CN102610691A - Method for manufacturing thin-film solar battery module and apparatus thereof - Google Patents
Method for manufacturing thin-film solar battery module and apparatus thereof Download PDFInfo
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- CN102610691A CN102610691A CN2011103047612A CN201110304761A CN102610691A CN 102610691 A CN102610691 A CN 102610691A CN 2011103047612 A CN2011103047612 A CN 2011103047612A CN 201110304761 A CN201110304761 A CN 201110304761A CN 102610691 A CN102610691 A CN 102610691A
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Abstract
The present invention relates to a solar production process and an apparatus thereof and especially relates to the thin-film solar technology based on a transparent conductive oxide glass as a substrate. The method for manufacturing a thin-film solar battery module comprises the steps of cleaning a transparent conducting oxide glass substrate; the transparent conductive oxide film being subjected to semiconductor coating film so as to form a semiconductor film; marking three lines P1, P2 and P3 on the semiconductor film and forming a first slot and a second slot correspondingly, and a preparatory layer for a third slot; performing the back electrode coating so as to form a back electrode film layer for the annealing treatment; removing the preparatory layer and the backside electrode material on the preparatory layer by using water or solvent so as to form a third slot on the back electrode film layer; removing edges, external conductors and laminating glue, clamping and packaging. The solar battery provided by the invention has the advantages of high effective area and conversion efficiency, simple preparation method and low cost.
Description
Technical field
The present invention relates to solar energy production technology and equipment, relating in particular to transparent conductive oxide glass is the thin film solar technology of substrate.
Background technology
Tradition is that the thin-film solar cells production technology of substrate comprises the steps: substrate cleaning, leading portion laser scribing (P1), light-absorption layer (semiconductor layer) plated film, light-absorption layer laser scribing (P2), back electrode plated film, back electrode laser scribing (P3), packaging and testing with the transparent conducting glass.
Laser scribing is widely used in the production of thin-film solar cells module. can on the monolithic substrate, form a plurality of batteries and series connection formation battery modules through using laser scribing. and traditional handicraft adopts laser scribing P1, P2 and P3 usually 3 times; Wherein P1 is used for the laser scribing of TCO; Carry out semiconductor coated film then; P2 carries out the laser scribing of semiconductor film then, back electrode plated film then, and P3 carries out back electrode laser scribing then.Traditional handicraft P1, P2 and P3 need a scoring equipment respectively, and need the increase cleaning step to remove the dust that the P1 line forms after the P1 line.
The patent US6559411 B2 of first Sunpower Corp. discloses a kind of equipment and method of laser scribing on the substrate of filming; Wherein mention and adopt laser scribing P1 to be placed on after the semiconductor coated film, but it still uses two scoring equipments to make laser scribing P1 and P2 respectively, and equipment of increase is filled the P1 groove between P1 and P2; Production cost is high; Substrate needs second positioning, and the dead band area is big, and effectively cell area is little.
The tradition plated film is generally the monobasal plated film, and production efficiency is low.If will carry out two-sided while plated film; Substrate then needs vertical transport; The vertical transport of prior art need be used substrate holder or manipulator (US2002/0078892; 2002-6-27) or frame design, the device of fixing base needs contact with the positive and negative of substrate simultaneously, and complex structure, cost are high, equipment maintenance cost increase, reliability are low.
The U.S. Pat 2010/0151680 (2010-6-17) of Optisolar company but mention the substrate vertical transfer that carrier arrangement has been installed, yet this device has been installed more metal fixing and can be caused device fail safe reduction and the substrate proportion of goods damageds high on substrate; The part that contacts of substrate and metal fixing can't plated film, causes substrate film coating inhomogeneous; Source material steam can be deposited on the metal fixing, causes the source material waste; The cavity wall plated film of coating apparatus is serious, and the device cleannes are poor, and temperature is unstable, and the source material utilance is low; This carrier arrangement complex design, production cost height; Loading and unloading amount between substrate and the metal fixing is big.
Summary of the invention
First technical purpose of the present invention provides the preparation method of the thin-film solar cells module that a kind of accurate positioning of ruling, little, the effective cell area of dead band area and conversion efficiency are high, the preparation method is simple, cost is low.
