CN102747327B - Normal-pressure evaporation method, normal-pressure evaporation device and manufacturing equipment of anti-fouling film - Google Patents
Normal-pressure evaporation method, normal-pressure evaporation device and manufacturing equipment of anti-fouling film Download PDFInfo
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- CN102747327B CN102747327B CN201110162306.3A CN201110162306A CN102747327B CN 102747327 B CN102747327 B CN 102747327B CN 201110162306 A CN201110162306 A CN 201110162306A CN 102747327 B CN102747327 B CN 102747327B
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- 238000001704 evaporation Methods 0.000 title claims abstract description 86
- 230000008020 evaporation Effects 0.000 title claims abstract description 83
- 238000004519 manufacturing process Methods 0.000 title abstract description 8
- 230000003373 anti-fouling effect Effects 0.000 title abstract 7
- 238000000576 coating method Methods 0.000 claims abstract description 183
- 239000011248 coating agent Substances 0.000 claims abstract description 162
- 238000002309 gasification Methods 0.000 claims abstract description 16
- 238000000151 deposition Methods 0.000 claims abstract description 5
- 239000000463 material Substances 0.000 claims description 120
- 239000010409 thin film Substances 0.000 claims description 111
- 239000003973 paint Substances 0.000 claims description 102
- 238000000889 atomisation Methods 0.000 claims description 58
- 230000001681 protective effect Effects 0.000 claims description 22
- 239000007788 liquid Substances 0.000 claims description 17
- 239000002689 soil Substances 0.000 claims description 16
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims description 15
- 229910052731 fluorine Inorganic materials 0.000 claims description 15
- 239000011737 fluorine Substances 0.000 claims description 15
- -1 fluorine carbon silicon hydrocarbon compound Chemical class 0.000 claims description 15
- 239000002904 solvent Substances 0.000 claims description 15
- 238000000034 method Methods 0.000 claims description 14
- 125000000524 functional group Chemical group 0.000 claims description 10
- 238000005507 spraying Methods 0.000 claims description 10
- 238000001994 activation Methods 0.000 claims description 9
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 9
- 238000010438 heat treatment Methods 0.000 claims description 8
- 230000008569 process Effects 0.000 claims description 7
- 150000001298 alcohols Chemical class 0.000 claims description 6
- 150000001335 aliphatic alkanes Chemical class 0.000 claims description 6
- 150000002170 ethers Chemical class 0.000 claims description 6
- 239000007789 gas Substances 0.000 claims description 6
- 150000002576 ketones Chemical class 0.000 claims description 6
- 229910000077 silane Inorganic materials 0.000 claims description 6
- 238000002604 ultrasonography Methods 0.000 claims description 6
- IJGRMHOSHXDMSA-UHFFFAOYSA-N nitrogen Substances N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 5
- 230000008021 deposition Effects 0.000 claims description 4
- 229910052757 nitrogen Inorganic materials 0.000 claims description 4
- 239000006200 vaporizer Substances 0.000 claims description 4
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- 125000001997 phenyl group Chemical class [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims 2
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- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical group C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 1
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- 229910052786 argon Inorganic materials 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
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Abstract
The invention relates to a normal-pressure evaporation method, a normal-pressure evaporation device and manufacturing equipment of an anti-fouling film. The atmospheric pressure evaporation method of the anti-fouling film comprises the following steps. A substrate is provided. An anti-fouling coating solution is subjected to an gasification step to form a plurality of anti-fouling vapor molecules. Depositing the anti-fouling vapor molecules on a surface of the substrate to form an anti-fouling film.
Description
Technical field
The invention relates to a kind of manufacture method of film, and relate to especially normal pressure evaporation (Atmospheric Evaporation) method, normal pressure evaporation coating device and the making equipment of a kind of filth-resisting thin film (Anti-smudge Film).
Background technology
Universal along with portable electronic devices, in order to maintain its outward appearance, also improves day by day for the protection demand of the superficies of this class portable electronic devices.At present, in order to protect the superficies of these electronic installations, the modal practice is to be coated with filth-resisting thin film on the superficies of electronic installation, for example anti-fingerprint film.For example, now the Touch Screen surface of quite popular touch control electronic device is coated with the anti-fingerprint film of one deck conventionally, so that screen surface is going through repeatedly the touching after friction of user, still possesses good display quality and operation susceptibility.
Generally speaking, the surface of filth-resisting thin film mostly there is good pollution resistance, can prevent fingerprint be stained with glutinous, sense of touch is level and smooth, waterproof oil extraction and the characteristic such as transparent.In addition, the superficies of the device that filth-resisting thin film covers it need have high adhesive force, to extend the work-ing life of filth-resisting thin film.
At present, the mode of coating filth-resisting thin film mainly contains four kinds.First kind of way is vacuum evaporation mode, it is in vacuum chamber, be mounted with the container of anti-pollution paint solution in the below heating of base material, make anti-pollution paint gasification in it and rise and be attached on the lower surface of base material, and then form one deck filth-resisting thin film on the lower surface of base material.But this kind of coating method need vacuumize evaporation reaction chamber, therefore not only equipment manufacturing cost costliness, processing procedure time are long, and cause production capacity not good, and this kind of mode is also not suitable for carrying out on successional substrate surface to be deposited.
