CN102483478B - 用于制造针对辐射的滤波材料的合成物、用于制造滤波材料的合成物的方法、用于对辐射滤波的材料以及包括该材料的光电子器件 - Google Patents

用于制造针对辐射的滤波材料的合成物、用于制造滤波材料的合成物的方法、用于对辐射滤波的材料以及包括该材料的光电子器件 Download PDF

Info

Publication number
CN102483478B
CN102483478B CN201080030806.5A CN201080030806A CN102483478B CN 102483478 B CN102483478 B CN 102483478B CN 201080030806 A CN201080030806 A CN 201080030806A CN 102483478 B CN102483478 B CN 102483478B
Authority
CN
China
Prior art keywords
solvent
composition
radiation
pigment
siloxane
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201080030806.5A
Other languages
English (en)
Chinese (zh)
Other versions
CN102483478A (zh
Inventor
克劳斯·霍恩
迈克尔·舒曼
德克·佐森海默
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ams Osram International GmbH
Original Assignee
Osram Opto Semiconductors GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Osram Opto Semiconductors GmbH filed Critical Osram Opto Semiconductors GmbH
Publication of CN102483478A publication Critical patent/CN102483478A/zh
Application granted granted Critical
Publication of CN102483478B publication Critical patent/CN102483478B/zh
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/208—Filters for use with infrared or ultraviolet radiation, e.g. for separating visible light from infrared and/or ultraviolet radiation
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K13/00—Use of mixtures of ingredients not covered by one single of the preceding main groups, each of these compounds being essential
    • C08K13/02—Organic and inorganic ingredients
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/04—Polysiloxanes
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/204—Filters in which spectral selection is performed by means of a conductive grid or array, e.g. frequency selective surfaces
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/207—Filters comprising semiconducting materials
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G02B5/223—Absorbing filters containing organic substances, e.g. dyes, inks or pigments
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F30/00—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors
    • H10F30/20—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors
    • H10F30/21—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors the devices being sensitive to infrared, visible or ultraviolet radiation
    • H10F30/22—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors the devices being sensitive to infrared, visible or ultraviolet radiation the devices having only one potential barrier, e.g. photodiodes
    • H10F30/221—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors the devices being sensitive to infrared, visible or ultraviolet radiation the devices having only one potential barrier, e.g. photodiodes the potential barrier being a PN homojunction
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00—Constructional details of devices covered by this subclass
    • H10F77/30—Coatings
    • H10F77/306—Coatings for devices having potential barriers
    • H10F77/331—Coatings for devices having potential barriers for filtering or shielding light, e.g. multicolour filters for photodetectors
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00—Constructional details of devices covered by this subclass
    • H10F77/40—Optical elements or arrangements

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Organic Chemistry (AREA)
  • Wood Science & Technology (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Toxicology (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optical Filters (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Solid State Image Pick-Up Elements (AREA)
CN201080030806.5A 2009-07-06 2010-06-30 用于制造针对辐射的滤波材料的合成物、用于制造滤波材料的合成物的方法、用于对辐射滤波的材料以及包括该材料的光电子器件 Active CN102483478B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102009031915.8 2009-07-06
DE102009031915A DE102009031915A1 (de) 2009-07-06 2009-07-06 Zusammensetzung zur Herstellung eines Filtermaterials für Strahlung, Verfahren zur Herstellung einer Zusammensetzung für ein Filtermaterial, Material zur Filterung von Strahlung und ein optoelektronisches Bauelement umfassend das Material
PCT/EP2010/059288 WO2011003788A1 (de) 2009-07-06 2010-06-30 Zusammensetzung zur herstellung eines filtermaterials für strahlung, verfahren zur herstellung einer zusammensetzung für ein filtermaterial, material zur filterung von strahlung und ein optoelektronisches bauelement umfassend das material

Publications (2)

Publication Number Publication Date
CN102483478A CN102483478A (zh) 2012-05-30
CN102483478B true CN102483478B (zh) 2014-09-24

Family

ID=42350117

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201080030806.5A Active CN102483478B (zh) 2009-07-06 2010-06-30 用于制造针对辐射的滤波材料的合成物、用于制造滤波材料的合成物的方法、用于对辐射滤波的材料以及包括该材料的光电子器件

Country Status (7)

Country Link
US (1) US9310538B2 (cg-RX-API-DMAC7.html)
EP (1) EP2452215B1 (cg-RX-API-DMAC7.html)
JP (2) JP2012532353A (cg-RX-API-DMAC7.html)
KR (1) KR101700469B1 (cg-RX-API-DMAC7.html)
CN (1) CN102483478B (cg-RX-API-DMAC7.html)
DE (1) DE102009031915A1 (cg-RX-API-DMAC7.html)
WO (1) WO2011003788A1 (cg-RX-API-DMAC7.html)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103665778B (zh) 2012-08-30 2016-05-04 普立万聚合体（上海）有限公司 保护β-胡萝卜素的组合物
CN103275515B (zh) * 2013-06-18 2014-10-29 海宁市现代化工有限公司 一种橙色萘环酮染料及其制备方法
DE102014206995A1 (de) * 2014-04-11 2015-10-15 Osram Opto Semiconductors Gmbh Optoelektronisches Halbleiterelement, optoelektronisches Halbleiterbauteil und Verfahren zur Herstellung einer Mehrzahl von optoelektronischen Halbleiterelementen
US10363710B2 (en) 2016-01-22 2019-07-30 Indizen Optical Technologies of America, LLC Creating homogeneous optical elements by additive manufacturing
DE102023134624A1 (de) * 2023-12-11 2025-06-12 Ams-Osram International Gmbh Filterelement, optoelektronisches bauelement, verfahren zur herstellung eines filterelements und verfahren zur herstellung eines optoelektronischen bauelements

