CN102644058B - Substrate overturning device for vacuum coating equipment - Google Patents
Substrate overturning device for vacuum coating equipment Download PDFInfo
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- CN102644058B CN102644058B CN 201210120266 CN201210120266A CN102644058B CN 102644058 B CN102644058 B CN 102644058B CN 201210120266 CN201210120266 CN 201210120266 CN 201210120266 A CN201210120266 A CN 201210120266A CN 102644058 B CN102644058 B CN 102644058B
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Abstract
The invention relates to a substrate overturning device for vacuum coating equipment, which comprises a rotary table, a substrate work rack, an angle stopper, a pointer, a shifting fork, a window gland, a corrugated tube, a corrugated tube joint and a shifting fork rod. The substrate work rack, the angle stopper and the pointer are assembled together and are mounted on the rotary table, the window gland, window glass, the corrugated tube, the corrugated tube joint, the shifting fork and the shifting fork rod are assembled together, the window gland is connected with a coating machine, and therotating angle of a substrate is changed and overturning of a crystal surface of the substrate are finished in a vacuum state by means of operating the shifting fork rod, the corrugated tube and the pointer. The substrate overturning device is a manual operator, can be used for coating the substrate by physical vapor deposition methods including sputtering, heat evaporation and the like, when repeated substrate coating at the determined angle is needed, the angle of the substrate can be changed precisely by the device, so that multidirectional substrate coating can be finished by once vacuumizing, production efficiency is improved, working procedure time is shortened, and further the quality of films is improved.
Description
Technical field
The present invention relates to a kind of substrate turning device during for vacuum plating, be specifically related to a kind of manual substrate turning device of under vacuum state, the substrate coating direction being changed, belong to material technology and device technology field.
Background technology
The vacuum film formation technology is widely used in the fields such as optics, electronics, energy development, building machinery, Surface Science and scientific research now; vacuum plating more occupies very consequence aspect electronics, for example prepares now the vacuum plating commonly used of micromechanics (MEMS) device and prepares conducting film, insulating film and protective membrane., except substrate is carried out the uniform coated of two sides, sometimes need carry out plated film multi-direction, the polycrystalline face to substrate when utilizing vacuum plating to prepare the MEMS device actual.As adopt the vacuum plating mode to prepare the decline electrode of mechanical gyro of quartz tuning-fork, because quartzy piezoelectric properties, the sidewall surfaces of responsive tuning fork need prepare parallel layered electrode.Adopt the hole mask to prepare the angle that electrode just needs to adjust tuning fork side and coating materials molecule incident direction, make the tuning fork side form the membrane electrode of continuous uniform.Because the polarity of electrode that picks up on the yoke side of tuning fork is opposite, so also need change the electrode preparation that direction is carried out opposite side after finishing a side plated film of tuning fork, the electrode preparation of whole tuning fork needs repeatedly wafer to be carried out above-described angle evaporation, and each orientation angle must be accurately consistent.
More commonly realize 360 ° or 180 ° of uniform coateds of substrate in the vacuum coater, when needs carry out 0 °～90 ° plated films that tilt at any angle to substrate, and when needing to carry out repeatedly angle change plated film to substrate, if there is not the substrate turning device, when finishing a direction plated film, need to wait for the coating equipment cooling, change substrate direction again vacuumizes and carries out plated film after the inflation.This preparation method production efficiency is low, nor is beneficial to film quality control.
Summary of the invention
The object of the invention is to overcome the defects of prior art, the substrate turning device that provides a kind of vacuum plating unit to use, this device is hand-operating device, be used for the physical gas-phase deposite methods such as sputter, thermal evaporation substrate is carried out plated film, not only enhance productivity, reduce activity time, and can improve film quality.