The second way is to infiltrate coating (dipping coating) mode, it is that pending base material is immersed in anti-pollution paint solution, again pending base material is taken out in anti-pollution paint solution, make whereby anti-pollution paint be coated on the surface of pending base material.But for the coating of the pending base material of continuity, the required equipment volume of this kind of mode is quite huge, is therefore also not suitable for being applied on the pending base material of continuity.
The third mode is spraying type coating (spray coating) mode, and it is directly towards the jet surface anti-pollution paint of pending base material, so as to form filth-resisting thin film on the surface of pending base material with spraying plant.But the coating that spraying plant sprays has mostly just touched the surface of pending base material before not yet gasifying, thereby the droplet that spraying plant sprays can drop on the surface to be coated of base material, therefore the homogeneity of the filth-resisting thin film forming is not good.
The 4th kind of mode is for brushing (brush coating) method, and it is directly anti-pollution paint to be coated with and to be located on the surface of pending base material with brush.But such coating method often can produce the phenomenon that repeats coating, the lack of homogeneity of the filth-resisting thin film that therefore formed on the adjacent in two adjacent brushing regions.
Therefore, need at present a kind of method and apparatus of making filth-resisting thin film badly, can be in a large number fast and equably anti-pollution paint is applied on the surface of pending base material.
Summary of the invention
Therefore, an aspect of of the present present invention is exactly that a kind of normal pressure evaporation coating method of filth-resisting thin film is being provided, and it adopts normal pressure evaporation mode to carry out the coating of filth-resisting thin film, therefore can significantly increase the production capacity of filth-resisting thin film.
Another aspect of the present invention is that a kind of normal pressure evaporation coating method of filth-resisting thin film is being provided, and it can carry out the coating of the filth-resisting thin film of the pending base material of continuity efficiently.
Another aspect of the present invention is that a kind of normal pressure evaporation coating method of filth-resisting thin film is being provided, and it can also be coated on anti-pollution paint on the surface of pending base material in a large number fast effectively equably.
One side more of the present invention is providing a kind of normal pressure evaporation coating device and making equipment of filth-resisting thin film exactly, and it can carry out the coating of filth-resisting thin film under atmospheric pressure environment, therefore can carry out rapidly the coating of the filth-resisting thin film of pending base material.
Of the present invention is that a kind of normal pressure evaporation coating device and making equipment of filth-resisting thin film are being provided again on the one hand, and it can carry out the coating of the filth-resisting thin film of a large amount of base materials simultaneously, therefore can significantly improve the output of filth-resisting thin film.
Of the present invention is that a kind of normal pressure evaporation coating device and making equipment of filth-resisting thin film are being provided again on the one hand, and it can efficiently and carry out the coating of the filth-resisting thin film of continuity base material equably.
According to above-mentioned purpose of the present invention, a kind of normal pressure evaporation coating method of filth-resisting thin film is proposed, it comprises the following step.One base material is provided.One anti-soil coating solution is carried out to a gasification step, to form multiple anti-soil vapour molecules.Deposit these anti-soil vapour molecules upper in a surface of aforementioned substrates, to form filth-resisting thin film.
According to one embodiment of the invention, above-mentioned anti-pollution paint solution comprises an anti-pollution paint and a solvent, and this solvent comprises high volatile volatile liquid and/or a water.
According to another embodiment of the present invention, the material of above-mentioned anti-pollution paint comprises fluorine carbon silicon hydrocarbon compound, perfluorocarbon silicon hydrocarbon compound, fluorine carbon silane hydrocarbon compound, perfluor silane hydrocarbon compound or perfluor silane hydrocarbyl ether compounds.
According to another embodiment of the present invention, the vapour pressure of above-mentioned high volatile volatile liquid steaming pressure ratio water is at normal temperatures large, and this high volatile volatile liquid is to be selected from the group forming by alcohols, ethers, alkanes, ketone, benzene class, containing fluorine-based alcohols, containing fluorine-based ethers, containing fluorine-based alkanes, containing fluorine-based ketone, containing fluorine-based benzene class.
According to an embodiment more of the present invention, above-mentioned gasification step comprises utilizes an atomizing component.
According to an embodiment more of the present invention, the normal pressure evaporation coating method of above-mentioned filth-resisting thin film is before gasification step, also comprise and utilize a plasma to clean and process on the surface of above-mentioned base material, so as to form multiple functional groups on the surface of base material, these functional groups can comprise multiple hydrogen-oxygen functional groups, multiple nitrogen hydrogen functional group and/or multiple hovering key.
According to an embodiment more of the present invention, the normal pressure evaporation coating method of above-mentioned filth-resisting thin film, before gasification step, also comprises and utilizes a protective guard to cover base material, and gasification step is to carry out in this protective guard.
According to an embodiment more of the present invention, the normal pressure evaporation coating method of above-mentioned filth-resisting thin film, before the step of deposition anti-soil vapour molecule, also comprises and makes these anti-soil vapour molecule convection current in protective guard.
According to above-mentioned purpose of the present invention, a kind of normal pressure evaporation coating device of filth-resisting thin film is separately proposed.The normal pressure evaporation coating device of this filth-resisting thin film comprises a transmitting device and atomisation unit.Atomisation unit comprises at least one coating catching device and at least one atomizing component.Transmitting device is suitable for to transmit at least one base material.Aforesaid at least one coating catching device is in order to load an anti-soil coating solution.Aforesaid at least one atomizing component is located on aforementioned at least one coating catching device, uses so that anti-pollution paint vaporizer becomes multiple anti-pollution paint vapour molecules and is deposited on a surface of aforementioned at least one base material.