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3620888A (en) * 1966-09-02 1971-11-16 Polaroid Corp Transparent laminate having at least one layer of a cellulose derivative matrix containing infrared absorber
US4039467A (en) * 1975-06-16 1977-08-02 American Cyanamid Company Visibly opaque infrared transmitting optical filter containing a combination of copper and vanadyl phthalocyanine sulfonamides
WO2007149624A1 (en) * 2006-06-19 2007-12-27 General Electric Company Infrared transmissive thermoplastic composition, and articles formed therefrom
US20080103267A1 (en) * 2006-10-31 2008-05-01 General Electric Company Infrared transmissive thermoplastic composition
CN101472738A (zh) * 2006-06-16 2009-07-01 阿基里斯株式会社 在近红外线区域具有光反射性能的深色片状物

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1201066A (en) 1966-09-02 1970-08-05 Polaroid Corp Plastics optical elements
CA2191238C (en) * 1994-06-30 2004-01-27 Joel D. Oxman Dental impression material with cure-indicating dye
JPH09132718A (ja) 1995-11-08 1997-05-20 Toray Dow Corning Silicone Co Ltd 二液型硬化性液状シリコーン組成物
US6399190B1 (en) 1996-07-25 2002-06-04 Raytheon Company Infrared-transparent structure including an adherent, infrared-transparent polymer layer
JP4105440B2 (ja) 2002-01-30 2008-06-25 浜松ホトニクス株式会社 半導体光検出装置
JP2003262701A (ja) 2002-03-08 2003-09-19 Kanegafuchi Chem Ind Co Ltd 光学材料用組成物、光学材料、それを用いた液晶表示装置、発光ダイオードおよびそれらの製造方法
JP4426793B2 (ja) 2003-08-21 2010-03-03 株式会社朝日ラバー 樹脂複合体及びその製造方法
JP4653028B2 (ja) 2006-06-30 2011-03-16 三菱エンジニアリングプラスチックス株式会社 ポリカーボネート樹脂組成物及び赤外線レーザー用フィルター
JP5250837B2 (ja) 2006-09-20 2013-07-31 コニカミノルタ株式会社 新規なスクアリリウム金属錯体化合物、色素及びこれを含有する組成物、カラートナー、インク、光記録媒体、カラーフィルター及びディスプレイ用前面フィルター
US20080285165A1 (en) * 2007-05-14 2008-11-20 Wu Kuohua Angus Thin film filter system and method

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3620888A (en) * 1966-09-02 1971-11-16 Polaroid Corp Transparent laminate having at least one layer of a cellulose derivative matrix containing infrared absorber
US4039467A (en) * 1975-06-16 1977-08-02 American Cyanamid Company Visibly opaque infrared transmitting optical filter containing a combination of copper and vanadyl phthalocyanine sulfonamides
CN101472738A (zh) * 2006-06-16 2009-07-01 阿基里斯株式会社 在近红外线区域具有光反射性能的深色片状物
WO2007149624A1 (en) * 2006-06-19 2007-12-27 General Electric Company Infrared transmissive thermoplastic composition, and articles formed therefrom
US20080103267A1 (en) * 2006-10-31 2008-05-01 General Electric Company Infrared transmissive thermoplastic composition

Also Published As

Publication number Publication date
EP2452215A1 (de) 2012-05-16
US9310538B2 (en) 2016-04-12
JP2015072476A (ja) 2015-04-16
CN102483478A (zh) 2012-05-30
JP5933663B2 (ja) 2016-06-15
EP2452215B1 (de) 2017-08-09
KR20120107913A (ko) 2012-10-04
WO2011003788A1 (de) 2011-01-13
US20120104291A1 (en) 2012-05-03
KR101700469B1 (ko) 2017-01-26
JP2012532353A (ja) 2012-12-13
DE102009031915A1 (de) 2011-01-13

Similar Documents

Publication Publication Date Title
JP6878637B2 (ja) 赤外線吸収層用組成物、赤外線カットフィルタ、及び撮像装置
CN113840895B (zh) 基于亮银的四元纳米结构
JP6619828B2 (ja) 赤外線カットフィルタ、撮像装置、及び赤外線カットフィルタの製造方法
JP6343378B2 (ja) 赤外線カットフィルタ及び撮像光学系
KR101302277B1 (ko) 무기산화물 투명 분산액과 무기산화물 입자 함유 수지조성물, 발광소자 밀봉용 조성물 및 발광소자,하드코트막과 광학 기능막 및 광학 부품, 그리고무기산화물 입자 함유 수지 조성물의 제조 방법
DE602004006610T2 (de) Optisch transparente, temperaturbeständige polysiloxane mit hohem brechungsindex
CN102483478B (zh) 用于制造针对辐射的滤波材料的合成物、用于制造滤波材料的合成物的方法、用于对辐射滤波的材料以及包括该材料的光电子器件
EP2861687B1 (en) Optical composition
CN103576227B (zh) 光学滤波器、其制造和用途
JP5982790B2 (ja) 発光装置
JP2023071489A (ja) 光拡散性の組成物及びその製造方法
CN118435361A (zh) 罩部件和太阳能电池

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant