CN102537049A - Radial air floatation guide module and photoetching machine motion platform applying same - Google Patents
Radial air floatation guide module and photoetching machine motion platform applying same Download PDFInfo
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- CN102537049A CN102537049A CN2010106183737A CN201010618373A CN102537049A CN 102537049 A CN102537049 A CN 102537049A CN 2010106183737 A CN2010106183737 A CN 2010106183737A CN 201010618373 A CN201010618373 A CN 201010618373A CN 102537049 A CN102537049 A CN 102537049A
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Abstract
The invention provides a radial air floatation guide module and a photoetching machine motion platform applying the same. The radial air floatation guide module is arranged on a micropositioner and comprises a ring stator and a plurality of flexible hinges, wherein the ring stator is provided with an air flotation guide part, and the micropositioner moves by taking the air flotation guide part as guidance; and the plurality of flexible hinges are uniformly fixed on the micropositioner, and each flexible hinge is respectively provided with a fixing part, a flexible part and an air floatation part, wherein the fixing part is fixed on the micropositioner, the flexible part is connected with the fixing part and the air floatation part, the air floatation part faces to the air flotation part, and a uniform compressed air layer can be formed between the air floatation part and the air flotation guide part. According to the radial air floatation guide module provided by the invention, radial air floatation guidance is realized by using the flexible hinges, not only the rigidity of the radial air floatation guide module in the horizontal direction is ensured, but also reduction of difficulty in design, processing and assembly of the radial air flotation guide module is facilitated.
Description
Technical field
The present invention relates to a kind of air supporting oriented module, and be particularly related to a kind of radially air supporting oriented module and use its lithography machine moving platform.
Background technique
Photo-etching machine work-piece platform mainly is to carry workpiece such as silicon chip or glass substrate under object lens, to keep being synchronized with the movement with mask platform, and accomplishes accurate exposure work.
European patent number EP 0729073 discloses a kind of 6-dof motion platform that is used for silicon wafer exposure.The micropositioner of this moving platform can realize comprising that the four-degree-of-freedom that moves, rotates around X axle, Y axle and Z axle along the Z axle moves.Wherein, move and all be that mode with the annulus air-bearing realizes along the Z axle around the motion guide of Z axle rotation.The shortcoming of this method is need push the air bearing surface that is used to lead around the motion of X axle, the rotation of Y axle, has strengthened the difficulty of design of annulus air-bearing and processing, and is unfavorable for the assembling of annulus air-bearing.
In addition, above-mentioned European patent and U.S. Patent Publication US2005/0036126 have also provided a kind of air supporting layout of growing stroke directions simultaneously.Adopt air floating structure between its moving element bottom surface and the base platform, and one-sided air floating structure is adopted in the side, cause compression the side direction air film with the motor-driven asynchronism in the long stroke directions both sides of effective alleviation.Yet because air floating structure only is present in a side, therefore, the integral rigidity of moving platform will be restricted.
Summary of the invention
The present invention provides a kind of radially air supporting oriented module and uses its lithography machine moving platform, can address the above problem.
For solving the problems of the technologies described above, the technological scheme that the present invention adopts is:
The present invention provides a kind of radially air supporting oriented module, is arranged at micropositioner.Radially the air supporting oriented module comprises annulus stator and a plurality of flexible hinge.The annulus stator has the air supporting guide portion, and micropositioner is a guide movement with the air supporting guide portion.A plurality of flexible hinges are fixed in micropositioner equably, and each flexible hinge has fixing part, flexible part and air supporting portion respectively.Fixing part is fixed in micropositioner, and flexible part connects fixing part and air supporting portion, and air supporting portion faces the air supporting guide portion, and can form uniform pressurized air layer between air supporting portion and the air supporting guide portion.
According to a specific embodiment of the present invention, micropositioner has through hole, and the annulus stator is positioned at through hole, flexible hinge be distributed in equably through hole around, and air supporting portion is positioned between the inwall of air supporting guide portion and through hole.