According to one embodiment of the invention, above-mentioned at least one atomizing component comprises a ultrasound atomization shake sheet, a heating evaporation atomizing component, a spraying high-pressure gas assembly or a nozzle atomization assembly.
According to another embodiment of the present invention, above-mentioned at least one atomizing component is located on the top of above-mentioned at least one coating catching device, and atomisation unit also comprises at least one coating conductive members, be suitable for anti-pollution paint solution is sent to aforesaid at least one atomizing component.
According to another embodiment of the present invention, the evaporation coating device of above-mentioned filth-resisting thin film also comprises a protective guard, be suitable for to cover at least one base material of living in to state, at least one coating catching device, with at least one atomizing component.
According to an embodiment more of the present invention, above-mentioned at least one coating catching device comprises multiple coating catching devices, and at least one atomizing component comprises single atomizing component and is arranged on these coating catching devices.
According to an embodiment more of the present invention, above-mentioned at least one coating catching device comprises single coating catching device, and above-mentioned at least one atomizing component comprises multiple atomizing components and is arranged on this coating catching device.
According to above-mentioned purpose of the present invention, a kind of making equipment of filth-resisting thin film is also proposed.The making equipment of this filth-resisting thin film comprises a transmitting device, a plasma apparatus and a normal pressure evaporation coating device.This transmitting device is suitable for to transmit at least one base material.Plasma apparatus is located at transmitting device top, and is suitable for the surface to aforementioned at least one base material and carries out a surface activation process.Normal pressure evaporation coating device is adjacent to by plasma apparatus.Normal pressure evaporation coating device comprises an atomisation unit, and this atomisation unit comprises at least one coating catching device and at least one atomizing component.This at least one coating catching device is in order to load an anti-soil coating solution.Aforesaid at least one atomizing component is located at least one coating catching device, with so that anti-pollution paint vaporizer becomes multiple anti-pollution paint vapour molecules, and these anti-pollution paint vapour molecules are deposited on the surface of aforementioned at least one base material after surface activation process, so as to forming a filth-resisting thin film.
According to one embodiment of the invention, above-mentioned plasma apparatus is an atmospheric plasma device, a low-voltage plasma device or electromagnetic coupled formula plasma apparatus.
According to another embodiment of the present invention, above-mentioned normal pressure evaporation coating device also comprises a coating capacity sensor, is suitable for the amount of the anti-pollution paint solution to be loaded in the above-mentioned at least one coating catching device of sensing.
From the embodiment of the invention described above, an advantage of the present invention is that the present invention adopts normal pressure evaporation mode to carry out the coating of filth-resisting thin film, therefore omits the program that step-down vacuumizes, and then can significantly reduce equipment cost and increase production capacity.
From the embodiment of the invention described above, another advantage of the present invention is exactly because the present invention adopts normal pressure evaporation mode to be coated with filth-resisting thin film, therefore can carry out efficiently the coating of the filth-resisting thin film of the pending base material of continuity by the utmost point.
From the embodiment of the invention described above, another advantage of the present invention is exactly because the present invention is under atmospheric environment, carry out atomization, the gasification of anti-pollution paint solution, therefore can also effectively anti-pollution paint be coated on equably on the single or multiple surface of pending base material fast in a large number.
From the embodiment of the invention described above, an advantage more of the present invention is exactly because normal pressure evaporation coating device and the making equipment of filth-resisting thin film of the present invention can carry out the coating of filth-resisting thin film under atmospheric pressure environment, therefore can carry out rapidly the coating of the filth-resisting thin film of pending base material.
From the embodiment of the invention described above, an advantage more of the present invention is exactly because normal pressure evaporation coating device and the making equipment of filth-resisting thin film of the present invention can carry out the coating of the filth-resisting thin film of a large amount of base materials simultaneously, therefore can significantly improve the output of filth-resisting thin film.
From the embodiment of the invention described above, the normal pressure evaporation coating device that an advantage more of the present invention is filth-resisting thin film of the present invention and making equipment can efficiently and carry out the coating of the filth-resisting thin film of continuity base material equably.
Accompanying drawing explanation
For above and other objects of the present invention, feature, advantage and embodiment can be become apparent, appended the description of the drawings is as follows:
Fig. 1 is the schematic diagram illustrating according to the atomisation unit of the normal pressure evaporation coating device of a kind of filth-resisting thin film of an embodiment of the present invention;
Fig. 2 is the installing schematic diagram that illustrates the normal pressure evaporation coating device of the filth-resisting thin film of Fig. 1;
Fig. 3 is the schematic diagram illustrating according to the making equipment of a kind of filth-resisting thin film of one embodiment of the present invention;
Fig. 4 is the schema illustrating according to the normal pressure evaporation coating method of a kind of filth-resisting thin film of an embodiment of the present invention;
Fig. 5 illustrates a kind of filth-resisting thin film normal pressure evaporation according to an embodiment of the present invention schematic diagram on base material.
