CN106449711B - The production method of flexible displayer - Google Patents
The production method of flexible displayer Download PDFInfo
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- CN106449711B CN106449711B CN201610947753.2A CN201610947753A CN106449711B CN 106449711 B CN106449711 B CN 106449711B CN 201610947753 A CN201610947753 A CN 201610947753A CN 106449711 B CN106449711 B CN 106449711B
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/1201—Manufacture or treatment
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
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Abstract
The present invention provides a kind of production method of flexible displayer, by before making flexible substrate on the rigid substrate, form the flat inorganic matter film layer in a surface on the rigid substrate first, the coated polymer material in the inorganic matter film layer later, form flexible substrate, it can not only avoid the problem that flexible substrate is recessed and protrusion is bad caused by impurity particle of the rigid substrates surface because cleaning bad remaining, and the flexible substrate and rigid substrates can be made to can be easily separated in the removing processing procedure of flexible substrate and rigid substrates, protect flexible substrate from damage, to make the flexible substrate degree of planarization with higher of flexible displayer obtained, promote the oxygen resistance that blocks water of flexible substrate, and ensure the optical property of flexible displayer.
Description
Technical field
The present invention relates to field of display technology more particularly to a kind of production methods of flexible displayer.
Background technique
Organic Light Emitting Diode (Organic Light-Emitting Diode, OLED) display, also referred to as Organic Electricity
Electroluminescent display is a kind of emerging panel display apparatus, since it is simple with preparation process, at low cost, low in energy consumption, hair
Brightness height, operating temperature wide adaptation range, volume be frivolous, fast response time, and is easily achieved colored display and large screen
It shows, be easily achieved and match with driver ic, be easily achieved the advantages that Flexible Displays, thus there is wide application
Prospect.
OLED can be divided into passive matrix OLED(Passive Matrix OLED, PMOLED according to driving method) and
Active array type OLED(Active Matrix OLED, AMOLED) two major classes, i.e., directly addressing and thin film transistor (TFT) (TFT,
Thin Film Transistor) two class of matrix addressing.Wherein, AMOLED has the pixel in array arrangement, belongs to actively
Display type, luminous efficacy is high, is typically used as large scale display device high-definition.
OLED is generally included: substrate, the anode on substrate, hole injection layer (the Hole Inject on anode
Layer, HIL), the hole transmission layer (Hole Transport Layer, HTL) on hole injection layer, be set to hole pass
Luminescent layer on defeated layer, is set to electricity at the electron transfer layer on luminescent layer (Electron Transport Layer, ETL)
Electron injecting layer (Electron Inject Layer, EIL) in sub- transport layer and the cathode on electron injecting layer.
The principle of luminosity of OLED display device is semiconductor material and luminous organic material under electric field driven, by carrier injection and
Composite guide photoluminescence.Specifically, OLED display device generallys use ITO pixel electrode and metal electrode respectively as the sun of device
Pole and cathode, under certain voltage driving, electrons and holes are injected into electron transfer layer from cathode and anode respectively and hole passes
Defeated layer, electrons and holes pass through electron transfer layer respectively and hole transmission layer moves to luminescent layer, and meet in luminescent layer, shape
At exciton and excite light emitting molecule, the latter issues visible light by radiative relaxation.
For OLED compared with liquid crystal display panel (TFT-LCD), maximum advantage is exactly that can prepare large scale, ultra-thin flexibility
A kind of device, existing production method of flexible displayer, includes the following steps:
Step 1 ', as shown in Figure 1, provide a glass substrate 100, (initial is cleaned to the glass substrate 100
Clean)；
Step 2 ', as shown in Fig. 2, on the glass substrate 100 coating polyimide (Polyimide, PI), it is dry with
After solidifying (Curing), a flexible substrate 200 is formed；
Step 3 ', as shown in figure 3, in the flexible substrate 200 make thin film transistor (TFT) array (TFT Array) layer
300, OLED device 400 is made in the thin film transistor array layer 300, and using thin film encapsulation technology (TFE) to described
OLED device 400 is packaged with thin film transistor array layer 300, is formed in the flexible substrate 200 and OLED device 400
Coat the encapsulating structure layer 500 of the OLED device 400 and 300 outer surface of thin film transistor array layer；
Step 4 ', as shown in figure 4, using laser lift-off technique (LLO) technology by the flexible substrate 200 from the glass
It is removed on substrate 100, a flexible displayer 600 is made.
