工具中,使Ti的比率在后刀面中比前刀面高,从而能够抑制前刀面的熔敷和磨损的发展,并且能够抑制后刀面的边界损伤。
另外,在专利文献2中记载了如下情况,即:在基材的表面形成厚度为1~5μm的TiAlN系的硬质覆膜,使存在于硬质覆膜上的具有膜厚以上的尺寸的粗大粒子为5面积%以下,其表面粗糙度Ra为0.1μm以下或表面粗糙度Rz为1μm以下,由此来提高硬质覆膜的耐熔敷性和耐磨损性。
【在先技术文献】
【专利文献】
【专利文献1】日本特开2008-264975号公报
【专利文献2】日本特开2002-346812号公报
发明内容
然而,在专利文献1记载的后刀面比前刀面的Ti的比率高的结构中,前刀面的被覆层的耐热性和耐氧化性不充分,且后刀面的耐缺损性不充分。
另外,在专利文献2记载的极力减少粗大粒子的结构中,由于表面粗糙度小而切屑相对于硬质膜成为粘贴的状态,从而成为硬质膜的温度上升而月牙洼磨损发展的原因,存在耐磨损性下降的问题。
本发明是为了解决上述课题而做出的,其目的在于提供一种局部性地具备能够发挥最佳的切削性能的被覆层的切削工具。
本发明的切削工具在前刀面与后刀面的交叉棱线具有切削刃,在基体的表面覆盖由TiaAlbMd(C1-xNx)(其中,M是从Si、W、Nb、Mo、Ta、Hf、Cr、Zr及Y中选出的至少一种,0.35≤a≤0.55,0.3≤b≤0.6,0≤d≤0.25,a+b+d=1,0≤x≤1)构成的被覆层,在该被覆层的表面存在熔粒(droplet),并且,存在于所述前刀面上的熔粒的组成与所述前刀面的所述被覆层的组成相比,Al的含有率高,而且,存在于所述后刀面上的熔粒的组成与所述后刀面的所述被覆层的组成相比,Ti的含有率高。
在此,在上述结构中,优选的是,存在于所述前刀面上的熔粒的Al的含有率A1DR与所述被覆层的所述前刀面的Al的含有率AlbR之比为1.05≤A1DR/AlbR≤1.25,存在于所述后刀面上的熔粒的Ti的含有率TiDF与所述被覆层的所述后刀面的Ti的含有率TiaF之比为1.03≤TiDF/TiaF≤1.2。
另外,在上述结构中,优选的是,在所述被覆层的前刀面的算术平均粗糙度为RaR,所述被覆层的后刀面的算术平均粗糙度为RaF时,优选为0.07μm≤RaR≤0.3μm及0.05μm≤RaF≤0.15μm,而且,在所述被覆层的前刀面的最大高度为RzR,所述被覆层的后刀面的最大高度为RzF时,0.3μm≤RzR≤0.9μm及0.15μm≤RzF≤0.6μm。
此外,所述被覆层可以是由Tia1Alb1Md1(C1-x1Nx1)(其中,0≤a1≤1,0≤b1≤0.8,0≤d1≤0.4,a1+b1+d1=1,0≤x1≤1)表示的第一被覆层与由Tia2Alb2Md2(C1-x2Nx2)(其中,0≤a2≤1,0≤b2≤0.8,0≤d2≤0.4,a2+b2+d2=1,并且排除a1=a2且b1=b2且d1=d2的情况。)表示的第二被覆层反复交替层叠十层以上的结构。
【发明效果】
对于本发明的切削工具,通过使形成在基体表面上的被覆层中,存在于前刀面上的熔粒的组成与被覆层的前刀面的组成相比,含有较多的Al,从而此,存在于前刀面上的熔粒的硬度及耐氧化性升高。由此,即使切屑与熔粒接触,熔粒也不会立即磨减而存在,因此切屑与前刀面的被覆层不会发生粘贴。而且,由于切削油进入到被覆层与切屑的间隙,因此切屑的润滑性良好。其结果是,能够抑制前刀面的被覆层的温度上升,月牙洼磨损减小。
