CN102487109A - Horizontal graphite boat - Google Patents

Horizontal graphite boat Download PDF

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Publication number
CN102487109A
CN102487109A CN2009102613593A CN200910261359A CN102487109A CN 102487109 A CN102487109 A CN 102487109A CN 2009102613593 A CN2009102613593 A CN 2009102613593A CN 200910261359 A CN200910261359 A CN 200910261359A CN 102487109 A CN102487109 A CN 102487109A
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CN
China
Prior art keywords
graphite boat
horizontal
sheet
silicon chip
disc
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN2009102613593A
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Chinese (zh)
Inventor
吴晓松
翁建军
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Wuxi Suntech Power Co Ltd
Original Assignee
Wuxi Suntech Power Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Wuxi Suntech Power Co Ltd filed Critical Wuxi Suntech Power Co Ltd
Priority to CN2009102613593A priority Critical patent/CN102487109A/en
Priority to PCT/CN2010/080069 priority patent/WO2011076108A1/en
Publication of CN102487109A publication Critical patent/CN102487109A/en
Pending legal-status Critical Current

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
    • C23C16/4582—Rigid and flat substrates, e.g. plates or discs
    • C23C16/4583—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially horizontally
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/67303—Vertical boat type carrier whereby the substrates are horizontally supported, e.g. comprising rod-shaped elements
    • H01L21/67306—Vertical boat type carrier whereby the substrates are horizontally supported, e.g. comprising rod-shaped elements characterized by a material, a roughness, a coating or the like
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/67303—Vertical boat type carrier whereby the substrates are horizontally supported, e.g. comprising rod-shaped elements
    • H01L21/67309—Vertical boat type carrier whereby the substrates are horizontally supported, e.g. comprising rod-shaped elements characterized by the substrate support
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/6734—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders specially adapted for supporting large square shaped substrates
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/6734—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders specially adapted for supporting large square shaped substrates
    • H01L21/67343—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders specially adapted for supporting large square shaped substrates characterized by a material, a roughness, a coating or the like
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/67346—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders characterized by being specially adapted for supporting a single substrate or by comprising a stack of such individual supports

Abstract

The invention relates to the solar cell manufacture technology field, especially relating to a graphite boat used in a production process of a solar cell. The invention discloses a horizontal graphite boat which comprises a plurality of mutually fixed graphite boat sheets which are horizontally arranged according to a predetermined interval. Along a length direction, an upper surface of each graphite boat sheet is provided with a plurality of recessed parts suitable for placing a silicon chip. Each recessed part has an edge part and a flat bottom part. The edge part of each recessed part at one side of the length direction of the graphite boat sheet is constructed into an inclined plane or is level with the bottom part. According to the horizontal graphite boat, operation personnel does not need to touch an etching surface of the silicon chip when carrying out operations of placing and unloading on the chip, thus the horizontal graphite boat is suitable for novel efficient solar cell technology production; the operations of placing and unloading on the chip can hardly wear the etching surface of the silicon chip, and performance of a solar cell product is raised.