It is above-mentioned flexibility displayer production method in, due to the step 1 ' in initial Clean cannot
Impurity particle (Particle) on the glass substrate 100 is washed completely, causes 100 surface of glass substrate thick
It is rough, so that the flexible substrate 200 formed on such glass substrate 100 is easy to produce protrusion and is recessed bad；Also, institute
In the case where stating 100 rough surface of glass substrate, the flexible substrate 200 is easy to be tightly combined with the glass substrate 100, leads
Cause the step 4 ' in laser lift-off processing procedure the flexible substrate 200 cannot be completely exfoliated from the glass substrate 100, make
Remain on the glass substrate 100 at subtle polyimide film, so that the flexible substrate 200 be made to be damaged；With
Upper two kinds of factors can cause the degree of planarization of the flexible substrate 200 to decline, and reduce blocking water for the flexible substrate 200
Oxygen performance, so that extraneous steam and oxygen is easily accessible in the flexible displayer 600 to the flexible substrate 200
The thin film transistor array layer 300 of top is corroded, while the degree of planarization decline of the flexible substrate 200 also can be to soft
The optical property of property displayer 600 impacts.
Summary of the invention
The purpose of the present invention is to provide a kind of production methods of flexible displayer, can make flexibility obtained
The flexible substrate of displayer degree of planarization with higher, promotes the oxygen resistance that blocks water of flexible substrate, and ensures
The optical property of flexible displayer.
To achieve the above object, the present invention provides a kind of production method of flexible displayer, includes the following steps:
Step 1 provides a rigid substrates, cleans to the rigid substrates；
Step 2 forms the flat inorganic matter film layer in a surface on the rigid substrates；
Step 3, the coated polymer material in the inorganic matter film layer, it is dry with after solidification, form a flexible substrate；
Step 4 makes thin film transistor array layer in the flexible substrate, makes in the thin film transistor array layer
Make OLED device, and the OLED device is packaged with thin film transistor array layer, in the flexible substrate and OLED device
The encapsulating structure layer for coating the OLED device and thin film transistor array layer outer surface is formed on part；
Step 5 removes the flexible substrate from the inorganic matter film layer, and a flexible displayer is made.
The flexibility displayer includes flexible substrate, the thin film transistor (TFT) array in the flexible substrate
It layer, the OLED device in the thin film transistor array layer and is set in the flexible substrate and OLED device and coats
The encapsulating structure layer of the OLED device and thin film transistor array layer outer surface.
In the step 1, the rigid substrates are glass substrate；In the step 2, using plasma enhances chemical gas
Phase sedimentation forms the inorganic matter film layer.
The material of the inorganic matter film layer includes at least one of silicon nitride and silica.
The inorganic matter film layer includes the first silicon nitride layer that successively lamination is arranged from top to bottom, silicon oxide layer and second
Silicon nitride layer.
The inorganic matter film layer with a thickness of 1 μm~10 μm.
Preferably, the inorganic matter film layer with a thickness of 2 μm.
In the step 3, the polymer material is polyimides.
In the step 4, the OLED device is packaged with thin film transistor array layer using thin film encapsulation technology.
In the step 5, the flexible substrate is removed from the inorganic matter film layer using laser lift-off technique.
Beneficial effects of the present invention: a kind of production method of flexible displayer provided by the invention, by rigid
Property substrate on make flexible substrate before, the flat inorganic matter film layer in a surface is formed on the rigid substrate first, later in institute
Coated polymer material in inorganic matter film layer is stated, flexible substrate is formed, rigid substrates surface can not only be avoided bad because cleaning
The impurity particle of remaining causes flexible substrate recess and the bad problem of protrusion, and can be in flexible substrate and rigid substrates
It can be easily separated the flexible substrate and rigid substrates in removing processing procedure, protect flexible substrate from damage, to make obtained
The flexible substrate of flexible displayer degree of planarization with higher promotes the oxygen resistance that blocks water of flexible substrate, and
Ensure the optical property of flexible displayer.
For further understanding of the features and technical contents of the present invention, it please refers to below in connection with of the invention detailed
Illustrate and attached drawing, however, the drawings only provide reference and explanation, is not intended to limit the present invention.
Detailed description of the invention
With reference to the accompanying drawing, by the way that detailed description of specific embodiments of the present invention, technical solution of the present invention will be made
And other beneficial effects are apparent.
