CN102644058A - Substrate overturning device for vacuum coating equipment - Google Patents
Substrate overturning device for vacuum coating equipment Download PDFInfo
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- CN102644058A CN102644058A CN2012101202660A CN201210120266A CN102644058A CN 102644058 A CN102644058 A CN 102644058A CN 2012101202660 A CN2012101202660 A CN 2012101202660A CN 201210120266 A CN201210120266 A CN 201210120266A CN 102644058 A CN102644058 A CN 102644058A
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Abstract
The invention relates to a substrate overturning device for vacuum coating equipment, which comprises a rotary table, a substrate work rack, an angle stopper, a pointer, a shifting fork, a window gland, a corrugated tube, a corrugated tube joint and a shifting fork rod. The substrate work rack, the angle stopper and the pointer are assembled together and are mounted on the rotary table, the window gland, window glass, the corrugated tube, the corrugated tube joint, the shifting fork and the shifting fork rod are assembled together, the window gland is connected with a coating machine, and the rotating angle of a substrate is changed and overturning of a crystal surface of the substrate are finished in a vacuum state by means of operating the shifting fork rod, the corrugated tube and the pointer. The substrate overturning device is a manual operator, can be used for coating the substrate by physical vapor deposition methods including sputtering, heat evaporation and the like, when repeated substrate coating at the determined angle is needed, the angle of the substrate can be changed precisely by the device, so that multidirectional substrate coating can be finished by once vacuumizing, production efficiency is improved, working procedure time is shortened, and further the quality of films is improved.
Description
Technical field
The present invention relates to a kind of substrate turning device when being used for vacuum plating, be specifically related to a kind of manual substrate turning device of under vacuum state, the substrate coating direction being changed, belong to material technology and device technology field.
Background technology
The vacuum film formation technology is widely used in the fields such as optics, electronics, energy development, building machinery, Surface Science and scientific research now; Vacuum plating more occupies very consequence aspect electronics, for example prepares the vacuum plating commonly used of micromechanics (MEMS) device now and prepares conducting film, insulating film and protective membrane.,, need sometimes carry out plated film multi-direction, the polycrystalline face when utilizing vacuum plating to prepare the MEMS device actual to substrate except that substrate being carried out the even plated film in two sides.As adopt the vacuum plating mode to prepare the decline electrode of mechanical gyro of quartz tuning-fork, because quartzy piezoelectric properties, the sidewall surfaces of responsive tuning fork need prepare parallel layered electrode.Adopt the hole mask to prepare the angle that electrode just needs adjustment tuning fork side and coating materials molecule incident direction, make the tuning fork side form continuously membrane electrode uniformly.Because the polarity of electrode that picks up on the yoke side of tuning fork is opposite; So also need change the electrode preparation that direction is carried out opposite side behind the side plated film of completion tuning fork; The electrode preparation of whole tuning fork needs repeatedly wafer to be carried out above-described angle evaporation, and each orientation angle must be accurately consistent.
More commonly realize 360 ° or 180 ° of even plated films of substrate in the vacuum coater; When needs carry out 0 °～90 ° plated films that tilt at any angle to substrate, and when needing to carry out repeatedly angle change plated film to substrate, if there is not the substrate turning device; When accomplishing a direction plated film; Need to wait for the coating equipment cooling, inflation back change substrate direction vacuumizes once more and carries out plated film.This preparation method production efficiency is low, nor is beneficial to film quality control.
Summary of the invention
The objective of the invention is to overcome the above-mentioned defective of prior art; The substrate turning device that provides a kind of vacuum plating unit to use; This device is hand-operating device, and being used for physical gas-phase deposite methods such as sputter, thermal evaporation carries out plated film to substrate, not only enhances productivity; Reduce activity time, and can improve film quality.