Second technical purpose of the present invention provides a kind of equipment that is used to realize the preparation method of said thin-film solar cells module.
Above-mentioned first technical purpose of the present invention is achieved through following technical scheme:
A kind of preparation method of thin-film solar cells module comprises step:
(1) cleans the transparent conductive oxide glass substrate;
(2) on the transparent conductive oxide rete, carry out semiconductor coated film and form semiconductor film;
(3) on said semiconductor film, use scoring equipment to carry out the line of three roads P1, P2 and P3, and form corresponding first groove and second groove, and the preparation layers that is used to form the 3rd groove;
(4) carry out the back electrode plated film, form back electrode film, do annealing heat treatment;
(5) make water or other solvents remove said preparation layers and and be deposited on the back electrode material on the said preparation layers, thereby on said back electrode film, form the 3rd groove;
(6) flash trimming, dispatch from foreign news agency are led, lamination doubling, terminal box install and packaging and testing.
Line P1 in three roads according to the invention, P2 and P3 are meant after said semiconductor coated film and in the time before the said back electrode plated film that all three roads line P1, P2 and P3 can accomplish in the time period between said semiconductor coated film and said back electrode plated film simultaneously; Can in this time period, accomplish the line of three roads successively; Also can accomplish twice line P1 and P2 earlier simultaneously, carry out the P3 line again; Also can accomplish the P1 line earlier, carry out P2 and P3 line more simultaneously.
The preparation method of thin-film solar cells module of the present invention has seven advantages at least:
1. traditional P 1 laser scribing, cleaning, P2 laser scribing, P3 laser scribing four segment process steps are merged into a segment process step; Three roads of the present invention line P1, P2 and P3 can be simultaneously said semiconductor coated film after and said back electrode plated film before during this period of time in carry out; And through adopting solvable lines formation method to exempt traditional P 3 laser scribings, production method is simple;
2. line P1 in three roads of the present invention, P2 and P3 carry out on same equipment after semiconductor coated film and in the time before the back electrode plated film; Glass substrate need not second positioning, the accurate positioning degree problem that the factors such as thermal expansion that do not exist the temperature difference to cause cause;
3. the dead band area be can reduce, effective cell area and conversion efficiency improved;
4. the present invention becomes traditional method of carrying out P1 laser scribing earlier, carrying out semiconductor coated film again and directly on the TCO rete, carries out earlier semiconductor coated film, carries out the P1 line again; Avoided the cleaning step after P1 rules; Thereby avoided possible dust and contamination problem; The interface performance of tco layer and semiconductor film interlayer be can improve, battery performance and long-time stability optimized;
5. exempt the electric leakage that traditional P 3 laser scribings can avoid laser scribing residue for the third time to cause through forming solvable lines preparation layers, improve the battery device performance;
6. the soluble material of the present invention's use and said semiconductor film and said back electrode material layer can not bond, and making water or organic solvent carry out soaking and washing can peel off said solvable lines or remove, simple to operate;
The preparation method of thin-film solar cells module 7. of the present invention is simple, cost is low.
Preferably in said glass substrate transmission course, use base plate transmission device as a kind of of technical scheme of the present invention, make said glass substrate and horizontal plane keep 65 °～115 ° also freely to stand.
Glass substrate according to the invention can be accepted plated film simultaneously from the both sides of coating source.Glass substrate transmission method of the present invention can carry out two above substrate plated films continuously, guarantee that plated film is even, production cost is low.Said glass substrate can all keep freely standing in the time that cleans to the completion of back electrode plated film.
The non-plated film face that is meant glass substrate and bottom surface or base of glass substrate of freely standing of the present invention contacts with said base plate transmission device; The plated film face that perhaps refers to glass substrate is not blocked fully, is not contacted with the external world.
Further preferred as technical scheme of the present invention, the method for said use base plate transmission device transmission base plate may further comprise the steps:
(a) substrate is placed on the base plate driving mechanism of coating source one or both sides, what make substrate treats that coated surface is towards the coating source working face;
(b) make substrate and horizontal plane keep 65 °～115 ° Free Station to stand on the said base plate driving mechanism, the top rear face of substrate relies on the substrate supporting mechanism, and the spacing of treating coated surface and coating source working face of substrate is 1～100mm;
(c) control the transmission that said base plate driving mechanism is used to realize substrate.