另外,存在于后刀面上的熔粒的组成与被覆层的后刀面的组成相比,Ti的含有率多,由此,后刀面的表面的熔粒的破坏韧性值升高,存在于后刀面的被覆层表面上的熔粒成为吸收冲击的缓冲材料,与直接向被覆层冲击的情况相比,能够缓和所述冲击,其结果是,能够提高后刀面的被覆层的耐缺损性。
另外,通过使存在于所述前刀面上的熔粒的Al的含有率AlDR与所述被覆层的所述前刀面的Al的含有率AlbR之比为1.05≤AlDR/AlbR≤1.25,从而能够进一步提高前刀面的耐磨损性。而且,所述后刀面的熔粒的Ti的含有率TiDF与所述被覆层的所述后刀面的Ti的含有率TibF之比为1.05≤TiDF/TibF≤1.2,从而能够进一步提高后刀面的耐缺损性。
此外,在所述被覆层的前刀面的算出平均粗糙度为RaR时,若在0.07μm≤RaR≤0.3μm的范围内,则能够抑制前刀面的被覆层的温度上升而提高耐磨损性的效果高,且能够提高耐熔敷性。而且,在所述被覆层的后刀面的算术平均粗糙度为RaF时,若在0.05μm≤RaF≤0.15μm的范围内,则通过减小后刀面的表面粗糙度,能够漂亮地完成加工时的被切削材料的面。需要说明的是,为了提高熔粒的存在所产生的上述效果,在所述被覆层的前刀面的最大高度为Rzr且所述被覆层的后刀面的最大高度为RzF时,优选0.3μm≤RzR≤0.9μm及0.15μm≤RzF≤0.6μm。
附图说明
图1是表示本发明的切削工具的一例的概略立体图。
图2是表示图1的切削工具的第一实施方式的剖视示意图。
图3是图1的切削工具的前刀面的被覆层表面的SEM照片。
图4是图1的切削工具的后刀面的被覆层表面的SEM照片。
具体实施方式
关于本发明的切削工具的一例,使用优选的实施方式例的切削工具的概略立体图即图1、本发明的第一实施方式的概略剖视图即图2、图1、2的切削工具的前刀面及后刀面的被覆层的表面的扫描型电子显微镜(SEM)照片即图3、4进行说明。
根据图1~4,本发明的切削工具(以下,简称为工具)1在主面具有前刀面3,在侧面具有后刀面4,在前刀面3与后刀面4的交叉棱线具有切削刃5,且在基体2的表面成膜有被覆层6。
并且,如图2、3、4所示,被覆层6在表面存在有被称为熔粒7的粒状物质。在此,该熔粒7的组成中,重要的是形成在前刀面3表面上的熔粒7的Al的含有率AlDR比前刀面3的被覆层6中的Al的含有率AlbR高、以及形成在后刀面4表面上的熔粒7的Ti含有率TiDF比后刀面4的被覆层6中的Ti的含有率TibF高。
由此,在切削时,即使切屑通过存在于前刀面3的被覆层6表面上的硬度高的熔粒7之上,熔粒7也不会磨减而长期存在,因此切屑不会粘贴在前刀面3的被覆层6的表面,从而能够抑制被覆层6的温度上升。而且,在切削时,由于能够将切削油充分保持在被覆层6与切屑之间,因此对于切屑的排出的润滑性优异,其结果是,能够进一步抑制被覆层6的温度上升,从而能够抑制前刀面3的月牙洼磨损的发展。另一方面,通过使在被覆层6的后刀面4表面上生成的熔粒7的Ti的含有率TiDF比后刀面4的被覆层6中含有的Ti的含有率Tibf高,从而使存在于后刀面4的被覆层6的表面上的熔粒7成为缓冲材料,能够减小作用于被覆层6的冲击,能够提高被覆层6的耐缺损性,其结果是,能够减小被切削材料的切削加工面的表面粗糙度。需要说明的是,被覆层的各金属成分的含有率可以通过电子线微量分析(EPMA)的能量分散分光分析(EDS)、或X射线光电子分光分析法(XPS)来测定。