Above-mentioned purpose of the present invention mainly is achieved through following technical scheme:
A kind of vacuum plating unit is used the substrate turning device; Comprise the substrate movements and postures of actors, angle stop block, pointer, shift fork, window gland, corrugated tube, corrugated tube interface and shifting fork bar; Wherein two supports that pass respectively on the coating equipment rotating disk at substrate movements and postures of actors two ends are fixed on the coating equipment rotating disk; The axle that the angle stop block passes the substrate movements and postures of actors one end is fixed therein on the support, and pointer is installed on the axle of the substrate movements and postures of actors one end, and shift fork is installed in the end of shifting fork bar; Offer two pairs of grooves that hold pointer on the shift fork; Select wherein a pair of groove to realize the change of angle between the evaporation source in the substrate and coating equipment in the substrate movements and postures of actors, select the upset of substrate coating crystal face in the other a pair of groove realization substrate movements and postures of actors, the window gland is installed on the coating equipment chamber door; Corrugated tube one end is welded on the window gland, and the other end and shifting fork bar are realized the dynamic seal assembling through the corrugated tube interface.
Above-mentioned vacuum plating unit with the substrate turning device in, the window gland is provided with window glass, is used to observe the operational circumstances of shift fork to the substrate movements and postures of actors.
Above-mentioned vacuum plating unit with the substrate turning device in; Be symmetrically arranged with two blocks on the angle stop block, wherein the angle of X axle
is 30-60 ° on the edge of block and the angle stop block.
Above-mentioned vacuum plating unit with the substrate turning device in; Two pairs of grooves offering on the shift fork are respectively a pair of U type groove and pair of L type groove; Wherein pointer inserts and realizes the change of angle between the evaporation source in substrate and the coating equipment in a pair of U type groove, and pointer inserts the upset that realizes the substrate coating crystal face in the pair of L type groove.
Above-mentioned vacuum plating unit with the substrate turning device in, the substrate movements and postures of actors are skeleton construction, rotational symmetry is arranged on the skeleton construction two ends, through the dividing plate of different quantities is set in framework, plated film when realizing a plurality of substrate.
The present invention compared with prior art has following beneficial effect:
(1) substrate turning device of the present invention adopts innovative structure design; Can carry out accurate angle change to substrate; Satisfied the substrate needs and confirmed the repeatedly plated film requirement of angle, made the substrate only need once vacuumize the multi-direction plated film that just can accomplish substrate, not only enhanced productivity; Reduce activity time, and can improve film quality;
(2) offer two pairs of grooves on the shift fork in the substrate turning device of the present invention, realize the rotation of vacuum state subtegulum angle and the upset of substrate wafer surface respectively, to satisfy the requirement of the multi-direction multiaspect plated film of substrate, two pairs of grooves are preferably L shaped groove and U type groove;
(3) substrate turning device of the present invention is installed on the chamber door of coating equipment through the window gland; Window gland and chamber door realize being tightly connected through sealing-ring; Make that the substrate turning device is simple and compact for structure, can use not changing on original Equipment Foundations, do not take cavity space;
(4) substrate turning device of the present invention does not have automatic control section; There is not the realization that receives storing temperature and vacuum tightness and influence function; Confirm that angle indicator rotates to the block place and just can guarantee the accurate of angle as long as observe; Avoided causing process failure because machine is slipped up, improved the safety of substrate coating greatly with gear driven substrate upset mode;
(5) substrate turning device of the present invention is a hand-operating device, can be used for physical gas-phase deposite methods such as sputter, thermal evaporation substrate is carried out plated film, has wider Application Areas and stronger practicality.
Description of drawings
Fig. 1 is a substrate turning device film plating substrate element sketch of the present invention;
Fig. 2 is a substrate turning device structural representation of the present invention;
Fig. 3 is substrate movements and postures of actors structural representation in the substrate turning device of the present invention;
Fig. 4 is angle stop block synoptic diagram in the substrate turning device of the present invention;
Fig. 5 is shift fork synoptic diagram in the substrate turning device of the present invention.
