CN102612641B - 真空质量测量系统 - Google Patents

真空质量测量系统 Download PDF

Info

Publication number
CN102612641B
CN102612641B CN201080050648.XA CN201080050648A CN102612641B CN 102612641 B CN102612641 B CN 102612641B CN 201080050648 A CN201080050648 A CN 201080050648A CN 102612641 B CN102612641 B CN 102612641B
Authority
CN
China
Prior art keywords
vacuum chamber
described vacuum
gas
sensor
methods according
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN201080050648.XA
Other languages
English (en)
Chinese (zh)
Other versions
CN102612641A (zh
Inventor
葛拉多·A·布鲁克尔
小肯尼斯·D·凡安特卫普
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
MKS Instruments Inc
Original Assignee
MKS Instruments Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by MKS Instruments Inc filed Critical MKS Instruments Inc
Publication of CN102612641A publication Critical patent/CN102612641A/zh
Application granted granted Critical
Publication of CN102612641B publication Critical patent/CN102612641B/zh
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
    • G01L21/00—Vacuum gauges
    • G01L21/02—Vacuum gauges having a compression chamber in which gas, whose pressure is to be measured, is compressed
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M3/00—Investigating fluid-tightness of structures
    • G01M3/02—Investigating fluid-tightness of structures by using fluid or vacuum
    • G01M3/04—Investigating fluid-tightness of structures by using fluid or vacuum by detecting the presence of fluid at the leakage point
    • G01M3/20—Investigating fluid-tightness of structures by using fluid or vacuum by detecting the presence of fluid at the leakage point using special tracer materials, e.g. dye, fluorescent material, radioactive material
    • G01M3/22—Investigating fluid-tightness of structures by using fluid or vacuum by detecting the presence of fluid at the leakage point using special tracer materials, e.g. dye, fluorescent material, radioactive material for pipes, cables or tubes; for pipe joints or seals; for valves; for welds; for containers, e.g. radiators
    • G01M3/226—Investigating fluid-tightness of structures by using fluid or vacuum by detecting the presence of fluid at the leakage point using special tracer materials, e.g. dye, fluorescent material, radioactive material for pipes, cables or tubes; for pipe joints or seals; for valves; for welds; for containers, e.g. radiators for containers, e.g. radiators
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/28—Investigating the spectrum
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M3/00—Investigating fluid-tightness of structures
    • G01M3/02—Investigating fluid-tightness of structures by using fluid or vacuum
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M3/00—Investigating fluid-tightness of structures
    • G01M3/02—Investigating fluid-tightness of structures by using fluid or vacuum
    • G01M3/04—Investigating fluid-tightness of structures by using fluid or vacuum by detecting the presence of fluid at the leakage point
    • G01M3/20—Investigating fluid-tightness of structures by using fluid or vacuum by detecting the presence of fluid at the leakage point using special tracer materials, e.g. dye, fluorescent material, radioactive material
    • G01M3/202—Investigating fluid-tightness of structures by using fluid or vacuum by detecting the presence of fluid at the leakage point using special tracer materials, e.g. dye, fluorescent material, radioactive material using mass spectrometer detection systems
    • G01M3/205—Accessories or associated equipment; Pump constructions
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M3/00—Investigating fluid-tightness of structures
    • G01M3/02—Investigating fluid-tightness of structures by using fluid or vacuum
    • G01M3/04—Investigating fluid-tightness of structures by using fluid or vacuum by detecting the presence of fluid at the leakage point
    • G01M3/20—Investigating fluid-tightness of structures by using fluid or vacuum by detecting the presence of fluid at the leakage point using special tracer materials, e.g. dye, fluorescent material, radioactive material
    • G01M3/22—Investigating fluid-tightness of structures by using fluid or vacuum by detecting the presence of fluid at the leakage point using special tracer materials, e.g. dye, fluorescent material, radioactive material for pipes, cables or tubes; for pipe joints or seals; for valves; for welds; for containers, e.g. radiators
    • G01M3/226—Investigating fluid-tightness of structures by using fluid or vacuum by detecting the presence of fluid at the leakage point using special tracer materials, e.g. dye, fluorescent material, radioactive material for pipes, cables or tubes; for pipe joints or seals; for valves; for welds; for containers, e.g. radiators for containers, e.g. radiators
    • G01M3/229—Investigating fluid-tightness of structures by using fluid or vacuum by detecting the presence of fluid at the leakage point using special tracer materials, e.g. dye, fluorescent material, radioactive material for pipes, cables or tubes; for pipe joints or seals; for valves; for welds; for containers, e.g. radiators for containers, e.g. radiators removably mounted in a test cell
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M3/00—Investigating fluid-tightness of structures
    • G01M3/02—Investigating fluid-tightness of structures by using fluid or vacuum
    • G01M3/26—Investigating fluid-tightness of structures by using fluid or vacuum by measuring rate of loss or gain of fluid, e.g. by pressure-responsive devices, by flow detectors
    • G01M3/32—Investigating fluid-tightness of structures by using fluid or vacuum by measuring rate of loss or gain of fluid, e.g. by pressure-responsive devices, by flow detectors for containers, e.g. radiators
    • G01M3/34—Investigating fluid-tightness of structures by using fluid or vacuum by measuring rate of loss or gain of fluid, e.g. by pressure-responsive devices, by flow detectors for containers, e.g. radiators by testing the possibility of maintaining the vacuum in containers, e.g. in can-testing machines
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
  • Examining Or Testing Airtightness (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
CN201080050648.XA 2009-11-09 2010-11-08 真空质量测量系统 Expired - Fee Related CN102612641B (zh)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US28082509P 2009-11-09 2009-11-09
US61/280,825 2009-11-09
US32499210P 2010-04-16 2010-04-16
US61/324,992 2010-04-16
PCT/US2010/055852 WO2011057201A2 (en) 2009-11-09 2010-11-08 Vacuum quality measurement system

