CN102560365B - 镁合金表面电磁屏蔽处理方法及镁合金制品 - Google Patents
镁合金表面电磁屏蔽处理方法及镁合金制品 Download PDFInfo
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Abstract
一种镁合金表面电磁屏蔽处理方法,其包括如下步骤:提供镁合金基体;采用磁控溅射镀膜法,依次于所述镁合金基体上形成铬金属层、钛金属层;采用喷涂法,于所述钛金属层上形成防护层,该防护层为环氧树脂涂层。本发明还提供一种经由上述方法制得的镁合金制品。
Description
技术领域
本发明涉及一种镁合金表面电磁屏蔽处理方法及其制品。
背景技术
镁合金由于质量轻、散热性佳、电磁屏蔽性好等优点,广泛应用于3C电子产品的镁合金制品,但随着3C电子产品的迅速发展,对产品的电磁屏蔽性能提出了更高的要求,因此,未经电磁屏蔽处理的镁合金电子产品已不能满足要求。
此外,由于镁及镁合金最明显的缺点是耐腐蚀差,暴露于自然环境中会引起表面快速腐蚀,如此也将影响镁合金的电磁屏蔽性能。
采用磁控溅射镀膜技术于镁合金基体表面形成的保护性涂层具有高硬度、高耐磨性、良好的化学稳定性以及与镁合金基体结合牢固等优点,但由于磁控溅射技术本身的特点,以该方法形成的保护性涂层无法完全填充镁合金基体表面的裂纹、孔洞等,因而对镁合金镁合金制品耐腐蚀性能的提高有限。
发明内容
鉴于此,提供一种可有效解决上述问题的镁合金表面电磁屏蔽处理方法。
另外,还有必要提供一种经由上述电磁屏蔽处理方法处理后而制得的镁合金制品。
一种镁合金表面电磁屏蔽处理方法,其包括如下步骤:
提供镁合金基体;
采用磁控溅射镀膜法,依次于所述镁合金基体上形成铬金属层、钛金属层;
采用喷涂法,于所述钛金属层上形成防护层,该防护层为环氧树脂涂层,所述铬金属层的厚度为100~500nm,所述钛金属层的厚度为100~1000nm。
一种经由上述电磁屏蔽处理方法处理后而制得的镁合金制品,包括镁合金基体、依次形成于该镁合金基体上的铬金属层、直接形成于铬金属层上的钛金属层及直接形成于钛金属层上的防护层,所述防护层为环氧树脂涂层。
本发明的镁合金表面电磁屏蔽处理方法,在所述镁合金基体上采用磁控溅射镀膜法依次于镁合金基体上形成铬金属层及钛金属层,再在钛金属层上进行喷涂形成防护层。所述铬金属层与钛金属层形成的复合层大大提高了镁合金基体的电磁屏蔽效果。该防护层不仅可提高镁合金基体的耐腐蚀性,同时还可避免钛金属层划伤而影响镁合金制品的电磁屏蔽性能。此外,经所述镁合金表面电磁屏蔽处理方法制得的镁合金制品还具有良好的耐高温高湿性。
附图说明
图1为本发明较佳实施方式镁合金制品的剖视示意图;
图2为制造图1中镁合金制品所用真空镀膜机的示意图。
主要元件符号说明
镁合金制品 10
镁合金基体 11
铬金属层 13
钛金属层 15
防护层 17
镀膜机 100
镀膜室 20
真空泵 30
轨迹 21
第一靶材 22
第二靶材 23
气源通道 24
具体实施方式
请参阅图1及图2,本发明一较佳实施方式镁合金表面电磁屏蔽处理方法主要包括如下步骤:
(1)镀膜前处理
提供一镁合金基体11,该镁合金基体11可以通过冲压成型得到,其具有待制得的镁合金制品10的结构。
将所述镁合金基体11无水乙醇或异丙酮放入盛装有无水乙醇或异丙酮溶液的超声波清洗器中进行震动清洗,以除去镁合金基体11表面的杂质和油污。该超声波清洗时间为10~30min。清洗完毕后烘干备用。