另外,此时,形成在被覆层6的前刀面3表面上的熔粒7的Al的含有率AlDR相对于前刀面3的被覆层6含有的Al的含有率AlbR,优选为1.05≤AlDR/AlbR≤1.25。这是因为,当比率AlDR/AlbR为1.05以上时,熔粒7的耐热性、耐氧化性得到改善。另外,当比率AlDR/AlbR为1.25以下时,熔粒7的结晶结构不会从立方晶向六方晶变化而耐磨损性高。比率AlDR/AlbR的特别优选的范围是1.06≤AlDR/AlbR≤1.15。
而且,形成在被覆层6的后刀面4上的熔粒7含有的Ti的含有率TiDF相对于后刀面4的被覆层6含有的Ti的含有率TiaF,优选为1.03≤TiDF/TiaF≤1.2。在比率TiDF/TiaF为1.05以上时,后刀面4上的熔粒7的破坏韧性值提高,其结果是,在切削中,切削工具1不会发生卷刃或缺损而被切削材料的加工面变得平滑。当比率TiDF/TiaF为1.2以下时,后刀面4上的熔粒7的硬度、耐热性不会下降,在切削中能够抑制后刀面的磨损。比率TiDF/TibF的特别优选的范围是1.05≤TiDF/TibF≤1.12。
此外,在被覆层6的前刀面3的算术平均粗糙度为RaR时,若在0.07μm≤RaR≤0.3μm的范围内,则抑制前刀面3的被覆层6的温度上升且提高耐磨损性的效果升高,且能够提高耐熔敷性。而且,在被覆层6的后刀面4的算术平均粗糙度为RaF时,若在0.05μm≤RaF≤0.15μm的范围内,则能够漂亮地完成加工时的被切削材料的面。需要说明的是,为了提高熔粒的存在所产生的上述效果,在被覆层6的前刀面3的最大高度为RzR,被覆层6的后刀面4的最大高度为RzF时,优选为0.3μm≤RzR≤0.9μm及0.15μm≤RzF≤0.6μm。
需要说明的是,被覆层6的前刀面的组成由TiaAlbMd(C1-xNx)(其中,M是从Si、W、Nb、Mo、Ta、Cr、Zr、Hf及Y中选出的至少一种,0.35≤a≤0.55,0.3≤b≤0.6,0.0≤d≤0.25,0≤x≤1)构成。通过使被覆层6成为该组成范围,被覆层6的氧化开始温度升高,耐氧化性高且能够减少固有的内部应力,耐缺损性高。而且,被覆层6由于硬度及与基体2的密接性高,因此被覆层6对于难切削材料的加工或干式切削、高速切削等的苛刻的切削条件下的耐磨损性及耐缺损性比较优异。
即,在被覆层6中,当a(Ti组成比率)比0.35小时,被覆层6的结晶结构从立方晶向六方晶变化而硬度下降,因此耐磨损性下降。当a(Ti组成比率)比0.55大时,被覆层6的耐氧化性及耐热性下降。a的特别优选的范围是0.45≤a≤0.5。而且,当b(Al组成比率)比0.3小时,被覆层6的耐氧化性及耐热性下降。当b(Al组成比)比0.6大时,被覆层6的结晶结构存在从立方晶向六方晶变化的倾向,硬度下降。b的特别优选的范围是0.48≤b≤0.52。需要说明的是,在被覆层的厚度为50nm以下较薄时,根据其上下层叠的层的结构的不同,有时即使b比0.6大也能够维持立方晶的结晶结构。而且,当d(金属M组成比率)比0.25大时,被覆层6的耐氧化性或由硬度下降引起的耐磨损性下降。d的特别优选的范围是0.01≤d≤0.22。
