CN102496612B - 一种采用陶瓷外壳封装的具有高隔离度的集成电路 - Google Patents

一种采用陶瓷外壳封装的具有高隔离度的集成电路 Download PDF

Info

Publication number
CN102496612B
CN102496612B CN2011104312598A CN201110431259A CN102496612B CN 102496612 B CN102496612 B CN 102496612B CN 2011104312598 A CN2011104312598 A CN 2011104312598A CN 201110431259 A CN201110431259 A CN 201110431259A CN 102496612 B CN102496612 B CN 102496612B
Authority
CN
China
Prior art keywords
metal
layer
based layer
shell
integrated circuit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN2011104312598A
Other languages
English (en)
Other versions
CN102496612A (zh
Inventor
杨若飞
万天才
范麟
唐睿
徐骅
刘永光
李家祎
李明剑
陈昆
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CHONGQING SOUTHWEST INTEGRATED-CIRCUIT DESIGN Co Ltd
CETC 24 Research Institute
Original Assignee
CHONGQING SOUTHWEST INTEGRATED-CIRCUIT DESIGN Co Ltd
CETC 24 Research Institute
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CHONGQING SOUTHWEST INTEGRATED-CIRCUIT DESIGN Co Ltd, CETC 24 Research Institute filed Critical CHONGQING SOUTHWEST INTEGRATED-CIRCUIT DESIGN Co Ltd
Priority to CN2011104312598A priority Critical patent/CN102496612B/zh
Publication of CN102496612A publication Critical patent/CN102496612A/zh
Application granted granted Critical
Publication of CN102496612B publication Critical patent/CN102496612B/zh
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L2224/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • H01L2224/321Disposition
    • H01L2224/32151Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/32221Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/32225Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L2224/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • H01L2224/321Disposition
    • H01L2224/32151Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/32221Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/32245Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48225Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • H01L2224/48227Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73251Location after the connecting process on different surfaces
    • H01L2224/73265Layer and wire connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/73Means for bonding being of different types provided for in two or more of groups H01L24/10, H01L24/18, H01L24/26, H01L24/34, H01L24/42, H01L24/50, H01L24/63, H01L24/71
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/11Device type
    • H01L2924/14Integrated circuits
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/161Cap
    • H01L2924/1615Shape
    • H01L2924/16195Flat cap [not enclosing an internal cavity]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/30Technical effects
    • H01L2924/301Electrical effects
    • H01L2924/3025Electromagnetic shielding

Landscapes

  • Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)

Abstract

本发明提供一种采用陶瓷外壳封装的具有高隔离度的集成电路,包括管壳和芯片,管壳由壳底、壳体和盖板构成,芯片放置在壳底上,其特征在于:壳体包括第一介质层、第一金属基层、第二介质层、第二金属基层、第三介质层和第三金属基层;所述第一介质层、第一金属基层、第二介质层、第二金属基层、第三介质层和第三金属基层从上至下按顺序叠合,芯片通过键合线与第二金属基层连接,第一金属基层和第三金属基层通过第一通孔连接。本发明能够有效地降低信号通道的耦合效应,降低本振泄露,具有高的隔离度,系统结构简单,能够减少投片次数,提高了工作效率和经济效益,具有良好的应用前景。