In attached drawing,
Fig. 1-4 is the schematic diagram of the production method of existing flexible displayer；
Fig. 5 is the flow chart of the production method of flexible displayer of the invention；
Fig. 6 is the schematic diagram of the step 1 of the production method of flexible displayer of the invention；
Fig. 7 is the schematic diagram of the step 2 of the production method of flexible displayer of the invention；
Fig. 8 is the schematic diagram of the step 3 of the production method of flexible displayer of the invention；
Fig. 9 is the schematic diagram of the step 4 of the production method of flexible displayer of the invention；
Figure 10 is the schematic diagram of the step 5 of the production method of flexible displayer of the invention.
Specific embodiment
Further to illustrate technological means and its effect adopted by the present invention, below in conjunction with preferred implementation of the invention
Example and its attached drawing are described in detail.
Referring to Fig. 5, the present invention provides a kind of production method of flexible displayer, include the following steps:
Step 1, as shown in fig. 6, provide a rigid substrates 10, (initial is cleaned to the rigid substrates 10
Clean).
Specifically, the rigid substrates 10 are glass substrate in the step 1.
Step 2, as shown in fig. 7, forming the flat inorganic matter film layer 20 in a surface on the rigid substrates 10.
Specifically, using plasma enhances chemical vapour deposition technique (PECVD, Plasma in the step 2
Enhanced Chemical Vapor Deposition) form the inorganic matter film layer 20.
The degree of planarization on 10 surface of rigid substrates can be improved in the inorganic matter film layer 20, makes subsequent described rigid
Property substrate 10 on the degree of planarization of flexible substrate 30 that is formed improve, and be conducive to subsequent flexible substrate 30 and the rigid base
The separation of plate 10 protects the flexible substrate 30 injury-free during the separation process, is further ensured that the flexible substrate 30
Degree of planarization.
Specifically, the material of the inorganic matter film layer 20 includes silicon nitride (SiNx) and silica (SiOx) at least one
Kind.
Preferably, as shown in fig. 7, the inorganic matter film layer 20 includes the first silicon nitride that successively lamination is arranged from top to bottom
Layer 21, silicon oxide layer 23 and the second silicon nitride layer 22.
Specifically, the inorganic matter film layer 20 with a thickness of 1 μm~10 μm, preferably 2 μm.
Step 3, as shown in figure 8, in the inorganic matter film layer 20 coated polymer material, it is dry with solidification (Curing)
Afterwards, a flexible substrate 30 is formed.
Specifically, the substrate as flexible displayer, the flexible substrate 30 needs to have good optical
Can, chemical-resistance and the oxygen resistance that blocks water, with guarantee flexible displayer have preferable display quality with it is longer
Service life.
It is obtained soft since flexible substrate 30 is formed in the flat inorganic matter film layer 20 in surface in the step 3
Property substrate 30 degree of planarization it is high, avoid flexible substrate caused by impurity particle of 10 surface of rigid substrates because cleaning bad remaining
30 recess and raised bad problem, promote the oxygen resistance that blocks water of flexible substrate 30, and ensure subsequent obtained flexible
The optical property of displayer 70.
Preferably, in the step 3, the polymer material is polyimides (Polyimide, PI).
Step 4, as shown in figure 9, make thin film transistor array layer 40 in the flexible substrate 30, it is brilliant in the film
OLED device 50 is made on body pipe array layer 40, and the OLED device 50 is packaged with thin film transistor array layer 40,
The OLED device 50 and 40 appearance of thin film transistor array layer are coated in the flexible substrate 30 and formation in OLED device 50
The encapsulating structure layer 60 in face.
Preferably, in the step 4, the OLED device 50 is formed using vapour deposition method.
Preferably, in the step 4, using thin film encapsulation technology (TFE) to the OLED device 50 and thin film transistor (TFT)
Array layer 40 is packaged.
Step 5, as shown in Figure 10, the flexible substrate 30 is removed from the inorganic matter film layer 20, it is flexible to be made one
Displayer 70.
Specifically, the flexibility displayer 70 includes flexible substrate 30, thin in the flexible substrate 30
Film transistor array layer 40, the OLED device 50 in the thin film transistor array layer 40 and be set to the flexible substrate
30 in OLED device 50 and the encapsulating structure layer 60 of the cladding OLED device 50 and 40 outer surface of thin film transistor array layer.