The spacing of said step (b) is meant the vertical interval between coated surface and the coating source working face of treating of substrate.
Board transport method of the present invention is simple and practical, can realize that coating source carries out uniform plated film to the substrate of two above stabilized free transmission simultaneously.
Again preferably, the method for said use base plate transmission device transmission base plate is to utilize the base plate driving mechanism that comprises motor and pass through the drive of motor driven, and the substrate Free Station is stood on the said drive.
Again preferably, the method for said use base plate transmission device transmission base plate be utilize fixing guide wheel or movably pulley and the contact site of said guide wheel or pulley and substrate back is arranged at the substrate first half as said substrate supporting mechanism.
A kind of preferred as technical scheme of the present invention, the semiconductor in the said step (2) is CdTe, after said CdTe semiconductor coated film is accomplished at CdCl
2Heat-treat under the steam.
Semiconductor of the present invention can be CdTe, Si, CIGS or other material.
A kind of preferred as technical scheme of the present invention; The P1 line uses laser that said transparent conductive oxide rete is rule in the said step (3); The P2 line uses laser that said semiconductor film is rule, and said semiconductor film is passed through in said P1 line and said transparent conductive oxide rete forms first groove; Said P2 line is passed through said semiconductor film and is formed second groove that parallels with said first groove; The solvable lines that said P3 line use soluble material forms on said semiconductor film and said second groove parallels are as the preparation layers of the 3rd groove; Said first groove that adopts the said P1 line of filling insulating material back to form.
Further preferred as technical scheme of the present invention, the insulating material in the said step (3) is the insulating material ink, said filling forms through inkjet printing.
Further preferred as technical scheme of the present invention, the soluble material in the said step (3) is the soluble material ink, said solvable lines form through inkjet printing.
A kind of preferred as technical scheme of the present invention, the spacing between said adjacent first groove, second groove and the 3rd groove is 20～50 μ m.
Second technical purpose of the present invention is achieved through following technical scheme:
The present invention provides the scoring equipment among a kind of preparation method of said thin-film solar cells module; Comprise laser scribe apparatus; And said scoring equipment also comprises solvable line strip forming apparatus; Said laser scribe apparatus comprises laser scribing machine and laser head; Said laser scribe apparatus and said solvable line strip apparatus for converting are incorporated on the same mechanical platform, and the solvable lines preparation layers of using first groove, second groove of said laser scribe apparatus formation and using solvable line strip apparatus for converting to form is parallel to each other.
The laser scribing equipment that tradition is used for thin-film solar cells is three laser scribing machines of needs at least, and laser scribing machine bigger equipment of cost during to be thin-film solar cells produce.
The scoring equipment that the present invention is used for thin-film solar cells only uses a laser scribe apparatus, is used to carry out P1 line and P2 line; Be equipped with solvable line strip apparatus for converting simultaneously, be used to form the P3 line, exempted traditional P 3 laser scribings, realize three special road scribble methods of the present invention, assembly of devices is originally significantly reduced.
Preferably on said mechanical platform, also be equipped with filling device as a kind of of technical scheme of the present invention, first groove that interstitial wire that said filling device forms and laser scribing form is overlapping fully.
Further preferred as technical scheme of the present invention, said solvable line strip apparatus for converting is ink jetting printing head or laser printing head.
Further preferred as technical scheme of the present invention, said filling device is ink jetting printing head or laser printing head.
The present invention also provides the base plate transmission device among a kind of preparation method of said thin-film solar cells module; Comprise base plate driving mechanism; Said base plate driving mechanism is used to realize substrate with respect to the moving of coating source, and said transmitting device also comprises the substrate supporting mechanism that is independent of said base plate driving mechanism.
The present invention uses separate base plate driving mechanism and substrate supporting mechanism; It is upright to make substrate not have the frame Free Station, said base plate transmission device make coating source realize simultaneously to two above substrate plated films, guarantee plated film evenly, the source material utilance is high, production cost is low.
A kind of preferred as technical scheme of the present invention, said base plate driving mechanism and said substrate supporting mechanism all have only a working face to be used for and substrate contacts, and the angle of said substrate supporting mechanism working face and horizontal plane is 65 °～115 °.
