CN102800818A - Method and structure for improving light emitting rate of bottom-emission organic electroluminescent device - Google Patents
Method and structure for improving light emitting rate of bottom-emission organic electroluminescent device Download PDFInfo
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- CN102800818A CN102800818A CN2012102626218A CN201210262621A CN102800818A CN 102800818 A CN102800818 A CN 102800818A CN 2012102626218 A CN2012102626218 A CN 2012102626218A CN 201210262621 A CN201210262621 A CN 201210262621A CN 102800818 A CN102800818 A CN 102800818A
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Abstract
The invention discloses a method for improving the light emitting rate of a bottom-emission organic electroluminescent device. The method comprises the steps of step one, roughening the surface of a template; step two, coating materials for manufacturing a scattering film on the toughened surface of the template, curing an OLED (Organic Light Emitting Diode) to be the scattering film, and then separating the scattering film and the template; and the step three, attaching the scattering film on the outer surface of a substrate. A structure for improving the light emitting rate of the bottom-emission organic electroluminescent device comprises a metallic cathode, an electronic transmission layer, an organic light emitting layer, a hole transmission layer, an ITO (Indium-Tin-Oxide) cathode, the substrate and the scattering film, wherein the scattering film comprises a rough surface and a smooth surface, and the smooth surface is attached on the outer surface of the substrate. The invention relates to a technology for improving the light emitting rate of the organic light emitting device, and has the advantages that the scattering film can be changed conveniently, the manufacturing is simple, the standard volume production is easy, the light emitting rate is high, and the like.
Description
Technical field
The present invention relates to a kind of technology that improves the luminescent device light emission rate, particularly a kind of method and structure thereof that improves end radiation organic EL part light emission rate.
Background technology
At present, through being carried out design improvement, the structure of organic electroluminescence device (Organic Light-emitting Diode is called for short OLED) outer surface mainly contains three kinds both at home and abroad to reach the research direction that improves light emission rate; First kind is direct roughening OLED glass substrate; Second kind is to introduce anti-reflective film, and the third is to increase lenticule film, these three kinds of schemes; Though improved the light emission rate of OLED to some extent, also had a lot of defectives:
For first kind of scheme, can there be following problem in direct roughening OLED glass substrate: at first, though directly simple to the structural design scheme technology of OLED outer surface roughening, probably bring damage to device.At present, the technology of roughened outer surface has two kinds of methods of direct corrosion and blasting treatment; For etch, mainly be chemical damage, if being placed in, the OLED for preparing corrodes substrate in the corrosive liquid; The situation of functional layer material and corrosive liquid reaction takes place possibly, has a strong impact on the performance of OLED; The method of sandblast is that the sand-blasting machine with customization is ejected into glass substrate surface with the granule of micron level diameter with special angle and speed; High velocity particle is inevitably brought corresponding mechanical shock to entire device to the impact meeting of substrate outer surface; Cause corresponding influence; Thereby upset well arranging between the molecule in the oled layer, can cause sizable destruction the photoelectric properties of device; Secondly, outer surface roughening OLED glass is deposited the end, causes the structure reproducibility of OLED poor; Same batch device products possibly have diverse outer surface form, thereby causes device photoelectric performance poor consistency, and; This structural design also exists the shortcoming of durable, and the outer surface micro-structural of roughening receives the destruction of extraneous external force or dust easily, makes the raising of light emission rate undesirable; And the photoelectric properties of OLED are unstable, and reliability is low.
For second kind be the method for introducing anti-reflective film, the basic manufacture method of this scheme is the MgF in OLED outside deposition specific thicknesses
2Film utilizes MgF
2The characteristic of refractive index 1.38 plays the effect of refractive index match layer, thereby improves bright dipping, but the light emission rate that this structural design can improve is not high; And need be to the new material of OLED outer surface vacuum evaporation one deck, at the vapor deposition device, the organic polymer character of each functional layer will inevitably be affected in the OLED; Make the luminescent device unstable properties, reliability is low, meanwhile; Also there is complex process in this design, and cost is high, is unfavorable for the defective of industrialized mass.