需要说明的是,金属M是从Si、W、Nb、Mo、Ta、Hf、Cr、Zr、Y中选出的一种以上的物质,其中从硬度优异的点出发优选含有Si或W,从耐磨损性、耐氧化性最优异的点出发优选含有Nb或Mo。
另外,被覆层6的非金属成分即C、N在切削工具所需的硬度及韧性上优异,x(N组成比率)的特别优选的范围是0.5≤x≤1。
另外,被覆层6可以是将由Tia1Alb1Md1(C1-x1Nx1)(其中,0≤a1≤1,0≤b1≤0.8,0≤d1≤0.4,a1+b1+d1=1,0≤x1≤1)表示的第一被覆层与由Tia2Alb2Md2(C1-x2Nx2)(其中,0≤a2≤1,0≤b2≤0.8,0≤d2≤0.4,a2+b2+d2=1,并且排除a1=a2且b1=b2且d1=d2的情况。)表示的第二被覆层反复交替层叠十层以上的结构。
作为表面被覆层6的成膜方法,可以应用离子镀敷法或溅射法等物理蒸镀(PVD)法,作为将这种熔粒7形成在被覆层6表面上的方法,优选应用电弧离子镀敷法。
需要说明的是,作为基体2,优选使用由以碳化钨或碳氮化钛为主成分的硬质相和以钴、镍等铁族金属为主成分的结合相构成的超硬合金或金属陶瓷的硬质合金、将以氮化硅或氧化铝为主成分的陶瓷、多结晶金刚石、立方晶氮化硼构成的硬质相和陶瓷或铁族金属等的结合相在超高压下进行烧成而得到的超高压烧结体等硬质材料。
(制造方法)
接下来,说明本发明的切削工具的制造方法。
首先,使用现有公知的方法制作工具形状的基体。接着,在基体的表面上成膜出被覆层。作为被覆层的成膜方法,可以优选应用离子镀敷法或溅射法等物理蒸镀(PVD)法。对于成膜方法的一例的详细情况进行说明时,在利用离子镀敷法制作被覆层的情况下,使用分别独立地含有金属钛(Ti)、金属铝(Al)以及根据需要而选择的金属M(其中,M是从Si、W、Nb、Mo、Ta、Hf、Cr、Zr及Y中选出的至少一种以上)的金属靶(target)、复合化的合金靶或烧结体靶,安置在腔室的侧壁面位置。
此时,根据本发明,准备含有上述金属的靶,并另外准备Al或Ti含有得比上述靶多的副靶,将含有较多Al成分的副靶安置在腔室的上壁面位置,含有较多Ti成分的副靶安置在腔室的侧壁面位置,利用后述的成膜条件进行成膜,由此将成膜后的被覆层的组成及熔粒的组成形成为本发明的结构。需要说明的是,作为靶的制作方法,在使用混合金属粉末而烧固的烧结靶时,与使用先使金属成分熔融而再次固化的合金靶相比,具有向被覆层的表面析出的熔粒的量增多的倾向。
作为成膜条件,使用这些靶,通过电弧放电或辉光放电等使金属源蒸发进行离子化,同时,通过与氮源的氮(N2)气或碳源的甲烷(CH4)/乙炔(C2H2)气体发生反应的离子镀敷法或溅射法而成膜出被覆层及熔粒。此时,基体的安置位置定位在后刀面与腔室的侧面大致平行且前刀面与腔室的上表面大致平行的方向上。此时,通过向主靶流过100~200A的电弧电流,向侧面的含有较多Ti成分的副靶流过70~150A的电弧电流,向上表面的含有较多Al成分的副靶流过150~250A的电弧电流,而能够将被覆层自身的组成与熔粒的组成控制成不同,存在于前刀面上的熔粒与前刀面的被覆层的组成相比,Al的含有率高,存在于后刀面上的熔粒的组成与后刀面的被覆层的组成相比,Ti的含有率高。需要说明的是,侧面的含有较多Ti成分的副靶仅在成膜即将结束之前流过电弧电流。