Publications (2)

Publication Number Publication Date
CN102612641A CN102612641A (zh) 2012-07-25
CN102612641B true CN102612641B (zh) 2015-01-14

Family

ID=43970810

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201080050648.XA Expired - Fee Related CN102612641B (zh) 2009-11-09 2010-11-08 真空质量测量系统

Country Status (6)

Country Link
US (1) US9322738B2 (https=)
EP (1) EP2499476A4 (https=)
JP (2) JP5756810B2 (https=)
KR (1) KR101824560B1 (https=)
CN (1) CN102612641B (https=)
WO (1) WO2011057201A2 (https=)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2994736B1 (de) * 2013-05-07 2019-07-10 Lüdolph Management GmbH Dichtheitsprüfanordnung und dichtheitsprüfverfahren
CN104576289B (zh) * 2014-12-31 2017-08-25 聚光科技(杭州)股份有限公司 一种可调真空压力的电感耦合等离子体质谱仪
US10217621B2 (en) * 2017-07-18 2019-02-26 Applied Materials Israel Ltd. Cleanliness monitor and a method for monitoring a cleanliness of a vacuum chamber
CN108760867B (zh) * 2018-03-13 2020-10-09 上海科技大学 Uhv设备互联的原位反应池与内置质谱电四极杆的联用结构
CN112082692B (zh) * 2020-08-05 2021-10-15 国网浙江省电力有限公司嘉兴供电公司 一种抽真空作业真空度实时监测装置
US11747233B2 (en) * 2020-09-28 2023-09-05 Agilent Technologies, Inc. Gas leak detector cartridge
US11635338B2 (en) * 2020-10-23 2023-04-25 Applied Materials, Inc. Rapid chamber vacuum leak check hardware and maintenance routine
CN113457397B (zh) * 2021-07-23 2022-12-27 北京科思研环保技术有限公司 基于低温等离子净化的工业废气处理系统
CN114115108B (zh) * 2021-11-26 2023-11-21 西北有色金属研究院 电子束熔炼炉双输入控制系统与单输出真空计的连接方法
CN115308291B (zh) * 2022-08-09 2023-06-13 中国科学院合肥物质科学研究院 一种低温泵用低温板性能测试装置