提供一真空镀膜机100,将所述镁合金基体11置于该镀膜机100内,对镁合金基体11的表面进行氩气等离子体清洗,进一步去除镁合金基体11表面的油污,以改善镁合金基体11表面与后续涂层的结合力。
该真空镀膜机100包括一镀膜室20及连接在镀膜室20的一真空泵30,真空泵30用以对镀膜室20抽真空。该镀膜室20内设有转架(未图示)、二第一靶材22及二第二靶材23。转架带动镁合金基体11沿圆形轨迹21运行,且镁合金基体11在沿轨迹21运行时亦自转。二第一靶材22与二第二靶材23关于轨迹21的中心对称设置,且二第一靶材22相对地设置在轨迹21的内外侧,二第二靶材23相对地设置在轨迹21的内外侧。每一第一靶材22及每一第二靶材23的两端均设有气源通道24,气体经该气源通道24进入所述镀膜室20中。当镁合金基体11穿过二第一靶材22之间时,将镀上第一靶材22表面溅射出的粒子,当镁合金基体11穿过二第二靶材23之间时,将镀上第二靶材23表面溅射出的粒子。本发明中,所述第一靶材22为铬靶,所述第二靶材23为钛靶。
该等离子体体清洗的具体操作及工艺参数为:如图2所示,将镁合金基体11安装于镀膜室20内,真空泵30对所述镀膜室20进行抽真空处理至真空度为1.0×10-3~3.0×10-3Pa,然后以100~300sccm(标准状态毫升/分钟)的流量向镀膜室20内通入纯度为99.999%的氩气(工作气体),于镁合金基体11上施加-150~-200V的偏压,对镁合金基体11表面进行等离子体清洗,清洗时间为5~10min。
(2)磁控溅射铬金属层13
在所述等离子体清洗完成后,调节工作气体氩气流量至100~300sccm,加热所述镀膜室20至150~200℃(即镀膜温度为150~200℃);开启所述第一靶材22的电源,并设定其功率为20~40kw,于镁合金基体11上施加-150~-200V的偏压,沉积铬金属层13。沉积该铬金属层13的时间为10~15min。沉积完成该铬金属层13后关闭所述第一靶材22的电源。
(3)磁控溅射钛金属层15
调节工作气体氩气流量至100~300sccm,维持镀膜温度为150~200℃;开启所述第二靶材23的电源,并设定其功率为20~40kw,于镁合金基体11上施加-150~-200V的偏压,沉积钛金属层15。沉积该钛金属层15的时间为45~60min。
(4)喷涂防护层17
该防护层17为环氧树脂涂层。喷涂防护层17采用直径为2mm的喷枪,设置喷涂气压为2.026×10-5Pa,将主要成分为环氧树脂的液态涂料喷涂于钛金属层15上形成防护层17。防护层17的厚度为50~80μm。
本发明较佳实施方式镁合金表面电磁屏蔽处理方法在所述镁合金基体11上采用磁控溅射镀膜法依次于镁合金基体11上形成铬金属层13及钛金属层15,再在钛金属层15上进行喷涂形成防护层17。所述铬金属层13与钛金属层15形成的复合层大大提高了镁合金基体11的电磁屏蔽效果。该防护层17不仅可提高镁合金基体11的耐腐蚀性,同时还可避免钛金属层15划伤而影响镁合金制品10的电磁屏蔽性能。此外,该镁合金制品10还具有良好的耐高温高湿性。
一种经由上述镁合金表面电磁屏蔽处理方法制得的镁合金制品10包括镁合金基体11、依次形成于该镁合金基体11表面的铬金属层13、钛金属层15及防护层17。
所述铬金属层13的厚度为100~500nm。
所述钛金属层15的厚度为100~1000nm。
所述防护层17为环氧树脂涂层,其厚度为50~80μm。