The present invention also provides a kind of lithography machine moving platform, is used to drive workpiece motion s.The lithography machine moving platform comprises that micropositioner, Z are to drive unit and air supporting oriented module radially.Micropositioner is used to carry workpiece.Z is connected in micropositioner to drive unit, and Z is used to drive the micropositioner motion to drive unit.Radially the air supporting oriented module is arranged at micropositioner, and radially the air supporting oriented module comprises annulus stator and a plurality of flexible hinge.The annulus stator has the air supporting guide portion, and micropositioner is a guide movement with the air supporting guide portion at Z under the driving of drive unit.A plurality of flexible hinges are fixed in micropositioner equably, and each flexible hinge has fixing part, flexible part and air supporting portion respectively.Fixing part is fixed in micropositioner, and flexible part connects fixing part and air supporting portion, and air supporting portion faces the air supporting guide portion, and can form uniform pressurized air layer between air supporting portion and the air supporting guide portion.
According to a specific embodiment of the present invention, micropositioner has through hole, and the annulus stator is positioned at through hole, flexible hinge be distributed in equably through hole around, and air supporting portion is positioned between the inwall of air supporting guide portion and through hole.
According to a specific embodiment of the present invention, Z comprises that to drive unit Z is to linear electric motor and Z axle electric rotating machine.
According to a specific embodiment of the present invention, the lithography machine moving platform also comprises the gravity compensation unit, is connected in micropositioner.
According to a specific embodiment of the present invention, the lithography machine moving platform also comprises pedestal, and micropositioner is positioned at the top of pedestal.
According to a specific embodiment of the present invention, the lithography machine moving platform also comprises supporting element, supports Z to drive unit, and supporting element can be suspended in the pedestal top.
According to a specific embodiment of the present invention, the lithography machine moving platform also comprise X to guide rail and X to linear electric motor.Micropositioner along X to being mounted slidably in X to guide rail.X is used to drive micropositioner to linear electric motor and slides to guide rail along X.
According to a specific embodiment of the present invention, the lithography machine moving platform also comprise two Y to guide rail, two air floating slide carriages and two Y to linear electric motor.Two Y are positioned at the both sides of micropositioner to guide rail.Two air floating slide carriages are connected to micropositioner, and two air floating slide carriages can form uniform pressurized air layer with corresponding Y respectively between guide rail.Two Y are connected in two air floating slide carriages respectively to linear electric motor, and two Y are used to drive micropositioner to linear electric motor and slide to guide rail along two Y.
According to a specific embodiment of the present invention, the lithography machine moving platform also comprises two shuttles, is connected to corresponding Y between linear electric motor and air floating slide carriage.
According to a specific embodiment of the present invention; The lithography machine moving platform also comprises two displacement measuring devices; Measure the moving displacement of two Y respectively, and utilize the feedback signal of its generation to calculate the movement position deviation of corresponding Y, and proofread and correct in real time to motor to motor.
According to a specific embodiment of the present invention, the lithography machine moving platform also comprises load-bearing member and coarse motion annulus.Load-bearing member is used to the upper surface that carries workpiece and be arranged at the coarse motion annulus, and the coarse motion annulus is arranged at the upper surface of micropositioner.
According to a specific embodiment of the present invention, the load-bearing member lower surface has vacuum tank, and load-bearing member is adsorbed in the upper surface of coarse motion annulus through vacuum tank.
According to a specific embodiment of the present invention, the lithography machine moving platform also comprises the vacuum piece, is arranged at the upper surface of micropositioner, and the coarse motion annulus is adsorbed in the upper surface of micropositioner through the vacuum piece.
According to a specific embodiment of the present invention, the lithography machine moving platform also comprises air supporting piece and electric rotating machine.The air supporting piece is arranged at the upper surface of micropositioner, and electric rotating machine is connected in the coarse motion annulus.
According to a specific embodiment of the present invention; When workpiece when transmission system is transferred on the load-bearing member; Open vacuum piece and air supporting piece so that coarse motion annulus, load-bearing member and workpiece are in state of suspension, drive the rotation of coarse motion annulus by electric rotating machine more simultaneously; With the deflection of preliminary calibration of workpieces, then close the air supporting piece.