Above-mentioned purpose of the present invention mainly is achieved by following technical solution:
A kind of vacuum plating unit substrate turning device, comprise the substrate movements and postures of actors, the angle stop block, pointer, shift fork, the window gland, corrugated tube, corrugated tube interface and shifting fork bar, wherein two supports passing respectively on the coating equipment rotating disk of the axle at substrate movements and postures of actors two ends are fixed on the coating equipment rotating disk, the axle of the angle stop block passing through substrate movements and postures of actors one end is fixed therein on the support, pointer is installed on the axle of the substrate movements and postures of actors one end, shift fork is installed in the end of shifting fork bar, offer two pairs of grooves that hold pointer on the shift fork, select a pair of groove wherein to realize the change of angle between the evaporation source in the substrate and coating equipment in the substrate movements and postures of actors, select other a pair of groove to realize the upset of substrate coating crystal face in the substrate movements and postures of actors, the window gland is installed on the coating equipment chamber door, corrugated tube one end is welded on the window gland, and the other end and shifting fork bar are by corrugated tube Interface realization dynamic seal assembling.
Use in the substrate turning device at above-mentioned vacuum plating unit, be provided with window glass on the window gland, be used for observing shift fork to the operational circumstances of the substrate movements and postures of actors.
Use in the substrate turning device at above-mentioned vacuum plating unit, be symmetrically arranged with two blocks on the angle stop block, wherein the angle of X-axis on the edge of block and the angle stop block
Be 30-60 °.
Use in the substrate turning device at above-mentioned vacuum plating unit, two pairs of grooves offering on the shift fork are respectively a pair of U-shaped groove and pair of L type groove, its pointer inserts realizes the change of angle between the evaporation source in substrate and the coating equipment in a pair of U-shaped groove, pointer inserts the upset that realizes the substrate coating crystal face in the pair of L type groove.
Above-mentioned vacuum plating unit with the substrate turning device in, the substrate movements and postures of actors are skeleton construction, rotational symmetry is arranged on the skeleton construction two ends, by the dividing plate of different quantities is set in framework, plated film when realizing a plurality of substrate.
The present invention compared with prior art has following beneficial effect:
(1) substrate turning device of the present invention adopts innovative structure design, can carry out accurate angle change to substrate, satisfy the substrate needs and determined the repeatedly plated film requirement of angle, make substrate only need once vacuumize the multi-direction plated film that just can finish substrate, not only enhance productivity, reduce activity time, and can improve film quality;
(2) offer two pairs of grooves on the shift fork in the substrate turning device of the present invention, realize respectively the rotation of vacuum state subtegulum angle and the upset of substrate wafer surface, to satisfy the requirement of the multi-direction multiaspect plated film of substrate, two pairs of grooves are preferably L shaped groove and U-shaped groove;
(3) substrate turning device of the present invention is installed on the chamber door of coating equipment by the window gland, window gland and chamber door realize being tightly connected by sealing-ring, so that the substrate turning device is simple and compact for structure, can use not changing original Equipment Foundations, do not take cavity space;
(4) substrate turning device of the present invention does not have automatic control section, there is not the realization that is subjected to storing temperature and vacuum tightness and affects function, confirm that angle indicator rotates to the block place and just can guarantee the accurate of angle as long as observe, avoided causing process failure with gear driven substrate upset mode because machine is slipped up, greatly improved the reliability of substrate coating;
(5) substrate turning device of the present invention is hand-operating device, can be used for the physical gas-phase deposite methods such as sputter, thermal evaporation substrate is carried out plated film, has wider Application Areas and stronger practicality.
Description of drawings
Fig. 1 is substrate turning device film plating substrate element sketch of the present invention;
Fig. 2 is substrate turning device structural representation of the present invention;
Fig. 3 is substrate movements and postures of actors structural representation in the substrate turning device of the present invention;
Fig. 4 is angle stop block schematic diagram in the substrate turning device of the present invention;
Fig. 5 is shift fork schematic diagram in the substrate turning device of the present invention.