Embodiment
Below in conjunction with accompanying drawing and specific embodiment the present invention is done further detailed explanation:
Be illustrated in figure 2 as substrate turning device structural representation of the present invention, but comprise the substrate movements and postures of actors 2, angle stop block 3, pointer 4, shift fork 5, window gland 6, window glass 7, corrugated tube 8, corrugated tube interface 9 and shifting fork bar 10 by figure knowledge capital invention substrate turning device.Rotating disk 1 is installed in coating equipment chamber top, and the rotary electric machine outer with chamber links to each other, and this driven by motor rotating disk 1 rotates in coating equipment.The substrate movements and postures of actors 2, angle stop block 3 are installed on the rotating disk 1 with pointer 4; Shift fork 5, window glass 7, window gland 6, corrugated tube 8, corrugated tube interface 9 are transferred on shifting fork bar 10; Be installed on the chamber door of coating equipment, shifting fork bar 10 is the outer moving parts of chamber with corrugated tube 8.
Two supports 11,14 that the axle 12,13 at the substrate movements and postures of actors 2 two ends passes respectively on the coating equipment rotating disk 1 are fixed on the coating equipment rotating disk 1; Be illustrated in figure 3 as substrate movements and postures of actors structural representation in the substrate turning device of the present invention, can know that by figure the substrate movements and postures of actors 2 are skeleton construction, axle 12,13 is symmetricly set on the skeleton construction two ends; Offer through hole on its axis 12; Be used for passing of pointer 4, through the dividing plate 16 that different quantities is set in framework, plated film when realizing a plurality of substrate.
The axle 12 that angle stop block 3 passes the substrate movements and postures of actors 2 one ends is fixed therein on the support for rotary disc 14; Pointer 4 is installed in axle 12 the through hole of the substrate movements and postures of actors 2 one ends; Be positioned at the centermost of 2 of the substrate movements and postures of actors, rotating pointer 4 just can drive the rotation of the substrate movements and postures of actors 2, thereby can handle substrate.Shift fork 5 is installed in the end of shifting fork bar 10; Offer two pairs of grooves that hold pointer 4 on the shift fork 5; Select wherein a pair of groove to realize the change of angle between the evaporation source in the substrate and coating equipment in the vacuum state subtegulum movements and postures of actors 2, select the upset of substrate coating crystal face in the other a pair of groove realization vacuum state subtegulum movements and postures of actors 2.
Be illustrated in figure 4 as angle stop block synoptic diagram in the substrate turning device of the present invention; Can know that by figure angle stop block 3 upper edge X rotational symmetry are provided with two blocks 15; The X axle is the medullary ray of angle stop block 3; The angle of inclination of substrate and evaporation source is the edge of block 15 and the angle of X axle; Arbitrary value between desirable 0 °～90 ° of the angle
is generally 30 °-60 °.Change the angle of inclination if desired, only need the angle of change block 15 and horizontal X axle.
Be illustrated in figure 5 as shift fork synoptic diagram in the substrate turning device of the present invention; Can know that by figure two pairs of grooves that shift fork 5 is offered are respectively a pair of U type groove and pair of L type groove; Wherein pointer 4 inserts and realizes the change of angle between the evaporation source in the substrate and coating equipment in the vacuum state subtegulum movements and postures of actors 2 in a pair of U type groove, promptly realizes the change of substrate coating direction in the substrate movements and postures of actors 2; Pointer 4 inserts the upset that realizes substrate coating crystal face in the vacuum state subtegulum movements and postures of actors 2 in the pair of L type groove, promptly realizes the change of substrate coating crystal face in the substrate movements and postures of actors 2.Shift fork 5 is installed in shifting fork bar 10 ends, cooperates with pointer 4 substrate is operated, referring to Fig. 2.
Be illustrated in figure 1 as substrate turning device film plating substrate element sketch of the present invention; Element shown in Figure 1 is the work in-process element that a certain substrate process semi-conductor or MEMS prepared go out; In the time need carrying out plated film to the sidewall of element; The rete at A as shown in the figure, B, C place need be tilted in substrate and carry out plated film on the evaporation source, and the direction that when accomplishing the plated film at A place, need change substrate could be accomplished the plated film of B place rete.The rete plated film at C place just needs upset substrate wafer surface rear-inclined substrate to accomplish, and substrate turning device of the present invention is to be used for above-described substrate is carried out multi-direction, polycrystalline face plated film.