Beneficial effect of the present invention can be:
In the radially air supporting oriented module provided by the invention; Utilize flexible hinge to realize radially air supporting guiding; Both guaranteed radially air supporting oriented module rigidity in the horizontal direction, the design, processing that helps reducing air supporting oriented module radially again with and the difficulty of assembling.
For let above and other objects of the present invention, feature and advantage can be more obviously understandable, hereinafter is special lifts preferred embodiment, and conjunction with figs., elaborates as follows.
Description of drawings
Shown in Figure 1 is the schematic representation of the lithography machine moving platform of the present invention's one preferred embodiment;
Shown in Figure 2 is the schematic top plan view of micropositioner among Fig. 1;
Shown in Figure 3 is the schematic representation of flexible hinge among Fig. 1.
Embodiment
Shown in Figure 1 is the schematic representation of the lithography machine moving platform of the present invention's one preferred embodiment.Please refer to Fig. 1.In the present embodiment, lithography machine moving platform 1 is used to drive workpiece 2 motions.At this, workpiece 2 can be silicon chip.Yet the present invention does not do any qualification to this.In other embodiments, workpiece 2 also can be glass substrate.
In the present embodiment, lithography machine moving platform 1 comprise pedestal 10, supporting element 11, micropositioner 12, Z to drive unit, gravity compensation unit 15, vacuum piece 16, air supporting piece 17, coarse motion annulus 18, electric rotating machine 19, load-bearing member 20, radially air supporting oriented module 3, X to guide rail 23, X to linear electric motor 24, two air floating slide carriages 25, two Y to guide rail 26, two Y to linear electric motor 27, two shuttles 28 and two displacement measuring devices 29.Thus, the lithography machine moving platform 1 that provides of present embodiment can be realized the motion of six-degree-of-freedom in the X-Y-Z space.Yet the present invention does not do any qualification to this.In other embodiments, the user can be provided with corresponding elements according to the needs of required degrees of freedom.
In the present embodiment, pedestal 10 can be the marble platform, and it keeps state of rest in whole motion process.Supporting element 11 is arranged at the upper surface of pedestal 10.Yet the present invention does not do any qualification to this.
In the present embodiment, micropositioner 12 can be positioned at the top of pedestal 10 and be positioned at the top of supporting element 11.At this, micropositioner 12 can have through hole 120.Yet the present invention does not do any qualification to this.In other embodiments, micropositioner 12 also can not have through hole 120.
In the present embodiment, Z is connected between micropositioner 12 and the supporting element 11 to drive unit, is used to drive micropositioner 12 motions.Please refer to Fig. 2, shown in Figure 2 is the schematic top plan view of micropositioner among Fig. 1.In the present embodiment, Z comprises that to drive unit Z is to linear electric motor 13 and Z axle electric rotating machine 14.Z to linear electric motor 13 be used to drive micropositioner 12 along Z to moving linearly.At this, Z can be three, distribution triangular in shape to the number of linear electric motor 13.Yet the present invention does not do any qualification to Z to the number of linear electric motor 13.When practical application, three Z also can asynchronous start to linear electric motor 13 start synchronously.As three Z in the present embodiment during, can order about micropositioner 12 and produce small rotation around X axle and Y axle to linear electric motor 13 asynchronous starts.Yet the present invention does not do any qualification to this.
In the present embodiment, Z axle electric rotating machine 14 is used to drive micropositioner 12 around the Z axis rotation.At this, the number of Z axle electric rotating machine 14 can be two, is diagonal and distributes.Yet the present invention does not do any qualification to the number of Z axle electric rotating machine 14.
In the present embodiment, gravity compensation unit 15 also is connected between micropositioner 12 and the supporting element 11.As shown in Figure 2, gravity compensation unit 15 is used to reduce the power output of Z to linear electric motor 13.At this, gravity compensation unit 15 numbers can be three, are del and distribute.Yet the present invention does not do any qualification to the number of gravity compensation unit 15.