Embodiment
The present invention is further detailed explanation below in conjunction with the drawings and specific embodiments:
Be illustrated in figure 2 as substrate turning device structural representation of the present invention, substrate turning device of the present invention comprises the substrate movements and postures of actors 2, angle stop block 3, pointer 4, shift fork 5, window gland 6, window glass 7, corrugated tube 8, corrugated tube interface 9 and shifting fork bar 10 as seen from the figure.Rotating disk 1 is installed in coating equipment chamber top, and the rotary electric machine outer with chamber links to each other, and this driven by motor rotating disk 1 rotates in coating equipment.The substrate movements and postures of actors 2, angle stop block 3 are installed on the rotating disk 1 with pointer 4, shift fork 5, window glass 7, window gland 6, corrugated tube 8, corrugated tube interface 9 are transferred on shifting fork bar 10, be installed on the chamber door of coating equipment, shifting fork bar 10 is the outer moving parts of chamber with corrugated tube 8.
Two supports 11,14 that the axle 12,13 at the substrate movements and postures of actors 2 two ends passes respectively on the coating equipment rotating disk 1 are fixed on the coating equipment rotating disk 1, be illustrated in figure 3 as substrate movements and postures of actors structural representation in the substrate turning device of the present invention, the substrate movements and postures of actors 2 are skeleton construction as seen from the figure, axle 12,13 is symmetricly set on the skeleton construction two ends, offer through hole on its axis 12, be used for passing of pointer 4, by the dividing plate 16 that different quantities is set in framework, plated film when realizing a plurality of substrate.
The axle 12 of the angle stop block 3 passing through substrate movements and postures of actors 2 one ends is fixed therein on the support for rotary disc 14, pointer 4 is installed in the through hole of axle 12 of the substrate movements and postures of actors 2 one ends, be positioned at the center of the substrate movements and postures of actors 2 axles, rotating pointer 4 just can drive the rotation of the substrate movements and postures of actors 2, thereby can handle substrate.Shift fork 5 is installed in the end of shifting fork bar 10, offer two pairs of grooves that hold pointer 4 on the shift fork 5, select a pair of groove wherein to realize the change of angle between the evaporation source in the substrate and coating equipment in the vacuum state subtegulum movements and postures of actors 2, select the upset of substrate coating crystal face in the other a pair of groove realization vacuum state subtegulum movements and postures of actors 2.
Be illustrated in figure 4 as angle stop block schematic diagram in the substrate turning device of the present invention, be symmetrically arranged with two blocks 15 along X-axis on the angle stop block 3 as seen from the figure, X-axis is the medullary ray of angle stop block 3, and the angle of inclination of substrate and evaporation source is the edge of block 15 and the angle of X-axis, angle
Arbitrary value between desirable 0 °～90 ° is generally 30 °-60 °.If need to change the angle of inclination, only need the angle of change block 15 and horizontal X axle.
Be illustrated in figure 5 as shift fork schematic diagram in the substrate turning device of the present invention, two pairs of grooves offering of shift fork 5 are respectively a pair of U-shaped groove and pair of L type groove as seen from the figure, its pointer 4 inserts realizes the change of angle between the evaporation source in the substrate and coating equipment in the vacuum state subtegulum movements and postures of actors 2 in a pair of U-shaped groove, namely realize the change of substrate coating direction in the substrate movements and postures of actors 2; Pointer 4 inserts the upset that realizes substrate coating crystal face in the vacuum state subtegulum movements and postures of actors 2 in the pair of L type groove, namely realizes the change of substrate coating crystal face in the substrate movements and postures of actors 2.Shift fork 5 is installed in shifting fork bar 10 ends, cooperates with pointer 4 substrate is operated, referring to Fig. 2.
Be illustrated in figure 1 as substrate turning device film plating substrate element sketch of the present invention, element shown in Figure 1 is the work in-process element that a certain substrate process semi-conductor or MEMS technique are prepared, in the time need to carrying out plated film to the sidewall of element, the rete at A as shown in the figure, B, C place, need to be tilted in substrate and carry out plated film on the evaporation source, the direction that need to change substrate when finishing the plated film at A place just can be finished the plated film of B place rete.The rete plated film at C place just needs upset substrate wafer surface rear-inclined substrate just can finish, and substrate turning device of the present invention is for above-described substrate being carried out multi-direction, polycrystalline face plated film.