The working face of base plate driving mechanism is base plate driving mechanism and plane, substrate contacts place, and the working face of substrate supporting mechanism is that substrate supporting mechanism is that non-plated film face contacts the plane, place with substrate back; Said base plate transmission device can make substrate keep the oblique angle to stand, and makes board transport stable; When substrate thickness is enough big, but the substrate standing upright, and base plate transmission device makes the substrate stable transfer.
Description of drawings
Fig. 1 a-Fig. 1 f is the sketch map that tradition is used for the scribble method of thin-film solar cells;
Fig. 2 a-Fig. 2 f is the sketch map that the present invention is used for the scribble method of thin-film solar cells;
Fig. 3 is the sketch map that the present invention is used for the scoring equipment of thin-film solar cells;
Fig. 4 a is the process chart that tradition is used for the scribble method of thin-film solar cells;
Fig. 4 b is the process chart that the present invention is used for the scribble method of thin-film solar cells;
Fig. 5 is the sketch map of the base plate transmission device that is used for plated film of an embodiment of the present invention;
Fig. 6 is the end view of the base plate transmission device that is used for plated film of an embodiment of the present invention;
Fig. 7 is the preparation method's of a thin-film solar cells module of the present invention schematic flow sheet.
Among the figure, the 12-motor; The 13-drive; The 14-substrate supporting mechanism; The 15-shaft coupling; The 16-coating source; 17-vacuum cavity chamber; 18-base plate driving mechanism working face; 19-substrate supporting mechanism working face; 510-coating source working face.
Embodiment
Below in conjunction with accompanying drawing the present invention is done further explain.
Fig. 1 series is to be the sketch map that tradition is used for the laser scribe method of thin-film solar cells.Fig. 1 a is the glass substrate 100 that has transparent oxide TCO rete 110; Receive the P1 of laser scribing for the first time and form TCO groove 114 (Fig. 1 b); Then glass substrate 100 is cleaned; Then on the TCO rete 110 after the line, plate semiconductor film 120 (Fig. 1 c), glass substrate 100 is accepted the P2 of laser scribing for the second time, forms semiconductor layer groove 124 (Fig. 1 d); Continue plating back electrode film 130 (Fig. 1 e) on the semiconductor film after the line 120 then; Glass substrate 100 is accepted laser scribing P3 for the third time; Form i.e. the 3rd groove 134 (Fig. 1 f) of back electrode groove; 134 need of the 3rd groove relate to dorsum electrode layer and get final product, but traditional P3 of laser scribing for the third time can penetrate back electrode film 130 and semiconductor film 120 simultaneously, and P3 line metacoxal plate will pass through to clean and remove the residual dust that P3 causes.Laser scribing 114 and 134 s' part belongs to dead band (distance is common more than 400 microns), to not contribution of current conversion.
Embodiment one
Prepare the thin-film solar cells module as follows: the transparent conductive oxide glass substrate is cleaned in (1); (2) on the transparent conductive oxide rete, carry out semiconductor coated film and form semiconductor film; Semiconductor is CdTe, after plated film is accomplished at CdCl
2Heat-treat under the steam; (3) on said semiconductor film, use scoring equipment to carry out the line of three roads P1, P2 and P3, and form corresponding first groove and second groove, and the preparation layers that is used to form the 3rd groove; The P1 line uses laser that said transparent conductive oxide rete is rule, and the P2 line uses laser that said semiconductor film is rule, and said semiconductor film is passed through in said P1 line and said transparent conductive oxide rete forms first groove; Said P2 line is passed through said semiconductor film and is formed second groove that parallels with said first groove; The solvable lines that said P3 line use soluble material forms on said semiconductor film and said second groove parallels are as the preparation layers of the 3rd groove; Said first groove that adopts the said P1 line of filling insulating material back to form; (4) carry out the back electrode plated film, form back electrode film, do annealing heat treatment; (5) make water or solvent remove said preparation layers and and be deposited on the back electrode material on the said preparation layers, thereby on said back electrode film, form the 3rd groove; (6) flash trimming, dispatch from foreign news agency are led, the lamination doubling encapsulates, the terminal box Installation And Test.