In the present embodiment, Z can comprise stator and mover respectively to linear electric motor 13, Z axle electric rotating machine 14 and gravity compensation unit 15.Wherein, stator can be fixed in the upper surface of supporting element 11, and mover can be fixed in the lower surface of micropositioner 12, drive thus micropositioner 12 along Z to moving linearly or around the Z axis rotation, produce small rotation around X axle and Y axle.Yet the present invention does not do any qualification to this.
In the present embodiment, vacuum piece 16 and air supporting piece 17 all are arranged at the upper surface of micropositioner 12.Vacuum piece 16 is used to produce downward pull of vacuum, and air supporting piece 17 is used to produce buoyant gas upwards.At this, vacuum piece 16 is all four with the number of air supporting piece 17, evenly be arranged on micropositioner 12 through hole 120 around.Yet, the present invention to the number of vacuum piece 16 and air supporting piece 17 with the position be set do not do any qualification.
In the present embodiment, coarse motion annulus 18 is adsorbed in the upper surface of micropositioner 12 through vacuum piece 17, and electric rotating machine 19 is connected in coarse motion annulus 18, is used to drive coarse motion annulus 18 and in X-Y plane, rotates.
In the present embodiment, load-bearing member 20 upper surface that is used to carry workpiece 2 and is arranged at coarse motion annulus 18.At this, the lower surface of load-bearing member 20 can have vacuum tank (figure does not show), and load-bearing member 20 is adsorbed in the upper surface of coarse motion annulus 18 through vacuum tank.In addition, workpiece 2 also can be carried on the load-bearing member 20 through the pull of vacuum effect.Yet the present invention does not do any qualification to this.Thus, in the present embodiment, workpiece 2, load-bearing member 20, coarse motion annulus 18 and micropositioner 12 can be adsorbed as a whole through vacuum action layer by layer, thereby realize being synchronized with the movement.
Especially, in the semiconductor exposure manufacturing process, workpiece 2 is transferred to 20 last times of load-bearing member from transmission system generally can produce rotation error.At this moment, vacuum piece capable of using 16, air supporting piece 17 and electric rotating machine 19 are proofreaied and correct this rotation error.Particularly, elder generation is open vacuum piece 16 gentle floating blocks 17 simultaneously, so that coarse motion annulus 18 is in state of suspension together with load-bearing member 20 and workpiece 2.At this moment, drive 18 rotations of coarse motion annulus by electric rotating machine 19 again, be placed on the deflection of workpiece 2 in X-Y plane on the load-bearing member 20 with preliminary correction.After correction finishes, close air supporting piece 17, thereby all parts firmly are adsorbed on the micropositioner 12.
In the present embodiment, radially air supporting oriented module 3 comprises annulus stator 21 and a plurality of flexible hinges 22.Annulus stator 21 is positioned at the through hole 120 of micropositioner 12, and does not contact with the inwall of through hole 120.A plurality of flexible hinges 22 are fixed in micropositioner 12 equably, at this, can be distributed in equably through hole 120 around.The number of flexible hinge 22 can be four.Yet the present invention does not do any qualification to the number of flexible hinge 22.
In the present embodiment, annulus stator 21 can have air supporting guide portion 210.At this, air supporting guide portion 210 can be the outer surface of annulus stator 21.Micropositioner 12 is a guide movement with air supporting guide portion 210 at Z under the driving of drive unit.Particularly, at Z under the driving of linear electric motor 13 or Z axle electric rotating machine 14, micropositioner 12 can with air supporting guide portion 210 serve as guiding along Z to moving up and down, or rotate around the Z axle.
In other embodiments, air supporting guide portion 210 can be the internal surface of annulus stator 21.At this moment, micropositioner 12 can not be provided with through hole 120, is placed in the annulus stator 21 and have bump accordingly.At this moment, flexible hinge 22 can be arranged on the bump.The present invention does not do any qualification to this.
Shown in Figure 3 is the schematic representation of flexible hinge among Fig. 1.Please refer to Fig. 1 and Fig. 3.In the present embodiment, flexible hinge 22 can produce bending around X and Y axle, and in X-Y plane, has bigger rigidity.Particularly, flexible hinge 22 has fixing part 220, flexible part 221 and air supporting portion 222.Fixing part 220 is fixed in micropositioner 12, and flexible part 221 connects fixing part 220 and air supporting portion 222.Air supporting portion 222 is in the face of the air supporting guide portion 210 of annulus stator 21.At this, air supporting portion 222 is promptly between the inwall of air supporting guide portion 210 and through hole 210.When feeding pressurized air, pressurized air can form uniform pressurized air layer behind the flexible hinge 22 of flowing through between air supporting portion 222 and air supporting guide portion 210.