Description

一种采用陶瓷外壳封装的具有高隔离度的集成电路
技术领域
本发明涉及集成电路,具体涉及一种采用陶瓷外壳封装的具有高隔离度的集成电路。
背景技术
射频IC设计中,射频信号的电磁场分布随着频率提高,其空间分布特性变化也增大,管壳封装等分布参数对电路性能影响非常大;随着频率变化,这些寄生参数在电路工作中不仅影响射频芯片本身的工作特性,而且耦合的高频信号能量还会造成周围电路和系统误工作,产生严重的电磁干扰问题。
传统陶瓷管壳一般三层,第一介质层、金属基层和第二介质层,传输电信号的金属基层介于两个介质层之间,这样的布局方式所加工出来的陶瓷管壳由于传输信号的信号层之间没有能够有效隔离本振泄露的阻隔层,导致高频信号在传输过程中,通道之间存在较高的耦合效应,从而会增大信号的本振泄露,隔离度低。
发明内容
本发明所要解决的技术问题在于提供一种采用陶瓷外壳封装的具有高隔离度的集成电路。
为了解决上述技术问题,本发明的技术方案是,一种采用陶瓷外壳封装的具有高隔离度的集成电路,包括管壳和芯片,管壳由壳底、壳体和盖板构成,芯片放置在壳底上,其特点是:壳体包括第一介质层、第一金属基层、第二介质层、第二金属基层、第三介质层和第三金属基层;所述第一介质层、第一金属基层、第二介质层、第二金属基层、第三介质层和第三金属基层从上至下按顺序叠合,芯片通过键合线与第二金属基层连接,第一金属基层和第三金属基层通过第一通孔连接;所述壳体还包括第四介质层,第四介质层叠合在第三金属基层之下方;所述壳体还包括第四金属基层、第五介质层和第五金属基层,第四金属基层、第五介质层和第五金属基层从上至下按顺序叠合,并且,第四金属基层叠合在第四介质层之下方,第二金属基层与第四金属基层通过第二通孔相连,第一金属基层、第三金属基层和第五金属基层通过第一通孔连接。
本发明在与芯片连接的第二金属基层外还设置有第一金属基层和第三金属基层,并将第一金属基层和第三金属基层连接,起到对第二金属基层屏蔽的作用,能够有效地降低信号通道的耦合效应,降低本振泄露。
本发明的该优选方案在与芯片连接的第二金属基层外还设置有第一金属基层,在与芯片连接的第四金属基层外还设置有第五金属基层,并在第二金属基层与第四金属基层之间设置有第三金属基层,同时将第一金属基层、第三金属基层和第五金属基层连接,起到对第二金属基层、第四金属基层屏蔽的作用,能够有效地降低信号通道的耦合效应,降低本振泄露。
根据本发明所述的一种采用陶瓷外壳封装的具有高隔离度的集成电路的一种优选方案,所述壳体还包括第六介质层,第六介质层叠合在第第五金属基层的下方。
根据本发明所述的一种采用陶瓷外壳封装的具有高隔离度的集成电路的一种优选方案,所述壳底为热沉或金属基层,第五金属基层与壳底连接。
根据本发明所述的一种采用陶瓷外壳封装的具有高隔离度的集成电路的一种优选方案,所述壳底为热沉,第五金属基层与壳底连接。
本发明所述的一种采用陶瓷外壳封装的具有高隔离度的集成电路的有益效果是:本发明采用地层隔离技术,能够有效地降低信号通道的耦合效应,降低本振泄露,具有高的隔离度,系统结构简单,能够减少投片次数,提高了工作效率和经济效益,具有良好的应用前景。
附图说明
图1是本发明所述的一种采用陶瓷外壳封装的具有高隔离度的集成电路的结构示意图。
图2是实施例2的结构示意图。
图3是实施例3的结构示意图。
图4是实施例4的结构示意图。
图5是采用传统陶瓷管壳LCC64封装的集成电路的仿真图。
图6是采用实施例2所述的陶瓷管壳封装的集成电路且壳底8为热沉的仿真图。
具体实施方式
实施例一,参见图1,一种采用陶瓷外壳封装的具有高隔离度的集成电路,包括管壳和芯片7,管壳由壳底8、壳体10和盖板1构成,芯片7放置在壳底8上,壳体10包括第一介质层9a、第一金属基层2a、第二介质层9b、第二金属基层2b、第三介质层9c和第三金属基层2c;所述第一介质层9a、第一金属基层2a、第二介质层9b、第二金属基层2b、第三介质层9c和第三金属基层2c从上至下按顺序叠合,芯片7通过键合线6与第二金属基层2a连接,第二金属基层2a通过第二通孔4与引线5连接;第一金属基层2a和第三金属基层2c通过第一通孔11连接,其中:壳底8为热沉,热沉采用钨铜合金材料制成,金属基层采用铁镍钴合金材料制成,介质层采用三氧化二铝材料构成,第三金属基层2c与壳底8连接;当芯片不需要通过热沉散热时,壳底8为金属基层,采用铁镍钴合金材料制成,壳底8与第三金属基层2c连接。
实施例二:参见图2,实施例二与实施例一不同的是:所述壳体10还包括第四介质层9d,第四介质层9d叠合在第三金属基层2c之下方;壳底8为热沉,热沉采用钨铜合金材料制成,金属基层采用铁镍钴合金材料制成,介质层采用三氧化二铝材料构成,第三金属基层2c与壳底8连接;当芯片不需要通过热沉散热时,壳底8也可以采用三氧化二铝制成,并将第一金属基层2a与地连接。
实施例三:参见图3,一种采用陶瓷外壳封装的具有高隔离度的集成电路,包括管壳和芯片7,管壳由壳底8、壳体10和盖板1构成,芯片7放置在壳底8上,壳体10包括第一介质层9a、第一金属基层2a、第二介质层9b、第二金属基层2b、第三介质层9c、第三金属基层2c、第四介质层9d、第四金属基层2d、第五介质层9e和第五金属基层2e以及第六介质层9f;所述第一介质层9a、第一金属基层2a、第二介质层9b、第二金属基层2b、第三介质层9c、第三金属基层2c、第四介质层9d、第四金属基层2d、第五介质层9e和第五金属基层2e从上至下按顺序叠合,芯片7通过键合引线6与第二金属基层2b连接,第二金属基层2b与第四金属基层2d以及引线5通过第二通孔4相连,第一金属基层2a、第三金属基层2c和第五金属基层2e通过第一通孔11连接,其中:壳底8为热沉,热沉采用钨铜合金材料制成,金属基层采用铁镍钴合金材料制成,介质层采用三氧化二铝材料构成,第五金属基层2e与壳底8连接;当芯片7不需要通过热沉散热时,壳底8为金属基层,采用铁镍钴合金材料制成,壳底8与第五金属基层2e连接。
实施例四:参见图4,实施例四与实施例三不同的是,所述壳体还包括第六介质层9f,第六介质层9f叠合在第五金属基层2e的下方;壳底为热沉,热沉采用钨铜合金材料制成,金属基层采用铁镍钴合金材料制成,介质层采用三氧化二铝材料构成,第五金属基层2e与壳底8连接;当芯片不需要通过热沉散热时,壳底8也可以采用三氧化二铝制成,并将第一金属基层2a与地连接。
实施例五:利用美国Ansoft公司的仿真软件HFSS和Q3D对LCC64管壳模型进行模拟分析,参见图5和图6,图5是采用传统陶瓷管壳LCC64封装的集成电路的仿真结果,图6是采用实施例2所述的陶瓷管壳封装的集成电路且壳底8为热沉的仿真结果,根据图5、图6的仿真结果对比可以看出,在频率为350MHz时,隔离度提高了18dB。
按照上述实施例进行实施,能够有效地降低信号通道的耦合效应,降低本振泄露,具有高的隔离度。
上面对本发明的具体实施方式进行了描述,但是,本发明保护的不仅限于具体实施方式的范围。