Increasing the method for lenticule film for the third, on the lenticule film is that the two-way array that the lenticule of tens micron levels is formed is arranged by taking measurements greatly, and the lenticule of two-way array arrangement carries out scattering to light; Problem below this method exists, because this scheme preparation is the matrix of microlenses of regular arrangement, the scattering of light is inhomogeneous; Dispersion effect is very poor, causes the bright dipping of luminescent device very fuzzy easily, causes images displayed very fuzzy; Simultaneously; The lenticule film of making regular arrangement needs very meticulous technology, and the difficulty of large-scale industrial production is big, and cost is high.
This shows that prior art mainly contains following defective:
(1) it is undesirable to go out light effect, can damage structure or the performance of OLED itself.
(2) be difficult to realize mass production, complex process, cost is high.
(3) scattering of light weak effect, image shows fuzzy.
(4) unstable properties of luminescent device, reliability is low.
Summary of the invention
The shortcoming that primary and foremost purpose of the present invention is to overcome prior art provides a kind of method that improves end radiation organic EL part light emission rate with not enough, and it is simple to have technology, has avoided the advantage to the destruction of luminescent device itself.
The shortcoming that another object of the present invention is to overcome prior art is with not enough; A kind of structure that realizes improving end radiation organic EL part light emission rate method is provided; Have the large-scale industrial production of being easy to, cost is low, good product consistency; Light emission rate is high, improves the scattering film of light emission rate and changes advantage easily.
Primary and foremost purpose of the present invention realizes through following technical proposals: a kind of method that improves end radiation organic EL part light emission rate may further comprise the steps:
Step 1, roughened is carried out on the surface of template;
Step 2, be coated in the matsurface through the template of said roughened to the material of making scattering film through spin coating or other method, said material cured moulding after forming scattering film is separated said scattering film and template;
Step 3, scattering film is affixed on the substrate outer surface of luminescent device.
Said step 1 may further comprise the steps:
S1, through the optics software simulation, sets different scattering film thickness and surface roughness thereof, and the light emission rate of the luminescent device through calculating more different scattering film thickness and surface roughness thereof, design a model with the scattering film of determining light effect the best;
S2, design a model, adopt corrosive liquid corrosion template, realize roughened template according to the scattering film of said the best.
In the said step 1, said template can be silicon template, nickel template or polymer template, to the roughening extent and scope of said template roughened between 0.5～3 micron.
In the said step 2, the material of making scattering film adopts polydimethylsiloxanepolymer polymer, said polydimethylsiloxanepolymer polymer by dimethyl silicone polymer crosslinking agent and curing agent in proportion scope be that the mixed of 15:1～8:1 forms.
In the said step 2, be coated in the material of said making scattering film before the template surface through spin coating or other method, said template done hydrophobization handle, saidly be applied to spin coating, build or other coating method.
In the said step 3, the method for pasting scattering film and substrate outer surface can adopt direct Method for bonding, uv irradiation method, oxonium ion facture or adhesive method.
Another object of the present invention realizes through following technical proposals: a kind of structure that realizes improving end radiation organic EL part light emission rate method; Comprise metallic cathode, electron transfer layer, organic luminous layer, hole transmission layer, ito anode, substrate and scattering film; Said scattering film comprises matsurface and shiny surface; Said shiny surface is affixed on the substrate outer surface; The matsurface roughening extent and scope of said scattering film between 0.5～3 micron, tin indium oxide (Indium-tin-oxide, be called for short ITO); Said scattering film adopts direct Method for bonding, oxonium ion facture, UV-irradiation facture or adhesive method to be affixed on the substrate outer surface, and said scattering film is to be coated in to solidify on the template through polydimethylsiloxanepolymer polymer to process.
Operation principle of the present invention: through the template of roughened; Prepare and have the coarse PDMS scattering film of one side, and stick on the substrate outer surface of end radiation organic EL part to this scattering film, it is 1.41 that the present invention has utilized the PDMS refractive index; Characteristics between air (refractive index is about 1.0) and substrate (refractive index is 1.58); Make light inject the air process that the refractive index of this medium of PDMS scattering film successively decreases of advancing, effectively improved light emission rate from substrate, and; The rough external surface of PDMS scattering film can destroy the total reflection of light; According to the Mie scattering principle, will discharge owing to the light that is limited in the luminescent device because of substrate and air interface total reflection, effectively improved the whole light emission rate of end radiation organic EL part.