Fig. 2 series is the sketch map that the present invention is used for the laser scribe method of thin-film solar cells.Fig. 2 a is the substrate 100 that has transparent oxide TCO rete 110; Before accepting any laser scribing, plate semiconductor film 120 (Fig. 2 b) earlier; When using scoring equipment shown in Figure 3, glass substrate 100 receives two laser scribing P1 and P2 simultaneously, and wherein the laser beam that sends of laser scribing P1 passes through TCO rete 110 and forms first groove 122 with semiconductor film 120; Laser scribing P2 only penetrates semiconductor film 120 and forms second groove 126, sees Fig. 2 c.The filling insulating material device is printed fill insulant and is formed insulation lines 128 in first groove, solvable line strip apparatus for converting is printed at the opposite side of second groove and formed soluble material lines 129 as the 3rd groove preparation layers, sees Fig. 2 d.
Continuation is plating back electrode film 130 at P1 line, P2 line, filling insulating material first groove with on the semiconductor film 120 after printing solvable lines preparation layers 129; Water or organic solvent are cleaned removing solvable lines preparation layers 129 and to be deposited on the back electrode material on the solvable lines preparation layers 129, thereby on back electrode tunic 130, form the 3rd groove 134.
Because being printed in the same equipment, twice laser scribing and lines accomplish; The temperature that does not need strict control glass substrate 100; The location that does not also exist thermal expansion to cause changes, and the distance of first groove 122 and second groove 126 can control to 20 microns at an easy rate, and the distance between first groove 122 and the 3rd groove 134 also can control to 40 microns at an easy rate; And the orientation problem that causes of the temperature difference that does not have three whens line; So can reduce the area in dead band, to compare with traditional thin-film solar cells, photoelectric conversion efficiency can improve 2%～5% at least.
Fig. 3 can show operation principle of the present invention more intuitively.After semiconductor coated film is accomplished, glass substrate 100 and laser aid or filling device or solvable line strip apparatus for converting maintenance relative motion.For example, glass substrate 100 operations, it is static that laser aid, filling device and solvable line strip apparatus for converting keep, and laser head 1 emitted laser bundle 3 forms groove 122 on substrate 100; Laser head 2 emitted laser bundles 4 form groove 126 on substrate 100; Ink jet-print head 5 uses insulating material ink filling groove 122 to form lines 128; Ink jet-print head 6 uses the soluble material ink on substrate 100, to form the preparation layers of lines 129 as the 3rd groove.Four steps can be carried out in same equipment simultaneously, also can carry out successively.
Also can find out laser scribing P1 and follow-up glass cleaning step 330 introducing dust and contamination easily for the first time in the traditional handicraft, the coatings of contaminate subsequent from the contrast of Fig. 4 a and Fig. 4 b.And the technology of present embodiment is that semiconductor film 120 directly is plated on the fresh clean surface of TCO rete 110, helps to mention interfacial characteristics, improves the performance of cell module.In addition, accomplish the electric leakage that the 3rd groove can avoid the laser scribing residue to cause, improve the battery device performance through inkjet printing.
As shown in Figure 5, the base plate transmission device that is used for plated film comprises base plate driving mechanism and the substrate supporting mechanism 14 that is independent of base plate driving mechanism.As shown in Figure 6; The working face of base plate driving mechanism is the plane that base plate driving mechanism contacts with the bottom of substrate 100; Be expressed as base plate driving mechanism working face 18 in the drawings; The working face of substrate supporting mechanism 14 is the plane that substrate supporting mechanism 14 contacts with substrate 100, is expressed as substrate supporting mechanism working face 19 in the drawings.
Like Fig. 5 and shown in Figure 6; Board transport mechanism in the base plate transmission device comprises a motor 12 and a plurality of drives 13 that drive through motor 12; Between the drive 13 through chain drive; The cross sectional shape of drive 13 is a triangle, and motor 12 and drive 13 are used to realize the stable transfer of substrate 100.Substrate supporting mechanism 14 is fixing guide wheel, and substrate supporting mechanism working face 19 is the bottom of substrate 100.If substrate 100 is arranged in hot environment, drive 13 must be high temperature resistant with the material of substrate supporting mechanism 14.The material of drive 13 and substrate supporting mechanism 14 is a carborundum.In order more effectively to prevent substrate 100 overturnings, being arranged on guide wheel apart from the height of the bottom of substrate 100 is 3/4ths places of the height of substrate 100.In order to make board transport more stable, the spacing between the drive 13 is substrate 1/3rd width in the horizontal direction.