所述镁合金制品的电磁屏蔽效能可达60~70dB。
下面通过实施例来对本发明进行具体说明。
实施例1
(1)镀膜前处理
采用无水乙醇或异丙酮对镁合金基体11进行超声波清洗大约25min。
将清洗好的镁合金基体11放入所述真空镀膜机100的转架上。对镁合金基体11的表面采用氩气等离子体清洗。对镀膜室20进行抽真空处理至真空度为1.5×10-3Pa,氩气流量为150sscm,施加镁合金基体11的偏压为-200V,该等离子体清洗时间为5min。本实施例所使用的真空镀膜机为北京丹普表面技术有限公司生产,型号为AS600DMTX05-X。
(2)磁控溅射铬金属层13
保持所述氩气的流量及施加于镁合金基体11上的偏压不变,加热镀膜室至150℃(即镀膜温度为150℃),设置第一靶材22的电源功率为30kw,沉积该铬金属层13的时间为10min。
(3)磁控溅射钛金属层15
保持所述氩气的流量、施加于镁合金基体11上的偏压及镀膜温度不变,设置第二靶材23的电源功率为30kw,沉积该铬金属层13的时间为50min。
(4)喷涂防护层17
该防护层17为环氧树脂涂层。采用直径为2mm的喷枪,设置喷涂气压为2.026×10-5Pa,将主要成分为环氧树脂涂料的液态涂料喷涂于钛金属层15上形成防护层17。该防护层17的厚度为50~80μm。本实施例中,液态涂料为环氧树脂涂料,液态涂料的溶剂为二甲苯。其中,环氧树脂占液态涂料的质量百分比约为85%。
喷涂后,对防护层17进行UV照射固化及后烘烤处理。
实施例2
(1)镀膜前处理
采用无水乙醇或异丙酮对镁合金基体11进行超声波清洗大约25min。
将清洗好的镁合金基体11放入真空镀膜机100的转架上。对镁合金基体11的表面采用氩气等离子体清洗。对镀膜室20进行抽真空处理至真空度为2×10-3Pa,氩气流量为200sscm,施加镁合金基体11的偏压为-150V,该等离子体清洗时间为5min。本实施例所使用的真空镀膜机100为北京丹普表面技术有限公司生产,型号为AS600DMTX05-X。
(2)磁控溅射铬金属层13
保持所述氩气的流量及施加于镁合金基体11上的偏压不变,加热镀膜室20至200℃(即镀膜温度为200℃),设置第一靶材22的电源功率为30kw,沉积该铬金属层13的时间为15min。
(3)磁控溅射钛金属层15
保持所述氩气的流量、施加于镁合金基体11上的偏压及镀膜温度不变,设置第二靶材23的电源功率为30kw,沉积该铬金属层13的时间为60min。
(4)喷涂防护层17
该防护层17为环氧树脂涂层。采用直径为2mm的喷枪,设置喷涂气压为2.026×10-5Pa,将主要成分为环氧树脂涂料的液态涂料喷涂于钛金属层15上形成防护层17。该防护层17的厚度为50~80μm。本实施例中,液态涂料为环氧树脂涂料,液态涂料的溶剂为二甲苯。其中,环氧树脂占液态涂料的质量百分比约为85%。
喷涂后,对防护层17进行UV照射固化及后烘烤处理。
性能测试
将上述制得的镁合金制品10进行电磁屏蔽效能测试、百格测试、盐雾测试和高温高湿测试,具体测试方法及结果如下:
(1)表面最大电阻测试
采用的电阻测试仪为广州四探针科技有限公司生产,其型号为RTS-8。测试表明,由本发明实施例1及2方法所制备的镁合金制品10的最大电阻值分别为0.3Ω、0.5Ω。
(2)电磁屏蔽效能测试
采用的电磁屏蔽测试仪为安捷伦公司生产,其型号为E5073。测试表明,在0.5GHz~3GHz的频率范围,由本发明实施例1及2方法所制备的镁合金制品10的电磁屏蔽效能分别为68dB、62dB。