In the step 5, since the surface that the flexible substrate 30 contacts with each other with the inorganic matter film layer 20 all has
Higher degree of planarization, therefore, the flexible substrate 30 described in stripping process are easier to separate with inorganic matter film layer 20, energy
It enough avoids flexible substrate 30 from being damaged in stripping process, the degree of planarization of the flexible substrate 30 is made to be guaranteed, from
And the oxygen resistance that blocks water of flexible substrate 30 is promoted, and ensure the optical property of flexible displayer 70.
Specifically, in the step 5, using laser lift-off technique (LLO) by the flexible substrate 30 from the inorganic matter
It is removed in film layer 20.
In conclusion the production method of flexible displayer of the invention, by making flexibility on the rigid substrate
Before substrate, forms the flat inorganic matter film layer in a surface on the rigid substrate first, applied in the inorganic matter film layer later
Polymer material is covered, flexible substrate is formed, rigid substrates surface can not only be avoided to make because cleaning the impurity particle of bad remaining
At the bad problem of flexible substrate recess and protrusion, and can make in the removing processing procedure of flexible substrate and rigid substrates described
Flexible substrate can be easily separated with rigid substrates, protect flexible substrate from damage, to make flexible displayer obtained
Flexible substrate degree of planarization with higher, promote the oxygen resistance that blocks water of flexible substrate, and ensure that flexible AMOLED is aobvious
Show the optical property of device.
The above for those of ordinary skill in the art can according to the technique and scheme of the present invention and technology
Other various corresponding changes and modifications are made in design, and all these change and modification all should belong to the claims in the present invention
Protection scope.
Claims (8)
1. a kind of production method of flexibility displayer, which comprises the steps of:
Step 1 provides a rigid substrates (10), cleans to the rigid substrates (10)；
Step 2 forms the flat inorganic matter film layer (20) in a surface on the rigid substrates (10)；
Step 3, the coated polymer material on the inorganic matter film layer (20), it is dry with after solidification, form a flexible substrate
(30)；
Step 4 makes thin film transistor array layer (40) on the flexible substrate (30), in the thin film transistor array layer
(40) OLED device (50) are made on, and the OLED device (50) and thin film transistor array layer (40) are packaged,
It is formed on the flexible substrate (30) and OLED device (50) and coats the OLED device (50) and thin film transistor array layer
(40) the encapsulating structure layer (60) of outer surface；
Step 5 removes the flexible substrate (30) from the inorganic matter film layer (20), and a flexible displayer is made
(70)；
In the step 5, the flexible substrate (30) is removed from the inorganic matter film layer (20) using laser lift-off technique；
In the step 1, the rigid substrates (10) are glass substrate；In the step 2, using plasma enhances chemical gas
Phase sedimentation forms the inorganic matter film layer (20).
2. the production method of flexibility displayer as described in claim 1, which is characterized in that the flexibility AMOLED is aobvious
Show that device (70) includes flexible substrate (30), the thin film transistor array layer (40) being set on the flexible substrate (30), is set to institute
It states the OLED device (50) on thin film transistor array layer (40) and is set on the flexible substrate (30) and OLED device (50)
And the encapsulating structure layer (60) of the cladding OLED device (50) and thin film transistor array layer (40) outer surface.
3. the production method of flexibility displayer as described in claim 1, which is characterized in that the inorganic matter film layer
(20) material includes at least one of silicon nitride and silica.
4. the production method of flexibility displayer as claimed in claim 3, which is characterized in that the inorganic matter film layer
(20) include from top to bottom successively lamination setting the first silicon nitride layer (21), silicon oxide layer (23) and the second silicon nitride layer
(22)。
5. the production method of flexibility displayer as described in claim 1, which is characterized in that the inorganic matter film layer
(20) with a thickness of 1 μm~10 μm.
6. the production method of flexibility displayer as claimed in claim 5, which is characterized in that the inorganic matter film layer
(20) with a thickness of 2 μm.
7. the production method of flexibility displayer as described in claim 1, which is characterized in that described in the step 3
Polymer material is polyimides.
8. the production method of flexibility displayer as described in claim 1, which is characterized in that in the step 4, use
Thin film encapsulation technology is packaged the OLED device (50) and thin film transistor array layer (40).
