CN206033869U - 一种新型的靶材冷却系统装置 - Google Patents
一种新型的靶材冷却系统装置 Download PDFInfo
- Publication number
- CN206033869U CN206033869U CN201621123620.5U CN201621123620U CN206033869U CN 206033869 U CN206033869 U CN 206033869U CN 201621123620 U CN201621123620 U CN 201621123620U CN 206033869 U CN206033869 U CN 206033869U
- Authority
- CN
- China
- Prior art keywords
- cooling
- target
- cooling tube
- grades
- tube
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000001816 cooling Methods 0.000 title claims abstract description 78
- 239000000498 cooling water Substances 0.000 claims abstract description 30
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical group [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 10
- 229910052802 copper Inorganic materials 0.000 claims description 9
- 239000010949 copper Substances 0.000 claims description 9
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 4
- 230000001815 facial effect Effects 0.000 claims description 2
- 230000001131 transforming effect Effects 0.000 abstract 1
- 238000004544 sputter deposition Methods 0.000 description 9
- 239000010408 film Substances 0.000 description 8
- 238000000576 coating method Methods 0.000 description 5
- 238000001755 magnetron sputter deposition Methods 0.000 description 5
- 239000011248 coating agent Substances 0.000 description 4
- 238000005240 physical vapour deposition Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 239000002826 coolant Substances 0.000 description 2
- 230000006378 damage Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000010849 ion bombardment Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000009825 accumulation Methods 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000008358 core component Substances 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000013467 fragmentation Methods 0.000 description 1
- 238000006062 fragmentation reaction Methods 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- -1 quasiconductor Substances 0.000 description 1
- 238000005477 sputtering target Methods 0.000 description 1
- 239000013077 target material Substances 0.000 description 1
- 230000008646 thermal stress Effects 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Abstract
Description
Claims (3)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201621123620.5U CN206033869U (zh) | 2016-10-15 | 2016-10-15 | 一种新型的靶材冷却系统装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201621123620.5U CN206033869U (zh) | 2016-10-15 | 2016-10-15 | 一种新型的靶材冷却系统装置 |
Publications (1)
Publication Number | Publication Date |
---|---|
CN206033869U true CN206033869U (zh) | 2017-03-22 |
Family
ID=58297988
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201621123620.5U Active CN206033869U (zh) | 2016-10-15 | 2016-10-15 | 一种新型的靶材冷却系统装置 |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN206033869U (zh) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107858658A (zh) * | 2017-12-26 | 2018-03-30 | 安徽金美新材料科技有限公司 | 一种靶材冷却装置 |
CN108225810A (zh) * | 2018-01-12 | 2018-06-29 | 北京航空航天大学 | 防溅射分子沉结构 |
CN109825811A (zh) * | 2019-04-04 | 2019-05-31 | 浙江工业大学 | 一种半导体制冷片靶材冷却装置 |
-
2016
- 2016-10-15 CN CN201621123620.5U patent/CN206033869U/zh active Active
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107858658A (zh) * | 2017-12-26 | 2018-03-30 | 安徽金美新材料科技有限公司 | 一种靶材冷却装置 |
CN108225810A (zh) * | 2018-01-12 | 2018-06-29 | 北京航空航天大学 | 防溅射分子沉结构 |
CN109825811A (zh) * | 2019-04-04 | 2019-05-31 | 浙江工业大学 | 一种半导体制冷片靶材冷却装置 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN206033869U (zh) | 一种新型的靶材冷却系统装置 | |
CN105792605B (zh) | 一种三维空间网络多孔高效散热器及应用 | |
CN101853822B (zh) | 散热器件及其制造方法 | |
CN102586737A (zh) | 铝铜膜的物理气相沉积方法 | |
CN208791743U (zh) | 一种利于冷却的旋转靶靶管 | |
TW200416293A (en) | Cooled deposition baffle in high density plasma semiconductor processing | |
CN202595259U (zh) | 磁控溅射设备 | |
CN109023274A (zh) | 手表表盘字钉真空镀膜方法 | |
CN102383097A (zh) | 一种铝硅铜薄膜的制备方法 | |
CN204474752U (zh) | 一种磁控溅射设备及其阴极靶材组件 | |
CN201725788U (zh) | 新型散热器件 | |
CN103805954A (zh) | 磁控溅射镀膜系统 | |
CN217160332U (zh) | 一种纳米涂层机偏压电源水冷控制系统 | |
CN103681960A (zh) | 一种制备cigs薄膜的前驱层cig的多步溅射工艺 | |
CN104204270A (zh) | 真空成膜装置及真空成膜方法 | |
CN209722290U (zh) | 一种半导体制冷片靶材冷却装置 | |
CN215163066U (zh) | 一种真空蒸镀机的大容量坩埚结构 | |
CN109338302A (zh) | 一种合成石墨无胶粘复合材料的制备方法 | |
CN208104526U (zh) | 一种靶材冷却装置 | |
CN206127411U (zh) | 一种磁控溅射装置 | |
CN105575871A (zh) | 承载装置和反应腔室 | |
CN209702844U (zh) | 一种镀膜设备用水冷板 | |
CN208008874U (zh) | 一种真空镀膜机冷却装置 | |
CN103074586B (zh) | 一种低温低损伤多功能复合镀膜的装置和方法 | |
CN205295448U (zh) | 溅射镍靶材生产中的冷却装置 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
CP02 | Change in the address of a patent holder |
Address after: 233010 Yan Nan Road, Bengbu high tech Zone, Bengbu, Anhui Province Patentee after: TRIUMPH PHOTOVOLTAIC MATERIAL Co.,Ltd. Address before: Tu Shan Lu Yuhui District 233010 Anhui city of Bengbu Province, No. 1047 Patentee before: TRIUMPH PHOTOVOLTAIC MATERIAL Co.,Ltd. |
|
CP02 | Change in the address of a patent holder | ||
EE01 | Entry into force of recordation of patent licensing contract |
Assignee: BENGBU XINGKE GLASS Co.,Ltd. Assignor: TRIUMPH PHOTOVOLTAIC MATERIAL Co.,Ltd. Contract record no.: X2023980053897 Denomination of utility model: A New Type of Target Cooling System Device Granted publication date: 20170322 License type: Common License Record date: 20231229 |
|
EE01 | Entry into force of recordation of patent licensing contract |