由(1)及(2)的测试结果可见,所述的镁合金制品10具有良好的电磁屏蔽效能。
(3)盐雾测试
进行35℃中性盐雾(NaCl浓度为5%)测试。结果表明,由本发明实施例1和实施例2的方法所制备的镁合金制品10在72小时后才出现腐蚀现象,且经所述表面处理方法形成于镁合金基体11表面的铬金属层13、钛金属层15及防护层17均完好、未发生脱落现象。可见,所述镁合金制品10具有良好的耐腐蚀性。
(4)百格测试
对由本发明实施例1和实施例2的方法所制得的镁合金制品10进行百格测试,其测试结果均为5B,即没有膜层脱落。可见,依次形成于镁合金基体11上的铬金属层13、钛金属层15及防护层17具有良好的附着力。
(5)高温高湿测试
采用KTHB-615TBS型KSON高温高湿试验箱,测试参数如下:先在温度为25℃、相对湿度为95%RH(Relative Humidity)的条件下保持3h,再于相对湿度为95%RH、温度为55℃的条件下保持9h,然后在温度为25℃、相对湿度为97%RH的条件下保持3h,最后在温度为55℃相对湿度为97%RH的条件下保持9h,如此共计24h为一个循环。
测试表明,由本发明实施例1及2的方法所制得的镁合金制品10均可通过18个循环以上的测试。可见,所述镁合金制品10具有良好的耐高温耐湿性。
Claims (9)
1.一种镁合金表面电磁屏蔽处理方法,其包括如下步骤:
提供镁合金基体;
采用磁控溅射镀膜法,依次于所述镁合金基体上形成铬金属层、钛金属层,所述铬金属层的厚度为100~500nm,所述钛金属层的厚度为100~1000nm;
采用喷涂法,于所述钛金属层上形成防护层,该防护层为环氧树脂涂层。
2.如权利要求1所述的镁合金表面电磁屏蔽处理方法,其特征在于:形成所述铬金属层的工艺参数为:采用铬靶为靶材,设置铬靶电源功率为20~40kw,以氩气为工作气体,氩气的流量为100~300sccm,镀膜温度为150~200℃,施加于镁合金基体上的偏压为-150~-200V,镀膜时间为10~15min。
3.如权利要求1所述的镁合金表面电磁屏蔽处理方法,其特征在于:形成所述钛金属层的工艺参数为:采用钛靶为靶材,设置钛靶电源功率为20~40kw,以氩气为工作气体,氩气的流量为100~300sccm,镀膜温度为150~200℃,施加于镁合金基体上的偏压为-150~-200V,镀膜时间为45~60min。
4.如权利要求1所述的镁合金表面电磁屏蔽处理方法,其特征在于:形成所述防护层的工艺参数为:采用直径为2mm的喷枪,设置喷涂气压为2.026×10-5Pa,喷涂所用涂料的主要成分为环氧树脂。
5.如权利要求1所述的镁合金表面电磁屏蔽处理方法,其特征在于:所述镁合金表面电磁屏蔽处理方法还包括在形成所述铬金属层之前对镁合金基体进行氩气等离子体清洗的步骤。
6.一种镁合金制品,包括镁合金基体,其特征在于:该镁合金制品还包括依次形成于该镁合金基体上的铬金属层、直接形成于铬金属层上的钛金属层及直接形成于钛金属层上的防护层,所述防护层为环氧树脂涂层。
7.如权利要求6所述的镁合金制品,其特征在于:所述铬金属层的厚度为100~500nm。
8.如权利要求6所述的镁合金制品,其特征在于:所述钛金属层的厚度为100~1000nm。
9.如权利要求6所述的镁合金制品,其特征在于:所述防护层的厚度为50~80μm。
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