CN102810617B - 发光二极管封装结构及其制造方法 - Google Patents
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- 238000004519 manufacturing process Methods 0.000 title claims abstract description 13
- 239000000463 material Substances 0.000 claims abstract description 19
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 claims abstract description 18
- 229920005989 resin Polymers 0.000 claims abstract description 15
- 239000011347 resin Substances 0.000 claims abstract description 15
- YHWCPXVTRSHPNY-UHFFFAOYSA-N butan-1-olate;titanium(4+) Chemical compound [Ti+4].CCCC[O-].CCCC[O-].CCCC[O-].CCCC[O-] YHWCPXVTRSHPNY-UHFFFAOYSA-N 0.000 claims abstract description 11
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 claims abstract description 11
- 239000000178 monomer Substances 0.000 claims abstract description 8
- 239000000758 substrate Substances 0.000 claims description 99
- 239000008393 encapsulating agent Substances 0.000 claims description 16
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 claims description 12
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical group [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 10
- 238000000034 method Methods 0.000 claims description 10
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims description 8
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 claims description 8
- 238000007789 sealing Methods 0.000 claims description 4
- 239000007921 spray Substances 0.000 claims description 3
- 238000002791 soaking Methods 0.000 claims description 2
- 238000002347 injection Methods 0.000 claims 1
- 239000007924 injection Substances 0.000 claims 1
- GNKTZDSRQHMHLZ-UHFFFAOYSA-N [Si].[Si].[Si].[Ti].[Ti].[Ti].[Ti].[Ti] Chemical compound [Si].[Si].[Si].[Ti].[Ti].[Ti].[Ti].[Ti] GNKTZDSRQHMHLZ-UHFFFAOYSA-N 0.000 abstract 1
- LFRDHGNFBLIJIY-UHFFFAOYSA-N trimethoxy(prop-2-enyl)silane Chemical compound CO[Si](OC)(OC)CC=C LFRDHGNFBLIJIY-UHFFFAOYSA-N 0.000 abstract 1
- 239000004020 conductor Substances 0.000 description 4
- 239000000843 powder Substances 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000012535 impurity Substances 0.000 description 3
- 239000000741 silica gel Substances 0.000 description 3
- 229910002027 silica gel Inorganic materials 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000003822 epoxy resin Substances 0.000 description 2