[primary clustering nomenclature]
100: normal pressure evaporation coating device 102: transmitting device
102a: transmitting device 104: bearing carrier
104a: bearing carrier 106: coating catching device
108: atomizing component 110: coating conductive members
112: anti-pollution paint solution 114: paint delivery groove
116: dispatch tube 118: protective guard
120: base material 122: roller
124: atomisation unit 126: coating capacity sensor
128: convection device 130: well heater
132: reaction chamber 134: perforate
136: plasma apparatus 138: making equipment
140: anti-pollution paint fog 142: anti-pollution paint vapour molecule
144: plasma 146: surface
148: bracing or strutting arrangement 150: filth-resisting thin film
152: side 154: surface
200: method 202: step
204: step 206: step
208: step
Embodiment
Please refer to Fig. 1 and Fig. 2, wherein Fig. 1 is the schematic diagram illustrating according to the atomisation unit of the normal pressure evaporation coating device of a kind of filth-resisting thin film of one embodiment of the present invention, and Fig. 2 is the installing schematic diagram that illustrates the normal pressure evaporation coating device of the filth-resisting thin film of Fig. 1.In the present embodiment, as shown in Figure 2, the normal pressure evaporation coating device 100 of filth-resisting thin film mainly comprises transmitting device 102 and atomisation unit 124.In one embodiment, as shown in Figure 1, atomisation unit 124 comprises one or more coating catching device 106 and one or more atomizing component 108.Transmitting device 102 is to transmit one or more pending base material 120, as shown in Figure 2.In the embodiment shown in Figure 2, transmitting device 102 can comprise bearing carrier 104, and pending base material 120 can be placed on bearing carrier 104, and transmits by transmitting device 102.Wherein, base material 120 can be for example protective glass, plastic basis material, chilled glass or metal base.
In another embodiment, as shown in Figure 3, transmitting device 102a comprises bearing carrier 104a and several roller 122, and wherein these rollers 122 are arranged under bearing carrier 104a, and can drive bearing carrier 104a.In other embodiment, base material can be continuity base material, and transmitting device can be the transport unit that drives this continuity base material, the second wheel that for example supports and drive continuity base material to advance in atomisation unit 124 front and back two sides, now base material brings carrying without seeing through to carry.
Please, referring again to Fig. 1, each coating catching device 106 can load anti-pollution paint solution 112.And as shown in Figure 2, coating catching device 106 is arranged at the top of base material 120.Anti-pollution paint solution 112 can comprise anti-pollution paint and solvent.In one embodiment, the material of anti-pollution paint can comprise fluorine carbon silicon hydrocarbon compound, perfluorocarbon silicon hydrocarbon compound, fluorine carbon silane hydrocarbon compound, perfluor silane hydrocarbon compound or perfluor silane hydrocarbyl ether compounds.In addition, the solvent of anti-pollution paint solution 112 can for example comprise the liquid that high volatile volatile liquid, water or high volatile volatile liquid and water mix.The character of high volatile volatile solvent is liquid state under normal temperature, have stable chemical structure, have high volatile volatile, lower boiling, clear, colorless and to biological without obvious nocuous liquid.In a preferred embodiment, the vapour pressure of high volatile volatile liquid steaming pressure ratio water is at normal temperatures large, and this high volatile volatile liquid can be selected from by alcohols, ethers, alkanes, ketone, benzene class, contains fluorine-based alcohols, contains fluorine-based ethers, contains fluorine-based alkanes, contains fluorine-based ketone and contain the group that fluorine-based benzene class forms.
In the embodiment shown in Fig. 1 and Fig. 2, atomisation unit 124 also comprises at least one coating conductive members 110.This coating conductive members 110 is connected between the anti-pollution paint solution 112 and atomizing component 108 in coating catching device 106, and anti-pollution paint solution 112 can be sent to atomizing component 108 in coating catching device 106.Coating conductive members 110 can be for example sliver or conducting tube.In another embodiment, atomizing component 108 can be placed directly on the liquid level of anti-pollution paint solution 112, and now atomisation unit 122 can be without comprising coating conductive members 110.
In the embodiment of Fig. 1 and Fig. 2, atomisation unit 124 comprises multiple coating catching devices 106, multiple atomizing component 108 and multiple coating conductive members 110.In atomisation unit 124, each coating catching device 106 correspondences dispose an atomizing component 108 and a coating conductive members 110.
But in another embodiment, atomisation unit can comprise multiple coating catching devices and single atomizing component, this atomizing component is arranged on these coating catching devices.The anti-pollution paint solution that these coating catching devices load can pass through respectively coating conductive members, and transmits so far atomizing component.Now, see through this atomizing component, the anti-pollution paint solution that can load all coating catching devices carries out atomization processing.
In another embodiment, atomisation unit can comprise single coating catching device and multiple atomizing component, and wherein these atomizing components are arranged on this coating catching device.The anti-pollution paint solution that this coating catching device loads can pass through one or more coating conductive members, and is sent to respectively all atomizing components.Now, see through these atomizing components, the anti-pollution paint solution that can load this coating catching device carries out atomization processing.
Please, referring again to Fig. 1, atomisation unit 124 also can comprise paint delivery groove 114 according to running demand, to see through the dispatch tube 116 that is communicated with all coating catching devices 106, supplies anti-pollution paint solution 112 to all coating catching devices 106.In addition,, in atomisation unit 124, due to connecting pipe principle, therefore the liquid level of the anti-pollution paint solution 112 in all coating catching devices 106 equates haply.