When actual plated film is worked; Base plate transmission device is positioned at vacuum cavity chamber 17; Substrate 100 Free Station stand on the drive 13; The back side of substrate 100 is that non-plated film face leans on substrate supporting mechanism 14, and the angle of substrate 100 and horizontal plane is that the angle of substrate supporting mechanism working face 19 and horizontal plane is 89.5 °, and a substrate 100 is respectively placed in the both sides of coating source 16; The coating source working face 510 of coating source 16 and substrate 100 are parallel and keep the spacing of 10mm, realize that coating source 16 carries out uniform plated film to the substrate 100 of two stabilized frees transmission simultaneously.
Embodiment two
The preparation method of thin-film solar cells module is with embodiment one.The semiconductor that different is in the step (2) is a silicon, and semiconductor coated film does not need heat treatment after accomplishing.
When carrying out the line of described three roads of step (3), after said semiconductor coated film, carry out P1 laser scribing earlier in the time before, and then carry out P2 laser scribing with said back electrode plated film.Select for use the laser printing head as pad device 7; Select for use ink jet-print head as solvable line strip apparatus for converting 9; Open filling device 7 earlier and fill first groove 122 that P1 line back forms, and then open solvable line strip apparatus for converting 9 formation soluble material lines preparation layers 129.Distance between adjacent first groove 122, second groove 126 and the 3rd groove 134 is 30 microns.
The base plate transmission device structure that is used for plated film is with embodiment one, and different is, and that motor 12 has is a plurality of, and each motor 12 connects a drive 13, is connected with spring coupling 15 between drive 13 and the motor 12, and the conveying of substrate 100 is had damping and buffering effect; Substrate supporting mechanism 14 is pulley movably, apart from the height of the bottom of substrate 100 be substrate 100 height 4/5ths; The cross sectional shape of drive 13 is a rectangle, and the spacing between the drive 13 is substrate 1/4th width in the horizontal direction; The material of drive 13 and substrate supporting mechanism 14 is a silicon nitride; For improving the uniformity of edge plated film, effective plated film height of coating source 16 is slightly larger than the height of substrate 100.
When actual plated film is worked; Substrate 100 Free Station stand on the drive 13; The angle of substrate 100 and horizontal plane is a substrate supporting mechanism working face 19 and the angle of horizontal plane is 65 ° or 115 °, and pulley and substrate are mobile simultaneously, and the coating source working face 510 of coating source 16 also keeps the spacing of 100mm.According to the actual needs of the plated film uniformity and thickness, coating source working face 510 also can be provided with certain angle with substrate 100 according to actual needs.
This specific embodiment only is to explanation of the present invention; It is not a limitation of the present invention; Those skilled in the art can make the modification that does not have creative contribution to present embodiment as required after reading this specification, but as long as in claim scope of the present invention, all receive the protection of Patent Law.
Claims (15)
1. the preparation method of thin-film solar cells module is characterized in that comprising step:
(1) cleans the transparent conductive oxide glass substrate;
(2) on the transparent conductive oxide rete, carry out semiconductor coated film, form semiconductor film;
(3) on said semiconductor film, use chalker to carry out the line of three roads P1, P2 and P3, and form corresponding first groove and second groove, and be used to form preparation layers the 3rd groove, that soluble material forms;
(4) carry out the back electrode plated film, form back electrode film, do annealing heat treatment;
(5) make water or other solvents remove said preparation layers and be deposited on the back electrode material on the said preparation layers, thereby on said back electrode film, form the 3rd groove;
(6) flash trimming, dispatch from foreign news agency are led, the lamination doubling encapsulates, the terminal box Installation And Test.
2. the preparation method of thin-film solar cells module according to claim 1 is characterized in that: in said glass substrate transmission course, use base plate transmission device, make said glass substrate and horizontal plane keep 65 °～115 ° also freely to stand.
3. the preparation method of a kind of thin-film solar cells module according to claim 1 is characterized in that: the semiconductor in the said step (2) is CdTe, after said CdTe semiconductor coated film is accomplished at CdCl
2Heat-treat under the steam.