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0238297A2 (en) * 1986-03-20 1987-09-23 Seiko Instruments Inc. Gas pressure gauge
CN1689136A (zh) * 2002-08-29 2005-10-26 西门子能量及自动化公司 使用ftms执行定量分析的方法、系统与装置
CN1689135A (zh) * 2002-08-29 2005-10-26 西门子能量及自动化公司 优化ftms变量的方法、系统与装置
CN2757130Y (zh) * 2004-12-08 2006-02-08 上海永新彩色显像管股份有限公司 彩色显像管残余气体分析设备
CN1786704A (zh) * 2004-12-08 2006-06-14 上海永新彩色显像管股份有限公司 彩色显像管扫屏放气性能的测试方法

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3085913A (en) * 1960-10-03 1963-04-16 Ibm Vacuum evaporation method
US3762212A (en) 1971-07-15 1973-10-02 Advanced Technologies Inc Leak testing apparatus and methods
JPS5811782A (ja) * 1981-07-13 1983-01-22 Oki Electric Ind Co Ltd 金属膜の形成方法
JPS61130485A (ja) 1984-11-28 1986-06-18 Mitsubishi Electric Corp 真空モニタ装置
JPH05215633A (ja) 1992-02-06 1993-08-24 Fujitsu Ltd 真空装置の監視装置及び監視方法
JPH0845856A (ja) * 1994-07-26 1996-02-16 Hitachi Ltd 減圧処理方法および装置
FI113805B (fi) * 1998-04-03 2004-06-15 Licentia Oy Menetelmä ja laite kaasuseosten analysoimiseksi
JP2002005806A (ja) * 2000-06-16 2002-01-09 Murata Mfg Co Ltd 圧力測定方法および放出ガス量測定方法
ES2165823B8 (es) * 2000-09-15 2014-06-05 Consejo Superior De Investigaciones Cientificas Procedimiento y dispositivo para medir la resistencia la hidruracion de tubos y vainas tubulares.
US7022992B2 (en) 2002-01-17 2006-04-04 American Air Liquide, Inc. Method and apparatus for real-time monitoring of furnace flue gases
US7223965B2 (en) 2002-08-29 2007-05-29 Siemens Energy & Automation, Inc. Method, system, and device for optimizing an FTMS variable
KR100588050B1 (ko) 2003-02-14 2006-06-09 박래준 진공관의 진공배기를 위한 진공배기장치 및 진공배기방법
JP5404984B2 (ja) * 2003-04-24 2014-02-05 東京エレクトロン株式会社 プラズマモニタリング方法、プラズマモニタリング装置及びプラズマ処理装置
DE10324596A1 (de) * 2003-05-30 2004-12-16 Inficon Gmbh Lecksuchgerät
US7531469B2 (en) 2004-10-23 2009-05-12 Applied Materials, Inc. Dosimetry using optical emission spectroscopy/residual gas analyzer in conjunction with ion current
US7313966B2 (en) 2004-12-14 2008-01-01 Brooks Automation, Inc. Method and apparatus for storing vacuum gauge calibration parameters and measurement data on a vacuum gauge structure
US7867779B2 (en) * 2005-02-03 2011-01-11 Air Products And Chemicals, Inc. System and method comprising same for measurement and/or analysis of particles in gas stream
US7289863B2 (en) * 2005-08-18 2007-10-30 Brooks Automation, Inc. System and method for electronic diagnostics of a process vacuum environment
JP4859423B2 (ja) * 2005-09-27 2012-01-25 三菱重工業株式会社 真空処理装置及びその不純物監視方法
FR2897434B1 (fr) * 2006-02-15 2014-07-11 Commissariat Energie Atomique Procede et dispositif de mesure de permeation
JP4958258B2 (ja) 2006-03-17 2012-06-20 株式会社リガク ガス分析装置
TWI484529B (zh) * 2006-11-13 2015-05-11 Mks Instr Inc 離子阱質譜儀、利用其得到質譜之方法、離子阱、捕捉離子阱內之離子之方法和設備