Therefore, in another embodiment, normal pressure evaporation coating device 100 also can be according to the actual requirements, and in a coating catching device 106, coating capacity sensor 126 is set therein, with the amount of the sensing coating catching device 106 interior anti-pollution paint solution 122 that loaded, as shown in Figure 1.The information of anti-pollution paint solution 122 quantity that coating capacity sensor 126 monitors, can directly be shown on the display module of an outside surface of normal pressure evaporation coating device 100, or can utilize transmission route by and be sent in the supervisory system of coating, for the amount of the anti-pollution paint solution 122 in personnel control's coating catching device 106 that works online.
In the present embodiment, can utilize by multiple atomisation units 124, come simultaneously the multiple base materials 120 on transmitting device 102, for example, be arranged in rows, in column or become multiple base materials of array, carry out the evaporation of filth-resisting thin film.In addition, because the present invention is the coating of carrying out filth-resisting thin film under normal pressure, therefore can fast and effectively anti-pollution paint be coated on base material 120 surfaces equably in a large number.
Please, referring again to Fig. 2, in this embodiment, normal pressure evaporation coating device 100 also can comprise protective guard 118.Protective guard 118 covers the transmitting device 102 of part, and can define reaction chamber 132 with the bearing carrier of transmitting device 102 104.In addition, protective guard 118 covers the base material 120 on the transmitting device 102 of this part, and the coating catching device 106 of atomisation unit 124, atomizing component 108, with coating conductive members 110.It should be noted that in the time that base material is continuity base material, protective guard can be directly and its base material covering define reaction chamber.
As shown in Figure 2, a sidewall of protective guard 118 can have a perforate 134.The area of the reducible side that is slightly larger than coating catching device 106 of area of the perforate 134 of protective guard 118, so atomisation unit 124 can enter the reaction chamber 132 of protective guard 118 inside from the perforate of protective guard 118 134.As shown in Figure 3, still can be at the interior bracing or strutting arrangement 148 that arranges of reaction chamber 132, so as to support atomisation unit 124.
In one embodiment, atomisation unit 124 also can comprise well heater 130.Well heater 130 is preferably and is arranged in reaction chamber 132, for example, on the protective guard 118 of reaction chamber 132 inside or on transmitting device 102.The anti-pollution paint fog that well heater 130 can heating atomization assembly 108 produces, accelerates to change into anti-pollution paint vapour molecule by anti-pollution paint fog whereby.For example, in the time of the solvent of the anti-pollution paint solution 112 non-high volatile volatile liquid such as be water, can utilize well heater 130 to help anti-pollution paint fog, make it change into smoothly anti-pollution paint vapour molecule.
In another embodiment, according to process requirement, atomisation unit 124 can further comprise convection device 128.Wherein, convection device 128 can be arranged in reaction chamber 132 equally, for example, on the protective guard 118 of reaction chamber 132 inside or on transmitting device 102.Convection device 128 can be before anti-pollution paint vapour molecule be deposited on base material 120, and the anti-pollution paint vapour molecule that first makes to be distributed in reaction chamber 132 intersperses among in reaction chamber 132 more equably.By the setting of convection device 128, not only can make formed filth-resisting thin film more even, also make normal pressure evaporation coating device 100 can carry out smoothly the filth-resisting thin film coating on each surface of three-dimensional arrangement.
The normal pressure evaporation coating device of the present embodiment plasma apparatus of can arranging in pairs or groups carries out the coating of filth-resisting thin film.Please refer to Fig. 3, it is the schematic diagram illustrating according to the making equipment of a kind of filth-resisting thin film of one embodiment of the present invention.The making equipment 138 of filth-resisting thin film, except comprising normal pressure evaporation coating device 100, also comprises plasma apparatus 136.In a preferred embodiment, normal pressure evaporation coating device 100 can be shared transmitting device 102a with plasma apparatus 136.But in another embodiment, normal pressure evaporation coating device 100 also can utilize different transmitting devices to transmit pending base material from plasma apparatus 136.Wherein, normal pressure evaporation coating device 100 is all arranged on transmitting device 102a top with plasma apparatus 136.Normal pressure evaporation coating device 100 is preferably and is adjacent to plasma apparatus 136, with at base material 120 after plasma apparatus 136 is processed, carry out immediately the normal pressure evaporation of filth-resisting thin film.
In one embodiment, plasma apparatus 136 can be for example atmospheric plasma device, low-voltage plasma device or electromagnetic coupled formula plasma apparatus etc., to produce atmospheric plasma or low-voltage plasma, base material 120 surfaces is cleaned and modifying process.Wherein, atmospheric plasma can be for example atmospheric pressure discharge plasma (plasma jet or plasma torch) or wide cut atmospheric plasma (dielectric barrier discharge; DBD or atmospheric glow discharge) etc., low-voltage plasma can be for example vacuum plasma.So, more noticeable, coordinate the operating integrity of follow-up normal pressure evaporation, present embodiment to be preferably and adopt atmospheric plasma to carry out the clean and activation treatment on base material 120 surfaces, to shorten the processing procedure time.
Please refer to Fig. 4, is the schema illustrating according to the normal pressure evaporation coating method of a kind of filth-resisting thin film of an embodiment of the present invention.In the present embodiment, can in the making equipment of the embodiment shown in above-mentioned Fig. 3 138, carry out when normal pressure evaporation filth-resisting thin film.As shown in Figure 4, in the present embodiment, the normal pressure evaporation coating method 200 of filth-resisting thin film, can, first as described in step 202, provide base material 120.