Description

A kind of horizontal graphite boat
Technical field
The present invention relates to solar cell manufacturing technology field, relate in particular to the graphite boat that in the process of solar cell production, uses.
Background technology
In the process for making of silicon substrate solar cell; Usually need to adopt thin film deposition processes to carry out the plated film of silicon chip; For example can adopt PECVD (Plasma Enhanced Chemical VapourDeposition; Plasma reinforced chemical vapour deposition) depositing operation carries out the vacuum coating of silicon nitride to silicon chip, makes at silicon chip surface and forms anti-reflection layer (passivation layer).Carry out brief introduction in the face of the silicon substrate solar cell manufacture process down.
In the solar cell manufacture process, when carrying out the silicon chip surface plated film, uncoated silicon chip is inserted on the slide glass device of PECVD vacuum coating equipment; Usually the slide glass device is realized by graphite boat; That is, will insert graphite boat without the silicon chip of plated film, then; The graphite boat that is loaded with silicon chip is placed in the PECVD vacuum coating equipment cavity, adopts pecvd process that silicon chip is carried out plated film.After plated film finishes, in the vacuum coating equipment cavity, take out graphite boat, and then the silicon chip that will pass through plated film unloads from graphite boat and takes off.
The employed graphite boat of existing vacuum coating equipment is generally rectilinear graphite boat.Shown in Figure 1 is the plan structure sketch map of rectilinear graphite boat of the prior art; Fig. 2 is the front view of the wherein a slice graphite boat sheet among Fig. 1; Fig. 3 has the lateral elevational view of electrode one side for rectilinear graphite boat of the prior art.Like Fig. 1, Fig. 2 and shown in Figure 3; This rectilinear graphite boat mainly is made up of the graphite boat sheet that interfixes with the vertically arranged multi-disc of predetermined space; Two surfaces of every graphite boat sheet are provided with a plurality of fixed parts 20 that are used to place the position 10 of silicon chip and are used to locate silicon chip; Also be provided with a plurality of ceramic rods 30 that pass multi-disc graphite boat sheet perpendicular to graphite boat sheet surface on the multi-disc graphite boat sheet; This ceramic rod 30 is used for the graphite boat sheet of each layer is fixed, and the end of ceramic rod 30 uses graphite screw 40 fixing.Ceramic rod 30 between any two graphite boat sheets is provided with ceramic jacket 50, is used for that the graphite boat sheet is separated certain distance and reserves the space that silicon chip picks and places, and can guarantee to keep between every layer of graphite boat sheet insulation.This rectilinear graphite boat comprises that also the manipulator that is arranged on both sides grasps piece 60, and is arranged on the positive and negative electrode 70 of a side.All be provided with the position that to place silicon chip owing to form two surfaces of every graphite boat sheet of this rectilinear graphite boat, inhale the mode of drawing silicon wafer suede is unloaded sheet to silicon chip a operation with adopting so can only adopt a mode of drawing silicon chip surface of inhaling that silicon chip is carried out inserted sheet.
It is thus clear that there is following shortcoming in rectilinear graphite boat of the prior art:
1, because vertical graphite boat need use fixedly silicon chip of fixed part, so can produce process point, promptly can not fully react the effective passivation layer of formation with reacting gas here at the silicon chip place that contacts with fixed part, influenced the coating quality on the whole surface of silicon chip;
2, because the technological requirement of new efficient solar battery can not be touched the matte of silicon chip, therefore existing rectilinear graphite boat can't be applicable to new efficient solar battery explained hereafter.
3, silicon chip is being inserted rectilinear graphite boat or is unloading when getting from this rectilinear graphite boat, silicon chip easily and the graphite boat sheet touch, thereby the crackle or the fragment that cause silicon wafer suede to be worn so that influence performance of products and can cause silicon chip.
Summary of the invention
The objective of the invention is to, a kind of horizontal graphite boat is provided, this horizontal graphite boat make the operator can under the situation of the making herbs into wool face that need not touch silicon chip, realize to the inserted sheet of silicon chip with unload sheet, thereby applicable to new efficient solar battery art production process.
For realizing above-mentioned purpose; The present invention provides a kind of horizontal graphite boat; This horizontal graphite boat comprises the graphite boat sheet that the multi-disc with the predetermined space horizontal arrangement interfixes; The upper surface of every said graphite boat sheet is provided with a plurality of recess that are suitable for placing silicon chip along its length direction; Each the female portion has edge part and smooth bottom, and the edge part of a side of the length direction that is in said graphite boat sheet of the female portion is configured to be suitable for said silicon chip is inserted the female portion through this edge part.
As preferably, the edge part of a side of the length direction that is in said graphite boat sheet of the female portion is configured to the inclined-plane or flushes so that recess is opening-like in a side with the bottom of recess.
As preferably, the female portion is with respect to the recessed degree of depth of the upper surface of the said graphite boat sheet thickness less than said silicon chip.
As preferably, this horizontal graphite boat also comprises the graphite boat support that is fixedly installed on said multi-disc graphite boat sheet bottom.
As preferably, this horizontal graphite boat comprises that also the machinery that is fixedly installed on the both side ends on the said multi-disc graphite boat leaf length direction holds piece in hand.
As preferably, the both sides on the Width of said multi-disc graphite boat sheet are provided with a plurality of ceramic rods that vertically pass multi-disc graphite boat sheet, and said ceramic rod is between a plurality of recess of said graphite boat sheet.
As preferably, this horizontal graphite boat also comprises the graphite screw that is fixed in said ceramic rod end.
As preferably, this horizontal graphite boat also comprises ceramic jacket, and it is arranged on the said ceramic rod between any two graphite boat sheets.
As preferably, said horizontal graphite boat also comprises the positive and negative electrode on the wherein side end that is arranged on the both side ends on the said multi-disc graphite boat leaf length direction.