The present invention has following advantage and effect with respect to prior art:
(1) improve the effective of light emission rate, photoelectric properties are stable, and reliability is high; The present invention is protecting on the not impaired basis of luminescent device; Effectively improved the light emission rate of luminescent device, what carry out roughened is template, again through the template construct scattering film; Be attached to scattering film the outer surface of luminescent device again; In whole process engineering, can the performance of luminescent device not had any impact, can not destroy the structure of device itself fully, only carry out pad pasting and can accomplish effective raising the luminescent device light emission rate; Both protect luminescent device, effectively improved the light emission rate of luminescent device again.
(2) the present invention is easy to the standardization volume production, and operation is simple; Though the process of roughening is at random, in a single day template is decided, and just can be repeatedly used the scattering film that the batch making roughness is consistent.
(3) flexibility of the present invention's operation is strong, and scattering film is changed conveniently, makes simple, has lowered cost; If scattering film damaged because of external force or dust rainwater etc., can to paste new scattering film more promptly replaceable with taking off with the scattering film that damages, it is easy to operate, quick, and luminescent device can utilize once more, effectively reduces cost.
(4) the coarse outer surface design of scattering film can destroy the total reflection of light, effectively improves light emission rate, and makes the light intensity of all directions angle bright dipping unanimous on the whole, effectively prevents image blurring.
Description of drawings
Fig. 1 is the step sketch map that improves end radiation organic EL part light emission rate method.
Fig. 2 is the structural representation that improves end radiation organic EL part light emission rate method.
Embodiment
Below in conjunction with embodiment and accompanying drawing the present invention is described in further detail, but execution mode of the present invention is not limited thereto.
Embodiment 1
As shown in Figure 1, a kind of method that improves end radiation organic EL part light emission rate may further comprise the steps: step 1, through optical design software Tracepro; Set different scattering film thickness and surface roughness thereof, and pass through the light emission rate of the luminescent device of more different scattering film thickness of calculating and surface roughness thereof, design a model to determine the best scattering film of light effect; Scattering film according to the best of confirming designs a model; Adopt NaOH corrosive liquid corrosion template, roughened is carried out on the surface of template, in the process of etch corrosion; Through the concentration of control NaOH corrosive liquid and the degree of roughness of etching time control template; The degree of said roughening adopts thickness test step appearance to test with scanning electron microscopy, and according to the data of observation, the data that simulate in conjunction with optical design software Tracepro; Constantly adjustment last goes on foot the process of corrosion; Produce the different template of roughness and carry out, to confirm the pairing best roughness of the characteristics of luminescence to different luminescent devices, said template adopts the silicon template; Described scattering film employing dimethyl silicone polymer (Polydimethylsiloxane, be called for short: PDMS) polymer is made;
Step 2, said silicon template done hydrophobization and handles after; Be spin-coated on surface to the material of making scattering film through the silicon template of said roughened; Said material cured is peeled off out from the silicon template with scattering film after becoming to have the coarse scattering film of one-sided smooth one side;
Step 3, employing uv irradiation method are pasted on scattering film the outer surface of substrate.
In the said step 1, to the roughening extent and scope of silicon template roughened between 0.5 to 3 micron.
In the said step 2, the material of making scattering film adopts polydimethylsiloxanepolymer polymer, and said polydimethylsiloxanepolymer polymer is formed by dimethyl silicone polymer crosslinking agent and the curing agent mixed by 10:1; PDMS crosslinking agent and curing agent stir by the mixed of 10:1, make in the drier of mixture under 3KPa～5KPa vacuum to vacuumize the bubble of wrapped folder in mixture when stirring to remove then; During the mixture degassing, volume can expand 3～4 times, and health check-up after a period of time can diminish again; Behind about 5min～10min, restore to the original state, degasification process needs about 0.5h approximately; After the degassing is accomplished, the mixture spin coating is covered or can directly be cast on the template, and place the baking oven of 70 degrees centigrade of ambient temperatures to solidify 2 hours; After the curing be cooled to room temperature after, it is peeled off from the silicon template carefully.In the time of the demoulding, can in alcohol, carry out sonic oscillation then, scattering film is intactly peeled off with template earlier little angle of PDMS perk.
In the said step 2; Though it is polymer-bonded that the silicon template generally is difficult for PDMS, still be that the PDMS polymeric material after guaranteeing to solidify is taken off from the silicon template easily, the silicon template is done hydrophobization handle; The method that concrete hydrophobization is handled is following: place silicon fluoride solution (trim,ethylchlorosilane) bubble more than 2 hours the silicon template; Be set to the oven for drying of 150 degree then with temperature, use the hydrophobic angle of water contact angle tester test silicon template again, to check its hydrophobicity.
In the said step 3, the concrete operation method of said uv irradiation method is following: scattering film is cleaned successively, dries up with absolute ethyl alcohol, and with the 6W ultra violet lamp about 3 hours; Simultaneously; The cleaning glass substrate surface is when pasting, closing up according to the rapid and clean glass substrate of scattering film after handling through uviol lamp; Keep certain pressure to make them closely contact 4～5 hours simultaneously, with the permanent adhesive of realizing scattering film and substrate and the qualification rate that improves finished product.
As shown in Figure 2, a kind of structure that realizes improving end radiation organic EL part light emission rate method comprises organic luminous layer 3, substrate 2 and scattering film 1; Said scattering film 1 comprises matsurface and shiny surface, and said shiny surface is affixed on substrate 2 outer surfaces, and the matsurface roughening extent and scope of said scattering film 1 is between 0.5 to 3 micron; After light sends from organic luminous layer 3; Through substrate 2, pass through the scattering process of scattering film 1 again, effectively improved the light emission rate of end radiation organic EL part.
Embodiment 2
Present embodiment except that following characteristics with embodiment 1: in the said step 1; The corrosive liquid corrosion silicon template that adopts the NaoH doping to form; Polydimethylsiloxanepolymer polymer in the step 2 is formed by dimethyl silicone polymer crosslinking agent and the curing agent mixed by 15:1, adopts direct Method for bonding scattering film to be pasted on the outer surface of substrate in the said step 3.
Embodiment 3
Present embodiment except that following characteristics with embodiment 1: optical design software in the step 1 adopts LightTools; Adopt sand-blast that template is carried out roughened; Said template adopts the nickel template; Polydimethylsiloxanepolymer polymer in the step 2 is formed by dimethyl silicone polymer crosslinking agent and the curing agent mixed by 12:1; The material of making scattering film is cast in the surface through the silicon template of roughened, adopts the oxonium ion facture scattering film to be pasted on the outer surface of substrate in the said step 3.
Embodiment 4
Present embodiment except that following characteristics with embodiment 1: optical design software in the step 1 adopts ZEMAX; Adopt sand-blast that template is carried out roughened; Said template adopts polymer template; Polydimethylsiloxanepolymer polymer is formed by dimethyl silicone polymer crosslinking agent and the curing agent mixed by 8:1 in the step 2, adopts adhesive method scattering film to be pasted on the outer surface of substrate in the said step 3.
The foregoing description is a preferred implementation of the present invention; But execution mode of the present invention is not restricted to the described embodiments; Other any do not deviate from change, the modification done under spirit of the present invention and the principle, substitutes, combination, simplify; All should be the substitute mode of equivalence, be included within protection scope of the present invention.
Claims (10)
1. a method that improves end radiation organic EL part light emission rate is characterized in that, may further comprise the steps:
Step 1, roughened is carried out on the surface of template;
Step 2, the coated materials of making scattering film at matsurface through the template of said roughened, said material cured moulding after forming scattering film is separated said scattering film and template;
Step 3, scattering film is affixed on the substrate outer surface of luminescent device.
2. the method for radiation organic EL part light emission rate is characterized in that at the bottom of the raising according to claim 1, and said step 1 may further comprise the steps:
S1, through the optics software simulation, sets different scattering film thickness and surface roughness thereof, and the light emission rate of the luminescent device through calculating more different scattering film thickness and surface roughness thereof, design a model with the scattering film of determining light effect the best;
S2, design a model, adopt corrosive liquid corrosion template, realize roughened template according to the scattering film of said the best.
3. the method for radiation organic EL part light emission rate is characterized in that at the bottom of the raising according to claim 1, and in the said step 1, said template is the silicon template, to the roughening extent and scope of said silicon template roughened between 0.5～3 micron.
4. the method for radiation organic EL part light emission rate at the bottom of the raising according to claim 1; It is characterized in that; In the said step 2; The material of making scattering film adopts polydimethylsiloxanepolymer polymer, and said polydimethylsiloxanepolymer polymer is mixed by dimethyl silicone polymer crosslinking agent and curing agent in proportion, and the scope of said ratio is 15:1～8:1.
5. the method for radiation organic EL part light emission rate is characterized in that at the bottom of the raising according to claim 1, in the said step 2, before template surface, said template is done said coated materials hydrophobization handle.
6. the method for radiation organic EL part light emission rate is characterized in that at the bottom of the raising according to claim 1, in the said step 3, adopts uv irradiation method that scattering film is affixed on the substrate outer surface.
7. structure that is used to improve the method for end radiation organic EL part light emission rate; Comprise metallic cathode, electron transfer layer, organic luminous layer, hole transmission layer, ito anode and substrate; It is characterized in that; Also comprise scattering film, said scattering film comprises matsurface and shiny surface, and said shiny surface is affixed on the substrate outer surface of luminescent device.
8. the structure that is used to improve the method for end radiation organic EL part light emission rate according to claim 7 is characterized in that the matsurface roughening extent and scope of said scattering film is between 0.5～3 micron.
9. the structure that is used to improve the method for end radiation organic EL part light emission rate according to claim 7; It is characterized in that said scattering film adopts direct Method for bonding, oxonium ion facture, UV-irradiation facture or adhesive method to be affixed on the substrate outer surface.
10. the structure that is used to improve the method for end radiation organic EL part light emission rate according to claim 7 is characterized in that, said scattering film is to be coated in to solidify on the template through polydimethylsiloxanepolymer polymer to process.
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| CN103633256A (en) * | 2013-12-13 | 2014-03-12 | 广州新视界光电科技有限公司 | Ladder anti-reflection structure type organic electroluminescence device and preparation method thereof |
| CN104124341A (en) * | 2013-04-24 | 2014-10-29 | 海洋王照明科技股份有限公司 | Organic light-emitting device and preparation method thereof |
| CN104659283A (en) * | 2013-11-22 | 2015-05-27 | 财团法人交大思源基金会 | Method and device for preparing blue fluorescent organic light emitting diode and organic light emitting diode assembly |
| CN106654064A (en) * | 2016-12-29 | 2017-05-10 | 深圳市华星光电技术有限公司 | Preparation method and application for top-emitting OLED device refraction passivation layer |
| CN110459140A (en) * | 2019-08-16 | 2019-11-15 | 云谷（固安）科技有限公司 | Light-emitting component and display panel |
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| CN104124341A (en) * | 2013-04-24 | 2014-10-29 | 海洋王照明科技股份有限公司 | Organic light-emitting device and preparation method thereof |
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| CN110618482A (en) * | 2019-09-19 | 2019-12-27 | 中国科学院重庆绿色智能技术研究院 | Preparation method of polyimide film diffraction lens with high thickness uniformity |
| CN113019157A (en) * | 2021-05-25 | 2021-06-25 | 中国科学院宁波材料技术与工程研究所 | Multifunctional supported nano multilayer composite film and preparation method and application thereof |
| CN113019157B (en) * | 2021-05-25 | 2021-08-06 | 中国科学院宁波材料技术与工程研究所 | Multifunctional supported nano multilayer composite film and preparation method and application thereof |
| CN113363392A (en) * | 2021-05-31 | 2021-09-07 | 上海大学 | Preparation method of PDMS (polydimethylsiloxane) wrinkled seal and organic solar cell |
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Application publication date: 20121128 |