In one embodiment, carry out step 202 when base material 120 to be provided, one or more base material 120 can be arranged on to transmitting device 102a.In the embodiment shown in fig. 3, base material 120 is to be arranged on the bearing carrier 104a of transmitting device 102a.In further embodiments, in the time that base material is continuity base material, base material can for example, be transported by the transport unit (roller) that drives this continuity base material, now carries without seeing through bearing carrier 104a.
In the present embodiment, while carrying out the coating of filth-resisting thin film 150 (please also refer to Fig. 5), can be according to process requirement, and as described in the step 204 of Fig. 4, first optionally utilize plasma apparatus 136 to produce plasma 144, and utilize plasma 144 to clean and surfaction processing the surface 146 of base material 120, so as to the surface 146 of activation base material 120.In one embodiment, the surface 146 of base material 120, after plasma 144 activation, can form several functional groups on the surface of base material 120 146.
Complete after the surface treatment step 204 of base material 120, carry out step 206 immediately.In one embodiment, while carrying out step 206, can first atomisation unit 124 be arranged on to 146 tops, surface of base material 120, and utilize protective guard 118 to cover base material 120, so as to making protective guard 118 and the bearing carrier of transmitting device 102a define reaction chamber 132.Then, as shown in Figure 3, under atmospheric environment, utilize atomisation unit 124 in the surface of the base material 120 of reaction chamber 132 inside 146 top atomization anti-pollution paint solution 112, to form anti-pollution paint fog 140 above the surface 146 at base material 120.
While utilizing the atomizing component 108 of atomisation unit 124 to carry out atomization, wave voltinism solvent by height and can drive the anti-pollution paint that molecule is larger, be conducive to thus 112 atomizations of anti-pollution paint solution to change into anti-pollution paint fog 140.Subsequently, because the solvent in anti-pollution paint fog 140 compositions volatilizees and is gasificated into anti-pollution paint vapour molecule 142 fast.
In further embodiments, also can utilize well heater 130 as shown in Figure 2, carry out the anti-pollution paint fog 140 that heating atomization device 124 forms, change into anti-pollution paint vapour molecule 142 to accelerate anti-pollution paint fog 140.For example, in the time of the solvent of the anti-pollution paint solution 112 non-high volatile volatile liquid such as be water, can utilize well heater 130 to help anti-pollution paint fog 140 and change into anti-pollution paint vapour molecule 142.
In preferred embodiment of the present invention, because the activated rear generation in surface 146 of base material 120 has functional group, therefore the anti-pollution paint molecule in anti-pollution paint fog 140 can be attached in the mode of anisotropic the surface 146 of base material 120, and produces condensation reaction (CondensationReaction) with the functional group on base material 120 surfaces 146.Therefore the filth-resisting thin film 150 forming has extremely strong sticking power to the surface 146 of base material 120.
In another embodiment of the present invention, also can be according to process requirement, and before anti-pollution paint vapour molecule 142 depositions, first optionally convection device 128 is arranged in reaction chamber 132, and utilizes convection device 128 that anti-pollution paint vapour molecule 142 is interspersed among in reaction chamber 132 more equably.Now, if when the surface 154 of base material 120 and/or side 152 are not attached at bearing carrier 104a completely, anti-pollution paint vapour molecule 142 can be deposited on surface 146, surface 154 and/or the side 152 of base material 120 simultaneously, and then makes filth-resisting thin film 150 be coated on surface 146, surface 154 and/or the side 152 of base material 120.By coating filth-resisting thin film 150, can make surface 146, surface 154 and/or the side 152 of base material 120 there is the function of hydrophobic, oleophobic and oil rub resistance.
In the present embodiment, can utilize the evaporated device being formed by multiple atomisation units 124, come simultaneously multiple base materials 120, for example, be arranged in rows, in column or array base material, carry out the evaporation of filth-resisting thin film.In addition, because the present invention is the coating of carrying out filth-resisting thin film 150 under normal pressure, therefore can be in a large number fast and effectively anti-pollution paint is coated on equably on the surface 146 of base material 120.
In addition, one of embodiments of the present invention are characterised in that, the atomization of anti-pollution paint solution is to carry out above pending base material, and therefore the spray direction of anti-pollution paint solution after atomization is not directly towards pending base material.Thus, anti-pollution paint solution can, after gasification is more clear and definite, just touch on pending substrate surface.Therefore, droplet phenomenon can be avoided producing on substrate surface, and then the coating homogeneity of filth-resisting thin film can be improved.
In other embodiments of the present invention, the atomization of anti-pollution paint solution also can be carried out in other region, and can above pending base material, not carry out.For example, can below pending base material, carry out the atomization of anti-pollution paint solution, recycling conduit carries out the guiding of anti-pollution paint fog.By conduit, the anti-pollution paint vapour molecule being changed into can be directed into the region of the required coating filth-resisting thin film of base material, and then form filth-resisting thin film at base material desired zone in conductive process by anti-pollution paint fog.
From the embodiment of the invention described above, an advantage of the present invention is that the present invention adopts normal pressure evaporation mode to carry out the coating of filth-resisting thin film, therefore omits the program that step-down vacuumizes, and then can significantly reduce equipment cost and increase production capacity.
From the embodiment of the invention described above, another advantage of the present invention is exactly because the present invention adopts normal pressure evaporation mode to be coated with filth-resisting thin film, therefore can carry out efficiently the coating of the filth-resisting thin film of the pending base material of continuity by the utmost point.