Horizontal graphite boat provided by the invention makes operating personnel can not need touch the making herbs into wool face of silicon chip and realizes operation that silicon chip is carried out film releasing and unloads sheet, therefore goes for new efficient solar battery explained hereafter; And place silicon chip and unload the operation of getting silicon chip and be difficult for making the making herbs into wool face of silicon chip to be worn, thereby improved the solar cell performance of products; And, need not extra silicon chip fixed structure because silicon chip is under the horizontal positioned state, to carry out plated film, can not produce the contact process point, thereby improve the whole coating quality of silicon chip surface.
Description of drawings
Fig. 1 is the plan structure sketch map of rectilinear graphite boat of the prior art;
Fig. 2 is the front view of a slice graphite boat sheet wherein among Fig. 1;
Fig. 3 has the lateral elevational view of electrode one side for rectilinear graphite boat of the prior art;
Fig. 4 is the perspective view of an embodiment of horizontal graphite boat of the present invention;
Fig. 5 is the vertical view of the horizontal graphite boat among Fig. 4.
Embodiment
Below in conjunction with accompanying drawing embodiment of the present invention is elaborated.
Fig. 4 is the perspective view of an embodiment of horizontal graphite boat of the present invention; Fig. 5 is the vertical view of the horizontal graphite boat among Fig. 4.Like Fig. 4 and shown in Figure 5; Horizontal graphite boat among this embodiment comprises the graphite boat sheet that the multi-disc with the predetermined space horizontal arrangement interfixes; The upper surface of every graphite boat sheet is provided with a plurality of recess 1 that are suitable for placing silicon chip along its length direction; Each recess 1 has edge part 11 and smooth bottom 12, and said silicon chip is inserted the female portion 1 from the edge part 11 of a side of the length direction of the said graphite boat sheet of being in of the female portion 1.The size of the female portion 1 is corresponding with the size of the actual silicon chip that uses, and fit in the bottom 12 of its lower surface and recess 1 after silicon chip is inserted.
Wherein, Recess 1 is preferably the thickness less than silicon chip from the recessed degree of depth of the upper surface of this sheet graphite boat sheet; When guaranteeing load, can carry out in the silicon chip location so rapidly accurately; The lower surface that yet can guarantee silicon chip does not contact with reacting gas when vacuum coating, well avoids the lower surface of reacting gas and silicon chip to produce reaction formation passivation layer.
Preferably; The edge part 11 that the silicon chip that is in graphite boat of recess 1 is inserted a side is configured to the inclined-plane; Or be configured to flush so that recess 1 is opening-like in a side with the bottom 12 of recess 1, be beneficial to silicon chip is inserted recess 1 or silicon chip is released from recess 1.
Both sides on the Width of multi-disc graphite boat sheet also are provided with a plurality of ceramic rods 4 that vertically pass multi-disc graphite boat sheet; Can position the graphite boat sheet; And each ceramic rod 4 is between adjacent two recess 1 of graphite boat sheet, therefore can be used for locating the position of each recess 1.
The horizontal graphite boat of present embodiment also can comprise the graphite boat support 2 that is arranged on multi-disc graphite boat sheet bottom, and it is used for supporting this horizontal graphite boat, and is convenient to this horizontal graphite boat is placed on the oar of vacuum coating equipment silicon chip is carried out plated film.
The horizontal graphite boat of present embodiment can comprise that also the machinery that is fixedly installed on the both side ends on the multi-disc graphite boat leaf length direction holds piece 3 in hand; Will this horizontal graphite boat put on the oar of vacuum coating equipment with the manipulator that makes things convenient for vacuum coating equipment or take off from it, machinery is held piece 3 in hand and can be fixedly connected with graphite boat through the graphite rod of graphite boat both side ends.
The horizontal graphite boat of present embodiment also can comprise graphite screw 6, and it is used for fixing the end of ceramic rod 4.
The horizontal graphite boat of present embodiment also can comprise ceramic jacket 5, and it is arranged on the ceramic rod 4 between any two graphite boat sheets, is used to make between any two of graphite boat sheet keep predetermined interval and make two adjacent graphite boat sheets keep each other being electrically insulated.
The horizontal graphite boat of present embodiment also can comprise the positive and negative electrode 7 on the wherein side end that is arranged on the both side ends on the multi-disc graphite boat leaf length direction; It is connected with power supply; Be provided for the Ionized high frequency voltage of reacting gas, positive and negative electrode 7 connects the graphite boat sheet of being separated by respectively, for example when the graphite boat sheet is 8 altogether; Positive electrode connects by down from first and third, five, seven last graphite boat sheet, and negative electrode connects by down from second, four, six, eight last graphite boat sheet.
When using the horizontal graphite boat of present embodiment, as shown in Figure 4, according to the arrow indicated direction, silicon chip is pushed recess 1 from the edge part that is inclined-plane or opening of a side of the recess 1 of graphite boat can locate silicon chip.After plated film is accomplished, when horizontal graphite boat takes out silicon chip, only need opposite direction according to the direction of arrow, promptly silicon chip is released recess 1 and get final product from the opposite side of graphite boat.It is thus clear that, the operator silicon chip is pushed recess 1 or with silicon chip when recess 1 is released, only need touch the edge of silicon chip and need not to touch the making herbs into wool face of silicon chip, thereby this horizontal graphite boat goes for new efficient solar battery explained hereafter; And place silicon chip and unload the operation of getting silicon chip the making herbs into wool face of silicon chip and graphite boat sheet are come in contact, be difficult for making silicon wafer suede to be worn, thereby improved the performance of solar battery product; And, need not extra silicon chip fixed structure because silicon chip is under the horizontal positioned state, to carry out plated film, and can not produce the contact process point, improved the whole coating quality of silicon chip surface.
The above is a preferred implementation of the present invention; Should be understood that; For those skilled in the art; Under the prerequisite that does not break away from the principle of the invention, can also make some improvement and retouching, these improvement and retouching also are regarded as dropping within the desired protection range of claim of the present invention.