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN107415333A (en) * | 2017-07-17 | 2017-12-01 | 武汉华星光电半导体显示技术有限公司 | Cured film and preparation method thereof, flexible AMOLED display device |
| US10497899B2 (en) | 2017-07-17 | 2019-12-03 | Wuhan China Star Optoelectronics Semiconductor Display Technology Co., Ltd. | Hardening film and method of manufacturing the same, flexible AMOLED display device |
| CN107611158B (en) * | 2017-08-25 | 2019-09-24 | 武汉华星光电半导体显示技术有限公司 | A kind of production method of flexible display panels |
| CN107742628A (en) * | 2017-09-12 | 2018-02-27 | 奕瑞影像科技（太仓）有限公司 | Flexible scintillation screen, radiation image sensor and preparation method thereof |
| CN107706311A (en) * | 2017-09-18 | 2018-02-16 | 武汉华星光电半导体显示技术有限公司 | A kind of OLED preparation method and corresponding OLED |
| CN107768415B (en) * | 2017-10-30 | 2024-03-08 | 京东方科技集团股份有限公司 | Flexible display device, display apparatus and manufacturing method |
| CN107931845B (en) * | 2017-11-20 | 2020-05-05 | 武汉华星光电半导体显示技术有限公司 | Cutting method |
| CN107863459B (en) * | 2017-12-05 | 2019-04-05 | 武汉华星光电半导体显示技术有限公司 | The production method of flexible OLED display panel |
| US11114628B2 (en) | 2017-12-05 | 2021-09-07 | Wuhan China Star Optoelectronics Semiconductor Display Technology Co., Ltd. | Method of manufacturing a flexible organic light-emitting diode (OLED) display panel by laser lift-off of a glass carrier through a planarization layer |
| CN109961692A (en) * | 2017-12-26 | 2019-07-02 | 昆山维信诺科技有限公司 | Flexible display device and preparation method thereof |
| CN110056786A (en) * | 2018-01-18 | 2019-07-26 | 展晶科技(深圳)有限公司 | Bendable ultra-thin light-emitting body structure and preparation method thereof |
| CN108365128B (en) * | 2018-01-19 | 2019-12-03 | 昆山国显光电有限公司 | Prepare the method and flexible display device of flexible display device |
| CN108539051A (en) * | 2018-03-20 | 2018-09-14 | 武汉华星光电半导体显示技术有限公司 | Display panel and preparation method thereof |
| CN113169076A (en) * | 2018-12-24 | 2021-07-23 | 深圳市柔宇科技股份有限公司 | Electronic device and method of manufacturing the same |
| CN110729335B (en) * | 2019-10-28 | 2022-02-01 | 武汉华星光电半导体显示技术有限公司 | Display panel and preparation method thereof |
| CN111276052A (en) * | 2020-02-18 | 2020-06-12 | 深圳市华星光电半导体显示技术有限公司 | Flexible display panel and preparation method thereof |
| CN111455345A (en) * | 2020-05-13 | 2020-07-28 | 山东申华光学有限责任公司 | Polyimide/diamond-like carbon composite flexible film and preparation method and application thereof |
| KR20220070134A (en) | 2020-11-20 | 2022-05-30 | 삼성디스플레이 주식회사 | Display panel and method for manufacturing the same |
| CN113036065B (en) * | 2021-03-08 | 2024-02-20 | 京东方科技集团股份有限公司 | Flexible display substrate, preparation method thereof and display device |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101458901B1 (en) * | 2008-04-29 | 2014-11-10 | 삼성디스플레이 주식회사 | Method of manufacturing flexible display device |
| KR101894089B1 (en) * | 2011-10-24 | 2018-08-31 | 엘지디스플레이 주식회사 | Manufacturing Method of Flexible Display Device |
| CN104051496B (en) * | 2014-06-04 | 2017-07-14 | 昆山工研院新型平板显示技术中心有限公司 | A kind of flexible display and preparation method thereof |
| CN104485344B (en) * | 2014-12-08 | 2017-12-05 | 信利（惠州）智能显示有限公司 | A kind of flexible display preparation method |
| CN104600220B (en) * | 2014-12-30 | 2017-08-25 | 上海天马微电子有限公司 | A kind of manufacture method of flexible display, composite base plate and flexible display |
| CN105226186B (en) * | 2015-10-10 | 2018-06-01 | 深圳市华星光电技术有限公司 | The production method of flexible display apparatus and flexible display apparatus obtained |
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