From the embodiment of the invention described above, another advantage of the present invention is exactly because the present invention is under atmospheric environment, carry out atomization, the gasification of anti-pollution paint solution, therefore can also effectively anti-pollution paint be coated on equably on the single or multiple surface of pending base material fast in a large number.
From the embodiment of the invention described above, an advantage more of the present invention is exactly because normal pressure evaporation coating device and the making equipment of filth-resisting thin film of the present invention can carry out the coating of filth-resisting thin film under atmospheric pressure environment, therefore can carry out rapidly the coating of the filth-resisting thin film of pending base material.
From the embodiment of the invention described above, an advantage more of the present invention is exactly because normal pressure evaporation coating device and the making equipment of filth-resisting thin film of the present invention can carry out the coating of the filth-resisting thin film of a large amount of base materials simultaneously, therefore can significantly improve the output of filth-resisting thin film.
From the embodiment of the invention described above, the normal pressure evaporation coating device that an advantage more of the present invention is filth-resisting thin film of the present invention and making equipment can efficiently and carry out the coating of the filth-resisting thin film of continuity base material equably.
Although the present invention discloses as above with embodiment; so it is not in order to limit the present invention; any those having an ordinary knowledge in this technical field; without departing from the spirit and scope of the present invention; when being used for a variety of modifications and variations, the scope that therefore protection scope of the present invention ought define depending on appending claims is as the criterion.
Claims (20)
1. a normal pressure evaporation coating method for filth-resisting thin film, is characterized in that, comprises:
One base material is provided;
One anti-soil coating solution is carried out to a gasification step, to form multiple anti-soil vapour molecules, this gasification step is that this anti-pollution paint solution is after an atomizing component is processed, be atomized into an anti-pollution paint fog, the solvent in this anti-pollution paint fog solution volatilizees fast and is gasificated into those anti-soil vapour molecules; And
Deposit those anti-soil vapour molecules upper in a surface of this base material, to form this filth-resisting thin film.
2. the normal pressure evaporation coating method of filth-resisting thin film according to claim 1, is characterized in that, this anti-pollution paint solution comprises an anti-pollution paint and a solvent, and this solvent comprises high volatile volatile liquid and/or a water.
3. the normal pressure evaporation coating method of filth-resisting thin film according to claim 2, it is characterized in that, the material of this anti-pollution paint comprises fluorine carbon silicon hydrocarbon compound, perfluorocarbon silicon hydrocarbon compound, fluorine carbon silane hydrocarbon compound, perfluor silane hydrocarbon compound or perfluor silane hydrocarbyl ether compounds.
4. the normal pressure evaporation coating method of filth-resisting thin film according to claim 2, it is characterized in that, the vapour pressure of this high volatile volatile liquid steaming pressure ratio water is at normal temperatures large, and this high volatile volatile liquid is to be selected from by alcohols, ethers, alkanes, ketone, benzene class, containing fluorine-based alcohols, containing fluorine-based ethers, containing fluorine-based alkanes, containing fluorine-based ketone and the group forming containing fluorine-based benzene class.
5. the normal pressure evaporation coating method of filth-resisting thin film according to claim 1, is characterized in that, this atomizing component comprises a ultrasound atomizing component, a heating evaporation atomizing component, a spraying high-pressure gas assembly or a nozzle atomization assembly.
6. the normal pressure evaporation coating method of filth-resisting thin film according to claim 1, it is characterized in that, before this gasification step, also comprise and utilize a plasma to clean and process in this surface of this base material, so as to form multiple functional groups on this surface of this base material, those functional groups comprise multiple hydrogen-oxygen functional groups, multiple nitrogen hydrogen functional group and/or multiple hovering key.
7. the normal pressure evaporation coating method of filth-resisting thin film according to claim 1, is characterized in that, before this gasification step, also comprise and utilize a protective guard to cover this base material, and this gasification step is to carry out in this protective guard.
8. the normal pressure evaporation coating method of filth-resisting thin film according to claim 7, is characterized in that, before the step of those anti-soil vapour molecules of deposition, also comprises and makes those anti-soil vapour molecule convection current in this protective guard.
9. a normal pressure evaporation coating device for filth-resisting thin film, is characterized in that, comprises:
One transmitting device, is suitable for to transmit at least one base material; And
One atomisation unit, comprises:
At least one coating catching device, in order to load an anti-soil coating solution; And
At least one atomizing component, is located on this at least one coating catching device, uses so that this anti-pollution paint vaporizer becomes multiple anti-pollution paint vapour molecules and is deposited on a surface of this at least one base material.
10. the normal pressure evaporation coating device of filth-resisting thin film according to claim 9, is characterized in that, this at least one atomizing component comprises a ultrasound atomization shake sheet, a heating evaporation atomizing component, a spraying high-pressure gas assembly or a nozzle atomization assembly.
The normal pressure evaporation coating device of 11. filth-resisting thin films according to claim 9, it is characterized in that, this at least one atomizing component is located on the top of this at least one coating catching device, and this atomisation unit also comprises at least one coating conductive members, be suitable for so that this anti-pollution paint solution is sent to this at least one atomizing component.
The normal pressure evaporation coating device of 12. filth-resisting thin films according to claim 9, is characterized in that, also comprises a protective guard, be suitable for cover this at least one base material, this at least one coating catching device, with this at least one atomizing component.
The normal pressure evaporation coating device of 13. filth-resisting thin films according to claim 9, is characterized in that, this at least one coating catching device comprises multiple coating catching devices, and this at least one atomizing component comprises single atomizing component and is arranged on those coating catching devices.