Claims (12)

1. horizontal graphite boat; It is characterized in that; Said horizontal graphite boat comprises the graphite boat sheet that the multi-disc with the predetermined space horizontal arrangement interfixes; The upper surface of every said graphite boat sheet is provided with a plurality of recess that are suitable for placing silicon chip along its length direction, and each the female portion has edge part and smooth bottom, and the edge part of a side of the length direction that is in said graphite boat sheet of the female portion is configured to be suitable for said silicon chip is inserted the female portion through this edge part.
2. according to the said horizontal graphite boat of claim 1, it is characterized in that the edge part of a side of the length direction that is in said graphite boat sheet of the female portion is configured to the inclined-plane.
3. according to the said horizontal graphite boat of claim 1, it is characterized in that the edge part of a side of the length direction that is in said graphite boat sheet of the female portion is configured to flush so that the female portion is opening-like with the bottom of recess.
4. horizontal graphite boat according to claim 1 is characterized in that, the female portion is with respect to the recessed degree of depth of the upper surface of the said graphite boat sheet thickness less than said silicon chip.
5. horizontal graphite boat according to claim 1 is characterized in that, said horizontal graphite boat also comprises the graphite boat support that is fixedly installed on said multi-disc graphite boat sheet bottom.
6. horizontal graphite boat according to claim 1 is characterized in that, said horizontal graphite boat comprises that also the machinery that is fixedly installed on the both side ends on the said multi-disc graphite boat leaf length direction holds piece in hand.
7. horizontal graphite boat according to claim 1 is characterized in that, the both sides on the Width of said multi-disc graphite boat sheet are provided with a plurality of ceramic rods that vertically pass said multi-disc graphite boat sheet.
8. horizontal graphite boat according to claim 7 is characterized in that, said horizontal graphite boat also comprises the graphite screw that is fixed in said ceramic rod end.
9. according to claim 7 or 8 described horizontal graphite boats, it is characterized in that said horizontal graphite boat also comprises ceramic jacket, it is arranged on the said ceramic rod between any two graphite boat sheets.
10. according to claim 2 or 3 described horizontal graphite boats, it is characterized in that the both sides on the Width of said multi-disc graphite boat sheet are provided with a plurality of ceramic rods that vertically pass said multi-disc graphite boat sheet.
11. horizontal graphite boat according to claim 10 is characterized in that, said horizontal graphite boat also comprises ceramic jacket, and it is arranged on the said ceramic rod between any two graphite boat sheets.
12. horizontal graphite boat according to claim 1 is characterized in that, said horizontal graphite boat also comprises the positive and negative electrode on the wherein side end that is arranged on the both side ends on the said multi-disc graphite boat leaf length direction.
CN2009102613593A 2009-12-22 2009-12-22 Horizontal graphite boat Pending CN102487109A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
CN2009102613593A CN102487109A (en) 2009-12-22 2009-12-22 Horizontal graphite boat
PCT/CN2010/080069 WO2011076108A1 (en) 2009-12-22 2010-12-21 Horizontal graphite boat

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN2009102613593A CN102487109A (en) 2009-12-22 2009-12-22 Horizontal graphite boat

Publications (1)

Publication Number Publication Date
CN102487109A true CN102487109A (en) 2012-06-06

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CN (1) CN102487109A (en)
WO (1) WO2011076108A1 (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107046080A (en) * 2017-02-22 2017-08-15 广东爱康太阳能科技有限公司 A kind of contactless inserted sheet graphite boat
CN106848003B (en) * 2017-04-11 2018-04-13 常州亿晶光电科技有限公司 Graphite boat ceramic jacket rapid installation device
CN110931339A (en) * 2019-10-23 2020-03-27 深圳市拉普拉斯能源技术有限公司 Processing device for semiconductor or photovoltaic material
CN111118478A (en) * 2019-12-31 2020-05-08 湖南红太阳光电科技有限公司 PECVD equipment for preparing heterojunction battery thin film
CN112663030A (en) * 2020-12-28 2021-04-16 无锡松煜科技有限公司 Vertical photovoltaic cell passivation deposition device
CN112898049A (en) * 2021-01-28 2021-06-04 赛瑞特科技(福建)有限公司 Boron nitride coating evaporation boat and preparation method thereof

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Publication number Priority date Publication date Assignee Title
CN101008081A (en) * 2007-01-29 2007-08-01 刘卓 Graphite boat for silicon wafer production
US7334691B2 (en) * 2004-08-13 2008-02-26 Au Optronics Corp. Glass substrate cassette
US20090133628A1 (en) * 2007-10-22 2009-05-28 Centrotherm Photovoltaics Ag Vacuum device for continuous processing of substrates
CN201601140U (en) * 2009-12-22 2010-10-06 无锡尚德太阳能电力有限公司 Horizontal graphite boat

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JP4169813B2 (en) * 1997-07-22 2008-10-22 株式会社日立国際電気 Semiconductor manufacturing apparatus, boat, and semiconductor manufacturing method
CN201222507Y (en) * 2008-06-06 2009-04-15 上海太阳能科技有限公司 Quartz boat for solar cell diffusion technology

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Publication number Priority date Publication date Assignee Title
US7334691B2 (en) * 2004-08-13 2008-02-26 Au Optronics Corp. Glass substrate cassette
CN101008081A (en) * 2007-01-29 2007-08-01 刘卓 Graphite boat for silicon wafer production
US20090133628A1 (en) * 2007-10-22 2009-05-28 Centrotherm Photovoltaics Ag Vacuum device for continuous processing of substrates
CN201601140U (en) * 2009-12-22 2010-10-06 无锡尚德太阳能电力有限公司 Horizontal graphite boat

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107046080A (en) * 2017-02-22 2017-08-15 广东爱康太阳能科技有限公司 A kind of contactless inserted sheet graphite boat
CN106848003B (en) * 2017-04-11 2018-04-13 常州亿晶光电科技有限公司 Graphite boat ceramic jacket rapid installation device
CN110931339A (en) * 2019-10-23 2020-03-27 深圳市拉普拉斯能源技术有限公司 Processing device for semiconductor or photovoltaic material
CN110931339B (en) * 2019-10-23 2022-04-22 深圳市拉普拉斯能源技术有限公司 Processing device for semiconductor or photovoltaic material
CN111118478A (en) * 2019-12-31 2020-05-08 湖南红太阳光电科技有限公司 PECVD equipment for preparing heterojunction battery thin film
CN112663030A (en) * 2020-12-28 2021-04-16 无锡松煜科技有限公司 Vertical photovoltaic cell passivation deposition device
CN112898049A (en) * 2021-01-28 2021-06-04 赛瑞特科技(福建)有限公司 Boron nitride coating evaporation boat and preparation method thereof

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Publication number Publication date
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Application publication date: 20120606