- 238000004806 packaging method and process Methods 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- 230000007704 transition Effects 0.000 description 2
- XYGKGASSKJWLTN-UHFFFAOYSA-N CCCCCCC.CCCCCCC Chemical compound CCCCCCC.CCCCCCC XYGKGASSKJWLTN-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 230000006978 adaptation Effects 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000004411 aluminium Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 238000005323 electroforming Methods 0.000 description 1
- 238000005538 encapsulation Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000003032 molecular docking Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 238000004064 recycling Methods 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000011135 tin Substances 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- -1 titan silicate Chemical class 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 238000004078 waterproofing Methods 0.000 description 1
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Abstract
一种发光二极管封装结构,包括基板、形成于基板上的电极、装设于基板上并与电极电连接的发光二极管芯片以及设于基板上环绕所述发光二极管芯片的封装物,所述基板包括第一表面和与第一表面相对的第二表面,所述发光二极管芯片设置于基板的第一表面上,还包括一个覆盖部,该覆盖部围设于该发光二极管封装结构的外围并密封所述基板、电极与基板上的封装物相接合的接缝,该覆盖部的材料为钛硅酸盐树脂,其反应单体包括庚烷,稀丙基三甲氧基硅烷,正钛酸四丁酯及正硅酸甲酯,质量百分比分别为,庚烷大于60.0%,稀丙基三甲氧基硅烷7.0%至13.0%、正钛酸四丁酯5.0%至10.0%以及正硅酸甲酯小于0.1%。本发明还涉及一种发光二极管封装结构的制造方法。
Description
技术领域
本发明涉及半导体结构,尤其涉及一种发光二极管封装结构及其制造方法。
背景技术
现有的发光二极管(Light Emitting Diode, LED)封装结构通常包括一个基板,形成于基板上的电极、在基板装设的发光二极管芯片以及覆盖发于光二极管芯片的封装层。在另一些结构中,还可以在基板上形成反射杯环绕于发光二极管芯片,封装层填充于反射杯内并覆盖于发光二极管芯片。这些发光二极管封装结构中封装层与基板之间或反射杯与基板之间容易形成缝隙,水汽和灰尘容易沿该缝隙进入封装后的发光二极管封装结构中,从而影响该发光二极管封装结构的寿命,甚至造成发光二极管的失效。
发明内容
有鉴于此,有必要提供一种密封性更好的发光二极管封装结构及其制造方法。
一种发光二极管封装结构,包括基板、形成于基板上的电极、装设于基板上并与电极电连接的发光二极管芯片以及设于基板上环绕所述发光二极管芯片的封装物,所述基板包括第一表面和与第一表面相对的第二表面,所述发光二极管芯片设置于基板的第一表面上,还包括一个覆盖部,该覆盖部围设于该发光二极管封装结构的外围并密封所述基板、电极与基板上的封装物相接合的接缝,该覆盖部的材料为钛硅酸盐树脂,其反应单体包括庚烷,稀丙基三甲氧基硅烷,正钛酸四丁酯及正硅酸甲酯,质量百分比分别为,庚烷大于60.0%,稀丙基三甲氧基硅烷7.0%至13.0%、正钛酸四丁酯5.0%至10.0%以及正硅酸甲酯小于0.1%。
一种发光二极管封装结构的制造方法,包括以下步骤:
提供形成有电极的基板,该基板具有第一表面和相对的第二表面,该电极形成在第一表面上;
将发光二极管芯片固定于基板的第一表面上,并将发光二极管芯片与所述电极电性连接;
形成一封装层于基板上,覆盖所述发光二极管芯片;
形成覆盖部于发光二极管封装结构的外围,该覆盖部覆盖基板和基板上设置的元件的接缝,该覆盖部的材料为钛硅酸盐树脂,其反应单体及含量包括,庚烷大于60.0%,稀丙基三甲氧基硅烷7.0%至13.0%、正钛酸四丁酯5.0%至10.0%以及正硅酸甲酯小于0.1%。
上述发光二极管封装结构中,由于在发光二极管封装结构的外围设置覆盖部,该覆盖部采用钛硅酸盐树脂制成,其具有良好的防水效果,将其覆盖于基板与基板上设置的封装物对接的接缝处,从而使外界的水汽和杂质难于穿过该覆盖部进入到封装体内部,起到有效的防尘、防水的作用。
附图说明
图1是本发明一实施方式提供的一种发光二极管封装结构剖视示意图。
图2是本发明一实施方式提供的一种发光二极管封装结构俯视示意图。