The normal pressure evaporation coating device of 14. filth-resisting thin films according to claim 9, is characterized in that, this at least one coating catching device comprises single coating catching device, and this at least one atomizing component comprises multiple atomizing components and is arranged on this coating catching device.
The making equipment of 15. 1 kinds of filth-resisting thin films, is characterized in that, comprises:
One transmitting device, is suitable for to transmit at least one base material;
One plasma apparatus, is located at this transmitting device top, and is suitable for the surface to this at least one base material and carries out a surface activation process; And
One normal pressure evaporation coating device, is adjacent to by this plasma apparatus, and wherein this normal pressure evaporation coating device comprises an atomisation unit, and this atomisation unit comprises:
At least one coating catching device, in order to load an anti-soil coating solution; And
At least one atomizing component, be located on this at least one coating catching device, with so that this anti-pollution paint vaporizer becomes multiple coating vapor molecules, and make those coating vapor molecule depositions on this surface of this at least one base material after this surface activation process, so as to forming a filth-resisting thin film.
The making equipment of 16. filth-resisting thin films according to claim 15, is characterized in that, this plasma apparatus is an atmospheric plasma device, a low-voltage plasma device or electromagnetic coupled formula plasma apparatus.
The making equipment of 17. filth-resisting thin films according to claim 15, is characterized in that, this at least one atomizing component comprises a ultrasound atomization shake sheet, a heating evaporation atomizing component, a spraying high-pressure gas assembly or a nozzle atomization assembly.
The making equipment of 18. filth-resisting thin films according to claim 15, is characterized in that, this at least one coating catching device comprises multiple coating catching devices, and this at least one atomizing component comprises single atomizing component and is arranged on those coating catching devices.
The making equipment of 19. filth-resisting thin films according to claim 15, is characterized in that, this at least one coating catching device comprises single coating catching device, and this at least one atomizing component comprises multiple atomizing components and is arranged on this coating catching device.
The making equipment of 20. filth-resisting thin films according to claim 15, is characterized in that, this normal pressure evaporation coating device also comprises a coating capacity sensor, is suitable for the amount of this anti-pollution paint solution to be loaded in this at least one coating catching device of sensing.
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW100113923A TWI415961B (en) | 2011-04-21 | 2011-04-21 | Atmospheric evaporation method of anti-smudge film |
| TW100207065U TWM415754U (en) | 2011-04-21 | 2011-04-21 | Atmospheric evaporation device and manufacturing apparatus of anti-smudge film |
| TW100207065 | 2011-04-21 | ||
| TW100113923 | 2011-04-21 |
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| CN102747327A CN102747327A (en) | 2012-10-24 |
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| CN104310796A (en) * | 2014-09-26 | 2015-01-28 | 蓝思科技（长沙）有限公司 | AS coating method on surface of glass material and device thereof |
| CN104513950B (en) * | 2014-10-29 | 2019-10-01 | 苏州东杏表面技术有限公司 | A method of quickly preparing wear-resisting anti-soil film |
| CN206003070U (en) * | 2016-07-28 | 2017-03-08 | 意力(广州)电子科技有限公司 | A kind of contact panel with AF film and its manufacturing equipment |
| TWI668320B (en) * | 2018-05-09 | 2019-08-11 | 馗鼎奈米科技股份有限公司 | Method for enhancing adhesion of anti-fouling film |
| CN110129728B (en) * | 2019-06-14 | 2021-09-21 | 东莞市广正模具塑胶有限公司 | Modified AF (AF) coating material as well as preparation method and application thereof |
| CN113913787A (en) * | 2021-10-15 | 2022-01-11 | 浙江生波智能装备有限公司 | Novel film preparation process and vacuum coating equipment |
| CN114538895B (en) * | 2022-03-17 | 2023-03-17 | 湖北中烟工业有限责任公司 | Self-cleaning heat-resistant ceramic and preparation method thereof |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1679142A (en) * | 2002-08-26 | 2005-10-05 | 亚利桑那西格玛实验室公司 | Barrier coatings produced by atmospheric glow discharge |
| CN101508192A (en) * | 2009-03-30 | 2009-08-19 | 天津美泰真空技术有限公司 | Polymerization sheet anti-fingerprint film for handset protection screen and preparation method thereof |
| CN101879801A (en) * | 2010-06-21 | 2010-11-10 | 东莞劲胜精密组件股份有限公司 | Anti-fingerprint film and preparation method thereof |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004300503A (en) * | 2003-03-31 | 2004-10-28 | Toray Ind Inc | Evaporation source and method, deposition apparatus using the evaporation source and organic electroluminescent device manufacturing method using the evaporation source |
-
2011
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Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1679142A (en) * | 2002-08-26 | 2005-10-05 | 亚利桑那西格玛实验室公司 | Barrier coatings produced by atmospheric glow discharge |
| CN101508192A (en) * | 2009-03-30 | 2009-08-19 | 天津美泰真空技术有限公司 | Polymerization sheet anti-fingerprint film for handset protection screen and preparation method thereof |
| CN101879801A (en) * | 2010-06-21 | 2010-11-10 | 东莞劲胜精密组件股份有限公司 | Anti-fingerprint film and preparation method thereof |
Non-Patent Citations (1)
| Title |
|---|
| JP特开2004-300503A 2004.10.28 |
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