In the present embodiment, the pressurized air layer between flexible hinge 22 and the annulus stator 21 provides the horizontal rigidity that micropositioner 12 moves in X-Y plane.When micropositioner 12 along Z to, around the X axle with when the Y axle rotatablely moves; The flexible part 221 of flexible hinge 22 will bend; And can not compress the air film (pressurized air layer) between air supporting portion 222 and the air supporting guide portion 210 along radial direction; Therefore reduced manufacturing requirement, helped guaranteeing the overall performance of lithography machine moving platform 1 the air film gap.Simultaneously, in the present embodiment, utilize the fixation of 12 of fixing part 220 and the micropositioners of flexible hinge 22, guarantee its air film gap easily.
In the present embodiment, X can be two to the number of guide rail 23, respectively along the both sides of Y to the lower surface that is arranged at micropositioner 12 symmetrically.Thus, micropositioner 12 can slide to guide rail along X.Yet the present invention does not do any qualification to X to the number of guide rail 23.In other embodiments, X can be one to the number of guide rail 23, is arranged at the central authorities of the lower surface of micropositioner 12.
In the present embodiment, X can be arranged at the lower surface of micropositioner 12 to linear electric motor 24, is used to drive micropositioner 12 and slides to guide rail 23 along X.Yet the present invention does not do any qualification to X to the position that is provided with of linear electric motor 24.
In the present embodiment; Between supporting element 11 and the pedestal 10 opposed facing surfaces and X between guide rail 23 and micropositioner 12 opposed facing surfaces, can be provided with air floating structure; With the uniform pressurized air layer of both middle formation in relative movement; Thereby make micropositioner 12 along X when the frictionless motion, supporting element 11 can rely on air floating structure to be suspended in the top of pedestal 10.
In the present embodiment, two air floating slide carriages 25 can lay respectively at the both sides of X to guide rail 23, and are connected to guide rail 23 with X respectively at two ends.
In the present embodiment, two Y arrange to guide rail is vertical to guide rail 26 and X, two air floating slide carriages 25 respectively and two Y between guide rail 26, form air floating structure,, under the driving of linear electric motor 27, order about micropositioner 12 and slide to making long stroke at two Y along Y.
In the present embodiment, two Y are positioned at the relative both sides of the edge of pedestal 10 to linear electric motor 27, and are connected in the air floating slide carriage 25 of respective side respectively through shuttle 28.Yet the present invention does not do any qualification to Y to the position that is provided with of linear electric motor 27.In the present embodiment; Because air floating slide carriage 25 is connected in X to guide rail 23; And micropositioner 12 is mounted slidably in X to guide rail 23; Therefore, two Y to linear electric motor 27 can come to drive accordingly air floating slide carriage 25 through driving shuttle 28, X slides to guide rail 26 along Y to guide rail 23 and micropositioner 12 together.Yet the present invention does not do any qualification to the annexation of Y between linear electric motor 27 and micropositioner 12.
In the present embodiment; Between air floating slide carriage 25 and the pedestal 10 opposed facing surfaces and air floating slide carriage 25 and Y between guide rail 26 opposed facing surfaces, can be provided with air floating structure, in the middle of both of relative movement, to form uniform pressurized air layer, in addition owing to also be provided with air floating structure between supporting element 11 and the pedestal 10 opposed facing surfaces; Therefore; When micropositioner 12 along Y when moving, supporting element 11 and air floating slide carriage 25 can rely on air floating structure to be suspended in the top of pedestal 10, and also there are the very thin pressurized air layer of one deck in air floating slide carriage 25 and Y between guide rail 26; Promptly do not have directly contact, thereby can realize the frictionless motion of long stroke.