需要说明的是,在通过离子镀敷法或溅射法来成膜出上述被覆层时,考虑被覆层的结晶结构,为了能够制作高硬度的被覆层并提高与基体的密接性而优选施加20~200V的偏置电压。
另外,为了成膜出上述层叠结构的被覆层,将与第一被覆层的组成接近的组成的第一靶和与第二被覆层的组成接近的组成的第二靶这两个组成的靶安装在成膜装置的侧面,并且用于调整熔粒组成的靶安装在距腔室的上壁面的第一靶或第二靶的位置近的位置,使试料在装置内旋转的同时进行成膜,由此形成上述层叠结构的被覆层。
【实施例1】
以平均粒径0.8μm的碳化钨(WC)粉末为主成分,并将平均粒径1.2μm的金属钴(Co)粉末以10质量%,平均粒径1.0μm的碳化钒(VC)粉末以0.1质量%,平均粒径1.0μm的碳化铬(Cr3C2)粉末以0.3质量%的比例添加于其中并进行混合,通过冲压成形而成形为DCGT11T302MFCQ形状的不重磨刀片形状之后,实施脱粘合剂处理,在0.01Pa的真空中,以1450℃烧成1小时而制作超硬合金。而且,对各试料的前刀面表面通过喷丸加工、电刷加工等而进行研磨加工。然后,对制作的超硬合金利用电刷加工而实施刀尖处理(珩磨)。
对于如此制作的基体,施加表1所示的成膜温度及偏置电压,使表1所示的电弧电流分别流过主靶、侧面的副靶、上表面的副靶,从而成膜出表2所示的组成的被覆层。需要说明的是,侧面的含有较多Ti成分的副靶仅在成膜即将结束之前流过电弧电流。
[表1]
对于得到的试料,利用能量分散分光分析(EDS)(Ametek公司制EDAX)测定了被覆层表面的前刀面及后刀面的各面的任意三个部位及前刀面及后刀面表面上形成的直径3μm以上的熔粒各10个的组成,算出它们的平均值作为被覆层的前刀面、后刀面及各面表面上的熔粒的组成。而且,利用触针式表面粗糙度仪(东京精密公司制SURFCOM)分别测定了前刀面及后刀面的长度2mm的三个部位,并进行平均而算出Rar、Rzr、Raf、Rzf。需要说明的是,在表面粗糙度的测定中,截止值为0.25mm,评价长度为1.25mm。
[表2]
接下来,使用得到的外径切削工具DCGT11T302MFCQ形状的不重磨刀片,按以下的切削条件进行了切削试验。结果如表3所示。
切削方法:外径车削加工
被切削材料:碳素钢(S45C)
切削速度:120m/分钟
进给量:0.05mm/rev
切入量:1.2mm
切削状态:湿式
评价方法:利用光学显微镜测定了180分钟切削后的前刀面月牙洼磨损的有无、卷刃的有无。而且,对于被切削材料的表面粗糙度,利用接触式表面粗糙度仪(东京精密公司制SURFCOM)测定了算术平均粗糙度Ra。
[表3]
根据表1~3所示的结果,在前刀面存在的熔粒的Al的含有率AlDR为前刀面的被覆层的Al的含有率AlbR以下的试料No.I-11中,耐磨损性差。另外,在后刀面存在的熔粒的Ti的含有率与后刀面的被覆层的Ti的含有率相同的试料No.I-12中,由于缺损的发生而提前达到工具寿命。
相对于此,在本发明的范围内的试料No.I-1~10中,被覆层的耐缺损性及耐氧化性均优异而发挥了良好的切削性能。
【实施例2】
使用实施例1的切削嵌入基体,将表4所示的三种靶在侧面上安装两种且在上表面上安装一种,与实施例1同样地成膜出表4所示的被覆层。需要说明的是,主靶使用烧结靶,在腔室的侧壁面上各安置一个。而且,副靶使用表4记载的各金属的合金靶或烧结靶,在腔室的表4所示的安置位置的壁面上设置一个。