It is following that substrate turning device of the present invention is used to change the operation of substrate coating direction:
Be placed on substrate on the substrate movements and postures of actors 2; Close the coating equipment chamber, after vacuum filming equipment state satisfies, carry out the plated film (A place plated film among Fig. 1) of a direction of substrate, when after plated film is accomplished, needing change substrate direction; Rotary turnplate 1 rotates to the substrate movements and postures of actors 2 over against view port position 7.Advance shifting fork bar 10 or compress bellows 8; Make the U type mouth of shift fork 5 insert the pointer 4 on 2 of the substrate movements and postures of actors; Rotation shifting fork bar 10 handles, promptly rotary indicator 4, when pointer is screwed into next block 15 places; Just accomplish the change of the substrate coating direction of substrate movements and postures of actors, thereby realize B place plated film among Fig. 1.Move corrugated tube 8; Make shift fork 5 not influence the next substrate movements and postures of actors 2 and rotate to the view port position, when another substrate movements and postures of actors 2 rotate to shift fork 5 co-located, repeat above operation; Just can accomplish the direction change of all substrates in the whole chamber by that analogy, continue plated film then.
Operation when substrate turning device of the present invention is used to change the substrate coating crystal face is following:
When the rotary substrate movements and postures of actors 2 and shift fork 5 co-located, advance shifting fork bar 10 or compress bellows 8, the L type groove of shift fork 5 and pointer 4 are combined; Pulling pointer 4 when pulling out pointer 4 block 15 control regional, rotates shifting fork bar 10; The substrate movements and postures of actors 2 are along with rotation, when observe substrate accomplish change face after, advance shifting fork bar 10 or compress bellows 8 to be reapposed over block 15 control areas to pointer 4; Shift fork 5 unclamps pointer 4, accomplishes substrate and changes face, realizes the plated film at C place among Fig. 1.More than operation can be confirmed entire operation process and operating result through view port.
Substrate turning device of the present invention is a hand gear, is the upset of accomplishing substrate through outdoor corrugated tube of operating cavity 8 and the pointer 4 in shifting fork bar 10 and the chamber.The outer corrugated tube 8 of chamber can be compressed and stretch; Shifting fork bar 10 can advance, retreats, rotatablely move, and shift fork 5 is fixed on an end of shifting fork bar 10, as long as after shift fork 5 is combined with pointer 4; Just can operate corrugated tube 8 and shifting fork bar 10, substrate is rotated operation.Corrugated tube 8 assembles through the dynamic seal mode with shifting fork bar 10, guarantees that shifting fork bar 10 does not influence the vacuum tightness of chamber in moving process.
The above; Be merely the best embodiment of the present invention, but protection scope of the present invention is not limited thereto, any technician who is familiar with the present technique field is in the technical scope that the present invention discloses; The variation that can expect easily or replacement all should be encompassed within protection scope of the present invention.
The content of not doing to describe in detail in the specification sheets of the present invention belongs to this area professional and technical personnel's known technology.
Claims (5)
1. a vacuum plating unit is used the substrate turning device; It is characterized in that: comprise the substrate movements and postures of actors (2), angle stop block (3), pointer (4), shift fork (5), window gland (6), corrugated tube (8), corrugated tube interface (9) and shifting fork bar (10); Wherein two supports (11,14) of passing respectively on the coating equipment rotating disk (1) of the axle (12,13) at the substrate movements and postures of actors (2) two ends are fixed on the coating equipment rotating disk (1); The axle (12) that angle stop block (3) passes the substrate movements and postures of actors (2) one ends is fixed therein on the support (14); Pointer (4) is installed on the axle (12) of the substrate movements and postures of actors (2) one ends; Shift fork (5) is installed in the end of shifting fork bar (10), offers two pairs of grooves that hold pointer (4) on the shift fork (5), selects wherein a pair of groove to realize the change of angle between the evaporation source in middle substrate of the substrate movements and postures of actors (2) and the coating equipment; Select other a pair of groove to realize the upset of substrate coating crystal face in the substrate movements and postures of actors (2); Window gland (6) is installed on the coating equipment chamber door, and corrugated tube (8) one ends are welded on the window gland (6), and the other end and shifting fork bar (10) are realized the dynamic seal assembling through corrugated tube interface (9).