In the present embodiment, two displacement measuring devices 29 can be arranged at respectively on the shuttle 28 of both sides, and the Y that is connected to respective side is to linear electric motor 27.Because in the present embodiment, be provided with two Y to linear electric motor 27, so these two Y between linear electric motor 27 if exist asynchronism will have influence on the Location accuracy of micropositioner 12.At this, utilize the feedback signal of two displacement measuring devices 29 to obtain the movement position deviation of two Y between linear electric motor 27, thereby proofread and correct in real time, guarantee the synchronism of two Y between linear electric motor 27, to obtain the preferred positioning precision.
In the lithography machine moving platform that preferred embodiment of the present invention provides; Radially the air supporting oriented module utilizes flexible hinge to realize radially air supporting guiding; Both guaranteed radially air supporting oriented module rigidity in the horizontal direction, the design, processing that helps reducing air supporting oriented module radially again with and the difficulty of assembling.When micropositioner moves in X-Y plane, can rely on air floating structure to realize the frictionless motion of long stroke.In addition, the lithography machine moving platform has also utilized the feedback signal of displacement measuring device to proofread and correct the asynchronism of both sides Y between linear electric motor, can guarantee Location accuracy.To the rotation error that workpiece produces when transmission system is transferred on the load-bearing member, can proofread and correct through vacuum piece and cooperatively interacting of air supporting piece.
Though the present invention discloses as above with preferred embodiment; Right its is not in order to limiting the present invention, anyly knows this art, do not breaking away from the spirit and scope of the present invention; When can doing a little change and retouching, so protection scope of the present invention is as the criterion when looking claims person of defining.
Claims (17)
1. an air supporting oriented module radially is arranged at micropositioner, it is characterized in that said radially air supporting oriented module comprises:
The annulus stator has the air supporting guide portion, and said micropositioner is a guide movement with said air supporting guide portion; And
A plurality of flexible hinges; Be fixed in said micropositioner equably; Each said flexible hinge has fixing part, flexible part and air supporting portion respectively, and said fixing part is fixed in said micropositioner, and said flexible part connects said fixing part and said air supporting portion; Said air supporting portion is in the face of said air supporting guide portion, and can form uniform pressurized air layer between said air supporting portion and the said air supporting guide portion.
2. radially air supporting oriented module according to claim 1; It is characterized in that; Said micropositioner has through hole; Said annulus stator is positioned at said through hole, said a plurality of flexible hinges be distributed in equably said through hole around, and said air supporting portion is positioned between the inwall of said air supporting guide portion and said through hole.
3. a lithography machine moving platform is used to drive workpiece motion s, it is characterized in that, said lithography machine moving platform comprises:
Micropositioner is used to carry said workpiece;
Z is connected in said micropositioner to drive unit, and said Z is used to drive said micropositioner motion to drive unit; And
Radially the air supporting oriented module is arranged at said micropositioner, and said radially air supporting oriented module comprises:
The annulus stator has the air supporting guide portion, and said micropositioner is a guide movement with said air supporting guide portion at said Z under the driving of drive unit; And
A plurality of flexible hinges; Be fixed in said micropositioner equably; Each said flexible hinge has fixing part, flexible part and air supporting portion respectively, and said fixing part is fixed in said micropositioner, and said flexible part connects said fixing part and said air supporting portion; Said air supporting portion is in the face of said air supporting guide portion, and can form uniform pressurized air layer between said air supporting portion and the said air supporting guide portion.
4. lithography machine moving platform according to claim 3; It is characterized in that; Said micropositioner has through hole; Said annulus stator is positioned at said through hole, said a plurality of flexible hinges be distributed in equably said through hole around, and said air supporting portion is positioned between the inwall of said air supporting guide portion and said through hole.
5. lithography machine moving platform according to claim 3 is characterized in that, said Z comprises that to drive unit Z is to linear electric motor and Z axle electric rotating machine.
6. lithography machine moving platform according to claim 3 is characterized in that, said lithography machine moving platform also comprises the gravity compensation unit, is connected in said micropositioner.
7. lithography machine moving platform according to claim 3 is characterized in that, said lithography machine moving platform also comprises pedestal, and said micropositioner is positioned at the top of said pedestal.