4. the preparation method of thin-film solar cells module according to claim 1; It is characterized in that: the P1 line uses laser that said transparent conductive oxide rete is rule in the said step (3); The P2 line uses laser that said semiconductor film is rule, and said semiconductor film is passed through in said P1 line and said transparent conductive oxide rete forms first groove; Said P2 line is passed through said semiconductor film and is formed second groove that parallels with said first groove; The solvable lines that said P3 line use soluble material forms on said semiconductor film and said second groove parallels are as the preparation layers of the 3rd groove; Said first groove that adopts the said P1 line of filling insulating material back to form.
5. the preparation method of thin-film solar cells module according to claim 4 is characterized in that: the insulating material in the said step (3) is the insulating material ink, and said filling forms through inkjet printing.
6. the preparation method of a kind of thin-film solar cells module according to claim 4 is characterized in that: the soluble material in the said step (3) is the soluble material ink, and said solvable lines form through inkjet printing.
7. the preparation method of thin-film solar cells module according to claim 2 is characterized in that: the method for said use base plate transmission device transmission base plate may further comprise the steps:
(a) substrate is placed on the base plate driving mechanism of coating source one or both sides, what make substrate treats that coated surface is towards the coating source working face;
(b) make substrate and horizontal plane keep 65 °～115 ° Free Station to stand on the said base plate driving mechanism, the top rear face of substrate relies on the substrate supporting mechanism, and the spacing of treating coated surface and coating source working face of substrate is 1～100mm;
(c) control the transmission that said base plate driving mechanism is used to realize substrate.
8. the preparation method of thin-film solar cells module according to claim 7 is characterized in that: said base plate driving mechanism comprises motor and the drive through motor driven.
9. the preparation method of thin-film solar cells module according to claim 7; It is characterized in that: utilize fixing guide wheel or movably pulley and the contact site of said guide wheel or pulley and substrate back is arranged at the substrate first half as said substrate supporting mechanism.
10. scoring equipment among the preparation method of thin-film solar cells module according to claim 1; Comprise laser scribe apparatus; It is characterized in that: said scoring equipment also comprises solvable line strip apparatus for converting; Said laser scribe apparatus comprises laser scribing machine and laser head; Said laser scribe apparatus and said solvable line strip apparatus for converting are incorporated on the same mechanical platform, and the solvable lines preparation layers of using first groove, second groove of said laser scribe apparatus formation and using solvable line strip apparatus for converting to form is parallel to each other.
11. scoring equipment according to claim 10 is characterized in that: on said mechanical platform, also be equipped with filling device, first groove that interstitial wire that said filling device forms and laser scribing form is overlapping fully.
12. scoring equipment according to claim 10 is characterized in that: said solvable line strip apparatus for converting is ink jetting printing head or laser printing head.
13. scoring equipment according to claim 11 is characterized in that: said filling device is ink jetting printing head or laser printing head.
14. the base plate transmission device among the preparation method of the said thin-film solar cells module of claim 7; Comprise base plate driving mechanism; Said base plate driving mechanism is used to realize substrate with respect to the moving of coating source, and it is characterized in that: said transmitting device also comprises the substrate supporting mechanism that is independent of said base plate driving mechanism.
15. base plate transmission device according to claim 14; It is characterized in that: said base plate driving mechanism and said substrate supporting mechanism all have only a working face to be used for and substrate contacts, and the angle of said substrate supporting mechanism working face and horizontal plane is 65 °～115 °.
