CN102666469B - 新型非结晶甲基丙烯酸酯、其的制备和应用 - Google Patents

新型非结晶甲基丙烯酸酯、其的制备和应用 Download PDF

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Publication number
CN102666469B
CN102666469B CN201080049781.3A CN201080049781A CN102666469B CN 102666469 B CN102666469 B CN 102666469B CN 201080049781 A CN201080049781 A CN 201080049781A CN 102666469 B CN102666469 B CN 102666469B
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CN
China
Prior art keywords
photopolymer formulation
hologram
acrylate
photopolymer
isocyanate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN201080049781.3A
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English (en)
Chinese (zh)
Other versions
CN102666469A (zh
Inventor
T.费克
F-K.布鲁德
M-S.韦泽
T.罗勒
D.赫内尔
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Covestro Deutschland AG
Bayer Intellectual Property GmbH
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Bayer MaterialScience AG
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Priority to CN201510183780.2A priority Critical patent/CN104892462B/zh
Publication of CN102666469A publication Critical patent/CN102666469A/zh
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Expired - Fee Related legal-status Critical Current
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    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C271/00—Derivatives of carbamic acids, i.e. compounds containing any of the groups, the nitrogen atom not being part of nitro or nitroso groups
    • C07C271/06—Esters of carbamic acids
    • C07C271/08—Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms
    • C07C271/26—Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms with the nitrogen atom of at least one of the carbamate groups bound to a carbon atom of a six-membered aromatic ring
    • C07C271/30—Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms with the nitrogen atom of at least one of the carbamate groups bound to a carbon atom of a six-membered aromatic ring to a carbon atom of a six-membered aromatic ring being part of a condensed ring system
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C323/00—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
    • C07C323/23—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton
    • C07C323/39—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton at least one of the nitrogen atoms being part of any of the groups, X being a hetero atom, Y being any atom
    • C07C323/43—Y being a hetero atom
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/001—Phase modulating patterns, e.g. refractive index patterns
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/035—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyurethanes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Inorganic Chemistry (AREA)
  • Holo Graphy (AREA)
  • Polyurethanes Or Polyureas (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
CN201080049781.3A 2009-11-03 2010-11-02 新型非结晶甲基丙烯酸酯、其的制备和应用 Expired - Fee Related CN102666469B (zh)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201510183780.2A CN104892462B (zh) 2009-11-03 2010-11-02 新型非结晶甲基丙烯酸酯、其的制备和应用

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP09013763.9 2009-11-03
EP09013763 2009-11-03
PCT/EP2010/066633 WO2011054818A2 (de) 2009-11-03 2010-11-02 Neue, nicht kristallisierende methacrylate, deren herstellung und verwendung

Related Child Applications (1)

Application Number Title Priority Date Filing Date
CN201510183780.2A Division CN104892462B (zh) 2009-11-03 2010-11-02 新型非结晶甲基丙烯酸酯、其的制备和应用

Publications (2)

Publication Number Publication Date
CN102666469A CN102666469A (zh) 2012-09-12
CN102666469B true CN102666469B (zh) 2016-03-02

Family

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Family Applications (2)

Application Number Title Priority Date Filing Date
CN201080049781.3A Expired - Fee Related CN102666469B (zh) 2009-11-03 2010-11-02 新型非结晶甲基丙烯酸酯、其的制备和应用
CN201510183780.2A Expired - Fee Related CN104892462B (zh) 2009-11-03 2010-11-02 新型非结晶甲基丙烯酸酯、其的制备和应用

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Country Status (7)

Country Link
US (1) US20120219885A1 (https=)
EP (1) EP2496549B1 (https=)
JP (1) JP5793147B2 (https=)
KR (1) KR101767280B1 (https=)
CN (2) CN102666469B (https=)
TW (1) TWI506018B (https=)
WO (1) WO2011054818A2 (https=)