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0238297A2 (en) * 1986-03-20 1987-09-23 Seiko Instruments Inc. Gas pressure gauge
CN1689136A (zh) * 2002-08-29 2005-10-26 西门子能量及自动化公司 使用ftms执行定量分析的方法、系统与装置
CN1689135A (zh) * 2002-08-29 2005-10-26 西门子能量及自动化公司 优化ftms变量的方法、系统与装置
CN2757130Y (zh) * 2004-12-08 2006-02-08 上海永新彩色显像管股份有限公司 彩色显像管残余气体分析设备
CN1786704A (zh) * 2004-12-08 2006-06-14 上海永新彩色显像管股份有限公司 彩色显像管扫屏放气性能的测试方法

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
四极质谱气体分析装置;邱纯一等;《分析仪器》;19901231(第2期);摘要、第43页-46页及图1 *

Also Published As

Publication number Publication date
EP2499476A2 (en) 2012-09-19
US20120227465A1 (en) 2012-09-13
WO2011057201A3 (en) 2011-08-18
KR101824560B1 (ko) 2018-03-14
JP5756810B2 (ja) 2015-07-29
EP2499476A4 (en) 2017-07-26
WO2011057201A2 (en) 2011-05-12
KR20120091344A (ko) 2012-08-17
JP2013510323A (ja) 2013-03-21
JP6019173B2 (ja) 2016-11-02
JP2015172594A (ja) 2015-10-01
US9322738B2 (en) 2016-04-26
CN102612641A (zh) 2012-07-25

Similar Documents

Publication Publication Date Title
CN102612641B (zh) 真空质量测量系统
JP5778278B2 (ja) 容器を漏洩試験するための方法及び装置
US6985215B2 (en) Plasma processing method and plasma processing apparatus
US9153414B2 (en) Particle optical apparatus with a predetermined final vacuum pressure
EP0310210B1 (en) Measuring trace elements in gas
CN113933454B (zh) 极紫外光刻机材料检测装置及测试方法
Fedchak et al. Recommended practice for calibrating vacuum gauges of the ionization type
CN106814125A (zh) 一种材料辐射致放气的在线测试装置和测试方法
WO2021236379A1 (en) Cleanliness monitor and a method for monitoring a cleanliness of a vacuum chamber
KR101391822B1 (ko) 공정 모니터링이 가능한 기판 처리 장치 및 이를 이용한 공정 모니터링 방법
CN100549650C (zh) 泄漏率测量设备
Blessing et al. Recommended practice for process sampling for partial pressure analysis
JP4454519B2 (ja) 発光分光による少量気体種の検出
JP4221232B2 (ja) イオン付着を利用する質量分析装置および質量分析方法
KR102257270B1 (ko) 리크 체크 방법 및 처리 장치
JPH04122833A (ja) 漏れ試験方法および装置
JP5255974B2 (ja) 真空室内のガス成分測定方法、及び真空装置
JP4811341B2 (ja) ヘリウムリークディテクタおよびそのヘリウムリークディテクタに設けられた補正電極に印加する電圧の調整方法
JP2000097910A (ja) ガス分析方法
He et al. Measurement of total gas scattering cross‐section
Thomas Microcircuit package gas analysis
JP2004340726A (ja) 漏洩検知装置
Poppe et al. New methodology to baseline and match AME polysilicon etcher using advanced diagnostic tools
KR101939634B1 (ko) 플라즈마 반응기 벽면 상태 진단 방법
Mucha 3.7 LASER SPECTROMETRIC DETERMINATION OF MOISTURE

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
ASS Succession or assignment of patent right

Owner name: MKS INSTRUMENTS INC.

Free format text: FORMER OWNER: BROOKS AUTOMATION INC.

Effective date: 20141010

C41 Transfer of patent application or patent right or utility model
TA01 Transfer of patent application right

Effective date of registration: 20141010

Address after: Massachusetts, USA

Applicant after: MKS Instruments Inc.

Address before: Massachusetts, USA

Applicant before: Brooks Automation Inc.

C14 Grant of patent or utility model
GR01 Patent grant
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20150114

Termination date: 20201108

CF01 Termination of patent right due to non-payment of annual fee