Applications Claiming Priority (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US40488210P | 2010-10-12 | 2010-10-12 | |
| US40488110P | 2010-10-12 | 2010-10-12 | |
| US40487810P | 2010-10-12 | 2010-10-12 | |
| US61/404881 | 2010-10-12 | ||
| US61/404878 | 2010-10-12 | ||
| US61/404882 | 2010-10-12 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN102610691A true CN102610691A (en) | 2012-07-25 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN2011103047612A Pending CN102610691A (en) | 2010-10-12 | 2011-10-10 | Method for manufacturing thin-film solar battery module and apparatus thereof |
| CN201110304760.8A Active CN102544197B (en) | 2010-10-12 | 2011-10-10 | The scribble method of thin-film solar cells and equipment thereof |
| CN201110304763.1A Active CN102554472B (en) | 2010-10-12 | 2011-10-10 | Lineation method and apparatus for thin-film solar cell |
| CN2011103047627A Pending CN102593238A (en) | 2010-10-12 | 2011-10-10 | Laser scribing method and apparatus thereof for thin-film solar cell |
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| CN201110304760.8A Active CN102544197B (en) | 2010-10-12 | 2011-10-10 | The scribble method of thin-film solar cells and equipment thereof |
| CN201110304763.1A Active CN102554472B (en) | 2010-10-12 | 2011-10-10 | Lineation method and apparatus for thin-film solar cell |
| CN2011103047627A Pending CN102593238A (en) | 2010-10-12 | 2011-10-10 | Laser scribing method and apparatus thereof for thin-film solar cell |
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| CN104694882A (en) * | 2015-03-19 | 2015-06-10 | 中国建材国际工程集团有限公司 | Substrate film coating process method |
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| CN103489964A (en) * | 2013-10-15 | 2014-01-01 | 山东禹城汉能光伏有限公司 | Manufacturing method of BIPV (Building Integrated Photovoltaics) thin-film solar cell |
| CN103887368B (en) * | 2014-03-07 | 2016-05-11 | 京东方科技集团股份有限公司 | The integrated inline assembly of solar cell and preparation method, solar cell |
| CN106670655B (en) * | 2017-01-22 | 2019-07-05 | 旭科新能源股份有限公司 | For manufacturing the control method of the laser scoring system of flexible substrate solar battery |
| CN106972065B (en) * | 2017-03-03 | 2019-01-29 | 浙江爱旭太阳能科技有限公司 | Using the p-type PERC double-sided solar battery and preparation method of laser labelling contraposition |
| CN108987511A (en) * | 2018-07-23 | 2018-12-11 | 成都中建材光电材料有限公司 | A kind of integrated approach of cadmium telluride thin-film battery |
| CN109585573A (en) * | 2018-11-05 | 2019-04-05 | 武汉三工智能装备制造有限公司 | HIT battery and its metal grid lines printing process |
| CN109888027A (en) * | 2019-01-18 | 2019-06-14 | 北京铂阳顶荣光伏科技有限公司 | Back electrode, solar battery and preparation method thereof |
| CN110091069B (en) * | 2019-04-09 | 2021-09-24 | 大族激光科技产业集团股份有限公司 | Laser deplating method |
| CN116154032A (en) * | 2021-11-19 | 2023-05-23 | 宁德时代新能源科技股份有限公司 | Apparatus for manufacturing solar cell and method of manufacturing solar cell |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20030029848A1 (en) * | 2001-08-10 | 2003-02-13 | Borgeson Frank A. | Method and apparatus for laser scribing glass sheet substrate coatings |
| CN101743643A (en) * | 2007-07-11 | 2010-06-16 | 比尔克勒激光技术股份有限公司 | Thin-film solar cell module and method for its |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| JPS61263172A (en) * | 1985-05-16 | 1986-11-21 | Fuji Electric Co Ltd | Manufacture of thin-film solar cell |
| US6300593B1 (en) * | 1999-12-07 | 2001-10-09 | First Solar, Llc | Apparatus and method for laser scribing a coated substrate |
| US20090102502A1 (en) * | 2007-10-22 | 2009-04-23 | Michel Ranjit Frei | Process testers and testing methodology for thin-film photovoltaic devices |
| CN101383357B (en) * | 2008-10-10 | 2010-11-17 | 苏州富能技术有限公司 | Thin-film solar cell module and processing method thereof |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| US20030029848A1 (en) * | 2001-08-10 | 2003-02-13 | Borgeson Frank A. | Method and apparatus for laser scribing glass sheet substrate coatings |
| CN101743643A (en) * | 2007-07-11 | 2010-06-16 | 比尔克勒激光技术股份有限公司 | Thin-film solar cell module and method for its |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104694882A (en) * | 2015-03-19 | 2015-06-10 | 中国建材国际工程集团有限公司 | Substrate film coating process method |
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| CN102593238A (en) | 2012-07-18 |
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