Substrate turning device of the present invention is as follows for the operation of change substrate coating direction:
Substrate is placed on the substrate movements and postures of actors 2, close the coating equipment chamber, after satisfying, vacuum filming equipment state carries out the plated film (A place plated film among Fig. 1) of a direction of substrate, when after plated film is finished, needing to change the substrate direction, rotary turnplate 1 rotates to the substrate movements and postures of actors 2 over against view port position 7.Advance shifting fork bar 10 or compress bellows 8, make U-shaped mouthful of pointer 4 that inserts on the substrate movements and postures of actors 2 axles of shift fork 5, rotation shifting fork bar 10 handles, it is rotary indicator 4, when pointer is screwed into next block 15 place, just finish the change of the substrate coating direction of substrate movements and postures of actors, thereby realize B place plated film among Fig. 1.Mobile corrugated tube 8, make shift fork 5 not affect the next substrate movements and postures of actors 2 and rotate to the view port position, when another substrate movements and postures of actors 2 rotate to shift fork 5 co-located, repeat above operation, just can finish by that analogy the direction change of all substrates in the whole chamber, then continue plated film.
Operation when substrate turning device of the present invention is used for change substrate coating crystal face is as follows:
When the rotary substrate movements and postures of actors 2 and shift fork 5 co-located, advance shifting fork bar 10 or compress bellows 8, the L-type groove of shift fork 5 and pointer 4 are combined, pulling pointer 4, when pointer 4 being pulled out block 15 control regional, rotation shifting fork bar 10, the substrate movements and postures of actors 2 are along with rotation, after observing substrate and finishing the face of changing, advance shifting fork bar 10 or compress bellows 8 that pointer 4 is reapposed over block 15 control areas, shift fork 5 unclamps pointer 4, finishes substrate and changes face, realizes the plated film at C place among Fig. 1.Above operation can be confirmed whole operating process and operating result by view port.
Substrate turning device of the present invention is hand gear, is the upset of finishing substrate by the outdoor corrugated tube of operating cavity 8 and the pointer 4 in shifting fork bar 10 and the chamber.The outer corrugated tube 8 of chamber can be compressed with stretch, shifting fork bar 10 can advance, retreats, rotatablely move, and shift fork 5 is fixed on an end of shifting fork bar 10, as long as after shift fork 5 is combined with pointer 4, just can operate corrugated tube 8 and shifting fork bar 10, substrate is rotated operation.Corrugated tube 8 assembles by the dynamic seal mode with shifting fork bar 10, guarantees that shifting fork bar 10 does not affect the vacuum tightness of chamber in moving process.
The above; only be the embodiment of the best of the present invention, but protection scope of the present invention is not limited to this, anyly is familiar with those skilled in the art in the technical scope that the present invention discloses; the variation that can expect easily or replacement all should be encompassed within protection scope of the present invention.
The content that is not described in detail in the specification sheets of the present invention belongs to this area professional and technical personnel's known technology.
Claims (3)
1. vacuum plating unit substrate turning device, it is characterized in that: comprise the substrate movements and postures of actors (2), angle stop block (3), pointer (4), shift fork (5), window gland (6), corrugated tube (8), corrugated tube interface (9) and shifting fork bar (10), the axle (12 at the substrate movements and postures of actors (2) two ends wherein, 13) pass respectively two supports (11 on the coating equipment rotating disk (1), 14) be fixed on the coating equipment rotating disk (1), the axle (12) of angle stop block (3) the passing through substrate movements and postures of actors (2) one ends is fixed therein on the support (14), be symmetrically arranged with two blocks (15) on the described angle stop block (3), wherein the angle of the upper X-axis of the edge of block (15) and angle stop block (3)
Be 30-60 °; Pointer (4) is installed on the axle (12) of the substrate movements and postures of actors (2) one ends, shift fork (5) is installed in the end of shifting fork bar (10), offer two pairs of grooves that hold pointer (4) on the shift fork (5), be respectively a pair of U-shaped groove and pair of L type groove, its pointer (4) inserts and realizes the change of angle between the evaporation source in the middle substrate of the substrate movements and postures of actors (2) and the coating equipment in a pair of U-shaped groove, pointer (4) inserts the upset that realizes substrate coating crystal face in the substrate movements and postures of actors (2) in the pair of L type groove, window gland (6) is installed on the coating equipment chamber door, corrugated tube (8) one ends are welded on the window gland (6), and the other end and shifting fork bar (10) are realized the dynamic seal assembling by corrugated tube interface (9).
2. a kind of vacuum plating unit substrate turning device according to claim 1 is characterized in that: be provided with window glass (7) on the described window gland (6), be used for observing shift fork (5) to the operational circumstances of the substrate movements and postures of actors (2).
3. a kind of vacuum plating unit substrate turning device according to claim 1, it is characterized in that: the described substrate movements and postures of actors (2) are skeleton construction, axle (12,13) is symmetricly set on the skeleton construction two ends, by the dividing plate (16) that different quantities is set in framework, plated film when realizing a plurality of substrate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
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| CN 201210120266 CN102644058B (en) | 2012-04-23 | 2012-04-23 | Substrate overturning device for vacuum coating equipment |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201210120266 CN102644058B (en) | 2012-04-23 | 2012-04-23 | Substrate overturning device for vacuum coating equipment |
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| CN102644058A CN102644058A (en) | 2012-08-22 |
| CN102644058B true CN102644058B (en) | 2013-10-16 |
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Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN104498888B (en) * | 2014-11-06 | 2017-04-05 | 深圳市纳为金属技术有限公司 | The automatic turning structure and method of monomer vacuum coating equipment pivoted frame slide glass |
| CN107313001B (en) * | 2017-08-18 | 2019-03-01 | 上海克来机电自动化工程股份有限公司 | A kind of turnover device |
| CN107841726B (en) * | 2017-12-21 | 2022-07-01 | 上海祖强能源有限公司 | Full-automatic film coating machine |
| CN108342710B (en) * | 2018-04-02 | 2023-10-27 | 杭州赛威斯真空技术有限公司 | Sample table for vacuum coating device |
| CN111501001B (en) * | 2020-05-22 | 2022-05-06 | 无锡奥夫特光学技术有限公司 | Film coating device for irregular polyhedron one-furnace method film coating |
| CN112725757A (en) * | 2020-11-23 | 2021-04-30 | 苏州鼎利涂层有限公司 | Novel film coating device and film coating method capable of improving surface hardness |
| CN113584452A (en) * | 2021-07-26 | 2021-11-02 | 深圳天成真空技术有限公司 | Multi-angle turnover equipment and method for vacuum coating product |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN200981891Y (en) * | 2006-08-28 | 2007-11-28 | 深圳豪威真空光电子股份有限公司 | Substrate frame film coating device |
| DE102006041137B4 (en) * | 2006-09-01 | 2015-02-12 | Carl Zeiss Vision Gmbh | Apparatus for turning an article in a vacuum coating machine, method of turning an article in a vacuum coating machine, and use thereof |
| CN101295033B (en) * | 2007-04-27 | 2010-06-09 | 鸿富锦精密工业（深圳）有限公司 | Turning tools and method |
| CN101899648A (en) * | 2009-05-28 | 2010-12-01 | 富士能株式会社 | Workpiece roll-over unit, vacuum film formation apparatus and workpiece assembly unit |
| CN201570491U (en) * | 2009-09-30 | 2010-09-01 | 东莞宏威数码机械有限公司 | Overturn structure |
| CN101692431B (en) * | 2009-09-30 | 2011-01-19 | 东莞宏威数码机械有限公司 | Turning device |
| CN201778107U (en) * | 2010-05-25 | 2011-03-30 | 东莞宏威数码机械有限公司 | Coated substrate preprocessing device |
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