[表4]
对于得到的嵌入物,与实施例1同样地,进行了被覆层及熔粒的组成的定量分析,并测定了Rar、Rzr、Raf、Rzf。结果如表5、表6所示。需要说明的是,利用透过型电子显微镜(TEM)观察被覆层时,成为以厚度10nm以下的间隔将表5的组成(详细)所示的第一层(上段)与第二层(下段)层叠的结构。然后,使用得到的嵌入物,利用与实施例1相同的切削条件进行了切削试验。结果如表6所示。
[表5]
[表6]
通过表4~6可知,前刀面存在的熔粒的Al的含有率比前刀面的被覆层的Al的含有率多的试料No.II-1~4的被覆层的耐缺损性及耐氧化性均优异而发挥了良好的切削性能。
【符号说明】
1切削工具
2基体
3前刀面
4后刀面
5切削刃
6被覆层
7熔粒
Claims (5)
1.一种切削工具,其中,
在前刀面与后刀面的交叉棱线具有切削刃,在基体的表面覆盖由TiaAlbMd(C1-xNx)构成的被覆层,其中,M是从Si、W、Nb、Mo、Ta、Hf、Cr、Zr及Y中选出的至少一种,0.35≤a≤0.55,0.3≤b≤0.6,0≤d≤0.25,a+b+d=1,0≤x≤1,
在该被覆层的表面存在熔粒,并且,存在于所述前刀面上的熔粒的组成与所述前刀面的所述被覆层的组成相比,Al的含有率高,而且,存在于所述后刀面上的熔粒的组成与所述后刀面的所述被覆层的组成相比,Ti的含有率高。
2.根据权利要求1所述的切削工具,其中,
存在于所述前刀面上的熔粒的Al的含有率AlDR与所述被覆层的所述前刀面的Al的含有率AlbR之比为1.05≤AlDR/AlbR≤1.25,存在于所述后刀面上的熔粒的Ti的平均含有率TiDF与所述被覆层的所述后刀面的Ti的含有率TiaF之比为1.03≤TiDF/TiaF≤1.2。
3.根据权利要求1所述的切削工具,其中,
在所述被覆层的前刀面的算术平均表面粗糙度及最大高度分别为RaR、RzR,所述被覆层的后刀面的算术平均表面粗糙度及最大高度分别为RaF、RzF时,0.07μm≤RaR≤0.3μm,0.3μm≤RzR≤0.9μm,0.05μm≤RaF≤0.15μm,0.15μm≤RzF≤0.6μm。
4.根据权利要求2所述的切削工具,其中,
在所述被覆层的前刀面的算术平均表面粗糙度及最大高度分别为RaR、RzR,所述被覆层的后刀面的算术平均表面粗糙度及最大高度分别为RaF、RzF时,0.07μm≤RaR≤0.3μm,0.3μm≤RzR≤0.9μm,0.05μm≤RaF≤0.15μm,0.15μm≤RzF≤0.6μm。
5.根据权利要求1~4中任一项所述的切削工具,其中,
所述被覆层是由Tia1Alb1Md1(C1-x1Nx1)表示的第一被覆层与由Tia2Alb2Md2(C1-x2Nx2)表示的第二被覆层反复交替层叠十层以上的结构,
其中,在Tia1Alb1Md1(C1-x1Nx1)中,0≤a1≤1,0≤b1≤0.8,0≤d1≤0.4,a1+b1+d1=1,0≤x1≤1,
在Tia2Alb2Md2(C1-x2Nx2)中,0≤a2≤1,0≤b2≤0.8,0≤d2≤0.4,a2+b2+d2=1,0≤x2≤1,并且排除a1=a2且b1=b2且d1=d2的情况。
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