Claims (4)

1.一种采用陶瓷外壳封装的具有高隔离度的集成电路,包括管壳和芯片(7),管壳由壳底(8)、壳体(10)和盖板(1)构成,芯片(7)放置在壳底(8)上,其特征在于:壳体(10)包括第一介质层(9a)、第一金属基层(2a)、第二介质层(9b)、第二金属基层(2b)、第三介质层(9c)和第三金属基层(2c);所述第一介质层(9a)、第一金属基层(2a)、第二介质层(9b)、第二金属基层(2b)、第三介质层(9c)和第三金属基层(2c)从上至下按顺序叠合,芯片(7)通过键合线(6)与第二金属基层(2a)连接,第一金属基层(2a)和第三金属基层(2c)通过第一通孔(11)连接;
所述壳体(10)还包括第四介质层(9d),第四介质层(9d)叠合在第三金属基层(2c)之下方;
所述壳体(10)还包括第四金属基层(2d)、第五介质层(9e)和第五金属基层(2e),第四金属基层(2d)、第五介质层(9e)和第五金属基层(2e)从上至下按顺序叠合,并且,第四金属基层(2d)叠合在第四介质层(9d)之下方,第二金属基层(2b)与第四金属基层(2d)通过第二通孔(4)相连,第一金属基层(2a)、第三金属基层(2c)和第五金属基层(2e)通过第一通孔(11)连接。
2.根据权利要求1所述的一种采用陶瓷外壳封装的具有高隔离度的集成电路,其特征在于:所述壳体(10)还包括第六介质层(9f),第六介质层(9f)叠合在第五金属基层(9e)的下方。
3.根据权利要求1所述的一种采用陶瓷外壳封装的具有高隔离度的集成电路,其特征在于:所述壳底(8)为热沉或金属基层,第五金属基层(2e)与壳底(8)连接。
4.根据权利要求2所述的一种采用陶瓷外壳封装的具有高隔离度的集成电路,其特征在于:所述壳底(8)为热沉,第五金属基层(2e)与壳底(8)连接。
CN2011104312598A 2011-12-21 2011-12-21 一种采用陶瓷外壳封装的具有高隔离度的集成电路 Active CN102496612B (zh)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN2011104312598A CN102496612B (zh) 2011-12-21 2011-12-21 一种采用陶瓷外壳封装的具有高隔离度的集成电路

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN2011104312598A CN102496612B (zh) 2011-12-21 2011-12-21 一种采用陶瓷外壳封装的具有高隔离度的集成电路

Publications (2)