2. a kind of vacuum plating unit according to claim 1 is used the substrate turning device, it is characterized in that: said window gland (6) is provided with window glass (7), is used to observe the operational circumstances of shift fork (5) to the substrate movements and postures of actors (2).
3. a kind of vacuum plating unit according to claim 1 is used the substrate turning device; It is characterized in that: be symmetrically arranged with two blocks (15) on the said angle stop block (3), wherein the angle
of the last X axle of the edge of block (15) and angle stop block (3) is 30-60 °.
4. a kind of vacuum plating unit according to claim 1 is used the substrate turning device; It is characterized in that: two pairs of grooves offering on the said shift fork (5) are respectively a pair of U type groove and pair of L type groove; Wherein pointer (4) inserts and realizes the change of angle between the evaporation source in substrate and the coating equipment in a pair of U type groove, and pointer (4) inserts the upset that realizes the substrate coating crystal face in the pair of L type groove.
5. a kind of vacuum plating unit according to claim 1 is used the substrate turning device; It is characterized in that: the said substrate movements and postures of actors (2) are skeleton construction; Axle (12,13) is symmetricly set on the skeleton construction two ends; Through the dividing plate (16) that different quantities is set in framework, plated film when realizing a plurality of substrate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201210120266 CN102644058B (en) | 2012-04-23 | 2012-04-23 | Substrate overturning device for vacuum coating equipment |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201210120266 CN102644058B (en) | 2012-04-23 | 2012-04-23 | Substrate overturning device for vacuum coating equipment |
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| CN102644058A true CN102644058A (en) | 2012-08-22 |
| CN102644058B CN102644058B (en) | 2013-10-16 |
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| CN 201210120266 Active CN102644058B (en) | 2012-04-23 | 2012-04-23 | Substrate overturning device for vacuum coating equipment |
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Cited By (7)
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| CN104498888B (en) * | 2014-11-06 | 2017-04-05 | 深圳市纳为金属技术有限公司 | The automatic turning structure and method of monomer vacuum coating equipment pivoted frame slide glass |
| CN107313001A (en) * | 2017-08-18 | 2017-11-03 | 上海克来机电自动化工程股份有限公司 | A kind of turning device |
| CN107841726A (en) * | 2017-12-21 | 2018-03-27 | 北京铂阳顶荣光伏科技有限公司 | Full-automatic coating machine |
| CN108342710A (en) * | 2018-04-02 | 2018-07-31 | 杭州赛威斯真空技术有限公司 | A kind of sample stage for vacuum coater |
| CN111501001A (en) * | 2020-05-22 | 2020-08-07 | 无锡奥夫特光学技术有限公司 | Film coating device for irregular polyhedron one-furnace method film coating |
| CN112725757A (en) * | 2020-11-23 | 2021-04-30 | 苏州鼎利涂层有限公司 | Novel film coating device and film coating method capable of improving surface hardness |
| CN113584452A (en) * | 2021-07-26 | 2021-11-02 | 深圳天成真空技术有限公司 | Multi-angle turnover equipment and method for vacuum coating product |
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| CN112725757A (en) * | 2020-11-23 | 2021-04-30 | 苏州鼎利涂层有限公司 | Novel film coating device and film coating method capable of improving surface hardness |
| CN113584452A (en) * | 2021-07-26 | 2021-11-02 | 深圳天成真空技术有限公司 | Multi-angle turnover equipment and method for vacuum coating product |
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