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US8877408B2 (en) * 2009-11-03 2014-11-04 Bayer Materialscience Ag Urethanes used as additives in a photopolymer formulation
EP2317511B1 (de) 2009-11-03 2012-03-07 Bayer MaterialScience AG Photopolymerformulierungen mit einstellbarem mechanischem Modul Guv
KR101782182B1 (ko) * 2009-11-03 2017-09-26 코베스트로 도이칠란드 아게 상이한 기록 공단량체를 갖는 광중합체 제제
JP5925687B2 (ja) * 2009-11-03 2016-05-25 バイエル・マテリアルサイエンス・アクチェンゲゼルシャフトＢａｙｅｒ ＭａｔｅｒｉａｌＳｃｉｅｎｃｅ ＡＧ ホログラフィック媒体の製造方法
ES2446344T3 (es) * 2009-11-03 2014-03-07 Bayer Intellectual Property Gmbh Procedimiento para la producción de una película holográfica
PT2497085E (pt) * 2009-11-03 2014-03-27 Bayer Ip Gmbh Processo para a produção de um filme holográfico
KR20120125270A (ko) * 2010-02-02 2012-11-14 바이엘 인텔렉쳐 프로퍼티 게엠베하 트리아진-기재 기록 단량체를 갖는 광중합체 배합물
US9057950B2 (en) * 2010-02-02 2015-06-16 Bayer Intellectual Property Gmbh Photopolymer formulation having ester-based writing monomers
EP2450387A1 (de) * 2010-11-08 2012-05-09 Bayer MaterialScience AG Photopolymer-Formulierung für die Herstellung holographischer Medien
TWI557187B (zh) * 2012-05-03 2016-11-11 拜耳材料科學股份有限公司 用於光聚合物之新穎光起始劑
US20140128508A1 (en) * 2012-11-06 2014-05-08 Ppg Industries Ohio, Inc. Non-aqueous dispersions comprising an acrylic polymer stabilizer and an aliphatic polyester stabilized seed polymer
KR102583200B1 (ko) * 2014-12-12 2023-09-27 코베스트로 도이칠란트 아게 광중합체에 대한 기록 단량체로서의 나프틸 아크릴레이트
WO2016096641A1 (de) * 2014-12-19 2016-06-23 Covestro Deutschland Ag Feuchtigkeitsstabile holographische medien
US11414373B2 (en) 2017-01-20 2022-08-16 Evonik Operations Gmbh Glycerol (meth)acrylate carboxylic ester having a long shelf life
EP3611155A1 (en) 2018-08-16 2020-02-19 Evonik Operations GmbH Preparation of (meth)acrylic acid esters
US11718580B2 (en) 2019-05-08 2023-08-08 Meta Platforms Technologies, Llc Fluorene derivatized monomers and polymers for volume Bragg gratings
US11780819B2 (en) 2019-11-27 2023-10-10 Meta Platforms Technologies, Llc Aromatic substituted alkane-core monomers and polymers thereof for volume Bragg gratings
US11879024B1 (en) 2020-07-14 2024-01-23 Meta Platforms Technologies, Llc Soft mold formulations for surface relief grating fabrication with imprinting lithography
US20220153693A1 (en) * 2020-11-13 2022-05-19 Facebook Technologies, Llc Substituted mono- and poly-phenyl-core monomers and polymers thereof for volume bragg gratings

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Also Published As

Publication number Publication date
US20120219885A1 (en) 2012-08-30
EP2496549A2 (de) 2012-09-12
CN104892462A (zh) 2015-09-09
WO2011054818A3 (de) 2011-09-15
CN104892462B (zh) 2017-08-22
JP5793147B2 (ja) 2015-10-14
CN102666469A (zh) 2012-09-12
KR20120099426A (ko) 2012-09-10
WO2011054818A2 (de) 2011-05-12
EP2496549B1 (de) 2014-10-08
JP2013510116A (ja) 2013-03-21
KR101767280B1 (ko) 2017-08-23
TWI506018B (zh) 2015-11-01
TW201130796A (en) 2011-09-16

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