CN102753454A - 用于超紫外光微影术光罩盒的开关器 - Google Patents
用于超紫外光微影术光罩盒的开关器 Download PDFInfo
- Publication number
- CN102753454A CN102753454A CN2011800049629A CN201180004962A CN102753454A CN 102753454 A CN102753454 A CN 102753454A CN 2011800049629 A CN2011800049629 A CN 2011800049629A CN 201180004962 A CN201180004962 A CN 201180004962A CN 102753454 A CN102753454 A CN 102753454A
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- China
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- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000001900 extreme ultraviolet lithography Methods 0.000 title 1
- 230000007246 mechanism Effects 0.000 claims abstract description 39
- 239000002184 metal Substances 0.000 claims abstract description 18
- 238000000206 photolithography Methods 0.000 claims description 11
- 238000007789 sealing Methods 0.000 claims description 9
- 238000011109 contamination Methods 0.000 claims description 6
- 239000002245 particle Substances 0.000 claims description 6
- 239000011248 coating agent Substances 0.000 claims 1
- 238000000576 coating method Methods 0.000 claims 1
- 238000000926 separation method Methods 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 17
- 239000011521 glass Substances 0.000 description 7
- 238000004519 manufacturing process Methods 0.000 description 5
- 238000001459 lithography Methods 0.000 description 4
- 238000007639 printing Methods 0.000 description 3
- 230000008878 coupling Effects 0.000 description 2
- 238000010168 coupling process Methods 0.000 description 2
- 238000005859 coupling reaction Methods 0.000 description 2
- 239000004148 curcumin Substances 0.000 description 2
- 238000009434 installation Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 238000012856 packing Methods 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 230000008901 benefit Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000013011 mating Effects 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/66—Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof
Abstract
Description
Claims (15)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US34358310P | 2010-04-30 | 2010-04-30 | |
US61/343,583 | 2010-04-30 | ||
PCT/US2011/000777 WO2011136856A1 (en) | 2010-04-30 | 2011-05-02 | Opener for extreme ultra violet lithography reticle pods |
Publications (2)
Publication Number | Publication Date |
---|---|
CN102753454A true CN102753454A (zh) | 2012-10-24 |
CN102753454B CN102753454B (zh) | 2016-01-20 |
Family
ID=44861859
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201180004962.9A Active CN102753454B (zh) | 2010-04-30 | 2011-05-02 | 用于超紫外光微影术光罩盒的开关器 |
Country Status (5)
Country | Link |
---|---|
US (1) | US20130043776A1 (zh) |
EP (1) | EP2563689A1 (zh) |
CN (1) | CN102753454B (zh) |
TW (1) | TW201206787A (zh) |
WO (1) | WO2011136856A1 (zh) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN115057081A (zh) * | 2022-06-23 | 2022-09-16 | 上海大族富创得科技有限公司 | 一种光罩存储盒开合器 |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
SG11201408294QA (en) | 2012-06-14 | 2015-01-29 | Murata Machinery Ltd | Lid-opening/closing device |
US20190333797A1 (en) * | 2018-04-30 | 2019-10-31 | Stek Co., Ltd | Apparatus and method for opening snap-shot cases |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20060066834A1 (en) * | 2004-09-28 | 2006-03-30 | Phillips Alton H | EUV reticle handling system and method |
US20060291982A1 (en) * | 2004-11-15 | 2006-12-28 | Keiichi Tanaka | Substrate conveyor apparatus, substrate conveyance method and exposure apparatus |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002009133A (ja) * | 2000-06-26 | 2002-01-11 | Canon Inc | 基板搬送装置 |
US7304720B2 (en) * | 2002-02-22 | 2007-12-04 | Asml Holding N.V. | System for using a two part cover for protecting a reticle |
JP2006128188A (ja) * | 2004-10-26 | 2006-05-18 | Nikon Corp | 基板搬送装置、基板搬送方法および露光装置 |
US7808616B2 (en) * | 2005-12-28 | 2010-10-05 | Nikon Corporation | Reticle transport apparatus, exposure apparatus, reticle transport method, and reticle processing method |
-
2011
- 2011-04-29 TW TW100115100A patent/TW201206787A/zh unknown
- 2011-05-02 EP EP11775403A patent/EP2563689A1/en not_active Withdrawn
- 2011-05-02 CN CN201180004962.9A patent/CN102753454B/zh active Active
- 2011-05-02 US US13/695,286 patent/US20130043776A1/en not_active Abandoned
- 2011-05-02 WO PCT/US2011/000777 patent/WO2011136856A1/en active Application Filing
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20060066834A1 (en) * | 2004-09-28 | 2006-03-30 | Phillips Alton H | EUV reticle handling system and method |
US20060291982A1 (en) * | 2004-11-15 | 2006-12-28 | Keiichi Tanaka | Substrate conveyor apparatus, substrate conveyance method and exposure apparatus |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN115057081A (zh) * | 2022-06-23 | 2022-09-16 | 上海大族富创得科技有限公司 | 一种光罩存储盒开合器 |
Also Published As
Publication number | Publication date |
---|---|
US20130043776A1 (en) | 2013-02-21 |
EP2563689A1 (en) | 2013-03-06 |
CN102753454B (zh) | 2016-01-20 |
WO2011136856A1 (en) | 2011-11-03 |
TW201206787A (en) | 2012-02-16 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
ASS | Succession or assignment of patent right |
Owner name: FORTREND ENGINEERING (SHENYANG) CORPORATION Free format text: FORMER OWNER: FORTREND ENGINEERING CORP. Effective date: 20130717 |
|
C41 | Transfer of patent application or patent right or utility model | ||
COR | Change of bibliographic data |
Free format text: CORRECT: ADDRESS; TO: 110169 SHENYANG, LIAONING PROVINCE |
|
TA01 | Transfer of patent application right |
Effective date of registration: 20130717 Address after: 110169 Liaoning province Shenyang Hunnan Hunnan Road No. 19-4 Applicant after: Fuchengde Technology (Shenyang) Co.,Ltd. Address before: The United States of California, Sunnyvale Pasto electric Street No. 687 Applicant before: Fortrend Engineering Corp. |
|
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
TR01 | Transfer of patent right |
Effective date of registration: 20171024 Address after: 201114 Shanghai city Minhang District million Fang Building Room 202 No. 555 1 Patentee after: SHANGHAI FORTREND TECHNOLOGY Co.,Ltd. Address before: 110169 Liaoning province Shenyang Hunnan Hunnan Road No. 19-4 Patentee before: Fuchengde Technology (Shenyang) Co.,Ltd. |
|
TR01 | Transfer of patent right | ||
CP01 | Change in the name or title of a patent holder | ||
CP01 | Change in the name or title of a patent holder |
Address after: 201114 Room 202, building 1, 555 Wanfang Road, Minhang District, Shanghai Patentee after: Shanghai Han's Fuchuang Technology Co.,Ltd. Address before: 201114 Room 202, building 1, 555 Wanfang Road, Minhang District, Shanghai Patentee before: SHANGHAI FORTREND TECHNOLOGY Co.,Ltd. |