图3是本发明另一实施方式提供的一种发光二极管封装结构剖视示意图。
图4是本发明一实施方式提供的一种发光二极管封装结构的制造方法流程图。
主要元件符号说明
发光二极管封装结构 | 10、20 |
基板 | 11 |
第一表面 | 111 |
第二表面 | 112 |
第一边 | 113 |
第二边 | 114 |
电极 | 12 |
发光二极管芯片 | 13 |
金属导线 | 131 |
反射杯 | 14 |
接缝 | 141、241 |
封装层 | 15、25 |
覆盖部 | 16 |
如下具体实施方式将结合上述附图进一步说明本发明。
具体实施方式
请参阅图1和图2,本发明的一实施方式提供一种发光二极管封装结构10,其包括基板11、设置于该基板11上的电极12、装设于基板11上的发光二极管芯片13、形成于基板11上并环绕发光二极管芯片13的封装物和围设于该发光二极管封装结构10外围的覆盖部16。本实施例中封装物为覆盖发光二极管芯片13于基板11上的封装层15及位于该封装层15外围的反射杯14。
所述基板11包括相对的第一表面111和第二表面112及连接该第一表面111和第二表面112的相对两侧面。在本实施例中,该基板11包括相对的两条第一边113和相对的两条第二边114,该第一边113和第二边114围成矩形状。可以理解,所述基板11各边的长度可以相同或不同,进一步的,所述基板11的形状并不限于矩形,其形状还可以为圆形等。
所述电极12设置于所述基板11上,并从该基板11的第一表面111绕行基板11的相对两侧面延伸至基板11的第二表面112。所述电极12至少为两个。所述电极12相互间隔设置,使两电极12之间相互电性绝缘。所述电极12所用的材料为导电性能较好的金属材料,如金、银、铜、铂、铝、镍、锡或镁中的一种或几种的合金。
所述发光二极管芯片13位于第一表面111上。更具体的,发光二极管芯片13可贴置于其中一电极12上。所述发光二极管芯片13通过金属导线131与所述电极12电性连接。可以理解的,该发光二极管芯片13也可以采用覆晶的方式固定于电极12上并与电极12电连接。
所述反射杯14形成于所述第一表面111上。该反射杯14环绕基板11的第一边113和第二边114将发光二极管芯片13围设于反射杯14之中。所述反射杯14的外围与基板11的外围平滑对接。反射杯14的底面在基板11的第一表面111与电极12的接合处形成接缝141。
所述封装层15形成于所述基板11上的反射杯14内,覆盖所述发光二极管芯片13和金属导线131。所述封装层15的材质可以为硅胶(silicone)、环氧树脂(epoxy resin)或二者的混合物。所述封装层15还可以包含荧光转换材料,该萤光转换材料可以为石榴石基荧光粉、硅酸盐基荧光粉、原硅酸盐基荧光粉、硫化物基荧光粉、硫代镓酸盐基荧光粉和氮化物基荧光粉。封装层15在基板11的第一表面111与所述电极12的接合处形成接缝141。
所述覆盖部16设置于发光二极管封装结构10的外围,密封基板11、电极12与反射杯14、封装层15之间的接缝141,即,覆盖部16密封围绕基板11、电极12与封装物之间的接缝141。在本实施例中,该覆盖部16覆盖于基板11和电极12与反射杯14对接的接缝141处,并以该接缝141处为起点分别向基板11和封装层15背向延伸,该覆盖部16不超过该基板11的第二表面112和反射杯14远离发光二极管芯片13的顶面。更确切地说,该覆盖部16由接缝141处向基板11的第二表面112延伸且未延伸至该第二表面112;该覆盖部16由接缝141处向反射杯14的顶面方向延伸且未延伸至反射杯14的顶面。可以理解地,该覆盖部16的形状及大小具有灵活性,可根据设计需要和材料用量的要求进行控制。
该覆盖部16的材料为钛硅酸盐树脂(silicone-titanate resin)。该钛硅酸盐树脂的反应单体包括:庚烷(Heptane),稀丙基三甲氧基硅烷(Allytrimethoxysilane)、正钛酸四丁酯(Tetrabutyl titanate)以及正硅酸甲酯(Tetramethoxysilane)。各单体的质量百分比为:庚烷(Heptane)大于60.0%,稀丙基三甲氧基硅烷(Allytrimethoxysilane)7.0%至13.0%、正钛酸四丁酯(Tetrabutyl titanate)5.0%至10.0%以及正硅酸甲酯(Tetramethoxysilane)小于0.1%。该覆盖部16具有良好的防水效果,可以避免外界的水汽或杂质通过该接缝141从而进入到封装体的内部。
请参阅图3,本发明另一实施方式提供的发光二极管封装结构20,其包括:基板11,该基板11上形成有两电极12,装设于基板11上并与电极12电连接的发光二极管芯片13,覆盖发光二极管芯片13与基板11的封装物和围设于该发光二极管封装结构20外围的覆盖部16。本实施例中封装物为封装层25。
所述封装层25直接覆盖于基板11的第一表面111上,并与基板11的侧边对接。该封装层25与第一表面111的对接处形成接缝241。在本实施方式中,该封装层25的材质为硅胶。
所述覆盖部16环绕该发光二极管芯片20的外围,密封覆盖于基板11、电极12与对接的封装层25的外围的接缝241处,即,覆盖部16密封围绕基板11、电极12与封装物之间的接缝241。该覆盖部16的材料为钛硅酸盐树脂(silicone-titanate resin),其反应单体及含量与前述实施方式中相同。该覆盖部16以接缝241为起点,分别向封装层25和电极12两相反的方向各延伸一段距离d。该距离d较小,以不对发光二极管芯片13发出的光线形成遮挡为佳。以发光二极管芯片13的出光角度为120°为例,距离d与发光二极管芯片13距基板11的侧壁距离的比值需小于tan30°,如此可控制该覆盖部16在发光二极管芯片13发射光线角度之外,而此时,距离d的大小随发光二极管芯片13距基板11的侧壁的距离而变化。在其他实施方式中,若距离d较大,使覆盖部16对发光二极管芯片13形成遮挡,然而由于覆盖部16的折射率小于封装层25的折射率,故仍然可以增加封装结构的出光效率。钛硅酸盐树脂与硅胶两者的密合度较高,故直接将覆盖部16覆盖于基板11、电极12与封装层25的接合处能够使防水性能更佳。
请参阅图4,本发明实施方式提供的一种发光二极管封装结构的制造方法,包括以下步骤:
提供形成有电极12的基板11,该基板11具有第一表面111和相对的第二表面112,该电极12形成在第一表面111上;
将发光二极管芯片13固定于基板11的第一表面111上,并将发光二极管芯片13与所述电极12电性连接;
形成一封装层15于基板11上,覆盖所述发光二极管芯片13;
形成覆盖部16于发光二极管封装结构的外围,该覆盖部16覆盖基板11和基板11上设置的封装层15的接缝141。
所述电极12可通过机械、蚀刻或激光加工技术在基板11上形成孔洞后,再利用溅镀、电镀、电铸或蒸镀的方式形成。
发光二极管芯片13采用固晶打线方式固定于基板11上,并通过金属导线131与电极12电连接。
所述覆盖部16采用钛硅酸盐树脂(silicone-titanate resin)材料,利用喷涂或浸泡的方式制作而成。采用喷涂的方式可以使制作过程简单,并能够根据所需的用量进行喷涂,有效地节省材料,且可根据设计需要灵活的控制喷涂的厚度、面积和位置等。采用浸泡的方式,是先将发光二极管封装结构用保护材料包裹,仅预留需要形成覆盖部16的区域裸露于保护材料之外,然后将发光二极管封装结构容置于钛硅酸盐树脂溶液中,再将其取出,加热烧结,去除包裹材料,形成具有覆盖部16的发光二极管封装结构。
本发明实施方式提供的发光二极管封装结构中,由于在基板、电极和基板上设置的封装物对接的接缝处密封设置覆盖部,该覆盖部具有较好的防水性,使外界的水汽和杂质难于穿过覆盖部并通过接缝进入到封装体以内,避免了发光二极管芯片受到外界的污染而损坏。且该覆盖部与反射杯也具有较好的接合性,使两者之间的接合更加紧密。
可以理解的是,对于本领域的普通技术人员来说,可以根据本发明的技术构思做出其它各种相应的改变与变形,而所有这些改变与变形都应属于本发明权利要求的保护范围。
Claims (9)
1.一种发光二极管封装结构,包括基板、形成于基板上的电极、装设于基板上并与电极电连接的发光二极管芯片以及设于基板上环绕所述发光二极管芯片的封装物,所述基板包括第一表面和与第一表面相对的第二表面,所述发光二极管芯片设置于基板的第一表面上,其特征在于:还包括一个覆盖部,该覆盖部围设于所述基板、电极以及封装物结合的接缝并密封所述基板、电极与基板上的封装物相接合的接缝,该覆盖部的材料为钛硅酸盐树脂,所述封装物包含一将所述发光二极管芯片覆盖在基板上的封装层,该覆盖部的折射率小于封装层的折射率,其反应单体包括庚烷,稀丙基三甲氧基硅烷,正钛酸四丁酯及正硅酸甲酯,质量百分比分别为,庚烷大于60.0%,稀丙基三甲氧基硅烷7.0%至13.0%、正钛酸四丁酯5.0%至10.0%以及正硅酸甲酯小于0.1%。
2.如权利要求1所述的发光二极管封装结构,其特征在于:所述电极至少为两个,且自基板的第一表面延伸至第二表面,所述接缝形成于所述封装层与基板及电极的接合处。
3.如权利要求2所述的发光二极管封装结构,其特征在于:所述覆盖部覆盖于该接缝,并以该接缝为中心分别向基板和封装层背向延伸,且该覆盖部未延伸至该基板的第二表面和封装层的顶面。
4.如权利要求1所述的发光二极管封装结构,其特征在于:所述封装物还包括一个环绕所述封装层的反射杯,该反射杯的底面与基板的第一表面接合,所述接缝形成于反射杯与所述基板及电极于基板第一表面的对接处。
5.如权利要求4所述的发光二极管封装结构,其特征在于:所述覆盖部覆盖于该接缝,并以该接缝为起点分别自所述基板和反射杯背向延伸,且该覆盖部未延伸至该基板的第二表面和反射杯的顶面。
6.一种发光二极管封装结构的制造方法,包括以下步骤:
提供形成有电极的基板,该基板具有第一表面和相对的第二表面,该电极形成在第一表面上;
将发光二极管芯片固定于基板的第一表面上,并将发光二极管芯片与所述电极电性连接;
形成一封装层于基板上,环绕覆盖所述发光二极管芯片;
形成覆盖部围设于封装物与电极以及电极与基板结合的接缝,该覆盖部密封基板、电极与基板上设置的封装层相接合的接缝,该覆盖部的材料为钛硅酸盐树脂,该覆盖部的折射率小于封装层的折射率,其反应单体及含量包括,庚烷大于60.0%,稀丙基三甲氧基硅烷7.0%至13.0%、正钛酸四丁酯5.0%至10.0%以及正硅酸甲酯小于0.1%。
7.如权利要求6所述的发光二极管封装结构的制造方法,其特征在于:所述覆盖部覆盖于所述接缝,并以该接缝为起点分别自基板和封装层背向延伸,该覆盖部未延伸至该基板的第二表面,也不阻挡发光二极管芯片的射出的光线。
8.如权利要求6所述的发光二极管封装结构的制造方法,其特征在于:将发光二极管芯片固定于基板上的步骤之前还包括在基板的第一表面上形成一个反射杯,所述覆盖部覆盖在基板及电极与反射杯的接缝处。
9.如权利要求6-8项中任意一项所述的发光二极管封装结构的制造方法,其特征在于:所述覆盖部是采用浸泡或喷涂的方式制成。
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