8. lithography machine moving platform according to claim 7 is characterized in that, said lithography machine moving platform also comprises supporting element, supports said Z to drive unit, and said supporting element can be suspended in said pedestal top.
9. lithography machine moving platform according to claim 3 is characterized in that, said lithography machine moving platform also comprises:
X is to guide rail, said micropositioner along X to being mounted slidably in said X to guide rail; And
X is used to drive said micropositioner and slides to guide rail along said X to linear electric motor.
10. lithography machine moving platform according to claim 3 is characterized in that, said lithography machine moving platform also comprises:
Two Y are positioned at the both sides of said micropositioner to guide rail;
Two air floating slide carriages are connected to said micropositioner, and said two air floating slide carriages can form uniform pressurized air layer with corresponding said Y respectively between guide rail; And
Two Y are connected to said two air floating slide carriages to linear electric motor, and said two Y are used to drive said micropositioner to linear electric motor and slide to guide rail along said two Y.
11. lithography machine moving platform according to claim 10 is characterized in that, said lithography machine moving platform also comprises two shuttles, is connected to corresponding said Y between linear electric motor and said air floating slide carriage.
12. lithography machine moving platform according to claim 10; It is characterized in that; Said lithography machine moving platform also comprises two displacement measuring devices; Measure the moving displacement of two Y respectively, and utilize the feedback signal of its generation to calculate the movement position deviation of corresponding said Y, and proofread and correct in real time to motor to motor.
13. lithography machine moving platform according to claim 3; It is characterized in that; Said lithography machine moving platform also comprises load-bearing member and coarse motion annulus; The upper surface that said load-bearing member is used to carry said workpiece and is arranged at said coarse motion annulus, said coarse motion annulus is arranged at the upper surface of said micropositioner.
14. lithography machine moving platform according to claim 13 is characterized in that, said load-bearing member lower surface has vacuum tank, and said load-bearing member is adsorbed in the upper surface of said coarse motion annulus through said vacuum tank.
15. lithography machine moving platform according to claim 13 is characterized in that, said lithography machine moving platform also comprises the vacuum piece, is arranged at the upper surface of said micropositioner, and said coarse motion annulus is adsorbed in the upper surface of said micropositioner through said vacuum piece.
16. lithography machine moving platform according to claim 15 is characterized in that, said lithography machine moving platform also comprises air supporting piece and electric rotating machine, and said air supporting piece is arranged at the upper surface of said micropositioner, and said electric rotating machine is connected in said coarse motion annulus.
17. lithography machine moving platform according to claim 16; It is characterized in that, when said workpiece is transferred on the said load-bearing member from transmission system, open said vacuum piece and said air supporting piece simultaneously; So that said coarse motion annulus, said load-bearing member and said workpiece are in state of suspension; Drive said coarse motion annulus rotation by said electric rotating machine again,, then close said air supporting piece with the deflection of the said workpiece of preliminary correction.
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Cited By (7)
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| CN103573815A (en) * | 2012-07-31 | 2014-02-12 | 上海微电子装备有限公司 | Micropositioner and gas bearing |
| CN104749895A (en) * | 2013-12-30 | 2015-07-01 | 上海微电子装备有限公司 | Double air floatation large-scale substrate transmission apparatus |
| CN104820346A (en) * | 2015-04-24 | 2015-08-05 | 深圳市大川光电设备有限公司 | Flat workpiece alignment method |
| WO2015127863A1 (en) * | 2014-02-28 | 2015-09-03 | 上海微电子装备有限公司 | Lithography machine workpiece table and vertical position initialization method thereof |
| CN107900702A (en) * | 2017-11-15 | 2018-04-13 | 广东工业大学 | A kind of air floating platform device |
| CN110436203A (en) * | 2019-08-16 | 2019-11-12 | 吉林华微电子股份有限公司 | Pass piece system and litho machine |
| CN112355990A (en) * | 2021-01-13 | 2021-02-12 | 上海隐冠半导体技术有限公司 | XY motion platform and telecontrol equipment |
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Application publication date: 20120704 |