CN102808158A - 银靶材溅射系统 - Google Patents
银靶材溅射系统 Download PDFInfo
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- CN102808158A CN102808158A CN2011101435685A CN201110143568A CN102808158A CN 102808158 A CN102808158 A CN 102808158A CN 2011101435685 A CN2011101435685 A CN 2011101435685A CN 201110143568 A CN201110143568 A CN 201110143568A CN 102808158 A CN102808158 A CN 102808158A
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- silver
- cooling water
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Abstract
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Claims (3)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN2011101435685A CN102808158A (zh) | 2011-05-31 | 2011-05-31 | 银靶材溅射系统 |
Applications Claiming Priority (1)
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CN2011101435685A CN102808158A (zh) | 2011-05-31 | 2011-05-31 | 银靶材溅射系统 |
Publications (1)
Publication Number | Publication Date |
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CN102808158A true CN102808158A (zh) | 2012-12-05 |
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CN2011101435685A Pending CN102808158A (zh) | 2011-05-31 | 2011-05-31 | 银靶材溅射系统 |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104694887A (zh) * | 2013-12-09 | 2015-06-10 | 财团法人金属工业研究发展中心 | 镀膜设备 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04272174A (ja) * | 1991-02-27 | 1992-09-28 | Clarion Co Ltd | スパッタ装置 |
US6113754A (en) * | 1998-07-02 | 2000-09-05 | Samsung Electronics Co., Ltd. | Sputtering apparatus having a target backing plate equipped with a cooling line and sputtering method using the same |
CN2565842Y (zh) * | 2002-07-11 | 2003-08-13 | 中国科学院物理研究所 | 一种平面磁控溅射靶 |
CN101070590A (zh) * | 2006-02-22 | 2007-11-14 | 应用材料有限责任与两合公司 | 具有冷却靶的溅射 |
-
2011
- 2011-05-31 CN CN2011101435685A patent/CN102808158A/zh active Pending
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04272174A (ja) * | 1991-02-27 | 1992-09-28 | Clarion Co Ltd | スパッタ装置 |
US6113754A (en) * | 1998-07-02 | 2000-09-05 | Samsung Electronics Co., Ltd. | Sputtering apparatus having a target backing plate equipped with a cooling line and sputtering method using the same |
CN2565842Y (zh) * | 2002-07-11 | 2003-08-13 | 中国科学院物理研究所 | 一种平面磁控溅射靶 |
CN101070590A (zh) * | 2006-02-22 | 2007-11-14 | 应用材料有限责任与两合公司 | 具有冷却靶的溅射 |
Non-Patent Citations (1)
Title |
---|
史月艳等: "《太阳光谱选择性吸收膜系设计、制备及测评》", 31 March 2009, 清华大学出版社 * |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104694887A (zh) * | 2013-12-09 | 2015-06-10 | 财团法人金属工业研究发展中心 | 镀膜设备 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
ASS | Succession or assignment of patent right |
Owner name: WUXI HUARUN SHANGHUA TECHNOLOGY CO., LTD. Free format text: FORMER OWNER: WUXI CSMC SEMICONDUCTOR CO., LTD. Effective date: 20140519 Free format text: FORMER OWNER: WUXI HUARUN SHANGHUA TECHNOLOGY CO., LTD. Effective date: 20140519 |
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C41 | Transfer of patent application or patent right or utility model | ||
TA01 | Transfer of patent application right |
Effective date of registration: 20140519 Address after: 214028 Xinzhou Road, Wuxi national hi tech Industrial Development Zone, Jiangsu, China, No. 8 Applicant after: Wuxi Huarun Shanghua Technology Co., Ltd. Address before: 214028 Wuxi provincial high tech Industrial Development Zone, Hanjiang Road, No. 5, Jiangsu, China Applicant before: Wuxi CSMC Semiconductor Co., Ltd. Applicant before: Wuxi Huarun Shanghua Technology Co., Ltd. |
|
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C02 | Deemed withdrawal of patent application after publication (patent law 2001) | ||
WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20121205 |