Publication Number Publication Date
CN102496612A CN102496612A (zh) 2012-06-13
CN102496612B true CN102496612B (zh) 2013-09-18

Family

ID=46188417

Family Applications (1)

Application Number Title Priority Date Filing Date
CN2011104312598A Active CN102496612B (zh) 2011-12-21 2011-12-21 一种采用陶瓷外壳封装的具有高隔离度的集成电路

Country Status (1)

Country Link
CN (1) CN102496612B (zh)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102014206608A1 (de) 2014-04-04 2015-10-08 Siemens Aktiengesellschaft Verfahren zum Montieren eines elektrischen Bauelements, bei der eine Haube zum Einsatz kommt, und zur Anwendung in diesem Verfahren geeignete Haube
DE102014206601A1 (de) * 2014-04-04 2015-10-08 Siemens Aktiengesellschaft Verfahren zum Montieren eines elektrischen Bauelements, bei der eine Haube zum Einsatz kommt, und zur Anwendung in diesem Verfahren geeignete Haube
CN104112890B (zh) * 2014-06-23 2016-09-21 中国电子科技集团公司第五十五研究所 X波段低损耗高隔离度封装结构
CN105530026B (zh) * 2015-12-18 2018-05-18 南京才华科技集团有限公司 一种小型化毫米波收发组件
CN108231698A (zh) * 2017-12-29 2018-06-29 中国电子科技集团公司第十三研究所 陶瓷焊盘阵列外壳
CN111599790B (zh) * 2020-05-13 2021-12-24 中国电子科技集团公司第十三研究所 陶瓷无引线片式封装外壳
CN111621827B (zh) * 2020-06-05 2021-08-24 中国电子科技集团公司第二十四研究所 一种提升封装后的半导体器件抗盐雾能力的处理方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN202394861U (zh) * 2011-12-21 2012-08-22 重庆西南集成电路设计有限责任公司 一种采用陶瓷外壳封装的集成电路

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1093012A (ja) * 1996-09-19 1998-04-10 Mitsubishi Electric Corp 高周波集積回路装置
US6537849B1 (en) * 2001-08-22 2003-03-25 Taiwan Semiconductor Manufacturing Company Seal ring structure for radio frequency integrated circuits
JP2004071772A (ja) * 2002-08-05 2004-03-04 Matsushita Electric Ind Co Ltd 高周波パッケージ
US20040080917A1 (en) * 2002-10-23 2004-04-29 Steddom Clark Morrison Integrated microwave package and the process for making the same
US7253502B2 (en) * 2004-07-28 2007-08-07 Endicott Interconnect Technologies, Inc. Circuitized substrate with internal organic memory device, electrical assembly utilizing same, and information handling system utilizing same

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN202394861U (zh) * 2011-12-21 2012-08-22 重庆西南集成电路设计有限责任公司 一种采用陶瓷外壳封装的集成电路

Also Published As

Publication number Publication date
CN102496612A (zh) 2012-06-13

Similar Documents

Publication Publication Date Title
CN102496612B (zh) 一种采用陶瓷外壳封装的具有高隔离度的集成电路
CN103258817B (zh) 半导体封装结构及其制造方法
CN108063302A (zh) 射频基板垂直互联结构
CN107369673B (zh) 设置有天线的集成电路封装装置及其制造方法
CN104218018A (zh) 一种射频功放模块及其组装方法、射频模块、基站
CN202394861U (zh) 一种采用陶瓷外壳封装的集成电路
CN105657962A (zh) 一种多层pcb电路板
CN102185470B (zh) 具有双面冷却及电磁干扰屏蔽功能的夹层结构
CN103763849A (zh) 一种高散热铜基线路板
CN202564037U (zh) 变压器
CN105449355A (zh) 天线装置
CN105514082A (zh) 一种芯片间无线互连结构
CN110868793A (zh) 屏蔽结构和三维集成微波电路
CN103490593A (zh) 一种dc-dc电源模块的pcb布局结构
CN204144246U (zh) 一种射频功放模块、射频模块及基站
CN208127416U (zh) 一种毫米波天线单体
CN102412230A (zh) 用于射频工艺中的电感地屏蔽结构
CN206559718U (zh) 一种降低电磁干扰的pcb板结构
CN105529312A (zh) 封装结构
CN211090142U (zh) 一种基于ltcc工艺的多层电路基板
CN209626395U (zh) 一种多通道微带环行器
CN204204841U (zh) 一种小型化高隔离度陶瓷封装结构
CN102509831A (zh) 一种带侧墙的慢波微带线结构
CN201904778U (zh) 用于双频段宽带电台的天线共用装置
CN202335196U (zh) 双、多复合吸收层

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant